JP2009208282A - Plastic sheet - Google Patents

Plastic sheet Download PDF

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Publication number
JP2009208282A
JP2009208282A JP2008051689A JP2008051689A JP2009208282A JP 2009208282 A JP2009208282 A JP 2009208282A JP 2008051689 A JP2008051689 A JP 2008051689A JP 2008051689 A JP2008051689 A JP 2008051689A JP 2009208282 A JP2009208282 A JP 2009208282A
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plastic sheet
resin composition
curable resin
base film
sheet according
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Takashi Ito
剛史 伊藤
Wataru Oka
渉 岡
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Abstract

<P>PROBLEM TO BE SOLVED: To provide a plastic sheet having a texture structure with a high surface shape flexibility, an excellent heat resistance and a thermal dimensional stability. <P>SOLUTION: The plastic sheet is made of a base film and a cured resin laminated thereon, and has a texture structure having a relief structure where the surface shape of at least one side surface of the cured resin layer is fine, and preferably the root-mean-square roughness Rms of the texture structure is 20 nm≤Rms≤60 nm, and the glass transition temperature of the cured resin is 160°C or more. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明はプラスチックシートに関するものである。   The present invention relates to a plastic sheet.

近年、光電変換装置の低コスト化要求により、薄膜光電変換装置が注目を浴び精力的に開発されている。太陽電池が効率よく発電するには、入射光が失われることなく光電変換素子に達して、光電作用を行うことが必要である。しかし、太陽電池基板と透明導電膜、あるいは透明導電膜と光電変換素子の接合面等は光学特性の異なる層の境界面であるから、入射光の一部がこれらの接合面で反射され光電変換素子に達せず、発電に寄与しない光が生じる。接合面が平であると、光の入射角度によっては全反射を起こしやすい。   In recent years, thin film photoelectric conversion devices have attracted attention and have been vigorously developed in response to demands for cost reduction of photoelectric conversion devices. In order for the solar cell to efficiently generate power, it is necessary to reach the photoelectric conversion element without losing incident light and perform a photoelectric action. However, since the solar cell substrate and the transparent conductive film, or the joint surface between the transparent conductive film and the photoelectric conversion element is a boundary surface between layers having different optical characteristics, a part of incident light is reflected by these joint surfaces and photoelectric conversion is performed. Light that does not reach the element and does not contribute to power generation occurs. If the joint surface is flat, total reflection tends to occur depending on the incident angle of light.

従来から、光の利用効率を高めることを目的に、接合面を凹凸の多い面、すなわち粗面にする検討が行われている。接合面を粗面にすることによって、反射されずに接合面を通り抜ける光の分量が多くなるとともに、一旦接合面を通り抜けた光が次の接合面で反射されて外部に放出されそうになっても、再度接合面で反射されて内部に留まる率が高まる。いわゆる光の閉じ込め効果を有することとなる。   Conventionally, for the purpose of increasing the light utilization efficiency, studies have been made to make the joint surface a rough surface, that is, a rough surface. By making the bonding surface rough, the amount of light that passes through the bonding surface without being reflected increases, and light that has once passed through the bonding surface is reflected by the next bonding surface and is likely to be emitted to the outside. However, the rate of being reflected again at the joint surface and remaining inside increases. It has a so-called light confinement effect.

例えば、太陽電池基板上に凹凸のある透明導電膜を形成する一般的な方法として、透明導電膜であるＳｎＯ2 膜を常圧ＣＶＤ法で形成することが行われている。プラスチック基板上へは微粒子を基板表面に存在させることで凹凸を形成する方法（例えば、特許文献１）が知られている。
特開２００１−２６０８５号公報 For example, as a general method for forming an uneven transparent conductive film on a solar cell substrate, an SnO 2 film that is a transparent conductive film is formed by an atmospheric pressure CVD method. A method of forming irregularities on a plastic substrate by causing fine particles to exist on the substrate surface is known (for example, Patent Document 1).
JP 2001-26085 A

しかしながら、基板にガラスを用いると太陽電池素子の厚みおよび形状に制限が生じる。ガラス基板上にテクスチャ構造を有した透明導電性酸化物電極を形成する方法では、常圧ＣＶＤによりＳｎＯ2膜を形成するが、大きな設備が必要で生産性が悪く、コスト高になるという欠点がある。また５００℃以上の高温プロセスを要するなどの理由により耐熱温度の低いフレキシブル性を持つフィルム等の基板上への成膜は不可能であった。また、微粒子により凹凸を形成する方法では、例えば特許文献１にあるように、基板表面に微粒子を存在させるために、該微粒子を含有する樹脂スラリーを調製し、これをプラスチック基板表面に塗布・乾燥するといった非常に多くの工程を必要とする手法が採用されており、生産性の面で劣る。また、使用される微粒子は一般に二次凝集し易く、品質面での安定性に問題が生じ易い。さらに、上記の如き樹脂スラリーを用いた場合に、スラリー中の溶剤の乾燥が不十分であると、高温、高真空下で実施される太陽電池各層の形成工程において、該溶剤が揮発することでガスが発生して真空度が低下するため、製品（太陽電池）の生産効率を悪化させる要因となる場合がある。加えて、不純物の混入も生じ易く、光電変換層の品質が低下する可能性がある、等の問題点がある。 However, when glass is used for the substrate, the thickness and shape of the solar cell element are limited. In the method of forming a transparent conductive oxide electrode having a texture structure on a glass substrate, an SnO 2 film is formed by atmospheric pressure CVD, but there is a disadvantage that a large facility is required, productivity is low, and cost is high. is there. In addition, film formation on a substrate such as a flexible film having a low heat-resistant temperature is impossible because a high temperature process of 500 ° C. or higher is required. Further, in the method of forming irregularities with fine particles, for example, as disclosed in Patent Document 1, in order to make fine particles exist on the substrate surface, a resin slurry containing the fine particles is prepared, and this is applied to the plastic substrate surface and dried. A technique that requires a very large number of processes is employed, which is inferior in productivity. In addition, the fine particles used are generally easily agglomerated, and problems in quality stability are likely to occur. Furthermore, when the resin slurry as described above is used, if the solvent in the slurry is insufficiently dried, the solvent volatilizes in the step of forming each layer of the solar cell performed under high temperature and high vacuum. Since gas is generated and the degree of vacuum is lowered, the production efficiency of the product (solar cell) may be deteriorated. In addition, there is a problem that impurities are likely to be mixed and the quality of the photoelectric conversion layer may be deteriorated.

本発明の目的は、上記課題を解決して、表面形状の自由度が高く耐熱性や熱寸法安定性に優れたテクスチャ構造を有するプラスチックシートを提供することにある。   An object of the present invention is to provide a plastic sheet having a texture structure that solves the above problems and has a high degree of freedom in surface shape and excellent heat resistance and thermal dimensional stability.

本発明は、以下の通りである。
（１）ベースフィルム、及び前記ベースフィルム上に硬化樹脂を積層させてなるプラスチックシートであって、前記硬化樹脂層の少なくとも片面の表面形状が微細な凹凸構造を有するテクスチャ構造であることを特徴とするプラスチックシート。
（２）前記テクスチャ構造の二乗平均平方根粗さＲｍｓが２０ｎｍ≦Ｒｍｓ≦６０ｎｍである（１）記載のプラスチックシート。
（３）前記硬化樹脂のガラス転移温度が１６０℃以上である（１）又は（２）記載のプラスチックシート。
（４）前記ベースフィルムが、樹脂と有機充填材及び／又は無機充填材とからなる複合体である（１）〜（３）何れか一項記載のプラスチックシート。
（５）波長５５０ｎｍでの光線透過率が８０％以上である（１）〜（４）何れか一項記載のプラスチックシート。
（６）（１）〜（５）何れか一項記載のプラスチックシートの製造方法であって、ベースフィルムに硬化性樹脂組成物を積層する工程、前記硬化性樹脂組成物層を凹凸構造を有する転写体と接触させる工程、活性エネルギー線を照射して前記硬化性樹脂組成物を硬化する工程、を有するプラスチックシートの製造方法。
（７）前記硬化性樹脂組成物が、アクリレート化合物、エポキシ樹脂、及びオキセタン化合物から選ばれた１種以上を主成分とした紫外線硬化性樹脂組成物である（６）記載のプラスチックシートの製造方法。
（８）（１）〜（５）何れか一項記載のテクスチャ構造を有するプラスチックシートを用いた薄膜太陽電池用プラスチック基板。 The present invention is as follows.
(1) A base film and a plastic sheet obtained by laminating a cured resin on the base film, wherein at least one surface of the cured resin layer has a textured structure having a fine uneven structure. Plastic sheet.
(2) The plastic sheet according to (1), wherein the root mean square roughness Rms of the texture structure is 20 nm ≦ Rms ≦ 60 nm.
(3) The plastic sheet according to (1) or (2), wherein the cured resin has a glass transition temperature of 160 ° C. or higher.
(4) The plastic sheet according to any one of (1) to (3), wherein the base film is a composite composed of a resin and an organic filler and / or an inorganic filler.
(5) The plastic sheet according to any one of (1) to (4), wherein the light transmittance at a wavelength of 550 nm is 80% or more.
(6) The method for producing a plastic sheet according to any one of (1) to (5), wherein a step of laminating a curable resin composition on a base film, the curable resin composition layer has an uneven structure. The manufacturing method of the plastic sheet which has a process made to contact a transcription | transfer body, and the process of irradiating an active energy ray and hardening the said curable resin composition.
(7) The method for producing a plastic sheet according to (6), wherein the curable resin composition is an ultraviolet curable resin composition mainly comprising at least one selected from an acrylate compound, an epoxy resin, and an oxetane compound. .
(8) A plastic substrate for a thin film solar cell using the plastic sheet having the texture structure according to any one of (1) to (5).

本発明のプラスチックシートは軽量で屈曲性に優れているほか、透明性、耐熱性、熱寸法安定性などの面でも良好である。また、薄膜太陽電池用基板として用いた場合、テクスチャ構造により入射した光を効率よく閉じ込めることができ、高い光電変換効率を達成することができる。   The plastic sheet of the present invention is lightweight and excellent in flexibility, and is also excellent in terms of transparency, heat resistance, thermal dimensional stability, and the like. Moreover, when it uses as a board | substrate for thin film solar cells, the incident light can be efficiently confined by a texture structure, and a high photoelectric conversion efficiency can be achieved.

本発明は、ベースフィルム、及び前記ベースフィルム上に硬化樹脂を積層させてなるプラスチックシートであって、前記硬化樹脂層の少なくとも片面の表面形状が微細な凹凸構造を有するテクスチャ構造であることを特徴とするプラスチックシートである。   The present invention is a base film and a plastic sheet obtained by laminating a cured resin on the base film, wherein the surface shape of at least one surface of the cured resin layer is a textured structure having a fine uneven structure. It is a plastic sheet.

本発明に使用するベースフィルムは、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリサルホン、ポリエーテルサルホン、ポリエーテルケトン、ポリエーテルエーテルケトン、ポリイミド、ポリアミドイミド、ポリカーボネート、ノルボルネン系高分子及びこれをブレンドした樹脂等の熱可塑性樹脂、アクリル樹脂、エポキシ樹脂、フェノール樹脂、シアネート樹脂などの熱硬化性の樹脂成型物、或いはこれらの樹脂とガラスクロスとからなる複合体などをあげることができるが、これらに限定されるものではない。中でも太陽電池セル製造上、耐熱性、加工性、耐衝撃性のバランスの良いポリエチレンナフタレートやポリエーテルサルホン、耐熱性のあるエポキシ樹脂とガラスクロスとからなる複合体が特に好ましい。   Base films used in the present invention include polyethylene terephthalate, polyethylene naphthalate, polysulfone, polyethersulfone, polyetherketone, polyetheretherketone, polyimide, polyamideimide, polycarbonate, norbornene-based polymer, and resins blended with these. Thermosetting resin moldings such as thermoplastic resins, acrylic resins, epoxy resins, phenol resins, cyanate resins, or composites composed of these resins and glass cloth, but are not limited thereto. It is not something. Among them, a composite made of polyethylene naphthalate or polyether sulfone, heat-resistant epoxy resin and glass cloth having a good balance of heat resistance, workability, and impact resistance is particularly preferable for the production of solar cells.

ベースフィルムの厚みは、１０μｍ以上５００μｍ以下が好ましく、更に好ましくは５０μｍ 以上４００μｍ以下である。ベースシートの厚みが下限値未満であると切れやすく取り扱いが困難であり、上限値を超えると、光線透過率が低下して太陽電池の変換効率を悪化させ、またフィルムの柔軟性が乏しくなり好ましくない。ベースフィルムの表面には、その上に積層する硬化性樹脂組成物との密着性を向上させるために、コロナ処理、エキシマ処理、ＵＶ−オゾン処理、カップリング剤によるプライマー処理を施したり、銅箔の表面など微細な凹凸のある面を転写させたり、サンドブラスト処理したりして、表面に微細な凹凸を施しても良い。また、波長５５０ｎｍにおける光線透過率は８０％以上が好ましく、更に好ましくは８５％以上の範囲である。光線透過率が下限値未満では太陽電池用基板として使用した場合に、光を効率良く光電変換素子に届けることができないため太陽電池の光電変換効率が低下する恐れがある。   The thickness of the base film is preferably 10 μm or more and 500 μm or less, more preferably 50 μm or more and 400 μm or less. If the thickness of the base sheet is less than the lower limit, it is easy to cut and difficult to handle, and if the thickness exceeds the upper limit, the light transmittance is lowered to deteriorate the conversion efficiency of the solar cell, and the flexibility of the film is preferably reduced. Absent. The surface of the base film is subjected to corona treatment, excimer treatment, UV-ozone treatment, primer treatment with a coupling agent, or copper foil in order to improve adhesion with the curable resin composition laminated thereon. The surface with fine irregularities such as the surface of the surface may be transferred or sandblasted to give fine irregularities to the surface. Further, the light transmittance at a wavelength of 550 nm is preferably 80% or more, and more preferably 85% or more. If the light transmittance is less than the lower limit, when used as a substrate for a solar cell, light cannot be efficiently delivered to the photoelectric conversion element, which may reduce the photoelectric conversion efficiency of the solar cell.

本発明において、ベースフィルム上に硬化樹脂層を積層する方法としては、ベースフィルムに予め硬化した樹脂層を積層させる方法、ベースフィルム上に硬化性樹脂組成物を積層し、熱又は活性エネルギー線照射により硬化させる方法等が挙げられる。 In the present invention, as a method of laminating the cured resin layer on the base film, a method of laminating a precured resin layer on the base film, laminating a curable resin composition on the base film, and heat or active energy ray irradiation And a method of curing by the method.

本発明で使用する硬化性樹脂組成物としては、紫外線等の活性エネルギー線又は熱で硬化できる各種樹脂が適用できる。好ましい硬化性樹脂組成物としては、アクリレート化合物、エポキシ樹脂、オキセタン化合物から選ばれる１種以上を主成分とした液状の紫外線硬化性樹脂組成物や、エポキシ樹脂、フェノール樹脂、シアネート樹脂から選ばれる１種以上を主成分とした熱硬化性樹脂組成物、またはこれらを混合したもの等が挙げられる。これらの樹脂組成物は、塗布装置によりベースシート上に塗布し、溶剤を含む場合には乾燥装置により溶剤を揮発させる。樹脂組成物成分には、必要に応じてフィラー成分、界面活性剤、消泡剤、帯電防止剤などを添加しても良い。 As the curable resin composition used in the present invention, various kinds of resins that can be cured by active energy rays such as ultraviolet rays or heat can be applied. Preferred curable resin compositions are selected from liquid ultraviolet curable resin compositions mainly composed of one or more selected from acrylate compounds, epoxy resins, and oxetane compounds, epoxy resins, phenol resins, and cyanate resins. The thermosetting resin composition which has more than seed | species as a main component, what mixed these, etc. are mentioned. These resin compositions are apply | coated on a base sheet with an application | coating apparatus, and when a solvent is included, a solvent is volatilized with a drying apparatus. You may add a filler component, surfactant, an antifoamer, an antistatic agent, etc. to a resin composition component as needed.

本発明で使用する硬化樹脂層の硬化樹脂のガラス転移温度は１６０℃以上、より好ましくは２００℃以上であることが望ましい。ガラス転移温度が下限値未満であると、常圧ＣＶＤやスパッタなどで透明導電膜や光電変換素子を積層する際の２００℃程度の温度条件下では、テクスチャ構造が変形してしまい、目的とする光閉じ込め効果が得られない。   The glass transition temperature of the cured resin of the cured resin layer used in the present invention is preferably 160 ° C. or higher, more preferably 200 ° C. or higher. If the glass transition temperature is less than the lower limit, the texture structure is deformed under a temperature condition of about 200 ° C. when laminating the transparent conductive film or the photoelectric conversion element by atmospheric pressure CVD or sputtering, which is the target. The light confinement effect cannot be obtained.

本発明において、ベースフィルムに積層した硬化樹脂層の少なくとも片面の表面形状は、微細な凹凸構造を有するテクスチャ構造である。
本発明で形成される凹凸構造は、太陽電池における光閉じ込め効果をより促進する働きをすることができる。この凹凸構造を形成する方法としてはレプリカ法などがある。レプリカ法では、予め目的とする凹凸構造のネガ構造を有する金型等のネガレプリカを用意しておき、これを転写体として使用することができる。ここでネガレプリカを作製するための凹凸構造としては、例えば結晶シリコン基板を所定のウェットエッチング条件やドライエッチング条件でエッチングすることによって形成されるシリコン結晶面方位を反映した凹凸構造を利用することができるし、ＳｎＯ2等の透明導電膜を所定の条件で製膜することによって得られる自主的な表面の凹凸構造等を利用することもでき、得たい凹凸構造に応じて様々な材料を使用することができる。 In the present invention, the surface shape of at least one surface of the cured resin layer laminated on the base film is a texture structure having a fine uneven structure.
The concavo-convex structure formed in the present invention can function to further promote the light confinement effect in the solar cell. As a method for forming the uneven structure, there is a replica method. In the replica method, a negative replica such as a mold having a negative structure with a desired uneven structure is prepared in advance, and this can be used as a transfer body. Here, as the concavo-convex structure for producing a negative replica, for example, a concavo-convex structure reflecting a silicon crystal plane orientation formed by etching a crystalline silicon substrate under predetermined wet etching conditions or dry etching conditions may be used. It is also possible to use a voluntary surface uneven structure obtained by depositing a transparent conductive film such as SnO 2 under predetermined conditions, and use various materials depending on the uneven structure to be obtained. be able to.

具体例としては、ベースフィルムに硬化性樹脂組成物を塗布等の方法により積層する工程、硬化性樹脂組成物層を凹凸構造を有する転写体と接触させる工程、熱又は活性エネルギー線照射により硬化性樹脂組成物を硬化する工程、転写体を剥離させる工程、により硬化樹脂層にテクスチャ構造を有するプラスチックシートが得られる。   Specific examples include a step of laminating a curable resin composition on a base film by a method such as coating, a step of bringing the curable resin composition layer into contact with a transfer body having a concavo-convex structure, and curable by irradiation with heat or active energy rays. A plastic sheet having a texture structure in the cured resin layer is obtained by the step of curing the resin composition and the step of peeling the transfer body.

本発明において、テクスチャ構造の二乗平均平方根粗さＲｍｓは２０ｎｍ≦Ｒｍｓ≦６０ｎｍであることが好ましく、更に好ましくは３０ｎｍ≦Ｒｍｓ≦５０ｎｍである。下限値未満では光閉じ込め効果が十分に得られず、上限値を超えると光電変換素子に欠陥部分が生じやすくなる恐れがある。   In the present invention, the root mean square roughness Rms of the texture structure is preferably 20 nm ≦ Rms ≦ 60 nm, more preferably 30 nm ≦ Rms ≦ 50 nm. If it is less than the lower limit, the light confinement effect cannot be sufficiently obtained, and if it exceeds the upper limit, there is a possibility that a defective portion is likely to occur in the photoelectric conversion element.

本発明のプラスチックシートの波長５５０ｎｍにおける光線透過率は８０％以上が好ましく、更に好ましくは８５％以上である。下限値未満では太陽電池用基板として使用した場合に、光を効率良く光電変換素子に届けることができないため太陽電池の光電変換効率が低下する恐れがある。   The light transmittance at a wavelength of 550 nm of the plastic sheet of the present invention is preferably 80% or more, more preferably 85% or more. If it is less than the lower limit, when it is used as a substrate for a solar cell, light cannot be efficiently delivered to the photoelectric conversion element, so that the photoelectric conversion efficiency of the solar cell may be lowered.

〔実施例１〕
ベースフィルムとしてガラスクロス（日東紡製、厚み９０μｍ、屈折率１．５０３）にエポキシ樹脂を含浸し、硬化させた厚み９０μｍのガラスクロス複合体を用いた。このガラスクロス複合体シート上に、イソシアヌール酸ＥＯ変性トリアクリレート（東亞合成製 Ｍ−３１５）５０重量部、アクリレート樹脂（日本化薬製 ＫＡＹＡＲＡＤ Ｒ−６０４）５０重量部、光重合開始剤（チバ・ジャパン製 イルガキュア１８４）１重量部を配合してなる紫外線硬化性樹脂組成物ワニスを塗工した。次いで市販のテクスチャ構造を有するＳｎＯ2導電膜付きガラス板（旭硝子製、商品名：ＡＳＡＨＩ−Ｕ）のテクスチャ構造面と硬化性樹脂組成物層面とをラミネートし、紫外線を照射して硬化性樹脂組成物を硬化させ、ガラス板を剥離することでテクスチャ構造を有するプラスチックシートを得た。被膜された硬化樹脂層の厚みは４μｍであり、ガラス転移温度を測定したところ、２００℃以上であった。 [Example 1]
A glass cloth composite having a thickness of 90 μm obtained by impregnating an epoxy resin into a glass cloth (manufactured by Nittobo Co., Ltd., thickness 90 μm, refractive index 1.503) and curing it was used as a base film. On this glass cloth composite sheet, 50 parts by weight of isocyanuric acid EO-modified triacrylate (M-315 manufactured by Toagosei Co., Ltd.), 50 parts by weight of acrylate resin (KAYARAD R-604 manufactured by Nippon Kayaku Co., Ltd.), photopolymerization initiator (Ciba -Japan Irga Cure 184) An ultraviolet curable resin composition varnish formed by blending 1 part by weight was applied. Next, the texture structure surface of the commercially available glass plate with SnO 2 conductive film having a texture structure (product name: ASAHI-U, manufactured by Asahi Glass Co., Ltd.) and the curable resin composition layer surface are laminated, and the curable resin composition is irradiated with ultraviolet rays. The product was cured and a plastic sheet having a textured structure was obtained by peeling the glass plate. The thickness of the coated cured resin layer was 4 μm, and when the glass transition temperature was measured, it was 200 ° C. or higher.

シート表面に形成した微細凹凸の形状は、原子間力顕微鏡を用いて行い、二乗平均平方根粗さＲｍｓを測定したところ４１．５ｎｍであった。尚、転写体であるＡＳＡＨＩ−ＵのＲｍｓは４４．９ｎｍであったため、ほぼ転写体の形状が転写されていることが分かった。   The shape of the fine irregularities formed on the sheet surface was 41.5 nm when the root mean square roughness Rms was measured using an atomic force microscope. Incidentally, since Rms of ASAHI-U, which is a transfer body, was 44.9 nm, it was found that the shape of the transfer body was almost transferred.

プラスチックシートについては、下記に示す評価方法により各種特性を測定した。
（ａ）原子間力顕微鏡
Ｄｉｇｉｔａｌ Ｉｎｓｔｒｕｍｅｎｔｓ社製のＮａｎｏＳｃｏｐｅIIIａのタッピングモードで測定を行った。
（ｂ）ガラス転移温度
ＳＥＩＫＯ電子（株）製ＤＭＳ２１０型動的粘弾性測定装置を用いて、１Ｈｚでのtanδの最大値をガラス転移温度（Ｔｇ）とした。 Various characteristics of the plastic sheet were measured by the evaluation methods shown below.
(A) Atomic force microscope The measurement was performed in a tapping mode of NanoScope IIIa manufactured by Digital Instruments.
(B) Glass transition temperature The maximum value of tanδ at 1 Hz was defined as the glass transition temperature (Tg) using a DMS210 dynamic viscoelasticity measuring device manufactured by SEIKO ELECTRONICS.

Claims (8)

ベースフィルム、及び前記ベースフィルム上に硬化樹脂を積層させてなるプラスチックシートであって、前記硬化樹脂層の少なくとも片面の表面形状が微細な凹凸構造を有するテクスチャ構造であることを特徴とするプラスチックシート。 A plastic sheet obtained by laminating a cured resin on a base film and the base film, wherein the plastic sheet is a textured structure having a fine uneven structure on at least one surface of the cured resin layer . 前記テクスチャ構造の二乗平均平方根粗さＲｍｓが２０ｎｍ≦Ｒｍｓ≦６０ｎｍである請求項１記載のプラスチックシート。 The plastic sheet according to claim 1, wherein the root mean square roughness Rms of the texture structure is 20 nm ≦ Rms ≦ 60 nm. 前記硬化樹脂のガラス転移温度が１６０℃以上である請求項１又は２記載のプラスチックシート。 The plastic sheet according to claim 1 or 2, wherein the cured resin has a glass transition temperature of 160 ° C or higher. 前記ベースフィルムが、樹脂と有機充填材及び／又は無機充填材とからなる複合体である請求項１〜３何れか一項記載のプラスチックシート。 The plastic sheet according to any one of claims 1 to 3, wherein the base film is a composite composed of a resin and an organic filler and / or an inorganic filler. 波長５５０ｎｍでの光線透過率が８０％以上である請求項１〜４何れか一項記載のプラスチックシート。 The plastic sheet according to any one of claims 1 to 4, wherein the light transmittance at a wavelength of 550 nm is 80% or more. 請求項１〜５何れか一項記載のプラスチックシートの製造方法であって、ベースフィルムに硬化性樹脂組成物を積層する工程、前記硬化性樹脂組成物層を凹凸構造を有する転写体と接触させる工程、活性エネルギー線を照射して前記硬化性樹脂組成物を硬化する工程、を有するプラスチックシートの製造方法。 It is a manufacturing method of the plastic sheet as described in any one of Claims 1-5, Comprising: The process of laminating | stacking a curable resin composition on a base film, The said curable resin composition layer is made to contact with the transfer body which has an uneven structure. The manufacturing method of the plastic sheet which has a process and the process of irradiating an active energy ray and hardening | curing the said curable resin composition. 前記硬化性樹脂組成物が、アクリレート化合物、エポキシ樹脂、及びオキセタン化合物から選ばれた１種以上を主成分とした紫外線硬化性樹脂組成物である請求項６記載のプラスチックシートの製造方法。 The method for producing a plastic sheet according to claim 6, wherein the curable resin composition is an ultraviolet curable resin composition containing as a main component at least one selected from an acrylate compound, an epoxy resin, and an oxetane compound. 請求項１〜５何れか一項記載のテクスチャ構造を有するプラスチックシートを用いた薄膜太陽電池用プラスチック基板。 The plastic substrate for thin film solar cells using the plastic sheet which has a texture structure as described in any one of Claims 1-5.
JP2008051689A 2008-03-03 2008-03-03 Plastic sheet Pending JP2009208282A (en)

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JP2001347220A (en) * 2000-06-05 2001-12-18 Sumitomo Bakelite Co Ltd Method for manufacturing polymer film sheet, manufacturing equipment and polymer film sheet for optics
JP2005161199A (en) * 2003-12-02 2005-06-23 Sumitomo Bakelite Co Ltd Plastic laminate and production method for the same
JP2005298634A (en) * 2004-04-09 2005-10-27 Sumitomo Bakelite Co Ltd Method for producing transparent composite substrate

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JP2001347220A (en) * 2000-06-05 2001-12-18 Sumitomo Bakelite Co Ltd Method for manufacturing polymer film sheet, manufacturing equipment and polymer film sheet for optics
JP2005161199A (en) * 2003-12-02 2005-06-23 Sumitomo Bakelite Co Ltd Plastic laminate and production method for the same
JP2005298634A (en) * 2004-04-09 2005-10-27 Sumitomo Bakelite Co Ltd Method for producing transparent composite substrate

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011155365A1 (en) * 2010-06-08 2011-12-15 Dic株式会社 Molded article having fine surface irregularities and method for producing same
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