JP2007144279A - Apparatus for applying sealing agent and method for manufacturing liquid crystal panel - Google Patents

Apparatus for applying sealing agent and method for manufacturing liquid crystal panel Download PDF

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JP2007144279A
JP2007144279A JP2005340240A JP2005340240A JP2007144279A JP 2007144279 A JP2007144279 A JP 2007144279A JP 2005340240 A JP2005340240 A JP 2005340240A JP 2005340240 A JP2005340240 A JP 2005340240A JP 2007144279 A JP2007144279 A JP 2007144279A
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sealant
sealing agent
stage
pressure
dispenser
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Hiromasa Takahashi
宏昌 高橋
Takeshi Toyoshima
毅 豊嶋
Ryoichi Takahashi
良一 高橋
Shin Sakamoto
慎 坂本
Shintaro Enami
信太郎 榎並
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Toshiba Corp
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Toshiba Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To maintain an applying quality of a sealing agent by keeping the applying shape of a corner part constant even if the sealing agent is applied at a high rate of speed. <P>SOLUTION: The apparatus for applying sealing agent comprises a stage 33 supporting a glass substrate W, a dispenser 50 disposed facing the stage 33 and delivering the sealing agent S, a XY-stage 30 transferring the stage 33 relatively to the dispenser 50 along a surface to be applied, a sealing agent S supplying part 60 supplying the sealing agent S to the dispenser 50 at a pressure of at least two kinds and a control part 100 controlling a rate of speed at which the XY-stage 30 is relatively transferred by the XY-stage 30. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、ディスペンサを用いてシール剤を塗布するシール剤塗布装置及びこのシール剤塗布装置を用いて基板上にシール剤を塗布することで液晶を封止する液晶パネル製造方法に関し、特にコーナ部での塗布品質を向上できるものに関する。   The present invention relates to a sealant application device that applies a sealant using a dispenser and a liquid crystal panel manufacturing method that seals liquid crystal by applying a sealant on a substrate using the sealant application device, and in particular, a corner portion. It relates to the one that can improve the coating quality.

液晶パネル製造工程においては、シール剤塗布装置を用いてガラス基板の表面にシール剤を矩形状に塗布し、このシール剤で封止された領域に液晶を充填することで液晶パネルを製造していた。シール剤塗布装置はディスペンサに一定圧力でシール剤を供給し、ＸＹテーブル等を用いて一定速度でガラス基板を移動させることで、シール剤が均一に塗布されるようにしていた（例えば、特許文献１参照）。なお、シール剤の吐出量はディスペンサに供給されるシール剤の供給圧力にほぼ比例している。また、ディスペンサとＸＹテーブルとの間隔を一定にし、塗布品質を維持するため、レーザ光を用いた距離測定方法を用いるものが知られている（例えば、特許文献２参照）。
特開平１１−２２６４７１号公報 特開平１１−２７６９６２号公報 In the liquid crystal panel manufacturing process, the sealing agent is applied to the surface of the glass substrate in a rectangular shape using a sealing agent coating device, and the liquid crystal is filled in the area sealed with the sealing agent. It was. The sealing agent application device supplies the sealing agent to the dispenser at a constant pressure, and moves the glass substrate at a constant speed using an XY table or the like so that the sealing agent is uniformly applied (for example, Patent Documents). 1). The discharge amount of the sealing agent is substantially proportional to the supply pressure of the sealing agent supplied to the dispenser. In addition, there is known a method using a distance measuring method using a laser beam in order to maintain the coating quality by keeping the distance between the dispenser and the XY table constant (see, for example, Patent Document 2).
JP-A-11-226471 Japanese Patent Laid-Open No. 11-276962

上述したシール剤塗布方法では、次のような問題があった。すなわち、塗布方向を変える際には、ＸＹテーブルの動作方向が変わることとなる。このとき、ガラス基板に作用する慣性力によりガラス基板が撓み、塗布形状が悪化する虞があった。特にコーナ部の半径が小さくなったり、移動速度が高速になるにしたがって塗布形状の悪化は顕著になる。このため、塗布品質を維持するためには塗布速度を低速にせざるを得ず、生産効率が低下するという問題があった。   The sealing agent application method described above has the following problems. That is, when the application direction is changed, the operation direction of the XY table is changed. At this time, there was a possibility that the glass substrate bends due to the inertial force acting on the glass substrate and the applied shape deteriorates. In particular, the deterioration of the coating shape becomes more remarkable as the radius of the corner portion becomes smaller or the moving speed becomes higher. For this reason, in order to maintain the coating quality, the coating speed has to be reduced, and there is a problem that the production efficiency is lowered.

そこで本発明は、シール剤を高速度で塗布を行う場合であっても、コーナ部における塗布形状を一定に保ち塗布品質を維持することができるシール剤塗布装置及び液晶パネル製造方法を提供することを目的としている。   Accordingly, the present invention provides a sealing agent coating apparatus and a liquid crystal panel manufacturing method capable of maintaining the coating shape at the corner portion and maintaining the coating quality even when the sealing agent is applied at a high speed. It is an object.

前記課題を解決し目的を達成するために、本発明のシール剤塗布装置及び液晶パネル製造方法は次のように構成されている。   In order to solve the above problems and achieve the object, the sealing agent coating apparatus and the liquid crystal panel manufacturing method of the present invention are configured as follows.

被塗布面を有するワークにシール剤を塗布するシール剤塗布装置において、前記ワークを支持するステージと、このステージに対向配置され、シール剤を吐出するディスペンサと、前記ステージと前記ディスペンサとを前記被塗布面に沿って相対的に移動させる移動機構と、前記ディスペンサに少なくとも２種類の圧力で前記シール剤を供給するシール剤供給部と、前記ディスペンサに供給される前記シール剤の圧力に基づいて前記移動機構による相対移動の速度を変えるよう制御する制御部とを備えていることを特徴とする。   In a sealing agent coating apparatus that applies a sealing agent to a workpiece having a surface to be coated, a stage that supports the workpiece, a dispenser that is disposed opposite to the stage, and that discharges the sealing agent, and the stage and the dispenser are disposed on the substrate. Based on a moving mechanism that relatively moves along the application surface, a sealant supply unit that supplies the sealant to the dispenser with at least two types of pressure, and a pressure of the sealant that is supplied to the dispenser. And a control unit that controls to change the speed of relative movement by the moving mechanism.

本発明によれば、シール剤を高速度で塗布を行う場合であっても、コーナ部における塗布形状を一定に保ち塗布品質を維持することが可能となる。また、信頼性の高い液晶パネルを製造することを可能とする。   According to the present invention, even when the sealing agent is applied at a high speed, it is possible to keep the application shape in the corner portion constant and maintain the application quality. In addition, a highly reliable liquid crystal panel can be manufactured.

図１は本発明の一実施の形態に係るシール剤塗布装置１０の構成を示す説明図、図２はのディスペンサ５０を示す側面図、図３は塗布速度の変化を示す説明図、図４は圧力信号Ｐ、速度信号Ｖ、圧力信号Ｐと速度信号Ｖとの比、塗布量との関係を示す説明図である。なお、図中Ｗはガラス基板、Ｓはシール剤を示している。また、図中矢印ＸＹＺは互いに直交する三方向を示しており、特にＸＹは水平方向、Ｚは鉛直方向を示している。   FIG. 1 is an explanatory view showing a configuration of a sealing agent application apparatus 10 according to an embodiment of the present invention, FIG. 2 is a side view showing a dispenser 50, FIG. 3 is an explanatory view showing changes in application speed, and FIG. It is explanatory drawing which shows the relationship between the pressure signal P, the speed signal V, the ratio of the pressure signal P and the speed signal V, and the coating amount. In the figure, W represents a glass substrate, and S represents a sealing agent. In the figure, arrows XYZ indicate three directions orthogonal to each other, and in particular, XY indicates a horizontal direction and Z indicates a vertical direction.

シール剤塗布装置１０は、塗布部２０と、シール剤供給部６０と、制御部１００とを備えている。シール剤塗布装置１０は、例えば液晶パネル製造工程で用いられ、ガラス基板Ｗ上に、液晶封止をするためのシール剤Ｓを塗布する。   The sealant application device 10 includes an application unit 20, a sealant supply unit 60, and a control unit 100. The sealant application device 10 is used, for example, in a liquid crystal panel manufacturing process, and applies a sealant S for liquid crystal sealing on a glass substrate W.

塗布部２０は、架台２１と、この架台２１上に設けられたＸＹステージ３０及びガイド機構４０と、ガイド機構４０に沿って矢印方向に往復動自在に取り付けられるとともに、ＸＹステージ３０に対向配置されたディスペンサ５０とを備えている。ＸＹステージ３０は、架台２１上に設置されたＸ方向駆動部３１と、このＸ方向駆動部３１上に設置されたＹ方向駆動部３２と、このＹ方向駆動部３２上に設置されガラス基板Ｗの被塗布面を上側にして支持するステージ３３とを備え、ガラス基板Ｗと後述するノズル５１とを被塗布面に沿って相対的に移動させる機能を有している。   The coating unit 20 is attached to the gantry 21, an XY stage 30 and a guide mechanism 40 provided on the gantry 21, and reciprocally movable in the direction of the arrow along the guide mechanism 40, and is disposed to face the XY stage 30. Dispenser 50. The XY stage 30 includes an X-direction drive unit 31 installed on the gantry 21, a Y-direction drive unit 32 installed on the X-direction drive unit 31, and a glass substrate W installed on the Y-direction drive unit 32. The stage 33 is supported with the surface to be coated facing upward, and has a function of relatively moving the glass substrate W and a nozzle 51 described later along the surface to be coated.

ディスペンサ５０は、図２に示すように、シール剤供給部５０から供給されたシール剤Ｓを吐出するノズル５１と、このノズル５１の近傍に設けられたレーザ変位計５２とを備えている。レーザ変位計５２はレーザ部５３と反射鏡５４とを備え、ノズル５１とガラス基板Ｗの距離が一定になるようにディスペンサ５０の高さ位置制御を行う。   As shown in FIG. 2, the dispenser 50 includes a nozzle 51 that discharges the sealing agent S supplied from the sealing agent supply unit 50, and a laser displacement meter 52 provided in the vicinity of the nozzle 51. The laser displacement meter 52 includes a laser unit 53 and a reflecting mirror 54, and controls the height position of the dispenser 50 so that the distance between the nozzle 51 and the glass substrate W is constant.

シール剤供給部６０は、ディスペンサ５０に接続されたＳＵＳマニホルド６１を備えている。ＳＵＳマニホルド６１には、２系統のシール剤圧送系統が接続されている。すなわち、シール剤タンク（不図示）に接続された第１の圧力（高圧）の電空レギュレータ６２及び電空電磁弁６３と、シール剤タンクに接続された第２の圧力（低圧）低圧用の電空レギュレータ６４及び電空電磁弁６５とが接続されている。さらに、ＳＵＳマニホルド６１には圧力センサ６６が接続され、圧力センサ６６の出力は後述するＸＹステージ制御部１０２に入力されている。   The sealant supply unit 60 includes a SUS manifold 61 connected to the dispenser 50. The SUS manifold 61 is connected with two sealant pumping systems. That is, a first pressure (high pressure) electropneumatic regulator 62 and an electropneumatic solenoid valve 63 connected to a sealant tank (not shown), and a second pressure (low pressure) low pressure connected to the sealant tank. An electropneumatic regulator 64 and an electropneumatic solenoid valve 65 are connected. Further, a pressure sensor 66 is connected to the SUS manifold 61, and an output of the pressure sensor 66 is input to an XY stage control unit 102 described later.

制御部１００は、電磁弁６３，６５の切替及びディスペンサ５０の制御を行うディスペンサ制御部１０１と、ＸＹステージ３０の動作制御を行うＸＹステージ制御部１０２とを備えている。   The control unit 100 includes a dispenser control unit 101 that switches the electromagnetic valves 63 and 65 and controls the dispenser 50, and an XY stage control unit 102 that controls the operation of the XY stage 30.

このように構成されたシール剤塗布装置１０では、次のようにしてガラス基板Ｗ上にシール剤Ｓを塗布する。すなわち、ガラス基板ＷをＸＹステージ３０のステージ３３上に載せる。次に、ＸＹステージ３０を駆動し、塗布開始位置まで移動する。この時点では高圧側の電磁弁６２、低圧側の電磁弁６４は共に閉じている。   In the sealing agent application device 10 configured as described above, the sealing agent S is applied onto the glass substrate W as follows. That is, the glass substrate W is placed on the stage 33 of the XY stage 30. Next, the XY stage 30 is driven and moved to the application start position. At this time, both the high pressure side solenoid valve 62 and the low pressure side solenoid valve 64 are closed.

次に、ＸＹステージ３０を駆動し、ステージ３３を所定方向（例えば矢印Ｘ方向）に高速移動させる。このときの速度は例えば１００ｍｍ／ｓとする。同時に、高圧側の電磁弁６２を開き、シール剤Ｓを高圧でディスペンサ５０に供給し、ノズル５１からシール剤Ｓをガラス基板Ｗに向けて吐出する。なお、ガラス基板Ｗは製造上の誤差等により図２に示すようにうねりがあるが、レーザ変位計５２における測定値をガイド機構４０にフィードバックすることでディスペンサ５０を矢印Ｚ方向に移動し、ノズル５１とガラス基板Ｗとの距離を一定とする。したがって塗布形状は一定となる。   Next, the XY stage 30 is driven to move the stage 33 at a high speed in a predetermined direction (for example, the direction of the arrow X). The speed at this time is, for example, 100 mm / s. At the same time, the high-pressure side electromagnetic valve 62 is opened, the sealing agent S is supplied to the dispenser 50 at a high pressure, and the sealing agent S is discharged from the nozzle 51 toward the glass substrate W. The glass substrate W has undulation as shown in FIG. 2 due to manufacturing errors, etc., but the measured value in the laser displacement meter 52 is fed back to the guide mechanism 40 to move the dispenser 50 in the direction of arrow Z, and the nozzle The distance between 51 and the glass substrate W is constant. Therefore, the application shape is constant.

次に、ＸＹステージ３０を駆動するモータのエンコーダ出力がモニタされており、シール剤Ｓを異なる方向（例えば矢印Ｙ方向）に塗布するための方向転回位置であるコーナ部が近づいたことが検知されると、図３に示すように塗布速度を低下させる（例えば７０ｍｍ／ｓ）。このため、ＸＹステージ３０による方向転換の際にもガラス基板Ｗにかかる慣性力が抑えられ、ガラス基板Ｗの撓みを最小限に抑えることができる。   Next, the encoder output of the motor that drives the XY stage 30 is monitored, and it is detected that a corner portion that is a direction turning position for applying the sealant S in a different direction (for example, the arrow Y direction) is approaching. Then, as shown in FIG. 3, a coating speed is reduced (for example, 70 mm / s). For this reason, the inertial force applied to the glass substrate W is suppressed even when the direction is changed by the XY stage 30, and the bending of the glass substrate W can be minimized.

具体的な制御手順としては、高圧側の電磁弁６２を閉じ、低圧側の電磁弁６４を開く。シール剤Ｓの供給圧力は図４に示すように徐々に低下する。シール剤Ｓの供給圧力は、圧力信号ＰとしてＸＹステージ制御部１０２に入力される。ＸＹステージ制御部１０２では、供給圧力と速度との比、すなわちＰ／Ｖが一定となるようにＸＹステージ３０の駆動速度を低下させる。   As a specific control procedure, the high-pressure side electromagnetic valve 62 is closed and the low-pressure side electromagnetic valve 64 is opened. The supply pressure of the sealing agent S gradually decreases as shown in FIG. The supply pressure of the sealant S is input to the XY stage controller 102 as a pressure signal P. In the XY stage control unit 102, the driving speed of the XY stage 30 is reduced so that the ratio of the supply pressure to the speed, that is, P / V is constant.

このようにして、低圧・低速度でシール剤Ｓを供給しながら、ＸＹステージ３０により塗布方向の転回を行う。ＸＹステージ３０の駆動速度が遅いため、ガラス基板Ｗにかかる慣性を最小限に抑えることができ、ガラス基板Ｗの撓みを防止できる。したがって、単位長さ当りの塗布量は同一であり、また撓みが無いため塗布幅が変わることがなく、塗布品質を維持した状態で塗布を行うことができる。なお、コーナ部を通過したら低圧側の電磁弁６４を閉じ、高圧側の電磁弁６２を開くことで、ＸＹステージ３０の駆動速度を高める。   In this manner, the XY stage 30 rotates in the coating direction while supplying the sealant S at a low pressure and a low speed. Since the driving speed of the XY stage 30 is slow, the inertia applied to the glass substrate W can be minimized, and the bending of the glass substrate W can be prevented. Therefore, the coating amount per unit length is the same, and since there is no bending, the coating width does not change, and coating can be performed while maintaining the coating quality. When the corner portion passes, the low-pressure side electromagnetic valve 64 is closed and the high-pressure side electromagnetic valve 62 is opened, thereby increasing the driving speed of the XY stage 30.

このようにして、ＸＹステージ３０の駆動速度を、直線部分では早く、コーナ部分では遅くすることで、全体の塗布速度を大幅に低下させることなく、塗布品質を維持することができる。したがって、シール剤Ｓの塗布効率が向上し、液晶ガラス基板の生産効率を向上させることができる。また、コーナ部の半径を小さくすることができる。   In this manner, the application speed of the XY stage 30 can be maintained at a high speed without significantly reducing the overall application speed by reducing the driving speed of the XY stage 30 at the straight line portion and slowing down at the corner portion. Therefore, the application efficiency of the sealing agent S is improved, and the production efficiency of the liquid crystal glass substrate can be improved. Moreover, the radius of a corner part can be made small.

なお、図５は圧力信号Ｐ、速度信号Ｖ、圧力信号Ｐと速度信号Ｖとの比の実測例を示しており、圧力信号と速度信号との比はほぼ一定である。また、図６に示すように、移動速度を低下させると、圧力制御をした場合（ＵＣ）は塗布断面積がほぼ一定であるが、圧力制御をしない場合（ＮＣ）は塗布断面積が大幅に大きくなり一定とはならない。   FIG. 5 shows an actual measurement example of the ratio of the pressure signal P, the speed signal V, and the ratio of the pressure signal P to the speed signal V, and the ratio of the pressure signal to the speed signal is substantially constant. In addition, as shown in FIG. 6, when the moving speed is reduced, the application cross-sectional area is almost constant when pressure control is performed (UC), but the application cross-section area is greatly increased when pressure control is not performed (NC). It grows and is not constant.

なお、ＳＵＳマニホルド６１に１系統のシール剤供給系統を接続し、電空レギュレータによるシール剤Ｓの供給圧力を変化させてもよい。なお、電空レギュレータの応答速度は一般的に２００ｍｓｅｃ程度、電磁弁の応答速度は２０ｍｓｅｃ程度であり、コーナ部直前まで高速度で移動させたほうが生産効率を向上させることができることを考慮すると、前述した２系統のシール剤供給系統を電磁弁で切り替えた方が好ましい。   Note that one sealant supply system may be connected to the SUS manifold 61, and the supply pressure of the sealant S by the electropneumatic regulator may be changed. The response speed of the electropneumatic regulator is generally about 200 msec, the response speed of the solenoid valve is about 20 msec, and considering that it is possible to improve the production efficiency by moving at a high speed just before the corner portion, the above-mentioned It is preferable to switch the two sealant supply systems using electromagnetic valves.

また、速度を先に低下させる制御を行い、この速度に基づいて圧力制御を行うようにしてもよい。なお、圧力制御に伴う圧力変化の遅延に対して、速度制御による速度変化の遅延が少ないことから、圧力制御を先に低下させた場合の方が追従性を高めることができる。   Further, control for decreasing the speed first may be performed, and pressure control may be performed based on this speed. In addition, since there is little delay of the speed change by speed control with respect to the delay of the pressure change accompanying pressure control, the followability can be improved by lowering the pressure control first.

また、上記実施形態では、シール剤圧送系統は２系統で説示したが、より細かい圧力制御を行いたい場合には、圧力値の異なる別の圧送系統をＳＵＳマニホルド６１に連結するよう構成することができる。   Moreover, in the said embodiment, although the sealing agent pumping system was demonstrated by two systems, when performing finer pressure control, it is comprised so that another pumping system from which a pressure value differs may be connected with the SUS manifold 61. FIG. it can.

上述したように、本発明の一実施の形態に係るシール剤塗布装置１０によれば、シール剤を高速度で塗布を行う場合であっても、コーナ部における塗布形状を一定に保ち塗布品質を維持することが可能となり、生産効率を向上させることができる。すなわち、液晶パネル製造工程において、シール剤塗布装置１０を用いることで液晶パネル製造における製造効率が向上することとなる。   As described above, according to the sealing agent application apparatus 10 according to one embodiment of the present invention, even when the sealing agent is applied at a high speed, the application shape in the corner portion is kept constant and the application quality is improved. This makes it possible to maintain production efficiency. That is, in the liquid crystal panel manufacturing process, the manufacturing efficiency in manufacturing the liquid crystal panel is improved by using the sealant coating apparatus 10.

なお、本発明は上記実施形態そのままに限定されるものではなく、実施段階ではその要旨を逸脱しない範囲で構成要素を変形して具体化できる。また、上記実施形態に開示されている複数の構成要素の適宜な組み合わせにより、種々の発明を形成できる。例えば、実施形態に示される全構成要素から幾つかの構成要素を削除してもよい。さらに、異なる実施形態にわたる構成要素を適宜組み合わせてもよい。   Note that the present invention is not limited to the above-described embodiment as it is, and can be embodied by modifying the components without departing from the scope of the invention in the implementation stage. In addition, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the embodiment. For example, some components may be deleted from all the components shown in the embodiment. Furthermore, constituent elements over different embodiments may be appropriately combined.

本発明の一実施の形態に係るシール剤塗布装置の構成を示す説明図。Explanatory drawing which shows the structure of the sealing agent application | coating apparatus which concerns on one embodiment of this invention. 同シール剤塗布装置に組み込まれたディスペンサを示す側面図。The side view which shows the dispenser integrated in the sealing agent application apparatus. 同シール剤塗布装置おける塗布速度の変化を示す説明図。Explanatory drawing which shows the change of the coating speed in the sealing agent application apparatus. 圧力信号、速度信号、圧力信号と速度信号との比、塗布量の関係を示す説明図。Explanatory drawing which shows the relationship between a pressure signal, a speed signal, ratio of a pressure signal and a speed signal, and application amount. 圧力信号、速度信号、圧力信号と速度信号との比の実測例を示す説明図。Explanatory drawing which shows the actual measurement example of ratio of a pressure signal, a speed signal, and a pressure signal and a speed signal. 圧力制御をした場合としなかった場合を比較する説明図。Explanatory drawing which compares the case where it is not with the case where pressure control is carried out.

符号の説明Explanation of symbols

１０…シール剤塗布装置、２０…塗布部、３０…ＸＹステージ、５０…ディスペンサ、６０…シール剤供給部、６２…電空レギュレータ、６３…電空電磁弁、６４…電空レギュレータ、６５…電空電磁弁、６６…圧力センサ、１００…制御部、１０１…ディスペンサ制御部、１０２…ＸＹステージ制御部、Ｗ…ガラス基板、Ｓ…シール剤。   DESCRIPTION OF SYMBOLS 10 ... Sealing agent application apparatus, 20 ... Application | coating part, 30 ... XY stage, 50 ... Dispenser, 60 ... Sealing agent supply part, 62 ... Electropneumatic regulator, 63 ... Electropneumatic solenoid valve, 64 ... Electropneumatic regulator, 65 ... Electricity Air solenoid valve, 66 ... pressure sensor, 100 ... control unit, 101 ... dispenser control unit, 102 ... XY stage control unit, W ... glass substrate, S ... sealing agent.

Claims (4)

被塗布面を有するワークにシール剤を塗布するシール剤塗布装置において、
前記ワークを支持するステージと、
このステージに対向配置され、シール剤を吐出するディスペンサと、
前記ステージと前記ディスペンサとを前記被塗布面に沿って相対的に移動させる移動機構と、
前記ディスペンサに少なくとも２種類の圧力で前記シール剤を供給するシール剤供給部と、
前記ディスペンサに供給される前記シール剤の圧力に基づいて前記移動機構による相対移動の速度を変えるよう制御する制御部とを備えていることを特徴とするシール剤塗布装置。 In a sealant application device that applies a sealant to a workpiece having a surface to be coated,
A stage for supporting the workpiece;
A dispenser that is disposed opposite to the stage and discharges the sealant;
A moving mechanism for relatively moving the stage and the dispenser along the surface to be coated;
A sealant supply section for supplying the sealant with at least two kinds of pressures to the dispenser;
And a controller that controls the relative movement speed of the moving mechanism based on the pressure of the sealing agent supplied to the dispenser. 前記シール剤供給部は、前記移動機構による移動方向が変化する位置の通過前に前記圧力をより低くするよう変化させ、前記位置の通過後に前記圧力をより高くするよう変化させることを特徴とする請求項１に記載のシール剤塗布装置。   The sealant supply unit is configured to change the pressure to be lower before passing the position where the moving direction of the moving mechanism changes, and to change the pressure to be higher after passing the position. The sealant coating apparatus according to claim 1. 前記シール剤供給部は、前記ディスペンサに接続されたマニホルドと、このマニホルドに電磁弁を介して接続され前記シール剤を第１の圧力で送出する第１のレギュレータと、前記マニホルドに電磁弁を介して接続され前記シール剤を第１の圧力よりも低く設定された第２の圧力で送出する第２のレギュレータとを備えていることを特徴とする請求項１に記載のシール剤塗布装置。   The sealant supply unit includes a manifold connected to the dispenser, a first regulator connected to the manifold via an electromagnetic valve and delivering the sealant at a first pressure, and an electromagnetic valve connected to the manifold. And a second regulator for delivering the sealant at a second pressure set lower than the first pressure. The sealant applicator according to claim 1, further comprising: 請求項１〜請求項３いずれかのシール剤塗布装置を用いて、ガラス基板上に液晶を封止するためのシール剤を塗布する工程を備えていることを特徴とする液晶パネル製造方法。   A method for producing a liquid crystal panel, comprising the step of applying a sealant for sealing a liquid crystal on a glass substrate using the sealant application device according to any one of claims 1 to 3.
JP2005340240A 2005-11-25 2005-11-25 Apparatus for applying sealing agent and method for manufacturing liquid crystal panel Pending JP2007144279A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009011912A (en) * 2007-07-03 2009-01-22 Asahi Sunac Corp High-viscosity liquid coating apparatus
CN112412942A (en) * 2020-11-28 2021-02-26 戴仁杰 Method for mounting sealing rubber strip of bridge-cut-off aluminum alloy door and window
CN113117972A (en) * 2021-03-05 2021-07-16 深圳市炬烜科技有限公司 Dispensing equipment for crystal oscillator processing
TWI757407B (en) * 2017-09-29 2022-03-11 日商中外爐工業股份有限公司 Method and apparatus for coating substrate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009011912A (en) * 2007-07-03 2009-01-22 Asahi Sunac Corp High-viscosity liquid coating apparatus
TWI757407B (en) * 2017-09-29 2022-03-11 日商中外爐工業股份有限公司 Method and apparatus for coating substrate
CN112412942A (en) * 2020-11-28 2021-02-26 戴仁杰 Method for mounting sealing rubber strip of bridge-cut-off aluminum alloy door and window
CN112412942B (en) * 2020-11-28 2022-07-08 山东索美特家居科技有限公司 Method for mounting sealing rubber strip of bridge-cut-off aluminum alloy door and window
CN113117972A (en) * 2021-03-05 2021-07-16 深圳市炬烜科技有限公司 Dispensing equipment for crystal oscillator processing

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