JP2008015462A - モールドの製造方法。 - Google Patents
モールドの製造方法。 Download PDFInfo
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- JP2008015462A JP2008015462A JP2006346785A JP2006346785A JP2008015462A JP 2008015462 A JP2008015462 A JP 2008015462A JP 2006346785 A JP2006346785 A JP 2006346785A JP 2006346785 A JP2006346785 A JP 2006346785A JP 2008015462 A JP2008015462 A JP 2008015462A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
- B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/40—Plastics, e.g. foam or rubber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
【解決手段】モールドの製造方法は、第1パターン23が形成されたマスター基板21と透明なモールド基板27との間に光重合可能な樹脂層25を形成するステップと、前記樹脂層25を前記透明なモールド基板27を介して紫外線光に露出させて硬化するステップと、前記マスター基板21から前記硬化された樹脂層25を前記モールド基板27と結合された状態で分離することにより、前記第1パターン23が転写された溝状の第2パターン31を有するモールド29を形成するステップとを含む。
【選択図】図2B
Description
本発明の他の目的は、変形を防止し得るモールドの製造方法を提供することにある。
前記1次硬化ステップは、前記紫外線光の強度及び照射期間のうちの少なくとも1つを調節することにより、前記樹脂層の表面エネルギーを変化させる。
図2A〜図2Cは、本発明に係るモールドの製造方法を示す工程図である。
Claims (20)
- 第1パターンが形成されたマスター基板と透明なモールド基板との間に光重合可能な樹脂層を形成するステップと、
前記透明なモールド基板を介して紫外線光を第1照射して、前記樹脂層を硬化させる1次硬化ステップと、
前記マスター基板から前記硬化された樹脂層を前記モールド基板と結合された状態で分離することにより、前記第1パターンが転写された溝状の第2パターンを有するモールドを形成するステップと
を含むことを特徴とするモールドの製造方法。 - 前記樹脂層は、光重合可能な液状高分子前駆体を含むことを特徴とする請求項1に記載のモールドの製造方法。
- 前記1次硬化ステップは、前記紫外線光の強度及び照射期間のうちの少なくとも1つを調節することにより、前記樹脂層の表面エネルギーを変化させることを特徴とする請求項2に記載のモールドの製造方法。
- 前記1次硬化ステップは、前記紫外線光を略2〜20mW/cm2程度の強度で略5〜15秒程度の期間、前記樹脂層に照射するステップを含むことを特徴とする請求項3に記載のモールドの製造方法。
- 前記1次硬化ステップは、前記紫外線光を略3mW/cm2程度の強度で略10秒程度の期間、前記樹脂層に照射することを特徴とする請求項4に記載のモールドの製造方法。
- 前記1次硬化ステップは、前記紫外線光を略11mW/cm2程度の強度で略10秒程度の期間、前記樹脂層に照射することを特徴とする請求項4に記載のモールドの製造方法。
- 前記樹脂層は、ポリウレタンアクリレート、グリシジルアクリレート及びブチルメタクリルレートのうちのいずれか1つを含むことを特徴とする請求項2に記載のモールドの製造方法。
- 前記樹脂層は、光開始剤をさらに含むことを特徴とする請求項7に記載のモールドの製造方法。
- 前記樹脂層を形成するステップは、前記マスター基板上に樹脂を塗布し、モールド基板を合着するステップを含むことを特徴とする請求項2に記載のモールドの製造方法。
- 前記樹脂層を形成するステップは、前記モールド基板上に樹脂を塗布し、前記マスター基板を合着するステップを含むことを特徴とする請求項2に記載のモールドの製造方法。
- 前記マスター基板は、シリコン及びガラスのうちのいずれか1つを含むことを特徴とする請求項2に記載のモールドの製造方法。
- 前記第1パターンは、酸化シリコン、窒化シリコン及び金属の無機物質、及びレジスト及びワックスなどの有機物質のうちのいずれか1つを含むことを特徴とする請求項11に記載のモールドの製造方法。
- 前記モールド基板と共に分離された前記樹脂層に紫外線光を第2照射して、前記樹脂層を硬化させる2次硬化ステップをさらに含むことを特徴とする請求項2に記載のモールドの製造方法。
- 前記1次硬化ステップ及び前記2次硬化ステップは、紫外線光の強度及び照射期間のうちの少なくとも1つを調節して、前記樹脂層の表面エネルギーを変化させることを特徴とする請求項13に記載のモールドの製造方法。
- 前記2次硬化ステップは、前記紫外線光を前記1次硬化ステップより長い期間、前記樹脂層に照射することを特徴とする請求項14に記載のモールドの製造方法。
- 前記2次硬化ステップでの前記紫外線光の照射は、前記1次硬化ステップより略6〜30倍程度長い期間、前記樹脂層に照射されることを特徴とする請求項15に記載のモールドの製造方法。
- 前記紫外線光は、前記1次硬化ステップ及び前記2次硬化ステップ全てに同じ強度で前記樹脂層に照射されることを特徴とする請求項16に記載のモールドの製造方法。
- 前記紫外線光は、略3mW/cm2程度及び略11mW/cm2のうちのいずれかの強度を有することを特徴とする請求項17に記載のモールドの製造方法。
- 前記1次硬化ステップは、前記紫外線光を略11mW/cm2程度の強度で前記樹脂層に照射し、
前記2次硬化ステップは、前記紫外線光を略3mW/cm2程度の強度で前記樹脂層に照射する
ことを特徴とする請求項16に記載のモールドの製造方法。 - 前記1次硬化ステップは、前記紫外線光を略3mW/cm2程度の強度で前記樹脂層に照射し、
前記2次硬化ステップは、前記紫外線光を略11mW/cm2程度の強度で前記樹脂層に照射する
ことを特徴とする請求項16に記載のモールドの製造方法。
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KR1020060061020A KR101284943B1 (ko) | 2006-06-30 | 2006-06-30 | 몰드의 제조방법 |
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JP2008015462A true JP2008015462A (ja) | 2008-01-24 |
JP4625445B2 JP4625445B2 (ja) | 2011-02-02 |
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US (1) | US8480936B2 (ja) |
JP (1) | JP4625445B2 (ja) |
KR (1) | KR101284943B1 (ja) |
CN (1) | CN101097399B (ja) |
GB (1) | GB2439600B (ja) |
TW (1) | TWI345135B (ja) |
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KR102233625B1 (ko) * | 2016-08-23 | 2021-03-31 | 캐논 가부시끼가이샤 | 3차원 조형 장치 및 3차원 조형물의 제조 방법 |
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KR20080002288A (ko) | 2008-01-04 |
GB2439600B (en) | 2008-06-04 |
TWI345135B (en) | 2011-07-11 |
GB0624072D0 (en) | 2007-01-10 |
CN101097399B (zh) | 2012-01-04 |
US20080001332A1 (en) | 2008-01-03 |
US8480936B2 (en) | 2013-07-09 |
JP4625445B2 (ja) | 2011-02-02 |
GB2439600A (en) | 2008-01-02 |
TW200801806A (en) | 2008-01-01 |
KR101284943B1 (ko) | 2013-07-10 |
CN101097399A (zh) | 2008-01-02 |
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