JP2007042263A - Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording and reproducing apparatus - Google Patents
Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording and reproducing apparatus Download PDFInfo
- Publication number
- JP2007042263A JP2007042263A JP2006185710A JP2006185710A JP2007042263A JP 2007042263 A JP2007042263 A JP 2007042263A JP 2006185710 A JP2006185710 A JP 2006185710A JP 2006185710 A JP2006185710 A JP 2006185710A JP 2007042263 A JP2007042263 A JP 2007042263A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- recording medium
- substrate
- afm
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 183
- 239000000758 substrate Substances 0.000 title claims abstract description 138
- 230000003746 surface roughness Effects 0.000 claims abstract description 39
- 230000002093 peripheral effect Effects 0.000 claims description 50
- 239000011521 glass Substances 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 18
- 238000005260 corrosion Methods 0.000 abstract description 18
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 230000006866 deterioration Effects 0.000 abstract description 6
- 230000001629 suppression Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 64
- 239000010408 film Substances 0.000 description 30
- 238000005498 polishing Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- 239000000463 material Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 239000002245 particle Substances 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 9
- 239000000956 alloy Substances 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 230000001050 lubricating effect Effects 0.000 description 6
- 238000007517 polishing process Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 241001422033 Thestylus Species 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- -1 alumocarbon Chemical compound 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910001149 41xx steel Inorganic materials 0.000 description 1
- 229910000521 B alloy Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- 229910005435 FeTaN Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Images
Abstract
Description
本発明は、情報機器の記録媒体として使用される磁気記録媒体用の基板及び磁気記録媒体並びに磁気記録再生装置に関するものである。 The present invention relates to a magnetic recording medium substrate, a magnetic recording medium, and a magnetic recording / reproducing apparatus used as a recording medium for information equipment.
近年各種情報機器の進展にともない、磁気記録媒体の記憶容量は増大の一途をたどっている。特にコンピュータの外部メモリとして中心的な役割をはたしている磁気ディスクは年々記録容量、記録密度ともに増加しているが、更に高密度な記録を行なうための開発が必要とされている。例えば、ノート型パソコンやパームトップパソコンの開発により、小型で衝撃に強い記録装置が望まれ、そのために、より高密度記録ができ、機械強度の強い小型の磁気記録媒体が望まれている。さらに最近ではナビゲーションシステムや携帯用音楽再生装置にも、超小型の磁気記録媒体を使用したものが採用されるようになってきた。 With the progress of various information devices in recent years, the storage capacity of magnetic recording media has been steadily increasing. In particular, a magnetic disk that plays a central role as an external memory of a computer has been increasing both in recording capacity and recording density year by year. However, development for recording at higher density is required. For example, with the development of notebook personal computers and palmtop personal computers, a compact and impact-resistant recording device is desired. For this reason, a compact magnetic recording medium that can perform higher-density recording and has high mechanical strength is desired. Furthermore, recently, navigation systems and portable music playback devices that use ultra-small magnetic recording media have been adopted.
従来よりこの磁気記録媒体である磁気ディスク用の基板としては、表面にＮｉＰメッキ処理をしたアルミニウム合金や、あるいはより高い耐衝撃性、剛性・硬度、化学的耐久性といったシビアな要求に対応できる基板としてガラス基板が採用されている。ガラス基板は磁気記録面の高密度化にとって重要な、磁気記録面上でのヘッドの低浮上に好適な平坦度が容易に得られる利点がある。
近年、高記録密度化を達成するために磁気記録媒体に対するヘッドの浮上高さはますます小さくなる傾向にあり、それに伴って磁気記録媒体用の基板は鏡面のような平坦性や小さい表面粗さが要求され、かつ表面の微小スクラッチや微小ピットなどの表面欠陥が極力無いものが要求されている。
Conventionally, as a substrate for a magnetic disk, which is this magnetic recording medium, an aluminum alloy whose surface is NiP plated, or a substrate that can meet severe requirements such as higher impact resistance, rigidity / hardness, and chemical durability. A glass substrate is employed. The glass substrate has an advantage that flatness suitable for low flying of the head on the magnetic recording surface can be easily obtained, which is important for increasing the density of the magnetic recording surface.
In recent years, in order to achieve higher recording density, the flying height of the head with respect to the magnetic recording medium tends to become smaller, and accordingly, the substrate for the magnetic recording medium has a flat surface such as a mirror surface and a small surface roughness. Are required, and surface defects such as micro scratches and micro pits on the surface are minimized.
ハードディスク（ＨＤ）用基板に代表される磁気記録媒体用基板は、所望の寸法に成形した後、基板本体の表面を粗研磨するラッピング工程、内外周端面を研削して面取りするチャンファ加工工程、表面を仕上げ研磨するポリッシング工程を経て製造されている。そして、この基板は、更に、基板本体の表面を適度に粗面化するテクスチャー工程、表面に下地層を形成する下地層形成工程、表面に磁性層を成膜する磁性層形成工程、磁性層上に保護層を形成する保護層形成工程、保護層の上に潤滑層を形成する潤滑層形成工程等にて基板本体の表面に成膜し、更にその膜表面の異常突起を除去するバーニッシュ工程を施されて完成製品となる。 A magnetic recording medium substrate typified by a hard disk (HD) substrate is formed into a desired dimension, and then a lapping process for roughly polishing the surface of the substrate body, a chamfering process for chamfering by grinding the inner and outer peripheral end surfaces, surface It is manufactured through a polishing process for finishing and polishing. The substrate further includes a texture process for appropriately roughening the surface of the substrate body, an underlayer formation process for forming an underlayer on the surface, a magnetic layer formation process for forming a magnetic layer on the surface, A protective layer forming step for forming a protective layer on the substrate, a lubricating layer forming step for forming a lubricating layer on the protective layer, etc., and a burnishing step for removing abnormal projections on the surface of the substrate body. It will be finished product.
このようにして得られる基板は、基板本体の内外周端面においてチャンファ加工された面取部分で、その上に形成された下地層や磁性層の膜剥れを生じて欠陥品となることがあった。この問題を解決して基板本体上に形成された膜の耐久性を向上させる手段として、面取部分の平均表面粗さ（Ｒａ）を０．２０μｍ未満にすることが提案されている（例えば、特許文献１参照。）。
また、磁気記録媒体を磁気抵抗型ヘッドで再生する際、記録密度の向上を求めてヘッドの浮上高さ（フライングハイト）を下げると、再生の誤動作、あるいは、再生が不可能になる現象が発生する。この現象の発生原因は、磁気記録媒体表面上のパーティクルによって形成された凸部が、サーマル・アスペリティ（Thermal Asperity）となって磁気抵抗型ヘッドに熱が発生し、ヘッドの抵抗値を変動させることにより電磁変換に悪影響を与えていることがその原因である。さらにこのパーティクルの発生原因は、磁気記録媒体の製造工程で基板をカセット容器に収納して搬送する際に、基板の端面がカセット容器と擦れることにより、例えば、角張ったパーティクルや、ディスク表面に対して比較的急峻な立ち上がりを持ったパーティクルなどの、ヘッドの浮上に悪影響を及ぼすパーティクルが発生することが判明した。これらのパーティクルは、基板の端面（面取部及び基板側面）が鏡面になっていないため、基板をポリカーボネート等からなる収納カセット容器に出し入れする際に、収納カセット容器の内周面と基板の端面とが接触し、端面から発塵したパーティクルが磁気記録媒体表面に付着するためと考えられる。この問題を解決するために基板の面取部及び側壁部のうち少なくとも一方の表面の平均表面粗さ（Ｒａ）を１μｍ未満の鏡面とすることも提案されている（例えば、特許文献２参照。）。
Also, when playing back magnetic recording media with a magnetoresistive head, if the flying height of the head is lowered in order to improve the recording density, a malfunction of playback or a phenomenon that makes playback impossible will occur. To do. The cause of this phenomenon is that the protrusion formed by particles on the surface of the magnetic recording medium becomes thermal asperity and heat is generated in the magnetoresistive head, causing the resistance value of the head to fluctuate. The cause of this is that it adversely affects electromagnetic conversion. Furthermore, the cause of the generation of particles is that, for example, when the substrate is stored in the cassette container and transported in the magnetic recording medium manufacturing process, the end surface of the substrate rubs against the cassette container. It has been found that particles that have a relatively steep rise, such as particles that adversely affect the flying of the head. Since these particles are not mirror-finished on the end surfaces (the chamfered portion and the side surfaces of the substrate) of the substrate, the inner peripheral surface of the storage cassette container and the end surface of the substrate are taken into and out of the storage cassette container made of polycarbonate or the like. This is thought to be because particles generated from the end face adhere to the surface of the magnetic recording medium. In order to solve this problem, it has been proposed that the average surface roughness (Ra) of at least one of the chamfered portion and the side wall portion of the substrate is a mirror surface of less than 1 μm (see, for example, Patent Document 2). ).
従来より磁気記録媒体として垂直磁気記録層を使用する場合、裏打ち軟磁性層にＦｅ、Ｃｏなどを含む合金が利用されてきているが、その製膜膜厚と合金材料固有のコロージョン性に起因して、もともと密着力が弱い端面部近傍からの軟磁性膜に発生するコロージョンにより、磁気記録媒体の機能上著しい電磁変換特性の劣化を引き起こすことがわかり、その対策が必要とされてきた。基板の表面粗さと裏打ち軟磁性層の付着強度の関係を調査した結果、従来提案されてきた程度の基板端面の表面粗さでは、基板端面と軟磁性層との間の密着が充分でなく、腐食し易い軟磁性層にコロージヨンが発生して強固な付着強度が得られない。
本発明は、基板端面と軟磁性層との間の密着強度を高め、コロージョンを抑制できる磁気記録媒体用基板を提供し、この基板を利用した電磁変換特性の劣化を引き起こさない耐久性に優れた磁気記録媒体及びこの磁気記録媒体を使用した磁気記録再生装置を提供することを目的とする。
Conventionally, when a perpendicular magnetic recording layer is used as a magnetic recording medium, an alloy containing Fe, Co, etc. has been used for the backing soft magnetic layer. This is due to the film thickness of the film and the corrosion properties inherent to the alloy material. Thus, it has been found that the corrosion generated in the soft magnetic film from the vicinity of the end face portion where the adhesive force is weak causes deterioration in electromagnetic conversion characteristics that are significantly functional in terms of the function of the magnetic recording medium. As a result of investigating the relationship between the surface roughness of the substrate and the adhesion strength of the backing soft magnetic layer, the surface roughness of the substrate end surface to the extent conventionally proposed is not sufficient adhesion between the substrate end surface and the soft magnetic layer, Corrosion occurs in the soft magnetic layer which is easily corroded, and a strong adhesion strength cannot be obtained.
The present invention provides a magnetic recording medium substrate that can increase the adhesion strength between the substrate end face and the soft magnetic layer and suppress corrosion, and has excellent durability that does not cause deterioration of electromagnetic conversion characteristics using the substrate. It is an object of the present invention to provide a magnetic recording medium and a magnetic recording / reproducing apparatus using the magnetic recording medium.
上記目的を達成するために以下の発明を提供する。
（１）本発明の磁気記録媒体用基板は、円盤状の非磁性基板の中心部に円孔を有し、磁性層を形成するための主表面と外周端面との間、もしくは主表面と前記円孔の内周端面の間の少なくとも一方にチャンファー面を具備した磁気記録媒体用基板であって、前記チャンファー面の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦１００Åであることを特徴とする。
（２）本発明の磁気記録媒体用基板において、（１）に記載の磁気記録媒体が、垂直磁気記録媒体であるものでも良い。
（３）本発明の磁気記録媒体用基板において、（２）に記載の垂直磁気記録媒体が、裏打ち軟磁性層を含む垂直磁気記録媒体であるものでも良い。
（４）本発明の磁気記録媒体用基板において、（３）に記載の裏打ち軟磁性層が、少なくともＦｅまたはＣｒを含む裏打ち軟磁性層であるものでも良い。
（５）本発明の磁気記録媒体用基板において、（１）〜（４）のいずれかに記載のチャンファー面の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦５０Åであるものでも良い。
（６）本発明の磁気記録媒体用基板において、（１）〜（５）のいずれかに記載の外周端面の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦１００Åであるものでも良い。
（７）本発明の磁気記録媒体用基板において、（６）に記載の外周端面の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦５０Åであるものでも良い。
（８）本発明の磁気記録媒体用基板において、（１）〜（７）のいずれかに記載の主表面と前記チャンファー面との間のコーナー部の曲面（Ｒ曲面）の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦５０Åであるものでも良い。
（９）本発明の磁気記録媒体用基板において、（１）〜（８）のいずれかに記載の円孔の内周端面の表面粗さ（Ｒａ）がＡＦＭで４．０Å≦Ｒａ≦１００Åであるものでも良い。
（１０）本発明の磁気記録媒体用基板において、（１）〜（９）のいずれかに記載の非磁性基板が非晶質ガラス、結晶化ガラス、シリコン、アルミニウムのいずれかからなるものでも良い。
（１１）本発明の磁気記録媒体は、（１）〜（１０）のいずれか１項に記載の磁気記録媒体用基板の主表面に垂直磁気記録媒体層を具備していることを特徴とする。
（１２）本発明の磁気記録再生装置は、（１１）に記載の磁気記録媒体を組み込んだことを特徴とする。
In order to achieve the above object, the following invention is provided.
(1) The magnetic recording medium substrate of the present invention has a circular hole in the center of a disk-shaped nonmagnetic substrate, and is formed between the main surface and the outer peripheral end surface for forming the magnetic layer, or the main surface and the above-mentioned A magnetic recording medium substrate having a chamfer surface on at least one of inner peripheral end surfaces of a circular hole, wherein the chamfer surface has a surface roughness (Ra) of 4.0 mm ≦ Ra ≦ 100 mm in AFM. It is characterized by that.
(2) In the magnetic recording medium substrate of the present invention, the magnetic recording medium described in (1) may be a perpendicular magnetic recording medium.
(3) In the magnetic recording medium substrate of the present invention, the perpendicular magnetic recording medium described in (2) may be a perpendicular magnetic recording medium including a backing soft magnetic layer.
(4) In the substrate for magnetic recording medium of the present invention, the backing soft magnetic layer described in (3) may be a backing soft magnetic layer containing at least Fe or Cr.
(5) In the magnetic recording medium substrate of the present invention, even if the chamfer surface roughness (Ra) according to any one of (1) to (4) is 4.0） ≦ Ra ≦ 50Å in AFM good.
(6) In the magnetic recording medium substrate of the present invention, the surface roughness (Ra) of the outer peripheral end face according to any one of (1) to (5) may be 4.0 mm ≦ Ra ≦ 100 mm in AFM. .
(7) In the magnetic recording medium substrate of the present invention, the surface roughness (Ra) of the outer peripheral end face described in (6) may be 4.0ＡＦ ≦ Ra ≦ 50Å in AFM.
(8) In the magnetic recording medium substrate of the present invention, the surface roughness of the curved surface (R-curved surface) of the corner portion between the main surface according to any one of (1) to (7) and the chamfer surface ( Ra) may be AFM and 4.0 Å ≦ Ra ≦ 50 Å.
(9) In the magnetic recording medium substrate of the present invention, the surface roughness (Ra) of the inner peripheral end face of the circular hole according to any one of (1) to (8) is 4.0 mm ≦ Ra ≦ 100 mm by AFM. There may be something.
(10) In the magnetic recording medium substrate of the present invention, the nonmagnetic substrate according to any one of (1) to (9) may be made of any of amorphous glass, crystallized glass, silicon, and aluminum. .
(11) The magnetic recording medium of the present invention comprises a perpendicular magnetic recording medium layer on the main surface of the magnetic recording medium substrate according to any one of (1) to (10). .
(12) A magnetic recording / reproducing apparatus according to the present invention includes the magnetic recording medium described in (11).
チャンファー面の表面粗さをこの程度細密に形成しておけば、チャンファー面と軟磁性層との間の密着強度が高まり、軟磁性層のコロージョン発生を抑制することができるので、電磁変換特性の劣化を起こさない磁気記録媒体が得られる。その結果、従来問題となっていた外周部のＳＮＲ劣化による読み取り不良、および外周部に発生するコロージョン部をヘッドが飛行し、ヘッド表面にコロージョン部が付着することによって発生する飛行不安定により引き起こされるサイドライティングによる隣接信号消去不良を著しく改善できることができる。 If the surface roughness of the chamfer surface is formed so fine, the adhesion strength between the chamfer surface and the soft magnetic layer can be increased, and the occurrence of corrosion of the soft magnetic layer can be suppressed. A magnetic recording medium that does not deteriorate characteristics can be obtained. As a result, the reading failure due to the SNR deterioration of the outer peripheral portion, which has been a problem in the past, and the flight instability caused by the head flying over the corrosion portion generated on the outer peripheral portion and the corrosion portion adhering to the head surface are caused. Adjacent signal erasure failure due to side lighting can be remarkably improved.
以下、本発明を詳細に説明する。図１に本発明の磁気記録媒体用基板を示し、図１（ａ）は、本発明の磁気記録媒体用基板を切断して見たときの斜視図で、図１（ｂ）は断面図である。また、図２は図１に示す本発明の磁気記録媒体用基板の各部を説明するために断面を拡大して示した図である。
図１に示すように本発明の磁気記録媒体用基板１は、ドーナツ状の円盤からなっており、円盤の表裏に磁気記録を形成するための主表面１０が有り、円盤の最外周に外周端面１１が、また円盤の中心部の中心円孔１４の内側に内周端面２１が形成されている。
そして主表面１０と外周端面１１との間に面取部（チャンファー）１２が、また主表面１０と内周端面２１との間にも面取部（チャンファー）２２が形成されている。
Hereinafter, the present invention will be described in detail. FIG. 1 shows a magnetic recording medium substrate according to the present invention. FIG. 1 (a) is a perspective view of the magnetic recording medium substrate according to the present invention cut and viewed, and FIG. 1 (b) is a sectional view. is there. FIG. 2 is an enlarged cross-sectional view for explaining each part of the magnetic recording medium substrate of the present invention shown in FIG.
As shown in FIG. 1, a magnetic
A
図２は図１に示す本発明の磁気記録媒体用基板の各部を説明するために断面を拡大して示した図である。図２では主表面１０と面取部（チャンファー）１２との間に半径ｒが１３〜８０μｍのＲ曲面１３が形成されている例を示した。Ｒ曲面１３は磁気記録媒体の製造工程で基板をカセット容器に収納して搬送する際に、基板の端面がカセット容器と擦れてもパーティクルの発生を抑制する効果がある。
FIG. 2 is an enlarged cross-sectional view for explaining each part of the magnetic recording medium substrate of the present invention shown in FIG. FIG. 2 shows an example in which an R
本発明で使用する基板としては、非晶質（アモルファス）ガラス基板、結晶化ガラス基板、単結晶シリコン(Ｓｉ)基板、ＮｉＰめっきを施したＡｌもしくはＡｌ合金基板などを用いることができる。非晶質ガラス基板は化学強化ガラス基板でも非強化ガラス基板でも良い。シリコン基板は半導体ウェハで用いられるような高純度な単結晶基板でも構わないし、不純物がドープされていても構わないし、多結晶基板も使用することができる。
本発明で使用する基板は、先ず円盤状の素材に形状精度及び寸法精度の向上を目的としてラッピング加工を施す。ラッピング加工はラッピング装置を用いて通常２段階で行う。
次いで、多数枚の基板素材をスペーサーを介して束ねて基板素材の積層体を準備する。
そして、この基板素材の積層体の中心部に円孔を穿孔した後、基板の内外周部に所定の面取り加工を施す。
さらに研磨ブラシを使用して外周端面及び内周端面をブラシ研磨する。本発明の磁気記録用基板の製造方法では、円孔穿孔から内外周のポリッシュ加工までを、基板素材積層体を使用してバッチ処理で行う。
最後に磁気記録層を設ける主表面をポリッシュ加工する。ポリッシュ加工はそれまでの加工で発生した傷や歪みを除去するために、１次ポリッシュと鏡面に仕上げるための２次ポリッシュ加工の２段階に分けて行う。
ポリッシュ加工を終えた基板は充分洗浄した後、検査工程を経て磁気記録媒体用基板となる。
As the substrate used in the present invention, an amorphous glass substrate, a crystallized glass substrate, a single crystal silicon (Si) substrate, an Al or Al alloy substrate plated with NiP, or the like can be used. The amorphous glass substrate may be a chemically tempered glass substrate or a non-tempered glass substrate. The silicon substrate may be a high-purity single crystal substrate used in a semiconductor wafer, may be doped with impurities, or may be a polycrystalline substrate.
The substrate used in the present invention is first subjected to lapping for the purpose of improving shape accuracy and dimensional accuracy on a disk-shaped material. Lapping is usually performed in two stages using a lapping machine.
Next, a large number of substrate materials are bundled through a spacer to prepare a laminate of substrate materials.
And after making a circular hole in the center part of this laminated body of board | substrate materials, a predetermined chamfering process is given to the inner-periphery part of a board | substrate.
Further, the outer peripheral end face and the inner peripheral end face are brush-polished using a polishing brush. In the method for manufacturing a magnetic recording substrate according to the present invention, the process from circular hole drilling to polishing of the inner and outer circumferences is performed by batch processing using a substrate material laminate.
Finally, the main surface on which the magnetic recording layer is provided is polished. Polishing is performed in two stages, a primary polishing and a secondary polishing for finishing to a mirror surface, in order to remove scratches and distortions generated in the previous processing.
The substrate after the polishing process is sufficiently cleaned, and after inspection, becomes a magnetic recording medium substrate.
ここで重要なのは面取り加工を施したチャンファー面や外周端面及び内周端面の研磨仕上げ精度である。従来はこれらの面の仕上げ精度を極く一般的な表面粗さ測定法である触針法で測定した表面粗さで規定していた。しかし従来の仕上げ精度では、基板の主表面と面取部（チャンファー）との境界付近で軟磁性層の密着強度が弱く、軟磁性層にコロージョンが発生し、電磁変換特性の劣化を引き起こしている。
そこで本発明の磁気記録媒体用基板では、さらに精細な測定が可能な原子力間顕微鏡（Atomic Force Microscope ：ＡＦＭ）で測定した表面粗さで仕上げ精度を規定することとした。
原子力間顕微鏡（ＡＦＭ）は、物質の間に働く原子レベルの力を測定することにより、試料表面の２次元的構造を観察する装置で、具体的には試料表面を鋭い先端を持つカンチレバー（プローブ）を使用し、カンチレバー先端と試料表面との間に働く原子間力が一定になるようにカンチレバーの高さ方向位置を制御しながら試料表面をスキャンする。試料表面の凹凸に応じて上下するカンチレバーの変位をレーザ光を当てて検知し、レーザ反射光の位置変化をフォトダイオードにより検出するものである。ＡＦＭによれば、触針法では測定できない微細なレベルのナノオーダーの凹凸を検知することができる。
What is important here is the polishing finishing accuracy of the chamfered surface, the outer peripheral end surface and the inner peripheral end surface that have been chamfered. Conventionally, the finishing accuracy of these surfaces has been defined by the surface roughness measured by the stylus method, which is a very general surface roughness measuring method. However, with the conventional finishing accuracy, the adhesion strength of the soft magnetic layer is weak in the vicinity of the boundary between the main surface of the substrate and the chamfered portion (chamber), causing corrosion in the soft magnetic layer, causing deterioration of electromagnetic conversion characteristics. Yes.
Therefore, in the magnetic recording medium substrate of the present invention, the finishing accuracy is defined by the surface roughness measured with an atomic force microscope (AFM) capable of further fine measurement.
An atomic force microscope (AFM) is a device that observes the two-dimensional structure of a sample surface by measuring atomic force acting between materials. Specifically, the cantilever (probe) has a sharp tip on the sample surface. ), And scan the sample surface while controlling the height position of the cantilever so that the atomic force acting between the tip of the cantilever and the sample surface is constant. The displacement of the cantilever that moves up and down according to the unevenness of the sample surface is detected by applying laser light, and the change in the position of the laser reflected light is detected by a photodiode. According to the AFM, it is possible to detect a fine level of nano-order irregularities that cannot be measured by the stylus method.
本発明の磁気記録媒体用基板では、前記チャンファー面の表面粗さ（Ｒａ）をＡＦＭで４．０Å≦Ｒａ≦１００Å、好ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとすることにした。
Ｒａの下限である４．０Åは加工可能または測定可能の下限でもある。Ｒａが５０Å以下ではコロージョンは全く発生しないが、Ｒａが５０Åを越えると軟磁性層の密着強度が弱くて軟磁性層にコロージョンが発生するようになり、Ｒａが１００Åを越えるとコロージョンがますます発生し易くなって、電磁変換特性の劣化が起こるようになる。したがって、チャンファー面の表面粗さ（Ｒａ）はＡＦＭで４．０Å≦Ｒａ≦１００Å、好ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとすることにした。
In the magnetic recording medium substrate of the present invention, the surface roughness (Ra) of the chamfer surface is set to 4.0 mm ≦ Ra ≦ 100 mm by AFM, preferably 4.0 mm ≦ Ra ≦ 50 mm by AFM.
The lower limit of Ra of 4.0 mm is also the lower limit of processability or measurement. When Ra is less than 50 mm, no corrosion occurs at all. However, when Ra exceeds 50 mm, the soft magnetic layer has low adhesion strength and corrosion occurs in the soft magnetic layer. When Ra exceeds 100 mm, more corrosion occurs. As a result, the electromagnetic conversion characteristics deteriorate. Therefore, the surface roughness (Ra) of the chamfer surface is determined to be 4.0 mm ≦ Ra ≦ 100 mm by AFM, and preferably 4.0 mm ≦ Ra ≦ 50 mm by AFM.
本発明の磁気記録媒体用基板では、チャンファー面に加えて外周端面の表面粗さ（Ｒａ）もＡＦＭで４．０Å≦Ｒａ≦１００Å、望ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとすることが好ましい。
外周端面の表面粗さをこのように細密に仕上げておけば、基板をカセット容器に収容して搬送する際にも外周端面が破損する危険が少なく、パーティクルの発生に伴うトラブルを防ぐことができる。
In the magnetic recording medium substrate of the present invention, in addition to the chamfer surface, the surface roughness (Ra) of the outer peripheral end surface is 4.0 mm ≦ Ra ≦ 100 mm in AFM, preferably 4.0 mm ≦ Ra ≦ 50 mm in AFM. Is preferred.
By finely finishing the surface roughness of the outer peripheral end face in this way, there is little risk of damage to the outer peripheral end face even when the substrate is accommodated in the cassette container and transported, and trouble associated with the generation of particles can be prevented. .
本発明の磁気記録媒体用基板では、図２に示すように、基板の主表面と外周端面側のチャンファー面との間、もしくは主表面と円孔側のチャンファー面との間のコーナー部に、半径が０．０１ｍｍ以上０．０５ｍｍ以下の曲面（Ｒ曲面）を介在させることが好ましい。 そしてこの曲面（Ｒ曲面）の表面粗さ（Ｒａ）もＡＦＭで４．０Å≦Ｒａ≦１００Å、望ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとすることが好ましい。
主表面とチャンファー面との間のコーナー部に曲面を持たせておけば、基板をカセット容器に収容して搬送する際にも外周端面が破損する危険が少なく、パーティクルの発生に伴うトラブルを防ぐことができるし、Ｒ曲面の表面粗さ（Ｒａ）をＡＦＭで４．０Å≦Ｒａ≦１００Å、望ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとしておけば、軟磁性層の密着強度が強くなって軟磁性層にコロージョンが発生することはなく、電磁変換特性の劣化が起こる心配もない。
以上説明したように、主表面から外周端面もしくは内周端面にかけてのコーナー部の表面粗さをＡＦＭで４．０Å≦Ｒａ≦１００Å、望ましくはＡＦＭで４．０Å≦Ｒａ≦５０Åとしておけば、主表面から外周端面もしくは内周端面にかけての軟磁性層の密着強度が強くなって軟磁性層にコロージョンが発生することはないので非常に好ましい磁気記録媒体用基板となる。
本発明の磁気記録媒体用基板では、前記チャンファー面、チャンファー面に加えて外周端面、基板の主表面と外周端面側のチャンファー面との間もしくは主表面と円孔側のチャンファー面との間のコーナー部の局面（Ｒ曲面）の表面粗さ（Ｒａ）をＡＦＭで４．０Å≦Ｒａ≦１０Å、ＡＦＭで１０Å≦Ｒａ≦１００Åとすることにしても良い。また、望ましくはＡＦＭで４．０Å≦Ｒａ≦１０Å、ＡＦＭで１０Å≦Ｒａ≦５０Åとするようにしても良い。
In the magnetic recording medium substrate of the present invention, as shown in FIG. 2, a corner portion between the main surface of the substrate and the chamfer surface on the outer peripheral end surface side, or between the main surface and the chamfer surface on the circular hole side. It is preferable to interpose a curved surface (R curved surface) having a radius of 0.01 mm or more and 0.05 mm or less. The surface roughness (Ra) of this curved surface (R-curved surface) is also preferably 4.0Ｒ ≦ Ra ≦ 100Å in AFM, and preferably 4.0Å ≦ Ra ≦ 50Å in AFM.
By providing a curved surface at the corner between the main surface and the chamfer surface, there is little risk of damage to the outer peripheral end surface even when the substrate is stored in a cassette container and transported, and problems associated with the generation of particles can be avoided. If the surface roughness (Ra) of the R curved surface is set to 4.0 mm ≦ Ra ≦ 100 mm by AFM, and preferably 4.0 mm ≦ Ra ≦ 50 mm by AFM, the adhesion strength of the soft magnetic layer is increased. Corrosion does not occur in the soft magnetic layer, and there is no fear of deterioration of electromagnetic conversion characteristics.
As described above, if the surface roughness of the corner portion from the main surface to the outer peripheral end face or the inner peripheral end face is 4.0 mm ≦ Ra ≦ 100 mm in AFM, preferably 4.0 mm ≦ Ra ≦ 50 mm in AFM, Since the adhesion strength of the soft magnetic layer from the surface to the outer peripheral end surface or the inner peripheral end surface is increased and no corrosion occurs in the soft magnetic layer, it is a very preferable substrate for a magnetic recording medium.
In the magnetic recording medium substrate of the present invention, in addition to the chamfer surface, the chamfer surface, an outer peripheral end surface, a space between the main surface of the substrate and the chamfer surface on the outer peripheral end surface side, or a chamfer surface on the main surface and the circular hole side. The surface roughness (Ra) of the corner portion (R-curved surface) may be 4.0 と ≦ Ra ≦ 10Å by AFM and 10Å ≦ Ra ≦ 100Å by AFM. Further, it may be desirable that 4.0Å ≦ Ra ≦ 10Å in AFM and 10Å ≦ Ra ≦ 50Å in AFM.
次に、本発明の磁気記録媒体用基板を得るための研磨方法について説明する。
本発明で使用する基板は、形状精度及び寸法精度の向上を目的としてラッピング加工を施した後、中心部に円孔を穿孔して基板の内外周部に所定の面取り加工（チャンファー加工）を施す。
主表面から外周端面もしくは内周端面にかけてのチャンファー面を含むコーナー部の研磨には、例えば図３に示すように、多数の磁気記録媒体用基板１をスペーサー５を介して重ね合わせた基板の積層体６を使用して行う。
スペーサ５は磁気記録媒体用基板１と同じく中心部に円孔１４を有する円盤状とし、装着した際にスペーサ５の端部（側面）５ａが磁気記録媒体用基板１のコーナー部１５の外周チャンファー面の終端から０〜２ｍｍ程度内側（好ましくは０．５〜２ｍｍ程度内側）になるようにする。また、スペーサ５の厚さは０．１〜０．３ｍｍ程度が好ましい。また、スペーサ５の材質としては、ポリウレタン、アクリル、プラスチック、あるいは研磨工程で使用する研磨パッドと同じ材料など基板より軟質の材料とすることが好ましい。
Next, a polishing method for obtaining the magnetic recording medium substrate of the present invention will be described.
The substrate used in the present invention is subjected to lapping for the purpose of improving shape accuracy and dimensional accuracy, and then a circular hole is drilled in the central portion, and predetermined chamfering processing (chamber processing) is performed on the inner and outer peripheral portions of the substrate. Apply.
For polishing the corner portion including the chamfer surface from the main surface to the outer peripheral end surface or the inner peripheral end surface, for example, as shown in FIG. 3, a large number of magnetic
The
外周端面のチャンファー面を含むコーナー部を研磨するには、図４に示すように基板の積層体６の外周部に回転するブラシ７を当ててブラシ研磨する。研磨ブラシ７は線径０．０５ｍｍ〜０．３ｍｍ、毛足長１〜１０ｍｍのポリアミド系繊維を螺旋状に植毛した直径２００〜５００ｍｍの筒状ブラシを使用するのが好ましい。
この筒状の研磨ブラシ７を基板積層体６の外周部分に押し付け、研磨液を基板積層体６の外周部分と研磨ブラシ７との接触面に供給しつつ、基板積層体６を６０ｒｐｍ程度で、また筒状の研磨ブラシ７を７００〜１０００ｒｐｍ程度で互いに逆方向に回転させながら上下に移動させて基板の外周端面及びコーナー部分をブラシ研磨することにより、１０μｍ視野でのＡＦＭによる測定により４．０Å≦Ｒａ≦１００Å以内に、望むらくは４．０Å≦Ｒａ≦５０Å以内にコントロールされた鏡面仕上げされたコーナー部分となるように研磨する。
内周端面のチャンファー面を含むコーナー部を研磨するには、図５に示すようにスペーサーを介して重ね合わせた磁気記録媒体用基板１の積層体６の内孔１４内に、回転するブラシ１７を挿入してブラシ研磨する。円孔内も１０μｍ視野でのＡＦＭによる測定により４．０Å≦Ｒａ≦１００Å以内に、望むらくは４．０Å≦Ｒａ≦５０Å以内にコントロールされた鏡面仕上げされたコーナー部分となるように研磨する。
研磨精度の制御は、使用するブラシの材質、太さ、硬さ、長さ、研磨材の材質、粒径、濃度、ブラシを押しつける圧力、ブラシの回転速度、上下移動速度、積層体の回転速度等を適宜調整して行う。
In order to polish the corner portion including the chamfer surface on the outer peripheral end face, the rotating brush 7 is applied to the outer peripheral portion of the
While pressing this cylindrical polishing brush 7 against the outer peripheral portion of the
In order to polish the corner portion including the chamfer surface on the inner peripheral end face, a rotating brush is inserted into the
Polishing accuracy is controlled by the brush material used, thickness, hardness, length, abrasive material, particle size, concentration, pressure applied to the brush, brush rotation speed, vertical movement speed, and stack rotation speed. Etc. are adjusted appropriately.
磁性層を形成するための主表面（データ面）とチャンファー面との間にＲ曲面を設ける場合、Ｒ曲面の曲率半径は０．０１〜０．０５ｍｍとするのが好ましい。
ここで、Ｒ曲面の曲率半径とは、図６に示すように、基板の主表面（データ面）の延長線を引き、基板表面の形状曲線が上記延長線と離れる位置をＡ点とする。そのＡ点からそれぞれ１０μｍ離れた基板表面の位置を、それぞれＢ点およびＣ点として、これらの点Ａ、ＢおよびＣを通る円を求め、その円の半径を「Ｒ曲面の曲率」とする。
When an R curved surface is provided between the main surface (data surface) for forming the magnetic layer and the chamfer surface, the radius of curvature of the R curved surface is preferably 0.01 to 0.05 mm.
Here, as shown in FIG. 6, the radius of curvature of the R-curved surface is defined as a point A where the extension line of the main surface (data surface) of the substrate is drawn and the shape curve of the substrate surface is separated from the extension line. Assuming that the position of the
上記のような表面粗さに加工した非磁性基板の表面に磁性層を形成する。磁性層は面内磁気記録層でも垂直磁気記録層でもかまわないが、本発明は垂直磁気記録層の場合に特に顕著な効果を発揮する。これら磁気記録層は主としてＣｏを主成分とする合金から形成するのが好ましい。
例えば、面内磁気記録媒体用の磁気記録層としては、非磁性のＣｒＭｏ下地層と強磁性のＣｏＣｒＰｔＴａ磁性層からなる積層構造が利用できる。
垂直磁気記録媒体用の磁気記録層としては、例えば軟磁性のＦｅＣｏ合金（ＦｅＣｏＢ、ＦｅＣｏＳｉＢ、ＦｅＣｏＺｒ、ＦｅＣｏＺｒＢ、ＦｅＣｏＺｒＢＣｕなど）、ＦｅＴａ合金（ＦｅＴａＮ、ＦｅＴａＣなど）、Ｃｏ合金（ＣｏＴａＺｒ、ＣｏＺｒＮＢ、ＣｏＢなど）等からなる軟磁性層と、Ｐｔ、Ｐｄ、ＮｉＣｒ、ＮｉＦｅＣｒなどの配向制御膜と、必要によりＲｕ等の中間膜、及び６０Ｃｏ−１５Ｃｒ−１５Ｐｔ合金や７０Ｃｏ−５Ｃｒ−１５Ｐｔ−１０ＳｉＯ２ 合金からなる磁性層を積層したものを利用することがきる。
磁気記録層の厚さは、３ｎｍ以上２０ｎｍ以下、好ましくは５ｎｍ以上１５ｎｍ以下とする。磁気記録層は使用する磁性合金の種類と積層構造に合わせて、十分なヘッド出入力が得られるように形成すればよい。磁性層の膜厚は再生の際に一定以上の出力を得るにはある程度以上の磁性層膜厚が必要であり、一方で記録再生特性を表す諸パラメーターは出力の上昇とともに劣化するのが通例であるため、最適な膜厚に設定する必要がある。
通常、磁気記録層はスパッタ法、真空蒸着法、ガス中蒸着法、ガスフロースパッタ法等の物理的蒸着法を用いて薄膜として形成する。
A magnetic layer is formed on the surface of the nonmagnetic substrate processed to have the above surface roughness. The magnetic layer may be an in-plane magnetic recording layer or a perpendicular magnetic recording layer, but the present invention exhibits a particularly remarkable effect in the case of a perpendicular magnetic recording layer. These magnetic recording layers are preferably formed from an alloy mainly containing Co as a main component.
For example, as a magnetic recording layer for an in-plane magnetic recording medium, a laminated structure composed of a nonmagnetic CrMo underlayer and a ferromagnetic CoCrPtTa magnetic layer can be used.
Examples of magnetic recording layers for perpendicular magnetic recording media include soft magnetic FeCo alloys (FeCoB, FeCoSiB, FeCoZr, FeCoZrB, FeCoZrBCu, etc.), FeTa alloys (FeTaN, FeTaC, etc.), Co alloys (CoTaZr, CoZrNB, CoB, etc.). Soft magnetic layer made of, etc., orientation control film made of Pt, Pd, NiCr, NiFeCr, etc., intermediate film made of Ru, etc. if necessary, and magnetic layer made of 60Co-15Cr-15Pt alloy or 70Co-5Cr-15Pt-10SiO2 alloy Can be used.
The thickness of the magnetic recording layer is 3 nm to 20 nm, preferably 5 nm to 15 nm. The magnetic recording layer may be formed so as to obtain sufficient head input / output according to the type of magnetic alloy used and the laminated structure. The film thickness of the magnetic layer requires a certain thickness of the magnetic layer in order to obtain a certain level of output during playback. On the other hand, parameters indicating recording / playback characteristics usually deteriorate as the output increases. Therefore, it is necessary to set an optimum film thickness.
Usually, the magnetic recording layer is formed as a thin film using a physical vapor deposition method such as a sputtering method, a vacuum vapor deposition method, a gas vapor deposition method, or a gas flow sputtering method.
磁気記録層の表面には保護膜層が形成されている。保護膜としては、炭素（Ｃ）、水素化炭素（ＨｘＣ）、窒素化炭素（ＣＮ）、アルモファスカーボン、炭化珪素（ＳｉＣ）等の炭素質層やＳｉＯ２ 、Ｚｒ２Ｏ３、ＴｉＮなど、通常用いられる保護膜層材料を用いることができる。また、保護膜層が２層以上の層から構成されていてもよい。
保護膜層の膜厚は１０ｎｍ未満とする必要がある。保護膜層の膜厚が１０ｎｍを越えるとヘッドと磁性層との距離が大きくなり、十分な出入力信号の強さが得られなくなるからである。
通常、保護膜層はスパッタ法により形成される。
A protective film layer is formed on the surface of the magnetic recording layer. Examples of the protective film include carbonaceous layers such as carbon (C), hydrogenated carbon (HxC), nitrogenated carbon (CN), alumocarbon, silicon carbide (SiC), SiO 2 , Zr 2 O 3 , TiN, etc. A commonly used protective film layer material can be used. Further, the protective film layer may be composed of two or more layers.
The thickness of the protective film layer needs to be less than 10 nm. This is because if the thickness of the protective film layer exceeds 10 nm, the distance between the head and the magnetic layer increases, and sufficient input / output signal strength cannot be obtained.
Usually, the protective film layer is formed by sputtering.
保護膜層の上には潤滑層を形成することが好ましい。潤滑層に用いる潤滑剤としては、フッ素系潤滑剤、炭化水素系潤滑剤及びこれらの混合物等が挙げられ、通常１〜４ｎｍの厚さで潤滑層を形成する。 A lubricating layer is preferably formed on the protective film layer. Examples of the lubricant used for the lubricating layer include a fluorine-based lubricant, a hydrocarbon-based lubricant, and a mixture thereof, and the lubricating layer is usually formed with a thickness of 1 to 4 nm.
次に、本発明の磁気記録再生装置の構成を図７に示す。本発明の磁気記録再生装置４０は、上述の本発明の磁気記録媒体３０と、これを記録方向に駆動する媒体駆動部２６と、記録部と再生部からなる磁気ヘッド２７と、磁気ヘッド２７を磁気記録媒体３０に対して相対運動させるヘッド駆動部２８と、磁気ヘッド２７への信号入力と磁気ヘッド２７からの出力信号再生を行うための記録再生信号処理手段を組み合わせた記録再生信号系２９とを具備したものである。これらを組み合わせることにより記録密度の高い磁気記録装置を構成することが可能となる。
本発明の磁気記録再生装置に使用した磁気記録媒体は、外周近傍や内孔近傍を精細に研磨仕上げしてあるので、基板と磁気記録媒体層との密着強度が強く、磁気記録媒体層にコロージョンが発生することはなく、電磁変換特性の劣化も起こらないので、長期にわたって安定した性能を維持した磁気記録再生装置となる。
Next, the configuration of the magnetic recording / reproducing apparatus of the present invention is shown in FIG. The magnetic recording / reproducing
Since the magnetic recording medium used in the magnetic recording / reproducing apparatus of the present invention is finely polished in the vicinity of the outer periphery and the inner hole, the adhesion strength between the substrate and the magnetic recording medium layer is strong, and the magnetic recording medium layer is corroded. Is not generated, and the electromagnetic conversion characteristics are not deteriorated. Therefore, the magnetic recording / reproducing apparatus can maintain a stable performance for a long time.
（実施例）
外径４８ｍｍ、内径１２ｍｍ、厚さ０．５０８ｍｍに加工した洗浄済みのガラス基板とシリコン基板を準備した。ガラス基板としては、非晶質ガラスと結晶化ガラスを使用した。シリコン基板は半導体用の単結晶シリコン基板を使用した。
各基板試料は図３に示した積層体にした後、図４と図５に示した方法でブラシ研磨して、チャンファー面の表面粗さ（Ｒａ）がＡＦＭ測定にて４．０Å以上〜１００Å以下の範囲、外周もしくは内周端部面の表面粗さ（Ｒａ）がＡＦＭ測定にて４．０Å以上〜１００Å以下の範囲、Ｒ曲面の曲率が０．０１ｍｍ以上〜０．０７ｍｍ以下の範囲になるようにコントロールした磁気記録媒体用基板を準備した。
次に、これらの基板をＤＣマグネトロンスパッタ装置（アネルバ社製Ｃ−３０１０）の成膜チャンバ内に収容して、到達真空度１×１０−５Ｐａとなるまで成膜チャンバ内を排気した後、基板上に軟磁性膜として９０Ｃｏ−４Ｚｒ−６Ｎｂ（Ｃｏ含有量９０ａｔ％、Ｚｒ含有量４ａｔ％、Ｎｂ含有量６ａｔ％）を５０ｎｍ、Ｒｕ膜を０．８ｎｍ、９０Ｃｏ−４Ｚｒ−６Ｎｂ（Ｃｏ含有量９０ａｔ％、Ｚｒ含有量４ａｔ％、Ｎｂ含有量６ａｔ％）を５０ｎｍ成膜して３層からなる裏打ち層を形成した。このとき基板加熱はおこなわず、磁界を基板半径方向の外周から内周に向かって磁界を印加した。
次いで、配向制御膜としてＲｕを２０ｎｍ、垂直磁気記録層として６６Ｃｏ−８Ｃｒ−１８Ｐｔ−８ＳｉＯ２ を１２ｎｍ成膜した。
次いで、ＣＶＤ法により４ｎｍのアルモファスカーボン保護膜を形成した。
次いで、ディッピング法によりパーフルオロポリエーテルからなる潤滑膜を形成し、磁気記録媒体を得た。
(Example)
A cleaned glass substrate and a silicon substrate processed to an outer diameter of 48 mm, an inner diameter of 12 mm, and a thickness of 0.508 mm were prepared. As the glass substrate, amorphous glass and crystallized glass were used. As the silicon substrate, a single crystal silicon substrate for semiconductor was used.
Each substrate sample is made into the laminate shown in FIG. 3 and then brushed by the method shown in FIGS. 4 and 5, and the surface roughness (Ra) of the chamfer surface is 4.0 mm or more by AFM measurement. The range of 100 mm or less, the surface roughness (Ra) of the outer peripheral or inner peripheral end surface is 4.0 mm to 100 mm in AFM measurement, and the curvature of the R curved surface is 0.01 mm to 0.07 mm. A magnetic recording medium substrate controlled so as to be prepared was prepared.
Next, these substrates are accommodated in a film forming chamber of a DC magnetron sputtering apparatus (C-3010 manufactured by Anelva), and the film forming chamber is evacuated until the ultimate vacuum is 1 × 10 −5 Pa. As a soft magnetic film, 90Co-4Zr-6Nb (Co content 90 at%, Zr content 4 at%,
Subsequently, 20 nm of Ru was formed as an orientation control film, and 12 nm of 66Co-8Cr-18Pt-8SiO 2 was formed as a perpendicular magnetic recording layer.
Next, a 4 nm Almophas carbon protective film was formed by CVD.
Next, a lubricating film made of perfluoropolyether was formed by a dipping method to obtain a magnetic recording medium.
（比較例１〜１９）
基板の研磨加工において、端面のブラシ研磨などの研磨加工を全く実施していないもの、あるいはチャンファー面の表面粗さ（Ｒａ）がＡＦＭ測定にて１００Å以上、外周若しくは外周端面の表面粗さがＡＦＭで１００Å以上、Ｒ曲面の曲率が０．０１ｍｍ以上〜０．０４ｍｍ以下の範囲になるような条件で加工する以外は、実施例に準じて磁気記録媒体を作製した。
(Comparative Examples 1-19)
In the polishing process of the substrate, the polishing process such as brushing of the end face is not performed at all, or the surface roughness (Ra) of the chamfer surface is 100 mm or more by AFM measurement, and the surface roughness of the outer periphery or outer end face is A magnetic recording medium was manufactured according to the example except that the AFM was processed under conditions such that the curvature was 100 mm or more and the curvature of the R-curved surface was 0.01 mm to 0.04 mm.
（比較例２０〜２２）
また面内方式の磁気記録媒体での効果を比較するために、外周端面をブラシ研磨加工していない従来の基板を使用し、ＤＣマグネトロンスパッタ装置を用いて基板を表面温度１７０℃に加熱後Ｃｒ５０−Ｔｉ合金を２００Å、Ｎｉ５０−Ａｌ合金を１００Å、Ｃｒ２０−Ｔｉ合金を５０Å、Ｃｏ１３−Ｃｒ６−Ｐｔ３−Ｂ合金を３０Å成膜した磁気記録媒体を作成した。
(Comparative Examples 20-22)
Further, in order to compare the effects of the in-plane magnetic recording medium, a conventional substrate whose outer peripheral end surface is not subjected to brush polishing is used, and the substrate is heated to a surface temperature of 170 ° C. using a DC magnetron sputtering apparatus, and then Cr50 is used. A magnetic recording medium was produced in which a film of 200-Ti alloy, 100% Ni50-Al alloy, 50% Cr20-Ti alloy and 30% Co13-Cr6-Pt3-B alloy was formed.
これら実施例および比較例の磁気記録媒体について、外周端面の表面粗さ、Ｒ曲面の曲率、及び記録再生特性としてＳＮＲ特性を評価した。また、主表面とチャンファー面近傍における膜の剥がれの有無と個数を観察した。
〔ＡＦＭ表面粗さの評価〕
Digital Instrument社製ＡＦＭ装置を用いて基板の表面粗さ（Ｒａ）を評価した。測定条件は視野１０μｍ、解像度２５６×２５６、タッピングモード、掃印速度１μｍ／ｓｅｃにて行った。
[Ｒ曲面曲率の測定]
ミツトヨ社製、コントレーサーＣＶ−Ｌ４００を用いて、図６に説明した方法に準じて測定した。この際に用いた測定条件は、以下の通りであった。
測定長さ：１ｍｍ
測定速度：０．０２ｍｍ／ｓ
測定ピッチ：０．００２ｍｍ
モード：Ｘ軸固定
〔垂直磁気記録媒体の評価〕
記録再生特性の評価は、米国ＧＵＺＩＫ社製リードライトアナライザＲＷＡ１６３２、およびスピンスタンドＳ１７０１ＭＰを用いて測定した。
記録再生特性の評価には、書き込みをシングルポール磁極、再生部にＧＭＲ素子を用いたヘッドを用いて、記録周波数条件を線記録密度１０００ｋＦＣＩとしてＳＮＲを測定した。
With respect to the magnetic recording media of these examples and comparative examples, the SNR characteristics were evaluated as the surface roughness of the outer peripheral end face, the curvature of the R curved surface, and the recording / reproducing characteristics. Also, the presence or absence and number of films in the vicinity of the main surface and the chamfer surface were observed.
[Evaluation of AFM surface roughness]
The surface roughness (Ra) of the substrate was evaluated using an AFM apparatus manufactured by Digital Instrument. The measurement conditions were a visual field of 10 μm, a resolution of 256 × 256, a tapping mode, and a sweeping speed of 1 μm / sec.
[Measure R curvature]
Measurement was performed according to the method described in FIG. 6 using a Contracer CV-L400 manufactured by Mitutoyo Corporation. The measurement conditions used at this time were as follows.
Measurement length: 1mm
Measurement speed: 0.02 mm / s
Measuring pitch: 0.002mm
Mode: X axis fixed [Evaluation of perpendicular magnetic recording medium]
The recording / reproduction characteristics were evaluated using a read / write analyzer RWA1632 manufactured by GUZIK, USA, and a spin stand S1701MP.
For the evaluation of the recording / reproducing characteristics, the SNR was measured using a single pole magnetic pole for writing and a head using a GMR element for the reproducing part and the recording frequency condition as the linear recording density of 1000 kFCI.
〔コロージョンによる膜剥がれの有無の評価〕
温度７０℃湿度８０％の環境に設定されたオーブンに実施例および比較例にて作成された磁気記録媒体を投入して２４０時間後に回収した後、データ面、外周端面の境界付近を倍率２４０倍の顕微鏡で観察した。チャンファー面とデータ面の境界領域にコロージョンにより発生した膜はがれの存在の有無を観察し、個数を計数した。
これらの結果をまとめて表１及び表２に示す。
[Evaluation of film peeling due to corrosion]
The magnetic recording media prepared in the examples and comparative examples were placed in an oven set to an environment of 70 ° C. and 80% humidity, and after 240 hours, the data was collected after 240 hours. Was observed with a microscope. The presence or absence of film peeling caused by corrosion in the boundary region between the chamfer surface and the data surface was observed, and the number was counted.
These results are summarized in Tables 1 and 2.
これらの結果から、本発明の磁気記録媒体用基板を使用した垂直磁気記録媒体は、コロージョンによる膜剥がれの発生が無く、ＳＮＲの高い高性能な磁気記録媒体であることが判る。
なお、面内記録方式の磁気記録媒体では、使用する薄膜の特性上コロージョンによる膜剥がれの発生は認められなかった。
From these results, it can be seen that the perpendicular magnetic recording medium using the magnetic recording medium substrate of the present invention is a high-performance magnetic recording medium having a high SNR without causing film peeling due to corrosion.
In the longitudinal recording type magnetic recording medium, no film peeling due to corrosion was observed due to the characteristics of the thin film used.
１…磁気記録媒体用基板、５…スペーサー、５ａ…スペーサの端部、６…基板積層体、７，１７…ブラシ、１０…主表面、１１…外周端面、１２，２２…チャンファー、
１３，２３…Ｒ曲面、１４…内孔、１５…コーナー部、２１…内周端面、２６…媒体駆動部、２７…磁気ヘッド、２８…ヘッド駆動部、２９…記録再生信号系、３０…磁気記録媒体、４０…磁気記録再生装置、
DESCRIPTION OF
DESCRIPTION OF
Claims (12)
A magnetic recording / reproducing apparatus comprising the magnetic recording medium according to claim 11.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006185710A JP4545714B2 (en) | 2005-07-08 | 2006-07-05 | Magnetic recording medium and magnetic recording / reproducing apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005200628 | 2005-07-08 | ||
| JP2006185710A JP4545714B2 (en) | 2005-07-08 | 2006-07-05 | Magnetic recording medium and magnetic recording / reproducing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007042263A true JP2007042263A (en) | 2007-02-15 |
| JP4545714B2 JP4545714B2 (en) | 2010-09-15 |
Family
ID=37800080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006185710A Active JP4545714B2 (en) | 2005-07-08 | 2006-07-05 | Magnetic recording medium and magnetic recording / reproducing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4545714B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013073667A (en) * | 2012-07-17 | 2013-04-22 | Asahi Glass Co Ltd | Manufacturing method of glass substrate for magnetic recording medium and glass substrate for magnetic recording medium |
| JP2013073658A (en) * | 2011-09-28 | 2013-04-22 | Asahi Glass Co Ltd | Glass substrate for magnetic recording medium |
| WO2014050241A1 (en) * | 2012-09-28 | 2014-04-03 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, and method for producing glass substrate for magnetic disk |
| JP2014160539A (en) * | 2012-09-28 | 2014-09-04 | Hoya Corp | Glass substrate for magnetic disk, and magnetic disk |
| WO2015152316A1 (en) * | 2014-03-31 | 2015-10-08 | Hoya株式会社 | Magnetic disk-use glass substrate |
| JP5983897B1 (en) * | 2015-11-26 | 2016-09-06 | 旭硝子株式会社 | Glass substrate for magnetic disk and magnetic disk |
| JP6106813B1 (en) * | 2015-09-30 | 2017-04-05 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, glass substrate intermediate, and method for producing glass substrate for magnetic disk |
| JP2021177440A (en) * | 2018-03-30 | 2021-11-11 | Hoya株式会社 | Plate material for annealing treatment, method for manufacturing plate material for annealing treatment, and method for manufacturing substrate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09102120A (en) * | 1995-10-03 | 1997-04-15 | Kao Corp | Substrate for recording medium |
| JPH10154321A (en) * | 1996-09-30 | 1998-06-09 | Hoya Corp | Glass substrate for magnetic recording medium, magnetic recording medium and their production |
| JP2002163817A (en) * | 2000-09-12 | 2002-06-07 | Showa Denko Kk | Magnetic recording medium, method for manufacturing the same and magnetic recording/reproducing device |
| JP2004039030A (en) * | 2002-06-28 | 2004-02-05 | Showa Denko Kk | Magnetic recording medium, its manufacturing method, and magnetic recording/reproducing device |
-
2006
- 2006-07-05 JP JP2006185710A patent/JP4545714B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09102120A (en) * | 1995-10-03 | 1997-04-15 | Kao Corp | Substrate for recording medium |
| JPH10154321A (en) * | 1996-09-30 | 1998-06-09 | Hoya Corp | Glass substrate for magnetic recording medium, magnetic recording medium and their production |
| JP2002163817A (en) * | 2000-09-12 | 2002-06-07 | Showa Denko Kk | Magnetic recording medium, method for manufacturing the same and magnetic recording/reproducing device |
| JP2004039030A (en) * | 2002-06-28 | 2004-02-05 | Showa Denko Kk | Magnetic recording medium, its manufacturing method, and magnetic recording/reproducing device |
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013073658A (en) * | 2011-09-28 | 2013-04-22 | Asahi Glass Co Ltd | Glass substrate for magnetic recording medium |
| JP2013073667A (en) * | 2012-07-17 | 2013-04-22 | Asahi Glass Co Ltd | Manufacturing method of glass substrate for magnetic recording medium and glass substrate for magnetic recording medium |
| US9697860B2 (en) | 2012-09-28 | 2017-07-04 | Hoya Corporation | Magnetic-disk glass substrate, magnetic disk and method for manufacturing magnetic-disk glass substrate |
| WO2014050241A1 (en) * | 2012-09-28 | 2014-04-03 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, and method for producing glass substrate for magnetic disk |
| JP2014160539A (en) * | 2012-09-28 | 2014-09-04 | Hoya Corp | Glass substrate for magnetic disk, and magnetic disk |
| US11094344B2 (en) | 2012-09-28 | 2021-08-17 | Hoya Corporation | Hard disk drive with magnetic-disk substrate |
| US10580448B2 (en) | 2012-09-28 | 2020-03-03 | Hoya Corporation | Magnetic-disk glass substrate, magnetic disk and method for manufacturing magnetic-disk glass substrate |
| US10290315B2 (en) | 2012-09-28 | 2019-05-14 | Hoya Corporation | Magnetic-disk substrate and magnetic disk |
| JP2016058128A (en) * | 2014-03-31 | 2016-04-21 | Hoya株式会社 | Glass substrate for magnetic disk |
| US10032472B2 (en) | 2014-03-31 | 2018-07-24 | Hoya Corporation | Magnetic-disk glass substrate |
| WO2015152316A1 (en) * | 2014-03-31 | 2015-10-08 | Hoya株式会社 | Magnetic disk-use glass substrate |
| US11024335B2 (en) | 2014-03-31 | 2021-06-01 | Hoya Corporation | Magnetic-disk glass substrate |
| CN106030709A (en) * | 2014-03-31 | 2016-10-12 | Hoya株式会社 | Magnetic disk-use glass substrate |
| JP5860195B1 (en) * | 2014-03-31 | 2016-02-16 | Hoya株式会社 | Glass substrate for magnetic disk |
| CN106030709B (en) * | 2014-03-31 | 2018-02-23 | Hoya株式会社 | Glass substrate for disc |
| JP2017130249A (en) * | 2015-09-30 | 2017-07-27 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, glass substrate intermediate, and manufacturing method of glass substrate for magnetic disk |
| JP6106813B1 (en) * | 2015-09-30 | 2017-04-05 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, glass substrate intermediate, and method for producing glass substrate for magnetic disk |
| US10720180B2 (en) | 2015-09-30 | 2020-07-21 | Hoya Corporation | Magnetic-disk glass substrate, magnetic-disk glass substrate intermediate, and method for manufacturing magnetic-disk glass substrate |
| WO2017057686A1 (en) * | 2015-09-30 | 2017-04-06 | Hoya株式会社 | Glass substrate for magnetic disk, magnetic disk, glass substrate intermediate body, and method for manufacturing glass substrate for magnetic disk |
| US11211090B2 (en) | 2015-09-30 | 2021-12-28 | Hoya Corporation | Magnetic-disk glass substrate, magnetic-disk glass substrate intermediate, and method for manufacturing magnetic-disk glass substrate |
| US11710505B2 (en) | 2015-09-30 | 2023-07-25 | Hoya Corporation | Magnetic-disk glass substrate, magnetic-disk glass substrate intermediate, and method for manufacturing magnetic-disk glass substrate |
| JP5983897B1 (en) * | 2015-11-26 | 2016-09-06 | 旭硝子株式会社 | Glass substrate for magnetic disk and magnetic disk |
| WO2017090260A1 (en) * | 2015-11-26 | 2017-06-01 | 旭硝子株式会社 | Glass substrate for magnetic disc, and magnetic disc |
| JP2021177440A (en) * | 2018-03-30 | 2021-11-11 | Hoya株式会社 | Plate material for annealing treatment, method for manufacturing plate material for annealing treatment, and method for manufacturing substrate |
| JP7228007B2 (en) | 2018-03-30 | 2023-02-22 | Hoya株式会社 | Plate material for annealing treatment, method for manufacturing plate material for annealing treatment, and method for manufacturing substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4545714B2 (en) | 2010-09-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5401066B2 (en) | Magnetic disk and manufacturing method thereof | |
| JP4545714B2 (en) | Magnetic recording medium and magnetic recording / reproducing apparatus | |
| US7727645B2 (en) | Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording and reproducing apparatus | |
| JP2008293552A (en) | Substrate, magnetic recording medium, its manufacturing method, and magnetic storage device | |
| JP5826000B2 (en) | Substrate for magnetic recording medium, magnetic recording medium, method for manufacturing magnetic recording medium substrate, and surface inspection method | |
| JP2007272995A (en) | Method for determining whether or not magnetic disk device and non-magnetic substrate are good, magnetic disk, and magnetic disk device | |
| WO2006098504A1 (en) | Production process of magnetic recording medium, magnetic recording medium, and magnetic recording and reproducing apparatus | |
| US6238780B1 (en) | Magnetic recording medium comprising multilayered carbon-containing protective overcoats | |
| JP4848469B2 (en) | Method for manufacturing perpendicular magnetic recording medium | |
| JP2006082138A (en) | Method of manufacturing glass substrate for magnetic disk, and glass substrate for magnetic disk, as well as method of manufacturing magnetic disk, and magnetic disk | |
| JP2007087533A (en) | Silicon substrate for magnetic recording media, and magnetic recording medium | |
| JP2006294220A (en) | Method for manufacturing magnetic recording medium, magnetic recording medium, and magnetic recording/reproducing device | |
| CN100550137C (en) | The substrate of magnetic recording media, magnetic recording media and magnetic recording and transcriber | |
| JP5032758B2 (en) | Manufacturing method of glass substrate for magnetic disk and manufacturing method of magnetic disk | |
| JP2014056622A (en) | Perpendicular magnetic recording medium | |
| JP5465456B2 (en) | Magnetic disk | |
| JP3657196B2 (en) | Magnetic recording medium and magnetic disk device | |
| JP2006155863A (en) | Perpendicular magnetic recording medium, its manufacturing method, and magnetic recording and reproducing apparatus | |
| JP5212530B2 (en) | GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM USING THE GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM | |
| JP4333663B2 (en) | Magnetic recording medium | |
| JP2005317181A (en) | Glass substrate for magnetic disk and magnetic disk | |
| JP4977795B1 (en) | GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM USING THE GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM | |
| JP2005141824A (en) | Manufacturing method of glass substrate for magnetic disk , and manufacturing method of the magnetic disk | |
| JP2007026536A (en) | Magnetic recording medium, its manufacturing method and magnetic recording and reproducing apparatus | |
| JP2007273000A (en) | Magnetic recording medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090402 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091201 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100126 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100316 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100517 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100622 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100630 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4545714 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |