JP2010188482A - Compound cloth for abrasive cloth, and abrasive cloth - Google Patents
Compound cloth for abrasive cloth, and abrasive cloth Download PDFInfo
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- JP2010188482A JP2010188482A JP2009036533A JP2009036533A JP2010188482A JP 2010188482 A JP2010188482 A JP 2010188482A JP 2009036533 A JP2009036533 A JP 2009036533A JP 2009036533 A JP2009036533 A JP 2009036533A JP 2010188482 A JP2010188482 A JP 2010188482A
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- 239000004744 fabric Substances 0.000 title claims abstract description 146
- 150000001875 compounds Chemical class 0.000 title abstract description 4
- 239000000835 fiber Substances 0.000 claims abstract description 69
- 229920000728 polyester Polymers 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 12
- 238000005498 polishing Methods 0.000 claims description 78
- 239000002131 composite material Substances 0.000 claims description 69
- 239000002759 woven fabric Substances 0.000 claims description 13
- 239000004745 nonwoven fabric Substances 0.000 claims description 7
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 6
- 239000006260 foam Substances 0.000 claims description 4
- 230000007547 defect Effects 0.000 abstract description 20
- 238000005299 abrasion Methods 0.000 abstract 1
- 238000009940 knitting Methods 0.000 description 24
- -1 polyethylene terephthalate Polymers 0.000 description 21
- 238000000034 method Methods 0.000 description 19
- 239000010410 layer Substances 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 15
- 229920000139 polyethylene terephthalate Polymers 0.000 description 13
- 239000005020 polyethylene terephthalate Substances 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005452 bending Methods 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 238000010030 laminating Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 239000006224 matting agent Substances 0.000 description 6
- 229920000747 poly(lactic acid) Polymers 0.000 description 6
- 239000004626 polylactic acid Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000008119 colloidal silica Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000009941 weaving Methods 0.000 description 4
- 229920001410 Microfiber Polymers 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 239000012760 heat stabilizer Substances 0.000 description 3
- 238000002074 melt spinning Methods 0.000 description 3
- 229920001707 polybutylene terephthalate Polymers 0.000 description 3
- 229920002215 polytrimethylene terephthalate Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- 239000013585 weight reducing agent Substances 0.000 description 3
- 229920005830 Polyurethane Foam Polymers 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000002788 crimping Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011496 polyurethane foam Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002781 deodorant agent Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 239000003230 hygroscopic agent Substances 0.000 description 1
- 239000000077 insect repellent Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005080 phosphorescent agent Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Woven Fabrics (AREA)
Abstract
Description
本発明は、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる、研磨布用複合布帛および研磨布に関する。 The present invention is excellent in handleability when attached to an apparatus and the like, can suppress the occurrence of defects (swells, scratches, etc.) on the surface of the object to be polished, and can provide excellent polishing efficiency. The present invention relates to a composite fabric and an abrasive fabric.
近年、各種情報機器の進展に伴い、磁気ディスク等の磁気記録媒体やシリコンウエハーは、さらなる記録容量の増大が望まれており、記録容量の増大につながる記録の高密度化を実現するべく、基板表面加工の一層の高精度仕上げが要求されている。例えば、ハードディスク装置に用いられる磁気記録媒体の基板としては、従来の長手磁気記録方式に代えて、現在磁気記録方式は、垂直磁気記録方式に移行しつつあり、基板となるアルミニウム、ガラスなどの表面をより高度に平滑化することが要求されており、そこで用いられる研磨布に対する要求もますます高くなってきている。用いる研磨布の特性に起因し、研磨した際に基板表面に欠点（うねりやスクラッチ傷など）を生じると、情報のリード／ライト時にエラーが発生してしまうおそれがある。
このため、被研磨物表面の欠点（スクラッチ）発生率を低減させるため、極細繊維を用いた研磨布が提案されている（例えば、特許文献１、特許文献２参照）。
In recent years, with the development of various information devices, magnetic recording media such as magnetic disks and silicon wafers are desired to have a further increase in recording capacity, and in order to achieve higher recording density that leads to an increase in recording capacity, There is a demand for higher precision surface finishing. For example, as a substrate of a magnetic recording medium used in a hard disk device, instead of the conventional longitudinal magnetic recording method, the current magnetic recording method is shifting to the perpendicular magnetic recording method, and the surface of aluminum, glass, or the like serving as the substrate Is required to be smoothed to a higher degree, and the demand for the polishing cloth used therefor is increasing. Due to the characteristics of the polishing cloth used, if a defect (such as undulation or scratches) occurs on the surface of the substrate during polishing, an error may occur when reading / writing information.
For this reason, in order to reduce the incidence of defects (scratches) on the surface of the object to be polished, polishing cloths using ultrafine fibers have been proposed (see, for example, Patent Document 1 and Patent Document 2).
しかしながら、かかる研磨布では、研磨布としての剛直性がなく、研磨装置に取り付ける際の取り扱い性に問題があり、かつ、研磨中において研磨布にシワが発生し、被研磨物表面に欠点（うねりやスクラッチ傷）を生じさせてしまうという問題があることが判明した。
なお、極細繊維を用いた研磨布は、例えば特許文献３などにより提案されている。
However, such an abrasive cloth has no rigidity as an abrasive cloth, and there is a problem in handling property when attached to a polishing apparatus, and wrinkles are generated in the abrasive cloth during polishing, and there are defects (undulations) on the surface of the object to be polished. And scratches).
Note that a polishing cloth using ultrafine fibers has been proposed, for example, in Patent Document 3.
本発明は上記の背景に鑑みなされたものであり、その目的は、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる、研磨布用複合布帛および研磨布を提供することにある。 The present invention has been made in view of the above-mentioned background, and the object thereof is excellent in handleability when attached to an apparatus and the like, and suppressing the occurrence of defects (swells, scratches, etc.) on the surface of the workpiece. Another object of the present invention is to provide a composite fabric for abrasive cloth and an abrasive cloth that can be further improved in polishing efficiency.
本発明者は上記の課題を達成するため鋭意検討した結果、極細繊維を含む布帛にシート状物を積層させて研磨布を得ることにより、研磨布の剛性が大きくなり、その結果、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られることを見出し、さらに鋭意検討を重ねることにより本発明を完成するに至った。 As a result of intensive studies to achieve the above-mentioned problems, the present inventor obtained a polishing cloth by laminating a sheet-like material on a cloth containing ultrafine fibers, thereby increasing the rigidity of the polishing cloth. By discovering that it has excellent handleability during mounting and can suppress the occurrence of defects (swells, scratches, etc.) on the surface of the workpiece, and that it offers superior polishing efficiency. The present invention has been completed.
かくして、本発明によれば「単繊維径５０〜１５００ｎｍのポリエステルマルチフィラメント糸Ａを含む布帛にシート状物が積層されてなる研磨布用複合布帛。」が提供される。 Thus, according to the present invention, there is provided a “composite fabric for abrasive cloth in which a sheet-like material is laminated on a cloth containing a polyester multifilament yarn A having a single fiber diameter of 50 to 1500 nm”.
その際、前記ポリエステルマルチフィラメント糸Ａのフィラメント数が１０００本以上であることが好ましい。また、前記ポリエステルマルチフィラメント糸Ａが、海成分と島成分とからなる海島型複合繊維の海成分を溶解除去して得られた糸条であることが好ましい。また、前記布帛に、他糸条として、単繊維径が１５００ｎｍより大のポリエステルマルチフィラメント糸Ｂが含まれることが好ましい。また、前記布帛が織物または編物であることが好ましい。また、前記シート状物が、織物または編物または不織布またはフィルムまたはウレタン樹脂発泡体であることが好ましい。また、複合布帛の厚さが０．０２〜１０ｍｍの範囲内であることが好ましい。また、複合布帛の曲げ強度が５０ｃＮ／ｍｍ２以上であることが好ましい。 At that time, the number of filaments of the polyester multifilament yarn A is preferably 1000 or more. The polyester multifilament yarn A is preferably a yarn obtained by dissolving and removing the sea component of a sea-island composite fiber composed of a sea component and an island component. Moreover, it is preferable that the polyester multifilament yarn B whose single fiber diameter is larger than 1500 nm is contained in the fabric as other yarns. The fabric is preferably a woven fabric or a knitted fabric. Moreover, it is preferable that the said sheet-like material is a woven fabric, a knitted fabric, a nonwoven fabric, a film, or a urethane resin foam. Moreover, it is preferable that the thickness of a composite fabric exists in the range of 0.02-10 mm. Moreover, it is preferable that the bending strength of the composite fabric is 50 cN / mm 2 or more.
また、本発明によれば、前記の研磨布用複合布帛を用いてなる、記録媒体のテキスチャリング用研磨布、記録媒体のポリッシング用研磨布、電子部品の仕上げ用研磨布、および電子部品のバフ研磨用研磨布からなる群より選択されるいずれかの研磨布が提供される。 In addition, according to the present invention, a polishing cloth for recording medium, a polishing cloth for polishing a recording medium, a polishing cloth for finishing an electronic component, and a buffing of an electronic component, each of which uses the above-described composite cloth for polishing cloth. Any polishing cloth selected from the group consisting of polishing cloths for polishing is provided.
本発明によれば、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる、研磨布用複合布帛および研磨布が得られる。 According to the present invention, it is excellent in handleability when attached to an apparatus, etc., and can suppress the occurrence of defects (swells, scratches, etc.) on the surface of the object to be polished, and further excellent polishing efficiency can be obtained. A composite fabric for cloth and an abrasive cloth are obtained.
以下、本発明の実施の形態について詳細に説明する。
まず、本発明において、ポリエステルマルチフィラメント糸Ａはその単繊維径（単繊維の直径）が５０〜１５００ｎｍ（好ましくは１００〜１０００ｎｍ、特に好ましくは４００〜８００ｎｍ）の範囲内であることが肝要である。かかる単繊維径を単糸繊度に換算すると、０．００００２〜０．０２２ｄｔｅｘに相当する。ここで、単繊維径が５０ｎｍ未満の場合には製造が困難となるだけでなく、繊維強度が低くなるため実用上好ましくない。逆に、単繊維径が１５００ｎｍを超える場合には、研磨布用布帛を研磨布として使用する際、被研磨物表面を高度に平坦化することができず好ましくない。なお、単繊維の断面形状が丸断面以外の異型断面である場合には外接円の直径を単繊維径とする。また、単繊維径は、透過型電子顕微鏡で繊維の横断面を撮影することにより測定が可能である。
Hereinafter, embodiments of the present invention will be described in detail.
First, in the present invention, it is important that the polyester multifilament yarn A has a single fiber diameter (single fiber diameter) in the range of 50 to 1500 nm (preferably 100 to 1000 nm, particularly preferably 400 to 800 nm). . When such a single fiber diameter is converted into a single yarn fineness, it corresponds to 0.00002 to 0.022 dtex. Here, when the single fiber diameter is less than 50 nm, not only the production becomes difficult, but also the fiber strength is lowered, which is not practically preferable. On the other hand, when the single fiber diameter exceeds 1500 nm, the surface of the object to be polished cannot be highly flattened when the cloth for polishing cloth is used as the polishing cloth, which is not preferable. In addition, when the cross-sectional shape of the single fiber is an atypical cross section other than the round cross section, the diameter of the circumscribed circle is defined as the single fiber diameter. The single fiber diameter can be measured by photographing the cross section of the fiber with a transmission electron microscope.
かかるポリエステルマルチフィラメント糸Ａにおいて、フィラメント数は特に限定されないが、１０００以上（より好ましくは２０００〜１００００）であることが好ましい。また、ポリエステルマルチフィラメント糸Ａの総繊度（単繊維繊度とフィラメント数との積）としては、５〜２００ｄｔｅｘの範囲内であることが好ましい。 In the polyester multifilament yarn A, the number of filaments is not particularly limited, but is preferably 1000 or more (more preferably 2000 to 10000). Further, the total fineness of the polyester multifilament yarn A (product of the single fiber fineness and the number of filaments) is preferably in the range of 5 to 200 dtex.
かかるポリエステルマルチフィラメント糸Ａを形成するポリマーは、艶消し剤の含有率がポリエステル重量対比１．０重量％以下（より好ましくは０．５重量％以下、特に好ましくは０重量％）のポリエステルであることが好ましい。艶消し剤がポリエステル重量対比１．０重量％より多くポリエステル中に含まれていると、研磨布を用いて被研磨物を研磨した際に、被研磨物表面に欠点（スクラッチ）が発生しやすくなるおそれがある。また、ポリエステルの種類としては、ポリエチレンテレフタレートやポリトリメチレンテレフタレート、ポリブチレンテレフタレート、ステレオコンプレックスポリ乳酸、ポリ乳酸、第３成分を共重合させたポリエステルなどが好ましく例示される。なお、前記の艶消し剤とは二酸化チタンのことであり、二酸化チタンは無機微粒子の１種である。かかる二酸化チタンの含有量は、蛍光Ｘ線（例えば、リガク電機工業（株）社製ＺＳＸ１００ｅ）を用いる方法や、溶媒を用いてポリエステルを溶かす方法などにより測定をすることができる。 The polymer forming the polyester multifilament yarn A is a polyester having a matting agent content of 1.0% by weight or less (more preferably 0.5% by weight or less, particularly preferably 0% by weight) relative to the weight of the polyester. It is preferable. If the matting agent is contained in the polyester in an amount greater than 1.0% by weight relative to the weight of the polyester, defects (scratches) are likely to occur on the surface of the object to be polished when the object is polished with an abrasive cloth. There is a risk. Moreover, as a kind of polyester, polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, stereocomplex polylactic acid, polylactic acid, polyester copolymerized with a third component, and the like are preferably exemplified. The matting agent is titanium dioxide, and titanium dioxide is a kind of inorganic fine particles. The titanium dioxide content can be measured by a method using fluorescent X-rays (for example, ZSX100e manufactured by Rigaku Electric Industry Co., Ltd.) or a method of dissolving polyester using a solvent.
また、前記ポリマー中には、本発明の目的を損なわない範囲内で必要に応じて、カチオン染料可染剤、着色防止剤、熱安定剤が１種または２種以上含まれていてもよいが無機微粒子の含有率がポリエステル重量対比１．０重量％以下であることが好ましい。 The polymer may contain one or more cationic dyes, colorants, and heat stabilizers as necessary within the range not impairing the object of the present invention. The content of the inorganic fine particles is preferably 1.0% by weight or less with respect to the polyester weight.
前記ポリエステルマルチフィラメント糸Ａの繊維形態は特に限定されず、通常の空気加工、仮撚捲縮加工が施されていてもさしつかえない。また、空気混繊または合撚糸または複合仮撚により他の糸条との複合糸として織物に含まれていてもよい。 The fiber form of the polyester multifilament yarn A is not particularly limited, and normal air processing or false twist crimping may be applied. Further, it may be contained in the woven fabric as a composite yarn with other yarn by air-mixed fiber, synthetic twisted yarn or composite false twist.
本発明において、研磨層となる布帛は前記ポリエステルマルチフィラメント糸Ａのみで構成されていてもよいが、前記ポリエステルマルチフィラメント糸Ａ以外に他糸条として、単繊維径が１５００ｎｍより大のポリエステルマルチフィラメント糸Ｂが含まれることが好ましい。その際、該ポリエステルマルチフィラメント糸Ｂはその単繊維径が３μｍ以上（より好ましくは３〜３０μｍ）の範囲内であることが好ましい。該単繊維径が３μｍよりも小さいと、布帛の圧縮剛さが小さくなるため、被研磨物表面の欠点（スクラッチ）が発生しやすくなるおそれがある。ここで、単繊維の断面形状が丸断面以外の異型断面である場合には、外接円の直径を単繊維径とする。なお、単繊維径は、前記と同様、透過型電子顕微鏡で繊維の横断面を撮影することにより測定が可能である。 In the present invention, the fabric that becomes the polishing layer may be composed only of the polyester multifilament yarn A, but in addition to the polyester multifilament yarn A, the polyester multifilament having a single fiber diameter of more than 1500 nm is used as another yarn. Yarn B is preferably included. At that time, the polyester multifilament yarn B preferably has a single fiber diameter in the range of 3 μm or more (more preferably 3 to 30 μm). If the single fiber diameter is smaller than 3 μm, the compressive stiffness of the fabric becomes small, so that a defect (scratch) on the surface of the object to be polished tends to occur. Here, when the cross-sectional shape of the single fiber is an atypical cross section other than the round cross section, the diameter of the circumscribed circle is defined as the single fiber diameter. The single fiber diameter can be measured by photographing the cross section of the fiber with a transmission electron microscope, as described above.
前記ポリエステルマルチフィラメント糸Ｂにおいて、フィラメント数は特に限定されないが、１０〜３００本（好ましくは３０〜１５０本）の範囲内であることが好ましい。また、かかるポリエステルマルチフィラメント糸Ｂの繊維形態は特に限定されないが、長繊維（マルチフィラメント糸）であることが好ましい。単繊維の断面形状も特に限定されず、丸、三角、扁平、中空など公知の断面形状でよい。また、通常の空気加工、仮撚捲縮加工が施されていてもさしつかえない。 In the polyester multifilament yarn B, the number of filaments is not particularly limited, but is preferably in the range of 10 to 300 (preferably 30 to 150). The fiber form of the polyester multifilament yarn B is not particularly limited, but is preferably a long fiber (multifilament yarn). The cross-sectional shape of the single fiber is not particularly limited, and may be a known cross-sectional shape such as a circle, a triangle, a flat shape, or a hollow shape. In addition, normal air processing and false twist crimping may be applied.
前記ポリエステルマルチフィラメント糸Ｂを形成するポリマー形成するポリマーは、艶消し剤の含有率がポリエステル重量対比１．０重量％以下（より好ましくは０．５重量％以下、特に好ましくは０重量％）のポリエステルであることが好ましい。艶消し剤がポリエステル重量対比１．０重量％より多くポリエステル中に含まれていると、研磨布を用いて被研磨物を研磨した際に、被研磨物表面に欠点（スクラッチ）が発生しやすくなるおそれがある。また、ポリエステルの種類としては、ポリエステル系ポリマーであれば特に限定されず、ポリエチレンテレフタレートやポリトリメチレンテレフタレート、ポリブチレンテレフタレート、ステレオコンプレックスポリ乳酸、ポリ乳酸、第３成分を共重合させたポリエステルなどが好ましく例示される。かかるポリエステルとしては、マテリアルリサイクルまたはケミカルリサイクルされたポリエステルであってもよい。さらには、特開２００４−２７００９７号公報や特開２００４−２１１２６８号公報に記載されているような、特定のリン化合物およびチタン化合物を含む触媒を用いて得られたポリエステルでもよい。該ポリマー中には、本発明の目的を損なわない範囲内で必要に応じて、カチオン染料可染剤、着色防止剤、熱安定剤が１種または２種以上含まれていてもよいが、無機微粒子の含有率がポリエステル重量対比１．０重量％以下であることが好ましい。 The polymer forming the polyester multifilament yarn B has a matting agent content of 1.0% by weight or less (more preferably 0.5% by weight or less, particularly preferably 0% by weight) relative to the polyester weight. Polyester is preferred. If the matting agent is contained in the polyester in an amount greater than 1.0% by weight relative to the weight of the polyester, defects (scratches) are likely to occur on the surface of the object to be polished when the object is polished with an abrasive cloth. There is a risk. In addition, the type of polyester is not particularly limited as long as it is a polyester polymer, and examples thereof include polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, stereocomplex polylactic acid, polylactic acid, and polyester obtained by copolymerizing a third component. Preferably exemplified. Such polyester may be material recycled or chemically recycled polyester. Furthermore, the polyester obtained using the catalyst containing the specific phosphorus compound and titanium compound which are described in Unexamined-Japanese-Patent No. 2004-270097 and 2004-2111268 may be sufficient. The polymer may contain one or more cationic dyes, dyeing agents, and heat stabilizers as necessary within the range not impairing the object of the present invention. The content of the fine particles is preferably 1.0% by weight or less with respect to the polyester weight.
本発明において、研磨層となる布帛の組織は特に限定されないが、編物または織物が好ましい。その際、編物の編組織としては、例えば、よこ編組織としては、平編、ゴム編、両面編、パール編、タック編、浮き編、片畔編、レース編、添え毛編等が例示され、たて編組織としては、シングルデンビー編、シングルアトラス編、ダブルコード編、ハーフ編、ハーフベース編、サテン編、ハーフトリコット編、裏毛編、ジャガード編等などが例示される。層数も単層でもよいし、２層以上の多層でもよい。なかでも、前記のような伸度を得る上で、たて編組織が好ましい。また、層数を２層以上の多層構造とし、多層のうち１層または２層を前記ポリエステルマルチフィラメント糸Ａで構成し、他の層を前記ポリエステルマルチフィラメント糸Ｂで構成することは好ましいことである。また、織物の織組織としては、例えば、平織、斜文織、サテン織物等の三原組織、変化組織、変化斜文織等の変化組織、たて二重織、よこ二重織等の片二重組織、たてビロードなどが例示される。層数も単層でもよいし、２層以上の多層でもよい。 In the present invention, the structure of the fabric to be the polishing layer is not particularly limited, but a knitted fabric or a woven fabric is preferable. In this case, examples of the knitting structure of the knitted fabric include flat knitting, rubber knitting, double-sided knitting, pearl knitting, tack knitting, floating knitting, one-side knitting, lace knitting, splicing knitting, and the like. Examples of the warp knitting structure include single denby knitting, single atlas knitting, double cord knitting, half knitting, half base knitting, satin knitting, half tricot knitting, back hair knitting, jacquard knitting and the like. The number of layers may be a single layer or a multilayer of two or more layers. Of these, a warp knitted structure is preferable in obtaining the above-described elongation. Further, it is preferable that the number of layers is a multilayer structure of two or more layers, and one or two of the multilayers are constituted by the polyester multifilament yarn A and the other layers are constituted by the polyester multifilament yarn B. is there. The woven structure of the woven fabric is, for example, a three-layered structure such as plain weave, oblique weave, satin woven fabric, etc. Examples include heavy tissue, fresh velvet, and the like. The number of layers may be a single layer or a multilayer of two or more layers.
また、前記の布帛の織編密度は特に限定されないが、編物であれば、３０コース／２．５４ｃｍ以上（より好ましくは３０〜１４０コース／２．５４ｃｍ）かつ２０ウエール／２．５４ｃｍ以上（より好ましくは２０〜１１０ウエール／２．５４ｃｍ）であることが好ましい。また、布帛が織物の場合、カバーファクターＣＦが２０００〜４５００（より好ましくは２５００〜４０００）の範囲であることが被研磨物に微細な溝を形成する上で好ましい。カバーファクターが２０００未満であると、研磨布用織物に研磨剤を付与した際、分散性が不十分となり被研磨物に微細な溝を形成するのが困難となるおそれがある。逆に、カバーファクターが４５００よりも大きいと、剛性が高くなりすぎ被研磨物に微細な溝を形成するのが困難となるおそれがある。なお、本発明でいうカバーファクターＣＦは下記の式により表されるものである。
ＣＦ＝（ＤＷｐ／１．１）１／２×ＭＷｐ＋（ＤＷｆ／１．１）１／２×ＭＷｆ
［ＤＷｐは経糸総繊度（ｄｔｅｘ）、ＭＷｐは経糸織密度（本／２．５４ｃｍ）、ＤＷｆは緯糸総繊度（ｄｔｅｘ）、ＭＷｆは緯糸織密度（本／２．５４ｃｍ）である。］
Further, the woven / knitted density of the fabric is not particularly limited. However, in the case of a knitted fabric, 30 courses / 2.54 cm or more (more preferably 30 to 140 courses / 2.54 cm) and 20 wales / 2.54 cm or more (more It is preferably 20 to 110 wales / 2.54 cm). Further, when the fabric is a woven fabric, the cover factor CF is preferably in the range of 2000 to 4500 (more preferably 2500 to 4000) in order to form fine grooves on the object to be polished. When the cover factor is less than 2000, when an abrasive is applied to the fabric for polishing cloth, dispersibility becomes insufficient, and it may be difficult to form fine grooves in the object to be polished. On the other hand, if the cover factor is larger than 4500, the rigidity becomes too high and it may be difficult to form fine grooves in the object to be polished. The cover factor CF in the present invention is represented by the following formula.
CF = (DWp / 1.1) 1/2 × MWp + (DWf / 1.1) 1/2 × MWf
[DWp is the total warp fineness (dtex), MWp is the warp weave density (main / 2.54 cm), DWf is the total weft fineness (dtex), and MWf is the weft weave density (main / 2.54 cm). ]
また、布帛において、厚みが０．１５〜１．０ｍｍ（より好ましくは０．１７〜０．９０ｍｍ）の範囲内であることが好ましい。該厚みが０．１５ｍｍよりも小さいと、クッション性が低くなり被研磨物表面に欠点（スクラッチ）を発生させやすくなるおそれがある。逆に厚みが１．０ｍｍよりも大きいと作業性が低下するおそれがある。 In the fabric, the thickness is preferably in the range of 0.15 to 1.0 mm (more preferably 0.17 to 0.90 mm). When the thickness is less than 0.15 mm, the cushioning property is lowered and there is a possibility that defects (scratches) are likely to be generated on the surface of the object to be polished. Conversely, if the thickness is greater than 1.0 mm, workability may be reduced.
前記の布帛は、例えば、以下の製造方法により製造することができる。まず、海成分と、ポリエステルからなりその径が１０〜１５００ｎｍである島成分とで形成される海島型複合繊維（ポリエステルマルチフィラメント糸Ａ用繊維）を用意する。かかる海島型複合繊維としては、特開２００７−２３６４号公報に開示された海島型複合繊維マルチフィラメント（島数１００〜１５００）が好ましく用いられる。 The fabric can be manufactured, for example, by the following manufacturing method. First, a sea-island type composite fiber (polyester multifilament yarn A fiber) formed of a sea component and an island component made of polyester and having a diameter of 10 to 1500 nm is prepared. As such a sea-island type composite fiber, a sea-island type composite fiber multifilament (100 to 1500 islands) disclosed in Japanese Patent Application Laid-Open No. 2007-2364 is preferably used.
すなわち、海成分ポリマーとしては、繊維形成性の良好なポリエステル、ポリアミド、ポリスチレン、ポリエチレンなどが好ましい。例えば、アルカリ水溶液易溶解性ポリマーとしては、ポリ乳酸、超高分子量ポリアルキレンオキサイド縮合系ポリマー、ポリエチレングルコール系化合物共重合ポリエステル、ポリエチレングリコール系化合物と５−ナトリウムスルホン酸イソフタル酸の共重合ポリエステルが好適である。なかでも、５−ナトリウムスルホイソフタル酸６〜１２モル％と分子量４０００〜１２０００のポリエチレングルコールを３〜１０重量％共重合させた固有粘度が０．４〜０．６のポリエチレンテレフタレート系共重合ポリエステルが好ましい。 That is, as the sea component polymer, polyester, polyamide, polystyrene, polyethylene and the like having good fiber forming properties are preferable. For example, as an easily soluble polymer in an alkaline aqueous solution, polylactic acid, an ultra-high molecular weight polyalkylene oxide condensation polymer, a polyethylene glycol compound copolymer polyester, a copolymer polyester of polyethylene glycol compound and 5-sodium sulfonic acid isophthalic acid may be used. Is preferred. Among them, a polyethylene terephthalate copolymer polyester having an intrinsic viscosity of 0.4 to 0.6 obtained by copolymerizing 6 to 12 mol% of 5-sodium sulfoisophthalic acid and 3 to 10% by weight of polyethylene glycol having a molecular weight of 4000 to 12000. Is preferred.
一方、島成分ポリマーは、繊維形成性の良好なポリエチレンテレフタレートやポリトリメチレンテレフタレート、ポリブチレンテレフタレート、ポリ乳酸、第３成分を共重合させたポリエステルなどのポリエステルが好ましい。該ポリマー中には、本発明の目的を損なわない範囲内で必要に応じて、微細孔形成剤、カチオン染料可染剤、着色防止剤、熱安定剤、蛍光増白剤、艶消し剤、着色剤、吸湿剤、無機微粒子が１種または２種以上含まれていてもよい。 On the other hand, the island component polymer is preferably a polyester such as polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, polylactic acid, or polyester obtained by copolymerizing a third component, which has good fiber-forming properties. In the polymer, a fine pore forming agent, a cationic dye dyeing agent, an anti-coloring agent, a heat stabilizer, a fluorescent whitening agent, a matting agent, a coloring agent may be added as necessary within the range not impairing the object of the present invention. 1 type (s) or 2 or more types of an agent, a hygroscopic agent, and inorganic fine particles may be contained.
上記の海成分ポリマーと島成分ポリマーからなる海島型複合繊維は、溶融紡糸時における海成分の溶融粘度が島成分ポリマーの溶融粘度よりも大きいことが好ましい。また、島成分の径は、１０〜１５００ｎｍの範囲とする必要がある。その際、島成分の形状が真円でない場合は外接円の直径を求める。前記の海島型複合繊維において、その海島複合重量比率（海：島）は、４０：６０〜５：９５の範囲が好ましく、特に３０：７０〜１０：９０の範囲が好ましい。 The sea-island composite fiber composed of the sea component polymer and the island component polymer preferably has a sea component melt viscosity higher than that of the island component polymer during melt spinning. Further, the diameter of the island component needs to be in the range of 10 to 1500 nm. At this time, if the shape of the island component is not a perfect circle, the diameter of the circumscribed circle is obtained. In the sea-island composite fiber, the sea-island composite weight ratio (sea: island) is preferably in the range of 40:60 to 5:95, and particularly preferably in the range of 30:70 to 10:90.
かかる海島型複合繊維マルチフィラメント糸は、例えば以下の方法により容易に製造することができる。すなわち、前記の海成分ポリマーと島成分ポリマーとを用い溶融紡糸する。溶融紡糸に用いられる紡糸口金としては、島成分を形成するための中空ピン群や微細孔群を有するものなど任意のものを用いることができる。吐出された海島型断面複合繊維マルチフィラメント糸は、冷却風によって固化され、好ましくは４００〜６０００ｍ／分で溶融紡糸された後に巻き取られる。得られた未延伸糸は、別途延伸工程をとおして所望の強度・伸度・熱収縮特性を有する複合繊維とするか、あるいは、一旦巻き取ることなく一定速度でローラーに引き取り、引き続いて延伸工程をとおした後に巻き取る方法のいずれでも構わない。かかる海島型複合繊維マルチフィラメント糸において、単糸繊維繊度、フィラメント数、総繊度としてはそれぞれ単糸繊維繊度０．５〜１０．０ｄｔｅｘ、フィラメント数５〜７５本、総繊３０〜１７０ｄｔｅｘの範囲内であることが好ましい。また、かかる海島型複合繊維マルチフィラメント糸の沸水収縮率としては５〜３０％の範囲内であることが好ましい。 Such a sea-island type composite fiber multifilament yarn can be easily manufactured, for example, by the following method. That is, melt spinning is performed using the sea component polymer and the island component polymer. As the spinneret used for melt spinning, any one such as a hollow pin group for forming an island component or a group having a fine hole group can be used. The discharged sea-island type cross-section composite fiber multifilament yarn is solidified by cooling air, and is preferably wound after being melt spun at 400 to 6000 m / min. The obtained undrawn yarn is made into a composite fiber having desired strength, elongation, and heat shrinkage properties through a separate drawing process, or is taken up by a roller at a constant speed without being wound once, and subsequently drawn. Any of the methods of winding after passing through may be used. In such a sea-island type composite fiber multifilament yarn, the single yarn fiber fineness, the number of filaments, and the total fineness are within the range of single yarn fiber fineness of 0.5 to 10.0 dtex, the number of filaments of 5 to 75, and the total fiber of 30 to 170 dtex, respectively. It is preferable that Further, the boiling water shrinkage of such sea-island type composite fiber multifilament yarn is preferably in the range of 5 to 30%.
一方、必要に応じて、単繊維繊度が０．１ｄｔｅｘ以上（好ましくは０．１〜５０ｄｔｅｘ）であるポリエステルマルチフィラメント糸Ｂを用意する。最終的に得られる生地内のフィラメント糸Ｂの単繊維径を１５００ｎｍより大とする上で、単繊維繊度を前記の範囲内とすることが好ましい。 On the other hand, if necessary, a polyester multifilament yarn B having a single fiber fineness of 0.1 dtex or more (preferably 0.1 to 50 dtex) is prepared. In order to make the single fiber diameter of the filament yarn B in the finally obtained fabric larger than 1500 nm, it is preferable that the single fiber fineness is within the above range.
次いで、前記海島型複合繊維マルチフィラメント糸と、必要に応じてポリエステルマルチフィラメント糸Ｂとを用いて布帛を織編成する。その際、前記海島型複合繊維フィラメント糸とポリエステルマルチフィラメント糸Ｂとの総繊度比としては、９０：１０〜２０：８０の範囲内であることが好ましい。なお、製織編する際に用いる織編機を限定されず通常のものでよい。 Next, a fabric is knitted using the sea-island type composite fiber multifilament yarn and, if necessary, the polyester multifilament yarn B. At that time, the total fineness ratio of the sea-island composite fiber filament yarn and the polyester multifilament yarn B is preferably in the range of 90:10 to 20:80. The weaving and knitting machine used for weaving and knitting is not limited and may be a normal one.
次いで、前記の布帛にアルカリ水溶液処理を施し、前記海島型複合繊維の海成分をアルカリ水溶液で溶解除去することにより、海島型複合繊維フィラメント糸を単繊維径が１０〜１５００ｎｍのフィラメント糸Ａとする。その際、アルカリ水溶液処理の条件としては、濃度３〜４％のＮａＯＨ水溶液を使用し５５〜６５℃の温度で処理するとよい。 Next, the fabric is subjected to an alkaline aqueous solution treatment, and sea components of the sea-island composite fiber are dissolved and removed with an alkaline aqueous solution, whereby the sea-island composite fiber filament yarn is changed to a filament yarn A having a single fiber diameter of 10 to 1500 nm. . At that time, the alkaline aqueous solution treatment may be performed at a temperature of 55 to 65 ° C. using a 3 to 4% NaOH aqueous solution.
ここで、前記アルカリ水溶液による溶解除去の前および／または後に、あるいは、前記熱セットの前および／または後に編物に染色加工を施してもよい。カレンダー加工（加熱加圧加工）やエンボス加工を施してもよい。さらに、常法の起毛加工、撥水加工、さらには、紫外線遮蔽あるいは制電剤、抗菌剤、消臭剤、防虫剤、蓄光剤、再帰反射剤、マイナスイオン発生剤等の機能を付与する各種加工を付加適用してもよい。 Here, the knitted fabric may be dyed before and / or after the dissolution with the alkaline aqueous solution, or before and / or after the heat setting. You may give a calendar process (heat-pressing process) and an embossing. Furthermore, conventional brushing processing, water repellent processing, and various functions that provide functions such as ultraviolet ray shielding or antistatic agents, antibacterial agents, deodorants, insect repellents, phosphorescent agents, retroreflective agents, negative ion generators, etc. Processing may be additionally applied.
本発明の研磨布用複合布帛は前記の布帛のどちらか一方の面にシート状物を積層してなる二層構造複合布帛である。このように、布帛にシート状物を積層することにより、複合布帛の剛性が向上し、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる。 The composite fabric for abrasive cloth according to the present invention is a two-layer structure composite fabric obtained by laminating a sheet-like material on either side of the above-mentioned fabric. Thus, by laminating a sheet-like material on the fabric, the rigidity of the composite fabric is improved, it is easy to handle when attached to an apparatus, etc., and defects (swells, scratches, etc.) on the surface of the object to be polished are generated. And further excellent polishing efficiency can be obtained.
ここで、前記シート状物が、織物または編物または不織布またはフィルムまたはウレタン樹脂発泡体であることが好ましい。その際、織物、編物、不織布を構成する繊維としては、ポリエチレンテレフタレートなどのポリエステルからなるポリエステル繊維が好ましい。また、前記フィルムを形成する樹脂としてはポリエチレンテレフタレートが好ましい。かかるフィルムには、コーティングなどにより形成した樹脂層も含まれる。また、前記シート状物は、織物または編物または不織布またはフィルムまたはウレタン樹脂発泡体の複合体でもよい。前記布帛に前記シート状物を積層する方法は特に限定されず、熱ロールラミネート法により熱接着する方法、接着剤を用いる方法、樹脂をコーティングする方法などが例示される。 Here, the sheet-like product is preferably a woven fabric, a knitted fabric, a nonwoven fabric, a film, or a urethane resin foam. In that case, as a fiber which comprises a textile fabric, a knitted fabric, and a nonwoven fabric, the polyester fiber which consists of polyesters, such as a polyethylene terephthalate, is preferable. The resin forming the film is preferably polyethylene terephthalate. Such a film includes a resin layer formed by coating or the like. The sheet-like material may be a woven fabric, a knitted fabric, a nonwoven fabric, a film, or a composite of urethane resin foam. The method for laminating the sheet-like material on the fabric is not particularly limited, and examples thereof include a method of heat bonding by a hot roll laminating method, a method using an adhesive, and a method of coating a resin.
かくして得られた複合布帛において、厚さが０．０２〜１０ｍｍの範囲内であることが好ましい。厚さが０．０２ｍｍよりも小さいと、複合布帛としての剛性が大きくならず、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率を有する研磨布が得られないおそれがある。逆に、布帛の厚さが１０ｍｍよりも大きいと、複合布帛としての剛性が大きくなりすぎて、かえって取扱い性が損われるおそれがある。その際、かかる複合布帛の、タテ方向またはヨコ方向またはななめ方向のうち、少なくとも一方向の曲げ強度が５０ｃＮ／ｍｍ２以上であることが好ましい。特に、タテ方向およびヨコ方向の曲げ強度が５０ｃＮ／ｍｍ２以上であることが好ましい。なお、かかる曲げ強度はＪＩＳ Ｋ ６９１１ ５．１７に従って測定するものとする。 The composite fabric thus obtained preferably has a thickness in the range of 0.02 to 10 mm. If the thickness is less than 0.02 mm, the rigidity as a composite fabric will not increase, it will be easy to handle when attached to a device, etc., and it will suppress the occurrence of defects (swells, scratches, etc.) on the surface of the workpiece. Further, there is a possibility that a polishing cloth having a further excellent polishing efficiency cannot be obtained. On the contrary, when the thickness of the fabric is larger than 10 mm, the rigidity as the composite fabric becomes too large, and the handling property may be deteriorated. At this time, it is preferable that the bending strength of at least one direction of the composite fabric is 50 cN / mm 2 or more among the vertical direction, the horizontal direction, or the tanning direction. In particular, the bending strength in the vertical direction and the horizontal direction is preferably 50 cN / mm 2 or more. The bending strength is measured according to JIS K 6911 5.17.
次に、本発明の研磨布は、前記研磨布用複合布帛を用いてなる、磁気デイスクや光デイスクなど記録媒体のテキスチャリング用研磨布、記録媒体のポリッシング用研磨布、電子部品の仕上げ用研磨布、および電子部品のバフ研磨用研磨布からなる群より選択されるいずれかの研磨布である。かかる研磨布によれば、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる。 Next, the polishing cloth of the present invention is a polishing cloth for texturing of recording media such as a magnetic disk and an optical disk, a polishing cloth for polishing of a recording medium, and polishing for finishing electronic parts, using the composite cloth for polishing cloth. Any polishing cloth selected from the group consisting of a cloth and a polishing cloth for buffing an electronic component. According to such a polishing cloth, it is excellent in handleability when attached to an apparatus or the like, can suppress the occurrence of defects (swells, scratches, etc.) on the surface of the object to be polished, and further excellent polishing efficiency can be obtained.
（１）単繊維径と繊維径の均一性
透過型電子顕微鏡（ＴＥＭ）で繊維の横断面を撮影することにより測定した。ｎ数５で測定しその平均値を求め、その最大値と最小値の幅が平均値の５０％より小さいものを「繊維径の均一性良好」とした。
（２）複合布帛の厚さ
ＪＩＳ Ｌ １０１８ ８．５に従って複合布帛の厚みを測定した。
（３）複合布帛の曲げ強度
ＪＩＳ Ｋ ６９１１ ５．１７に従って複合布帛の曲げ強度を測定した。
（４）研磨能率
シリコンウエハに対し、研磨剤に０．０３５μｍのコロイダルシリカ砥粒を５重量％含んでいるスラリーを１２ｍｌ／ｍｉｎで滴下しながら、定盤回転数８０ｒｐｍ、加圧２００ｇｆ／ｃｍ２で１０分間ポリッシュ加工した際の、シリコンウエハの重量低下量により測定した。０．４μｍ／ｍｉｎ以上であれば合格とする。
(1) Single fiber diameter and uniformity of fiber diameter It was measured by photographing the cross section of the fiber with a transmission electron microscope (TEM). The average value obtained by measuring with n number of 5 was obtained, and the one whose width between the maximum value and the minimum value was smaller than 50% of the average value was defined as “good fiber diameter uniformity”.
(2) Thickness of composite fabric The thickness of the composite fabric was measured according to JIS L 1018 8.5.
(3) Bending strength of composite fabric The bending strength of the composite fabric was measured in accordance with JIS K 6911 5.17.
(4) Polishing efficiency While a slurry containing 5% by weight of a colloidal silica abrasive of 0.035 μm in a polishing agent is dropped onto a silicon wafer at 12 ml / min, a platen rotation speed of 80 rpm and a pressure of 200 gf / cm 2 Measured by the amount of weight reduction of the silicon wafer when polished for 10 minutes. If it is 0.4 μm / min or more, it is considered acceptable.
［実施例１］
島成分としてポリエチレンテレフタレート、海成分として５−ナトリウムスルホイソフタル酸９モル％と数平均分子量４０００のポリエチレングリコール３重量％を共重合したポリエチレンテレフタレートを用い、海：島＝３０：７０、島数＝８３６の海島型複合未延伸繊維を、紡糸温度２８０℃、紡糸速度１５００ｍ／分で溶融紡糸して一旦巻き取った。得られた未延伸糸を、延伸温度８０℃、延伸倍率２．５倍でローラー延伸し、次いで１５０℃で熱セットして巻き取り、ポリエステルマルチフィラメント糸Ａ用糸条とした。得られた海島型複合延伸糸は５６ｄｔｅｘ／１０ｆｉｌであり、透過型電子顕微鏡ＴＥＭによる繊維横断面を観察したところ、島の形状は丸形状でかつ島の径は７００ｎｍであった。
[Example 1]
Using polyethylene terephthalate as the island component, polyethylene terephthalate copolymerized with 9% by mole of 5-sodium sulfoisophthalic acid and 3% by weight of polyethylene glycol having a number average molecular weight of 4000 as the sea component, sea: island = 30: 70, number of islands = 836 The sea-island type composite undrawn fiber was melt-spun at a spinning temperature of 280 ° C. and a spinning speed of 1500 m / min, and was wound up once. The obtained undrawn yarn was subjected to roller drawing at a drawing temperature of 80 ° C. and a draw ratio of 2.5 times, and then heat-set at 150 ° C. to wind up to obtain a polyester multifilament yarn A yarn. The obtained sea-island type composite drawn yarn was 56 dtex / 10 fil and the cross section of the fiber was observed with a transmission electron microscope TEM. As a result, the shape of the island was round and the diameter of the island was 700 nm.
次いで、２８ゲージの通常の経編機を使用して、前述の海島型複合延伸糸をフロント筬とミドル筬に用い、ポリエチレンテレフタレートからなるマルチフィラメント（３３ｄｔｅｘ／１２ｆｉｌ、ポリエステルマルチフィラメント糸Ｂ）をバック筬に用い、サテン組織（バック：１０／２１、ミドル：１０／３４、フロント：１０／３４による編方）によりサテン組織の経編生機を得た。次いで、該編物を５０℃にて湿熱処理した後、海島型複合延伸糸の海成分を除去するために、２．５％ＮａＯＨ水溶液で、５５℃にて２５％減量（アルカリ減量）した。その後、常法の染色仕上げ加工、湿熱加工、乾熱加工を行った。 Next, using a 28-gauge ordinary warp knitting machine, using the above-mentioned sea-island type composite drawn yarn for the front and middle folds, back the multifilament (33 dtex / 12fil, polyester multifilament yarn B) made of polyethylene terephthalate. A warp knitting machine having a satin structure was obtained by using a satin structure (back: 10/21, middle: 10/34, front: 10/34). Next, the knitted fabric was subjected to a wet heat treatment at 50 ° C., and then a 25% weight reduction (an alkali weight reduction) was performed at 55 ° C. with a 2.5% NaOH aqueous solution in order to remove sea components of the sea-island type composite drawn yarn. Thereafter, conventional dyeing finishing, wet heat processing, and dry heat processing were performed.
その後、該編物の裏面に、ポリエチレンテレフタレートからなる厚さ１００μｍ（０．１ｍｍ）のフィルム（帝人デュポンフィルム（株）製「メリネックス」）を、熱ロールラミネート法により、ウレタン樹脂溶剤系接着剤を用い、塗工量２８ｇ／ｍ２、プレス温度８０℃、プレス圧力２０００ｋｇｆ／ｃｍ、速度８ｍ／秒の条件で貼り合せて複合布帛（研磨層が編物、下地層がポリエチレンテレフタレートフィルムからなるシート状物）を得た。 Thereafter, a film of polyethylene terephthalate having a thickness of 100 μm (0.1 mm) (“Melinex” manufactured by Teijin DuPont Films Ltd.) is used on the back surface of the knitted fabric, and a urethane resin solvent-based adhesive is used by a hot roll laminating method. , A composite fabric (sheet-like material comprising a knitted abrasive layer and a polyethylene terephthalate film as an undercoat layer) bonded under the conditions of a coating amount of 28 g / m 2 , a press temperature of 80 ° C., a press pressure of 2000 kgf / cm, and a speed of 8 m / sec. Got.
得られた複合布帛において、ポリエステルマルチフィラメント糸Ａの平均単繊維径は７００ｎｍ、最大値と最小値の幅は平均繊維径に対し１５％であった。また、複合布帛の厚みは０．５６ｍｍであり、曲げ強度はタテ方向１１６ｃＮ／ｍｍ２、ヨコ方向１６０ｃＮ／ｍｍ２であった。
該複合布帛を直径３８０ｍｍの円形に裁断し、シリコンウエハのポリッシュ加工に適した研磨パッドとした。該研磨パッドを用い、研磨剤に０．０３５μｍのコロイダルシリカ砥粒を５重量％含んでいるスラリーを１２ｍｌ／ｍｉｎで滴下しながら、定盤回転数８０ｒｐｍ、加圧２００ｇｆ／ｃｍ２で１０分間ポリッシュ加工を実施した。研磨能率は０．６μｍ／ｍｉｎと良好であり、スクラッチ傷などの欠点が非常に少なかった。
In the obtained composite fabric, the average single fiber diameter of the polyester multifilament yarn A was 700 nm, and the width between the maximum value and the minimum value was 15% with respect to the average fiber diameter. The thickness of the composite fabric is 0.56 mm, the flexural strength longitudinal direction 116cN / mm 2, was transversely 160cN / mm 2.
The composite fabric was cut into a circle having a diameter of 380 mm to obtain a polishing pad suitable for polishing a silicon wafer. Polishing for 10 minutes at a platen rotational speed of 80 rpm and a pressure of 200 gf / cm 2 while using the polishing pad and dropping a slurry containing 5 wt% of 0.035 μm colloidal silica abrasive in the polishing agent at 12 ml / min. Processing was carried out. The polishing efficiency was as good as 0.6 μm / min, and there were very few defects such as scratches.
［実施例２］
実施例１と同様に編物を得た後、該編物の裏面に、厚さ１．５ｍｍの硬質ポリウレタン発泡体（ロデール・ニッタ社製の「ＭＨ−Ｓ１５Ａ」）を熱ロールラミネート法により、ウレタン樹脂溶剤系接着剤を用い、塗工量２８ｇ／ｍ２、プレス温度８０℃、プレス圧力２０００ｋｇｆ／ｃｍ、速度８ｍ／秒の条件で貼り合せ、研磨層が編物、下地層が硬質ポリウレタン発泡体からなる複合布帛を得た。
[Example 2]
After a knitted fabric was obtained in the same manner as in Example 1, a 1.5 mm thick hard polyurethane foam ("MH-S15A" manufactured by Rodel Nitta) was applied to the back surface of the knitted fabric by a hot roll laminating method. Using a solvent-based adhesive, bonding is performed under the conditions of a coating amount of 28 g / m 2 , a press temperature of 80 ° C., a press pressure of 2000 kgf / cm, and a speed of 8 m / sec, the polishing layer is a knitted fabric, and the base layer is made of a rigid polyurethane foam. A composite fabric was obtained.
得られた複合布帛において、フィラメント糸Ａの平均単繊維径は７００ｎｍ、最大値と最小値の幅は平均繊維径に対し１５％であり、複合布帛の厚みは１．９ｍｍであり、曲げ強度はタテ方向１９５ｃＮ／ｍｍ２、ヨコ方向２１０ｃＮ／ｍｍ２であった。
該複合布帛を直径３８０ｍｍの円形に裁断し、シリコンウエハのポリッシュ加工に適した研磨パッドとした。該研磨パッドを用い、研磨剤に０．０３５μｍのコロイダルシリカ砥粒を５重量％含んでいるスラリーを１２ｍｌ／ｍｉｎで滴下しながら、定盤回転数８０ｒｐｍ、加圧２００ｇｆ／ｃｍ２で１０分間ポリッシュ加工を実施した。研磨能率は０．５６μｍ／ｍｉｎと良好であり、スクラッチ傷などの欠点が非常に少なかった。
In the obtained composite fabric, the average single fiber diameter of the filament yarn A is 700 nm, the width between the maximum value and the minimum value is 15% with respect to the average fiber diameter, the thickness of the composite fabric is 1.9 mm, and the bending strength is The vertical direction was 195 cN / mm 2 and the horizontal direction was 210 cN / mm 2 .
The composite fabric was cut into a circle having a diameter of 380 mm to obtain a polishing pad suitable for polishing a silicon wafer. Polishing for 10 minutes at a platen rotational speed of 80 rpm and a pressure of 200 gf / cm 2 while using the polishing pad and dropping a slurry containing 5 wt% of 0.035 μm colloidal silica abrasive in the polishing agent at 12 ml / min. Processing was carried out. The polishing efficiency was as good as 0.56 μm / min, and there were very few defects such as scratches.
［実施例３］
実施例１と同様に海島型複合延伸糸５６ｄｔｅｘ／１０ｆｉｌを得た。次いで、該延伸糸２本と通常のポリエチレンテレフタレートからなるマルチフィラメント（３３ｄｔｅｘ／１２ｆｉｌ）とインターレース加工にて混繊糸を得た。
該混繊糸を３００回／ｍ（Ｓ方向）にて撚糸し、経糸に全量配し、一方、通常のポリエチレンテレフタレートからなるマルチフィラメント仮撚捲縮加工糸（５６ｄｔｅｘ／１４４ｆｉｌ）を２本引き揃え３００回／ｍ（Ｓ方向）にて合撚後、緯糸に全量配し、経密度１７１本／２．５４ｃｍ、緯密度６７本／２．５４ｃｍの織密度にて、通常の製織方法により５枚サテン組織の織物生機を得た。次いで、該織物を５０℃にて湿熱処理した後、海島型複合延伸糸の海成分を除去するために、２．５％ＮａＯＨ水溶液で、５５℃にて２０％減量（アルカリ減量）した。その後、常法の湿熱加工、乾熱加工を行った。
[Example 3]
In the same manner as in Example 1, 56 dtex / 10 fill of sea-island type composite drawn yarn was obtained. Next, a multifilament (33 dtex / 12 file) made of the two drawn yarns and ordinary polyethylene terephthalate and interlaced were used to obtain a mixed yarn.
The mixed yarn is twisted at 300 times / m (in the S direction), and all the warp yarns are arranged. Meanwhile, two multifilament false twisted crimped yarns (56 dtex / 144 fil) made of ordinary polyethylene terephthalate are aligned. After twisting at 300 times / m (S direction), all the wefts are distributed, and 5 sheets by a normal weaving method at a weaving density of warp density of 171 pieces / 2.54 cm and weft density of 67 pieces / 2.54 cm. A satin texture fabric was obtained. Next, the fabric was subjected to wet heat treatment at 50 ° C., and then a 20% reduction (alkali reduction) was performed at 55 ° C. with a 2.5% NaOH aqueous solution in order to remove the sea component of the sea-island type composite drawn yarn. Thereafter, conventional wet heat processing and dry heat processing were performed.
その後、該織物の裏面に、厚さ１．２７ｍｍのウレタン含浸不織布（ロデール・ニッタ社製の「ＳＵＢＡ６００」）を熱ロールラミネート法により、ウレタン樹脂溶剤系接着剤を用い、塗工量２８ｇ／ｍ２、プレス温度８０℃、プレス圧力２０００ｋｇｆ／ｃｍ、速度８ｍ／秒の条件で貼り合せ、研磨層が織物、下地層がウレタン含浸不織布からなる複合布帛を得た。 Thereafter, a urethane impregnated non-woven fabric (“SUBA600” manufactured by Rodel Nitta Co., Ltd.) having a thickness of 1.27 mm is applied to the back surface of the woven fabric by a hot roll laminating method using a urethane resin solvent-based adhesive and a coating amount of 28 g / m. 2. Bonding was performed under the conditions of a pressing temperature of 80 ° C., a pressing pressure of 2000 kgf / cm, and a speed of 8 m / sec to obtain a composite fabric in which the polishing layer was a woven fabric and the underlying layer was a urethane-impregnated non-woven fabric.
得られた複合布帛において、フィラメント糸Ａの平均単繊維径は７００ｎｍ、最大値と最小値の幅は平均繊維径に対し１７％であり、複合布帛の厚みは１．６ｍｍであり、曲げ強度はタテ方向７２ｃＮ／ｍｍ２、ヨコ方向７９ｃＮ／ｍｍ２であった。
該複合布帛を直径３８０ｍｍの円形に裁断し、シリコンウエハのポリッシュ加工に適した研磨パッドとした。該研磨パッドを用い、研磨剤に０．０３５μｍのコロイダルシリカ砥粒を５重量％含んでいるスラリーを１２ｍｌ／ｍｉｎで滴下しながら、定盤回転数８０ｒｐｍ、加圧２００ｇｆ／ｃｍ２で１０分間ポリッシュ加工を実施した。研磨能率は０．４８μｍ／ｍｉｎと良好であり、スクラッチ傷などの欠点が非常に少なかった。
In the obtained composite fabric, the average single fiber diameter of the filament yarn A is 700 nm, the width between the maximum value and the minimum value is 17% with respect to the average fiber diameter, the thickness of the composite fabric is 1.6 mm, and the bending strength is The vertical direction was 72 cN / mm 2 and the horizontal direction was 79 cN / mm 2 .
The composite fabric was cut into a circle having a diameter of 380 mm to obtain a polishing pad suitable for polishing a silicon wafer. Polishing for 10 minutes at a platen rotational speed of 80 rpm and a pressure of 200 gf / cm 2 while using the polishing pad and dropping a slurry containing 5 wt% of 0.035 μm colloidal silica abrasive in the polishing agent at 12 ml / min. Processing was carried out. The polishing efficiency was as good as 0.48 μm / min, and there were very few defects such as scratches.
［比較例１］
実施例１と同様に編物を得た後、そのまま該編物を直径３８０ｍｍの円形に裁断し、シリコンウエハのポリッシュ加工に適した研磨パッドとした。得られた研磨パッドにおいて、フィラメント糸Ａの平均単繊維径は７００ｎｍ、最大値と最小値の幅は平均繊維径に対し１５％であり、厚みは０．４７ｍｍであり、曲げ強度はタテ方向１７ｃＮ／ｍｍ２、ヨコ方向７ｃＮ／ｍｍ２であった。
該研磨パッドを用い、研磨剤に０．０３５μｍのコロイダルシリカ砥粒を５重量％含んでいるスラリーを１２ｍｌ／ｍｉｎで滴下しながら、定盤回転数８０ｒｐｍ、加圧２００ｇｆ／ｃｍ２で１０分間ポリッシュ加工を実施した。研磨能率は０．５８μｍ／ｍｉｎと良好であったが、研磨中に研磨パッドにシワが発生し、スクラッチ傷の欠点が多発した。
[Comparative Example 1]
After a knitted fabric was obtained in the same manner as in Example 1, the knitted fabric was cut into a circular shape having a diameter of 380 mm as it was to obtain a polishing pad suitable for polishing a silicon wafer. In the obtained polishing pad, the average single fiber diameter of the filament yarn A is 700 nm, the width between the maximum value and the minimum value is 15% of the average fiber diameter, the thickness is 0.47 mm, and the bending strength is 17 cN in the vertical direction. / Mm 2 , and the horizontal direction was 7 cN / mm 2 .
Polishing for 10 minutes at a platen rotational speed of 80 rpm and a pressure of 200 gf / cm 2 while using the polishing pad and dropping a slurry containing 5 wt% of 0.035 μm colloidal silica abrasive in the polishing agent at 12 ml / min. Processing was carried out. The polishing efficiency was as good as 0.58 μm / min. However, wrinkles were generated on the polishing pad during polishing, and scratch defects were frequently generated.
本発明によれば、装置などに取り付ける際の取り扱い性に優れ、かつ被研磨物表面の欠点（うねり、スクラッチ傷など）の発生を抑制することができ、さらに優れた研磨能率が得られる、研磨布用複合布帛および研磨布が提供され、その工業的価値は極めて大である。 According to the present invention, it is excellent in handleability when attached to an apparatus, etc., and can suppress the occurrence of defects (swells, scratches, etc.) on the surface of the object to be polished, and further excellent polishing efficiency can be obtained. A composite fabric for cloth and an abrasive cloth are provided, and the industrial value is extremely large.
Claims (9)
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| JP2009036533A JP2010188482A (en) | 2009-02-19 | 2009-02-19 | Compound cloth for abrasive cloth, and abrasive cloth |
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| JP2009036533A JP2010188482A (en) | 2009-02-19 | 2009-02-19 | Compound cloth for abrasive cloth, and abrasive cloth |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017073556A1 (en) * | 2015-10-27 | 2017-05-04 | 富士紡ホールディングス株式会社 | Wrapping material and method for manufacturing same, and method for manufacturing abrasive |
| WO2018092630A1 (en) * | 2016-11-16 | 2018-05-24 | 帝人フロンティア株式会社 | Polishing pad and method for manufacturing same |
| JP2018083282A (en) * | 2016-11-11 | 2018-05-31 | 富士紡ホールディングス株式会社 | Polishing pad and manufacturing method thereof, and manufacturing method of object to be polished |
| JP2019201177A (en) * | 2018-05-18 | 2019-11-21 | 帝人フロンティア株式会社 | Abrasive pad and manufacturing method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005340863A (en) * | 2005-08-22 | 2005-12-08 | Matsushita Electric Ind Co Ltd | Polishing pad and chemical mechanical polishing method |
| JP2006075959A (en) * | 2004-09-10 | 2006-03-23 | Inoac Corp | Polishing pad |
| JP2008207319A (en) * | 2007-01-30 | 2008-09-11 | Toray Ind Inc | Polishing pad |
| JP2008238282A (en) * | 2007-03-26 | 2008-10-09 | Toray Ind Inc | Abrasive cloth |
| JP2009000751A (en) * | 2007-06-19 | 2009-01-08 | Teijin Fibers Ltd | Woven fabric for polishing cloth, its manufacturing method, and the polishing cloth |
| JP2009007713A (en) * | 2007-06-29 | 2009-01-15 | Toray Ind Inc | Sheet like material |
-
2009
- 2009-02-19 JP JP2009036533A patent/JP2010188482A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006075959A (en) * | 2004-09-10 | 2006-03-23 | Inoac Corp | Polishing pad |
| JP2005340863A (en) * | 2005-08-22 | 2005-12-08 | Matsushita Electric Ind Co Ltd | Polishing pad and chemical mechanical polishing method |
| JP2008207319A (en) * | 2007-01-30 | 2008-09-11 | Toray Ind Inc | Polishing pad |
| JP2008238282A (en) * | 2007-03-26 | 2008-10-09 | Toray Ind Inc | Abrasive cloth |
| JP2009000751A (en) * | 2007-06-19 | 2009-01-08 | Teijin Fibers Ltd | Woven fabric for polishing cloth, its manufacturing method, and the polishing cloth |
| JP2009007713A (en) * | 2007-06-29 | 2009-01-15 | Toray Ind Inc | Sheet like material |
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|---|---|---|---|---|
| TWI703253B (en) * | 2015-10-27 | 2020-09-01 | 日商富士紡控股股份有限公司 | Lapping material and method for producing the same, and method for producing polished article |
| KR102597982B1 (en) * | 2015-10-27 | 2023-11-02 | 후지보 홀딩스 가부시키가이샤 | Wrapping material and its manufacturing method, and manufacturing method of abrasive material |
| KR20180075533A (en) * | 2015-10-27 | 2018-07-04 | 후지보 홀딩스 가부시키가이샤 | Lapping material, manufacturing method thereof, and method of manufacturing abrasive article |
| JPWO2017073556A1 (en) * | 2015-10-27 | 2018-09-27 | 富士紡ホールディングス株式会社 | Wrapping material, method for producing the same, and method for producing abrasive |
| US11465255B2 (en) | 2015-10-27 | 2022-10-11 | Fujibo Holdings, Inc. | Lapping material and method for producing the same, and method for producing polished product |
| WO2017073556A1 (en) * | 2015-10-27 | 2017-05-04 | 富士紡ホールディングス株式会社 | Wrapping material and method for manufacturing same, and method for manufacturing abrasive |
| JP2018083282A (en) * | 2016-11-11 | 2018-05-31 | 富士紡ホールディングス株式会社 | Polishing pad and manufacturing method thereof, and manufacturing method of object to be polished |
| JPWO2018092630A1 (en) * | 2016-11-16 | 2019-06-24 | 帝人フロンティア株式会社 | Polishing pad and method of manufacturing the same |
| KR102230016B1 (en) | 2016-11-16 | 2021-03-19 | 데이진 프론티아 가부시키가이샤 | Polishing pad and manufacturing method thereof |
| KR20190059975A (en) * | 2016-11-16 | 2019-05-31 | 데이진 프론티아 가부시키가이샤 | Abrasive pad and manufacturing method thereof |
| US11577359B2 (en) | 2016-11-16 | 2023-02-14 | Teijin Frontier Co., Ltd. | Polishing pad and method for manufacturing same |
| WO2018092630A1 (en) * | 2016-11-16 | 2018-05-24 | 帝人フロンティア株式会社 | Polishing pad and method for manufacturing same |
| JP2019201177A (en) * | 2018-05-18 | 2019-11-21 | 帝人フロンティア株式会社 | Abrasive pad and manufacturing method thereof |
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