JP2011256107A5 - - Google Patents
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- JP2011256107A5 JP2011256107A5 JP2011153248A JP2011153248A JP2011256107A5 JP 2011256107 A5 JP2011256107 A5 JP 2011256107A5 JP 2011153248 A JP2011153248 A JP 2011153248A JP 2011153248 A JP2011153248 A JP 2011153248A JP 2011256107 A5 JP2011256107 A5 JP 2011256107A5
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本願の第1の発明は、短辺が500mm以上の略矩形の面形状であり、かつ板厚が0.3mm以上、6mm以下、平面応力が0.1MPa〜5MPaであるディスプレイ用のガラス基板の製造方法であって、
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの板幅方向の温度分布を、ガラス基板の周辺部の温度を中心部に比べて低い状態に操作し、
ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、基板の周囲に沿って圧縮の残留応力が入るようにし、基板の周囲に沿った偏差圧縮応力の最大値が0.5MPa以上であり、
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とするディスプレイ用のガラス基板の製造方法(但し、ガラス基板における圧縮の残留応力が20kg/cm2以上の場合を除く)を提供する。
また、本願の第2の発明は、短辺が500mm以上の略矩形の面形状であり、かつ板厚が0.3mm以上、6mm以下、平面応力が0.1MPa〜5MPaであるディスプレイ用のガラス基板の製造方法であって、
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの板幅方向の温度分布を、ガラス基板の周辺部の温度を中心部に比べて高い状態に操作し、
ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、基板の周囲に沿って引張の残留応力が入るようにし、基板の周囲に沿った偏差引張応力の最大値が0.57MPa以上であり、
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とするディスプレイ用のガラス基板の製造方法(但し、ガラス基板における引張の残留応力が20kg/cm2以上の場合を除く)を提供する。
また、本願の第3の発明は、短辺が300mm以上の略矩形の面形状であり、かつ板厚が0.3mm以上、6mm以下、平面応力が0.1MPa〜5MPaであるディスプレイ用のガラス基板の製造方法であって、
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの流れと垂直な板幅方向の温度分布を、周辺部の温度を中心部に比べて低い状態に操作し、
前記徐冷工程後のガラスリボンからガラス基板を切り出すことで、該ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、該ガラス基板の各辺の近傍において各辺と平行に圧縮の残留応力が入るようにし、
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とし、
前記ガラス基板の各辺の近傍で各辺と平行方向での偏差圧縮応力の最大値が0.3MPa以上であって、
前記ガラス基板の板厚から算出したたわみ量に対する実測たわみ量の減少量が0.4mm〜0.8mmである、ディスプレイ用のガラス基板の製造方法を提供する。
また、上記のディスプレイ用のガラス基板の製造方法によって製造したガラス基板の歪点がフラットパネルディスプレイの製造工程での熱処理温度よりも高いフラットパネルディスプレイの製造方法を提供する。
また、上記のディスプレイ用のガラス基板の製造方法によって製造したガラス基板を用いるフラットパネルディスプレイの製造方法であって、ディスプレイが液晶ディスプレイであり、製造したガラス基板の歪点より、液晶ディスプレイの製造工程での熱処理温度が高いフラットパネルディスプレイの製造方法を提供する。
本発明により、引張または圧縮の残留応力を持つフラットパネルディスプレイ用のガラス基板を製造することができる。
A first invention of the present application is a glass substrate for a display having a substantially rectangular surface shape with a short side of 500 mm or more, a plate thickness of 0.3 mm or more and 6 mm or less, and a plane stress of 0.1 MPa to 5 MPa. A manufacturing method comprising:
The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the width direction of the glass ribbon in the slow cooling process after forming the glass ribbon is centered on the temperature at the periphery of the glass substrate. Operate to a lower state than the
Due to the residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the plate thickness direction causes the compressive residual stress to enter along the circumference of the substrate, and the maximum of the deviation compressive stress along the circumference of the substrate The value is 0.5 MPa or more,
A method of manufacturing a glass substrate for a display having a strain point of 570 ° C. or more for a plasma display and a strain point of 650 ° C. or more for a liquid crystal display panel (however, the compressive residual stress in the glass substrate is 20 kg / cm 2 or more) Provided).
The second invention of the present application is a display glass having a substantially rectangular surface shape with a short side of 500 mm or more, a plate thickness of 0.3 mm or more and 6 mm or less, and a plane stress of 0.1 MPa to 5 MPa. A method for manufacturing a substrate, comprising:
The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the width direction of the glass ribbon in the slow cooling process after forming the glass ribbon is centered on the temperature at the periphery of the glass substrate. Operate to a higher state than the
Due to the residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the plate thickness direction is such that the tensile residual stress enters along the circumference of the substrate, and the maximum of the deviation tensile stress along the circumference of the substrate The value is 0.57 MPa or more,
A method for producing a glass substrate for a display having a strain point of 570 ° C. or higher for a plasma display and a strain point of 650 ° C. or higher for a liquid crystal display panel (however, the tensile residual stress in the glass substrate is 20 kg / cm 2 or higher) Provided).
The third invention of the present application is a display glass having a substantially rectangular surface shape with a short side of 300 mm or more, a plate thickness of 0.3 mm or more and 6 mm or less, and a plane stress of 0.1 MPa to 5 MPa. A method for manufacturing a substrate, comprising:
The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the plate width direction perpendicular to the flow of the glass ribbon in the slow cooling process after forming the glass ribbon, Operate to a lower state than the center,
By cutting the glass substrate from the glass ribbon after the slow cooling step, due to residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the thickness direction is in the vicinity of each side of the glass substrate. So that compressive residual stress enters parallel to each side,
For plasma displays, the strain point is 570 ° C. or higher, and for liquid crystal display panels, the strain point is 650 ° C. or higher.
The maximum value of the deviation compressive stress in the direction parallel to each side in the vicinity of each side of the glass substrate is 0.3 MPa or more,
Provided is a method for producing a glass substrate for a display, wherein the amount of decrease in the measured deflection amount with respect to the deflection amount calculated from the thickness of the glass substrate is 0.4 mm to 0.8 mm.
Moreover, the manufacturing method of the flat panel display in which the strain point of the glass substrate manufactured by the manufacturing method of the glass substrate for said displays is higher than the heat processing temperature in the manufacturing process of a flat panel display is provided.
Moreover, it is a manufacturing method of the flat panel display using the glass substrate manufactured by the manufacturing method of the glass substrate for said display, Comprising: A display is a liquid crystal display, From the distortion point of the manufactured glass substrate, the manufacturing process of a liquid crystal display A method for manufacturing a flat panel display having a high heat treatment temperature is provided.
According to the present invention, a glass substrate for a flat panel display having a tensile or compressive residual stress can be manufactured.
Claims (9)
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの板幅方向の温度分布を、ガラス基板の周辺部の温度を中心部に比べて低い状態に操作し、
ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、基板の周囲に沿って圧縮の残留応力が入るようにし、基板の周囲に沿った偏差圧縮応力の最大値が0.5MPa以上であり、
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とするディスプレイ用のガラス基板の製造方法(但し、ガラス基板における圧縮の残留応力が20kg/cm2以上の場合を除く)。 A method of manufacturing a glass substrate for a display having a substantially rectangular surface shape with a short side of 500 mm or more, a plate thickness of 0.3 mm or more and 6 mm or less, and a plane stress of 0.1 MPa to 5 MPa,
The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the width direction of the glass ribbon in the slow cooling process after forming the glass ribbon is centered on the temperature at the periphery of the glass substrate. Operate to a lower state than the
Due to the residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the plate thickness direction causes the compressive residual stress to enter along the circumference of the substrate, and the maximum of the deviation compressive stress along the circumference of the substrate The value is 0.5 MPa or more,
A method of manufacturing a glass substrate for a display having a strain point of 570 ° C. or more for a plasma display and a strain point of 650 ° C. or more for a liquid crystal display panel (however, the compressive residual stress in the glass substrate is 20 kg / cm 2 or more) Except for.)
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの板幅方向の温度分布を、ガラス基板の周辺部の温度を中心部に比べて高い状態に操作し、
ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、基板の周囲に沿って引張の残留応力が入るようにし、基板の周囲に沿った偏差引張応力の最大値が0.57MPa以上であり、
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とするディスプレイ用のガラス基板の製造方法(但し、ガラス基板における引張の残留応力が20kg/cm2以上の場合を除く)。 A method of manufacturing a glass substrate for a display having a substantially rectangular surface shape with a short side of 500 mm or more, a plate thickness of 0.3 mm or more and 6 mm or less, and a plane stress of 0.1 MPa to 5 MPa,
The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the width direction of the glass ribbon in the slow cooling process after forming the glass ribbon is centered on the temperature at the periphery of the glass substrate. Operate to a higher state than the
Due to the residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the plate thickness direction is such that the tensile residual stress enters along the circumference of the substrate, and the maximum of the deviation tensile stress along the circumference of the substrate The value is 0.57 MPa or more,
A method for producing a glass substrate for a display having a strain point of 570 ° C. or higher for a plasma display and a strain point of 650 ° C. or higher for a liquid crystal display panel (however, the tensile residual stress in the glass substrate is 20 kg / cm 2 or higher) Except for.)
フロート法、フュージョン法、またはスリット・ダウンドロー法によりガラスリボンを連続形成し、ガラスリボンの成形後の徐冷工程におけるガラスリボンの流れと垂直な板幅方向の温度分布を、周辺部の温度を中心部に比べて低い状態に操作し、 The glass ribbon is continuously formed by the float method, fusion method, or slit down draw method, and the temperature distribution in the plate width direction perpendicular to the flow of the glass ribbon in the slow cooling process after forming the glass ribbon, Operate to a lower state than the center,
前記徐冷工程後のガラスリボンからガラス基板を切り出すことで、該ガラス基板内の残留歪による、板厚方向で測定したときの基板面内の偏差応力が、該ガラス基板の各辺の近傍において各辺と平行に圧縮の残留応力が入るようにし、 By cutting the glass substrate from the glass ribbon after the slow cooling step, due to residual strain in the glass substrate, the deviation stress in the substrate surface when measured in the thickness direction is in the vicinity of each side of the glass substrate. So that compressive residual stress enters parallel to each side,
プラズマディスプレイ用には歪点が570℃以上、液晶ディスプレイパネル用には歪点が650℃以上とし、 For plasma displays, the strain point is 570 ° C. or higher, and for liquid crystal display panels, the strain point is 650 ° C. or higher.
ガラス基板の各辺の近傍で各辺と平行方向での偏差圧縮応力の最大値が0.3MPa以上であって、The maximum value of the deviation compressive stress in the direction parallel to each side in the vicinity of each side of the glass substrate is 0.3 MPa or more,
前記ガラス基板の板厚から算出したたわみ量に対する実測たわみ量の減少量が0.4mm〜0.8mmである、ディスプレイ用のガラス基板の製造方法。 The manufacturing method of the glass substrate for displays whose reduction amount of the actual amount of deflection with respect to the amount of deflection computed from the board thickness of the glass substrate is 0.4 mm-0.8 mm.
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JP2011153248A JP5434977B2 (en) | 2011-07-11 | 2011-07-11 | Manufacturing method of glass substrate for display and manufacturing method of flat panel display |
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JP2011153248A JP5434977B2 (en) | 2011-07-11 | 2011-07-11 | Manufacturing method of glass substrate for display and manufacturing method of flat panel display |
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JP2009053738A Division JP5375213B2 (en) | 2009-03-06 | 2009-03-06 | Manufacturing method of glass substrate for display and manufacturing method of flat panel display |
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JP2011256107A JP2011256107A (en) | 2011-12-22 |
JP2011256107A5 true JP2011256107A5 (en) | 2013-07-25 |
JP5434977B2 JP5434977B2 (en) | 2014-03-05 |
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WO2014147730A1 (en) * | 2013-03-18 | 2014-09-25 | 富士通株式会社 | Package structure |
JP2023082982A (en) * | 2021-12-03 | 2023-06-15 | 日本電気硝子株式会社 | Method for manufacturing glass article |
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JPH065639B2 (en) * | 1985-12-23 | 1994-01-19 | ウシオ電機株式会社 | Light source |
JPH0612333B2 (en) * | 1988-09-20 | 1994-02-16 | 有限会社ユニオプト | Automatic birefringence measuring device |
JPH046444A (en) * | 1990-04-25 | 1992-01-10 | Hoya Corp | Method and apparatus for measuring photo-elastic constant |
JP2828604B2 (en) * | 1995-03-17 | 1998-11-25 | 有限会社ユニオプト | Birefringence measurement device |
JP4006747B2 (en) * | 1998-06-29 | 2007-11-14 | 日本電気硝子株式会社 | Display substrate manufacturing method |
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