JP2012177218A - 形状記憶性ポリアミド生地の製造方法、形状記憶性ポリアミド生地および形状記憶性衣類 - Google Patents
形状記憶性ポリアミド生地の製造方法、形状記憶性ポリアミド生地および形状記憶性衣類 Download PDFInfo
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Abstract
【解決手段】ε−カプロラクタムまたはヘキサメチレンジアミンおよびアジピン酸を主原料とするポリアミドの重合時に多価カルボン酸および多価アミンを添加して製造され、多価カルボン酸および多価アミンのうち少なくとも1つによって導入される芳香族成分の総含量がポリアミド主原料の含量に対して0.4〜10モル%である形状記憶性ポリアミドおよびそれを用いた形状記憶性ポリアミド生地の製造方法。
【選択図】なし
Description
Tg≦Td≦Tx (2)
上記式中、Tgは、ポリアミド共重合体のガラス転移温度であり、
Txは、熱処理温度であり、
Tmは、ポリアミド共重合体の融点であり、
Tdは、染色温度である。
Tg≦Td≦Tx (2)
上記式中、Tgは、ポリアミド共重合体のガラス転移温度であり、
Txは、熱処理温度であり、
Tmは、ポリアミド共重合体の融点であり、
Tdは、染色温度である。
Tg≦Td≦Tx (2)
上記式中、Tgは、ポリアミド共重合体のガラス転移温度であり、
Txは、熱処理温度であり、
Tmは、ポリアミド共重合体の融点であり、
Tdは、染色温度である。
撹拌器が装着された混合槽にナイロン6用のε−カプロラクタムと、開始剤として水を投入し、下記表1に示す種類および含量の多価カルボン酸および多価アミンを添加した後、250〜300℃で重合した。得られた生成物を水槽に注いで固化させた後、ポリマーレースをチップ化し、抽出および乾燥させることにより、最終チップの物性が硫酸相対粘度約2.6を有する共重合ポリアミドチップを得た。
AA:アジピン酸 HMD:ヘキサメチレンジアミン
TPA:テレフタル酸 MXD:メタキシレンジアミン
IPA:イソフタル酸 t−IPA:1,3,5−トリカルボン酸
SiPA:5−ナトリウムスルホイソフタル酸
[形状記憶特性および形状復元力評価方法]
形状記憶特性は、製織された生地にしわを作った場合、形態維持の可否を肉眼で評価することにより決定され、形状復元力は、しわを伸ばした場合、元の形態に回復する程度を肉眼で評価して決定された。
実施例6〜10および比較例3〜4
前記実施例1〜5のように、撹拌器が装着された混合槽にナイロン66用のアジピン酸およびヘキサメチレンジアミン成分を投入し、下記表2に示す種類および含量の多価カルボン酸および多価アミンを添加した後、270〜350℃で重合した。その後、得られた生成物を水槽に注いで固化させた後、ポリマーレースをチップ化して、最終チップの物性が硫酸相対粘度約2.6を有する共重合ポリアミドチップを得た。
Claims (7)
- ポリアミドの重合時に多価カルボン酸および多価アミンを添加して、芳香族成分の総含量が主原料の含量に対して0.4〜10モル%であるポリアミド部分共重合体を合成する段階;
前段階で得られたポリアミド共重合体を用いて織編物を得る段階;および
前記織編物を下記式(1)の条件で熱処理した後、下記式(2)の条件で染色する段階を含むことを特徴とする形状記憶性ポリアミド生地の製造方法:
Tg+40℃≦Tx≦Tm−20℃ (1)
Tg≦Td≦Tx (2)
上記式中、Tgは、ポリアミド共重合体のガラス転移温度であり、
Txは、熱処理温度であり、
Tmは、ポリアミド共重合体の融点であり、
Tdは、染色温度である。 - 前記ポリアミドは、ナイロン6、ナイロン66またはナイロン6とナイロン66との共重合体であることを特徴とする、請求項1に記載の形状記憶性ポリアミド生地の製造方法。
- 前記ポリアミド部分共重合体は、芳香族多価カルボン酸と脂肪族多価アミンとの組み合わせ、脂肪族多価カルボン酸と芳香族多価アミンとの組み合わせ、または芳香族多価カルボン酸と芳香族多価アミンとの組み合わせを有することを特徴とする、請求項2に記載の形状記憶性ポリアミド生地の製造方法。
- 前記多価カルボン酸は、アジピン酸、セバシン酸、ドデカンジカルボン酸、テレフタル酸、イソフタル酸、1,3,5−トリカルボン酸、2,5−および3,5−ジカルボキシベンゼンスルホン酸、2,5−および3,5−ジカルボキシエチルベンゼンスルホン酸、ならびに2,5−および3,5−ジカルボキシプロピルベンゼンスルホン酸またはこれらのナトリウム、カリウムもしくはリチウムのスルホン酸塩、2,5−および3,5−ジメトキシカルボキシルベンゼンスルホン酸、2,5−および3,5−ジメトキシカルボキシルエチルベンゼンスルホン酸、ならびに2,5−および3,5−ジメトキシカルボキシルプロピルベンゼンスルホン酸またはこれらのナトリウム、カリウムもしくはリチウムのスルホン酸塩、2,5−および3,5−ジエトキシカルボキシルエチルベンゼンスルホン酸、ならびに2,5−および3,5−ジエトキシカルボキシルプロピルベンゼンスルホン酸またはこれらのナトリウム、カリウムもしくはリチウムのスルホン酸塩、2,5−および3,5−ジプロポキシカルボキシルエチルベンゼンスルホン酸、ならびに2,5−および3,5−ジプロポキシカルボキシルプロピルベンゼンスルホン酸またはこれらのナトリウム、カリウムもしくはリチウムのスルホン酸塩ならびにこれらの混合物からなる群より選択されることを特徴とする、請求項1に記載の形状記憶性ポリアミド生地の製造方法。
- 前記多価アミン化合物は、エチレンジアミン、テトラメチレンジアミン、ヘキサメチレンジアミン、オクタメチレンジアミン、デカメチレンジアミン、ウンデカメチレンジアミン、ドデカメチレンジアミン、パラフェニレンジアミン、メタフェニレンジアミン、パラキシレンジアミン、メタキシレンジアミンおよびこれらの混合物からなる群より選択されることを特徴とする、請求項1に記載の形状記憶性ポリアミド生地の製造方法。
- 請求項1〜5のいずれか一項に記載の方法により製造されることを特徴とする形状記憶性ポリアミド生地。
- 請求項6の生地から製作されることを特徴とする形状記憶性衣類。
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Application Number | Priority Date | Filing Date | Title |
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KR20060130793 | 2006-12-20 | ||
KR10-2006-0130793 | 2006-12-20 | ||
KR1020070109460A KR100937086B1 (ko) | 2006-12-20 | 2007-10-30 | 형상기억성 폴리아미드 및 그를 이용한 형상기억성폴리아미드 원단의 제조방법 |
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US (2) | US20100304115A1 (ja) |
EP (1) | EP2094762A4 (ja) |
JP (2) | JP5346812B2 (ja) |
KR (1) | KR100937086B1 (ja) |
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KR100937086B1 (ko) * | 2006-12-20 | 2010-01-15 | 주식회사 효성 | 형상기억성 폴리아미드 및 그를 이용한 형상기억성폴리아미드 원단의 제조방법 |
EP3262219A1 (en) * | 2015-02-23 | 2018-01-03 | DSM IP Assets B.V. | High strength polyamide yarn |
US10370780B2 (en) | 2015-02-23 | 2019-08-06 | Dsm Ip Assets B.V. | High strength polyamide yarn |
CN108148200A (zh) * | 2016-12-02 | 2018-06-12 | 上海杰事杰新材料(集团)股份有限公司 | 水溶性聚酰胺树脂及其制备方法 |
CN110004513B (zh) * | 2019-04-12 | 2021-05-07 | 太原理工大学 | 一种智能变形丙纶纤维及其制备方法 |
CN110092907B (zh) * | 2019-05-29 | 2020-05-26 | 四川大学 | 含硫醚耐高温形状记忆型聚酰胺树脂及其制备方法和应用 |
KR102303209B1 (ko) * | 2019-12-11 | 2021-09-17 | 효성티앤씨 주식회사 | 저융점 코폴리아미드 및 그의 제조방법 |
CN113789052B (zh) * | 2021-11-15 | 2022-03-08 | 富海(东营)新材料科技有限公司 | 形状记忆尼龙材料及其制备方法 |
CN113802379B (zh) * | 2021-11-17 | 2022-03-25 | 苏州宝丽迪材料科技股份有限公司 | 一种持久高效抗菌尼龙6纤维的制备方法及其产品 |
CN114908469B (zh) * | 2022-06-20 | 2023-06-13 | 江南大学 | 一种形状记忆经编成形医用手臂保护套及其生产工艺 |
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- 2007-12-06 CN CN200780047322XA patent/CN101563393B/zh not_active Expired - Fee Related
- 2007-12-06 EP EP07851291A patent/EP2094762A4/en not_active Withdrawn
- 2007-12-06 JP JP2009541214A patent/JP5346812B2/ja not_active Expired - Fee Related
- 2007-12-06 US US12/446,546 patent/US20100304115A1/en not_active Abandoned
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2012
- 2012-03-06 JP JP2012049278A patent/JP5450695B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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KR20080058165A (ko) | 2008-06-25 |
EP2094762A4 (en) | 2012-08-22 |
JP2010512445A (ja) | 2010-04-22 |
CN101563393A (zh) | 2009-10-21 |
CN101563393B (zh) | 2011-09-28 |
JP5450695B2 (ja) | 2014-03-26 |
US20140013522A1 (en) | 2014-01-16 |
KR100937086B1 (ko) | 2010-01-15 |
WO2008075844A1 (en) | 2008-06-26 |
US8957179B2 (en) | 2015-02-17 |
EP2094762A1 (en) | 2009-09-02 |
US20100304115A1 (en) | 2010-12-02 |
JP5346812B2 (ja) | 2013-11-20 |
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