JP2012109446A - Insulation member, and substrate processing device with insulation member - Google Patents

Insulation member, and substrate processing device with insulation member Download PDF

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JP2012109446A
JP2012109446A JP2010257965A JP2010257965A JP2012109446A JP 2012109446 A JP2012109446 A JP 2012109446A JP 2010257965 A JP2010257965 A JP 2010257965A JP 2010257965 A JP2010257965 A JP 2010257965A JP 2012109446 A JP2012109446 A JP 2012109446A
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insulating member
long
length direction
insulating
screw hole
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Yoshihiko Sasaki
芳彦 佐々木
Seiji Tanaka
誠治 田中
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2010257965A priority Critical patent/JP2012109446A/en
Priority to CN2011103687360A priority patent/CN102468107A/en
Priority to TW100141957A priority patent/TW201234453A/en
Priority to KR1020110120374A priority patent/KR101282487B1/en
Publication of JP2012109446A publication Critical patent/JP2012109446A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an insulation member capable of preventing deterioration of a seal member due to plasma.SOLUTION: An insulation member 14 insulating a susceptor and a bottom flat surface of a chamber in the chamber of a substrate processing device has an inner member 41, an outer member 42, and an O-ring 43 arranged between them. The outer member 42 is constituted by an assembly of long articles 44-47 corresponding to each side of the rectangular susceptor 12. The long articles are assembled such that one end surface of each long article comes into contact with one side surface of the other adjacent long article and the other end side surface comes into contact with one end surface of another long article. One end of each long article is fixed to the bottom flat surface 51 of the chamber 11 via a fixing screw hole 48, and the other end is displaceably supported via a supporting screw hole 49.

Description

本発明は、基板処理装置の処理室内に設けられた電極と処理室の内壁面とを電気的に絶縁する絶縁部材及び該絶縁部材を備えた基板処理装置に関する。   The present invention relates to an insulating member that electrically insulates an electrode provided in a processing chamber of a substrate processing apparatus and an inner wall surface of the processing chamber, and a substrate processing apparatus including the insulating member.

液晶表示装置（ＬＣＤ）をはじめとするＦＰＤ（Flat Panel Display）の製造工程において、ガラス基板をはじめとする各種基板に対してプラズマ処理を施す基板処理装置が知られている。   2. Description of the Related Art A substrate processing apparatus that performs plasma processing on various substrates such as a glass substrate in a manufacturing process of an FPD (Flat Panel Display) including a liquid crystal display (LCD) is known.

このような基板処理装置においては、内部が真空領域である処理室（以下、「チャンバ」という。）内で基板を支持する基板載置台（サセプタ）と、該サセプタと処理空間を隔てて対向するように配置された上部電極とを有し、下部電極として機能するサセプタにプラズマ生成用の高周波電力（ＲＦ）を印加すると共に、チャンバ内の処理空間に処理ガスを導入してプラズマを生成させ、生成したプラズマを用いてサセプタに載置された基板に対して所定のプラズマ処理が施される。   In such a substrate processing apparatus, a substrate mounting table (susceptor) for supporting a substrate in a processing chamber (hereinafter referred to as “chamber”) whose inside is a vacuum region is opposed to the susceptor with a processing space therebetween. A high-frequency power (RF) for plasma generation is applied to a susceptor functioning as a lower electrode, and a processing gas is introduced into a processing space in the chamber to generate plasma. A predetermined plasma process is performed on the substrate placed on the susceptor using the generated plasma.

サセプタは処理対象である基板と同様の矩形を呈しており、ＲＦの絶縁を確保するためにサセプタとチャンバの内壁面、例えば底部壁面とを電気的に絶縁する絶縁部材は矩形の環状体からなる。絶縁部材は、通常、内側部材と、外側部材と、該内側部材と外側部材との間に配置されたシール部材とから主として構成されている。内側部材及び外側部材は、例えば、ポリテトラフルオロエチレン（商品名：テフロン(登録商標)）をはじめとする絶縁性の材料で構成されており、内側部材で囲まれた領域は、大気に開放された大気領域となっている。従って、内側部材と外側部材との間に配置されたシール部材は、チャンバ内の真空領域と内部部材に囲まれた大気領域とを区画している。   The susceptor has the same rectangular shape as the substrate to be processed, and the insulating member that electrically insulates the susceptor and the inner wall surface of the chamber, for example, the bottom wall surface, from a rectangular annular body in order to ensure RF insulation. . Usually, the insulating member is mainly composed of an inner member, an outer member, and a seal member disposed between the inner member and the outer member. The inner member and the outer member are made of an insulating material such as polytetrafluoroethylene (trade name: Teflon (registered trademark)), and the region surrounded by the inner member is open to the atmosphere. It has become an atmospheric region. Accordingly, the seal member disposed between the inner member and the outer member defines a vacuum region in the chamber and an atmospheric region surrounded by the inner member.

絶縁部材を構成する内部部材及び外部部材は矩形の環状体であり、近年の産業界の要請等に伴う処理基板の大型化に伴って大型化しているために一体成形することが困難であること、また、形状の簡易化、コストダウン、部材の膨張による寸法変化への対策の観点から、通常、複数の構成部材の組合せによる組合せ体として形成されている。   The internal member and the external member constituting the insulating member are rectangular annular bodies, and it is difficult to integrally form because the processing substrate has been increased in size due to the recent demand from the industry, etc. Moreover, from the viewpoint of simplification of shape, cost reduction, and measures against dimensional changes due to expansion of members, it is usually formed as a combination of a plurality of constituent members.

図７は、従来技術における絶縁部材の構成を示す図であり、図７（Ａ）は、絶縁部材全体の平面図、図７（Ｂ）は、絶縁部材の角部の部分拡大平面図、図７（Ｃ）は、絶縁部材の角部の部分拡大側面図である。   7A and 7B are diagrams showing a configuration of an insulating member in the prior art. FIG. 7A is a plan view of the entire insulating member, and FIG. 7B is a partially enlarged plan view of a corner portion of the insulating member. 7 (C) is a partially enlarged side view of the corner of the insulating member.

図７において、絶縁部材７０は、矩形の内側部材７１及び外側部材７２と、該内側部材７１及び外側部材７２の間に挟持するように配置されたシール部材としての矩形のＯリング７３とから主として構成されている。内側部材７１及び外側部材７２は複数に分割された構成部材からなり、各構成部材は、図示省略したねじによってチャンバの底部壁面に固定されている。なお、矩形の角部に配置された構成部材はそれぞれＬ字状を呈している。   In FIG. 7, the insulating member 70 is mainly composed of a rectangular inner member 71 and an outer member 72, and a rectangular O-ring 73 as a seal member disposed so as to be sandwiched between the inner member 71 and the outer member 72. It is configured. The inner member 71 and the outer member 72 are composed of constituent members divided into a plurality of parts, and each constituent member is fixed to the bottom wall surface of the chamber by a screw (not shown). In addition, the structural member arrange | positioned at the corner | angular part of a rectangle is exhibiting L shape.

絶縁部材７０は、処理目的に応じて加熱される下部電極からの伝熱によって加熱され、熱膨張する。従って、熱膨張時に、隣接する構成部材相互の当接面において相互に他方を押し合う力が発生して変形する虞がある。   The insulating member 70 is heated by heat transfer from the lower electrode heated according to the processing purpose, and is thermally expanded. Therefore, at the time of thermal expansion, there is a possibility that a force that pushes the other member on the contact surface between adjacent components is generated and deformed.

そこで、各構成部材相互間には、あらかじめ熱膨張代として熱膨張分を吸収するための隙間７４が設けられている。なお、プラズマの、例えば、縦方向の貫通を防止するために、各構成部材相互の当接部に段差部７５が設けられており、隙間７４は段差部７５によって２つに分割されている。   Therefore, a gap 74 for absorbing thermal expansion as a thermal expansion allowance is provided in advance between the constituent members. In order to prevent plasma from penetrating in the vertical direction, for example, a stepped portion 75 is provided at a contact portion between the constituent members, and the gap 74 is divided into two by the stepped portion 75.

しかしながら、隙間７４は種々の処理条件における各構成部材の熱膨張を吸収するために十分な大きさに設計されていたために、基板処理時に構成部材が熱膨張しても隙間７４が完全に閉じられず、殆どの場合、隙間７４に幾分かの間隙が残留していた。   However, since the gap 74 is designed to be large enough to absorb the thermal expansion of each component under various processing conditions, the gap 74 is completely closed even if the component expands during substrate processing. In most cases, some gaps remained in the gap 74.

プラズマ処理時に、各構成部材相互間に隙間７４が存在すると、該隙間７４からプラズマが進入して外側部材７２の内側に配置されたＯリング７３に至り、プラズマの照射を受けたＯリング７３が短時間のうちに劣化するという問題が生じる。   If a gap 74 exists between the constituent members during the plasma processing, the plasma enters from the gap 74 to reach the O-ring 73 disposed inside the outer member 72, and the O-ring 73 that has been irradiated with plasma is exposed. The problem that it deteriorates in a short time arises.

そこで、このような絶縁部材、シールドリングをはじめとするチャンバ内部品の熱膨張に伴って発生する問題を解決するために、チャンバ内部品を構成する各構成部材を相互に引きつけるように付勢する付勢部材又は各構成部材を該構成部材の組み立て体としてのチャンバ内部品の中心部に向かって付勢する付勢部材を取り付け、これによって、各構成部材相互間における隙間の発生を防止する技術が提案されている（例えば、「特許文献１」参照）。   Therefore, in order to solve the problems caused by the thermal expansion of the in-chamber components such as the insulating member and the shield ring, the constituent members constituting the in-chamber components are energized so as to attract each other. A technology for attaching an urging member or an urging member for urging each component member toward the central portion of the in-chamber component as an assembly of the component members, thereby preventing a gap from being generated between the component members Has been proposed (see, for example, “Patent Document 1”).

特開２００８−３１１２９８号公報JP 2008-311298 A

しかしながら、チャンバ内部品を形成するための各構成部材に対して特定の方向に働く作用力を付与するための付勢部材を取り付けることは、必ずしも容易ではない。一方、熱膨張を吸収するための隙間をなくしたのでは、熱膨張による構成部材の変形または破損を招くことになり、また、熱膨張を十分吸収できる隙間を放置したのでは、該隙間からプラズマが進入して、例えばその内部に配置された他の構成部品の劣化を促進させるという問題がある。   However, it is not always easy to attach an urging member for applying an acting force acting in a specific direction to each component for forming the in-chamber component. On the other hand, if the gap for absorbing the thermal expansion is eliminated, deformation or breakage of the component due to the thermal expansion is caused, and if the gap that can sufficiently absorb the thermal expansion is left, the plasma from the gap is left. There is a problem in that, for example, the deterioration of other components arranged inside it is promoted.

本発明の課題は、シール部材の劣化を防止することができる絶縁部材及び該絶縁部材を備えた基板処理装置を提供することにある。   The subject of this invention is providing the substrate processing apparatus provided with the insulating member which can prevent deterioration of a sealing member, and this insulating member.

上記課題を解決するために、請求項１記載の絶縁部材は、矩形の基板にプラズマ処理を施す基板処理装置の処理室内で前記基板を載置する矩形の載置台と前記処理室の内壁面とを電気的に絶縁する絶縁部材であって、内側部材と、外側部材と、該内側部材及び外側部材の間に配置され前記処理室内の真空領域と前記内側部材で囲まれた大気領域とを区画する環状のシール部材と、を有し、前記外側部材は、前記矩形の載置台の各辺に対応して配置された絶縁性の長尺状物の組合せ体からなり、各長尺状物の長さ方向の一端の端面が、隣接する他の長尺状物の長さ方向の一端の側面に当接し、他端の側面が、前記隣接する他の長尺状物とは異なる隣接する別の長尺状物の長さ方向の一端の端面に当接するようにそれぞれ組合せられ、前記各長尺状物の長さ方向の一端が固定用のねじ孔を介して前記処理室の内壁面に固定され、他端が少なくとも１つの支持用のねじ孔を介して変位自在に支持されて配列されていることを特徴とする。   In order to solve the above-described problem, an insulating member according to claim 1 includes a rectangular mounting table for mounting the substrate in a processing chamber of a substrate processing apparatus that performs plasma processing on the rectangular substrate, an inner wall surface of the processing chamber, An insulating member for electrically insulating the inner member, the outer member, and a vacuum region disposed between the inner member and the outer member and surrounded by the inner member. An annular sealing member, and the outer member comprises a combination of insulating long objects disposed corresponding to the sides of the rectangular mounting table, and each of the long objects The end face of one end in the length direction is in contact with the side face of one end in the length direction of another adjacent long object, and the side face of the other end is different from the adjacent other long object. Are combined so as to abut against one end face in the length direction of the long object One end in the length direction of the object is fixed to the inner wall surface of the processing chamber through a fixing screw hole, and the other end is supported and arranged to be displaceable through at least one supporting screw hole. It is characterized by that.

請求項２記載の絶縁部材は、請求項１記載の絶縁部材において、前記各長尺状物は、前記固定された一端を起点にして前記長尺状物の長さ方向に沿って熱膨張又は熱収縮可能に配列されていることを特徴とする。   The insulating member according to claim 2 is the insulating member according to claim 1, wherein each of the long objects is thermally expanded along the length direction of the long object from the fixed end. The heat-shrinkable arrangement.

請求項３記載の絶縁部材は、請求項１又は２記載の絶縁部材において、前記固定用のねじ孔は、該固定用のねじ孔に垂直な断面において真円形であり、前記支持用のねじ孔は、該支持用のねじ孔に垂直な断面において前記長尺状物の長さ方向に長い楕円形若しくは両端が半円である矩形であることを特徴とする。   The insulating member according to claim 3 is the insulating member according to claim 1 or 2, wherein the screw hole for fixing has a perfect circle in a cross section perpendicular to the screw hole for fixing, and the screw hole for supporting. Is characterized in that it is an ellipse that is long in the length direction of the long object or a rectangle that is semicircular at both ends in a cross section perpendicular to the supporting screw hole.

請求項４記載の絶縁部材は、請求項３記載の絶縁部材において、前記固定用のねじ孔に装着される固定ねじの締め付けトルクを、前記支持用のねじ孔に装着される支持ねじの締め付けトルクよりも大きくしたことを特徴とする。   The insulating member according to claim 4 is the insulating member according to claim 3, wherein the tightening torque of the fixing screw mounted in the fixing screw hole is the same as the tightening torque of the supporting screw mounted in the supporting screw hole. It is characterized by being larger than.

請求項５記載の絶縁部材は、請求項１乃至４のいずれか１項に記載の絶縁部材において、前記外側部材は、前記環状のシール部材の長さ方向に直交する断面において前記環状のシール部材の外側面側にのみに存在していることを特徴とする。   The insulating member according to claim 5 is the insulating member according to any one of claims 1 to 4, wherein the outer member is the annular seal member in a cross section orthogonal to a length direction of the annular seal member. It exists in only the outer surface side of this.

請求項６記載の絶縁部材は、請求項１乃至５のいずれか１項に記載の絶縁部材において、前記外側部材における前記長尺状物相互の当接部の内側面は曲面を呈しており、前記長尺状物の一端の側面に前記曲面を形成する突出部が設けられていることを特徴とする。   The insulating member according to claim 6 is the insulating member according to any one of claims 1 to 5, wherein an inner side surface of the abutting portion between the long objects in the outer member has a curved surface, A projecting portion that forms the curved surface is provided on a side surface of one end of the elongated object.

請求項７記載の絶縁部材は、請求項１乃至５のいずれか１項に記載の絶縁部材において、前記外側部材における前記長尺状物相互の当接部の内側面は実質的に直角の角部を形成しており、前記長尺状物は、突起部を有さない矩形の外形を有することを特徴とする。   The insulating member according to claim 7 is the insulating member according to any one of claims 1 to 5, wherein an inner side surface of the abutting portion between the long objects in the outer member is a substantially right angle. The long object has a rectangular outer shape having no protrusion.

請求項８記載の絶縁部材は、請求項１乃至７のいずれか１項に記載の絶縁部材において、前記各長尺状物の長さ方向の一端の端面と、前記隣接する他の長尺状物の長さ方向の一端の側面との当接部に段差構造の組合せ部が形成されていることを特徴とする。   The insulating member according to claim 8 is the insulating member according to any one of claims 1 to 7, wherein the end surface of one end in the length direction of each elongated object and the other adjacent elongated shape. A combination portion of a step structure is formed at a contact portion with a side surface of one end in the length direction of the object.

請求項９記載の絶縁部材は、請求項８記載の絶縁部材において、前記段差構造の少なくとも一部は、前記各長尺状物の一端の端面と、前記隣接する他の長尺状物の前記一端の側面との当接部に形成された凹部に遊嵌された絶縁材料からなる入れ子部材で構成されていることを特徴とする。   The insulating member according to claim 9 is the insulating member according to claim 8, wherein at least a part of the stepped structure includes an end surface of one end of each long object and the adjacent long object. It is characterized by comprising a nesting member made of an insulating material loosely fitted in a recess formed in a contact portion with a side surface of one end.

請求項１０記載の絶縁部材は、請求項９記載の絶縁部材において、前記凹部と前記入れ子部材との間に、前記長尺状物の長さ方向に沿った熱膨張又は熱収縮に起因する変位を吸収する隙間が設けられていることを特徴とする。   The insulating member according to claim 10 is the insulating member according to claim 9, wherein the displacement is caused by thermal expansion or contraction along a length direction of the elongated object between the concave portion and the nesting member. It is characterized in that a gap for absorbing water is provided.

請求項１１記載の絶縁部材は、請求項１０記載の絶縁部材において、前記凹部における前記入れ子部材の挿入口は、サイドシールド部材で封止されていることを特徴とする。   An insulating member according to an eleventh aspect is the insulating member according to the tenth aspect, wherein an insertion port of the nesting member in the recess is sealed with a side shield member.

請求項１２記載の絶縁部材は、請求項１乃至１１のいずれか１項に記載の絶縁部材において、前記環状のシール部材の一部は、前記処理室の内壁面に設けられた凹部に嵌合されていることを特徴とする。   The insulating member according to claim 12 is the insulating member according to any one of claims 1 to 11, wherein a part of the annular seal member is fitted in a recess provided on an inner wall surface of the processing chamber. It is characterized by being.

請求項１３記載の絶縁部材は、請求項１乃至１２のいずれか１項に記載の絶縁部材において、前記内側部材は、複数の構成部材が組み合わされた組合せ体からなり、各構成部材の相互間に熱膨張を吸収するための隙間が設けられていることを特徴とする。   The insulating member according to claim 13 is the insulating member according to any one of claims 1 to 12, wherein the inner member is formed of a combined body in which a plurality of constituent members are combined, and each of the constituent members is between each other. It is characterized in that a gap for absorbing thermal expansion is provided.

上記課題を解決するために、請求項１４記載の基板処理装置は、請求項１乃至１３のいずれか１項に記載の絶縁部材を備えていることを特徴とする。   In order to solve the above problem, a substrate processing apparatus according to a fourteenth aspect includes the insulating member according to any one of the first to thirteenth aspects.

本発明によれば、内側部材及び外側部材と、その間に配置された環状のシール部材とを有する絶縁部材における外部部材を長尺状物の組合せ体で絶縁部材を構成し、各長尺状物の長さ方向の一端の端面が、隣接する他の長尺状物の長さ方向の一端の側面に当接し、他端の側面が、隣接する他の長尺状物とは異なる隣接する別の長尺状物の長さ方向の一端の端面に当接するようにそれぞれ組合せ、各長尺状物の一端を固定するとともに、他端を変位自在に支持するようにしたので、外側部材の構成部材相互間に隙間を形成することなく、熱膨張を吸収して外部部材の内側に配置されたシール部材へのプラズマの進入を阻止し、これによって、プラズマが照射されることによるシール部材の劣化を防止することができる。   According to the present invention, an outer member in an insulating member having an inner member and an outer member, and an annular seal member disposed between the inner member and the outer member is constituted by a combination of long objects, and each long member is formed. The end surface of one end in the length direction of the other side is in contact with the side surface of one end in the length direction of another adjacent long object, and the side surface of the other end is different from the adjacent other long object. Since each of the long objects is combined so as to be in contact with the end face of one end in the length direction, the one end of each long object is fixed and the other end is supported to be displaceable. Without forming a gap between the members, the thermal expansion is absorbed and the plasma is prevented from entering the seal member disposed inside the external member, thereby deteriorating the seal member due to plasma irradiation. Can be prevented.

本発明の実施の形態に係る絶縁部材を備えた基板処理装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the substrate processing apparatus provided with the insulating member which concerns on embodiment of this invention. 本発明の実施の形態に係る絶縁部材の構成を示す平面図である。It is a top view which shows the structure of the insulating member which concerns on embodiment of this invention. 図２の絶縁部材を図１の基板処理装置に組み込んだ状態における要部を示す断面図である。It is sectional drawing which shows the principal part in the state which integrated the insulating member of FIG. 2 in the substrate processing apparatus of FIG. 絶縁部材の角部の部分拡大図であって、図４（Ａ）及び図４（Ｃ）は、熱膨張前の状態を示す図であり、図４（Ｂ）及び図４（Ｄ）は、熱膨張後の状態を示す図である。It is the elements on larger scale of the corner | angular part of an insulating member, Comprising: FIG. 4 (A) and FIG.4 (C) are figures which show the state before thermal expansion, FIG.4 (B) and FIG.4 (D) It is a figure which shows the state after thermal expansion. 本発明の実施の形態に係る絶縁部材の変形例の要部を示す図であって、図５（Ａ）は、第１の変形例の要部を示す図、図５（Ｂ）は、第２の変形例の要部を示す図である。FIG. 5A is a diagram showing a main part of a modification of the insulating member according to the embodiment of the present invention, FIG. 5A is a diagram showing a main part of the first modification, and FIG. It is a figure which shows the principal part of the modification of 2. 本発明の実施の形態に係る絶縁部材の変形例の要部を示す図であって、図６（Ａ）は、第３の変形例の要部を示す図、図６（Ｂ）は、第４の変形例の要部を示す図である。FIGS. 6A and 6B are diagrams showing a main part of a modified example of the insulating member according to the embodiment of the present invention, FIG. 6A is a diagram showing a main part of the third modified example, and FIG. It is a figure which shows the principal part of the modification of 4. 従来技術における絶縁部材の構成を示す図であり、図７（Ａ）は、絶縁部材全体の平面図、図７（Ｂ）は、絶縁部材の角部の部分拡大平面図、図７（Ｃ）は、絶縁部材の角部の部分拡大側面図である。It is a figure which shows the structure of the insulating member in a prior art, FIG. 7 (A) is a top view of the whole insulating member, FIG.7 (B) is a partial expanded plan view of the corner | angular part of an insulating member, FIG.7 (C). These are the partial expanded side views of the corner | angular part of an insulating member.

以下、本発明の実施の形態について図面を参照しながら詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

図１は、本発明の実施の形態に係る絶縁部材を備えた基板処理装置の概略構成を示す断面図である。この基板処理装置は、例えば、液晶表示装置（ＬＣＤ）製造用のガラス基板にプラズマエッチング処理を施すものである。   FIG. 1 is a cross-sectional view illustrating a schematic configuration of a substrate processing apparatus including an insulating member according to an embodiment of the present invention. This substrate processing apparatus, for example, performs a plasma etching process on a glass substrate for manufacturing a liquid crystal display device (LCD).

図１において、基板処理装置１０は、例えば１辺が数ｍの矩形のガラス基板Ｇ（以下、単に「基板」という。）を収容する処理室（チャンバ）１１を有し、該チャンバ１１内部の図中下方には基板Ｇを載置する載置台（サセプタ）１２が配置されている。サセプタ１２は、例えば、表面がアルマイト処理されたアルミニウムやステンレス等からなる基材１３で構成されており、基材１３は絶縁部材１４を介してチャンバ１１の内壁面である底部平面に支持されている。絶縁部材１４は、サセプタ１２とチャンバ１１の底部平面とを電気的に絶縁する。基材１３は断面凸型を呈しており、その上部平面は基板Ｇを載置する基板載置面１３ａとなっている。   In FIG. 1, a substrate processing apparatus 10 includes a processing chamber (chamber) 11 that accommodates a rectangular glass substrate G (hereinafter simply referred to as “substrate”) with a side of several meters, for example. A mounting table (susceptor) 12 on which the substrate G is mounted is disposed below the figure. The susceptor 12 is composed of a base material 13 made of, for example, aluminum or stainless steel whose surface is anodized, and the base material 13 is supported by a bottom plane that is an inner wall surface of the chamber 11 via an insulating member 14. Yes. The insulating member 14 electrically insulates the susceptor 12 from the bottom plane of the chamber 11. The base material 13 has a convex cross section, and the upper plane is a substrate placement surface 13a on which the substrate G is placed.

基板載置面１３ａの周囲を囲むようにシールドリング１５が設けられている。基材１３の上部は静電電極板１６を内蔵し、静電チャックとして機能する。静電電極板１６には直流電源１７が接続されており、静電電極板１６に正の直流電圧が印加されると、基板載置面１３ａに載置された基板Ｇにおける静電電極板１６側の面（以下、「裏面」という。）には負電荷が誘起され、これによって静電電極板１６及び基板Ｇの裏面の間に電界が生じ、該電界に起因するクーロン力又はジョンソン・ラーベック力により、基板Ｇが基板載置面１３ａに吸着保持される。   A shield ring 15 is provided so as to surround the periphery of the substrate placement surface 13a. The upper part of the base material 13 incorporates an electrostatic electrode plate 16 and functions as an electrostatic chuck. A DC power source 17 is connected to the electrostatic electrode plate 16, and when a positive DC voltage is applied to the electrostatic electrode plate 16, the electrostatic electrode plate 16 on the substrate G placed on the substrate placement surface 13a. A negative charge is induced on the side surface (hereinafter referred to as “rear surface”), whereby an electric field is generated between the electrostatic electrode plate 16 and the rear surface of the substrate G, and Coulomb force or Johnson Rabeck resulting from the electric field is generated. The substrate G is attracted and held on the substrate placement surface 13a by the force.

基材１３の内部には、基材１３及び基板載置面１３ａに載置された基板Ｇの温度を調節するための温度調節機構（図示省略）が設けられている。この温度調節機構に、例えば、冷却水やガルデン（登録商標）等の冷媒が循環供給され、該冷媒によって冷却された基材１３は基板Ｇを冷却する。   Inside the base material 13, a temperature adjustment mechanism (not shown) for adjusting the temperature of the base material 13 and the substrate G placed on the substrate placement surface 13a is provided. For example, coolant such as cooling water or Galden (registered trademark) is circulated and supplied to the temperature adjusting mechanism, and the base material 13 cooled by the coolant cools the substrate G.

基材１３の周囲には、シールドリング１５と基材１３との当接部を含む側面を覆うサイドシールド部材としての絶縁リング１８が配置されている。絶縁リング１８は絶縁性のセラミックス、例えばアルミナで構成されている。   Around the base material 13, an insulating ring 18 is disposed as a side shield member that covers a side surface including a contact portion between the shield ring 15 and the base material 13. The insulating ring 18 is made of an insulating ceramic such as alumina.

チャンバ１１の底部平面、絶縁部材１４で囲まれた空間部及び基材１３を貫通する貫通孔に、昇降ピン２１が昇降可能に挿通されている。昇降ピン２１は基板載置面１３ａに載置される基板Ｇの搬入及び搬出時に作動するものであり、基板Ｇをチャンバ１１内に搬入する際又はチャンバ１１から搬出する際には、サセプタ１２の上方の搬送位置まで上昇し、それ以外のときには基板載置面１３ａ内に埋設状態で収容されている。   An elevating pin 21 is inserted through the bottom plane of the chamber 11, a space surrounded by the insulating member 14, and a through hole penetrating the base material 13 so as to be movable up and down. The elevating pins 21 operate when the substrate G placed on the substrate placement surface 13a is carried in and out, and when the substrate G is carried into or out of the chamber 11, the susceptor 12 is moved. The substrate moves up to the upper transfer position, and is otherwise housed in the substrate placement surface 13a.

基板載置面１３ａには、図示省略した複数の伝熱ガス供給孔が開口している。複数の伝熱ガス供給孔は伝熱ガス供給部に接続され、伝熱ガス供給部から伝熱ガスとして、例えばヘリウム（Ｈｅ）ガスが基板載置面１３ａ及び基板Ｇの裏面の間隙に供給される。基板載置面１３ａ及び基板Ｇの裏面の間隙に供給されたヘリウムガスは基板Ｇとサセプタ１２の間で効果的に熱の伝達を行い、例えば、基板Ｇの熱をサセプタ１２に抜熱して効果的に基板Ｇの冷却を行うことができる。   A plurality of heat transfer gas supply holes (not shown) are opened in the substrate mounting surface 13a. The plurality of heat transfer gas supply holes are connected to the heat transfer gas supply unit, and for example, helium (He) gas is supplied from the heat transfer gas supply unit to the gap between the substrate mounting surface 13a and the back surface of the substrate G. The The helium gas supplied to the gap between the substrate mounting surface 13a and the back surface of the substrate G effectively transfers heat between the substrate G and the susceptor 12. For example, the heat of the substrate G is extracted to the susceptor 12 to be effective. In particular, the substrate G can be cooled.

サセプタ１２の基材１３には、高周波電力を供給するための高周波電源２３が整合器２４を介して接続されている。高周波電源２３からは、例えば１３．５６ＭＨｚの高周波電力（ＲＦ）が印加され、サセプタ１２は下部電極として機能する。整合器２４は、サセプタ１２からの高周波電力の反射を低減して高周波電力のサセプタ１２への印加効率を最大にする。   A high frequency power source 23 for supplying high frequency power is connected to the base material 13 of the susceptor 12 via a matching unit 24. A high frequency power (RF) of 13.56 MHz, for example, is applied from the high frequency power supply 23, and the susceptor 12 functions as a lower electrode. The matching unit 24 reduces the reflection of the high frequency power from the susceptor 12 to maximize the application efficiency of the high frequency power to the susceptor 12.

基板処理装置１０では、チャンバ１１の内部側壁とサセプタ１２の側面とによって側方排気路２６が形成される。この側方排気路２６は排気管２７を介して排気装置２８に接続されている。排気装置２８としてのＴＭＰ（Turbo Molecular Pump）及びＤＰ（Dry Pump）若しくはＭＢＰ（Mechanical Booster Pump）（ともに図示省略）はチャンバ１１内を真空引きして減圧する。具体的には、ＤＰ若しくはＭＢＰはチャンバ１１内を大気圧から中真空状態（例えば、１．３×１０Ｐａ（０．１Ｔｏｒｒ）以下）まで減圧し、ＴＭＰはＤＰ若しくはＭＢＰと協働してチャンバ１１内を中真空状態より低い圧力である高真空状態（例えば、１．３×１０−３Ｐａ（１．０×１０−５Ｔｏｒｒ）以下）まで減圧する。なお、チャンバ１１内の圧力はＡＰＣバルブ（図示省略）によって制御される。 In the substrate processing apparatus 10, a side exhaust path 26 is formed by the inner side wall of the chamber 11 and the side surface of the susceptor 12. The side exhaust path 26 is connected to an exhaust device 28 via an exhaust pipe 27. TMP (Turbo Molecular Pump) and DP (Dry Pump) or MBP (Mechanical Booster Pump) (both not shown) as the exhaust device 28 are evacuated to reduce the pressure inside the chamber 11. Specifically, DP or MBP depressurizes the inside of the chamber 11 from atmospheric pressure to a medium vacuum state (for example, 1.3 × 10 Pa (0.1 Torr or less)), and TMP cooperates with DP or MBP to chamber 11. The inside is depressurized to a high vacuum state (for example, 1.3 × 10 −3 Pa (1.0 × 10 −5 Torr or less)) that is lower than the medium vacuum state. The pressure in the chamber 11 is controlled by an APC valve (not shown).

チャンバ１１の天井部分には、サセプタ１２と対向するようにシャワーヘッド３０が配置されている。シャワーヘッド３０は内部空間３１を有するとともに、サセプタ１２との間の処理空間Ｓに処理ガスを吐出する複数のガス孔３２を有する。シャワーヘッド３０は接地されており、下部電極として機能するサセプタ１２と共に一対の平行平板電極を構成している。   A shower head 30 is disposed on the ceiling portion of the chamber 11 so as to face the susceptor 12. The shower head 30 has an internal space 31 and a plurality of gas holes 32 for discharging a processing gas into the processing space S between the shower head 30 and the susceptor 12. The shower head 30 is grounded and constitutes a pair of parallel plate electrodes together with the susceptor 12 functioning as a lower electrode.

シャワーヘッド３０は、ガス供給管３６を介して処理ガス供給源３９に接続されている。ガス供給管３６には、開閉バルブ３７及びマスフローコントローラ３８が設けられている。また、処理チャンバ１１の側壁には基板搬入出口３４が設けられており、この基板搬入出口３４はゲートバルブ３５により開閉可能となっている。そして、このゲートバルブ３５を介して処理対象である基板Ｇがチャンバ１１に搬入出される。   The shower head 30 is connected to a processing gas supply source 39 via a gas supply pipe 36. The gas supply pipe 36 is provided with an open / close valve 37 and a mass flow controller 38. A substrate loading / unloading port 34 is provided on the side wall of the processing chamber 11, and the substrate loading / unloading port 34 can be opened and closed by a gate valve 35. Then, the substrate G to be processed is carried into and out of the chamber 11 through the gate valve 35.

基板処理装置１０では、処理ガス供給源３９から処理ガス導入管３６を介して処理ガスが供給される。供給された処理ガスは、シャワーヘッド３０の内部空間３１及びガス孔３２を介してチャンバ１１の処理空間Ｓへ導入される。導入された処理ガスは、高周波電源２３からサセプタ１２を介して処理空間Ｓへ印加されたプラズマ生成用の高周波電力（ＲＦ）によって励起されてプラズマとなる。プラズマ中のイオンは、基板Ｇに向かって引きこまれ、基板Ｇに対して所定のプラズマエッチング処理を施す。   In the substrate processing apparatus 10, the processing gas is supplied from the processing gas supply source 39 through the processing gas introduction pipe 36. The supplied processing gas is introduced into the processing space S of the chamber 11 through the internal space 31 and the gas hole 32 of the shower head 30. The introduced processing gas is excited into plasma by high-frequency power (RF) for plasma generation applied to the processing space S from the high-frequency power source 23 via the susceptor 12. Ions in the plasma are attracted toward the substrate G, and the substrate G is subjected to a predetermined plasma etching process.

基板処理装置１０の各構成部品の動作は、基板処理装置１０が備える制御部（図示省略）のＣＰＵがプラズマエッチング処理に対応するプログラムに応じて制御する。   The operation of each component of the substrate processing apparatus 10 is controlled by a CPU of a control unit (not shown) provided in the substrate processing apparatus 10 according to a program corresponding to the plasma etching process.

図２は、本発明の実施の形態に係る絶縁部材の構成を示す平面図である。   FIG. 2 is a plan view showing the configuration of the insulating member according to the embodiment of the present invention.

図２において、絶縁部材１４は、内側部材４１と、外側部材４２と、該内側部材４１及び外側部材４２の間に挟持されるように配置された環状のシール部材（以下、「Ｏリング」という。）４３とから主として構成されている。   In FIG. 2, the insulating member 14 includes an inner member 41, an outer member 42, and an annular seal member (hereinafter referred to as an “O-ring”) disposed so as to be sandwiched between the inner member 41 and the outer member 42. .) 43.

外部部材４２は、矩形のサセプタ１２の各辺に対応して配置された４つの長尺状物からなる矩形を呈しており、対向する２つの短辺を形成する長尺状物４４、４５と、対向する２つの長辺を形成する長尺状物４６、４７との組合せ体で構成されている。長尺状物４４の固定端４４ａの端面は、隣接する他の長尺状物４６の長さ方向の端部（自由端）４６ｂの側面に当接し、他端である移動端４４ｂの側面が、隣接する他の長尺状物４６とは異なる隣接する別の長尺状物４７の端部（固定端）４７ａの端面に当接するように配置されている。長尺状物４５及び４７は、それぞれ内部部材４１で囲まれた空間部である大気領域５０の中心点Ｃに対して長尺状物４４及び４６と点対象となるように組み合わされている。   The external member 42 has a rectangular shape composed of four long objects arranged corresponding to the respective sides of the rectangular susceptor 12, and has long objects 44 and 45 that form two opposing short sides; It is composed of a combination of long objects 46 and 47 that form two opposing long sides. The end surface of the fixed end 44a of the long object 44 is in contact with the side surface of the end (free end) 46b in the length direction of another adjacent long object 46, and the side surface of the moving end 44b, which is the other end, is in contact. These are arranged so as to come into contact with the end surface of the end (fixed end) 47a of another adjacent long object 47 different from the other adjacent long object 46. The long objects 45 and 47 are combined with the long objects 44 and 46 so as to be point targets with respect to the center point C of the atmospheric region 50 which is a space surrounded by the internal member 41.

長尺状物４４〜４７は、その長さ方向の一端である固定端に設けられた固定用のねじ孔４８と、該固定用のねじ孔４８とは長尺状物の長さ方向に離間して設けられた支持用のねじ孔４９を有する。固定端４４ａ〜４７ａはそれぞれ固定用のねじ孔４８に装着された固定ねじ（図示省略）によってチャンバ１１の底部平面に固定されている。一方、自由端４４ｂ〜４７ｂは、支持用のねじ孔４９を貫通する支持ねじ（図示省略）によって、チャンバ１１の底部平面に対して長尺状物の長さ方向に沿って変位自在に支持されている。これによって、各長尺状物４４〜４７は固定端４４ａ〜４７ａを起点にして長尺状物の長さ方向に沿って熱膨張又は熱収縮可能に支持されている。   The long objects 44 to 47 are fixed in the fixing end which is one end in the length direction, and the fixing screw holes 48 are separated from each other in the length direction of the long object. The support screw hole 49 is provided. The fixed ends 44 a to 47 a are fixed to the bottom plane of the chamber 11 by fixing screws (not shown) mounted in the fixing screw holes 48, respectively. On the other hand, the free ends 44b to 47b are supported by a support screw (not shown) penetrating the support screw hole 49 so as to be displaceable along the length of the long object with respect to the bottom plane of the chamber 11. ing. As a result, each of the long objects 44 to 47 is supported so as to be capable of thermal expansion or contraction along the length direction of the long object starting from the fixed ends 44a to 47a.

固定用のねじ孔４８は長尺状物の固定端４４ａ〜４７ａをチャンバ１１の底部平面に固定するためのものであり、ねじ孔に垂直な断面において遊びが少ない真円形に形成されている。一方、支持用のねじ孔４９は、固定端４４ａ〜４７ａに対向する他端である自由端４４ｂ〜４７ｂを、固定端を起点として変位自在に支持するものであり、ねじ孔に垂直な断面において長尺状物の長さ方向に長い楕円形若しくは両端が半円となる矩形に形成されている。   The fixing screw hole 48 is for fixing the fixed ends 44a to 47a of the long object to the bottom plane of the chamber 11, and is formed in a true circle with little play in a cross section perpendicular to the screw hole. On the other hand, the supporting screw hole 49 supports the free ends 44b to 47b, which are the other ends facing the fixed ends 44a to 47a, so as to be displaceable from the fixed end, and in a cross section perpendicular to the screw holes. It is formed in an ellipse that is long in the length direction of the long object or a rectangle that is semicircular at both ends.

支持用のねじ孔４９は少なくとも１つ設けられるが、長尺状物４４〜４７の長さに応じて２つ又はそれ以上設けることもできる。このとき各支持用のねじ孔４９は、例えば等間隔に設けることが好ましい。支持用のねじ孔４９の長径は、各長尺状物４４〜４７が熱膨張しても、支持用のねじ孔４９に装着された支持ねじが長尺状物の熱膨張を規制しない程度の長さを有するものとし、長径の長さは、例えば、第８世代と呼ばれるＦＰＤ用ガラス基板を処理する際には、１６ｍｍ〜２０ｍｍであることが好ましいが、処理するガラス基板のサイズに応じて設定される。   At least one screw hole 49 for support is provided, but two or more screw holes 49 may be provided according to the length of the long objects 44 to 47. At this time, it is preferable to provide the screw holes 49 for support at regular intervals, for example. The major diameter of the support screw hole 49 is such that the support screw mounted in the support screw hole 49 does not restrict the thermal expansion of the long object even if each of the long objects 44 to 47 is thermally expanded. For example, when processing a glass substrate for FPD called 8th generation, the length of the major axis is preferably 16 mm to 20 mm, depending on the size of the glass substrate to be processed. Is set.

固定用のねじ孔４８に装着される固定ねじの締め付けトルクは、支持用のねじ孔４９に装着される支持ねじの締め付けトルクよりも大きくすることが好ましい。これによって、長尺状物４４〜４７の固定端４４ａ〜４７ａを確実に固定し、また、自由端４４ｂ〜４７ｂを緩く支持して熱膨張時又は熱収縮時のその変位を確保することができる。   The tightening torque of the fixing screw attached to the fixing screw hole 48 is preferably larger than the tightening torque of the support screw attached to the supporting screw hole 49. As a result, the fixed ends 44a to 47a of the long objects 44 to 47 can be securely fixed, and the free ends 44b to 47b can be loosely supported to ensure displacement during thermal expansion or thermal contraction. .

固定ねじの締め付けトルクは、例えば１５〜２０ｋｇｆ・ｃｍ（１．５〜２．０Ｎ・ｍ）程度であり、支持ねじの締め付けトルクは、固定ねじの締め付けトルクよりも若干小さく、例えば１０〜１５ｋｇｆ・ｃｍ（１．０〜１．５Ｎ・ｍ）程度である。ただし、膨張による延び量を制限する必要がある場合などにおいては、これらのトルクを、長尺状物が破損しない程度の範囲内でより強く締め、長尺状物の変位を制約することも可能である。   The tightening torque of the fixing screw is, for example, about 15 to 20 kgf · cm (1.5 to 2.0 N · m), and the tightening torque of the support screw is slightly smaller than the tightening torque of the fixing screw, for example, 10 to 15 kgf · cm. It is about cm (1.0 to 1.5 N · m). However, when it is necessary to limit the amount of extension due to expansion, it is also possible to restrict the displacement of the long object by tightening these torques more strongly within a range that does not damage the long object. It is.

長尺状物４４〜４７相互の当接部の内側面は曲面を呈しており、各長尺状物４４〜４７の一端の側面には曲面を形成する突出部４４ｃ〜４７ｃが設けられている。これによって、外側部材４２と後述する内側部材４１とでＯリング４３の全周を確実に支持することができ、Ｏリング４３によるチャンバ１１内部の真空領域と内部部材４１で囲まれた大気領域５０とを確実に区画することができる。   The inner surfaces of the abutting portions of the long objects 44 to 47 are curved, and protrusions 44c to 47c that form curved surfaces are provided on the side surfaces of one end of each of the long objects 44 to 47. . Accordingly, the entire circumference of the O-ring 43 can be reliably supported by the outer member 42 and the inner member 41 described later, and the atmosphere region 50 surrounded by the vacuum region inside the chamber 11 by the O-ring 43 and the inner member 41. Can be reliably partitioned.

なお、長尺状物４４〜４７相互の当接部の内側面は実質的に直角の角部であってもよく、この場合、長尺状物４４〜４７として、突起部を有さない矩形の外形を有するものが適用される。   The inner side surfaces of the contact portions of the long objects 44 to 47 may be substantially perpendicular corners. In this case, as the long objects 44 to 47, a rectangular shape having no protrusions. The one having the outer shape is applied.

外側部材４２は、Ｏリング４３の長さ方向に直交する断面においてＯリング４３の外側面側にのみ存在する（図２及び図３参照）。すなわち、各長尺状物４４〜４７はＯリング４３を挟んだり、収容することがなく、Ｏリング４３を拘束しない。これによって、後述の図４に示すように、外部部材を構成する各長尺状物４４〜４７が加熱され、その自由端４４ｂ〜４７ｂがその長さ方向に沿って変位したとしても、長尺状物４４〜４７がＯリング４３をねじることがなく、チャンバ内の真空領域と大気領域５０とを安定に区画する。また、Ｏリング４３はねじられないので、Ｏリング４３の損傷、磨耗、劣化などを防止することができる。   The outer member 42 exists only on the outer surface side of the O-ring 43 in a cross section orthogonal to the length direction of the O-ring 43 (see FIGS. 2 and 3). That is, the long objects 44 to 47 do not sandwich or house the O-ring 43 and do not restrain the O-ring 43. As a result, as shown in FIG. 4 to be described later, even when the long objects 44 to 47 constituting the external member are heated and the free ends 44b to 47b are displaced along the length direction, the long objects 44 to 47 are long. The shapes 44 to 47 do not twist the O-ring 43 and stably partition the vacuum region and the atmospheric region 50 in the chamber. Further, since the O-ring 43 is not twisted, damage, wear, deterioration, etc. of the O-ring 43 can be prevented.

図３は、図２の絶縁部材を図１の基板処理装置に組み込んだ状態における要部を示す断面図である。   3 is a cross-sectional view showing a main part in a state in which the insulating member of FIG. 2 is incorporated in the substrate processing apparatus of FIG.

図３において、Ｏリング４３の長さ方向に直交する断面形状（以下、単に「断面形状」という。）の高さは、外部部材４２及び内部部材４１の高さ寸法よりも若干大きい。Ｏリング４３の断面形状における上下端はそれぞれそれ以外の部分よりも太くなっており、且つその一部である下方端は、チャンバ１１の底部平面５１に設けられた凹部に嵌合し、これによって安定に支持、固定されている。Ｏリング４３の断面形状における上方端は、サセプタ１２を形成する基材１３の下側面に当接しており、これによってチャンバ１１内の処理空間Ｓとしての真空領域と内部部材４１で囲まれた大気領域５０とを確実に区画して真空領域の真空度を維持している。   In FIG. 3, the height of the cross-sectional shape orthogonal to the length direction of the O-ring 43 (hereinafter simply referred to as “cross-sectional shape”) is slightly larger than the height dimension of the external member 42 and the internal member 41. The upper and lower ends of the cross-sectional shape of the O-ring 43 are thicker than the other portions, and the lower end, which is a part of the O-ring 43, is fitted into a recess provided in the bottom flat surface 51 of the chamber 11, thereby Stablely supported and fixed. The upper end in the cross-sectional shape of the O-ring 43 is in contact with the lower surface of the base material 13 forming the susceptor 12, and thereby the atmosphere surrounded by the vacuum region as the processing space S in the chamber 11 and the internal member 41. The degree of vacuum in the vacuum region is maintained by reliably partitioning the region 50.

内部部材４１は、複数に分割された構成部材の組合せ体で構成されており、各構成部材相互間には、熱膨張による変位を吸収するための隙間４１ａが形成されている。内部部材４１を平面視した際に内部部材４１の矩形の角部に相当する構成部材は、その外側面がＯリング４３の内側面を均等に支持できるような曲面を有するＬ字状の分割部材で構成されている。   The internal member 41 is composed of a combination of constituent members divided into a plurality of parts, and a gap 41a for absorbing displacement due to thermal expansion is formed between the constituent members. The structural member corresponding to the rectangular corner of the internal member 41 when the internal member 41 is viewed in plan is an L-shaped divided member having a curved surface whose outer surface can uniformly support the inner surface of the O-ring 43. It consists of

このような構成の絶縁部材１４を組み込んだ図１の基板処理装置１０を用い、基板Ｇにプラズマエッチング処理を施す際、処理目的に応じて加熱される下部電極からの伝熱等によって絶縁部材１４は加熱され、熱膨張する。   When the substrate processing apparatus 10 of FIG. 1 incorporating the insulating member 14 having such a configuration is used and the substrate G is subjected to plasma etching, the insulating member 14 is transferred by heat transfer from the lower electrode heated according to the processing purpose. Is heated and expands thermally.

図４は、絶縁部材の角部の部分拡大図であって、図４（Ａ）及び図４（Ｃ）は、熱膨張前の状態を示す図であり、図４（Ｂ）及び図４（Ｄ）は、熱膨張後の状態を示す図である。   FIG. 4 is a partially enlarged view of a corner portion of the insulating member. FIGS. 4A and 4C are views showing a state before thermal expansion, and FIG. 4B and FIG. (D) is a figure which shows the state after thermal expansion.

図４（Ａ）において、長尺状物４４の自由端４４ｂは、隣接する長尺状物４７の固定端４７ａの側面よりも所定幅だけ引っ込んでいる。一方、熱膨張後の状態を示す図４（Ｂ）において、長尺状物４４は固定端４４ａ（図示省略）を起点としてその長さ方向に延伸し、これによって自由端４４ｂは変位しており、自由端４４ｂの端面は隣接する長尺状物４７の固定端４７ａの側面と、いわゆる面一になっている。   In FIG. 4A, the free end 44 b of the long object 44 is retracted by a predetermined width from the side surface of the fixed end 47 a of the adjacent long object 47. On the other hand, in FIG. 4B showing the state after thermal expansion, the long object 44 extends in the length direction from a fixed end 44a (not shown), and the free end 44b is displaced thereby. The end surface of the free end 44b is so-called flush with the side surface of the fixed end 47a of the adjacent long object 47.

本実施の形態によれば、外側部材４２を構成する各長尺状物４４〜４７の長さ方向の一端である固定端の端面が、隣接する他の長尺状物の長さ方向の自由端の側面に当接し、他端である自由端の側面が、隣接する他の長尺状物とは異なる隣接する別の長尺状物の長さ方向の一端である固定端の端面に当接するようにそれぞれ隙間なく組合せられ、且つ各長尺状物４４〜４７の固定端４４ａ〜４７ａを固定用のねじ孔４８に装着される固定ねじによって確実に固定し、他端である自由端４４ｂ〜４７ｂを支持用のねじ孔４９に装着される支持ねじによって熱膨張又は熱収縮方向に変位可能に支持するようにしたので、自由端４４ｂ〜４７ｂの移動方向に他の長尺状物が存在せず、これによって、長尺状物４４〜４７が熱膨張しても長尺状物相互間に相手を押圧する力及び隙間が発生することがない。従って、外側部材４２の内部に配置されたＯリング４３へのプラズマの進入を阻止し、プラズマが照射されることによるＯリング４３の劣化を防止することができる。   According to the present embodiment, the end face of the fixed end, which is one end in the length direction of each of the long objects 44 to 47 constituting the outer member 42, is free in the length direction of other adjacent long objects. The side surface of the free end, which is the other end, abuts the side surface of the end, and the end surface of the fixed end that is one end in the length direction of another adjacent long object different from the other adjacent long object. The fixed ends 44a to 47a of the long objects 44 to 47 are securely fixed by the fixing screws mounted in the fixing screw holes 48, and the other ends are free ends 44b. ˜47b is supported by a support screw mounted in the support screw hole 49 so as to be displaceable in the direction of thermal expansion or contraction, so that there is another long object in the moving direction of the free ends 44b to 47b. Without this, even if the long objects 44 to 47 are thermally expanded, the long objects The Power and the gap to press is not able to generate an opponent. Accordingly, it is possible to prevent the plasma from entering the O-ring 43 disposed inside the outer member 42 and to prevent the O-ring 43 from being deteriorated due to the plasma irradiation.

また、本実施の形態によれば、外側部材４２を長尺状物４４〜４７の組合せ体で構成したので、各長尺状物４４〜４７の形状を、例えば略短冊状の簡易形状とすることができ、これによって、長尺状物４４〜４７及び外側部材４２、ひいては絶縁部材１４の製作コストを削減することができる。   Moreover, according to this Embodiment, since the outer member 42 was comprised with the combination body of the elongate objects 44-47, the shape of each elongate object 44-47 is made into a substantially strip-shaped simple shape, for example. This can reduce the manufacturing cost of the long objects 44 to 47 and the outer member 42 and thus the insulating member 14.

本実施の形態において、長尺状物４４の自由端４４ｂは、隣接する長尺状物４７の固定端４７ａの外側面よりも該長尺状物４４の熱膨張による延伸幅に相当する長さ分だけ引っ込んだ状態となるように長尺状物４４の長さを選定しておくことが好ましい。これによって、長尺状物４４が熱膨張によってその長さ方向に延伸したとしても、その自由端４４ｂが隣接する長尺状物４７の固定端４７ａの外側面から突出することがなく、他のチャンバ内構成部品への衝突を回避することができる。   In the present embodiment, the free end 44b of the long object 44 is longer than the outer surface of the fixed end 47a of the adjacent long object 47 by a length corresponding to the stretching width due to the thermal expansion of the long object 44. It is preferable to select the length of the long object 44 so as to be in a retracted state. As a result, even if the long object 44 extends in the length direction due to thermal expansion, the free end 44b does not protrude from the outer surface of the fixed end 47a of the adjacent long object 47. Collisions with the components in the chamber can be avoided.

なお、長尺状物４４の自由端４４ｂの端部を、図４（Ｃ）に示すようにあらかじめ隣接する長尺状物４７の固定端４７ａの外側面とツライチにし、熱膨張時には図４（Ｄ）に示すように固定端４７ａの側面から突出するようにしておき、隣接する別のチャンバ内部品に、長尺状物４４の熱膨張による延伸幅に相当する幅を有する凹部を設け、これによって当該隣接する別のチャンバ内部品と長尺状物４４との衝突を避けるようにしてもよい。   As shown in FIG. 4C, the end of the free end 44b of the long object 44 is preliminarily formed with the outer surface of the fixed end 47a of the adjacent long object 47, and the thermal expansion shown in FIG. As shown in FIG. D), the projection is protruded from the side surface of the fixed end 47a, and a concave portion having a width corresponding to the extending width due to the thermal expansion of the long object 44 is provided in another adjacent chamber part. Thus, the collision between the adjacent parts in the chamber and the elongated object 44 may be avoided.

本実施の形態において、長尺状物４４の熱膨張によって、図４（Ｂ）に示したように、該長尺状物４４とＯリング４３との間に隙間５２が生じるが、長尺状物４４の自由端４４ｂの側面と長尺状物４７の固定端４７ａの端面との当接状態は確保されるので、プラズマの進入によってＯリング４３の劣化が生じることはない。   In the present embodiment, the thermal expansion of the long object 44 causes a gap 52 between the long object 44 and the O-ring 43 as shown in FIG. Since the contact state between the side surface of the free end 44b of the object 44 and the end surface of the fixed end 47a of the long object 47 is ensured, the O-ring 43 is not deteriorated by the entrance of plasma.

本実施の形態において、外側部材４１を構成する長尺状物４４〜４７は、絶縁性材料、例えばポリテトラフルオロエチレン（商品名：テフロン(登録商標)）等で構成される。   In the present embodiment, the long objects 44 to 47 constituting the outer member 41 are made of an insulating material such as polytetrafluoroethylene (trade name: Teflon (registered trademark)).

本実施の形態において、長尺状物４４〜４７における固定用のねじ孔４８は、該長尺状物４４〜４７の固定端４４ａ〜４７ａの端面に極力近い位置にあることが好ましく、固定端の端部から、例えば、３０〜４０ｍｍの位置に設けられる。固定用のねじ孔４８と固定端の端面との間隔が数百ｍｍ以上となると、その部分の熱膨張が無視できなくなり、各長尺状物の固定端と、該固定端に当接する他のリング構成部品との接合面に歪みが発生する虞がある。   In the present embodiment, the fixing screw holes 48 in the long objects 44 to 47 are preferably located as close as possible to the end surfaces of the fixed ends 44 a to 47 a of the long objects 44 to 47. For example, it is provided in the position of 30-40 mm from the edge part. When the interval between the fixing screw hole 48 and the end face of the fixed end is several hundred mm or more, the thermal expansion of that portion can not be ignored, and the fixed end of each long object and the other end contacting the fixed end There is a risk of distortion occurring at the joint surface with the ring component.

本実施の形態において、Ｏリング４３は、耐熱性の弾性部材、例えばバイトン等で構成されている。   In the present embodiment, the O-ring 43 is composed of a heat-resistant elastic member such as Viton.

次に、本実施の形態の変形例について説明する。   Next, a modification of the present embodiment will be described.

図５は、本発明の実施の形態に係る絶縁部材の変形例の要部を示す図であって、図５（Ａ）は、第１の変形例の要部を示す図、図５（Ｂ）は、第２の変形例の要部を示す図である。   FIG. 5 is a diagram showing a main part of a modification of the insulating member according to the embodiment of the present invention, and FIG. 5A is a diagram showing a main part of the first modification, and FIG. ) Is a diagram showing a main part of a second modification.

図５（Ａ）及び図５（Ｂ）において、この絶縁部材１４ａ及び１４ｂは、長尺状物の長さ方向の一端の端面と、該長尺状物に隣接する他の長尺状物の長さ方向の一端の側面との当接部に、プラズマの進入を阻止する段差構造の組合せ部を設けたものである。   5 (A) and 5 (B), the insulating members 14a and 14b are formed by the end face of one end in the length direction of the long object and other long objects adjacent to the long object. A stepped structure combination portion for preventing the entrance of plasma is provided at a contact portion with a side surface at one end in the length direction.

図５（Ａ）において、長尺状物５７の長さ方向の一端である固定端５７ａの端面と、該長尺状物５７に隣接する他の長尺状物５４の長さ方向の一端である自由端５４ｂの側面との当接部に、プラズマの進入を阻止するラビリンス状の段差構造が設けられている。長尺状物５４の自由端５４ｂは、長尺状物５７の固定端５７ａの側面よりも長尺状物４４の熱膨張による延伸幅に相当する長さ、例えば１０〜２０ｍｍだけ引っ込んだ状態の長さに調整されている。   In FIG. 5A, at the end surface of the fixed end 57a which is one end of the long object 57 in the length direction and one end of the other long object 54 adjacent to the long object 57 in the length direction. A labyrinth-shaped step structure for preventing the entrance of plasma is provided at a contact portion with a side surface of a certain free end 54b. The free end 54b of the long object 54 is retracted by a length corresponding to the stretching width due to the thermal expansion of the long object 44, for example, 10-20 mm, from the side surface of the fixed end 57a of the long object 57. The length is adjusted.

なお、前述の本実施形態の場合と同様に、図５（Ｂ）に示したように、長尺状物５４の自由端５４ｂの端面と長尺状物５７の固定端５７ａの側面をツライチにしておき、隣接する別のチャンバ内部品に長尺状物５４の熱膨張による延伸幅に相当する幅を有する凹部を設け、これによって当該隣接する別のチャンバ内部品と長尺状物５４との衝突を避けるようにしても良い。   As in the case of the above-described embodiment, as shown in FIG. 5B, the end surface of the free end 54b of the long object 54 and the side surface of the fixed end 57a of the long object 57 are made to be plied. In addition, a concave portion having a width corresponding to the extending width due to the thermal expansion of the elongated object 54 is provided in another adjacent chamber part, and thereby, the adjacent another in-chamber part and the elongated object 54 are provided. You may try to avoid a collision.

本実施の形態の第１の変形例によれば、長尺状物５７の固定端５７ａの端面と、該長尺状物５７に隣接する他の長尺状物５４の自由端５４ｂの側面との当接部に段差構造の組合せ部を設けたので、絶縁部材１４の上部に配置された下部電極（図示省略）から絶縁部材１４の下部に配置され且つグラウンドに接続されたチャンバ１１の底部平面（図示省略）へ至る経路の長さを十分確保することができ、これによって、下部電極とチャンバ１１の底部平面との間における短絡的な放電を回避して当接部におけるプラズマの発生を抑制することができ、ひいては、Ｏリング４３の劣化及び近傍のチャンバ内部品の摩耗を防止することができる。   According to the first modification of the present embodiment, the end surface of the fixed end 57 a of the long object 57 and the side surface of the free end 54 b of the other long object 54 adjacent to the long object 57 Since the combination portion of the step structure is provided in the contact portion of the chamber 11, the bottom plane of the chamber 11 is arranged from the lower electrode (not shown) arranged on the insulating member 14 to the lower portion of the insulating member 14 and connected to the ground. A sufficient length of the path to (not shown) can be ensured, thereby preventing a short-circuit discharge between the lower electrode and the bottom plane of the chamber 11 and suppressing plasma generation at the contact portion. As a result, it is possible to prevent the O-ring 43 from being deteriorated and the nearby chamber components from being worn.

また、本実施の形態の第１の変形例によれば、各長尺状物の当接部に段差構造の組合せ部を設けたので、各長尺状物の当接部からのプラズマの進入がより有効に阻止され、その内部に配置されたＯリングの劣化をより確実に防止することができる。なお、本実施の形態の第１変形例においては、外側部材４２の外側面にはサイドシールド部材１８（図１参照）が配設されており、これによって絶縁部材１４の側面からのプラズマの進入が阻止されている。   Further, according to the first modification of the present embodiment, the stepped structure combination portion is provided at the contact portion of each long object, so that plasma enters from the contact portion of each long object. Can be more effectively prevented, and the deterioration of the O-ring disposed therein can be more reliably prevented. In the first modification of the present embodiment, the side shield member 18 (see FIG. 1) is disposed on the outer surface of the outer member 42, and thereby plasma enters from the side surface of the insulating member 14. Is blocked.

図６は、本発明の実施の形態に係る絶縁部材の変形例の要部を示す図であって、図６（Ａ）は、第３の変形例の要部を示す図、図６（Ｂ）は、第４の変形例の要部を示す図である。   FIG. 6 is a diagram showing a main part of a modification of the insulating member according to the embodiment of the present invention, and FIG. 6A is a diagram showing a main part of the third modification, and FIG. ) Is a diagram showing a main part of a fourth modified example.

図６（Ａ）及び図６（Ｂ）において、この絶縁部材１４ｃ及び１４ｄが、図５の絶縁部材１４ａ及び１４ｂと異なる点は、長尺状物の長さ方向の一端の端面と、該長尺状物に隣接する他の長尺状物の長さ方向の一端の側面との当接部に設けられた段差構造の一部を、長尺状物の一端の端面と、該長尺状物に隣接する他の長尺状物の一端の側面との当接部に形成された凹部に遊嵌された入れ子部材６０で構成した点である。   In FIGS. 6A and 6B, the insulating members 14c and 14d are different from the insulating members 14a and 14b in FIG. A part of the step structure provided at the abutting portion with the side surface of one end in the length direction of another long object adjacent to the long object is connected to the end surface of one end of the long object and the long shape. It is the point comprised with the nesting member 60 loosely fitted by the recessed part formed in the contact part with the side surface of the end of the other elongate thing adjacent to a thing.

図６（Ａ）において、長尺状物６７の固定端６７ａの端面、及び長尺状物６４の自由端６４ｂの側面には、それぞれ図中下方が四角柱状に削り取られた段差部が設けられている。これによって、長尺状物６７の固定端６７ａの端面と長尺状物６４の自由端６４ｂの側面との当接部には、段差部と段差部とで形成される凹部が形成される。そして、この凹部には、入れ子部材６０が遊嵌状に挿入され、段差構造の一部を形成している。   In FIG. 6 (A), a stepped portion is formed on the end surface of the fixed end 67a of the long object 67 and the side surface of the free end 64b of the long object 64, the lower part of which is scraped off into a quadrangular prism shape. ing. As a result, a recess formed by the stepped portion and the stepped portion is formed at the contact portion between the end surface of the fixed end 67 a of the long object 67 and the side surface of the free end 64 b of the long object 64. And in this recessed part, the nesting member 60 is inserted in loosely-fitting form, and forms a part of level | step difference structure.

入れ子部材６０と凹部との間には、熱膨張に起因して延伸する長尺状物６４の変位を吸収するための隙間６８が設けられている。入れ子部材６０が遊嵌状に挿入された外側部材４２の側面には、図示省略したサイドシールド部材１８（図１参照）が配置され、垂直方向からだけでなく、水平方向からのプラズマの進入も阻止されている。   A gap 68 is formed between the nesting member 60 and the recess to absorb the displacement of the elongated object 64 that extends due to thermal expansion. An unillustrated side shield member 18 (see FIG. 1) is disposed on the side surface of the outer member 42 into which the nesting member 60 is inserted in a loosely fitting manner, and plasma intrusion not only from the vertical direction but also from the horizontal direction. It is blocked.

本実施の形態の第３の変形例においても、第１及び第２の変形例と同様、絶縁部材１４の上部に配置された下部電極（図示省略）から絶縁部材１４の下部に配置され且つグラウンドに接続されたチャンバの底部平面へ至る経路の長さを十分確保することができ、これによって、下部電極とチャンバの底部平面との間における短絡的な放電を回避して当接部におけるプラズマの発生を抑制することができ、ひいては、Ｏリング４３の劣化及び近傍のチャンバ内部品の摩耗を防止することができる。   Also in the third modified example of the present embodiment, as in the first and second modified examples, the lower electrode (not shown) disposed on the insulating member 14 is disposed below the insulating member 14 and grounded. The length of the path leading to the bottom plane of the chamber connected to the chamber can be secured sufficiently, thereby avoiding a short-circuit discharge between the lower electrode and the bottom plane of the chamber and avoiding plasma in the contact portion. Generation | occurrence | production can be suppressed and by extension, degradation of the O-ring 43 and wear of the components in the vicinity of the chamber can be prevented.

また、本実施の形態の第３の変形例によれば、段差構造の一部を入れ子部材６０で構成することによって、長尺状物相互の当接部の構造が比較的単純な形状の部材により構成される。従って、各部材の製作が容易で、取り扱い時の破損の虞も少なくなる。   Further, according to the third modification of the present embodiment, a part of the step structure is constituted by the nesting member 60, so that the structure of the contact portion between the long objects is relatively simple. Consists of. Therefore, the manufacture of each member is easy, and the risk of damage during handling is reduced.

本実施の形態第３の変形例において、入れ子部材６０は、長尺状物６４、６７及びチャンバ１１の底部平面に固定されることなく、当該長尺状物相互間に形成される凹部に遊嵌した状態でチャンバ１１の底部平面に載置されていることが好ましい。   In the third modification of the present embodiment, the nesting member 60 is not fixed to the long planes 64 and 67 and the bottom plane of the chamber 11, but is allowed to play in the recess formed between the long sections. It is preferably placed on the bottom plane of the chamber 11 in a fitted state.

なお、前述の本実施形態の場合と同様に、図６（Ｂ）に示したように、長尺状物６４の自由端６４ｂの端面と長尺状物６７の固定端６７ａの側面をツライチにしておき、隣接する別のチャンバ内部品に長尺状物６４の熱膨張による延伸幅に相当する幅を有する凹部を設け、これによって当該隣接する別のチャンバ内部品と長尺状物６４との衝突を避けるようにしても良い。   As in the case of the above-described embodiment, as shown in FIG. 6B, the end surface of the free end 64b of the long object 64 and the side surface of the fixed end 67a of the long object 67 are made to be plied. In addition, a concave portion having a width corresponding to the extending width due to thermal expansion of the elongated object 64 is provided in another adjacent chamber part, and thereby, the adjacent another in-chamber part and the elongated object 64 are separated from each other. You may try to avoid a collision.

以上、本発明を実施の形態を用いて詳細に説明したが、本発明は、これらの実施の形態に限定されるものではない。   As mentioned above, although this invention was demonstrated in detail using embodiment, this invention is not limited to these embodiment.

上述した各実施の形態において、プラズマ処理が施される基板は、液晶ディスプレイ（ＬＣＤ）用のガラス基板だけでなく、エレクトロルミネセンス（Electro Luminescence ；EL）ディスプレイ、プラズマディスプレイパネル（ＰＤＰ）等をはじめとするＦＰＤ（Flat Panel Display）に用いる各種基板であってもよい。   In each of the embodiments described above, the substrate on which the plasma treatment is performed is not only a glass substrate for a liquid crystal display (LCD) but also an electroluminescence (EL) display, a plasma display panel (PDP), and the like. Various substrates used for FPD (Flat Panel Display) may be used.

また、上述の実施形態では、平行平板電極による容量結合型のプラズマ発生方式を用いた装置について説明したが、誘導結合型プラズマ発生方式など他のプラズマ発生方式による装置であっても、基板の載置台とシールドリング若しくはそれに相当する部材を有する装置であれば本発明を適用できることは言うまでもない。   In the above-described embodiment, the apparatus using the capacitively coupled plasma generation method using the parallel plate electrodes has been described. However, even if an apparatus using another plasma generation method such as an inductively coupled plasma generation method is used, the substrate is not mounted. Needless to say, the present invention can be applied to any apparatus having a table and a shield ring or a member corresponding thereto.

１０ 基板処理装置
１１ 処理室（チャンバ）
１２ 載置台（サセプタ）
１３ 基材
１４ 絶縁部材
４１ 内側部材
４２ 外側部材
４３ Ｏリング
４４〜４７ 長尺状物
４４ａ〜４７ａ 固定端
４４ｂ〜４７ｂ 自由端
４８ 固定用ねじ孔
４９ 支持用ねじ孔
５０ 大気領域
５１ 底部平面
Ｇ 基板 10 substrate processing apparatus 11 processing chamber (chamber)
12 Mounting table (susceptor)
13 Substrate 14 Insulating member 41 Inner member 42 Outer member 43 O-rings 44-47 Long objects 44a-47a Fixed end 44b-47b Free end 48 Fixing screw hole 49 Supporting screw hole 50 Atmospheric region 51 Bottom plane G Substrate

Claims (14)

矩形の基板にプラズマ処理を施す基板処理装置の処理室内で前記基板を載置する矩形の載置台と前記処理室の内壁面とを電気的に絶縁する絶縁部材であって、
内側部材と、外側部材と、該内側部材及び外側部材の間に配置され前記処理室内の真空領域と前記内側部材で囲まれた大気領域とを区画する環状のシール部材と、を有し、
前記外側部材は、
前記矩形の載置台の各辺に対応して配置された絶縁性の長尺状物の組合せ体からなり、
各長尺状物の長さ方向の一端の端面が、隣接する他の長尺状物の長さ方向の一端の側面に当接し、他端の側面が、前記隣接する他の長尺状物とは異なる隣接する別の長尺状物の長さ方向の一端の端面に当接するようにそれぞれ組合せられ、
前記各長尺状物の長さ方向の一端が固定用のねじ孔を介して前記処理室の内壁面に固定され、他端が少なくとも１つの支持用のねじ孔を介して変位自在に支持されて配列されていることを特徴とする絶縁部材。 An insulating member that electrically insulates a rectangular mounting table on which the substrate is mounted in a processing chamber of a substrate processing apparatus that performs plasma processing on a rectangular substrate, and an inner wall surface of the processing chamber,
An inner member, an outer member, and an annular seal member that is disposed between the inner member and the outer member and defines a vacuum region in the processing chamber and an atmospheric region surrounded by the inner member,
The outer member is
It consists of a combination of insulating long objects arranged corresponding to each side of the rectangular mounting table,
The end surface of one end in the length direction of each long object is in contact with the side surface of one end in the length direction of another adjacent long object, and the other side surface of the other end is in the adjacent other long object. Are respectively combined so as to come into contact with the end face of one end in the length direction of another adjacent elongated object different from
One end in the length direction of each of the long objects is fixed to the inner wall surface of the processing chamber via a fixing screw hole, and the other end is supported so as to be displaceable via at least one supporting screw hole. An insulating member characterized by being arranged. 前記各長尺状物は、前記固定された一端を起点にして前記長尺状物の長さ方向に沿って熱膨張又は熱収縮可能に配列されていることを特徴とする請求項１に記載の絶縁部材。   The said long objects are arranged so that thermal expansion or thermal contraction is possible along the length direction of the said long object from the said fixed end as a starting point. Insulation member. 前記固定用のねじ孔は、該固定用のねじ孔に垂直な断面において真円形であり、前記支持用のねじ孔は、該支持用のねじ孔に垂直な断面において前記長尺状物の長さ方向に長い楕円形若しくは両端が半円である矩形であることを特徴とする請求項１又は２記載の絶縁部材。   The fixing screw hole is perfectly circular in a cross section perpendicular to the fixing screw hole, and the supporting screw hole is a length of the elongated object in a cross section perpendicular to the supporting screw hole. The insulating member according to claim 1, wherein the insulating member is an ellipse that is long in the vertical direction or a rectangle that is semicircular at both ends. 前記固定用のねじ孔に装着される固定ねじの締め付けトルクを、前記支持用のねじ孔に装着される支持ねじの締め付けトルクよりも大きくしたことを特徴とする請求項３記載の絶縁部材。   The insulating member according to claim 3, wherein a tightening torque of a fixing screw attached to the fixing screw hole is larger than a tightening torque of a support screw attached to the supporting screw hole. 前記外側部材は、前記環状のシール部材の長さ方向に直交する断面において前記環状のシール部材の外側面側にのみに存在していることを特徴とする請求項１乃至４のいずれか１項に記載の絶縁部材。   The said outer member exists only in the outer surface side of the said annular seal member in the cross section orthogonal to the length direction of the said annular seal member, The any one of Claim 1 thru | or 4 characterized by the above-mentioned. The insulating member according to 1. 前記外側部材における前記長尺状物相互の当接部の内側面は曲面を呈しており、前記長尺状物の一端の側面に前記曲面を形成する突出部が設けられていることを特徴とする請求項１乃至５のいずれか１項に記載の絶縁部材。   The inner surface of the contact portion between the long objects in the outer member has a curved surface, and a protrusion that forms the curved surface is provided on a side surface of one end of the long object. The insulating member according to any one of claims 1 to 5. 前記外側部材における前記長尺状物相互の当接部の内側面は実質的に直角の角部を形成しており、前記長尺状物は、突起部を有さない矩形の外形を有することを特徴とする請求項１乃至５のいずれか１項に記載の絶縁部材。   The inner surface of the abutting portion between the long objects in the outer member forms a substantially right angle corner, and the long object has a rectangular outer shape having no protrusions. The insulating member according to claim 1, wherein: 前記各長尺状物の長さ方向の一端の端面と、前記隣接する他の長尺状物の長さ方向の一端の側面との当接部に段差構造の組合せ部が形成されていることを特徴とする請求項１乃至７のいずれか１項に記載の絶縁部材。   A combination part of a step structure is formed at a contact portion between one end face in the length direction of each of the long objects and a side surface of one end in the length direction of the other adjacent long objects. The insulating member according to claim 1, wherein: 前記段差構造の少なくとも一部は、前記各長尺状物の一端の端面と、前記隣接する他の長尺状物の前記一端の側面との当接部に形成された凹部に遊嵌された絶縁材料からなる入れ子部材で構成されていることを特徴とする請求項８記載の絶縁部材。   At least a part of the step structure is loosely fitted in a recess formed in an abutting portion between an end surface of one end of each elongated object and a side surface of the one end of the other adjacent elongated object. 9. The insulating member according to claim 8, wherein the insulating member is formed of a nested member made of an insulating material. 前記凹部と前記入れ子部材との間に、前記長尺状物の長さ方向に沿った熱膨張又は熱収縮に起因する変位を吸収する隙間が設けられていることを特徴とする請求項９記載の絶縁部材。   The clearance gap which absorbs the displacement resulting from the thermal expansion or the thermal contraction along the length direction of the said elongate thing is provided between the said recessed part and the said nest | insert member. Insulation member. 前記凹部における前記入れ子部材の挿入口は、サイドシールド部材で封止されていることを特徴とする請求項１０記載の絶縁部材。   The insulating member according to claim 10, wherein an insertion port of the nesting member in the recess is sealed with a side shield member. 前記環状のシール部材の一部は、前記処理室の内壁面に設けられた凹部に嵌合されていることを特徴とする請求項１乃至１１のいずれか１項に記載の絶縁部材。   The insulating member according to any one of claims 1 to 11, wherein a part of the annular seal member is fitted into a recess provided on an inner wall surface of the processing chamber. 前記内側部材は、複数の構成部材が組み合わされた組合せ体からなり、各構成部材の相互間に熱膨張を吸収するための隙間が設けられていることを特徴とする請求項１乃至１２のいずれか１項に記載の絶縁部材。   The said inner member consists of a combination body with which the some structural member was combined, The clearance gap for absorbing thermal expansion between each structural member is provided, The any one of Claim 1 thru | or 12 characterized by the above-mentioned. The insulating member according to claim 1. 請求項１乃至１３のいずれか１項に記載の絶縁部材を備えていることを特徴とする基板処理装置。   A substrate processing apparatus comprising the insulating member according to claim 1.
JP2010257965A 2010-11-18 2010-11-18 Insulation member, and substrate processing device with insulation member Pending JP2012109446A (en)

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