JP2009004408A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- 238000009832 plasma treatment Methods 0.000 claims abstract description 40
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 15
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 12
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- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 claims description 10
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 7
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 6
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- 235000019289 ammonium phosphates Nutrition 0.000 claims description 3
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 claims description 3
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 claims description 3
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- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
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- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76814—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics post-treatment or after-treatment, e.g. cleaning or removal of oxides on underlying conductors
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Abstract
【解決手段】低誘電率絶縁膜3を形成し、低誘電率絶縁膜3に、配線層2に達する開口孔4を形成し、水素またはアンモニアを含むガスを用いたプラズマ処理を行い、フルオロカーボンを含むガスを用いたプラズマ処理を行って、コンタクト不良やボイドの発生を抑制するようにした。これにより、抵抗の上昇や断線などを防止して、信頼性が大きく向上された半導体装置の製造方法を提供することができる。
【選択図】図1
Description
本実施の概要について図面を参照して説明し、その後に、本発明の概要に基づいた実施の形態について、同様に図面を参照して説明する。
図1は、本発明の概要を示した、半導体装置の製造工程の要部断面模式図である。図1は、本発明の半導体装置の、特に多層配線構造の製造方法を4つの製造工程(図1(A)〜図1(D))に分けて、各製造工程を模式的に示している。以下、各製造工程に沿って説明する。
なお、層間絶縁膜である低誘電率絶縁膜3は、SiO2の誘電率よりも低い誘電率、好ましくは2.5程度以下の誘電率を有する。
次に、本発明の概要においての低誘電率絶縁膜3の壁面の状態変化の詳細について図2を用いて以下に説明する。
本発明の実施の形態では、上記概要を踏まえて具体的な多層配線構造を備えた半導体装置の製造方法について触れる。
まず、基板101上の一面に、エッチングストッパーとして炭化珪素(SiC)膜103aを形成する。SiC膜103aにパターン(不図示)を形成し、パターンに沿って基板101を加工し、Cu配線層102を形成する。
SiC膜103b上にポーラスシリカ膜として触媒化成工業製NCS(Nano Clustering Silica;登録商標)膜104a,104b(合わせて膜厚250nm〜400nm)を順に形成する。なお、NCS膜104a,104bは、メチル基を含有するポーラス(多孔性)型の低誘電体材料の層間絶縁膜である。またNSC膜104a,104bの誘電率は約2.3である。
次に、Cuメッキ膜111の成膜後、CMP(Chemical Mechanical Polishing)処理を行って、SiO2膜106からの上層を除去して、SiCOH膜105の表面を平坦化する。
そして、再び、SiC膜112に図3(A)で示したように積層して、図3〜図6の工程を繰り返すことで、所望の層数の多層配線構造を形成することができる。
図7では、x軸に、H2を含むガスを用いたプラズマ処理時間(秒)と、y軸に、ビア配線の不良数(a.u.)とをそれぞれ定義しており、CF4を含むガスを用いたプラズマ処理の有無についてそれぞれ示している。なお、図7の結果は、ビア径100nm、配線幅5μmの凸パターンチェーン(ビア個数:10万個)について200℃、1000時間放置後、不良チェーン個数について示している。
H2を含むガスを用いてプラズマ処理時間を増加させていくと、ビア配線の不良数が減少していく。すなわち、H2を含むガスを用いてプラズマ処理を行うことにより、エッチング生成膜108が除去されていくことが分かる。
H2を含むガスを用いてプラズマ処理時間を増加させていくとともに、CF4を含むガスを用いたプラズマ処理を行わない場合と同様に、ビア配線の不良数が減少していく。
前記低誘電率絶縁膜に、前記配線層に達する開口孔を形成する工程と、
水素またはアンモニアを含むガスを用いたプラズマ処理を行う第1プラズマ工程と、
フルオロカーボンを含むガスを用いたプラズマ処理を行う第2プラズマ工程と、
を有することを特徴とする半導体装置の製造方法。
(付記5) 前記ポーラスシリカ膜の誘電率は2.5以下であることを特徴とする付記3記載の半導体装置の製造方法。
(付記7) 前記第2プラズマ工程後に、前記開口孔内部に銅拡散防止膜を形成することを特徴とする付記1乃至6のいずれか1項に記載の半導体装置の製造方法。
(付記9) 前記銅拡散防止膜は、スパッタ法を用いて形成されることを特徴とする付記7または8に記載の半導体装置の製造方法。
(付記12) 前記第2プラズマ工程にて、前記フルオロカーボンを含むガスに加えて、一酸化炭素またはメタンをさらに含むガスを用いることを特徴とする付記1乃至11のいずれか1項に記載の半導体装置の製造方法。
(付記15) 前記銅拡散防止膜上に銅配線を形成することを特徴とする付記7乃至14のいずれか1項に記載の半導体装置の製造方法。
2 配線層
3 低誘電率絶縁膜
4 開口孔
5 エッチング生成膜
6 ダメージ層
Claims (10)
- 基板上に形成された配線層上に、低誘電率絶縁膜を形成する工程と、
前記低誘電率絶縁膜に、前記配線層に達する開口孔を形成する工程と、
水素またはアンモニアを含むガスを用いたプラズマ処理を行う第1プラズマ工程と、
フルオロカーボンを含むガスを用いたプラズマ処理を行う第2プラズマ工程と、
を有することを特徴とする半導体装置の製造方法。 - 前記低誘電率絶縁膜は、ポリアリーレン膜、ポリアリルエーテル膜、水素シルセスキオキサン膜、メチルシルセスキオキサン膜、シリコンカーバイド膜、ポーラスシリカ膜、もしくはこれらの混合膜、あるいはこれらの積層膜であることを特徴とする請求項1記載の半導体装置の製造方法。
- 前記低誘電率絶縁膜は、メチル基を有する膜であることを特徴とする請求項1記載の半導体装置の製造方法。
- 前記フルオロカーボンは四フッ化炭素ガスであることを特徴とする請求項1乃至3のいずれか1項に記載の半導体装置の製造方法。
- 前記第2プラズマ工程後に、前記開口孔内部に銅拡散防止膜を形成することを特徴とする請求項1乃至4のいずれか1項に記載の半導体装置の製造方法。
- 前記銅拡散防止膜は、タンタル膜、窒化タンタル膜、チタン膜、またはこれらの積層構造であることを特徴とする請求項5記載の半導体装置の製造方法。
- 前記第2プラズマ工程後に、前記銅拡散防止膜の形成工程の前に、前記配線層の表面をウェットエッチングする工程をさらに有することを特徴とする請求項5または6に記載の半導体装置の製造方法。
- 前記ウェットエッチングを燐酸アンモニウムまたはフッ酸を含む薬液で行うことを特徴とする請求項7記載の半導体装置の製造方法。
- 前記第2プラズマ工程にて、前記フルオロカーボンを含むガスに加えて、一酸化炭素またはメタンをさらに含むガスを用いることを特徴とする請求項1乃至8のいずれか1項に記載の半導体装置の製造方法。
- 前記フルオロカーボンを含むガスは、四フッ化炭素ガスさらには三フッ化メタンガスまたはジフルオロメタンガスを加えたガスであることを特徴とする請求項9記載の半導体装置の製造方法。
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JP2011151141A (ja) * | 2010-01-20 | 2011-08-04 | Tokyo Electron Ltd | 基板処理方法及び記憶媒体 |
JP2013055317A (ja) * | 2011-08-05 | 2013-03-21 | Tokyo Electron Ltd | 半導体装置の製造方法 |
US8455348B2 (en) | 2010-03-29 | 2013-06-04 | Renesas Electronics Corporation | Manufacturing method of semiconductor device |
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KR20100050156A (ko) * | 2008-11-05 | 2010-05-13 | 주식회사 동부하이텍 | 반도체 소자의 금속배선 형성방법 |
CN105097650B (zh) * | 2014-05-04 | 2018-11-16 | 中芯国际集成电路制造(上海)有限公司 | 接触插塞的形成方法 |
KR20180030280A (ko) * | 2016-09-12 | 2018-03-22 | 삼성전자주식회사 | 배선 구조체를 갖는 반도체 소자 |
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JP2002141410A (ja) * | 2000-10-31 | 2002-05-17 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
JP2003100867A (ja) * | 2001-09-26 | 2003-04-04 | Fujitsu Ltd | 半導体装置の製造方法及び半導体装置用洗浄液 |
JP2004241776A (ja) * | 2003-02-04 | 2004-08-26 | Texas Instruments Inc | 低k誘電体フイルムの化学的処理 |
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US6323121B1 (en) * | 2000-05-12 | 2001-11-27 | Taiwan Semiconductor Manufacturing Company | Fully dry post-via-etch cleaning method for a damascene process |
JP2005116801A (ja) * | 2003-10-08 | 2005-04-28 | Toshiba Corp | 半導体装置の製造方法 |
JP4492947B2 (ja) * | 2004-07-23 | 2010-06-30 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
US7700479B2 (en) * | 2006-11-06 | 2010-04-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning processes in the formation of integrated circuit interconnect structures |
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JP2002141410A (ja) * | 2000-10-31 | 2002-05-17 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
JP2003100867A (ja) * | 2001-09-26 | 2003-04-04 | Fujitsu Ltd | 半導体装置の製造方法及び半導体装置用洗浄液 |
JP2004241776A (ja) * | 2003-02-04 | 2004-08-26 | Texas Instruments Inc | 低k誘電体フイルムの化学的処理 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011151141A (ja) * | 2010-01-20 | 2011-08-04 | Tokyo Electron Ltd | 基板処理方法及び記憶媒体 |
US8455348B2 (en) | 2010-03-29 | 2013-06-04 | Renesas Electronics Corporation | Manufacturing method of semiconductor device |
JP2013055317A (ja) * | 2011-08-05 | 2013-03-21 | Tokyo Electron Ltd | 半導体装置の製造方法 |
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