JP2011523711A5 - - Google Patents
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- JP2011523711A5 JP2011523711A5 JP2011512587A JP2011512587A JP2011523711A5 JP 2011523711 A5 JP2011523711 A5 JP 2011523711A5 JP 2011512587 A JP2011512587 A JP 2011512587A JP 2011512587 A JP2011512587 A JP 2011512587A JP 2011523711 A5 JP2011523711 A5 JP 2011523711A5
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- Prior art keywords
- sample
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- 238000003384 imaging method Methods 0.000 claims 10
- 230000003287 optical Effects 0.000 claims 9
- 230000000875 corresponding Effects 0.000 claims 4
- 238000001514 detection method Methods 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 4
- 210000001747 Pupil Anatomy 0.000 claims 2
- 230000002238 attenuated Effects 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000000903 blocking Effects 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000000051 modifying Effects 0.000 claims 1
- 238000005070 sampling Methods 0.000 claims 1
Applications Claiming Priority (15)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13072908P | 2008-06-03 | 2008-06-03 | |
| US61/130,729 | 2008-06-03 | ||
| US13561608P | 2008-07-22 | 2008-07-22 | |
| US61/135,616 | 2008-07-22 | ||
| US12/190,144 US7864334B2 (en) | 2008-06-03 | 2008-08-12 | Interferometric defect detection |
| US12/190,144 | 2008-08-12 | ||
| US18951008P | 2008-08-20 | 2008-08-20 | |
| US18950908P | 2008-08-20 | 2008-08-20 | |
| US18950808P | 2008-08-20 | 2008-08-20 | |
| US61/189,510 | 2008-08-20 | ||
| US61/189,508 | 2008-08-20 | ||
| US61/189,509 | 2008-08-20 | ||
| US21051309P | 2009-03-19 | 2009-03-19 | |
| US61/210,513 | 2009-03-19 | ||
| PCT/US2009/045999 WO2009149103A1 (fr) | 2008-06-03 | 2009-06-02 | Détection et classification par interférométrie de défauts |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011523711A JP2011523711A (ja) | 2011-08-18 |
| JP2011523711A5 true JP2011523711A5 (fr) | 2012-07-19 |
| JP5444334B2 JP5444334B2 (ja) | 2014-03-19 |
Family
ID=41398482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011512587A Expired - Fee Related JP5444334B2 (ja) | 2008-06-03 | 2009-06-02 | 干渉欠陥検知及び分類 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2286175A4 (fr) |
| JP (1) | JP5444334B2 (fr) |
| KR (1) | KR101556430B1 (fr) |
| CN (1) | CN102089616B (fr) |
| WO (1) | WO2009149103A1 (fr) |
Families Citing this family (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI421469B (zh) * | 2010-03-10 | 2014-01-01 | Ind Tech Res Inst | 表面量測裝置及其之量測方法及校正方法 |
| EP2384692B1 (fr) * | 2010-05-07 | 2020-09-09 | Rowiak GmbH | Appareil et procédé destinés à l'interférométrie |
| US9285601B2 (en) | 2011-07-25 | 2016-03-15 | Citizen Holdings Co., Ltd. | Optical device, projector, manufacturing method, and manufacturing support apparatus |
| CN102435547B (zh) * | 2011-09-15 | 2014-02-05 | 上海华力微电子有限公司 | 敏感光阻耐受程度检测方法及晶圆缺陷检验方法 |
| CN103018202B (zh) * | 2011-09-22 | 2014-10-01 | 中国科学院微电子研究所 | 一种集成电路缺陷的光学检测方法和装置 |
| US8964088B2 (en) | 2011-09-28 | 2015-02-24 | Semiconductor Components Industries, Llc | Time-delay-and-integrate image sensors having variable intergration times |
| JP5847304B2 (ja) * | 2012-05-16 | 2016-01-20 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| JP6025419B2 (ja) | 2012-06-27 | 2016-11-16 | 株式会社ニューフレアテクノロジー | 検査方法および検査装置 |
| KR101354729B1 (ko) * | 2012-08-23 | 2014-01-27 | 앰코 테크놀로지 코리아 주식회사 | 반도체 디바이스의 오정렬 값 측정 방법 및 이것이 적용된 반도체 디바이스 |
| JP6001383B2 (ja) * | 2012-08-28 | 2016-10-05 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びそれを用いた装置 |
| JP5993691B2 (ja) | 2012-09-28 | 2016-09-14 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| JP5946751B2 (ja) * | 2012-11-08 | 2016-07-06 | 株式会社日立ハイテクノロジーズ | 欠陥検出方法及びその装置並びに欠陥観察方法及びその装置 |
| KR101336946B1 (ko) * | 2012-11-27 | 2013-12-04 | 한국기초과학지원연구원 | 발열 분포 측정을 이용한 불량 분석 장치 및 방법 |
| JP5786270B2 (ja) * | 2013-03-06 | 2015-09-30 | 株式会社東京精密 | ２色干渉計測装置 |
| CN104180765B (zh) * | 2013-05-28 | 2017-03-15 | 甘志银 | 化学气相沉积设备中实时测量衬底翘曲的方法及装置 |
| US9995850B2 (en) | 2013-06-06 | 2018-06-12 | Kla-Tencor Corporation | System, method and apparatus for polarization control |
| US9189705B2 (en) * | 2013-08-08 | 2015-11-17 | JSMSW Technology LLC | Phase-controlled model-based overlay measurement systems and methods |
| JP6316068B2 (ja) | 2014-03-31 | 2018-04-25 | 国立大学法人 東京大学 | 検査システムおよび検査方法 |
| JP6433268B2 (ja) * | 2014-03-31 | 2018-12-05 | 国立大学法人 東京大学 | 検査システムおよび検査方法 |
| US9891078B2 (en) * | 2014-07-14 | 2018-02-13 | Zygo Corporation | Interferometric encoders using spectral analysis |
| JP5843179B1 (ja) * | 2014-09-19 | 2016-01-13 | レーザーテック株式会社 | 検査装置、及び波面収差補正方法 |
| CN104297744B (zh) * | 2014-10-16 | 2016-12-07 | 西安理工大学 | 偏振激光雷达的偏振标定与补偿装置及标定与补偿方法 |
| WO2016084239A1 (fr) * | 2014-11-28 | 2016-06-02 | 株式会社東京精密 | Dispositif de mesure d'interférence à deux couleurs |
| US10718934B2 (en) * | 2014-12-22 | 2020-07-21 | California Institute Of Technology | Epi-illumination Fourier ptychographic imaging for thick samples |
| TWI574334B (zh) * | 2015-03-17 | 2017-03-11 | 陳勇吉 | 檢測晶圓的方法 |
| CN104729712B (zh) * | 2015-03-30 | 2017-08-04 | 中国资源卫星应用中心 | 一种星载大气探测傅里叶变换光谱仪数据预处理方法 |
| JP2017129500A (ja) * | 2016-01-21 | 2017-07-27 | 株式会社ブイ・テクノロジー | 位相シフト量測定装置 |
| KR102483787B1 (ko) * | 2016-02-25 | 2023-01-04 | 에스케이하이닉스 주식회사 | 반도체 장치의 결함 모델링 장치 및 방법, 이를 위한 컴퓨터 프로그램과, 이를 이용한 반도체 장치의 결함 검사 시스템 |
| CN108886007B (zh) * | 2016-04-13 | 2020-03-27 | 科磊股份有限公司 | 用于基于电设计意图的缺陷分类的***及方法 |
| IL245932A (en) * | 2016-05-30 | 2017-10-31 | Elbit Systems Land & C4I Ltd | System and methods for determining the authenticity of an object that includes a reference image acquisition and a user unit |
| JP6705356B2 (ja) * | 2016-10-12 | 2020-06-03 | 住友電気工業株式会社 | 光ファイバ特性評価方法および光ファイバ特性評価装置 |
| US10234402B2 (en) * | 2017-01-05 | 2019-03-19 | Kla-Tencor Corporation | Systems and methods for defect material classification |
| WO2018219639A1 (fr) | 2017-06-02 | 2018-12-06 | Asml Netherlands B.V. | Appareil de mesure |
| CN107504919B (zh) * | 2017-09-14 | 2019-08-16 | 深圳大学 | 基于相位映射的折叠相位三维数字成像方法及装置 |
| US10522376B2 (en) * | 2017-10-20 | 2019-12-31 | Kla-Tencor Corporation | Multi-step image alignment method for large offset die-die inspection |
| CN108280824B (zh) * | 2018-01-18 | 2022-06-14 | 电子科技大学 | 基于图像配准及融合的激光剪切散斑干涉缺陷检测*** |
| CN108195849A (zh) * | 2018-01-23 | 2018-06-22 | 南京理工大学 | 基于短相干动态泰曼干涉仪的位相缺陷检测***及方法 |
| NL2020623B1 (en) * | 2018-01-24 | 2019-07-30 | Illumina Inc | Structured illumination microscopy with line scanning |
| NL2020622B1 (en) * | 2018-01-24 | 2019-07-30 | Lllumina Cambridge Ltd | Reduced dimensionality structured illumination microscopy with patterned arrays of nanowells |
| CN108550138A (zh) * | 2018-03-14 | 2018-09-18 | 浙江大学山东工业技术研究院 | 基于频率域滤波增强的耐火砖表面划痕识别方法 |
| CN112154320B (zh) * | 2018-06-11 | 2023-10-20 | 株式会社岛津制作所 | 缺陷检测方法以及装置 |
| CN108961234A (zh) * | 2018-06-29 | 2018-12-07 | 中国科学院光电技术研究所 | 一种基于多波长迭代算法的透射性元件缺陷检测装置及方法 |
| CN108802056B (zh) * | 2018-08-23 | 2024-02-06 | 中国工程物理研究院激光聚变研究中心 | 光学元件位相型缺陷测量装置及检测方法 |
| US10816464B2 (en) * | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
| US11294162B2 (en) * | 2019-02-07 | 2022-04-05 | Nanotronics Imaging, Inc. | Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel |
| US10948423B2 (en) * | 2019-02-17 | 2021-03-16 | Kla Corporation | Sensitive particle detection with spatially-varying polarization rotator and polarizer |
| JPWO2020196442A1 (fr) * | 2019-03-28 | 2020-10-01 | ||
| CN109994398A (zh) * | 2019-04-18 | 2019-07-09 | 上海华力微电子有限公司 | 一种晶圆缺陷扫描对比方法 |
| KR102166495B1 (ko) * | 2019-05-27 | 2020-10-15 | 김은근 | 델타봇 타입의 전동 현미경 스테이지 |
| CN110553580B (zh) * | 2019-06-04 | 2022-05-20 | 南京英特飞光电技术有限公司 | 一种倾斜入射相移干涉仪和直角棱镜大面测量方法 |
| CN111208089B (zh) * | 2020-01-13 | 2020-09-15 | 中国科学院上海光学精密机械研究所 | 长距离端面粗糙晶体体内缺陷测量装置和方法 |
| CN118329927A (zh) * | 2020-02-24 | 2024-07-12 | 诺威有限公司 | 光学计量***和方法 |
| US11544838B2 (en) * | 2020-03-21 | 2023-01-03 | Kla Corporation | Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging |
| KR102265540B1 (ko) * | 2020-04-27 | 2021-06-17 | 주식회사 에프에스티 | 초점 보정 장치, 초점 보정 방법 및 결함 검출 시스템 |
| CN115917438A (zh) * | 2020-08-19 | 2023-04-04 | Asml荷兰有限公司 | 用于从原始图像自动选择高品质图像的设备和方法 |
| CN112098421B (zh) * | 2020-09-15 | 2022-06-28 | 上海微电子装备（集团）股份有限公司 | 暗场检测装置 |
| CN113390467B (zh) * | 2021-07-14 | 2022-05-03 | 安徽至博光电科技股份有限公司 | 测振测温装置及其信号处理方法 |
| CN113465722B (zh) * | 2021-07-14 | 2022-06-07 | 安徽至博光电科技股份有限公司 | 一种低成本测振***及振动测量方法 |
| CN113642422B (zh) * | 2021-07-27 | 2024-05-24 | 东北电力大学 | 一种连续中文手语识别方法 |
| CN113533351B (zh) * | 2021-08-20 | 2023-12-22 | 合肥御微半导体技术有限公司 | 一种面板缺陷检测装置及检测方法 |
| CN114820617B (zh) * | 2022-06-29 | 2022-09-20 | 苏州大学 | 基于四焦距相位相干机器视觉的晶体缺陷检测方法和*** |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6501551B1 (en) * | 1991-04-29 | 2002-12-31 | Massachusetts Institute Of Technology | Fiber optic imaging endoscope interferometer with at least one faraday rotator |
| JP2005003689A (ja) * | 1994-10-07 | 2005-01-06 | Renesas Technology Corp | 被検査対象物上のパターンの欠陥検査方法及びその装置 |
| US6288780B1 (en) * | 1995-06-06 | 2001-09-11 | Kla-Tencor Technologies Corp. | High throughput brightfield/darkfield wafer inspection system using advanced optical techniques |
| JPH09281051A (ja) * | 1996-04-17 | 1997-10-31 | Nikon Corp | 検査装置 |
| US6259055B1 (en) * | 1998-10-26 | 2001-07-10 | Lsp Technologies, Inc. | Apodizers for laser peening systems |
| JP3881125B2 (ja) * | 1999-02-17 | 2007-02-14 | レーザーテック株式会社 | 段差測定装置並びにこの段差測定装置を用いたエッチングモニタ装置及びエッチング方法 |
| US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| WO2002056332A1 (fr) * | 2001-01-10 | 2002-07-18 | Ebara Corporation | Appareil et procede d'inspection a faisceau d'electrons, et procede de fabrication de dispositif comportant l'appareil d'inspection |
| US7209239B2 (en) * | 2002-10-02 | 2007-04-24 | Kla-Tencor Technologies Corporation | System and method for coherent optical inspection |
| JP4220287B2 (ja) * | 2003-03-31 | 2009-02-04 | 株式会社東芝 | パターン欠陥検査装置 |
| US7138629B2 (en) * | 2003-04-22 | 2006-11-21 | Ebara Corporation | Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| US7295303B1 (en) * | 2004-03-25 | 2007-11-13 | Kla-Tencor Technologies Corporation | Methods and apparatus for inspecting a sample |
| WO2006105259A2 (fr) * | 2004-07-30 | 2006-10-05 | Novalux, Inc. | Systeme et procede servant a commander des sources laser a semi-conducteur pour des afficheurs |
| WO2006078718A1 (fr) | 2005-01-20 | 2006-07-27 | Zygo Corporation | Interferometre pour la determination de caracteristiques de la surface d'un objet |
| US7864334B2 (en) | 2008-06-03 | 2011-01-04 | Jzw Llc | Interferometric defect detection |
-
2009
- 2009-06-02 WO PCT/US2009/045999 patent/WO2009149103A1/fr active Application Filing
- 2009-06-02 CN CN200980121352.XA patent/CN102089616B/zh not_active Expired - Fee Related
- 2009-06-02 EP EP09759262.0A patent/EP2286175A4/fr not_active Withdrawn
- 2009-06-02 KR KR1020117000031A patent/KR101556430B1/ko not_active IP Right Cessation
- 2009-06-02 JP JP2011512587A patent/JP5444334B2/ja not_active Expired - Fee Related
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