JP2008021407A - データ記憶方法及びデータ記憶装置 - Google Patents
データ記憶方法及びデータ記憶装置 Download PDFInfo
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- JP2008021407A JP2008021407A JP2007204945A JP2007204945A JP2008021407A JP 2008021407 A JP2008021407 A JP 2008021407A JP 2007204945 A JP2007204945 A JP 2007204945A JP 2007204945 A JP2007204945 A JP 2007204945A JP 2008021407 A JP2008021407 A JP 2008021407A
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- 238000000034 method Methods 0.000 title claims abstract description 58
- 239000002184 metal Substances 0.000 claims abstract description 64
- 229910052751 metal Inorganic materials 0.000 claims abstract description 64
- 238000005530 etching Methods 0.000 claims abstract description 41
- 238000010894 electron beam technology Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000010408 film Substances 0.000 claims description 70
- 238000013500 data storage Methods 0.000 claims description 62
- 239000010931 gold Substances 0.000 claims description 23
- 239000010936 titanium Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 238000005259 measurement Methods 0.000 description 4
- 238000000089 atomic force micrograph Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005329 nanolithography Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/10—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using electron beam; Record carriers therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
- G11B9/1463—Record carriers for recording or reproduction involving the use of microscopic probe means
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
- G11B9/1463—Record carriers for recording or reproduction involving the use of microscopic probe means
- G11B9/149—Record carriers for recording or reproduction involving the use of microscopic probe means characterised by the memorising material or structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31747—Etching microareas using STM
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- Condensed Matter Physics & Semiconductors (AREA)
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- Micromachines (AREA)
- ing And Chemical Polishing (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
【解決手段】上面に金属膜20が形成された基板100を調製する段階と、金属膜20の上方にマイクロチップ50を配置する段階と、金属膜20とマイクロチップ50との間に所定の電圧を印加してマイクロチップ50から電子ビーム30を発生させる段階と、電子ビーム30により金属膜20の表面を所定のパターンにエッチングする段階とを含む。マイクロチップ50に負のバイアスを印加することにより、従来のように機械的な強い力を加えずに、所定電圧を印加したマイクロチップ50から発生された電子ビーム30による加熱及び溶解を実行する方式を用いて、情報を表すエッチングパターンを所望の形状と大きさに制御して形成することが容易となる。
【選択図】図1
Description
ここで、前記読み出し段階は、前記金属膜の表面に形成された所定のパターンの形状を検出して行うことが望ましい。(請求項2)
前記データ記憶方法及びデータ記憶装置において、前記金属膜をエッチングする際、前記金属膜に対して前記マイクロチップが相対的な運動をすることが望ましい。(請求項3)
特に望ましくは、前記電圧が所定の範囲内で可変であり、前記金属膜に対するエッチング度を適宜制御する。(請求項4)
また、さらに望ましくは、前記電圧は12〜25Vであり、前記マイクロチップは負にバイアスされる。(請求項6)
そして、前記マイクロチップは表面にチタン薄膜が形成されたシリコン(Si)から構成されることが望ましい。(請求項7、10)
図1は、本発明の実施形態に係るデータ記憶方法及びデータ記憶装置並びにその原理を示した模式的な断面図である。本実施形態にあっては、まず、図1に示すように、シリコン酸化膜(SiO2)が被覆されたSi基板(SiO2/Si)10の上に、金(Au)からなる金属膜20が形成されたAu/SiO2/Si記録板100が調製される。
20 金(Au)からなる金属膜
30 電子ビーム
40 居部的にエッチングされた部分
50 シリコンの表面にチタン膜がコーティングされたマイクロチップ
100 シリコン酸化膜が被覆されたSi基板10の上に、Auからなる金属膜20が形成された記録板(Au/SiO2/Si)
Claims (10)
- データを書き込む書き込み段階と、データを読み出す読み出し段階とを含み、
前記書き込み段階は、
上面に金属膜が形成された基板を調製する段階と、
前記金属膜の上方にマイクロチップを配置する段階と、
前記金属膜とマイクロチップとの間に所定の電圧を印加してマイクロチップから電子ビームを発生させる段階と、
前記電子ビームにより前記金属膜の表面を所定のパターンにエッチングする段階と、
を含むことを特徴とするデータ記憶方法。 - 前記読み出し段階は、
前記金属膜の表面に形成された所定のパターンの形状を検出して行うことを特徴とする請求項1に記載のデータ記憶方法。 - 前記金属膜をエッチングする段階において、前記マイクロチップが前記金属膜に対して相対的な運動をすることを特徴とする請求項1に記載のデータ記憶方法。
- 前記電圧は、所定の範囲内で可変であり、前記金属膜のエッチングの度合いが制御可能に構成されることを特徴とする請求項1に記載のデータ記憶方法。
- 前記基板は、その表面にシリコン酸化膜が形成されたシリコン基板であり、
前記金属膜は、金(Au)として前記シリコン酸化膜の上面に形成されることを特徴とする請求項1に記載のデータ記憶方法。 - 前記所定の電圧は、12〜25Vであり、
前記マイクロチップは、負にバイアスされることを特徴とする請求項1に記載のデータ記憶方法。 - 前記マイクロチップは、表面にチタン薄膜が形成されたシリコン(Si)から構成されていることを特徴とする請求項1に記載のデータ記憶方法。
- 上面に金属膜が形成された基板からなる記録板と、
前記金属膜の上方に配置されるマイクロチップと、
前記マイクロチップから前記金属膜の表面に向けて電子ビームを放出すべく、前記金属膜とマイクロチップとの間に所定の電圧を印加する電圧印加手段と、
からなることを特徴とするデータ記憶装置。 - 前記基板は、その表面にシリコン酸化膜が形成されたシリコン基板であり、
前記金属膜は、金(Au)として前記シリコン酸化膜の上面に形成されることを特徴とする請求項8に記載のデータ記憶装置。 - 前記マイクロチップは、表面にチタン薄膜が形成されたシリコン(Si)から構成されていることを特徴とする請求項8に記載のデータ記憶装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020010026210A KR100604813B1 (ko) | 2001-05-14 | 2001-05-14 | 정보기록방법 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001351052A Division JP2002332580A (ja) | 2001-05-14 | 2001-11-16 | 金属膜のナノメートルスケールエッチング方法 |
Publications (1)
Publication Number | Publication Date |
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JP2008021407A true JP2008021407A (ja) | 2008-01-31 |
Family
ID=19709450
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001351052A Pending JP2002332580A (ja) | 2001-05-14 | 2001-11-16 | 金属膜のナノメートルスケールエッチング方法 |
JP2007204945A Pending JP2008021407A (ja) | 2001-05-14 | 2007-08-07 | データ記憶方法及びデータ記憶装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2001351052A Pending JP2002332580A (ja) | 2001-05-14 | 2001-11-16 | 金属膜のナノメートルスケールエッチング方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6664123B2 (ja) |
JP (2) | JP2002332580A (ja) |
KR (1) | KR100604813B1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2400908A (en) * | 2003-04-25 | 2004-10-27 | E2V Tech Uk Ltd | Molecular detector arrangement |
TWI269699B (en) * | 2003-06-03 | 2007-01-01 | Hon Hai Prec Ind Co Ltd | A method for making a molding die and a light guide plate |
KR100520631B1 (ko) * | 2003-07-23 | 2005-10-13 | 삼성전자주식회사 | 나노스케일 디지털 데이터 저장 장치 |
US7215633B2 (en) * | 2003-08-13 | 2007-05-08 | Hewlett-Packard Development Company, L.P. | Storage device having a probe with a tip to form a groove in a storage medium |
KR100585462B1 (ko) * | 2003-12-26 | 2006-06-07 | 한국전자통신연구원 | 정보 저장 및 독출 장치 |
EP1848626B1 (de) * | 2005-02-18 | 2017-04-19 | Bayerische Motoren Werke Aktiengesellschaft | Vorrichtung zum verbringen eines kraftfahrzeugs in eine zielposition |
US7749922B2 (en) * | 2005-05-05 | 2010-07-06 | The Board Of Trustees Of The University Of Illinois | Nanowire structures and electrical devices |
CN102211754B (zh) * | 2010-04-02 | 2013-09-18 | 中国科学院沈阳自动化研究所 | 基于afm的纳米沟道加工方法 |
KR101223977B1 (ko) * | 2010-05-26 | 2013-01-18 | 경상대학교산학협력단 | 독성을 억제하는 타이타늄 나노 구조 스텐트의 제작방법 |
US20230189664A1 (en) * | 2021-12-15 | 2023-06-15 | International Business Machines Corporation | Qubit Capacitor Trimming for Frequency Tuning |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01312753A (ja) * | 1988-06-13 | 1989-12-18 | Canon Inc | 記録再生装置 |
JP2000193672A (ja) * | 1998-12-25 | 2000-07-14 | Olympus Optical Co Ltd | 走査型プロ―ブ顕微鏡用カンチレバ―およびその作製方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4971851A (en) * | 1984-02-13 | 1990-11-20 | Hewlett-Packard Company | Silicon carbide film for X-ray masks and vacuum windows |
US5021672A (en) * | 1989-12-22 | 1991-06-04 | E. I. Du Pont De Nemours And Company | Etching of nanoscale structures |
US5219826A (en) * | 1990-08-20 | 1993-06-15 | Conductus, Inc. | Superconducting junctions and method of making same |
JP3422428B2 (ja) * | 1993-07-22 | 2003-06-30 | 科学技術振興事業団 | 微細加工レジストパターンの形成方法 |
KR100322696B1 (ko) * | 1995-03-29 | 2002-06-20 | 김순택 | 전계효과전자방출용마이크로-팁및그제조방법 |
KR0170472B1 (ko) * | 1995-12-21 | 1999-02-01 | 정선종 | 주사관통현미경의 저전압진공증착을 이용한 상온작동 단일전자트랜지스터의 제조방법 |
US5892223A (en) * | 1997-06-30 | 1999-04-06 | Harris Corporation | Multilayer microtip probe and method |
-
2001
- 2001-05-14 KR KR1020010026210A patent/KR100604813B1/ko not_active IP Right Cessation
- 2001-11-16 JP JP2001351052A patent/JP2002332580A/ja active Pending
- 2001-12-28 US US10/029,814 patent/US6664123B2/en not_active Expired - Fee Related
-
2007
- 2007-08-07 JP JP2007204945A patent/JP2008021407A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01312753A (ja) * | 1988-06-13 | 1989-12-18 | Canon Inc | 記録再生装置 |
JP2000193672A (ja) * | 1998-12-25 | 2000-07-14 | Olympus Optical Co Ltd | 走査型プロ―ブ顕微鏡用カンチレバ―およびその作製方法 |
Also Published As
Publication number | Publication date |
---|---|
US6664123B2 (en) | 2003-12-16 |
US20020168825A1 (en) | 2002-11-14 |
KR100604813B1 (ko) | 2006-07-26 |
KR20020087574A (ko) | 2002-11-23 |
JP2002332580A (ja) | 2002-11-22 |
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