JP2012104813A - 偏光アクチュエータ - Google Patents
偏光アクチュエータ Download PDFInfo
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- JP2012104813A JP2012104813A JP2011226221A JP2011226221A JP2012104813A JP 2012104813 A JP2012104813 A JP 2012104813A JP 2011226221 A JP2011226221 A JP 2011226221A JP 2011226221 A JP2011226221 A JP 2011226221A JP 2012104813 A JP2012104813 A JP 2012104813A
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- JP
- Japan
- Prior art keywords
- light
- light beam
- optical element
- exposure apparatus
- projection exposure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
【解決手段】互いに並べて配置した複数の光ビーム(4)を含む光ビーム配列に影響を及ぼす装置であって、光ビームに対して横方向に可動であり、光ビームを通過させる場合に光ビームに影響を及ぼすことができ、少なくとも1つの光吸収領域(9、19、29)を有する、少なくとも1つの光学素子(5、15、25)を設け、光学素子用の駆動デバイスと、光ビームの光を検出する測定デバイスと、光吸収領域の位置に応じて駆動デバイスを制御する制御ユニットとを備える。
【選択図】図1
Description
Claims (8)
- 互いに並べて配置した複数の光ビームを含む光ビーム配列に影響を及ぼす装置であって、
前記光ビーム(4)に対して横方向に可動であり、該光ビームを通過させる場合に該光ビーム(4)に影響を及ぼすことができ、少なくとも1つの光吸収領域(9、19、29)を有する、少なくとも1つの光学素子(5、15、25)を特徴とし、前記光学素子用の駆動デバイスと、前記光ビームの光を検出する測定デバイスと、前記光吸収領域の位置に応じて前記駆動デバイスを制御するよう設計した制御ユニットと、を備えることを特徴とする、装置。 - 請求項1に記載の装置において、
個別に又は全体で可動である複数の光学素子(5、15、25)を、前記光ビームのビーム方向で互いに並べて配置したことを特徴とする、装置。 - 請求項2に記載の装置において、
前記光吸収領域(9、19、29)を、複数の光学素子の場合、個々の前記光学素子それぞれで同じ場所に配置した、又は前記光ビームのビーム方向で前記光学素子のいかなる位置でも重なり合わないよう配置したことを特徴とする、装置。 - 請求項1〜3のいずれか1項に記載の装置において、
前記駆動デバイスはステッピングモータであることを特徴とする、装置。 - 請求項1〜4のいずれか1項に記載の装置において、
前記光学素子(5、15、25)は偏光子であることを特徴とする、装置。 - 複数の光ビーム(4)により照明されるマルチミラーアレイ(7)を備え、瞳平面(12)において各領域(11)を複数の光ビーム(4)に割り当てるようにした、マイクロリソグラフィ用の投影露光装置であって、
請求項1〜5のいずれか1項に記載の装置を備えることを特徴とする、投影露光装置。 - 請求項6に記載の投影露光装置において、
前記測定デバイスを、前記瞳平面(12)における光強度を測定するデバイスにより形成したことを特徴とする、投影露光装置。 - 請求項1〜5のいずれか1項に記載の装置又は請求項6又は7に記載の投影露光装置により、互いに並べて配置した複数の光ビーム(4)を含む光ビーム配列に影響を及ぼす方法であって、
前記光ビーム(4)に対して横方向に可動であり、該光ビームを通過させる場合に該光ビーム(4)に影響を及ぼし、少なくとも1つの光吸収領域を有する、少なくとも1つの光学素子(5、15、25)を設けること、該光学素子用の駆動デバイスを設けること、及び前記光ビームの光を検出する測定デバイスを設けることを含み、前記光学素子を前記光吸収領域(9、19、29)の位置に応じて駆動し、該光吸収領域(9、19、29)が所望の光ビームに影響を与える位置をとるようにすることを特徴とする、方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010042901.5 | 2010-10-26 | ||
DE102010042901A DE102010042901B3 (de) | 2010-10-26 | 2010-10-26 | Polarisationsaktuator |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012104813A true JP2012104813A (ja) | 2012-05-31 |
JP5107456B2 JP5107456B2 (ja) | 2012-12-26 |
Family
ID=45832803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011226221A Active JP5107456B2 (ja) | 2010-10-26 | 2011-10-13 | 偏光アクチュエータ |
Country Status (4)
Country | Link |
---|---|
US (1) | US8373847B2 (ja) |
JP (1) | JP5107456B2 (ja) |
KR (1) | KR101392037B1 (ja) |
DE (1) | DE102010042901B3 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9360762B2 (en) | 2011-02-02 | 2016-06-07 | Asml Netherlands B.V. | Illumination system, lithographic apparatus and method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2369413B1 (en) * | 2010-03-22 | 2021-04-07 | ASML Netherlands BV | Illumination system and lithographic apparatus |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000058442A (ja) * | 1998-04-21 | 2000-02-25 | Asm Lithography Bv | リソグラフィック投影装置 |
JP2001313250A (ja) * | 2000-02-25 | 2001-11-09 | Nikon Corp | 露光装置、その調整方法、及び前記露光装置を用いるデバイス製造方法 |
JP2002072361A (ja) * | 2000-09-04 | 2002-03-12 | Canon Inc | 照明光学系、該照明光学系を有する光学装置、画像処理装置 |
JP2002093700A (ja) * | 2000-09-02 | 2002-03-29 | Carl Zeiss:Fa | 投影露光装置 |
JP2002100561A (ja) * | 2000-07-19 | 2002-04-05 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0223304A (ja) * | 1988-07-12 | 1990-01-25 | Toray Ind Inc | 可視偏光フイルム |
KR20010085493A (ko) * | 2000-02-25 | 2001-09-07 | 시마무라 기로 | 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법 |
US7170587B2 (en) * | 2002-03-18 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005040927A2 (en) * | 2003-10-18 | 2005-05-06 | Carl Zeiss Smt Ag | Device and method for illumination dose adjustments in microlithography |
DE102004063314A1 (de) * | 2004-12-23 | 2006-07-13 | Carl Zeiss Smt Ag | Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung |
WO2007051574A1 (en) * | 2005-11-03 | 2007-05-10 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
JP4382791B2 (ja) * | 2006-05-16 | 2009-12-16 | Nec液晶テクノロジー株式会社 | 光線方向制御素子の製造方法 |
-
2010
- 2010-10-26 DE DE102010042901A patent/DE102010042901B3/de not_active Expired - Fee Related
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2011
- 2011-10-13 JP JP2011226221A patent/JP5107456B2/ja active Active
- 2011-10-25 KR KR1020110109191A patent/KR101392037B1/ko active IP Right Grant
- 2011-10-25 US US13/281,179 patent/US8373847B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000058442A (ja) * | 1998-04-21 | 2000-02-25 | Asm Lithography Bv | リソグラフィック投影装置 |
JP2001313250A (ja) * | 2000-02-25 | 2001-11-09 | Nikon Corp | 露光装置、その調整方法、及び前記露光装置を用いるデバイス製造方法 |
JP2002100561A (ja) * | 2000-07-19 | 2002-04-05 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP2002093700A (ja) * | 2000-09-02 | 2002-03-29 | Carl Zeiss:Fa | 投影露光装置 |
JP2002072361A (ja) * | 2000-09-04 | 2002-03-12 | Canon Inc | 照明光学系、該照明光学系を有する光学装置、画像処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9360762B2 (en) | 2011-02-02 | 2016-06-07 | Asml Netherlands B.V. | Illumination system, lithographic apparatus and method |
Also Published As
Publication number | Publication date |
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KR20120043650A (ko) | 2012-05-04 |
DE102010042901B3 (de) | 2012-04-05 |
US20120099093A1 (en) | 2012-04-26 |
KR101392037B1 (ko) | 2014-05-07 |
US8373847B2 (en) | 2013-02-12 |
JP5107456B2 (ja) | 2012-12-26 |
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