JP2009248059A - オゾン水と過酸化水素水の同時製造装置 - Google Patents
オゾン水と過酸化水素水の同時製造装置 Download PDFInfo
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- JP2009248059A JP2009248059A JP2008102573A JP2008102573A JP2009248059A JP 2009248059 A JP2009248059 A JP 2009248059A JP 2008102573 A JP2008102573 A JP 2008102573A JP 2008102573 A JP2008102573 A JP 2008102573A JP 2009248059 A JP2009248059 A JP 2009248059A
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- Electrodes For Compound Or Non-Metal Manufacture (AREA)
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Abstract
【解決手段】酸素還元用電極4を備えた陰極室2と、この陰極室2とイオン交換膜1により区画されるとともにオゾン発生用電極11を備えた陽極室3とを備え、前記酸素還元用電極4は疎水性微粒子を表面に分散固定した粒子群からなることを特徴とする過酸化水素水及びオゾン水の同時製造装置を用いて、陰極室2に酸素と純水、陽極室3に純水を供給しながら、前記両極間に通電し、陰極において酸素の還元により過酸化水素を発生させ、同時に、陽極において水の酸化によりオゾンを発生させた。さらに、同時に生成した過酸化水素水及びオゾン水を混合することで、促進酸化処理水である過酸化水素/オゾン混合水溶液を製造した。
【選択図】図1
Description
2 陰極室
3 陽極室
4 酸素還元用電極(陰極)
7 酸素供給口
8 純水供給口
9 過酸化水素水取出口
11 オゾン発生用電極(陽極)
12 純水供給口
13 オゾン水取出口
Claims (5)
- 酸素還元用電極を備えた陰極室と、この陰極室とイオン交換膜により区画されるとともにオゾン発生用電極を備えた陽極室とを備え、前記酸素還元用電極は疎水性微粒子を表面に分散固定した粒子群からなり、陰極において酸素の還元により過酸化水素を発生させ、同時に、陽極において水の酸化によりオゾンを発生させるように構成したことを特徴とする過酸化水素水及びオゾン水の同時製造装置。
- 前記酸素還元用電極は、複合めっき法により疎水性微粒子を表面に分散固定したものであることを特徴とする請求項1記載の過酸化水素水及びオゾン水の同時製造装置。
- 前記疎水性微粒子は、ポリテトラフルオロエチレンであることを特徴とする請求項1又は2記載の過酸化水素水及びオゾン水の同時製造装置。
- 前記陰極室に酸素供給口と純水供給口と過酸化水素水取出口とを設け、前記陽極室に純水供給口とオゾン水取出口とを設けたことを特徴とする請求項1〜3のいずれか1項記載の過酸化水素水及びオゾン水の同時製造装置。
- 前記請求項1〜4のいずれか1項記載の過酸化水素水及びオゾン水の同時製造装置を用いて、陰極室に酸素と純水、陽極室に純水を供給しながら、前記両極間に通電し、陰極において酸素の還元により過酸化水素を発生させ、同時に、陽極において水の酸化によりオゾンを発生させることを特徴とする過酸化水素水及びオゾン水の同時製造方法。
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107512760A (zh) * | 2017-08-14 | 2017-12-26 | 深圳大学 | 同步电生臭氧与双氧水的电解池装置及其制备方法、应用 |
CN111718105A (zh) * | 2020-07-16 | 2020-09-29 | 兰州理工大学 | 一种基于臭氧氧化与双氧水联合降解含油污泥的处理装置和方法 |
WO2022246201A3 (en) * | 2021-05-20 | 2023-01-26 | Evoqua Water Technologies Llc | Regulation of onsite peroxide generation for improved peroxone advanced oxidative process control |
CN117417035A (zh) * | 2023-12-18 | 2024-01-19 | 中国科学院生态环境研究中心 | 阳极产气态臭氧同步阴极产生双氧水的水处理装置及方法 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5915990Y2 (ja) * | 1981-08-14 | 1984-05-11 | 一男 和田 | 墓参用線香入れ |
JPH06248482A (ja) * | 1993-02-26 | 1994-09-06 | Permelec Electrode Ltd | 過酸化水素製造用電解槽及び過酸化水素の電解的製造方法 |
JPH08296076A (ja) * | 1995-04-21 | 1996-11-12 | Permelec Electrode Ltd | 過酸化水素水の製造方法及び装置 |
JPH1091987A (ja) * | 1996-09-18 | 1998-04-10 | Sony Corp | 光学ピックアップ及び光ディスク装置 |
JPH10140383A (ja) * | 1996-11-12 | 1998-05-26 | Permelec Electrode Ltd | 電極給電体、その製造方法及び過酸化水素製造用電解槽 |
JPH10277551A (ja) * | 1997-04-08 | 1998-10-20 | Matsushita Refrig Co Ltd | 電解水生成装置 |
JPH10324988A (ja) * | 1997-05-26 | 1998-12-08 | Permelec Electrode Ltd | オゾン及び過酸化水素含有水の製造装置及び製造方法 |
JPH11269686A (ja) * | 1998-03-18 | 1999-10-05 | Permelec Electrode Ltd | 過酸化水素の製造方法及び過酸化水素製造用電解槽 |
JP2000254650A (ja) * | 1999-03-15 | 2000-09-19 | Permelec Electrode Ltd | 水処理方法及び水処理用装置 |
JP2000254651A (ja) * | 1999-03-11 | 2000-09-19 | Kurita Water Ind Ltd | 疎水性有機物含有水の電解処理方法及び電解処理装置 |
JP2002206186A (ja) * | 2000-11-02 | 2002-07-26 | Permelec Electrode Ltd | 電極構造体及び該構造体を使用する電解方法 |
JP2005334694A (ja) * | 2004-05-24 | 2005-12-08 | Okayama Prefecture | 電解水製造装置 |
JP2008063648A (ja) * | 2006-09-11 | 2008-03-21 | Sumitomo Heavy Ind Ltd | 過酸化水素含有洗浄水の製造装置及び過酸化水素含有洗浄水の製造方法 |
-
2008
- 2008-04-10 JP JP2008102573A patent/JP4968628B2/ja active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5915990Y2 (ja) * | 1981-08-14 | 1984-05-11 | 一男 和田 | 墓参用線香入れ |
JPH06248482A (ja) * | 1993-02-26 | 1994-09-06 | Permelec Electrode Ltd | 過酸化水素製造用電解槽及び過酸化水素の電解的製造方法 |
JPH08296076A (ja) * | 1995-04-21 | 1996-11-12 | Permelec Electrode Ltd | 過酸化水素水の製造方法及び装置 |
JPH1091987A (ja) * | 1996-09-18 | 1998-04-10 | Sony Corp | 光学ピックアップ及び光ディスク装置 |
JPH10140383A (ja) * | 1996-11-12 | 1998-05-26 | Permelec Electrode Ltd | 電極給電体、その製造方法及び過酸化水素製造用電解槽 |
JPH10277551A (ja) * | 1997-04-08 | 1998-10-20 | Matsushita Refrig Co Ltd | 電解水生成装置 |
JPH10324988A (ja) * | 1997-05-26 | 1998-12-08 | Permelec Electrode Ltd | オゾン及び過酸化水素含有水の製造装置及び製造方法 |
JPH11269686A (ja) * | 1998-03-18 | 1999-10-05 | Permelec Electrode Ltd | 過酸化水素の製造方法及び過酸化水素製造用電解槽 |
JP2000254651A (ja) * | 1999-03-11 | 2000-09-19 | Kurita Water Ind Ltd | 疎水性有機物含有水の電解処理方法及び電解処理装置 |
JP2000254650A (ja) * | 1999-03-15 | 2000-09-19 | Permelec Electrode Ltd | 水処理方法及び水処理用装置 |
JP2002206186A (ja) * | 2000-11-02 | 2002-07-26 | Permelec Electrode Ltd | 電極構造体及び該構造体を使用する電解方法 |
JP2005334694A (ja) * | 2004-05-24 | 2005-12-08 | Okayama Prefecture | 電解水製造装置 |
JP2008063648A (ja) * | 2006-09-11 | 2008-03-21 | Sumitomo Heavy Ind Ltd | 過酸化水素含有洗浄水の製造装置及び過酸化水素含有洗浄水の製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107512760A (zh) * | 2017-08-14 | 2017-12-26 | 深圳大学 | 同步电生臭氧与双氧水的电解池装置及其制备方法、应用 |
CN111718105A (zh) * | 2020-07-16 | 2020-09-29 | 兰州理工大学 | 一种基于臭氧氧化与双氧水联合降解含油污泥的处理装置和方法 |
CN111718105B (zh) * | 2020-07-16 | 2023-12-12 | 兰州理工大学 | 一种基于臭氧氧化与双氧水联合降解含油污泥的处理装置和方法 |
WO2022246201A3 (en) * | 2021-05-20 | 2023-01-26 | Evoqua Water Technologies Llc | Regulation of onsite peroxide generation for improved peroxone advanced oxidative process control |
CN117417035A (zh) * | 2023-12-18 | 2024-01-19 | 中国科学院生态环境研究中心 | 阳极产气态臭氧同步阴极产生双氧水的水处理装置及方法 |
CN117417035B (zh) * | 2023-12-18 | 2024-03-12 | 中国科学院生态环境研究中心 | 阳极产气态臭氧同步阴极产生双氧水的水处理装置及方法 |
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