JP2008053494A - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
- Publication number
- JP2008053494A JP2008053494A JP2006228723A JP2006228723A JP2008053494A JP 2008053494 A JP2008053494 A JP 2008053494A JP 2006228723 A JP2006228723 A JP 2006228723A JP 2006228723 A JP2006228723 A JP 2006228723A JP 2008053494 A JP2008053494 A JP 2008053494A
- Authority
- JP
- Japan
- Prior art keywords
- heater electrode
- phase change
- semiconductor device
- specific resistance
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 239000010410 layer Substances 0.000 claims description 110
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 53
- 238000009792 diffusion process Methods 0.000 claims description 39
- 239000011229 interlayer Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 150000002736 metal compounds Chemical group 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 claims description 10
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 claims description 6
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 claims description 6
- 239000011669 selenium Substances 0.000 claims description 6
- CYKMNKXPYXUVPR-UHFFFAOYSA-N [C].[Ti] Chemical compound [C].[Ti] CYKMNKXPYXUVPR-UHFFFAOYSA-N 0.000 claims description 5
- DXZIFGZIQQRESB-UHFFFAOYSA-N [C].[Ti].[Si] Chemical compound [C].[Ti].[Si] DXZIFGZIQQRESB-UHFFFAOYSA-N 0.000 claims description 5
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 claims description 5
- 238000004904 shortening Methods 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 229910052714 tellurium Inorganic materials 0.000 claims description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 3
- 229920000535 Tan II Polymers 0.000 claims 1
- 235000007575 Calluna vulgaris Nutrition 0.000 abstract 1
- 239000007769 metal material Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 111
- 239000000463 material Substances 0.000 description 11
- 239000012782 phase change material Substances 0.000 description 9
- 239000013078 crystal Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- AKUCEXGLFUSJCD-UHFFFAOYSA-N indium(3+);selenium(2-) Chemical compound [Se-2].[Se-2].[Se-2].[In+3].[In+3] AKUCEXGLFUSJCD-UHFFFAOYSA-N 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- MNWRORMXBIWXCI-UHFFFAOYSA-N tetrakis(dimethylamido)titanium Chemical compound CN(C)[Ti](N(C)C)(N(C)C)N(C)C MNWRORMXBIWXCI-UHFFFAOYSA-N 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910005537 GaSeTe Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910006913 SnSb Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- VTGARNNDLOTBET-UHFFFAOYSA-N gallium antimonide Chemical compound [Sb]#[Ga] VTGARNNDLOTBET-UHFFFAOYSA-N 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- DDJAGKOCVFYQOV-UHFFFAOYSA-N tellanylideneantimony Chemical compound [Te]=[Sb] DDJAGKOCVFYQOV-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
- H10N70/8413—Electrodes adapted for resistive heating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8825—Selenides, e.g. GeSe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8828—Tellurides, e.g. GeSbTe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/884—Switching materials based on at least one element of group IIIA, IVA or VA, e.g. elemental or compound semiconductors
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
Abstract
【解決手段】ヒータ電極1は、高抵抗の金属材料からなる複数のヒータ電極層1−1〜1−6により構成する。複数のヒータ電極層1の比抵抗を下部電極側7から相変化膜側3へと徐々に高くし、相変化膜3と接触する領域2のヒータ電極層1−6の比抵抗を最大とする。最大の比抵抗を有する上層のヒータ電極層1−6により、効率的に高温とすることが可能となる。そのため小さな書換え電流で、効率よく書換え動作が実施できる。
【選択図】 図6
Description
ヒータ電極の発熱量 ∝ I2Rt
I ∝ ((発熱量)/Rt)1/2 となる。
2 相変化領域
3 相変化膜
4 上部電極
5 層間絶縁膜
6 ゲート電極
7 ドレイン拡散層
8 ソース拡散層
9 コンタクトプラグ
10 定電位配線
11 第1層間絶縁膜
12 第2層間絶縁膜
13 コンタクトホール
Claims (17)
- 下部電極を覆うように半導体基板上に形成された層間絶縁膜と、前記下部電極を露出させるように層間絶縁膜に開口されたコンタクトホールに形成されたヒータ電極と、前記ヒータ電極の上面に接するように形成された相変化膜と、前記相変化膜の上面に形成された上部電極とを備え、前記ヒータ電極は前記下部電極から前記相変化膜に向って、順次高い比抵抗を有する積層された第1番目から第n番目(nは3以上の正の整数)の複数のヒータ電極層からなることを特徴とする半導体装置。
- 前記第n番目のヒータ電極層の比抵抗は、1000μΩ・cm以上であることを特徴とする請求項1に記載の半導体装置。
- 前記第n番目のヒータ電極層は金属を含む金属化合物であり、金属化合物の比抵抗は、前記金属の比抵抗の100倍以上高いことを特徴とする請求項1に記載の半導体装置。
- 前記ヒータ電極層は、TiN(チタンナイトライド)、TiSiN(チタンシリコンナイトライド)、TiAlN(チタンアルミニュームナイトライド)、C(カーボン)、CN(カーボンナイトライド)、MoN(モリブデンナイトライド)、TaN(タンタルナイトライド)、PtIr(イリジューム白金)、TiCN(チタンカーボンナイトライド)、TiSiC(チタンシリコンカーボン)のうちいずれかを含むことを特徴とする請求項1に記載の半導体装置。
- 前記相変化膜は、ゲルマニウム(Ge)、アンチモン(Sb)、テルル(Te)、セレン(Se)、ガリウム(Ga)、インジュム(In)のうちいずれかを含むことを特徴とする請求項1に記載の半導体装置。
- 前記下部電極は、メモリセルトランジスタを形成する拡散層であることを特徴とする請求項1に記載の半導体装置。
- 前記上部電極はビット線に接続され、前記メモリセルトランジスタの他方の拡散層は定電位配線に接続されたことを特徴とする請求項6に記載の半導体装置。
- 半導体基板に形成された拡散層と、前記拡散層を覆うように半導体基板上に形成された層間絶縁膜と、前記拡散層を露出させるように層間絶縁膜に開口されたコンタクトホールに形成されたヒータ電極と、前記ヒータ電極の上面に接するように形成された相変化膜と、前記相変化膜の上面に形成された上部電極とを備え、前記ヒータ電極は前記拡散層と前記相変化膜とを導通させる1つのコンタクトホール内に形成したことを特徴とする半導体装置。
- 前記ヒータ電極は前記拡散層から前記相変化膜に向って、順次高い比抵抗を有する積層された第1番目から第n番目(nは3以上の正の整数)の複数のヒータ電極層からなることを特徴とする請求項8に記載の半導体装置。
- 下部電極を覆うように層間絶縁膜を成膜する工程と、前記下部電極を露出させるように層間絶縁膜にコンタクトホールを開口する工程と、前記コンタクトホールに前記下部電極から前記相変化膜に向って、順次高い比抵抗を有する積層された第1番目から第n番目(nは3以上の正の整数)の複数のヒータ電極層からなるヒータ電極を形成する工程と、前記ヒータ電極の上面に接するように相変化膜を形成する工程と、前記相変化膜の上面に上部電極を形成する工程と、を備えたことを特徴とする半導体装置の製造方法。
- 前記第n番目のヒータ電極層の比抵抗は、1000μΩ・cm以上であることを特徴とする請求項10に記載の半導体装置の製造方法。
- 前記第n番目のヒータ電極層は金属を含む金属化合物であり、金属化合物の比抵抗は、前記金属の比抵抗の100倍以上高いことを特徴とする請求項10に記載の半導体装置の製造方法。
- 前記ヒータ電極層は、TiN(チタンナイトライド)、TiSiN(チタンシリコンナイトライド)、TiAlN(チタンアルミニュームナイトライド)、C(カーボン)、CN(カーボンナイトライド)、MoN(モリブデンナイトライド)、TaN(タンタルナイトライド)、PtIr(イリジューム白金)、TiCN(チタンカーボンナイトライド)、TiSiC(チタンシリコンカーボン)のうちいずれかを含むことを特徴とする請求項11に記載の半導体装置の製造方法。
- 前記ヒータ電極を形成する工程は、MOCVD(有機金属気相成長)法を用いて形成することを特徴とする請求項11に記載の半導体装置の製造方法。
- 前記MOCVD法のトリートメント時間を短くすることで、ヒータ電極層の比抵抗を高くすることを特徴とする請求項11に記載の半導体装置の製造方法。
- 前記第n番目のヒータ電極層の上面を、酸素、窒素、カーボン、シリコンのいずれかをイオン注入し、さらに高い比抵抗とすることを特徴とする請求項11に記載の半導体装置の製造方法。
- 前記第n番目のヒータ電極層の上面を、熱酸化法、プラズマ酸化法、プラズマ窒化法いずれかの方法を用いて、さらに高い比抵抗とすることを特徴とする請求項11に記載の半導体装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006228723A JP2008053494A (ja) | 2006-08-25 | 2006-08-25 | 半導体装置及びその製造方法 |
US11/845,226 US20080210923A1 (en) | 2006-08-25 | 2007-08-27 | Semiconductor device and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006228723A JP2008053494A (ja) | 2006-08-25 | 2006-08-25 | 半導体装置及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008053494A true JP2008053494A (ja) | 2008-03-06 |
Family
ID=39237252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006228723A Pending JP2008053494A (ja) | 2006-08-25 | 2006-08-25 | 半導体装置及びその製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20080210923A1 (ja) |
JP (1) | JP2008053494A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010027928A (ja) * | 2008-07-22 | 2010-02-04 | Tokyo Electron Ltd | 窒化チタン膜の改質方法及び改質装置 |
WO2010017425A1 (en) * | 2008-08-07 | 2010-02-11 | Sandisk 3D, Llc | A memory cell that includes a carbon-based memory element and methods of forming the same |
JPWO2010140210A1 (ja) * | 2009-06-01 | 2012-11-15 | 株式会社日立製作所 | 半導体記憶装置およびその製造方法 |
CN104103613A (zh) * | 2013-04-12 | 2014-10-15 | 索尼公司 | 具有非易失性存储器的集成电路***及其制造方法 |
US10547000B2 (en) | 2017-10-20 | 2020-01-28 | Samsung Electronics Co., Ltd. | Variable resistance memory device and method of manufacturing the same |
WO2021071629A1 (en) * | 2019-10-08 | 2021-04-15 | Eugenus, Inc. | Titanium silicon nitride barrier layer |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1677371A1 (en) | 2004-12-30 | 2006-07-05 | STMicroelectronics S.r.l. | Dual resistance heater for phase change devices and manufacturing method thereof |
US20090230375A1 (en) * | 2008-03-17 | 2009-09-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Phase Change Memory Device |
US8133793B2 (en) * | 2008-05-16 | 2012-03-13 | Sandisk 3D Llc | Carbon nano-film reversible resistance-switchable elements and methods of forming the same |
US7939817B2 (en) * | 2008-07-03 | 2011-05-10 | Qimonda Ag | Integrated circuit including memory element with spatially stable material |
US8569730B2 (en) * | 2008-07-08 | 2013-10-29 | Sandisk 3D Llc | Carbon-based interface layer for a memory device and methods of forming the same |
US8835892B2 (en) * | 2008-10-30 | 2014-09-16 | Sandisk 3D Llc | Electronic devices including carbon nano-tube films having boron nitride-based liners, and methods of forming the same |
US20100108976A1 (en) * | 2008-10-30 | 2010-05-06 | Sandisk 3D Llc | Electronic devices including carbon-based films, and methods of forming such devices |
US8421050B2 (en) * | 2008-10-30 | 2013-04-16 | Sandisk 3D Llc | Electronic devices including carbon nano-tube films having carbon-based liners, and methods of forming the same |
US8183121B2 (en) | 2009-03-31 | 2012-05-22 | Sandisk 3D Llc | Carbon-based films, and methods of forming the same, having dielectric filler material and exhibiting reduced thermal resistance |
KR101620638B1 (ko) * | 2009-09-29 | 2016-05-13 | 주식회사 포스코 | 증착물질의 증발율 측정 장치 |
US8247789B2 (en) | 2010-08-31 | 2012-08-21 | Micron Technology, Inc. | Memory cells and methods of forming memory cells |
KR20120104031A (ko) * | 2011-03-11 | 2012-09-20 | 삼성전자주식회사 | 상변화 물질층, 상변화 물질층의 형성 방법, 상변화 메모리 장치 및 상변화 메모리 장치의 제조 방법 |
CN103794722A (zh) * | 2014-02-20 | 2014-05-14 | 中国科学院苏州纳米技术与纳米仿生研究所 | 新型相变存储单元结构及其制备方法 |
US10147876B1 (en) * | 2017-08-31 | 2018-12-04 | Sandisk Technologies Llc | Phase change memory electrode with multiple thermal interfaces |
US10825987B2 (en) * | 2018-06-06 | 2020-11-03 | Micron Technology, Inc. | Fabrication of electrodes for memory cells |
CN111279501B (zh) * | 2020-01-16 | 2021-05-14 | 长江存储科技有限责任公司 | 相变存储器 |
US20210242401A1 (en) * | 2020-01-31 | 2021-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Memory device and programming method thereof |
EP3876274A1 (en) * | 2020-03-05 | 2021-09-08 | Infineon Technologies AG | Integrated circuit, method for manufcaturing an integrated circuit, wafer and method for manufacturing a wafer |
US20230099419A1 (en) * | 2021-09-24 | 2023-03-30 | International Business Machines Corporation | Artificial intelligence device cell with improved phase change material region |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7005372B2 (en) * | 2003-01-21 | 2006-02-28 | Novellus Systems, Inc. | Deposition of tungsten nitride |
DE60220245D1 (de) * | 2002-01-17 | 2007-07-05 | St Microelectronics Srl | Integriertes Widerstandselement, Phasenwechsel Speicherelement mit solchem Widerstandselement, und Verfahren zu seiner Herstellung |
US6791102B2 (en) * | 2002-12-13 | 2004-09-14 | Intel Corporation | Phase change memory |
KR100979710B1 (ko) * | 2003-05-23 | 2010-09-02 | 삼성전자주식회사 | 반도체 메모리 소자 및 제조방법 |
KR100618879B1 (ko) * | 2004-12-27 | 2006-09-01 | 삼성전자주식회사 | 게르마늄 전구체, 이를 이용하여 형성된 gst 박막,상기 박막의 제조 방법 및 상변화 메모리 소자 |
TWI261099B (en) * | 2005-02-17 | 2006-09-01 | Au Optronics Corp | Backlight modules |
JP2007019305A (ja) * | 2005-07-08 | 2007-01-25 | Elpida Memory Inc | 半導体記憶装置 |
US7339814B2 (en) * | 2005-08-24 | 2008-03-04 | Infineon Technologies Ag | Phase change memory array having equalized resistance |
US8003972B2 (en) * | 2006-08-30 | 2011-08-23 | Micron Technology, Inc. | Bottom electrode geometry for phase change memory |
-
2006
- 2006-08-25 JP JP2006228723A patent/JP2008053494A/ja active Pending
-
2007
- 2007-08-27 US US11/845,226 patent/US20080210923A1/en not_active Abandoned
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010027928A (ja) * | 2008-07-22 | 2010-02-04 | Tokyo Electron Ltd | 窒化チタン膜の改質方法及び改質装置 |
JP4636133B2 (ja) * | 2008-07-22 | 2011-02-23 | 東京エレクトロン株式会社 | 窒化チタン膜の改質方法及び改質装置 |
US8409961B2 (en) | 2008-07-22 | 2013-04-02 | Tokyo Electron Limited | Alteration method and alteration apparatus for titanium nitride |
WO2010017425A1 (en) * | 2008-08-07 | 2010-02-11 | Sandisk 3D, Llc | A memory cell that includes a carbon-based memory element and methods of forming the same |
JPWO2010140210A1 (ja) * | 2009-06-01 | 2012-11-15 | 株式会社日立製作所 | 半導体記憶装置およびその製造方法 |
CN104103613A (zh) * | 2013-04-12 | 2014-10-15 | 索尼公司 | 具有非易失性存储器的集成电路***及其制造方法 |
JP2014207451A (ja) * | 2013-04-12 | 2014-10-30 | ソニー株式会社 | 不揮発性メモリを備えた集積回路システム及びその製造方法 |
US10547000B2 (en) | 2017-10-20 | 2020-01-28 | Samsung Electronics Co., Ltd. | Variable resistance memory device and method of manufacturing the same |
US10923655B2 (en) | 2017-10-20 | 2021-02-16 | Samsung Electronics Co., Ltd. | Variable resistance memory device and method of manufacturing the same |
WO2021071629A1 (en) * | 2019-10-08 | 2021-04-15 | Eugenus, Inc. | Titanium silicon nitride barrier layer |
US11832537B2 (en) | 2019-10-08 | 2023-11-28 | Eugenus, Inc. | Titanium silicon nitride barrier layer |
Also Published As
Publication number | Publication date |
---|---|
US20080210923A1 (en) | 2008-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2008053494A (ja) | 半導体装置及びその製造方法 | |
US8742387B2 (en) | Resistive memory devices with improved resistive changing elements | |
US7888719B2 (en) | Semiconductor memory structures | |
US7545668B2 (en) | Mushroom phase change memory having a multilayer electrode | |
US7932506B2 (en) | Fully self-aligned pore-type memory cell having diode access device | |
US7791057B2 (en) | Memory cell having a buried phase change region and method for fabricating the same | |
TWI384664B (zh) | 一種具有二極體驅動器之記憶陣列及其製造方法 | |
US7825398B2 (en) | Memory cell having improved mechanical stability | |
JP4437299B2 (ja) | 半導体装置及びその製造方法 | |
US8415651B2 (en) | Phase change memory cell having top and bottom sidewall contacts | |
US20070131980A1 (en) | Vacuum jacket for phase change memory element | |
US20090303780A1 (en) | Integrated circuit including an array of diodes coupled to a layer of resistance changing material | |
US20100019215A1 (en) | Mushroom type memory cell having self-aligned bottom electrode and diode access device | |
JP4437300B2 (ja) | 半導体装置 | |
US8916845B2 (en) | Low operational current phase change memory structures | |
US8916414B2 (en) | Method for making memory cell by melting phase change material in confined space | |
US9343676B2 (en) | Heating phase change material | |
US8178379B2 (en) | Integrated circuit, resistivity changing memory device, memory module, and method of fabricating an integrated circuit | |
US7732888B2 (en) | Integrated circuit, method for manufacturing an integrated circuit, memory cell array, memory module, and device | |
JP2009206418A (ja) | 不揮発性メモリ装置及びその製造方法 | |
KR20080050098A (ko) | 상변환 기억 소자의 제조방법 | |
US20130193402A1 (en) | Phase-change random access memory device and method of manufacturing the same | |
US7897954B2 (en) | Dielectric-sandwiched pillar memory device | |
CN111009607B (zh) | 可变电阻存储器件 | |
US8508021B2 (en) | Phase-change memory device and method of fabricating the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20081009 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081015 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081212 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090114 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20090513 |