JP2011530003A - 原子層堆積装置および装填方法 - Google Patents
原子層堆積装置および装填方法 Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 27
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 238000005470 impregnation Methods 0.000 description 1
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- 150000004706 metal oxides Chemical class 0.000 description 1
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- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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- 238000000427 thin-film deposition Methods 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
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Abstract
【選択図】図4
Description
あるパターンの相互位置関係で載置された複数の原子層堆積(ALD)反応炉であって、各ALD反応炉はALD処理のために一回分の基板群を収容するように構成され、上部からアクセス可能な反応室が各ALD反応炉に設けられた、複数のALD反応炉と、
把持部と移動用構成とを備えた装填用ロボットであって、上記複数のALD反応炉の各々への装填のために複数の装填シーケンスを実行するように構成された装填用ロボットと、
を備えたALD反応炉システムであって、各装填シーケンスは、
収納域または棚において一回分の基板群を担持している基板ホルダを上記把持部によって取り上げることと、
上記基板ホルダを上記一回分の基板と共に当該ALD反応炉の反応室に上記移動用構成によって移動させることと、
を含む、ALD反応炉システムが提供される。
反応炉蓋、または反応室蓋に一体化された真空室蓋、を備える蓋システムと、
反応室への装填のために上記蓋システムを吊り上げるように構成された吊り上げ構成と、
を備える。
ALD処理された一回分の基板群を担持している基板ホルダを上記把持部によって当該ALD反応炉から取り上げることと、
上記基板ホルダをALD処理された一回分の基板群と共に上記収納域または棚に上記移動用構成によって移動させることと、
を含む。
あるパターンの相互位置関係で載置された複数のALD反応炉であって、各ALD反応炉はALD処理のために一回分の基板群を収容するように構成され、上部からアクセス可能な反応室が各ALD反応炉に設けられた、複数のALD反応炉を作動させることと、
上記複数のALD反応炉の各々への装填のために複数の装填シーケンスを装填用ロボットによって実行することと、
を含む方法であって、各装填シーケンスは、
収納域または棚において一回分の基板群を担持している基板ホルダを取り上げることと、
上記基板ホルダを上記一回分の基板群と共に当該ALD反応炉の反応室に移動させることと、
を含む、方法が提供される。
ALD処理された一回分の基板群を担持している基板ホルダを当該ALD反応炉から取り上げることと、
上記基板ホルダをALD処理された一回分の基板群と共に上記収納域または棚に移動させること、
を含む。
原子層堆積(ALD)処理のために一回分の基板群を収容するように構成されたALD反応炉であって、上部からアクセス可能な反応室を備えたALD反応炉と、
把持部と移動用構成とを備えた装填用ロボットであって、上記ALD反応炉への装填のための装填シーケンスを実行するように構成された装填用ロボットと、
を備えるALD反応炉システムであって、上記装填シーケンスは、
収納域または棚において一回分の基板群を担持している基板ホルダを上記把持部によって取り上げることと、
上記基板ホルダを上記一回分の基板群と共にALD反応炉の反応室に上記移動用構成によって移動させることと、
を含む、ALD反応炉システムを提供する。
Claims (15)
- あるパターンの相互位置関係で載置された複数の原子層堆積(ALD)反応炉であって、各ALD反応炉はALD処理のために一回分の基板群を収容するように構成され、上部からアクセス可能な反応室が各ALD反応炉に設けられた、前記複数のALD反応炉と、
把持部と移動用構成とを備えた装填用ロボットであって、前記複数のALD反応炉の各々への装填のために複数の装填シーケンスを実行するように構成された前記装填用ロボットと、
を備えるALD反応炉システムであって、各装填シーケンスは、
収納域または棚において一回分の基板群を担持している基板ホルダを前記把持部によって取り上げることと、
前記基板ホルダを前記一回分の基板群と共に前記移動用構成によって当該ALD反応炉の前記反応室に移動させることと、
を含む、ALD反応炉システム。 - 前記装填用ロボットは、各装填シーケンスにおいて、前記基板ホルダを前記上部から反応室に鉛直に、別の装填室を通らずに、降ろすように構成される、請求項1に記載のALD反応炉システム。
- 前記システムのALD反応炉の数は2つまたは3つである、請求項1に記載のALD反応炉システム。
- 各ALD反応炉は、
反応炉蓋、または反応室蓋に一体化された真空室蓋、を備える蓋システムと、
前記反応室への装填のために前記蓋システムを吊り上げるように構成された吊り上げ構成と、
を備える、請求項1に記載のALD反応炉システム。 - 前記複数のALD反応炉と、装填用ロボットと、収納域または棚とを取り囲む高性能の微粒子除去エアフィルタフードを備える、請求項1に記載のALD反応炉システム。
- 前記装填シーケンスを、人間オペレータなしに、単一のロボットによって実行するように構成された、請求項1に記載のALD反応炉システム。
- 前記装填用ロボットは、ALD処理の後で前記複数のALD反応炉の各々からの取り出しのために複数の取り出しシーケンスを実行するように構成され、各取り出しシーケンスは、
ALD処理された一回分の基板群を担持している基板ホルダを前記把持部によって当該ALD反応炉から取り上げることと、
前記基板ホルダを前記ALD処理された一回分の基板群と共に前記収納域または棚に前記移動用構成によって移動させることと、
を含む、請求項1に記載のALD反応炉システム。 - あるパターンの相互位置関係で載置された複数のALD反応炉であって、各ALD反応炉はALD処理のために一回分の基板群を収容するように構成され、上部からアクセス可能な反応室が各ALD反応炉に設けられた、前記複数のALD反応炉を作動させることと、
前記複数のALD反応炉の各々への装填のために複数の装填シーケンスを装填用ロボットによって実行することと、
を含む方法であって、各装填シーケンスは、
収納域または棚において一回分の基板群を担持している基板ホルダを取り上げることと、
前記基板ホルダを前記一回分の基板群と共に当該ALD反応炉の前記反応室に移動させることと、
を含む、方法。 - 各装填シーケンスにおいて、前記基板ホルダは前記装填用ロボットによって前記上部から反応室に鉛直に、別の装填室を通らずに、降ろされる、請求項8に記載の方法。
- 前記システムのALD反応炉の数は2つまたは3つである、請求項8に記載の方法。
- 各ALD反応炉は、反応炉蓋、または反応室蓋に一体化された真空室蓋、を備えた蓋システムを備え、前記方法は、
前記反応室への装填のために前記蓋システムを吊り上げること、
を含む、請求項8に記載の方法。 - 前記複数のALD反応炉と、装填用ロボットと、前記収納域または棚とを取り囲むように高性能の微粒子除去エアフィルタフードを配置し、これにより局所的クリーンルームを形成すること、
を含む、請求項8に記載の方法。 - 前記装填シーケンスは、人間オペレータなしに、単一のロボットによって実行される、請求項8に記載の方法。
- ALD処理の後に前記複数のALD反応炉の各々からの取り出しのために複数の取り出しシーケンスを前記装填用ロボットによって実行することをさらに含み、各取り出しシーケンスは、
ALD処理された一回分の基板群を担持している基板ホルダを当該ALD反応炉から取り上げることと、
前記基板ホルダを前記ALD処理された一回分の基板群と共に前記収納域または棚に移動させることと、
を含む、請求項8に記載の方法。 - 原子層堆積(ALD)処理のために一回分の基板群を収容するように構成されたALD反応炉であって、上部からアクセス可能な反応室を備えた前記ALD反応炉と、
把持部と移動用構成とを備えた装填用ロボットであって、前記ALD反応炉への装填のための装填シーケンスを実行するように構成された前記装填用ロボットと、
を備えるALD反応炉システムであって、前記装填シーケンスは、
収納域または棚にある一回分の基板群を担持している基板ホルダを前記把持部によって取り上げることと、
前記基板ホルダを前記一回分の基板群と共に前記移動用構成によって前記ALD反応炉の前記反応室に移動させることと、
を含む、ALD反応炉システム。
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