JP2008142710A - 二種以上のガス状もしくは液状流を混合するための方法および装置 - Google Patents
二種以上のガス状もしくは液状流を混合するための方法および装置 Download PDFInfo
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Abstract
【解決手段】 ガス状流体を入口室内で一緒にしそしてその後に、一つ以上の段で繰り返して加速させおよび減速させ、そして加速させた一緒にしたガス状流体の最大の線速度の値を、各々の工程において、ガス状流体質量流量の範囲内に保つ、二種以上の流体流を混合する方法。座を有するボディ; 座内に設置したプラグを有するスピンドルを含み,そして座およびプラグは、同じ複数の円錐形の環を形成する複数の円錐形の表面を有する。スピンドルは、混合作業中に、座内の軸をスピンドル方向に移動させることができる二種以上のガス状または液状流を混合するための装置。
【選択図】 図1
Description
Fは、Nm3/秒で表す全ガス流量であり、
DseatおよびDplug は、環内の同じ位置mにおける、座の内直径およびプラグの直径であり、
Pは、ミキサー内のMPaで表す圧力でありそしてPref は、3.0 MPaであり,
T は、ミキサー内のKで表す温度でありそしてTref は、473.15 Kである。
R1 は、1×106〜1×108Nm3/秒/m2の範囲、好ましくは5×106〜2×107 Nm3/秒/m2の範囲でなければならない。
式中、
Fは、Nm3/秒で表す全ガス流量であり、
nは、孔の数であり、
Dholeは、mにおける、室の間の1つの孔の直径であり、
Pは、ミキサー内のMPaで表す圧力でありそしてPref は、3.0 MPaであり,
T は、ミキサー内のKで表す温度でありそしてTref は、473.15 Kである。
円錐形の表面は、スピンドルの軸と10° - 30°、好ましくは17.4° - 17.6°の角をなす。
2 座
3 プラグ
4 多孔質媒体
5 出口
6 環
7、9 室
8 孔
10 上部入口
11 ボディ
12 案内
13 アクチュエーター
14 内チューブ
15 オキシダント入口
16 炭化水素入
17 スピンドル
20 CPO反応装置
21 触媒床
22 火炎防止装置
23,24 圧力ゲージ
25 圧力測定計器
26 制御装置
31 入口環
33 チューブプラグ
35 機素
36 穿孔チューブ
37 出口経路
38 出口孔
39 孔
42 スプレーノズル
Claims (11)
- 流体を入口室内で一緒にしそしてその後に、一つ以上の段で繰り返して加速させおよび減速させ、
そして
加速させた一緒にしたガス状流体の最大の線速度の値を、各々の工程において、供給流体の質量流量の範囲内に保つ
ことを特徴とする、二種以上の流動流体を混合する方法。 - 流路混合作業中に最も小さい流路の面積を調節することによって、最大の線速度を保つ、請求項1記載の方法
- 各々の段において、減速させた一緒にした流体の流れ方向を、一回以上, 好ましくは3 - 5回90°変化させることによって、更なる混合を得る、請求項1記載の方法。
- 下記:
ボディ;
座;
プラグを有するスピンドル;
入口室;
座の内部に設置されたプラグ
を含み、
座およびプラグは、同じ複数の円錐形の環を形成する複数の円錐形の表面を有し;
2つの環の間に2つの室を形成しおよび該2つの室の間に孔を開けた流れ接続を有するために、座を造形し;
そして
混合作業中に、スピンドルは、移動させることができるプラグを座内でスピンドル軸方向に移動させることができる
ことを特徴とする、請求項1、2または3記載の二種以上のガス状または液状流体を混合するための装置。 - 多孔質媒体を入口室内に設置する、請求項4記載の装置。
- ガス流量と環の横断流れ面積との間の関係が、下記として表され:
式中、
Fは、Nm3/秒で表す全ガス流量であり、
DseatおよびDplug は、環内の同じ位置mにおける、座の内直径およびプラグの直径であり、
Pは、ミキサー内のMPaで表す圧力でありそしてPref は、3.0 MPaであり,
T は、ミキサー内のKで表す温度でありそしてTref は、473.15 Kである。
R1 は、1×106〜1×108Nm3/秒/m2の範囲、好ましくは5×106〜2×107 Nm3/秒/m2の範囲であり、
そして
ガス流量と、室の間に孔を開けた接続を形成する横断流れ面積との間の関係が、下記として表される:
式中、
Fは、Nm3/秒で表す全ガス流量であり、
nは、孔の数であり、
Dholeは、mにおける、室の間の孔の直径であり、
Pは、ミキサー内のMPaで表す圧力でありそしてPref は、3.0 MPaであり,
T は、ミキサー内のKで表す温度でありそしてTref は、473.15 Kであり;および
R2 は、5×105〜1×107 Nm3/秒/m2の範囲、好ましくは1×106〜2×106 Nm3/秒/m2の範囲である、
請求項3〜5のいずれか一に記載の装置。 - スピンドルおよびプラグが、更に、内部液体流路および内部液体流路の出口端部に接続されたスプレーノズルを含む、請求項4〜6のいずれか一に記載の装置。
- - ボディ;
-ボディ内に同軸に設置されたチューブプラグに接続された可動スピンドル; ここで
-チューブプラグは、スピンドルに近接した端部が穿孔されおよび他端が開放しており; および
-供給流体は、穿孔を通ってチューブプラグに入り;
-チューブプラグを囲むノズルを有しおよび実質的にチューブプラグからの空隙がないケージ; ここで
-ケージの高さ - 垂直に設置される場合 - およびチューブプラグの非穿孔部分の高さは、実質的に同じであり;および
・ チューブプラグの非穿孔部分は、上部,中部または下部位置に位置させる時に、ノズルのゼロ, いくらかまたはすべてを遮断することができ; および
- ケージを囲む複数の環状混合機素; ここで
-混合機素は、互いに隔離され;
- ケージおよび混合機素は、端部が閉鎖され,チューブプラグ端部は、開放しており; および
- ケージノズルの全流れ面積は、ミキサーの他のいずれの流路の流れ面積に比べて相当に小さい
を含むことを特徴とする、請求項1, 2または3に記載の二種以上のガス状または液状供給流体を混合するための装置。 - 多孔質媒体を穿孔の上流に設置しおよび多孔質媒体をチューブプラグ内に設置する、請求項8記載の装置。
- 供給流体が炭化水素流体, 水蒸気流体およびオキシダント流体である、請求項4, 5, 6, 7,および9のいずれか一に記載の装置。
- 混合流体が接触部分酸化プロセス用の供給流体を形成する、請求項10記載の装置。
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EP (1) | EP1930069B1 (ja) |
JP (1) | JP5132289B2 (ja) |
CN (1) | CN101249393B (ja) |
AT (1) | ATE481159T1 (ja) |
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ITUB20155366A1 (it) * | 2015-11-09 | 2017-05-09 | Soc It Acetilene E Derivati S I A D S P A In Breve Siad S P A | Dispositivo e corrispondente metodo per la dispersione di gas in liquidi |
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DE102012209342A1 (de) * | 2012-06-04 | 2013-12-05 | Siemens Aktiengesellschaft | Verfahren zum Anpassen der Geometrie einer Dispergierdüse |
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- 2007-11-07 DE DE200760009175 patent/DE602007009175D1/de active Active
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- 2007-12-07 JP JP2007316701A patent/JP5132289B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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CN101249393B (zh) | 2011-12-07 |
RU2007145268A (ru) | 2009-06-20 |
US20080140261A1 (en) | 2008-06-12 |
DE602007009175D1 (de) | 2010-10-28 |
RU2468857C2 (ru) | 2012-12-10 |
ZA200710587B (en) | 2008-11-26 |
EP1930069B1 (en) | 2010-09-15 |
ATE481159T1 (de) | 2010-10-15 |
EP1930069A1 (en) | 2008-06-11 |
CN101249393A (zh) | 2008-08-27 |
JP5132289B2 (ja) | 2013-01-30 |
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