JP2006227207A - Double-face exposure apparatus - Google Patents

Double-face exposure apparatus Download PDF

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JP2006227207A
JP2006227207A JP2005039635A JP2005039635A JP2006227207A JP 2006227207 A JP2006227207 A JP 2006227207A JP 2005039635 A JP2005039635 A JP 2005039635A JP 2005039635 A JP2005039635 A JP 2005039635A JP 2006227207 A JP2006227207 A JP 2006227207A
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exposure
workpiece
belt
mask
unit
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JP4364139B2 (en
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Masahiko Oshimo
征彦 大霜
Toshihiko Kurimasa
利彦 栗政
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a double-face exposure apparatus capable of forming exposure patterns with high quality on both surfaces of a belt-like work in an apparatus configuration with a relatively saved space. <P>SOLUTION: The apparatus is equipped with a first intermittent conveying mechanism 37L to intermittently convey a belt-like work W in a vertical direction, a first exposure unit 3L to perform proximity exposure on the top exposure surface of the belt-like work W conveyed by the first intermittent conveying mechanism 37L, a second intermittent conveying mechanism 37R to intermittently convey the belt-like work W exposed by the first exposure unit 3L in a vertical direction, and a second exposure unit 3R to perform proximity exposure on the rear surface of the belt-like work W conveyed by the second intermittent conveying mechanism 37R, wherein the first exposure unit 3L and the second exposure unit 3R are installed upright opposing to each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は両面露光装置に関する。より詳しくは、表裏両面に回路パターンを備える両面フィルム回路基板の生産に好適な両面露光装置に関する。   The present invention relates to a double-side exposure apparatus. More specifically, the present invention relates to a double-sided exposure apparatus suitable for production of a double-sided film circuit board having circuit patterns on both sides.

半導体素子の実装技術の分野では、従来のワイヤーボンディングに代わり、ワイヤレスボンディングによる実装が盛んになってきている。ワイヤレスボンディングの一つとして、フィルムキャリア方式による実装がある。フィルムキャリア方式による半導体素子の実装とは、絶縁フィルム基板上に回路パターンを形成したフィルム回路基板を製造し、この回路パターンの上に、半導体素子を一括ボンディングする実装方式である。フィルム回路基板は、一般には、銅剥等の導電体を貼り付けた帯状ワークに対して、レジスト塗布工程、パターン転写のための露光工程、現像工程、エッチング工程等を経ることにより形成される。最近ではフィルム基板の両面を有効利用するために、表裏両面に回路パターンを備える両面フィルム回路基板が盛んに生産されている。このため、フィルム基板の表裏両面に回路パターンを生産効率良く形成することのできる装置が要望されている。   In the field of semiconductor element mounting technology, mounting by wireless bonding has become popular in place of conventional wire bonding. As one of wireless bonding, there is a film carrier type mounting. The mounting of a semiconductor element by the film carrier method is a mounting method in which a film circuit board in which a circuit pattern is formed on an insulating film substrate is manufactured, and semiconductor elements are collectively bonded on the circuit pattern. In general, a film circuit board is formed by performing a resist coating process, an exposure process for pattern transfer, a development process, an etching process, and the like on a strip-shaped work on which a conductor such as copper is attached. Recently, in order to make effective use of both sides of a film substrate, double-sided film circuit boards having circuit patterns on both front and back sides are actively produced. For this reason, there is a demand for an apparatus that can form circuit patterns on the front and back surfaces of a film substrate with high production efficiency.

従来、基板の表裏両面に露光を行う装置として、例えば特許文献１に記載の露光装置が提案されている。この露光装置は、パターンが形成された露光マスクとワーク面とを直接密着させて露光を行う密着式の両面露光装置である。この露光装置によると、露光マスクとワーク面とが直接密着することにより、露光用光の回折現象が最小となり、また、ワークに対する光線の直角度が悪い場合でも良い結果を与えるので、解像度に対して望ましい方式と言える。そこで、フィルム基板の両面露光にこの密着式両面露光装置を適用することが考えられる。   Conventionally, for example, an exposure apparatus described in Patent Document 1 has been proposed as an apparatus that exposes both front and back surfaces of a substrate. This exposure apparatus is a contact-type double-side exposure apparatus that performs exposure by directly contacting an exposure mask on which a pattern is formed and a work surface. According to this exposure apparatus, since the exposure mask and the work surface are in direct contact with each other, the diffraction phenomenon of the exposure light is minimized, and a good result is obtained even when the perpendicularity of the light beam with respect to the work is bad. This is a desirable method. Therefore, it is conceivable to apply this contact type double-sided exposure apparatus to double-sided exposure of a film substrate.

特開２０００−２７５８６２号公報JP 2000-275862 A

しかしながら、上述の密着式両面露光装置では、露光マスクがワーク面に直接密着することにより、露光マスクの表面に損傷を生じたり異物が付着したりすることが多く、露光マスクの寿命が短い。また、プリント配線板の回路パターンが細密なものであり且つワークにゴミが付着していた場合、露光マスクに転写されたゴミにより回路が連続的に断線するなどの問題がある。   However, in the above-described contact-type double-side exposure apparatus, the exposure mask is in direct contact with the work surface, so that the surface of the exposure mask is often damaged or foreign matter adheres, and the life of the exposure mask is short. Further, when the circuit pattern of the printed wiring board is fine and dust is attached to the work, there is a problem that the circuit is continuously disconnected by dust transferred to the exposure mask.

また、フィルム基板の製造には、一般には上述したように帯状ワークを用いており、帯状ワーク用の露光装置は、帯状ワークを一定長さずつ巻き出すための巻出し装置や、巻き取るための巻取り装置などを露光部の両側に設置する必要があるため、上述したような両面露光装置をそのまま利用したのでは、広いスペースが必要となるという問題がある。   In addition, as described above, a strip-shaped workpiece is generally used for manufacturing a film substrate, and an exposure apparatus for the strip-shaped workpiece is an unwinding device for unwinding the strip-shaped workpiece by a certain length, Since it is necessary to install a winding device or the like on both sides of the exposure unit, if the double-sided exposure device as described above is used as it is, there is a problem that a large space is required.

本発明は、このような問題に鑑みてなされたものであり、帯状ワークの表裏両面に品質の良い露光パターンを比較的省スペースの装置構成で形成することができる両面露光装置を提供することを目的とする。   The present invention has been made in view of such problems, and provides a double-sided exposure apparatus capable of forming a high-quality exposure pattern on both the front and back sides of a belt-like workpiece with a relatively space-saving apparatus configuration. Objective.

上述の課題を解決するために、請求項１の発明は、帯状ワークＷを間歇的に垂直方向に搬送する第１間歇搬送機構３７Ｌと、第１間歇搬送機構３７Ｌにより搬送された帯状ワークＷの表側露光面にプロキシミティ露光を行う第１露光部３Ｌと、第１露光部３Ｌにより露光された帯状ワークＷを垂直方向に間歇的に搬送する第２間歇搬送機構３７Ｒと、第２間歇搬送機構３７Ｒにより搬送された帯状ワークＷの裏側露光面にプロキシミティ露光を行う第２露光部３Ｒとを備え、第１露光部３Ｌと第２露光部３Ｒとが互いに対向して垂直に立設していることを特徴とする。   In order to solve the above-described problem, the invention of claim 1 is directed to a first intermittent conveyance mechanism 37L that intermittently conveys the belt-like workpiece W in the vertical direction, and a belt-like workpiece W conveyed by the first intermittent conveyance mechanism 37L. A first exposure unit 3L that performs proximity exposure on the front-side exposure surface, a second intermittent conveyance mechanism 37R that intermittently conveys the strip-shaped workpiece W exposed by the first exposure unit 3L in the vertical direction, and a second intermittent conveyance mechanism A second exposure unit 3R that performs proximity exposure on the back side exposure surface of the belt-like workpiece W conveyed by 37R, and the first exposure unit 3L and the second exposure unit 3R are vertically opposed to each other. It is characterized by being.

請求項２の発明では、第１露光部３Ｌは、帯状ワークＷの表側露光面に対する第１露光パターンが形成された第１露光マスク３４Ｌと、第１露光マスク３４Ｌと帯状ワークＷの表側露光面とが所定のプロキシミティギャップを介して対向するように第１露光マスク３４Ｌを保持する第１露光マスクホルダ３３Ｌと、帯状ワークＷの裏側露光面を保持する第１保持ステージ３２Ｌと、露光用光を第１露光マスク３４Ｌに導くための第１光学系ＬＬとを備え、第２露光部３Ｒは、帯状ワークＷの裏側露光面に対する第２露光パターンが形成された第２露光マスク３４Ｒと、第２露光マスク３４Ｒと帯状ワークＷの裏側露光面とが所定のプロキシミティギャップを介して対向するように第２露光マスク３４Ｒを保持する第２露光マスクホルダ３３Ｒと、帯状ワークＷの表側露光面を保持する第２保持ステージ３２Ｒと、露光用光を第２露光マスク３４Ｒに導くための第２光学系ＬＲとを備えてなる。   In the invention of claim 2, the first exposure unit 3L includes the first exposure mask 34L on which the first exposure pattern is formed with respect to the front side exposure surface of the strip-shaped workpiece W, and the front side exposure surface of the first exposure mask 34L and the strip-shaped workpiece W. , A first exposure mask holder 33L that holds the first exposure mask 34L so as to face each other through a predetermined proximity gap, a first holding stage 32L that holds the back side exposure surface of the strip-shaped workpiece W, and exposure light And a first optical system LL for guiding the first exposure mask 34L to the first exposure mask 34L. The second exposure unit 3R includes a second exposure mask 34R on which a second exposure pattern is formed on the back side exposure surface of the strip-shaped workpiece W, and a second exposure mask 34R. 2nd exposure mask holder 33R which holds 2nd exposure mask 34R so that 2 exposure mask 34R and the back side exposure surface of strip shaped work W may oppose via a predetermined proximity gap. Becomes provided with a second holding stage 32R for holding the front exposed surface of the strip-shaped workpiece is W, the second optical system LR for guiding the exposure light in the second exposure mask 34R.

請求項３の発明では、第１露光部３Ｌは、第１露光マスク３４Ｌに形成されたマークと帯状ワークＷに形成されたマークとの位置誤差を観測する第１観測手段３８Ｌと、この位置誤差に基づいて第１露光マスク３４Ｌと帯状ワークＷとの相対位置の補正を行う第１位置補正手段３５Ｌとを備え、第２露光部３Ｒは、第２露光マスク３４Ｒに形成されたマークと帯状ワークＷに形成されたマークとの位置誤差を観測する第２観測手段３８Ｒと、この位置誤差に基づいて第２露光マスク３４Ｒと帯状ワークＷとの相対位置の補正を行う第２位置補正手段３５Ｒとを備えてなる。   In the invention of claim 3, the first exposure unit 3L includes first observation means 38L for observing the position error between the mark formed on the first exposure mask 34L and the mark formed on the strip-shaped workpiece W, and the position error. And a first position correction means 35L for correcting the relative position between the first exposure mask 34L and the strip-shaped workpiece W, and the second exposure unit 3R includes the mark formed on the second exposure mask 34R and the strip-shaped workpiece. Second observation means 38R for observing a position error with respect to the mark formed on W, and second position correction means 35R for correcting the relative position between the second exposure mask 34R and the strip-shaped workpiece W based on this position error; It is equipped with.

請求項４の発明では、第１露光マスクホルダ３３Ｌと第１保持ステージ３２Ｌとを水平方向に相対的に移動させる第１駆動手段３９Ｌと、第２露光マスクホルダ３３Ｒと第２保持ステージ３２Ｒとを水平方向に相対的に移動させる第２駆動手段３９Ｒとを備えてなる。   In the invention of claim 4, the first driving means 39L for relatively moving the first exposure mask holder 33L and the first holding stage 32L in the horizontal direction, the second exposure mask holder 33R and the second holding stage 32R. And second driving means 39R for relatively moving in the horizontal direction.

本発明によると、第１露光部３Ｌ及び第２露光部３Ｒにおいて、帯状ワークＷと露光マスク３４とを密着させることなくプロキシミティ露光を行うので、露光マスク３４の寿命が長く、しかも露光マスク３４に転写されたゴミにより回路が連続的に断線するなどの問題がない。また、第１露光部３Ｌと第２露光部３Ｒとは、互いに対向して垂直に立設しており、これにより、各露光部３Ｌ，３Ｒにおいて帯状ワークＷを垂直方向に移動させることができ、各露光部で帯状ワークＷを水平方向に移動させる型とした場合に比べて省スペース化を図ることができる。また、第１露光マスクホルダ３３Ｌと第２露光マスクホルダ３３Ｒとが垂直に立設することにより、各露光マスクホルダ３３Ｌ，３３Ｒを水平配置した場合に生じる撓みの影響が軽減され、プロキシミティギャップを精度良く維持することができる。また、第１露光部３Ｌと第２露光部３Ｒとにおいて帯状ワークＷにゴミや埃が付着しにくい。このように、帯状ワークの表裏両面に品質の良い露光パターンを比較的省スペースの装置構成で形成することができる両面露光装置が提供される。   According to the present invention, the proximity exposure is performed in the first exposure unit 3L and the second exposure unit 3R without bringing the strip-shaped workpiece W and the exposure mask 34 into close contact with each other. There is no problem such as continuous disconnection of the circuit due to dust transferred to the substrate. Further, the first exposure unit 3L and the second exposure unit 3R are erected vertically so as to be opposed to each other, so that the belt-like workpiece W can be moved in the vertical direction in each of the exposure units 3L and 3R. The space can be saved as compared with the case where the belt-like workpiece W is moved in the horizontal direction in each exposure unit. In addition, since the first exposure mask holder 33L and the second exposure mask holder 33R are erected vertically, the influence of bending that occurs when the exposure mask holders 33L and 33R are horizontally arranged is reduced, and the proximity gap is increased. It can be maintained with high accuracy. In addition, dust and dust hardly adhere to the strip-shaped workpiece W in the first exposure unit 3L and the second exposure unit 3R. Thus, there is provided a double-sided exposure apparatus that can form high-quality exposure patterns on both the front and back sides of a belt-like workpiece with a relatively space-saving apparatus configuration.

以下、添付図面を用いて、本発明を実施するための最良の形態について説明する。   The best mode for carrying out the present invention will be described below with reference to the accompanying drawings.

図１は本発明に係る両面露光装置ＥＰの正面概略図、図２は両面露光装置ＥＰの平面概略図、図３は第１露光部３Ｌの詳細図、図４は第２露光部３Ｒの詳細図、図５は照明部８の詳細図である。   1 is a schematic front view of a double-sided exposure apparatus EP according to the present invention, FIG. 2 is a schematic plan view of a double-sided exposure apparatus EP, FIG. 3 is a detailed view of a first exposure unit 3L, and FIG. 4 is a detailed view of a second exposure unit 3R. FIG. 5 and FIG. 5 are detailed views of the illumination unit 8.

図１及び図２に示すように、両面露光装置ＥＰは、送り出し機構部１Ｌ、第１エアダンサー部２Ｌ、第１露光部３Ｌ、第２エアダンサー部４Ｌ、第２露光部３Ｒ、第３エアダンサー部４Ｒ及び巻き取り機構部１Ｒ及び照明部８から構成される。   As shown in FIGS. 1 and 2, the double-side exposure apparatus EP includes a delivery mechanism 1L, a first air dancer 2L, a first exposure 3L, a second air dancer 4L, a second exposure 3R, and a third air. It consists of a dancer unit 4R, a winding mechanism unit 1R, and an illumination unit 8.

送り出し機構部１Ｌは、露光すべき帯状ワークＷを巻き出す送り出しリール１１Ｌを取り付け得るように構成される。   The delivery mechanism 1L is configured so that a delivery reel 11L for unwinding the belt-like workpiece W to be exposed can be attached.

第１エアダンサー部２Ｌは、入口部にガイドプレート２１Ｌを有し、下部は真空機構（図示せず）に接続され、帯状ワークＷをループ状にして一定量貯留するように構成される。また、出口部側には第１上流移動グリップフィード部２２Ｌが設けられる。また、出口部側上方にクリーニングロール２３を有し、帯状ワークＷに付着したゴミが次工程である第１露光部３Ｌに持ち込まれないよう除去する。   The first air dancer portion 2L has a guide plate 21L at the inlet portion, and a lower portion is connected to a vacuum mechanism (not shown), and is configured to store a certain amount of the belt-like workpiece W in a loop shape. In addition, a first upstream movement grip feed portion 22L is provided on the outlet side. In addition, the cleaning roller 23 is provided above the exit side, and dust attached to the strip-shaped workpiece W is removed so as not to be brought into the first exposure unit 3L which is the next process.

第１露光部３Ｌは、図３に示すように、ベース枠体９Ｌ、スライド機構３９Ｌ、アライメントテーブルＡＬ、第１露光マスクホルダ３３Ｌ、第１露光マスク３４Ｌ、ワーク／マスク・アライメント用ＸＹθ駆動機構３５Ｌ、第１吸着ステージ３２Ｌ、ワーク／マスク・アライメント用光学系３８Ｌ及び第１ミラーＬＬを有する。   As shown in FIG. 3, the first exposure unit 3L includes a base frame 9L, a slide mechanism 39L, an alignment table AL, a first exposure mask holder 33L, a first exposure mask 34L, and a work / mask alignment XYθ drive mechanism 35L. , A first suction stage 32L, a workpiece / mask alignment optical system 38L, and a first mirror LL.

第１露光マスクホルダ３３Ｌは、ワーク／マスク・アライメント用ＸＹθ駆動機構３５Ｌが設けられたアライメントテーブルＡＬに取り付けられ、スライド機構３９Ｌによって水平方向Ｘに駆動可能とされる。第１露光マスクホルダ３３Ｌは、第１露光マスク３４Ｌと帯状ワークＷの表側露光面とが所定のプロキシミティギャップを介して対向するように第１露光マスク３４Ｌを保持可能とされる。第１露光マスク３４Ｌには、帯状ワークＷの表側露光面に対する第１露光パターンが形成されると共に、位置合わせ用のマークが形成される。   The first exposure mask holder 33L is attached to an alignment table AL provided with a workpiece / mask alignment XYθ drive mechanism 35L, and can be driven in the horizontal direction X by a slide mechanism 39L. The first exposure mask holder 33L can hold the first exposure mask 34L so that the first exposure mask 34L and the front-side exposure surface of the strip-shaped workpiece W face each other with a predetermined proximity gap. On the first exposure mask 34L, a first exposure pattern for the front-side exposure surface of the strip-shaped workpiece W is formed, and an alignment mark is formed.

第１吸着ステージ３２Ｌは、真空ポンプ等に接続した焼結体からなり、搬送された帯状ワークＷを吸着保持可能とされる。なお、第１吸着ステージ３２Ｌにおいて、帯状ワークＷのマークが位置する部分には、ワーク／マスク・アライメント用光学系３８Ｌによる観測を可能とするための貫通穴ＨＬが穿設される。第１ミラーＬＬは、露光用光を第１露光マスク３４Ｌに導くように配設される。   The first suction stage 32L is formed of a sintered body connected to a vacuum pump or the like, and can suck and hold the conveyed belt-like workpiece W. In the first suction stage 32L, a through hole HL for enabling observation by the work / mask alignment optical system 38L is formed in a portion where the mark of the belt-like workpiece W is located. The first mirror LL is arranged to guide the exposure light to the first exposure mask 34L.

ワーク／マスク・アライメント用光学系３８Ｌは、画像データを出力可能な２次元カメラ等の撮像手段からなり、第１露光マスク３４Ｌに形成されたマークと帯状ワークＷに形成されたマークとの位置誤差を観測可能に、スライド自在に設けられたブラケット３６を介してベース枠体９Ｌに取り付けられる。ワーク／マスク・アライメント用ＸＹθ駆動機構３５Ｌは、Ｘ，Ｙ，θの各軸方向に駆動可能なサーボモータなどからなり、ワーク／マスク・アライメント用光学系３８Ｌから送られた位置誤差信号に基づいて第１露光マスクホルダ３３Ｌを補正駆動する。スライド機構３９Ｌは、第１露光マスクホルダ３３Ｌと第１吸着ステージ３２Ｌとを水平方向に相対的に移動可能とする。   The workpiece / mask alignment optical system 38L includes imaging means such as a two-dimensional camera that can output image data, and a positional error between the mark formed on the first exposure mask 34L and the mark formed on the strip-shaped workpiece W. Is attached to the base frame 9L via a bracket 36 slidably provided. The workpiece / mask alignment XYθ drive mechanism 35L is composed of a servo motor that can be driven in the X, Y, and θ axial directions, and is based on the position error signal sent from the workpiece / mask alignment optical system 38L. The first exposure mask holder 33L is driven for correction. The slide mechanism 39L can relatively move the first exposure mask holder 33L and the first suction stage 32L in the horizontal direction.

第２露光部３Ｒは、図４に示すように、第１露光部３Ｌと対照的に、ベース枠体９Ｒ、スライド機構３９Ｒ、アライメントテーブルＡＲ、第２マスクホルダ３３Ｒ、第２露光マスク３４Ｒ、ワーク／マスク・アライメント用ＸＹθ駆動機構３５Ｒ、第２吸着ステージ３２Ｒ、ワーク／マスク・アライメント用光学系３８Ｒ及び第２ミラーＬＲを有する。これら各構成部の詳細は、第１露光部３Ｌのものと同様であるためそれらの説明を省略する。第１露光部３Ｌと第２露光部３Ｒとは、互いに対向して垂直に立設している。   As shown in FIG. 4, the second exposure unit 3R, in contrast to the first exposure unit 3L, includes a base frame 9R, a slide mechanism 39R, an alignment table AR, a second mask holder 33R, a second exposure mask 34R, a workpiece / Machin alignment XYθ drive mechanism 35R, second suction stage 32R, workpiece / mask alignment optical system 38R, and second mirror LR. Since the details of these components are the same as those of the first exposure unit 3L, description thereof is omitted. The first exposure unit 3L and the second exposure unit 3R are erected vertically so as to face each other.

照明部８は、図２，５に示すように、ランプハウス８０及びこれに接続する冷却ユニット８１を備える。ランプハウス８０には、露光照明ランプ８１１、楕円ミラー８２１、コールドミラー８３１、反射ミラー８４１、第１露光部インテグレータ８５１及び第２露光部インテグレータ８５２が配設される。反射ミラー８４１は、直線Ｌ１方向にスライドすることにより第１位置Ｐ１と第２位置Ｐ２とに切り替えて配置可能に設けられる。なお、第１位置Ｐ１は、露光照明ランプ８１１による露光用光の光路から反射ミラー８４１が退避する位置であり、露光用光を第１ミラーＬＬに導く位置である。第２位置Ｐ２は、露光照明ランプ８１１による露光用光の光路内に反射ミラー８４１が入って、露光用光を第２ミラーＬＲに導く位置である。なお、この反対に、反射ミラー８４１が退避したときに、露光用光を第２ミラーＬＲに導くような配置とすることも可能である。   As shown in FIGS. 2 and 5, the illumination unit 8 includes a lamp house 80 and a cooling unit 81 connected to the lamp house 80. In the lamp house 80, an exposure illumination lamp 811, an elliptical mirror 821, a cold mirror 831, a reflection mirror 841, a first exposure unit integrator 851, and a second exposure unit integrator 852 are disposed. The reflection mirror 841 is provided so as to be switched between the first position P1 and the second position P2 by sliding in the direction of the straight line L1. The first position P1 is a position where the reflection mirror 841 is retracted from the optical path of the exposure light by the exposure illumination lamp 811, and is a position where the exposure light is guided to the first mirror LL. The second position P2 is a position where the reflection mirror 841 enters the optical path of the exposure light by the exposure illumination lamp 811 and guides the exposure light to the second mirror LR. On the other hand, it is possible to arrange such that the exposure light is guided to the second mirror LR when the reflection mirror 841 is retracted.

図１に戻って、第２エアダンサー部４Ｌは、出口部にガイドプレート４１Ｌを有し、下部は真空機構（図示せず）に接続されており、露光後の帯状ワークＷをループ状にして一定量貯留するように構成されている。また、入口部側には、第１下流移動グリップフィード部３７Ｌが設けられている。また、第２エアダンサー部４Ｌは、帯状ワークＷの送り量が変更しても、第１露光部３Ｌと第２露光部３Ｒのそれぞれ露光したい位置があうような貯蓄スペースも設けている。   Returning to FIG. 1, the second air dancer 4L has a guide plate 41L at the outlet, and the lower part is connected to a vacuum mechanism (not shown), and the strip-shaped workpiece W after exposure is looped. It is configured to store a certain amount. A first downstream movement grip feed portion 37L is provided on the inlet side. Further, the second air dancer unit 4L also has a storage space where the positions of the first exposure unit 3L and the second exposure unit 3R to be exposed to each other even if the feed amount of the belt-like workpiece W is changed.

以上のように構成された両面露光装置ＥＰにおいて、帯状ワークＷの両面露光処理は次のように行われる。まず、送り出し機構部１Ｌの送り出しリール１１Ｌから巻き出された帯状ワークＷは、第１上流移動グリップフィード部２２Ｌと第１下流移動グリップフィード部３７Ｌにより、その露光すべき箇所が第１露光部３Ｌに搬送される。その際、帯状ワークＷの一定量が第１エアーダンサー部２Ｌと第２エアーダンサー部４Ｌにそれぞれ貯留される。次に、第１露光部３Ｌから送り出された帯状ワークＷは第２上流移動グリップフィード部３７Ｍと第２下流移動グリップフィード部３７Ｒにより、その露光すべき箇所が第２露光部３Ｒに搬送される。   In the double-sided exposure apparatus EP configured as described above, the double-sided exposure processing of the belt-like workpiece W is performed as follows. First, the strip-shaped workpiece W unwound from the delivery reel 11L of the delivery mechanism 1L is exposed to the first exposure unit 3L by the first upstream movement grip feed unit 22L and the first downstream movement grip feed unit 37L. It is conveyed to. At that time, a certain amount of the strip-shaped workpiece W is stored in the first air dancer unit 2L and the second air dancer unit 4L, respectively. Next, the belt-like workpiece W sent out from the first exposure unit 3L is transported to the second exposure unit 3R at a position to be exposed by the second upstream movement grip feed unit 37M and the second downstream movement grip feed unit 37R. .

ここで、帯状ワークＷと第１露光マスク３４Ｌとの位置合わせは次のようにして行われる。   Here, alignment between the belt-like workpiece W and the first exposure mask 34L is performed as follows.

すなわち、第１露光部３Ｌにおいて、その露光すべき箇所が第１吸着ステージ３２Ｌに搬送された際、まず帯状ワークＷを第１吸着ステージ３２Ｌに吸着し、帯状ワークＷに形成されたマークをワーク／マスク・アライメント用光学系３８Ｌにより観測する。続いて、予め現在位置を認識している第１露光マスク３４Ｌにおけるマークが、帯状ワークＷにおけるマークの位置にくるように、ワーク／マスク・アライメント用ＸＹθ駆動機構３５ＬによりアライメントテーブルＡＬを移動させる。続いて、帯状ワークＷにおけるマークと第１露光マスク３４Ｌにおけるマークとの位置のズレ量を再度観測し、ズレ量が許容範囲内にある場合は以下に示す要領で露光を行い、許容範囲内にない場合は再度アライメントテーブルＡＬにより補正をかける。   That is, in the first exposure unit 3L, when the portion to be exposed is transported to the first suction stage 32L, the belt-like workpiece W is first sucked to the first suction stage 32L, and the mark formed on the belt-like workpiece W is marked with the workpiece. / Observe with mask alignment optical system 38L. Subsequently, the alignment table AL is moved by the XYθ drive mechanism 35L for work / mask alignment so that the mark on the first exposure mask 34L whose current position is recognized in advance is positioned at the mark position on the strip-shaped work W. Subsequently, the amount of deviation between the mark on the belt-like workpiece W and the mark on the first exposure mask 34L is observed again. If the amount of deviation is within the allowable range, exposure is performed in the following manner, and within the allowable range. If not, correction is performed again using the alignment table AL.

このような位置合わせ終了後、スライド機構３９Ｌにより、第１露光マスクホルダ３３Ｌを水平方向Ｘ１に駆動して、第１露光マスク３４Ｌと帯状ワークＷの表側露光面とのプロキシミティギャップを調整する。そして露光照明ランプ８１１からの露光用光より露光を行う。すなわち、反射ミラー８４１を第１位置Ｐ１に配置することにより、露光照明ランプ８１１の露光用光は、図２，５における二点鎖線で示す光路を経て第１露光マスク３４Ｌの第１パターンを通過する。これにより帯状ワークＷの表側露光面を露光する。露光が終了すると帯状ワークＷは、間歇的に１ピッチ送り出されて隣の表側露光面を露光する。   After such alignment, the first exposure mask holder 33L is driven in the horizontal direction X1 by the slide mechanism 39L to adjust the proximity gap between the first exposure mask 34L and the front-side exposure surface of the strip-shaped workpiece W. Then, exposure is performed using exposure light from the exposure illumination lamp 811. That is, by arranging the reflecting mirror 841 at the first position P1, the exposure light of the exposure illumination lamp 811 passes through the first pattern of the first exposure mask 34L via the optical path indicated by the two-dot chain line in FIGS. To do. Thereby, the front side exposure surface of the strip-shaped workpiece W is exposed. When the exposure is completed, the belt-like workpiece W is intermittently fed by one pitch to expose the adjacent front exposure surface.

上述の露光動作を順次行い、表側露光のされた露光箇所が、第２エアダンサー部４Ｌ、第２上流移動グリップフィード部３７Ｍ及び第２下流移動グリップフィード部３７Ｒを通り、第２露光部３Ｒの第２吸着ステージ３２Ｒに到達したときに、該露光箇所の裏側露光面への露光処理が開始する。   The above-described exposure operation is sequentially performed, and the exposed portion subjected to the front side exposure passes through the second air dancer unit 4L, the second upstream movement grip feed unit 37M, and the second downstream movement grip feed unit 37R, and passes through the second exposure unit 3R. When the second suction stage 32R is reached, the exposure processing for the backside exposure surface of the exposure location starts.

すなわち、第１露光部３Ｌの場合と同様に、第２露光部３Ｒにおいて、その露光すべき箇所が第２吸着ステージ３２Ｒに搬送された際、まず帯状ワークＷを第２吸着ステージ３２Ｒに吸着し、帯状ワークＷに形成されたマークをワーク／マスク・アライメント用光学系３８Ｒにより観測する。続いて、予め現在位置を認識している第２露光マスク３４Ｒにおけるマークが、帯状ワークＷにおけるマークの位置にくるように、ワーク／マスク・アライメント用ＸＹθ駆動機構３５ＲによりアライメントテーブルＡＲを移動させる。続いて、帯状ワークＷにおけるマークと第２露光マスク３４Ｒにおけるマークとの位置のズレ量を再度観測し、ズレ量が許容範囲内にある場合は以下に示す要領で露光を行い、許容範囲内にない場合は再度アライメントテーブルＡＲにより補正をかける。   That is, as in the case of the first exposure unit 3L, in the second exposure unit 3R, when the portion to be exposed is transported to the second suction stage 32R, the belt-like workpiece W is first suctioned to the second suction stage 32R. The marks formed on the belt-like workpiece W are observed by the workpiece / mask alignment optical system 38R. Subsequently, the alignment table AR is moved by the XYθ drive mechanism 35R for work / mask alignment so that the mark on the second exposure mask 34R whose current position is recognized in advance comes to the position of the mark on the strip-shaped work W. Subsequently, the amount of misalignment between the mark on the belt-like workpiece W and the mark on the second exposure mask 34R is observed again. If the amount of misalignment is within the allowable range, exposure is performed in the following manner, and within the allowable range. If not, correction is performed again using the alignment table AR.

このような位置合わせ終了後、スライド機構３９Ｒにより、第２露光マスクホルダ３３Ｒを水平方向Ｘ２に駆動して、第２露光マスク３４Ｒと帯状ワークＷの裏側露光面とのプロキシミティギャップを調整する。そして露光照明ランプ８１１からの露光用光より露光を行う。すなわち、反射ミラー８４１を第２位置Ｐ２に配置することにより、露光照明ランプ８１１の露光用光は、図２，５における三点鎖線の光路を経て第２露光マスク３４Ｒの第２パターンを通過する。これにより帯状ワークＷの表側露光面を露光する。   After such alignment, the second exposure mask holder 33R is driven in the horizontal direction X2 by the slide mechanism 39R to adjust the proximity gap between the second exposure mask 34R and the back side exposure surface of the strip-shaped workpiece W. Then, exposure is performed using exposure light from the exposure illumination lamp 811. That is, by disposing the reflecting mirror 841 at the second position P2, the exposure light from the exposure illumination lamp 811 passes through the second pattern of the second exposure mask 34R through the optical path of the three-dot chain line in FIGS. . Thereby, the front side exposure surface of the strip-shaped workpiece W is exposed.

このようにして、表裏の両面露光が行われた帯状ワークＷは第３アーダンサー部４Ｒを経て、巻き取り機構部１Ｒの巻き取りリール１１Ｒに巻き上げられる。   In this way, the belt-like workpiece W subjected to the front and back double-side exposure is wound up on the take-up reel 11R of the take-up mechanism portion 1R through the third erdancer portion 4R.

両面露光装置ＥＰによると、第１露光マスクホルダ３３Ｌは、帯状ワークＷの表側露光面と第１露光マスク３４Ｌとが所定のプロキシミティギャップを介して対向するように第１露光マスク３４Ｌを保持し、この状態で帯状ワークＷの表側露光面の露光を行う。また、第２露光マスクホルダ３３Ｒも同様に、帯状ワークＷの裏側露光面と第２露光マスク３４Ｒとが所定のプロキシミティギャップを介して対向するように第２露光マスク３４Ｒを保持し、この状態で帯状ワークＷの裏側露光面の露光を行う。つまり、帯状ワークＷと露光マスク３４とを密着させることなく露光を行うので、露光マスク３４の寿命が長く、しかも露光マスク３４に転写されたゴミにより回路が連続的に断線するなどの問題がない。   According to the double-sided exposure apparatus EP, the first exposure mask holder 33L holds the first exposure mask 34L so that the front-side exposure surface of the strip-shaped workpiece W and the first exposure mask 34L face each other with a predetermined proximity gap. In this state, the front side exposure surface of the belt-like workpiece W is exposed. Similarly, the second exposure mask holder 33R holds the second exposure mask 34R so that the back exposure surface of the strip-shaped workpiece W and the second exposure mask 34R face each other with a predetermined proximity gap. The exposure of the back side exposure surface of the strip-shaped workpiece W is performed with That is, since the exposure is performed without bringing the belt-like workpiece W and the exposure mask 34 into close contact with each other, there is no problem that the life of the exposure mask 34 is long and the circuit is continuously disconnected by dust transferred to the exposure mask 34. .

また、第１露光部３Ｌと第２露光部３Ｒとは、互いに対向して垂直に立設しており、これにより、各露光部３Ｌ，３Ｒにおいて帯状ワークＷを垂直方向に移動させることができ、各露光部で帯状ワークＷを水平方向に移動させる型とした場合に比べて省スペース化を図ることができる。また、第１露光マスクホルダ３３Ｌと第２露光マスクホルダ３３Ｒとが垂直に立設することにより、各露光マスクホルダ３３Ｌ，３３Ｒを水平配置した場合に生じる撓みの影響が軽減され、プロキシミティギャップを精度良く維持することができる。また、第１露光部３Ｌと第２露光部３Ｒとにおいて帯状ワークＷにゴミや埃が付着しにくい。このように、帯状ワークの表裏両面に品質の良い露光パターンを比較的省スペースの装置構成で形成することができる両面露光装置が提供される。   Further, the first exposure unit 3L and the second exposure unit 3R are erected vertically so as to be opposed to each other, so that the belt-like workpiece W can be moved in the vertical direction in each of the exposure units 3L and 3R. The space can be saved as compared with the case where the belt-like workpiece W is moved in the horizontal direction in each exposure unit. In addition, since the first exposure mask holder 33L and the second exposure mask holder 33R are erected vertically, the influence of bending that occurs when the exposure mask holders 33L and 33R are horizontally arranged is reduced, and the proximity gap is increased. It can be maintained with high accuracy. In addition, dust and dust hardly adhere to the strip-shaped workpiece W in the first exposure unit 3L and the second exposure unit 3R. Thus, there is provided a double-sided exposure apparatus that can form high-quality exposure patterns on both the front and back sides of a belt-like workpiece with a relatively space-saving apparatus configuration.

以上、本発明の実施の形態について説明を行ったが、上に開示した実施の形態は、あくまで例示であって、本発明の範囲はこれら実施の形態に限定されるものではない。本発明の範囲は、特許請求の範囲の記載によって示され、更に特許請求の範囲と均等の意味及び範囲内でのすべての変更を含むことが意図される。   As mentioned above, although embodiment of this invention was described, embodiment disclosed above is an illustration to the last, Comprising: The scope of the present invention is not limited to these embodiment. The scope of the present invention is defined by the terms of the claims, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

本発明に係る両面露光装置の正面概略図である。1 is a schematic front view of a double-sided exposure apparatus according to the present invention. 両面露光装置の平面概略図である。It is a plane schematic diagram of a double-sided exposure apparatus. 第１露光部の詳細図である。It is detail drawing of a 1st exposure part. 第２露光部の詳細図である。It is detail drawing of a 2nd exposure part. 照明部の詳細図である。It is detail drawing of an illumination part.

符号の説明Explanation of symbols

ＥＰ 両面露光装置
３Ｌ 第１露光部
３Ｒ 第２露光部
３２Ｌ 第１吸着ステージ（第１保持ステージ）
３２Ｒ 第２吸着ステージ（第２保持ステージ）
３３Ｌ 第１露光マスクホルダ
３３Ｒ 第２露光マスクホルダ
３４Ｌ 第１露光マスク
３４Ｒ 第２露光マスク
３５Ｌ ワーク／マスク・アライメント用ＸＹθ駆動機構（第１位置補正手段）
３５Ｒ ワーク／マスク・アライメント用ＸＹθ駆動機構（第２位置補正手段）
３７Ｌ 第１下流移動グリップフィード部（第１間歇搬送機構）
３７Ｒ 第２下流移動グリップフィード部（第２間歇搬送機構）
３８Ｌ ワーク／マスク・アライメント用光学系（第１観測手段）
３８Ｒ ワーク／マスク・アライメント用光学系（第２観測手段）
３９Ｌ スライド機構（第１駆動手段）
３９Ｒ スライド機構（第２駆動手段）
ＬＬ 第１ミラー（第１光学系）
ＬＲ 第２ミラー（第２光学系）
Ｗ 帯状ワーク EP double-side exposure apparatus 3L first exposure unit 3R second exposure unit 32L first suction stage (first holding stage)
32R second suction stage (second holding stage)
33L First exposure mask holder 33R Second exposure mask holder 34L First exposure mask 34R Second exposure mask 35L Work / mask alignment XYθ drive mechanism (first position correction means)
35R Work / mask alignment XYθ drive mechanism (second position correction means)
37L 1st downstream movement grip feed part (1st intermittent conveyance mechanism)
37R 2nd downstream movement grip feed part (2nd intermittent conveyance mechanism)
38L optical system for work / mask alignment (first observation means)
38R Work / mask alignment optical system (second observation means)
39L slide mechanism (first drive means)
39R slide mechanism (second drive means)
LL first mirror (first optical system)
LR Second mirror (second optical system)
W strip work

Claims (4)

帯状ワークを間歇的に垂直方向に搬送する第１間歇搬送機構と、第１間歇搬送機構により搬送された帯状ワークの表側露光面にプロキシミティ露光を行う第１露光部と、第１露光部により露光された帯状ワークを垂直方向に間歇的に搬送する第２間歇搬送機構と、第２間歇搬送機構により搬送された帯状ワークの裏側露光面にプロキシミティ露光を行う第２露光部とを備え、第１露光部と第２露光部とが互いに対向して垂直に立設していることを特徴とする帯状ワークの両面露光装置。   A first intermittent conveyance mechanism that intermittently conveys the belt-like workpiece in a vertical direction, a first exposure unit that performs proximity exposure on the front side exposure surface of the belt-like workpiece conveyed by the first intermittent conveyance mechanism, and a first exposure unit A second intermittent conveyance mechanism that intermittently conveys the exposed strip-shaped workpiece in the vertical direction; and a second exposure unit that performs proximity exposure on the back side exposure surface of the strip-shaped workpiece conveyed by the second intermittent conveyance mechanism, A double-sided exposure apparatus for a strip-shaped workpiece, wherein the first exposure unit and the second exposure unit are vertically arranged opposite to each other. 第１露光部は、帯状ワークの表側露光面に対する第１露光パターンが形成された第１露光マスクと、第１露光マスクと帯状ワークの表側露光面とが所定のプロキシミティギャップを介して対向するように第１露光マスクを保持する第１露光マスクホルダと、帯状ワークの裏側露光面を保持する第１保持ステージと、露光用光を第１露光マスクに導くための第１光学系とを備え、第２露光部は、帯状ワークの裏側露光面に対する第２露光パターンが形成された第２露光マスクと、第２露光マスクと帯状ワークの裏側露光面とが所定のプロキシミティギャップを介して対向するように第２露光マスクを保持する第２露光マスクホルダと、帯状ワークの表側露光面を保持する第２保持ステージと、露光用光を第２露光マスクに導くための第２光学系とを備えてなる請求項１記載の帯状ワークの両面露光装置。   In the first exposure unit, the first exposure mask on which the first exposure pattern is formed with respect to the front side exposure surface of the belt-like workpiece, and the first exposure mask and the front side exposure surface of the belt-like workpiece are opposed to each other with a predetermined proximity gap. A first exposure mask holder for holding the first exposure mask, a first holding stage for holding the back side exposure surface of the belt-like workpiece, and a first optical system for guiding the exposure light to the first exposure mask. The second exposure unit is configured such that the second exposure mask on which the second exposure pattern is formed with respect to the back side exposure surface of the belt-like workpiece, and the second exposure mask and the back side exposure surface of the belt-like workpiece are opposed to each other with a predetermined proximity gap. A second exposure mask holder for holding the second exposure mask, a second holding stage for holding the front side exposure surface of the belt-like workpiece, and a second optical system for guiding the exposure light to the second exposure mask Sided exposure apparatus of the belt-like work with composed claim 1, wherein the. 第１露光部は、第１露光マスクに形成されたマークと帯状ワークに形成されたマークとの位置誤差を観測する第１観測手段と、この位置誤差に基づいて第１露光マスクと帯状ワークとの相対位置の補正を行う第１位置補正手段と、第２露光部は、第２露光マスクに形成されたマークと帯状ワークに形成されたマークとの位置誤差を観測する第２観測手段と、この位置誤差に基づいて第２露光マスクと帯状ワークとの相対位置の補正を行う第２位置補正手段とを備えてなる請求項１または請求項２記載の帯状ワークの両面露光装置。   The first exposure unit includes first observation means for observing a position error between the mark formed on the first exposure mask and the mark formed on the band-shaped workpiece, and the first exposure mask and the band-shaped workpiece based on the position error. A first position correcting unit that corrects the relative position of the first exposure unit, a second exposure unit that observes a position error between the mark formed on the second exposure mask and the mark formed on the strip-shaped workpiece, 3. A double-sided exposure apparatus for a belt-like workpiece according to claim 1, further comprising second position correction means for correcting the relative position between the second exposure mask and the belt-like workpiece based on the position error. 第１露光マスクホルダと第１保持ステージとを水平方向に相対的に移動させる第１駆動手段と、第２露光マスクホルダと第２保持ステージとを水平方向に相対的に移動させる第２駆動手段とを備えてなる請求項１から請求項３のいずれかに記載の帯状ワークの両面露光装置。   First driving means for relatively moving the first exposure mask holder and the first holding stage in the horizontal direction, and second driving means for relatively moving the second exposure mask holder and the second holding stage in the horizontal direction A double-sided exposure apparatus for a strip-shaped workpiece according to any one of claims 1 to 3, comprising:
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301170A (en) * 2005-04-19 2006-11-02 Fujikura Ltd Exposing device and method therefor
JP2009276522A (en) * 2008-05-14 2009-11-26 Dainippon Screen Mfg Co Ltd Image recording device
JP2015034846A (en) * 2013-08-07 2015-02-19 株式会社清和光学製作所 Vertical type film exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301170A (en) * 2005-04-19 2006-11-02 Fujikura Ltd Exposing device and method therefor
JP2009276522A (en) * 2008-05-14 2009-11-26 Dainippon Screen Mfg Co Ltd Image recording device
JP2015034846A (en) * 2013-08-07 2015-02-19 株式会社清和光学製作所 Vertical type film exposure apparatus

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