JP2008242169A5 - - Google Patents

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Publication number
JP2008242169A5
JP2008242169A5 JP2007083869A JP2007083869A JP2008242169A5 JP 2008242169 A5 JP2008242169 A5 JP 2008242169A5 JP 2007083869 A JP2007083869 A JP 2007083869A JP 2007083869 A JP2007083869 A JP 2007083869A JP 2008242169 A5 JP2008242169 A5 JP 2008242169A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007083869A
Other versions
JP4880511B2 (ja
JP2008242169A (ja
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Publication date
Application filed filed Critical
Priority to JP2007083869A priority Critical patent/JP4880511B2/ja
Priority claimed from JP2007083869A external-priority patent/JP4880511B2/ja
Priority to TW096148914A priority patent/TWI401539B/zh
Priority to CN2008100885245A priority patent/CN101276157B/zh
Priority to US12/079,502 priority patent/US7701552B2/en
Publication of JP2008242169A publication Critical patent/JP2008242169A/ja
Publication of JP2008242169A5 publication Critical patent/JP2008242169A5/ja
Application granted granted Critical
Publication of JP4880511B2 publication Critical patent/JP4880511B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007083869A 2007-03-28 2007-03-28 露光描画装置 Active JP4880511B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007083869A JP4880511B2 (ja) 2007-03-28 2007-03-28 露光描画装置
TW096148914A TWI401539B (zh) 2007-03-28 2007-12-20 Exposure drawing device
CN2008100885245A CN101276157B (zh) 2007-03-28 2008-03-27 曝光绘图装置
US12/079,502 US7701552B2 (en) 2007-03-28 2008-03-27 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007083869A JP4880511B2 (ja) 2007-03-28 2007-03-28 露光描画装置

Publications (3)

Publication Number Publication Date
JP2008242169A JP2008242169A (ja) 2008-10-09
JP2008242169A5 true JP2008242169A5 (ja) 2009-10-22
JP4880511B2 JP4880511B2 (ja) 2012-02-22

Family

ID=39913600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007083869A Active JP4880511B2 (ja) 2007-03-28 2007-03-28 露光描画装置

Country Status (4)

Country Link
US (1) US7701552B2 (ja)
JP (1) JP4880511B2 (ja)
CN (1) CN101276157B (ja)
TW (1) TWI401539B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI401538B (zh) * 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
JP4885029B2 (ja) * 2007-03-28 2012-02-29 株式会社オーク製作所 露光描画装置
JP5090780B2 (ja) * 2007-04-26 2012-12-05 株式会社オーク製作所 露光描画装置
US20100154244A1 (en) 2008-12-19 2010-06-24 Exfo Photonic Solutions Inc. System, Method, and Adjustable Lamp Head Assembly, for Ultra-Fast UV Curing
JP5714334B2 (ja) * 2011-01-12 2015-05-07 株式会社オーク製作所 熱交換機構および露光装置
US10120283B2 (en) * 2011-06-06 2018-11-06 Nikon Corporation Illumination method, illumination optical device, and exposure device
KR101988820B1 (ko) * 2012-12-18 2019-06-12 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
JP2014149391A (ja) * 2013-01-31 2014-08-21 Hitachi High-Technologies Corp パターン形成装置及びパターン形成方法
US11221564B2 (en) * 2018-10-31 2022-01-11 Taiwan Semiconductor Manufacturing Company Ltd. Method for improving exposure performance and apparatus thereof
JPWO2023282214A1 (ja) * 2021-07-05 2023-01-12

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5526147A (en) * 1992-06-29 1996-06-11 Matsushita Electric Industrial Co., Ltd. Polymer dispersed liquid crystal projector with diffraction gratings along liquid crystal electrodes, a variable diaphragm, and an anamorphic lens
JP2001356488A (ja) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd レーザ描画装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2005017341A (ja) * 2003-06-23 2005-01-20 Dainippon Screen Mfg Co Ltd 光照射装置
JP2006113413A (ja) 2004-10-15 2006-04-27 Fuji Photo Film Co Ltd 描画方法および描画装置
JP5126928B2 (ja) * 2005-04-20 2013-01-23 大日本スクリーン製造株式会社 画像記録装置
JP4679249B2 (ja) * 2005-05-31 2011-04-27 大日本スクリーン製造株式会社 パターン描画装置
JP4775842B2 (ja) 2005-06-10 2011-09-21 大日本スクリーン製造株式会社 パターン描画装置

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