JP2008242169A5 - - Google Patents
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- Publication number
- JP2008242169A5 JP2008242169A5 JP2007083869A JP2007083869A JP2008242169A5 JP 2008242169 A5 JP2008242169 A5 JP 2008242169A5 JP 2007083869 A JP2007083869 A JP 2007083869A JP 2007083869 A JP2007083869 A JP 2007083869A JP 2008242169 A5 JP2008242169 A5 JP 2008242169A5
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- JP
- Japan
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007083869A JP4880511B2 (ja) | 2007-03-28 | 2007-03-28 | 露光描画装置 |
TW096148914A TWI401539B (zh) | 2007-03-28 | 2007-12-20 | Exposure drawing device |
CN2008100885245A CN101276157B (zh) | 2007-03-28 | 2008-03-27 | 曝光绘图装置 |
US12/079,502 US7701552B2 (en) | 2007-03-28 | 2008-03-27 | Exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007083869A JP4880511B2 (ja) | 2007-03-28 | 2007-03-28 | 露光描画装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008242169A JP2008242169A (ja) | 2008-10-09 |
JP2008242169A5 true JP2008242169A5 (ja) | 2009-10-22 |
JP4880511B2 JP4880511B2 (ja) | 2012-02-22 |
Family
ID=39913600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007083869A Active JP4880511B2 (ja) | 2007-03-28 | 2007-03-28 | 露光描画装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7701552B2 (ja) |
JP (1) | JP4880511B2 (ja) |
CN (1) | CN101276157B (ja) |
TW (1) | TWI401539B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI401538B (zh) * | 2007-03-28 | 2013-07-11 | Orc Mfg Co Ltd | Exposure drawing device |
JP4885029B2 (ja) * | 2007-03-28 | 2012-02-29 | 株式会社オーク製作所 | 露光描画装置 |
JP5090780B2 (ja) * | 2007-04-26 | 2012-12-05 | 株式会社オーク製作所 | 露光描画装置 |
US20100154244A1 (en) | 2008-12-19 | 2010-06-24 | Exfo Photonic Solutions Inc. | System, Method, and Adjustable Lamp Head Assembly, for Ultra-Fast UV Curing |
JP5714334B2 (ja) * | 2011-01-12 | 2015-05-07 | 株式会社オーク製作所 | 熱交換機構および露光装置 |
US10120283B2 (en) * | 2011-06-06 | 2018-11-06 | Nikon Corporation | Illumination method, illumination optical device, and exposure device |
KR101988820B1 (ko) * | 2012-12-18 | 2019-06-12 | 가부시키가이샤 니콘 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
JP2014149391A (ja) * | 2013-01-31 | 2014-08-21 | Hitachi High-Technologies Corp | パターン形成装置及びパターン形成方法 |
US11221564B2 (en) * | 2018-10-31 | 2022-01-11 | Taiwan Semiconductor Manufacturing Company Ltd. | Method for improving exposure performance and apparatus thereof |
JPWO2023282214A1 (ja) * | 2021-07-05 | 2023-01-12 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5526147A (en) * | 1992-06-29 | 1996-06-11 | Matsushita Electric Industrial Co., Ltd. | Polymer dispersed liquid crystal projector with diffraction gratings along liquid crystal electrodes, a variable diaphragm, and an anamorphic lens |
JP2001356488A (ja) * | 2000-06-14 | 2001-12-26 | Asahi Optical Co Ltd | レーザ描画装置 |
TW529172B (en) * | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
JP2005017341A (ja) * | 2003-06-23 | 2005-01-20 | Dainippon Screen Mfg Co Ltd | 光照射装置 |
JP2006113413A (ja) | 2004-10-15 | 2006-04-27 | Fuji Photo Film Co Ltd | 描画方法および描画装置 |
JP5126928B2 (ja) * | 2005-04-20 | 2013-01-23 | 大日本スクリーン製造株式会社 | 画像記録装置 |
JP4679249B2 (ja) * | 2005-05-31 | 2011-04-27 | 大日本スクリーン製造株式会社 | パターン描画装置 |
JP4775842B2 (ja) | 2005-06-10 | 2011-09-21 | 大日本スクリーン製造株式会社 | パターン描画装置 |
-
2007
- 2007-03-28 JP JP2007083869A patent/JP4880511B2/ja active Active
- 2007-12-20 TW TW096148914A patent/TWI401539B/zh not_active IP Right Cessation
-
2008
- 2008-03-27 CN CN2008100885245A patent/CN101276157B/zh not_active Expired - Fee Related
- 2008-03-27 US US12/079,502 patent/US7701552B2/en not_active Expired - Fee Related
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