JP2006298988A - Supporting material for grinding object - Google Patents

Supporting material for grinding object

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Publication number
JP2006298988A
JP2006298988A JP2005119217A JP2005119217A JP2006298988A JP 2006298988 A JP2006298988 A JP 2006298988A JP 2005119217 A JP2005119217 A JP 2005119217A JP 2005119217 A JP2005119217 A JP 2005119217A JP 2006298988 A JP2006298988 A JP 2006298988A
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JP
Japan
Prior art keywords
thermosetting resin
glass fiber
silicone rubber
polished
thickness
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Abandoned
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JP2005119217A
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Japanese (ja)
Inventor
Katsuharu Takahashi
克治 高橋
Minoru Yonekura
稔 米倉
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Resonac Corp
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Shin Kobe Electric Machinery Co Ltd
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Application filed by Shin Kobe Electric Machinery Co Ltd filed Critical Shin Kobe Electric Machinery Co Ltd
Priority to JP2005119217A priority Critical patent/JP2006298988A/en
Publication of JP2006298988A publication Critical patent/JP2006298988A/en
Abandoned legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a supporting material for a grinding object having improved abrasion resistance and long usable period. <P>SOLUTION: The supporting material for a grinding object is composed of a plate produced by hot-pressing a single fiber-sheet substrate impregnated with a thermosetting resin or a plurality of the substrates stacked one upon another. At least the surface layer of the material is composed of a fiber sheet substrate impregnated with a thermosetting resin containing silicone rubber particles. The amount of the silicone rubber is preferably 1-50 pts.mass based on 100 pts.mass of the thermosetting resin (including the curing agent) used as the main component. The fiber sheet substrate is preferably woven glass fiber cloth and the glass fiber preferably has a diameter of ≤7μm. The thickness of the surface resin layer is preferably 3-40μm. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

シリコンウエハ,ハードディスクなどの製造工程には、これらの表面を研磨する工程がある。本発明は、前記研磨工程で、シリコンウエハ,ハードディスクなどの被研磨物を保持するための保持材に関する。   The manufacturing process of silicon wafers and hard disks includes a process of polishing these surfaces. The present invention relates to a holding material for holding an object to be polished such as a silicon wafer or a hard disk in the polishing step.

上記被研磨物保持材は、駆動用のギヤを周囲に形成した円板に、被研磨物保持用の貫通穴を1個ないし複数個あけた構造である。前記貫通穴に被研磨物を嵌め込んで研磨装置に装着し、保持材を平面で駆動させることにより被研磨物の研磨を行なう。   The object to be polished holding material has a structure in which one or a plurality of through holes for holding an object to be polished are formed in a disk having a driving gear around it. The object to be polished is fitted into the through hole, mounted on a polishing apparatus, and the holding material is driven in a plane to polish the object to be polished.

従来、このような被研磨物保持材は、熱硬化性樹脂積層板を加工した板状体で構成されている。前記熱硬化性樹脂積層板は、ガラス繊維織布基材エポキシ樹脂積層板、アラミド繊維不織布基材エポキシ樹脂積層板、綿布基材フェノール樹脂積層板などである。
被研磨物保持材を構成するための積層板は、一般に無機物や有機物の粒子などを含有しない熱硬化性樹脂をガラス繊維織布やアラミド繊維不織布あるいは綿布等の基材に含浸乾燥してプリプレグとし、このプリプレグ1枚若しくは重ね合せた複数枚を加熱加圧成形して製造する。これら積層板は、前記のように被研磨物保持材に加工され、シリコンウエハ,ハードディスクなどの研磨に使用される。
Conventionally, such an object holding material is constituted by a plate-like body obtained by processing a thermosetting resin laminate. The thermosetting resin laminate is a glass fiber woven fabric base epoxy resin laminate, an aramid fiber non-woven fabric base epoxy resin laminate, a cotton fabric base phenol resin laminate, or the like.
Laminates for constituting the material to be polished are generally prepregs obtained by impregnating and drying a thermosetting resin containing no inorganic or organic particles on a glass fiber woven fabric, aramid fiber nonwoven fabric or cotton fabric. These prepregs or a plurality of superposed sheets are produced by heating and pressing. These laminated plates are processed into a workpiece holding material as described above, and are used for polishing silicon wafers, hard disks and the like.

特許第2974007号公報Japanese Patent No. 2974007

研磨作業は、上記被研磨物保持材を研磨装置に装着し、被研磨物保持材の貫通穴に被研磨物を保持し、被研磨物とその表面に当接した研磨パッドとの間にシリカ(SiO),アルミナ(Al),セリア(CeO)などの微粒子を分散した水系研磨液を供給しながら、被研磨物保持材を平面で駆動させることにより行なわれる。 The polishing work is carried out by mounting the object to be polished on a polishing apparatus, holding the object to be polished in a through hole of the object to be polished and holding a silica between the object to be polished and a polishing pad in contact with the surface. The polishing object holding material is driven in a plane while supplying an aqueous polishing liquid in which fine particles such as (SiO 2 ), alumina (Al 2 O 3 ), and ceria (CeO 2 ) are dispersed.

近時は、シリコンウエハ,ハードディスクに対してトータルコストを抑えることが求められるようになり、その結果、被研磨物保持材には正常な状態で使用可能な時間(研磨ライフ)を長くすることが要求されるようになってきた。本発明が解決しようとする課題は、耐摩耗性を向上させ、研磨ライフを延長させた被研磨物保持材を提供することである。   Recently, it has been required to reduce the total cost of silicon wafers and hard disks, and as a result, it is possible to lengthen the time (polishing life) that can be used in a normal state for the workpiece holding material. It has come to be required. The problem to be solved by the present invention is to provide an object holding material having improved wear resistance and extended polishing life.

上記課題を解決するために、本発明に係る被研磨物保持材は、熱硬化性樹脂を含浸したシート状繊維基材1枚若しくは重ね合せた複数枚を加熱加圧成形した板状体で構成されており、少なくとも表面層は、シリコーンゴム粒子を含有させた熱硬化性樹脂を含浸したシート状繊維基材で構成されていることを特徴とする。   In order to solve the above-mentioned problems, the object-holding material according to the present invention is composed of a sheet-like fiber base material impregnated with a thermosetting resin or a plate-like body obtained by heat-pressing a plurality of superposed sheets. And at least the surface layer is composed of a sheet-like fiber base material impregnated with a thermosetting resin containing silicone rubber particles.

シリコーンゴムは、その表面エネルギが最も小さい固体材料の一つであり、優れた非粘着性と非接着性を有する。被研磨物保持材を使用しているとその表面が摩耗して、シリコーンゴム粒子が露出してくるので、被研磨物保持材と研磨パッドの間の摩擦が、シリコーンゴム粒子の介在によって小さくなる。そうすると、被研磨物保持材の摩耗が進みにくくなる。   Silicone rubber is one of the solid materials having the smallest surface energy, and has excellent non-tackiness and non-adhesiveness. Since the surface of the object to be polished is worn and the silicone rubber particles are exposed when the object to be polished is used, the friction between the object to be polished and the polishing pad is reduced by the interposition of the silicone rubber particles. . If it does so, it will become difficult for abrasion of a to-be-polished thing holding material to advance.

本発明に係る被研磨物保持材は、表面層に、シリコーンゴム粒子を含有した熱硬化性樹脂層を配置しているので、その使用中における被研磨物保持材と研磨パッドとの摩擦が小さくなり、その結果、被研磨物保持材の摩耗促進が抑えられて研磨ライフが長くなる。これによって、被研磨物の大幅な製造コスト低減を図ることができる。   Since the object-holding material according to the present invention has a thermosetting resin layer containing silicone rubber particles disposed on the surface layer, the friction between the object-holding material and the polishing pad during use is small. As a result, the acceleration of wear of the workpiece holding material is suppressed, and the polishing life is lengthened. As a result, the manufacturing cost of the object to be polished can be greatly reduced.

上述したように、本発明に係る被研磨物保持材は、シリコーンゴム粒子含有熱硬化性樹脂を含浸したシート状繊維基材1枚若しくは重ね合わせた複数枚を加熱加圧成形し構成したものである。被研磨物保持材の少なくとも表面層を、前記シリコーンゴム粒子含有熱硬化性樹脂を含浸乾燥したシート状繊維基材(プリプレグ)を加熱加圧成形して構成する。シリコーンゴムの含有量は、主剤の熱硬化性樹脂(硬化剤を含む)100質量部に対して1〜50質量部が好ましい。少なすぎると、配合した効果が十分に現われず、多すぎると、層間接着強度が低下しギヤ部分が層間剥離を起こす。また、シリコーンゴムの粒子径は、2〜30μmが好ましい。   As described above, the object-holding material according to the present invention is formed by heating and press-molding one sheet-like fiber base material impregnated with a silicone rubber particle-containing thermosetting resin or a plurality of superposed sheets. is there. At least the surface layer of the material to be polished is formed by heating and pressure-molding a sheet-like fiber base material (prepreg) impregnated and dried with the thermosetting resin containing the silicone rubber particles. The content of the silicone rubber is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the main component thermosetting resin (including the curing agent). If the amount is too small, the blended effect does not sufficiently appear. If the amount is too large, the interlayer adhesive strength is lowered and the gear portion is delaminated. The particle diameter of the silicone rubber is preferably 2 to 30 μm.

シート状繊維基材は、ガラス繊維やアラミド繊維の織布又は不織布あるいは綿布など、被研磨物保持材を構成可能なシート状繊維基材であれば特に限定するものではない。しかし、研磨時のクラッシュ(被研磨物保持材の貫通穴に保持した被研磨物が、研磨作業中に貫通穴から離脱する現象)を防止するためには、ガラス繊維織布を選択して、剛性を付与することが好ましい。この場合、少なくとも表面層のガラス繊維織布は、それを構成するガラス繊維の繊維径を7μm以下とするのが好ましい。ガラス繊維織布を構成するガラス糸は、ガラス繊維を収束して構成したものであるが、前記のようにガラス繊維径を細くすると、同じ太さのガラス糸を構成するのにガラス繊維の収束本数が増え、被研磨物保持材の剛性が上がるからである。その結果、クラッシュが極めておこりにくくなる。   The sheet-like fiber base material is not particularly limited as long as it is a sheet-like fiber base material that can constitute the material to be polished, such as a woven or non-woven fabric or cotton cloth of glass fiber or aramid fiber. However, in order to prevent a crash at the time of polishing (a phenomenon in which the object held in the through hole of the object holding material is detached from the through hole during the polishing operation), select a glass fiber woven cloth, It is preferable to impart rigidity. In this case, at least the glass fiber woven fabric of the surface layer preferably has a fiber diameter of glass fibers constituting it of 7 μm or less. The glass yarn constituting the glass fiber woven fabric is configured by converging the glass fiber, but if the glass fiber diameter is reduced as described above, the glass fiber is converged to form a glass yarn of the same thickness. This is because the number increases and the rigidity of the workpiece holding material increases. As a result, crashes are extremely difficult to occur.

シート状繊維基材に含浸する熱硬化性樹脂は、フェノール樹脂,エポキシ樹脂,ポリエステル,ポリイミドなど特に限定するものではない。しかし、フェノール樹脂やポリイミドなど、比較的耐熱性の高い熱硬化性樹脂(例えば、ベンゼン核など接着に直接関与しない部分を分子骨格に高密度で有している樹脂)は、樹脂自体は硬いものの、接着性が比較的低いため研磨時に基材と樹脂の界面剥離が発生しやすかったり、樹脂自体の破壊・摩耗が起こりやすい。このようなことから、熱硬化性樹脂としてエポキシ樹脂を使用することが好ましい。
さらに、エポキシ樹脂の脆さを低減するために、ゴム成分などの可撓化成分を加え、変性したエポキシ樹脂も好ましいものである。
The thermosetting resin impregnated into the sheet-like fiber base material is not particularly limited, such as phenol resin, epoxy resin, polyester, and polyimide. However, thermosetting resins with relatively high heat resistance such as phenol resin and polyimide (for example, resins having a high density in the molecular skeleton such as a benzene nucleus), although the resin itself is hard Since the adhesiveness is relatively low, peeling of the interface between the base material and the resin is likely to occur during polishing, or the resin itself is liable to be destroyed or worn. For this reason, it is preferable to use an epoxy resin as the thermosetting resin.
Furthermore, in order to reduce the brittleness of the epoxy resin, an epoxy resin modified by adding a flexible component such as a rubber component is also preferable.

被研磨物保持材のための板状体の成形は、熱硬化性樹脂を含浸し加熱乾燥したシート状繊維基材1枚若しくは重ね合せた複数枚を離型フィルムで被覆して鏡面板に挟みこみ、プレス熱盤間で加熱加圧成形する。シリコンウエハ,ハードディスクなど被研磨物の種類や厚さなど研磨条件により、シート状繊維基材の重ね合せ枚数を変える。   Molding of the plate-like body for the material to be polished is performed by covering one sheet-like fiber base material impregnated with thermosetting resin and heat-drying or a plurality of superposed sheets with a release film and sandwiching it between mirror plates. It is heated and pressed between the dust and the press hot platen. Depending on the polishing conditions such as the type and thickness of the object to be polished such as silicon wafer and hard disk, the number of sheet-like fiber base materials to be stacked is changed.

本発明に係る被研磨物保持材は、ガラス繊維織布を含まないシリコーンゴム含有熱硬化性樹脂層が、3〜40μmの厚さで表面に形成されることが好ましい。このようにガラス繊維織布を含まない層を表面層に所定厚さで設けることにより、研磨ライフをより長くすることができる。
このようなシリコーンゴム含有熱硬化性樹脂だけの層は、樹脂含有量の多いプリプレグを使用することにより、ことにこのようなプリプレグを最表面に配置して加熱加圧成形するより構成することができる。
As for the to-be-polished material holding | maintenance material which concerns on this invention, it is preferable that the silicone rubber containing thermosetting resin layer which does not contain a glass fiber woven fabric is formed in the surface by the thickness of 3-40 micrometers. By providing the surface layer with a predetermined thickness on the surface layer in this manner, the polishing life can be further extended.
Such a silicone rubber-containing thermosetting resin-only layer can be constituted by using a prepreg having a high resin content, particularly by placing such a prepreg on the outermost surface and performing heat-pressure molding. it can.

シート状繊維基材として、以下のものを準備した。   The following were prepared as a sheet-like fiber base material.

ガラス繊維織布a(日東紡製「WEA−18」):厚さ0.18mm,単位質量205g/m
ガラス繊維織布b(日東紡製「WEA−116E」):厚さ0.1mm,単位質量104g/m
ガラス繊維織布c(日東紡製「WEA−05E」):厚さ0.06mm,単位質量:48g/m
エポキシ樹脂ワニスとして、硬化剤をジシアンジアミドとし、硬化促進剤を2−エチル−4メチルイミダゾールとしたビスフェノールA型エポキシ樹脂ワニス(A)を準備した。
また、ワニス(A)にシリコーンゴム粒子(東レダウコーニングシリコーン製「トレフィルE500」,平均粒径3μm)を配合したワニス(B)を準備した。ワニス(B)は、樹脂固形でビスフェノールA型エポキシ樹脂と硬化剤の合計質量100に対してシリコーンゴムを0.5,1,20,50,60の各質量部となるように調製したワニス(B1)〜ワニス(B5)である。
Glass fiber woven fabric a (“WEA-18” manufactured by Nittobo): thickness 0.18 mm, unit mass 205 g / m 2
Glass fiber woven fabric b (“WEA-116E” manufactured by Nittobo): thickness 0.1 mm, unit mass 104 g / m 2
Glass fiber woven fabric c (“WEA-05E” manufactured by Nittobo): thickness 0.06 mm, unit mass: 48 g / m 2
As the epoxy resin varnish, a bisphenol A type epoxy resin varnish (A) in which the curing agent was dicyandiamide and the curing accelerator was 2-ethyl-4methylimidazole was prepared.
Moreover, the varnish (B) which mix | blended the silicone rubber particle | grains ("Torefill E500" made from Toray Dow Corning silicone, average particle diameter of 3 micrometers) was prepared for the varnish (A). The varnish (B) is a resin varnish prepared such that the silicone rubber is 0.5, 1, 20, 50, 60 parts by mass with respect to the total mass 100 of the bisphenol A type epoxy resin and the curing agent. B1) to varnish (B5).

これら各種ワニスをガラス繊維織布a〜cに含浸し乾燥させて、プリプレグを得た。
ガラス繊維織布aには、その1枚を加熱加圧成形したときの厚さが0.2mmになるように、ワニスの含浸量・樹脂付着量を調整した。
ガラス繊維織布bには、その1枚を加熱加圧成形したときの厚さが0.1mmになるように、ワニスの含浸量・樹脂付着量を調整した。
ガラス繊維織布cには、その1枚を加熱加圧成形したときの厚さが0.07mmになるように、ワニスの含浸量・樹脂付着量を調整した。
上記各プリプレグの構成を纏めると、表1に示すプリプレグ(1)〜(8)のとおりである。
また、ガラス繊維織布aに、その1枚を加熱加圧成形したときの厚さが0.17,0.24,0.16,0.26mmの各厚さになるように、ワニスの含浸量・樹脂付着量を調整した。表2に示すプリプレグ(9)〜(12)のとおりである。
Glass fiber woven fabrics a to c were impregnated with these various varnishes and dried to obtain prepregs.
In the glass fiber woven fabric a, the amount of varnish impregnation and the amount of resin adhered was adjusted so that the thickness when one piece was heat-pressed was 0.2 mm.
In the glass fiber woven fabric b, the amount of varnish impregnation and the amount of resin adhered were adjusted so that the thickness when one piece was heat-press molded was 0.1 mm.
For the glass fiber woven fabric c, the amount of varnish impregnation and the amount of resin adhered were adjusted so that the thickness when one sheet was heat-press molded was 0.07 mm.
The configuration of each prepreg is summarized as prepregs (1) to (8) shown in Table 1.
Further, impregnation with varnish so that the thickness when one piece of glass fiber woven fabric a is heat-pressed is 0.17, 0.24, 0.16, 0.26 mm. The amount and resin adhesion amount were adjusted. The prepregs (9) to (12) shown in Table 2 are as follows.

Figure 2006298988
Figure 2006298988

Figure 2006298988
Figure 2006298988

実施例1
プリプレグ(3)を5枚重ねた両側に、離型フィルム(50μm厚のポリプロピレンフィルム)を配置しこれを鏡面板に挟み込み、クラフト紙層からなる厚さ10mmのクッション材を介してプレス熱盤間で加熱加圧成形し、厚さ1.0mmの積層板を得た。
この積層板を被研磨物保持材に加工した。この被研磨物保持材は、周囲にギヤを形成した直径10インチの円板であり、被研磨物を嵌め込むための直径3.5インチの貫通穴を4個設けたものである。
Example 1
A release film (50 μm thick polypropylene film) is placed on both sides of the five prepregs (3) stacked, and this is sandwiched between mirror plates. Between the press hot plates through a 10 mm thick cushioning material consisting of a kraft paper layer Was heated and pressed to obtain a laminated plate having a thickness of 1.0 mm.
This laminated board was processed into a workpiece holding material. This object-to-be-polished holding material is a disk having a diameter of 10 inches with a gear formed around it, and is provided with four through-holes having a diameter of 3.5 inches for fitting the object to be polished.

実施例2
プリプレグ(4)を5枚重ね、そのほかは実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Example 2
Five prepregs (4) were stacked, and other than that, a workpiece holding material having a thickness of 1.0 mm was obtained in the same manner as in Example 1.

実施例3
プリプレグ(5)を5枚重ね、そのほかは実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Example 3
Five prepregs (5) were stacked, and other than that, an object holding material having a thickness of 1.0 mm was obtained in the same manner as in Example 1.

実施例4
プリプレグ(7)を最外層に各1枚配置し、その中芯にプリプレグ(1)を4枚重ね合せ、これを加熱加圧成形し、以下、実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Example 4
One prepreg (7) is disposed in the outermost layer, and four prepregs (1) are superposed on the inner core, and this is heat-press molded. Thereafter, as in Example 1, the thickness is 1.0 mm. A material to be polished was used.

実施例5
プリプレグ(8)を最外層に各1枚配置し、その中芯にプリプレグ(1)を4枚重ね合せ、これを加熱加圧成形し、以下、実施例1と同様に厚さ0.94mmの被研磨物保持材とした。
Example 5
One prepreg (8) is disposed on the outermost layer, and four prepregs (1) are superposed on the core, and this is heat-press molded. Thereafter, the thickness is 0.94 mm as in Example 1. A material to be polished was used.

実施例6
プリプレグ(9)を最外層に各1枚配置し、その中芯にプリプレグ(1)を3枚重ね合せ、これを加熱加圧成形し、以下、実施例1と同様に厚さ0.94mmの被研磨物保持材とした。
Example 6
One prepreg (9) is disposed on the outermost layer, three prepregs (1) are stacked on the core, and this is heated and pressure-molded. Thereafter, as in Example 1, the thickness is 0.94 mm. A material to be polished was used.

実施例7
プリプレグ(10)を最外層に各1枚配置し、その中芯にプリプレグ(1)を3枚重ね合せ、これを加熱加圧成形し、以下、実施例1と同様に厚さ1.08mmの被研磨物保持材とした。
Example 7
One prepreg (10) is disposed on the outermost layer, three prepregs (1) are stacked on the core, and this is heat-press-molded. Thereafter, as in Example 1, the thickness is 1.08 mm. A material to be polished was used.

実施例8
プリプレグ(11)を最外層に各1枚配置し、その中芯にプリプレグ(1)を3枚重ね合せ、これを加熱加圧成形し、以下、実施例1と同様に厚さ0.92mmの被研磨物保持材とした。
Example 8
One prepreg (11) is disposed on the outermost layer, three prepregs (1) are stacked on the core, and this is heat-press molded. Thereafter, as in Example 1, the thickness is 0.92 mm. A material to be polished was used.

比較例1
プリプレグ(2)を5枚重ね、そのほかは実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Comparative Example 1
Five prepregs (2) were stacked, and the others were used as materials to be polished having a thickness of 1.0 mm as in Example 1.

比較例2
プリプレグ(6)を5枚重ね、そのほかは実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Comparative Example 2
Five prepregs (6) were stacked, and the others were used as materials to be polished having a thickness of 1.0 mm as in Example 1.

従来例1
プリプレグ(1)を5枚重ね、そのほかは実施例1と同様に厚さ1.0mmの被研磨物保持材とした。
Conventional Example 1
Five prepregs (1) were stacked, and the others were used as materials to be polished having a thickness of 1.0 mm in the same manner as in Example 1.

以上の各実施例と比較例および従来例の被研磨物保持材を使用して研磨作業を行なった。
被研磨物は、3.5インチアルミハードディスクである。被研磨物保持材の使用寿命を評価した結果を表3,4に示す。
被研磨物保持材の研磨ライフは、上記研磨作業における摩耗率を測定し、従来例1の使用寿命を100とした指数(指数が大きいほど、使用寿命が長い)で示す。
Polishing work was performed using the above-described respective objects, comparative examples, and conventional examples of the workpiece holding material.
The object to be polished is a 3.5 inch aluminum hard disk. Tables 3 and 4 show the results of evaluating the service life of the workpiece holding material.
The polishing life of the workpiece holding material is indicated by an index (measured as the larger the index is, the longer the service life is) when the wear rate in the polishing operation is measured and the service life of Conventional Example 1 is 100.

Figure 2006298988
Figure 2006298988

Figure 2006298988
Figure 2006298988

表3,4から、本発明の実施例に係る被研磨物保持材は、樹脂中にシリコーンゴム粒子を含有し、その含有量を樹脂100質量部に対し1〜50質量部にすることにより、研磨ライフを長くできることを理解できる(実施例1〜3と比較例1,2および従来例1との対比)。   From Tables 3 and 4, the material to be polished according to the examples of the present invention contains silicone rubber particles in the resin, and the content is 1 to 50 parts by mass with respect to 100 parts by mass of the resin. It can be understood that the polishing life can be lengthened (contrast with Examples 1 to 3, Comparative Examples 1 and 2 and Conventional Example 1).

ガラス繊維織布を構成するガラス繊維の繊維径を7μm以下にすることにより、研磨ライフをより長くできる(実施例2と実施例4,5との対比)。また、表面のシリコーンゴム含有熱硬化性樹脂層の厚さ(ガラス繊維織布が存在しない樹脂層のみの厚さ)を、3〜40μmとすることにより、研磨ライフをより長くできる(実施例2,6,7と実施例8の対比)。尚、ガラス繊維織布に保持させることができる樹脂量には自ずと限界があるので、前記表面のシリコーンゴム含有熱硬化性樹脂層の厚さは、40μmが限界となる。
By making the fiber diameter of the glass fiber constituting the glass fiber woven fabric 7 μm or less, the polishing life can be made longer (contrast with Example 2 and Examples 4 and 5). Moreover, the polishing life can be made longer by setting the thickness of the silicone rubber-containing thermosetting resin layer on the surface (the thickness of only the resin layer without the glass fiber woven fabric) to 3 to 40 μm (Example 2). , 6, 7 and Example 8). Since the amount of resin that can be held on the glass fiber woven fabric is naturally limited, the thickness of the thermosetting resin layer containing the silicone rubber on the surface is limited to 40 μm.

Claims (3)

熱硬化性樹脂を含浸したシート状繊維基材1枚若しくは重ね合せた複数枚を加熱加圧成形した板状体で構成され、少なくとも表面層はシリコーンゴム粒子を含有する熱硬化性樹脂を含浸したシート状繊維基材で構成されており、シリコーンゴム粒子の含有量が、主剤の熱硬化性樹脂(硬化剤を含む)100質量部に対して1〜50質量部であることを特徴とする被研磨物保持材。   It is composed of a sheet-like fiber base material impregnated with a thermosetting resin or a plate-like body obtained by heating and pressing a plurality of superposed sheets, and at least the surface layer is impregnated with a thermosetting resin containing silicone rubber particles. It is composed of a sheet-like fiber base material, and the content of the silicone rubber particles is 1 to 50 parts by mass with respect to 100 parts by mass of the main component thermosetting resin (including the curing agent). Polished material holding material. シート状繊維基材が、ガラス繊維織布であり少なくとも表面層のガラス繊維織布は、それを構成するガラス繊維の繊維径が7μm以下であることを特徴とする請求項1記載の被研磨物保持材。   2. The object to be polished according to claim 1, wherein the sheet-like fiber base material is a glass fiber woven fabric, and the glass fiber woven fabric of at least the surface layer has a fiber diameter of glass fiber constituting it of 7 μm or less. Retaining material. ガラス繊維織布を含まないシリコーンゴム含有熱硬化性樹脂層が表面に形成され、当該シリコーンゴム含有熱硬化性樹脂層の厚さが3〜40μmである請求項2記載の被研磨物保持材。   The material for holding an object to be polished according to claim 2, wherein a silicone rubber-containing thermosetting resin layer not containing a glass fiber woven fabric is formed on the surface, and the thickness of the silicone rubber-containing thermosetting resin layer is 3 to 40 µm.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008254149A (en) * 2007-04-09 2008-10-23 Sumitomo Bakelite Co Ltd Laminated plate for holding polishing object and holding member of polishing object
CN107900923A (en) * 2017-12-28 2018-04-13 扬中市锋利研磨材料有限公司 The compound vulcan fibre of glass fibre

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008254149A (en) * 2007-04-09 2008-10-23 Sumitomo Bakelite Co Ltd Laminated plate for holding polishing object and holding member of polishing object
CN107900923A (en) * 2017-12-28 2018-04-13 扬中市锋利研磨材料有限公司 The compound vulcan fibre of glass fibre

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