JP2008225399A - Liquid crystal display element - Google Patents

Liquid crystal display element Download PDF

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JP2008225399A
JP2008225399A JP2007067680A JP2007067680A JP2008225399A JP 2008225399 A JP2008225399 A JP 2008225399A JP 2007067680 A JP2007067680 A JP 2007067680A JP 2007067680 A JP2007067680 A JP 2007067680A JP 2008225399 A JP2008225399 A JP 2008225399A
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substrate
liquid crystal
gas barrier
barrier layer
display element
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Toshihiko Sato
佐藤　　敏彦
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Citizen Holdings Co Ltd
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Citizen Holdings Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display element using a flexible substrate such as a plastic film, wherein external form tolerance and assembling workability are not reduced even when a side surface gas barrier layer for preventing gas invasion from a side surface of the substrate is provided. <P>SOLUTION: The gas barrier layer 19 made of an inorganic material such as SiNx and having 250 nm thickness is formed on cut end surfaces of flexible substrates each comprising a substrate supporting material 11 and gas barrier layers 18 formed on both surfaces thereof. The gas barrier layer is formed at one stretch by low temperature sputtering to a bundle formed by stacking a plurality of single cells. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

この発明は、プラスチックフィルムなど可撓性のある基板支持材にガスバリア層が形成された液晶表示素子において、液晶層に浸入するガスを阻止するため基板の側面にもガスバリア部材を設けた液晶表示素子に関する。   The present invention relates to a liquid crystal display element in which a gas barrier layer is formed on a flexible substrate support material such as a plastic film. About.

いわゆるプラスチックフィルム基板からなる液晶表示素子は、軽量で薄いという性質を活かし携帯電話機の表示パネルとして実用化されたことがある。最近では、割れにくい、曲げられる、平面形状の自由度が高い、という特徴にも注目が集まるようになり様々な応用製品が提案されるようになった。   A liquid crystal display element made of a so-called plastic film substrate has been put into practical use as a display panel of a mobile phone taking advantage of its light weight and thin property. Recently, attention has been focused on the features of being hard to break, being bent, and having a high degree of freedom in planar shape, and various applied products have been proposed.

これら可撓性材料は、ガラスと違いガス或いは水蒸気透過性があるため、常温常圧下で
ガスあるいは水蒸気が透過する。もし仮に可撓性材料だけを使った基板で液晶表示素子を作成すると、ガスが基板を通して液晶内に溶け込み、液晶内に溶け込んだガスが飽和状態に達していると落下等の衝撃により液晶表示素子内に気泡が発生してしまう。そこで基板表面にガスが透過し難い無機物ないし有機物からなるガスバリア層を設けていた。ガスバリア層は、基板の両面に設けられる場合もあるが、製造工程を簡略化させるため基板の片側の面だけに設ける場合もある。ガスバリア層を基板の片側の面だけに設ける場合、液晶層側に設ける場合と液晶層とは反対側に設ける場合がある。基板の液晶層側には透明電極層や透明電極の密着力を高めるための中間層があるので、層構造を簡単にしたい場合はガスバリア層を液晶層とは反対側の面に設けていた。 Since these flexible materials are permeable to gas or water vapor unlike glass, gas or water vapor permeates under normal temperature and pressure. If a liquid crystal display element is made with a substrate using only a flexible material, the gas dissolves in the liquid crystal through the substrate, and if the gas dissolved in the liquid crystal reaches a saturated state, the liquid crystal display element is caused by an impact such as dropping. Bubbles are generated inside. Therefore, a gas barrier layer made of an inorganic material or an organic material that hardly allows gas to permeate is provided on the substrate surface. The gas barrier layer may be provided on both surfaces of the substrate, but may be provided only on one surface of the substrate in order to simplify the manufacturing process. When the gas barrier layer is provided only on one side of the substrate, it may be provided on the liquid crystal layer side or on the opposite side of the liquid crystal layer. Since there is a transparent electrode layer and an intermediate layer for enhancing the adhesion of the transparent electrode on the liquid crystal layer side of the substrate, a gas barrier layer is provided on the surface opposite to the liquid crystal layer in order to simplify the layer structure.

ガスバリア層を有する液晶表示素子は、平面的にはガスの浸入を押さえ込んでいるが、基板の切断によって生じた側面（以下端面と称する）は基板支持材がむき出しになっているので、ここから基板内を通して液晶層にガスが浸入する。この結果、柔軟性はあるがガス透過度の高い有機物からなるガスバリア層を使った場合、ガスバリア層を基板の両面に形成しても、長期的にはガスが基板端面から液晶層に浸入する(例えば文献１）。   The liquid crystal display element having a gas barrier layer suppresses the ingress of gas in a plan view, but the substrate support material is exposed from the side surface (hereinafter referred to as an end surface) generated by cutting the substrate. Gas enters the liquid crystal layer through the inside. As a result, when a gas barrier layer made of an organic material that is flexible but has a high gas permeability is used, even if the gas barrier layer is formed on both sides of the substrate, the gas will permeate into the liquid crystal layer from the end surface of the substrate in the long term ( For example, reference 1).

この対策として文献１に示された従来例１（文献中では実施例１）では、シールを含めた液晶表示素子の側面にエポキシ接着剤を塗布し、側面からのガスの浸入を防いでいる。この断面図を図４に示す。液晶表示素子は、図の下から、反射板４８、偏光板４７、基板４１、透明電極４２、配向膜４３、スペーサ４４が混入した液晶層４６、配向膜４３、透明電極４２、基板４１、偏光板４７が積層している。ここで基板４１は、ポリカーボネートフィルムを基板支持材とし、両面にＥＶＡ（エチレンと酢酸ビニルの共重合体）とフェノキシ樹脂からなる２層のガスバリア層を有している。表示素子の側面部では、シール４５と２枚の基板４１の端面とにエポキシ接着剤４９が塗布されている。なお文献１の記述にあわせて基板４１は基板支持材とガスバリア層からなるものとした（以下同様）。
特開２００１−２２１９９８ As a countermeasure against this, in Conventional Example 1 shown in Document 1 (Example 1 in the document), an epoxy adhesive is applied to the side surface of the liquid crystal display element including the seal to prevent gas from entering from the side surface. This sectional view is shown in FIG. From the bottom of the figure, the liquid crystal display element includes a reflector 48, a polarizing plate 47, a substrate 41, a transparent electrode 42, an alignment film 43, a liquid crystal layer 46 mixed with a spacer 44, an alignment film 43, a transparent electrode 42, a substrate 41, and a polarization. Plates 47 are stacked. Here, the substrate 41 uses a polycarbonate film as a substrate support material, and has two gas barrier layers made of EVA (copolymer of ethylene and vinyl acetate) and phenoxy resin on both sides. In the side surface portion of the display element, an epoxy adhesive 49 is applied to the seal 45 and the end surfaces of the two substrates 41. In accordance with the description in Document 1, the substrate 41 is composed of a substrate support material and a gas barrier layer (the same applies hereinafter).
JP2001-221998

文献１の従来例１のように側面にガスバリア層として有機物からなる接着剤を塗布する方法では、接着剤が垂れてしまい塗布後の平面形状が定まりにくい。また接着剤の粘性を高くすると接着剤が図４のように盛り上がってしまうので平面形状が大きくなる。また各表示素子を一枚一枚個別に接着剤を塗布しなければならないので作業性が悪い。   In the method of applying an organic adhesive as a gas barrier layer on the side as in Conventional Example 1 of Document 1, the adhesive drips and the planar shape after application is difficult to determine. Further, when the viscosity of the adhesive is increased, the adhesive swells as shown in FIG. Moreover, since each display element must be individually coated with an adhesive, workability is poor.

そこで本発明の目的は、プラスチックフィルムなど可撓性のある基板支持材にガスバリ
ア層を形成した基板を使った液晶表示素子において、液晶層に浸入するガスを阻止するために基板端面にも設けたガスバリアが外形公差に納まるくらい薄く、あわせて組立作業性が良い液晶表示素子を提供することである。 Therefore, an object of the present invention is to provide a liquid crystal display element using a substrate in which a gas barrier layer is formed on a flexible substrate support material such as a plastic film, so as to prevent gas entering the liquid crystal layer. The object of the present invention is to provide a liquid crystal display device having a gas barrier that is thin enough to fit within the tolerance of the outer shape and that has good assembly workability.

本発明は、２枚の可撓性を有する基板がシールを介して積層し、該基板と該シールから形成された空間に液晶が注入された液晶表示素子において、基板は少なくとも一方の基板面にガスバリア層を有し、基板の切断面に無機材料からなるガスバリア層を備えたことを特徴とするものである。   The present invention relates to a liquid crystal display element in which two flexible substrates are stacked via a seal, and liquid crystal is injected into a space formed from the substrate and the seal. The substrate is disposed on at least one substrate surface. It has a gas barrier layer, and is provided with a gas barrier layer made of an inorganic material on the cut surface of the substrate.

ガスバリア層は、スパッターにより形成されているのが好ましい。   The gas barrier layer is preferably formed by sputtering.

液晶を注入したあと単個に分離されたセルを複数枚積み重ねた状態で、スパッターにより切断面のガスバリア層を形成しても良い。   A gas barrier layer having a cut surface may be formed by sputtering in a state in which a plurality of cells separated into single pieces are stacked after liquid crystal is injected.

本発明に関わる液晶表示素子は、厚さが１μｍ以下でも充分なガスバリア機能を有する無機物からなるガスバリア層を基板の端面に設けたので、外形加工精度などから決まる１００μｍ程度の外形公差に対しガスバリア層の厚さは無視できる。   In the liquid crystal display element according to the present invention, a gas barrier layer made of an inorganic material having a sufficient gas barrier function even when the thickness is 1 μm or less is provided on the end face of the substrate. The thickness of is negligible.

また本発明に関わる液晶表示素子は、低温スパッターで端面にガスバリア層を形成する際に、多数の単個セルの各端面が同時に露出するように重ね、この単個セルの束から露出した端面に同時にガスバリア層を形成するので、ガスバリア層形成に対し著しく高い作業性が得られる。   In addition, the liquid crystal display element according to the present invention is stacked so that each end face of a large number of single cells is exposed at the same time when a gas barrier layer is formed on the end face by low-temperature sputtering, and the end face exposed from the bundle of single cells. Since the gas barrier layer is formed at the same time, remarkably high workability can be obtained for the gas barrier layer formation.

以下、図面を参照しながらこの発明の実施の形態について詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

図１は、本発明の実施の形態の断面図である。本発明の液晶表示素子は、図の下から、下側の偏光板１７、基板支持材１１の両面にガスバリア層１８が形成されている下側の基板、ＩＴＯからなる下側の透明電極１２、ポリイミドからなる下側の配向膜１３、スペーサ１４が混入された液晶層１６、上側の配向膜１３、上側の透明電極１２、基板支持材１１の両面にガスバリア層１８が形成されている上側の基板、上側の偏光板１７が積層している。なお上下の基板は、約０．１ｍｍのポリカーボネートフィルムからなる基板支持材１１の両面に有機物ないし無機物の薄膜からなるガスバリア層１８が形成されている。液晶層１６側のガスバリア層１８上と透明電極１２の密着力が弱い場合はガスバリア層１８と透明電極１２の間に中間層を設ける。   FIG. 1 is a cross-sectional view of an embodiment of the present invention. From the bottom of the figure, the liquid crystal display element of the present invention comprises a lower polarizing plate 17, a lower substrate on which gas barrier layers 18 are formed on both surfaces of the substrate support 11, a lower transparent electrode 12 made of ITO, A lower alignment film 13 made of polyimide, a liquid crystal layer 16 mixed with spacers 14, an upper alignment film 13, an upper transparent electrode 12, and an upper substrate on which gas barrier layers 18 are formed on both surfaces of the substrate support 11 The upper polarizing plate 17 is laminated. In the upper and lower substrates, gas barrier layers 18 made of organic or inorganic thin films are formed on both surfaces of a substrate support 11 made of a polycarbonate film of about 0.1 mm. When the adhesion between the gas barrier layer 18 on the liquid crystal layer 16 side and the transparent electrode 12 is weak, an intermediate layer is provided between the gas barrier layer 18 and the transparent electrode 12.

図１において、基板支持材１１とその表面を被覆するガスバリア層１８からなる上下の基板の左右の端面と、シール１５の外側には、窒化シリコン（ＳｉＮｘ）からなる厚さ０．２５μｍのガスバリア層１９が形成されている。また液晶層１６の厚さは５μｍである。偏光板の厚さは０．１ｍｍ、シール１５の幅は０．８ｍｍ程度である。   In FIG. 1, a gas barrier layer made of silicon nitride (SiNx) having a thickness of 0.25 μm is formed on the left and right end faces of the upper and lower substrates made of the substrate support 11 and the gas barrier layer 18 covering the surface thereof, and outside the seal 15. 19 is formed. The thickness of the liquid crystal layer 16 is 5 μm. The thickness of the polarizing plate is 0.1 mm, and the width of the seal 15 is about 0.8 mm.

一般にＳｉＮｘやＳｉＯ２、カーボン膜などの無機材料は、エポキシ材料などの有機材料にくらべガス透過姓が数百から数千分の一である。ガスバリア層１９は、低温スパッターで形成する場合、１００ｎｍから１０００ｎｍ程度の膜が得やすく、２００ｎｍから５００ｎｍで良い結果が得られたので前述の厚さとした。また酸化タンタル、窒化タンタルなどの金属酸化物は低温で緻密な膜を形成できる。   In general, inorganic materials such as SiNx, SiO2, and carbon films have a gas permeation of hundreds to thousands of that of organic materials such as epoxy materials. When the gas barrier layer 19 is formed by low-temperature sputtering, a film with a thickness of about 100 nm to 1000 nm is easily obtained, and good results are obtained with 200 nm to 500 nm. A metal oxide such as tantalum oxide or tantalum nitride can form a dense film at a low temperature.

図２は本発明の実施の形態の平面図（ａ）とその断面図（ｂ）であり、図２により外部
回路と接続を取るための電極取り出し部の構造を説明する。図１と同じ部材は同じ番号で示している。上下の基板１１ｂ、１１ｃは、基板支持材１１の両面にガスバリア層１８を形成したものである。また、透明電極１２、配向膜１３、スペーサ１４は図示していない。 FIG. 2A is a plan view of the embodiment of the present invention, and FIG. 2B is a cross-sectional view thereof. FIG. The same members as those in FIG. 1 are indicated by the same numbers. The upper and lower substrates 11 b and 11 c are obtained by forming gas barrier layers 18 on both surfaces of the substrate support 11. Further, the transparent electrode 12, the alignment film 13, and the spacer 14 are not shown.

図２（ａ）において、駆動信号は液晶表示素子に柔軟性のある回路基板２２（以下ＦＰＣと称する）を介して伝達される。上側の基板１１ｂには、辺２４と、表示素子の外形と直交する辺２３とにより切り欠いた領域（以下電極取り出し部と称する）がある。ＦＰＣ２２の下面の配線電極（図示せず）は、電極取り出し部において露出している透明電極（図示せず）と異方性導電シート（図示せず）を介して接着している。同様に上側の偏光板１７とシール１５にも電極取り出し部に対応して切り欠きがある。なお下側の基板１１ｃと下側の偏光板１７に切り欠きはない。電極取り出し部において、ＦＰＣ２２の端部、上側の基板１１ｂの端面及び下側の基板１１ｃの露出部は保護部材２１で覆われている。   In FIG. 2A, the drive signal is transmitted to the liquid crystal display element via a flexible circuit board 22 (hereinafter referred to as FPC). The upper substrate 11b has a region (hereinafter referred to as an electrode extraction portion) cut out by a side 24 and a side 23 orthogonal to the outer shape of the display element. A wiring electrode (not shown) on the lower surface of the FPC 22 is bonded to a transparent electrode (not shown) exposed at the electrode extraction portion via an anisotropic conductive sheet (not shown). Similarly, the upper polarizing plate 17 and the seal 15 have notches corresponding to the electrode extraction portions. Note that the lower substrate 11c and the lower polarizing plate 17 are not cut out. In the electrode extraction portion, the end portion of the FPC 22, the end surface of the upper substrate 11b, and the exposed portion of the lower substrate 11c are covered with a protective member 21.

図２（ｂ）は図２（ａ）の線分Ａ−Ｂに沿った断面図である。下側から、下側の偏光板１７、下側の基板１１ｃ、液晶層１６、上側の基板１１ｂ、上側の偏光板１７が積層している。左端には上下の基板１１ｂ、１１ｃの端面とシール１５にガスバリア層１９が形成されている。右側の電極取り出し部では、上側の基板１１ｂの端面と、シール１５と下側の基板１１ｃの露出面とＦＰＣ２２の端部からなる空間に、シリコーンからなる保護部材２１が塗布されている。下側の基板１１ｃの右側の端面にはガスバリア層１９が形成されている。保護部材２１は、上側の基板１１ｂの端面を覆い気密性を保持しながら、透明電極（図示せず）の保護とＦＰＣ２２接着の補強を兼ねている。   FIG. 2B is a cross-sectional view taken along line A-B in FIG. From the lower side, the lower polarizing plate 17, the lower substrate 11c, the liquid crystal layer 16, the upper substrate 11b, and the upper polarizing plate 17 are laminated. At the left end, a gas barrier layer 19 is formed on the end surfaces of the upper and lower substrates 11 b and 11 c and the seal 15. In the right electrode extraction portion, a protective member 21 made of silicone is applied to a space formed by the end surface of the upper substrate 11b, the exposed surface of the seal 15 and the lower substrate 11c, and the end portion of the FPC 22. A gas barrier layer 19 is formed on the right end surface of the lower substrate 11c. The protective member 21 serves to protect the transparent electrode (not shown) and reinforce the adhesion of the FPC 22 while covering the end surface of the upper substrate 11b and maintaining airtightness.

図３は本発明の実施の形態の工程図である。単個に分離すると液晶表示素子の基板となる複数の区画が集合した上下のマザー基板に対し、ホトリソグラフィーにより透明電極膜が形成された面（以下ＩＴＯ面と称する）を加工し電極を形成する。次にポリイミドからなる配向膜を印刷し、配向膜面をラビングする。この後、上側のマザー基板に対し、電極取り出し部の辺２３に相当する領域に切り込みを入れる（切り欠き部カット）。なお辺２４に相当する領域は切り込まない。この切り込みは、切断位置と切り込み量が設定できるフィルムカッターを使用する。次にシール印刷機でシール１５を印刷し、ＩＴＯ面が対向するように上下のマザー基板を重ね合わせ、マザー基板を加圧し約１２０℃で焼成しシール１５を硬化させる。液晶表示素子となる複数の区画が一列に配列した領域（以下短冊と称する）をマザー基板から切り取り、この短冊状態で液晶注入と封孔を行う。なお液晶注入時は、まず真空チャンバーのなかで基板の焼成と液晶の脱泡を行ってガス成分を低減してから注入するのが好ましい。その後に短冊から個々の区画（以下単個セルと称する）を分離する。   FIG. 3 is a process diagram of the embodiment of the present invention. When separated into a single piece, the upper and lower mother substrates in which a plurality of sections to be substrates of the liquid crystal display element are gathered are processed by forming a surface (hereinafter referred to as ITO surface) on which the transparent electrode film is formed by photolithography. . Next, an alignment film made of polyimide is printed, and the alignment film surface is rubbed. Thereafter, the upper mother substrate is cut into a region corresponding to the side 23 of the electrode extraction portion (cut-out portion cut). Note that the region corresponding to the side 24 is not cut. This cutting uses a film cutter in which the cutting position and the cutting amount can be set. Next, the seal 15 is printed by a seal printer, and the upper and lower mother substrates are overlapped so that the ITO surfaces face each other. A region (hereinafter referred to as a strip) in which a plurality of sections serving as liquid crystal display elements are arranged in a line is cut out from the mother substrate, and liquid crystal is injected and sealed in this strip state. In addition, when injecting the liquid crystal, it is preferable to first inject after reducing the gas component by baking the substrate and defoaming the liquid crystal in a vacuum chamber. Thereafter, individual sections (hereinafter referred to as single cells) are separated from the strip.

単個セルの端面を洗浄してから、複数の単個セルを端面が合うように重ね合わせる。この単個セルの束から露出している端面がターゲットの方向に向くように低温スパッター装置にセットする。低温スパッター装置のチャンバーのなかで単個セルの束を回転させ４方向の端面全てにガスバリア層を形成する。このときの基板温度は前述の加圧・焼成温度以下にしておく。   After cleaning the end faces of the single cells, a plurality of single cells are overlaid so that the end faces are aligned. It is set in a low-temperature sputtering apparatus so that the end face exposed from the bundle of single cells faces the target. A bundle of single cells is rotated in a chamber of a low-temperature sputtering apparatus to form a gas barrier layer on all end faces in four directions. The substrate temperature at this time is set to be equal to or lower than the above-described pressurizing / firing temperature.

次に上側の基板１１ｂの辺２４に相当する領域を、カッターでキズをつける。完全に切り込まれている辺２４の端をつまみキズに沿って上側の基板１１ｂを引きちぎり切り欠き部を形成する。その後ＦＰＣ２２を貼付け、ＦＰＣ２２の接着部周辺に保護部材２１を塗布し、最後に偏光板１７を接着する。なお低温スパッターの後に上側の基板１１ｂを切り欠くので、低温スパッターを含め途中の各工程で電極取り出し部が不要な汚染から保護されている。   Next, a region corresponding to the side 24 of the upper substrate 11b is scratched with a cutter. The end of the side 24 that is completely cut is pinched along the scratch to tear the upper substrate 11b to form a notch. After that, the FPC 22 is pasted, the protective member 21 is applied around the adhesion part of the FPC 22, and finally the polarizing plate 17 is adhered. Since the upper substrate 11b is cut out after the low temperature sputtering, the electrode lead-out portion is protected from unnecessary contamination in each of the intermediate steps including the low temperature sputtering.

基板のガスバリア層は、基板の両面だけでなく、液晶層側ないし基板の液晶層と反対側だけに設けてもよい。   The gas barrier layer of the substrate may be provided not only on both sides of the substrate but also only on the liquid crystal layer side or on the opposite side of the substrate from the liquid crystal layer.

本発明の実施の形態の断面図である。It is sectional drawing of embodiment of this invention. 本発明の実施の形態の平面図（ａ）と断面図（ｂ）である。It is the top view (a) and sectional drawing (b) of embodiment of this invention. 本発明の実施の形態の工程図である。It is process drawing of embodiment of this invention. 従来例１の断面図である。It is sectional drawing of the prior art example 1. FIG.

符号の説明Explanation of symbols

１１ 基板支持材
１１ｂ 上側の基板
１１ｃ 下側の基板
１２，４２ 透明電極
１３，４３ 配向膜
１４，４４ スペーサ
１５，４５ シール
１６，４６ 液晶層
１７，４７ 偏光板
１８ ガスバリア層
１９ ガスバリア層
４１ 基板
４８ 反射板 11 Substrate support material 11b Upper substrate 11c Lower substrate 12, 42 Transparent electrode 13, 43 Alignment film 14, 44 Spacer 15, 45 Seal 16, 46 Liquid crystal layer 17, 47 Polarizer 18 Gas barrier layer 19 Gas barrier layer 41 Substrate 48 a reflector

Claims (3)

２枚の可撓性を有する基板がシールを介して積層し、該基板と該シールから形成された空間に液晶が注入された液晶表示素子において、
前記基板は少なくとも一方の基板面にガスバリア層を有し、前記基板の切断面に無機材料からなるガスバリア層を備えたことを特徴とする液晶表示素子。 In a liquid crystal display element in which two flexible substrates are stacked through a seal, and liquid crystal is injected into a space formed from the substrate and the seal.
The substrate has a gas barrier layer on at least one substrate surface, and a gas barrier layer made of an inorganic material on a cut surface of the substrate. 前記ガスバリア層は、スパッターにより形成されていることを特徴とする請求項１記載の液晶表示素子。   The liquid crystal display element according to claim 1, wherein the gas barrier layer is formed by sputtering. 前記液晶を注入したあと単個に分離されたセルを複数枚積み重ねた状態で、スパッターにより前記切断面のガスバリア層が形成されたことを特徴とする請求項１または２に記載の液晶表示素子。   3. The liquid crystal display element according to claim 1, wherein the gas barrier layer of the cut surface is formed by sputtering in a state where a plurality of cells separated into single pieces are stacked after the liquid crystal is injected.
JP2007067680A 2007-03-16 2007-03-16 Liquid crystal display element Pending JP2008225399A (en)

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