JP2012519930A - 金属酸化物表面又は酸化物含有金属表面上の有機化合物単分子層、及びこれを用いて製造された有機エレクトロニクス素子 - Google Patents
金属酸化物表面又は酸化物含有金属表面上の有機化合物単分子層、及びこれを用いて製造された有機エレクトロニクス素子 Download PDFInfo
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- JP2012519930A JP2012519930A JP2011552433A JP2011552433A JP2012519930A JP 2012519930 A JP2012519930 A JP 2012519930A JP 2011552433 A JP2011552433 A JP 2011552433A JP 2011552433 A JP2011552433 A JP 2011552433A JP 2012519930 A JP2012519930 A JP 2012519930A
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- bis
- phenyl
- amino
- layer
- metal oxide
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- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 23
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 23
- 150000002894 organic compounds Chemical class 0.000 title abstract 2
- 229910052751 metal Inorganic materials 0.000 title description 4
- 239000002184 metal Substances 0.000 title description 4
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 14
- 229910000077 silane Inorganic materials 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 150000004756 silanes Chemical class 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- -1 methoxy, ethoxy Chemical group 0.000 claims description 5
- IXHWGNYCZPISET-UHFFFAOYSA-N 2-[4-(dicyanomethylidene)-2,3,5,6-tetrafluorocyclohexa-2,5-dien-1-ylidene]propanedinitrile Chemical compound FC1=C(F)C(=C(C#N)C#N)C(F)=C(F)C1=C(C#N)C#N IXHWGNYCZPISET-UHFFFAOYSA-N 0.000 claims description 4
- 238000000231 atomic layer deposition Methods 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- BLFVVZKSHYCRDR-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-2-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-2-amine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=C1 BLFVVZKSHYCRDR-UHFFFAOYSA-N 0.000 claims description 3
- XOYZGLGJSAZOAG-UHFFFAOYSA-N 1-n,1-n,4-n-triphenyl-4-n-[4-[4-(n-[4-(n-phenylanilino)phenyl]anilino)phenyl]phenyl]benzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 XOYZGLGJSAZOAG-UHFFFAOYSA-N 0.000 claims description 2
- IYZMXHQDXZKNCY-UHFFFAOYSA-N 1-n,1-n-diphenyl-4-n,4-n-bis[4-(n-phenylanilino)phenyl]benzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 IYZMXHQDXZKNCY-UHFFFAOYSA-N 0.000 claims description 2
- QVDYERLGSGAPKP-UHFFFAOYSA-N 1-n,4-n-dinaphthalen-2-yl-1-n,4-n-diphenylbenzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=C(N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=C1 QVDYERLGSGAPKP-UHFFFAOYSA-N 0.000 claims description 2
- MGNMGUIBVXLCKB-UHFFFAOYSA-N 1-n-[4-[4-(n-[4-(2-methyl-n-(2-methylphenyl)anilino)phenyl]anilino)phenyl]phenyl]-4-n,4-n-bis(2-methylphenyl)-1-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC=C1N(C=1C(=CC=CC=1)C)C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C(=CC=CC=2)C)C=2C(=CC=CC=2)C)C=C1 MGNMGUIBVXLCKB-UHFFFAOYSA-N 0.000 claims description 2
- MQRCTQVBZYBPQE-UHFFFAOYSA-N 189363-47-1 Chemical compound C1=CC=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC=CC=1)C=1C=CC=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 MQRCTQVBZYBPQE-UHFFFAOYSA-N 0.000 claims description 2
- KSSABTOENVKMLW-UHFFFAOYSA-N 2-N,2-N,2-N',2-N'-tetrakis(4-phenylphenyl)-9,9'-spirobi[fluorene]-2,2'-diamine Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=C3C4(C5=CC(=CC=C5C5=CC=CC=C54)N(C=4C=CC(=CC=4)C=4C=CC=CC=4)C=4C=CC(=CC=4)C=4C=CC=CC=4)C4=CC=CC=C4C3=CC=2)C=C1 KSSABTOENVKMLW-UHFFFAOYSA-N 0.000 claims description 2
- LZHVTCXAXYYCIF-UHFFFAOYSA-N 2-n',2-n',7-n',7-n'-tetrakis(4-methoxyphenyl)-9,9'-spirobi[fluorene]-2',7'-diamine Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC=CC=C4C4=CC=CC=C43)C3=CC(=CC=C3C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 LZHVTCXAXYYCIF-UHFFFAOYSA-N 0.000 claims description 2
- QZTQQBIGSZWRGI-UHFFFAOYSA-N 2-n',7-n'-bis(3-methylphenyl)-2-n',7-n'-diphenyl-9,9'-spirobi[fluorene]-2',7'-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=C3C4(C5=CC=CC=C5C5=CC=CC=C54)C4=CC(=CC=C4C3=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 QZTQQBIGSZWRGI-UHFFFAOYSA-N 0.000 claims description 2
- ZDAWFMCVTXSZTC-UHFFFAOYSA-N 2-n',7-n'-dinaphthalen-1-yl-2-n',7-n'-diphenyl-9,9'-spirobi[fluorene]-2',7'-diamine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C(=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C23C4=CC=CC=C4C4=CC=CC=C43)C2=C1 ZDAWFMCVTXSZTC-UHFFFAOYSA-N 0.000 claims description 2
- BXSXNLBKCNVUGA-UHFFFAOYSA-N 2-n,2-n,2-n',2-n'-tetrakis(4-methoxyphenyl)-9,9'-spirobi[fluorene]-2,2'-diamine Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C4=CC=CC=C43)N(C=3C=CC(OC)=CC=3)C=3C=CC(OC)=CC=3)C3=CC=CC=C3C2=CC=1)C1=CC=C(OC)C=C1 BXSXNLBKCNVUGA-UHFFFAOYSA-N 0.000 claims description 2
- ZOSISXPKNIMGRP-UHFFFAOYSA-N 2-n,2-n,2-n',2-n'-tetraphenyl-9,9'-spirobi[fluorene]-2,2'-diamine Chemical compound C1=CC=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C4=CC=CC=C43)N(C=3C=CC=CC=3)C=3C=CC=CC=3)C3=CC=CC=C3C2=CC=1)C1=CC=CC=C1 ZOSISXPKNIMGRP-UHFFFAOYSA-N 0.000 claims description 2
- NFZUWPDINLFCGG-UHFFFAOYSA-N 2-n,7-n-bis(3-methylphenyl)-2-n,7-n,9,9-tetraphenylfluorene-2,7-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=C3C(C4=CC(=CC=C4C3=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 NFZUWPDINLFCGG-UHFFFAOYSA-N 0.000 claims description 2
- PQCAURRJHOJJNQ-UHFFFAOYSA-N 2-n,7-n-dinaphthalen-1-yl-2-n,7-n,9,9-tetraphenylfluorene-2,7-diamine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C(=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C2(C=3C=CC=CC=3)C=3C=CC=CC=3)C2=C1 PQCAURRJHOJJNQ-UHFFFAOYSA-N 0.000 claims description 2
- OGGKVJMNFFSDEV-UHFFFAOYSA-N 3-methyl-n-[4-[4-(n-(3-methylphenyl)anilino)phenyl]phenyl]-n-phenylaniline Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 OGGKVJMNFFSDEV-UHFFFAOYSA-N 0.000 claims description 2
- WPUSEOSICYGUEW-UHFFFAOYSA-N 4-[4-(4-methoxy-n-(4-methoxyphenyl)anilino)phenyl]-n,n-bis(4-methoxyphenyl)aniline Chemical compound C1=CC(OC)=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 WPUSEOSICYGUEW-UHFFFAOYSA-N 0.000 claims description 2
- ZOKIJILZFXPFTO-UHFFFAOYSA-N 4-methyl-n-[4-[1-[4-(4-methyl-n-(4-methylphenyl)anilino)phenyl]cyclohexyl]phenyl]-n-(4-methylphenyl)aniline Chemical compound C1=CC(C)=CC=C1N(C=1C=CC(=CC=1)C1(CCCCC1)C=1C=CC(=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZOKIJILZFXPFTO-UHFFFAOYSA-N 0.000 claims description 2
- DIVZFUBWFAOMCW-UHFFFAOYSA-N 4-n-(3-methylphenyl)-1-n,1-n-bis[4-(n-(3-methylphenyl)anilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 DIVZFUBWFAOMCW-UHFFFAOYSA-N 0.000 claims description 2
- CRHRWHRNQKPUPO-UHFFFAOYSA-N 4-n-naphthalen-1-yl-1-n,1-n-bis[4-(n-naphthalen-1-ylanilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 CRHRWHRNQKPUPO-UHFFFAOYSA-N 0.000 claims description 2
- KDOQMLIRFUVJNT-UHFFFAOYSA-N 4-n-naphthalen-2-yl-1-n,1-n-bis[4-(n-naphthalen-2-ylanilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=C(N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=C1 KDOQMLIRFUVJNT-UHFFFAOYSA-N 0.000 claims description 2
- NXVNUSIHWZLMGF-UHFFFAOYSA-N 4-phenyl-N-(4-phenylphenyl)-N-[4-[9-[4-(4-phenyl-N-(4-phenylphenyl)anilino)phenyl]fluoren-9-yl]phenyl]aniline Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 NXVNUSIHWZLMGF-UHFFFAOYSA-N 0.000 claims description 2
- YUBXDAMWVRMLOG-UHFFFAOYSA-N 9,9-dimethyl-2-n,7-n-bis(3-methylphenyl)-2-n,7-n-diphenylfluorene-2,7-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=C3C(C)(C)C4=CC(=CC=C4C3=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 YUBXDAMWVRMLOG-UHFFFAOYSA-N 0.000 claims description 2
- KJEQVQJWXVHKGT-UHFFFAOYSA-N 9,9-dimethyl-2-n,7-n-dinaphthalen-1-yl-2-n,7-n-diphenylfluorene-2,7-diamine Chemical compound C1=C2C(C)(C)C3=CC(N(C=4C=CC=CC=4)C=4C5=CC=CC=C5C=CC=4)=CC=C3C2=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=CC=C1 KJEQVQJWXVHKGT-UHFFFAOYSA-N 0.000 claims description 2
- AEXYCFHHOWZCCQ-UHFFFAOYSA-N C1(=CC=CC=C1)C1=C(C2=C(N=C(N2)[Ir](C=2NC3=C(N=2)C=CC(=C3C2=CC=CC=C2)C2=CC=CC=C2)C=2NC3=C(N=2)C=CC(=C3C2=CC=CC=C2)C2=CC=CC=C2)C=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C1=C(C2=C(N=C(N2)[Ir](C=2NC3=C(N=2)C=CC(=C3C2=CC=CC=C2)C2=CC=CC=C2)C=2NC3=C(N=2)C=CC(=C3C2=CC=CC=C2)C2=CC=CC=C2)C=C1)C1=CC=CC=C1 AEXYCFHHOWZCCQ-UHFFFAOYSA-N 0.000 claims description 2
- LFIYMKYMOHCZMO-UHFFFAOYSA-N C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C(=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C23C4=CC(=CC=C4C4=CC=C(C=C42)N(C=2C=CC=CC=2)C=2C4=CC=CC=C4C=CC=2)N(C=2C=CC=CC=2)C=2C4=CC=CC=C4C=CC=2)C3=C1 Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C(=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C23C4=CC(=CC=C4C4=CC=C(C=C42)N(C=2C=CC=CC=2)C=2C4=CC=CC=C4C=CC=2)N(C=2C=CC=CC=2)C=2C4=CC=CC=C4C=CC=2)C3=C1 LFIYMKYMOHCZMO-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 claims description 2
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 2
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 claims description 2
- LBFXFIPIIMAZPK-UHFFFAOYSA-N n-[4-[4-(n-phenanthren-9-ylanilino)phenyl]phenyl]-n-phenylphenanthren-9-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C2=CC=CC=C2C=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C3=CC=CC=C3C=2)C=C1 LBFXFIPIIMAZPK-UHFFFAOYSA-N 0.000 claims description 2
- PKQHEBAYOGHIPX-UHFFFAOYSA-N n-[4-[9-[4-(dinaphthalen-2-ylamino)phenyl]fluoren-9-yl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=C4C=CC=CC4=CC=3)C3=CC=C(C=C3)C3(C=4C=CC(=CC=4)N(C=4C=C5C=CC=CC5=CC=4)C=4C=C5C=CC=CC5=CC=4)C4=CC=CC=C4C=4C3=CC=CC=4)=CC=C21 PKQHEBAYOGHIPX-UHFFFAOYSA-N 0.000 claims description 2
- LKFCORSLOUZJMB-UHFFFAOYSA-N n-[4-[9-[4-(n-naphthalen-1-ylanilino)phenyl]fluoren-9-yl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 LKFCORSLOUZJMB-UHFFFAOYSA-N 0.000 claims description 2
- POSMSOVYCXWGBM-UHFFFAOYSA-N n-[5,5-dimethyl-4-[4-(n-naphthalen-1-ylanilino)phenyl]cyclohexa-1,3-dien-1-yl]-n-phenylnaphthalen-1-amine Chemical compound CC1(C)CC(N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)=CC=C1C(C=C1)=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=CC=C1 POSMSOVYCXWGBM-UHFFFAOYSA-N 0.000 claims description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims description 2
- LYKXFSYCKWNWEZ-UHFFFAOYSA-N pyrazino[2,3-f][1,10]phenanthroline-2,3-dicarbonitrile Chemical compound N1=CC=CC2=C(N=C(C(C#N)=N3)C#N)C3=C(C=CC=N3)C3=C21 LYKXFSYCKWNWEZ-UHFFFAOYSA-N 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 2
- 239000005052 trichlorosilane Substances 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 claims 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 claims 1
- 239000002356 single layer Substances 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 30
- 239000013545 self-assembled monolayer Substances 0.000 description 20
- 239000000758 substrate Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 9
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- 238000000151 deposition Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 4
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
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- 229910052782 aluminium Inorganic materials 0.000 description 3
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- QRPMCZNLJXJVSG-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-henicosafluorodecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl QRPMCZNLJXJVSG-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
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- 230000015556 catabolic process Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
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- 125000005647 linker group Chemical group 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
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- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
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- 238000000576 coating method Methods 0.000 description 1
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- 150000001879 copper Chemical class 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
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- 239000002019 doping agent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011799 hole material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
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- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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Abstract
【選択図】図1
Description
a.高い平行性を可能とするバッチ処理。引き続き基板を空気中で処理しても被覆に害を及ぼさない。
b.生産設備内にある逆スパッタユニットは、浄化に続いてシランを気相から適用するのに利用することができる。
c.全てのCVD(化学蒸着)設備とALD(原子層蒸着)設備。
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−ジメチルフルオレン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−ジフェニルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−ジフェニルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−2,2−ジメチルベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−スピロビフルオレン、
2,2’,7,7’−テトラキス(N,N−ジフェニルアミノ)−9,9’−スピロビフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(ナフタレン−2−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−ジメチルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−スピロビフルオレン、
ジ−[4−(N,N−ジトリル−アミノ)−フェニル]シクロヘキサン、
2,2’,7,7’−テトラ(N,N−ジ−トリル)アミノ−スピロ−ビフルオレン、
9,9−ビス[4−(N,N−ビス−ビフェニル−4−イル−アミノ)フェニル]−9H−フルオレン、
2,2’,7,7’−テトラキス[N−ナフタレニル(フェニル)−アミノ]−9,9−スピロビフルオレン、
2,7−ビス[N,N−ビス(9,9−スピロ−ビフルオレン−2−イル)−アミノ]−9,9−スピロビフルオレン、
2,2’−ビス[N,N−ビス(ビフェニル−4−イル)アミノ]−9,9−スピロビフルオレン、
N,N’−ビス(フェナントレン−9−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N、N’,N’−テトラ−ナフタレン−2−イル−ベンジジン、
2,2’−ビス(N,N−ジ−フェニル−アミノ)−9,9−スピロビフルオレン、
9,9−ビス[4−(N,N−ビス−ナフタレン−2−イル−アミノ)フェニル]−9H−フルオレン、
9,9−ビス[4−(N,N’−ビス−ナフタレン−2−イル−N,N’−ビス−フェニル−アミノ)−フェニル]−9H−フルオレン、
酸化チタンフタロシアニン、
銅フタロシアニン、
2,3,5,6−テトラフルオロ−7,7,8,8−テトラシアノ−キノジメタン、
4,4’,4”−トリス(N−3−メチルフェニル−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N−(2−ナフチル)−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N−(1−ナフチル)−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N,N−ジフェニル−アミノ)トリフェニルアミン、
ピラジノ[2,3−f][1,10]フェナントロリン−2,3−ジカルボニトリル、
N,N,N’,N’−テトラキス(4−メトキシフェニル)ベンジジン、
2,7−ビス[N,N−ビス(4−メトキシ−フェニル)アミノ]−9,9−スピロビフルオレン、
2,2’−ビス[N,N−ビス(4−メトキシ−フェニル)アミノ]−9,9−スピロビフルオレン、
N,N’−ジ(ナフタレン−2−イル)−N,N’−ジフェニルベンゼン−1,4−ジアミン、
N,N’−ジ−フェニル−N,N’−ジ−[4−(N,N−ジ−トリル−アミノ)フェニル]ベンジジン、
N,N’−ジ−フェニル−N,N’−ジ−[4−(N,N−ジ−フェニル−アミノ)フェニル]ベンジジン、
トリ(ジフェニルベンズイミダゾイル)イリジウム(III)DPBIC。
−RIE前処理なしの高い仕事関数
−安価な材料
−気相からの処理
−有機素子の寿命延長、並びに、輝度及び電圧上昇及び出力効率における初期寿命低下の完全防止。
参照として役立つのは標準前処理である。このため、150nmのインジウム錫酸化物で被覆されたガラス板が酸素プラズマに10分間曝される。酸素圧0.6mbarにおいて、500W高周波出力を有するプラズマが基板上で直接燃焼させられる。このように処理された基板を有するダイオードの特性曲線が次掲のグラフに赤色で示してある。この前処理は、本発明に係るダイオードと参照ダイオードとが概ね同じ出力データを有し、こうして互いに一層良好に比較できるようにするために不可欠である。
久しく知られているダイオードは、正孔導体NPB(N,N’−ビス(ナフタレン−2−イル)−N,N’−ビス(フェニル)−ベンジジン)と電子導体Alq(トリス(8−ヒドロキシキノリノラート)アルミニウム)とから成る。このため、気相から40nmNPBと40nmAlqが堆積される。カソードが0.7nmのリチウムフルオリドと200nmのアルミニウムとから成る層を形成する。
Claims (13)
- 導電性金属酸化物表面に対するフッ化シランの使用であって、前記金属酸化物表面への結合がシラン基を介して行われる使用。
- 前記導電性金属酸化物表面が透明である請求項1に記載の使用。
- 透明導電性金属酸化物層上に単分子層を製造するための方法であって、シラン末端で前記金属酸化物層に結合したフッ化直鎖シラン化合物が気相から堆積される方法。
- 温度調節された真空室内で実施することのできる請求項5に記載の方法。
- CVD(化学蒸着)法及び/又はALD(原子層蒸着)法として実施される請求項5又は6のいずれかに記載の方法。
- 導電性金属酸化物層上のフッ化シランから成るSAM層であって、前記SAM層が前記導電性金属酸化物層を正孔導電層又は電子注入層と導電接続し、これらの層の間に直接的界面が生じることはないSAM層。
- 酸化物表面へのシランの結合が気相から行われる、導電性金属酸化物層上のフッ化シランから成るSAM層。
- シランが、請求項4又は5に記載のシラン、特に以下のシラン:トリクロロシラン、エトキシシラン及び/又はメトキシシラン、から選択されている、導電性金属酸化物表面上のSAM層。
- 透明導電性金属酸化物表面上のSAM層であって、前記SAM層のアンカー基が前記酸化物表面上で結合し、下記の正孔導電化合物の群から選択した1つの化合物から成る1層上でヘッド基が結合するSAM層。
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−ジメチルフルオレン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−ジフェニルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−ジフェニルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−2,2−ジメチルベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−スピロビフルオレン、
2,2’,7,7’−テトラキス(N,N−ジフェニルアミノ)−9,9’−スピロビフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(ナフタレン−2−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−ベンジジン、
N,N’−ビス(3−メチルフェニル)−N,N’−ビス(フェニル)−9,9−ジメチルフルオレン、
N,N’−ビス(ナフタレン−1−イル)−N,N’−ビス(フェニル)−9,9−スピロビフルオレン、
ジ−[4−(N,N−ジトリル−アミノ)−フェニル]シクロヘキサン、
2,2’,7,7’−テトラ(N,N−ジ−トリル)アミノ−スピロ−ビフルオレン、
9,9−ビス[4−(N,N−ビス−ビフェニル−4−イル−アミノ)フェニル]−9H−フルオレン、
2,2’,7,7’−テトラキス[N−ナフタレニル(フェニル)−アミノ]−9,9−スピロビフルオレン、
2,7−ビス[N,N−ビス(9,9−スピロ−ビフルオレン−2−イル)−アミノ]−9,9−スピロビフルオレン、
2,2’−ビス[N,N−ビス(ビフェニル−4−イル)アミノ]−9,9−スピロビフルオレン、
N,N’−ビス(フェナントレン−9−イル)−N,N’−ビス(フェニル)−ベンジジン、
N,N,N’,N’−テトラ−ナフタレン−2−イル−ベンジジン、
2,2’−ビス(N,N−ジ−フェニル−アミノ)−9,9−スピロビフルオレン、
9,9−ビス[4−(N,N−ビス−ナフタレン−2−イル−アミノ)フェニル]−9H−フルオレン、
9,9−ビス[4−(N,N’−ビス−ナフタレン−2−イル−N,N’−ビス−フェニル−アミノ)−フェニル]−9H−フルオレン、
酸化チタンフタロシアニン、
銅フタロシアニン、
2,3,5,6−テトラフルオロ−7,7,8,8−テトラシアノ−キノジメタン、
4,4’,4”−トリス(N−3−メチルフェニル−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N−(2−ナフチル)−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N−(1−ナフチル)−N−フェニル−アミノ)トリフェニルアミン、
4,4’,4”−トリス(N,N−ジフェニル−アミノ)トリフェニルアミン、
ピラジノ[2,3−f][1,10]フェナントロリン−2,3−ジカルボニトリル、
N,N、N’,N’−テトラキス(4−メトキシフェニル)ベンジジン、
2,7−ビス[N,N−ビス(4−メトキシ−フェニル)アミノ]−9,9−スピロビフルオレン、
2,2’−ビス[N,N−ビス(4−メトキシ−フェニル)アミノ]−9,9−スピロビフルオレン、
N,N’−ジ(ナフタレン−2−イル)−N,N’−ジフェニルベンゼン−1,4−ジアミン、
N,N’−ジ−フェニル−N,N’−ジ−[4−(N,N−ジ−トリル−アミノ)フェニル]ベンジジン、
N,N’−ジ−フェニル−N,N’−ジ−[4−(N,N−ジ−フェニル−アミノ)フェニル]ベンジジン、
トリ(ジフェニルベンズイミダゾイル)イリジウム(III)DPBIC。 - 有機電子部品における電極と正孔導電層又は電子注入層との間でのSAM層の使用。
- 発光部品、特に有機発光ダイオード又は有機発光電気化学セル(OLEEC)、における請求項12記載の使用。
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DE102009012163.3 | 2009-03-06 | ||
DE200910012163 DE102009012163A1 (de) | 2009-03-06 | 2009-03-06 | Monolagen organischer Verbindungen auf Metalloxidoberflächen oder oxidhaltigen Metalloberflächen und damit hergestelltes Bauelement auf Basis organischer Elektronik |
PCT/EP2010/052700 WO2010100194A1 (de) | 2009-03-06 | 2010-03-03 | Monolagen organischer verbindungen auf metalloxidoberflächen oder oxidhaltigen metalloberflächen und damit hergestelltes bauelement auf basis organischer elektronik |
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US (1) | US20120003485A1 (ja) |
EP (1) | EP2404334A1 (ja) |
JP (1) | JP2012519930A (ja) |
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JP2018510506A (ja) * | 2015-03-06 | 2018-04-12 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | 光電子デバイスおよび光電子デバイスの製造方法 |
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DE102011018480A1 (de) | 2011-04-21 | 2012-10-25 | Heraeus Precious Metals Gmbh & Co. Kg | Fluorierte Amine als SAM in OLEDs |
DE102011077961A1 (de) * | 2011-06-22 | 2012-12-27 | Siemens Aktiengesellschaft | Schwachlichtdetektion mit organischem fotosensitivem Bauteil |
EP3101088B1 (en) * | 2012-02-14 | 2017-11-29 | Merck Patent GmbH | Materials for organic electroluminescent devices |
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WO2014120093A1 (en) * | 2013-01-31 | 2014-08-07 | Agency For Science, Technology And Research | Electrically conductive ink composition and method of preparation thereof |
DE102014110978A1 (de) * | 2014-08-01 | 2016-02-04 | Osram Oled Gmbh | Organisches Licht emittierendes Bauelement |
DE102016102964A1 (de) | 2016-02-19 | 2017-08-24 | Osram Oled Gmbh | Organisches lichtemittierendes Bauelement und Verfahren zur Herstellung eines organischen lichtemittierenden Bauelements |
KR102546316B1 (ko) * | 2016-08-09 | 2023-06-21 | 삼성전자주식회사 | 금속-반도체 접합을 가지는 반도체 소자 |
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DE102009012163A1 (de) | 2010-09-09 |
US20120003485A1 (en) | 2012-01-05 |
WO2010100194A1 (de) | 2010-09-10 |
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