JP2008010446A - 半導体レーザ素子 - Google Patents
半導体レーザ素子 Download PDFInfo
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- JP2008010446A JP2008010446A JP2006176151A JP2006176151A JP2008010446A JP 2008010446 A JP2008010446 A JP 2008010446A JP 2006176151 A JP2006176151 A JP 2006176151A JP 2006176151 A JP2006176151 A JP 2006176151A JP 2008010446 A JP2008010446 A JP 2008010446A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- 150000004767 nitrides Chemical class 0.000 claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims description 26
- 238000005253 cladding Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 239000013078 crystal Substances 0.000 description 10
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 229910002704 AlGaN Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 5
- 238000003776 cleavage reaction Methods 0.000 description 4
- 230000007017 scission Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
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- Semiconductor Lasers (AREA)
Abstract
【解決手段】本発明の一実施形態に係る半導体レーザ素子は、Inを含有するIII族窒化物半導体からなる活性層を有する半導体レーザ素子である。当該半導体レーザ素子の光出射端面を含む、上記活性層の第1の部分は、当該活性層の上記第1の部分以外の部分である第2の部分に対して傾斜している。上記第1の部分の(0001)面に対する傾斜角度をα度、上記第2の部分の(0001)面に対する傾斜角度をβ度としたとき、α>β、かつα>0.3である
【選択図】図1
Description
102 Siドープn型GaN層
103 n型クラッド層
104 n型光閉じ込め層
105 多重量子井戸(MQW)層
106 キャップ層
107 p型GaN閉じ込め層
108 電流狭窄層
109 p型クラッド層
110 p型コンタクト層
111 p型電極
112 n型電極
113 誘電体膜
114 誘電体膜
201 サファイア基板
202 GaN層
203 n型GaNバッファ層
204 n型AlGaNクラッド層
205 n型GaN光閉じ込め層
206 InGaN活性層
207 p型GaN光閉じ込め層
208 p型AlGaNクラッド層
209 p型コンタクト層
210 p型電極
211 絶縁膜
801 ストライプ状溝パターン
802 ストライプ状開口部
Claims (4)
- Inを含有するIII族窒化物半導体からなる活性層を有する半導体レーザ素子であって、
当該半導体レーザ素子の光出射端面を含む、前記活性層の第1の部分は、当該活性層の前記第1の部分以外の部分である第2の部分に対して傾斜しており、
前記第1の部分の(0001)面に対する傾斜角度をα度、前記第2の部分の(0001)面に対する傾斜角度をβ度としたとき、α>β、かつα>0.3であることを特徴とする半導体レーザ素子。 - 請求項1に記載の半導体レーザ素子において、
0≦β≦0.3である半導体レーザ素子。 - 請求項1に記載の半導体レーザ素子において、
β>0.3である半導体レーザ素子。 - 請求項1乃至3いずれかに記載の半導体レーザ素子において、
前記活性層の前記第1の部分の光共振器方向の長さをL(nm)、当該半導体レーザ素子の光閉じ込め層の厚さをd(nm)としたとき、(α−β)≦tan−1{d/(2L)}である半導体レーザ素子。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006176151A JP4853133B2 (ja) | 2006-06-27 | 2006-06-27 | 半導体レーザ素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006176151A JP4853133B2 (ja) | 2006-06-27 | 2006-06-27 | 半導体レーザ素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008010446A true JP2008010446A (ja) | 2008-01-17 |
JP4853133B2 JP4853133B2 (ja) | 2012-01-11 |
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JP2006176151A Active JP4853133B2 (ja) | 2006-06-27 | 2006-06-27 | 半導体レーザ素子 |
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JP (1) | JP4853133B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009141933A1 (ja) * | 2008-05-19 | 2009-11-26 | パナソニック株式会社 | 窒化物半導体レーザ |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03185782A (ja) * | 1989-12-14 | 1991-08-13 | Sanyo Electric Co Ltd | 半導体レーザ |
JP2002076510A (ja) * | 2000-08-23 | 2002-03-15 | Sony Corp | 半導体レーザおよびその製造方法 |
JP2006060164A (ja) * | 2004-08-24 | 2006-03-02 | National Institute Of Advanced Industrial & Technology | 窒化物半導体デバイスおよび窒化物半導体結晶成長方法 |
-
2006
- 2006-06-27 JP JP2006176151A patent/JP4853133B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03185782A (ja) * | 1989-12-14 | 1991-08-13 | Sanyo Electric Co Ltd | 半導体レーザ |
JP2002076510A (ja) * | 2000-08-23 | 2002-03-15 | Sony Corp | 半導体レーザおよびその製造方法 |
JP2006060164A (ja) * | 2004-08-24 | 2006-03-02 | National Institute Of Advanced Industrial & Technology | 窒化物半導体デバイスおよび窒化物半導体結晶成長方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009141933A1 (ja) * | 2008-05-19 | 2009-11-26 | パナソニック株式会社 | 窒化物半導体レーザ |
JP2009283512A (ja) * | 2008-05-19 | 2009-12-03 | Panasonic Corp | 窒化物半導体レーザ |
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JP4853133B2 (ja) | 2012-01-11 |
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