JP2006167937A - Intaglio printing plate for machine plate with plate depth different from one another in every pattern - Google Patents

Intaglio printing plate for machine plate with plate depth different from one another in every pattern Download PDF

Info

Publication number
JP2006167937A
JP2006167937A JP2004359499A JP2004359499A JP2006167937A JP 2006167937 A JP2006167937 A JP 2006167937A JP 2004359499 A JP2004359499 A JP 2004359499A JP 2004359499 A JP2004359499 A JP 2004359499A JP 2006167937 A JP2006167937 A JP 2006167937A
Authority
JP
Japan
Prior art keywords
pattern
plate
intaglio
photosensitive layer
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004359499A
Other languages
Japanese (ja)
Inventor
Koji Imayoshi
孝二 今吉
Yuji Sato
裕治 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP2004359499A priority Critical patent/JP2006167937A/en
Publication of JP2006167937A publication Critical patent/JP2006167937A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Optical Filters (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an intaglio printing plate for a machine plate, in which patterns having dimensions and shapes different from one another are formed by a reversing printing method so as to manufacture a liquid crystal color filter with a high nominal grade. <P>SOLUTION: The intaglio printing plate 100 for a machine plate with plate depth different from one another in every pattern is formed by repeating the formation of a photosensitive layer on a machine plate-based base material 11, a pattern-wise exposure and a development treatment by a plurality of times. Concretely, the first photosensitive layer 21 is formed on a machine plate-based base material 11. The first photosensitive layer 21 is pattern-wise exposed and developingly treated in order to form a first intaglio printing plate 20 having an opening part 22 for an alignment mark and an opening part 23 for a frame pattern formed thereon. Next, the second photosensitive layer 31 is formed on the first intaglio printing plate 20. The second photosensitive layer 31 is pattern-wise exposed and developingly treated in order to form a second intaglio printing plate 30 having an opening part 32 for the alignment mark, an opening part 33 for the frame pattern and an opening part 34 for a pixel pattern on the first intaglio printing plate 20, resulting in producing the intaglio printing plate 100 for the machine plate with plate depth different from one another in every pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、液晶カラーフィルターを反転印刷法により製造する為のパターン毎に版深が異なる刷版用凹版及びその製造方法に関するものである。   The present invention relates to an intaglio for printing plates having a different plate depth for each pattern for producing a liquid crystal color filter by a reversal printing method and a method for producing the same.

近年、フラットディスプレイとして、液晶ディスプレイ（ＬＣＤ）が注目されており、その薄型、軽量、小消費電力、フリッカーレスといった特徴から、ノート型のパーソナルコンピューター（ＰＣ）、ＰＣ用のモニターを中心に市場が急速に拡大した。
また最近は、従来からＣＲＴが主流であったＴＶ向けにも大型のＬＣＤが利用されるようになってきた。 In recent years, liquid crystal displays (LCDs) have attracted attention as flat displays, and due to their thinness, light weight, low power consumption, and flickerless characteristics, the market is growing rapidly, mainly for notebook personal computers (PCs) and PC monitors. Expanded.
Recently, large LCDs have also been used for TVs for which CRT has been the mainstream.

液晶カラーフィルターは、パタン化された赤・緑・青や、シアン・マゼンダ・イエローの３色、及びこれに黒を加えた４色からなる着色層が透明基板上に形成されたものである。この着色層は、従来より、感光性顔料分散レジストをフォトリソ処理によって形成されているが、近年、液晶カラーフィルター（ＣＦ）の低コスト化を実現する為、印刷法によって形成することが提案されている。   The liquid crystal color filter is formed by forming a colored layer composed of three colors of patterned red, green, and blue, cyan, magenta, and yellow and four colors including black on a transparent substrate. Conventionally, this colored layer has been formed by photolithography treatment of a photosensitive pigment dispersion resist. In recent years, it has been proposed to form the colored layer by a printing method in order to reduce the cost of a liquid crystal color filter (CF). Yes.

印刷法には、凹版にインキを塗布、スキージで不要なインキを除去し、凹版内に残ったインキをオフセットブランケットに転写し、被印刷基板に印刷する方法（例えば、特許文献１参照。）や、オフセットブランケットにインキを塗布、刷版用凹版で不要なインキを除去し、オフセットブランケットに残ったインキを被印刷基板に印刷する方法が知られている（例えば、特許文献２参照。）
凹版の製造方法としては、一般的にガラス基板に金属薄膜でマスキングパターンを形成し、フッ酸等の薬液でガラスを溶解して形成する方法が知られている。
また、金属材料をエッチング処理して凹凸形状を形成する方法や、ベース基材にめっき等で厚付けした金属膜をエッチング処理して形成する方法が知られている（例えば、特許文献３参照。）
反転印刷用の刷版用凹版は、画面パタン、アライメントマーク、遮光用額縁パタンと様々な寸法のパタンを同一の刷版上に配置する必要がある。これらの様々な寸法のパタンを刷版用凹版からオフセットブランケットへ転写する場合、版深が浅いとオフセットブランケットのニップ圧により凹部の底にオフセットブランケットが接触する現象が認められる。この現象を回避する方策として、凹部の開口寸法が大きいパタンでは版深を深く設計する方法をとっている。 As the printing method, ink is applied to the intaglio, unnecessary ink is removed with a squeegee, the ink remaining in the intaglio is transferred to an offset blanket, and printed on a substrate to be printed (for example, see Patent Document 1). A method is known in which ink is applied to an offset blanket, unnecessary ink is removed with an intaglio for printing plate, and ink remaining in the offset blanket is printed on a substrate to be printed (for example, see Patent Document 2).
As a method for producing an intaglio, a method is generally known in which a masking pattern is formed with a metal thin film on a glass substrate, and the glass is dissolved with a chemical solution such as hydrofluoric acid.
In addition, there are known a method of forming a concavo-convex shape by etching a metal material, and a method of forming a metal film thickened by plating or the like on a base substrate (for example, see Patent Document 3). )
In the intaglio plate for reversal printing, it is necessary to arrange screen patterns, alignment marks, shading frame patterns, and patterns of various dimensions on the same printing plate. When these various patterns are transferred from the intaglio plate to the offset blanket, a phenomenon that the offset blanket contacts the bottom of the recess due to the nip pressure of the offset blanket when the plate depth is shallow is observed. As a measure to avoid this phenomenon, a method of designing a deep plate depth is used for a pattern having a large opening size of the recess.

従来の刷版用凹版製造方法では、版深を変更する為に、設定版深毎に複数回のエッチング処理する必要があり、この複数回のエッチングの前処理として、マスキングパターンを形成するためのフォトリソ処理を行っている。特に、ガラス基板や金属材はエッチングが入りにくい材料であり、刷版として数ミクロンから数十ミクロンの版深をエッチングにより形成する場合、凹部の開口寸法の面内分布の制御をより困難にしている。更に、マスキングパターンの開口寸法の面内分布の制御、マスキングパターンの膜欠陥に起因した基材の欠陥が、刷版の品質を低下させる原因となっている。   In the conventional intaglio plate manufacturing method for printing plates, in order to change the plate depth, it is necessary to perform a plurality of etching processes for each set plate depth, and as a pretreatment for this multiple etching, a masking pattern is formed. Photolithographic processing is performed. In particular, glass substrates and metal materials are materials that are difficult to etch. When forming a plate depth of several to several tens of microns as a printing plate by etching, it is more difficult to control the in-plane distribution of the opening size of the recesses. Yes. Further, the control of the in-plane distribution of the opening dimension of the masking pattern and the substrate defect caused by the film defect of the masking pattern cause the quality of the printing plate to deteriorate.

また、近年液晶ＴＶ製造用マザーガラスのサイズの大型化に伴い、必要とされる刷版も大型化してきている。大型化に伴い、刷版用凹版製造の従来方法で使用してきた基材の入手が制限されるようになっている。 ガラス材にマスキング層としての金属膜を形成した基材、大型の一枚ものの金属材料も使用が難しくなって来ており、従来どうりの刷版の品質が再現し難くなってきている。   In recent years, as the size of the mother glass for manufacturing liquid crystal TVs has increased, the required printing plates have also increased in size. Accompanying the increase in size, the availability of base materials that have been used in conventional methods for producing intaglio plates for printing plates has been restricted. A base material in which a metal film as a masking layer is formed on a glass material, and a large piece of metal material are becoming difficult to use, and it is difficult to reproduce the quality of a conventional printing plate.

こうして得られた刷版を使用してカラーフィルターを印刷する場合、画面内で線幅がバラツイてしまい、開口率、オーバーラップ量が変化するなど、カラーフィルターの表示品質を低下させる原因となっている。
特開昭６２−８５２０２号公報 特開昭６２−８５２０２号公報 特開平６−１７９２５７号公報 When printing a color filter using the printing plate obtained in this way, the line width varies within the screen, and the aperture ratio and overlap amount change, which causes the display quality of the color filter to deteriorate. Yes.
JP 62-85202 A JP 62-85202 A JP-A-6-179257

本発明は、上記問題点に鑑みなされたもので、寸法、形状の異なるパターンを反転印刷法で形成し、表示品位の高い液晶カラーフィルターを製造する為の刷版用凹版を提供することを目的とする。   The present invention has been made in view of the above problems, and an object thereof is to provide a printing plate intaglio for producing liquid crystal color filters having high display quality by forming patterns having different dimensions and shapes by a reversal printing method. And

本発明に於いて上記課題を達成するために、まず請求項１においては、液晶カラーフィルターを反転印刷法により製造する為の刷版用凹版であって、パタンの寸法、形状に応じて凹形状の深さを変えたことを特徴とするパターン毎に版深が異なる刷版用凹版としたものである。   In order to achieve the above object in the present invention, first, in claim 1, an intaglio for printing plate for producing a liquid crystal color filter by a reversal printing method, wherein the intaglio is formed according to the size and shape of the pattern. The intaglio plate for printing plate has a different plate depth for each pattern characterized by changing the depth of the plate.

また、請求項２においては、少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法としたものである。
（ａ）刷版ベース基材上に第１感光層を形成する工程。
（ｂ）前記第１感光層をパターン露光、現像処理して前記刷版ベース基材上に第１凹版を形成する工程。
（ｃ）第１凹版上に第２感光層を形成する工程。
（ｄ）前記第２感光層をパターン露光、現像処理して前記第１凹版上に第２凹版を形成する工程。
（ｅ）上記（ｃ）及び（ｄ）の工程を必要回数繰り返して、パターン毎に版深が異なる刷版用凹版を作製する工程。 According to a second aspect of the present invention, there is provided a method for producing an intaglio plate for printing plates having a different plate depth for each pattern according to the first aspect, comprising at least the following steps.
(A) A step of forming a first photosensitive layer on the printing plate base substrate.
(B) A step of pattern-exposing and developing the first photosensitive layer to form a first intaglio on the printing plate base substrate.
(C) A step of forming a second photosensitive layer on the first intaglio.
(D) forming a second intaglio on the first intaglio by pattern exposure and developing the second photosensitive layer.
(E) The process of producing the intaglio plate for printing plates in which plate depth differs for every pattern by repeating the process of said (c) and (d) required number of times.

また、請求項３においては、少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法としたものである。
（ａ）刷版ベース基材上に感光層を形成する工程。
（ｂ）前記感光層に版深の異なるパターン毎に露光量を変えたパターン露光を行う工程。（ｃ）前記感光層を現像処理して、パターン毎に版深が異なる刷版用凹版を作製する工程。 According to a third aspect of the present invention, there is provided a method for producing an intaglio plate for a printing plate having a different plate depth for each pattern according to the first aspect, comprising at least the following steps.
(A) A step of forming a photosensitive layer on the printing plate base substrate.
(B) A step of performing pattern exposure in which the exposure amount is changed for each pattern having a different plate depth on the photosensitive layer. (C) A step of developing the photosensitive layer to produce a printing plate intaglio having a different plate depth for each pattern.

また、請求項４においては、少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法としたものである。
（ａ）刷版ベース基材上に第１感光層を形成する工程。
（ｂ）前記第１感光層をパターン露光する工程。
（ｃ）露光された前記第１感光層上に第２感光層を形成する工程。
（ｄ）前記第２感光層をパターン露光する工程。
（ｃ）上記（ｃ）及び（ｄ）の工程を必要回数繰り返す工程。
（ｅ）露光された感光層を一括現像して、パターン毎に版深が異なる刷版用凹版を作製する工程。 According to a fourth aspect of the present invention, there is provided a method for producing an intaglio plate for a printing plate having a different plate depth for each pattern according to the first aspect, comprising at least the following steps.
(A) A step of forming a first photosensitive layer on the printing plate base substrate.
(B) A step of pattern exposing the first photosensitive layer.
(C) forming a second photosensitive layer on the exposed first photosensitive layer.
(D) A step of pattern-exposing the second photosensitive layer.
(C) A step of repeating the steps (c) and (d) as many times as necessary.
(E) A step of batch-developing the exposed photosensitive layer to produce an intaglio for printing plate having a different plate depth for each pattern.

さらにまた、請求項５においては、前記刷版ベース基材とパターン形成用の被転写基板との熱膨張率差が１５×１０-7ｃｍ／ｃｍ／℃以下であることを特徴とする請求項２乃至４のいずれか一項に記載のパターン毎に版深が異なる刷版用凹版の製造方法としたものである。 Furthermore, in claim 5, the difference in thermal expansion coefficient between the printing plate base substrate and the pattern-formed substrate is 15 × 10 −7 cm / cm / ° C. or less. A method for producing an intaglio plate for printing plate having a different plate depth for each pattern according to any one of 2 to 4.

本発明によれば、高精度のカラーフィルターを反転印刷法で形成するための刷版用凹版を容易に提供することができ、高品位の画像表示が可能な液晶カラーフィルターを安価に生産することが可能となる。   According to the present invention, it is possible to easily provide an intaglio plate for forming a high-precision color filter by a reversal printing method, and to produce a liquid crystal color filter capable of displaying a high-quality image at low cost. Is possible.

以下、本発明の実施の形態につき説明する。
図１（ａ）、（ｂ）及び（ｃ）は、本発明のパターン毎に版深が異なる刷版用凹版の一実施例を示す模式構成断面図である。
本発明のパターン毎に版深が異なる刷版用凹版１００は、刷版ベース基材１１上に感光層形成、パターン露光、現像処理を複数回（刷版用凹版１００では２回）繰り返すことにより、第１凹版２０及び第２凹版３０を形成し、パターン毎に版深が異なる刷版用凹版を形成したものである。 Hereinafter, embodiments of the present invention will be described.
FIGS. 1A, 1B, and 1C are schematic cross-sectional views showing one embodiment of an intaglio plate for printing plates having different plate depths for each pattern of the present invention.
The intaglio plate for printing plate 100 having a different plate depth for each pattern according to the present invention is obtained by repeating photosensitive layer formation, pattern exposure, and development processing on the printing plate base substrate 11 a plurality of times (twice for the intaglio plate for printing plate 100). The first intaglio 20 and the second intaglio 30 are formed, and intaglios for printing plates having different plate depths for each pattern are formed.

本発明のパターン毎に版深が異なる刷版用凹版２００は、刷版ベース基材１１上に感光層４１を形成し、パターン露光を複数回（刷版用凹版２００では２回）繰り返し、一括現像にて凹版４０を形成し、パターン毎に版深が異なる刷版用凹版を形成したものである。   The intaglio plate for printing plate 200 having a different plate depth for each pattern according to the present invention forms the photosensitive layer 41 on the printing plate base substrate 11 and repeats pattern exposure a plurality of times (twice for the intaglio plate for printing plate 200). An intaglio 40 is formed by development, and an intaglio for printing plate having a different plate depth for each pattern is formed.

本発明のパターン毎に版深が異なる刷版用凹版３００は、刷版ベース基材１１上に感光層形成とパターン露光とを複数回（刷版用凹版３００では２回）繰り返し、一括現像処理することにより、凹版５０を形成し、パターン毎に版深が異なる刷版用凹版を形成したものである。   The intaglio 300 for printing plates having different plate depths for each pattern according to the present invention repeats the formation of a photosensitive layer and pattern exposure on the printing plate base substrate 11 a plurality of times (twice for the intaglio 300 for printing plates), and collective development processing In this way, the intaglio 50 is formed, and intaglio plates for printing plates having different plate depths for each pattern are formed.

ここで、本発明のパターン毎に版深が異なる刷版用凹版を用いた反転印刷法について説明する。図５（ａ）〜（ｅ）は、本発明のパターン毎に版深が異なる刷版用凹版を用いた反転印刷法の主要工程を示す説明図である。。
まず、シリンダー胴６１に所定厚のオフセットブランケット６２が形成されたオフセットシリンダー６０（図５（ａ）参照）に所定厚のウエット状態のインキ被膜７１を形成したオフセットシリンダー６０ａ（図５（ｂ）参照）と本発明のパターン毎に版深が異なる刷版用凹版１００（図５（ｃ）参照）を準備する。 Here, the reverse printing method using the intaglio plate for printing plates having different plate depths for each pattern of the present invention will be described. FIGS. 5A to 5E are explanatory views showing the main steps of the reversal printing method using intaglio plates for printing plates having different plate depths for each pattern of the present invention. .
First, an offset cylinder 60a (see FIG. 5B) in which a wet ink film 71 having a predetermined thickness is formed on an offset cylinder 60 (see FIG. 5A) in which an offset blanket 62 having a predetermined thickness is formed on the cylinder body 61. ) And an intaglio plate for printing plate 100 (see FIG. 5C) having different plate depths for each pattern of the present invention.

次に、インキ被膜７１が形成されたオフセットシリンダー６０ａを本発明のパターン毎に版深が異なる刷版用凹版１００に押圧しながら、回転することにより、刷版用凹版１００の凸部にインキ被膜７１が転写され、加圧されない刷版用凹版１００の凹部のインキ被膜７１はそのまま残り、画素パターン、額縁パターン及びアライメントマークが形成されたオフセットシリンダー６０ｂが得られる（図５（ｄ）参照）。。   Next, the offset cylinder 60a on which the ink film 71 is formed is rotated while being pressed against the intaglio plate 100 having different plate depths for each pattern of the present invention, whereby the ink film is formed on the convex portions of the intaglio plate 100. 71 is transferred, and the ink film 71 in the concave portion of the printing plate intaglio 100 which is not pressed remains as it is, and an offset cylinder 60b on which a pixel pattern, a frame pattern and an alignment mark are formed is obtained (see FIG. 5D). .

次に、画素パターン、額縁パターン及びアライメントマークが形成されたオフセットシリンダー６０ｂをガラス基板等からなる被転写基板１２に押圧しながら、回転することにより、被転写基板１２上にパターンが転写され、被転写基板１２上には画素パターン７１ａ、額縁パターン７１ｂ及びアライメントマーク７１ｃが形成される。   Next, the offset cylinder 60b on which the pixel pattern, the frame pattern, and the alignment mark are formed is rotated while being pressed against the transfer substrate 12 made of a glass substrate or the like. On the transfer substrate 12, a pixel pattern 71a, a frame pattern 71b, and an alignment mark 71c are formed.

上記したように、本発明のパターン毎に版深が異なる刷版用凹版を用いた反転印刷法により、高精度のパターンを被転写基板上に容易に形成することができ、反転印刷を所定回
数繰り返すことにより、高品位の画像表示が可能な液晶カラーフィルターを容易に得ることができる。 As described above, a high-precision pattern can be easily formed on a transferred substrate by a reversal printing method using intaglio plates for printing plates having different plate depths for each pattern of the present invention, and reversal printing is performed a predetermined number of times. By repeating, a liquid crystal color filter capable of displaying a high-quality image can be easily obtained.

以下本発明のパターン毎に版深が異なる刷版用凹版の製造方法について説明する。
図２（ａ）〜（ｄ）は、請求項２に係るパターン毎に版深が異なる刷版用凹版の製造方法の一実施例の主要工程を示す説明図である。
請求項２に係るパターン毎に版深が異なる刷版用凹版の製造方法は、刷版ベース基材１１上に感光層形成、パターン露光、現像処理を複数回繰り返すことにより、複数の凹版を形成し、パターン毎に版深が異なる刷版用凹版を形成する方法である。
このように、複数の凹版を感光層で形成し、各感光層毎に、パターン露光、現像処理を行うことにより、凹版の深度、パタンサイズ・形状の制御が可能となる。 Hereinafter, a method for producing an intaglio plate for printing plates having different plate depths for each pattern of the present invention will be described.
FIGS. 2A to 2D are explanatory views showing the main steps of an embodiment of a method for producing an intaglio plate for printing plates having different plate depths for each pattern according to claim 2.
The method of manufacturing an intaglio plate for printing plates having different plate depths for each pattern according to claim 2 forms a plurality of intaglio plates by repeating photosensitive layer formation, pattern exposure, and development processing on the plate base substrate 11 a plurality of times. In this method, an intaglio plate for printing plate having a different plate depth for each pattern is formed.
In this manner, by forming a plurality of intaglio plates with a photosensitive layer and performing pattern exposure and development processing for each photosensitive layer, it is possible to control the depth, pattern size and shape of the intaglio plate.

凹版の深度をパタンサイズ・形状毎に変更する理由は、反転印刷法で、オフセットブランケット上のインキを刷版用凹版の凸部に転写する際、ニップ巾で数ミリの圧力をかけており、大パタンになると凹部のボトムにオフセットブランケット上のインキが接触する傾向が強くなる現象を受けてのものである。
カラーフィルターの３色およびブラックマトリクス（ＢＬＫ）の各パタンには、数ミクロンから数ミリの様々な寸法のものがあり、刷版用凹版の凹部の開口部も数ミクロンから数ミリの様々な寸法を形成しなければならない。この開口部の寸法の違いに合わせ、大パタンの版深は細線パタンに比べ深く形成する必要がある。
一般に、感光性材料の現像可能なアスペクト比（深さ／開口部寸法）は０．８から２．０程度であり、細線パタンを深く現像するのには限界があり、同一刷版上で版深を複数水準変更するためには、各パタンにあわせ異なる露光・現像条件で処理する必要がある。
また、凹版の刷版材料として感光性材料を用いたのは、現像が容易で、寸法精度が高いこと、様々なパタン形状に対応できるためである。 The reason for changing the depth of the intaglio for each pattern size and shape is the reverse printing method, when transferring the ink on the offset blanket to the convex part of the intaglio plate for press, applying a pressure of several millimeters at the nip width, When the pattern becomes large, the ink tends to come into contact with the ink on the offset blanket at the bottom of the recess.
Each of the three colors of the color filter and the black matrix (BLK) pattern has various dimensions from several microns to several millimeters, and the indentations of the intaglio plate for printing plates have various dimensions from several microns to several millimeters. Must be formed. In accordance with the difference in dimension of the opening, it is necessary to form the plate depth of the large pattern deeper than that of the thin line pattern.
In general, the developable aspect ratio (depth / opening size) of a photosensitive material is about 0.8 to 2.0, and there is a limit to deep development of a fine line pattern. In order to change the depth to a plurality of levels, it is necessary to perform processing under different exposure / development conditions for each pattern.
The photosensitive material is used as the intaglio plate material because it is easy to develop, has high dimensional accuracy, and can accommodate various pattern shapes.

まず、刷版ベース基材１１上に第１感光層２１を形成する（図２（ａ）参照）。
第１感光層２１を形成する感光性材料としては、液状レジスト、ドライフルムレジストが使用可能である。また製造プロセスによってネガ型レジスト、ポジ型レジストを使い分ければ良い。
また、感光層の厚みは凹版の開口部の版深設計に応じて設定すれば良い。 First, the first photosensitive layer 21 is formed on the printing plate base substrate 11 (see FIG. 2A).
As the photosensitive material for forming the first photosensitive layer 21, a liquid resist or a dry film resist can be used. Further, a negative resist and a positive resist may be properly used depending on the manufacturing process.
The thickness of the photosensitive layer may be set according to the plate depth design of the opening of the intaglio.

次に、第１感光層２１をパターン露光、現像処理して、刷版ベース基材１１上の第１感光層２１にアライメントマーク用開口部２２及び額縁パターン用開口部２３が形成された第１凹版２０を形成する（図２（ｂ）参照）。
パターン露光としては、フォトマスクを用いたマスク露光、電子ビーム露光等が使用できる。 Next, the first photosensitive layer 21 is subjected to pattern exposure and development processing, and the first photosensitive layer 21 on the printing plate base substrate 11 is formed with the alignment mark opening 22 and the frame pattern opening 23. An intaglio 20 is formed (see FIG. 2B).
As pattern exposure, mask exposure using a photomask, electron beam exposure, or the like can be used.

次に、第１凹版２０上に第２感光層３１を形成する（図２（ｃ）参照）。
第２感光層３１を形成する感光性材料としては、第１感光層２１にパターン開口部が形成されているため、ドライフルムレジストが好適である。また製造プロセスによってネガ型レジスト、ポジ型レジストを使い分ければ良い。
また、感光層の厚みは凹版の版深設計に応じて設定すれば良い。 Next, the second photosensitive layer 31 is formed on the first intaglio 20 (see FIG. 2C).
As the photosensitive material for forming the second photosensitive layer 31, a dry film resist is suitable because the pattern opening is formed in the first photosensitive layer 21. Further, a negative resist and a positive resist may be properly used depending on the manufacturing process.
The thickness of the photosensitive layer may be set according to the intaglio plate depth design.

次に、第２感光層３１をパターン露光、現像処理して第１凹版２０上にアライメントマーク用開口部３２、額縁パターン用開口部３３及び画素パターン用開口部３４が形成された第２凹版３０を形成し、本発明のパターン毎に版深が異なる刷版用凹版１００を作製する（図２（ｄ）参照）。
パターン露光としては、フォトマスクを用いたマスク露光、電子ビーム露光等が使用できる。
ここでは、感光層を２層使ったパターン毎に版深が異なる刷版用凹版の事例について説明したが、さらに上記の工程を繰り返すことにより、複数の凹版からなるパターン毎に版深が異なる刷版用凹版を作製することができる。 Next, the second photosensitive layer 31 is subjected to pattern exposure and development processing, and the second intaglio 30 in which the alignment mark opening 32, the frame pattern opening 33, and the pixel pattern opening 34 are formed on the first intaglio 20. And an intaglio plate 100 for printing plates having different plate depths for each pattern of the present invention is produced (see FIG. 2D).
As pattern exposure, mask exposure using a photomask, electron beam exposure, or the like can be used.
Here, the example of the intaglio plate for printing plates having different plate depths for each pattern using two photosensitive layers has been described. However, by repeating the above process, printing plates having different plate depths for each pattern consisting of a plurality of intaglio plates. An intaglio for printing plate can be produced.

図３（ａ）〜（ｂ）は、請求項３に係るパターン毎に版深が異なる刷版用凹版の製造方法の一実施例の主要工程を示す説明図である。
請求項３に係るパターン毎に版深が異なる刷版用凹版の製造方法は、刷版ベース基材１１上に感光層４１を形成し、パターン毎にパターン露光を複数回繰り返し、一括現像にて凹版４０を形成し、パターン毎に版深が異なる刷版用凹版を形成する方法である。
このように、感光層４１に対しパターン毎にパターン露光を複数回繰り返することにより、凹版の深度、パタンサイズ・形状の制御が可能となる。 FIGS. 3A to 3B are explanatory views showing the main steps of an embodiment of a method for producing a printing plate intaglio with different plate depths for each pattern according to claim 3.
According to a third aspect of the present invention, there is provided a method for producing an intaglio for printing plate having a different plate depth, wherein the photosensitive layer 41 is formed on the printing plate base substrate 11 and the pattern exposure is repeated a plurality of times for each pattern. This is a method of forming an intaglio plate 40 and forming intaglio plates for printing plates having different plate depths for each pattern.
As described above, the pattern exposure and the pattern size and shape of the intaglio can be controlled by repeating the pattern exposure for each pattern on the photosensitive layer 41 a plurality of times.

凹版の深度をパタンサイズ・形状毎に変更する理由は、反転印刷法で、オフセットブランケット上のインキを刷版用凹版の凸部に転写する際、ニップ巾で数ミリの圧力をかけており、大パタンになると凹部のボトムにオフセットブランケット上のインキが接触する傾向が強くなる現象を受けてのものである。
カラーフィルターの３色およびブラックマトリクス（ＢＬＫ）の各パタンには、数ミクロンから数ミリの様々な寸法のものがあり、刷版用凹版の凹部の開口部も数ミクロンから数ミリの様々な寸法を形成しなければならない。この開口部の寸法の違いに合わせ、大パタンの版深は細線パタンに比べ深く形成する必要がある。
一般に、感光性材料の現像可能なアスペクト比（深さ／開口部寸法）は０．８から２．０程度であり、細線パタンを深く現像するのには限界があり、同一刷版上で版深を複数水準変更するためには、各パタンにあわせ異なる露光・現像条件で処理する必要がある。
また、凹版の刷版材料として感光性材料を用いたのは、現像が容易で、寸法精度が高いこと、様々なパタン形状に対応できるためである。 The reason for changing the depth of the intaglio for each pattern size and shape is the reverse printing method, when transferring the ink on the offset blanket to the convex part of the intaglio plate for press, applying a pressure of several millimeters at the nip width, When the pattern becomes large, the ink tends to come into contact with the ink on the offset blanket at the bottom of the recess.
Each of the three colors of the color filter and the black matrix (BLK) pattern has various dimensions ranging from several microns to several millimeters, and the recess opening of the intaglio plate for printing plates also has various dimensions ranging from several microns to several millimeters. Must be formed. In accordance with the difference in dimension of the opening, it is necessary to form the plate depth of the large pattern deeper than that of the thin line pattern.
In general, the developable aspect ratio (depth / opening size) of a photosensitive material is about 0.8 to 2.0, and there is a limit to deep development of a fine line pattern. In order to change the depth to a plurality of levels, it is necessary to perform processing under different exposure / development conditions for each pattern.
The photosensitive material is used as the intaglio plate material because it is easy to develop, has high dimensional accuracy, and can accommodate various pattern shapes.

まず、刷版ベース基材１１上に感光層４１を形成する（図３（ａ）参照）。
感光層４１を形成する感光性材料としては、液状レジスト、ドライフルムレジストが使用可能である。また露光プロセスで感光層の残存膜厚を設定するため、ポジ型レジストが好ましい。
また、感光層の厚みは、刷版用凹版の最も深い版深設計に応じて設定する。 First, the photosensitive layer 41 is formed on the printing plate base substrate 11 (see FIG. 3A).
As the photosensitive material for forming the photosensitive layer 41, a liquid resist or a dry film resist can be used. Further, a positive resist is preferable because the remaining film thickness of the photosensitive layer is set in the exposure process.
The thickness of the photosensitive layer is set according to the deepest plate depth design of the intaglio plate for printing plate.

次に、感光層４１に版深の異なるパターン毎に露光量を変えたパターン露光を行い、現像処理して刷版ベース基材１１上にアライメントマーク用開口部４２、額縁パターン用開口部４３及び画素パターン用開口部４４が形成された凹版４０を形成し、本発明のパターン毎に版深が異なる刷版用凹版２００を作製する（図３（ｂ）参照）。
パターン露光としては、パターン毎に露光量が変更可能なハーフトーンマスクを用いたマスク露光、直描の電子ビーム露光装置を用いたパターン描画が使用できる。
ポジ形レジストの使用により露光量の多い部分が深く、露光量を抑えた部分が浅く現像される為、露光量に応じた凹版の版深を設定することが可能である。 Next, the photosensitive layer 41 is subjected to pattern exposure in which the exposure amount is changed for each pattern having different plate depths, and development processing is performed to form an alignment mark opening 42, a frame pattern opening 43, and the like on the printing plate base substrate 11. The intaglio 40 having the pixel pattern opening 44 is formed, and the intaglio 200 for printing plate having a different plate depth for each pattern of the present invention is produced (see FIG. 3B).
As pattern exposure, mask exposure using a halftone mask whose exposure amount can be changed for each pattern, or pattern drawing using a direct drawing electron beam exposure apparatus can be used.
By using a positive resist, a portion with a large amount of exposure is developed deep and a portion with a small amount of exposure is developed shallow, so that the intaglio plate depth can be set according to the amount of exposure.

図４（ａ）〜（ｅ）は、請求項４に係るパターン毎に版深が異なる刷版用凹版の製造方法の一実施例の主要工程を示す説明図である。
請求項４に係るパターン毎に版深が異なる刷版用凹版の製造方法は、刷版ベース基材１１上に感光層形成とパターン露光とを複数回繰り返し、一括現像処理することにより、凹版５０を形成し、パターン毎に版深が異なる刷版用凹版を形成する方法である。
このように、感光層形成とパターン露光とを複数回繰り返し、一括現像処理することにより、凹版の深度、パタンサイズ・形状の制御が可能となる。 4 (a) to 4 (e) are explanatory views showing the main steps of an embodiment of a method for producing a printing plate intaglio with different plate depths for each pattern according to claim 4. FIG.
According to a fourth aspect of the present invention, there is provided a method for producing an intaglio plate for printing plates having different plate depths. The intaglio plate 50 is subjected to batch development by repeating photosensitive layer formation and pattern exposure on the plate base substrate 11 a plurality of times. And an intaglio for printing plate having a different plate depth for each pattern is formed.
In this way, the depth of the intaglio, the pattern size and the shape can be controlled by repeating the formation of the photosensitive layer and the pattern exposure a plurality of times and performing a batch development process.

凹版の深度をパタンサイズ・形状毎に変更する理由は、反転印刷法で、オフセットブラ
ンケット上のインキを刷版用凹版の凸部に転写する際、ニップ巾で数ミリの圧力をかけており、大パタンになると凹部のボトムにオフセットブランケット上のインキが接触する傾向が強くなる現象を受けてのものである。
カラーフィルターの３色およびブラックマトリクス（ＢＬＫ）の各パタンには、数ミクロンから数ミリの様々な寸法のものがあり、刷版用凹版の凹部の開口部も数ミクロンから数ミリの様々な寸法を形成しなければならない。この開口部の寸法の違いに合わせ、大パタンの版深は細線パタンに比べ深く形成する必要がある。
一般に、感光性材料の現像可能なアスペクト比（深さ／開口部寸法）は０．８以下程度であり、細線パタンを深く現像するのには限界があり、同一刷版上で版深を複数水準変更するためには、各パタンにあわせ異なる露光・現像条件で処理する必要がある。
また、凹版の刷版材料として感光性材料を用いたのは、現像が容易で、寸法精度が高いこと、様々なパタン形状に対応できるためである。 The reason for changing the depth of the intaglio for each pattern size and shape is the reverse printing method, and when transferring the ink on the offset blanket to the convex part of the intaglio for printing plate, a pressure of several millimeters is applied at the nip width, When the pattern becomes large, the ink tends to come into contact with the ink on the offset blanket at the bottom of the recess.
Each of the three colors of the color filter and the black matrix (BLK) pattern has various dimensions from several microns to several millimeters, and the indentations of the intaglio plate for printing plates have various dimensions from several microns to several millimeters. Must be formed. In accordance with the difference in dimension of the opening, it is necessary to form the plate depth of the large pattern deeper than that of the thin line pattern.
In general, the developable aspect ratio (depth / opening size) of a photosensitive material is about 0.8 or less, and there is a limit to deep development of fine line patterns. In order to change the level, it is necessary to process under different exposure and development conditions for each pattern.
The photosensitive material is used as the intaglio plate material because it is easy to develop, has high dimensional accuracy, and can accommodate various pattern shapes.

まず、刷版ベース基材１１上に第１感光層２１を形成する（図４（ａ）参照）。
第１感光層２１を形成する感光性材料としては、液状レジスト、ドライフルムレジストが使用可能である。また製造プロセスによってネガ型レジスト、ポジ型レジストを使い分ければ良い。
また、感光層の厚みは凹版の版深設計に応じて設定すれば良い。 First, the first photosensitive layer 21 is formed on the printing plate base substrate 11 (see FIG. 4A).
As the photosensitive material for forming the first photosensitive layer 21, a liquid resist or a dry film resist can be used. Further, a negative resist and a positive resist may be properly used depending on the manufacturing process.
The thickness of the photosensitive layer may be set according to the intaglio plate depth design.

次に、第１感光層２１をパターン露光し、パターン露光された第１感光層２１ａを形成する（図４（ｂ）参照）。
パターン露光としては、フォトマスクを用いたマスク露光、電子ビーム露光等が使用できる。 Next, the first photosensitive layer 21 is pattern-exposed to form a pattern-exposed first photosensitive layer 21a (see FIG. 4B).
As pattern exposure, mask exposure using a photomask, electron beam exposure, or the like can be used.

次に、パターン露光された第１感光層２１ａ上に第２感光層３１を形成する（図４（ｃ）参照）。
第２感光層３１を形成する感光性材料としては、液状レジスト、ドライフルムレジストが使用可能である。また製造プロセスによってネガ型レジスト、ポジ型レジストを使い分ければ良い。
また、感光層の厚みは凹版の版深設計に応じて設定すれば良い。 Next, the second photosensitive layer 31 is formed on the pattern-exposed first photosensitive layer 21a (see FIG. 4C).
As the photosensitive material for forming the second photosensitive layer 31, a liquid resist or a dry film resist can be used. Further, a negative resist and a positive resist may be properly used depending on the manufacturing process.
The thickness of the photosensitive layer may be set according to the intaglio plate depth design.

次に、第２感光層３１をパターン露光し、パターン露光された第２感光層３１ａを形成する（図４（ｄ）参照）。
パターン露光としては、フォトマスクを用いたマスク露光、電子ビーム露光等が使用できる。 Next, the second photosensitive layer 31 is pattern-exposed to form a pattern-exposed second photosensitive layer 31a (see FIG. 4D).
As pattern exposure, mask exposure using a photomask, electron beam exposure, or the like can be used.

次に、パターン露光された第１感光層２１ａ及びパターン露光された第２感光層３１ａを一括現像処理して、刷版ベース基材１１上にアライメントマーク用開口部５２、額縁パターン用開口部５３及び画素パターン用開口部５４が形成された凹版５０を形成し、本発明のパターン毎に版深が異なる刷版用凹版３００を作製する（図４（ｅ）参照）。
ここでは、感光層を２層使ったパターン毎に版深が異なる刷版用凹版の事例について説明したが、さらに上記の工程を繰り返すことにより、複数の感光層からなるパターン毎に版深が異なる刷版用凹版を作製することができる。 Next, the pattern-exposed first photosensitive layer 21 a and the pattern-exposed second photosensitive layer 31 a are collectively developed, and an alignment mark opening 52 and a frame pattern opening 53 are formed on the printing plate base substrate 11. And the intaglio 50 in which the pixel pattern opening 54 is formed is formed, and the intaglio 300 for printing plate having a different plate depth for each pattern of the present invention is produced (see FIG. 4E).
Here, an example of an intaglio plate for printing plates having a different plate depth for each pattern using two photosensitive layers has been described, but the plate depth varies for each pattern composed of a plurality of photosensitive layers by further repeating the above steps. An intaglio for printing plates can be produced.

請求項５に係るパターン毎に版深が異なる刷版用凹版の製造方法は、刷版ベース基材１１とパターン形成用の被転写基板との熱膨張率差が１５×１０-7ｃｍ／ｃｍ／℃以下としている。
上記パターン毎に版深が異なる刷版用凹版を用いた反転印刷法で説明したカラーフィルター形成用の被転写基板は、対向電極基板とのセルの位置精度を保証する為に、トータルピッチは±３μｍ以下で制御することが求められている。現在、カラーフィルター形成用の
被転写基板と対向電極基板は熱膨張率の同じガラス基板材料を使用し、露光も熱膨張率の低いクウォーツ製のフォトマスクを使用して、トータルピッチの制御を行っている。
印刷カラーフィルターでは、カラーフィルター形成用の被転写基板と対向電極基板のトータルピッチの制御方法はフォトリソ処理の場合と同じである。カラーフィルター形成用の被転写基板のトータルピッチの制御には、刷版用凹版のトータルピッチの制御が重要となってくる。 In the method for producing an intaglio plate for printing plates having different plate depths for each pattern according to claim 5, the difference in thermal expansion coefficient between the printing plate base substrate 11 and the pattern-formed transfer substrate is 15 × 10 −7 cm / cm. / ° C or less.
The transfer substrate for forming a color filter described in the reversal printing method using an intaglio for printing plate with a different plate depth for each pattern described above has a total pitch of ±± to guarantee the positional accuracy of the cell with the counter electrode substrate. Control is required at 3 μm or less. Currently, the glass substrate material with the same coefficient of thermal expansion is used for the transfer substrate and counter electrode substrate for color filter formation, and the total pitch is controlled using a Quartz photomask with a low coefficient of thermal expansion. ing.
In the printing color filter, the method for controlling the total pitch of the transfer substrate for forming the color filter and the counter electrode substrate is the same as in the case of the photolithography process. Control of the total pitch of the intaglio for printing plates is important for controlling the total pitch of the transfer substrate for forming the color filter.

刷版用凹版のトータルピッチを制御する方法としてはカラーフィルター形成用の被転写基板に近い熱膨張率の材料を使用することが望ましい。
現状、カラーフィルター形成用の被転写基板に使用されるガラス基板の熱膨張率は３×１０-6ｃｍ／ｃｍ／℃程度であり、１０００ｍｍの基板サイズで１℃温度が変化すると３μｍの長さが変化する。液晶ディスプレイの要求仕様である±３μｍを保証する為には、刷版ベース基材とカラーフィルター形成用の被転写基板のトータルピッチの差は±１．５μｍ以下で制御する必要があり、熱膨張率の差として１５×１０-7ｃｍ／ｃｍ／℃以下であることが望ましい。
熱膨張率がカラーフィルター形成用の被転写基板に近い刷版ベース基材としては、液晶ディスプレイに使用されている低膨張ガラスや、低膨張ＳＵＳ材が使用可能である。 As a method for controlling the total pitch of the intaglio plates for printing plates, it is desirable to use a material having a thermal expansion coefficient close to that of the transfer substrate for forming the color filter.
At present, the thermal expansion coefficient of the glass substrate used for the transfer substrate for forming the color filter is about 3 × 10 −6 cm / cm / ° C., and the length of 3 μm when the temperature of 1 ° C. changes with the substrate size of 1000 mm. Changes. In order to guarantee ± 3μm, which is the required specification for liquid crystal displays, the difference in total pitch between the printing plate base substrate and the substrate for color filter formation must be controlled to ± 1.5μm or less. The difference in rate is desirably 15 × 10 −7 cm / cm / ° C. or less.
As a printing plate base substrate having a thermal expansion coefficient close to that of a transfer target substrate for forming a color filter, low expansion glass used in liquid crystal displays and low expansion SUS materials can be used.

刷版用凹版の画素パタンはライン巾２０μｍ、周囲のアライメントマークは５００μｍの線幅で設計した。
まず、低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる刷版ベース基材１１上にネガ型ドライフィルムレジストをロールラミネーターにてラミネートし、３０μｍ厚の第１感光層２１を形成した（図２（ａ）参照）。 The pixel pattern of the intaglio plate for printing plate was designed with a line width of 20 μm and the surrounding alignment marks with a line width of 500 μm.
First, a negative dry film resist was laminated on a printing plate base substrate 11 made of a low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm / cm / ° C.) with a roll laminator. A first photosensitive layer 21 having a thickness of 30 μm was formed (see FIG. 2A).

次に、±０．５℃に温度制御された露光機（トプコン社製）に露光用マスクと第１感光層２１が形成された刷版ベース基材１１とをセットして第１感光層２１にパターン露光を行う。さらに、アルカリ系の現像液で現像処理し、刷版ベース基材１１上の第１感光層２１にアライメントマーク用開口部２２及び額縁パターン用開口部２３が形成された第１凹版２０を形成した（図２（ｂ）参照）。
ここで、露光用マスクの額縁パターンは４５０μｍで設計した。 Next, the exposure mask and the printing plate base substrate 11 on which the first photosensitive layer 21 is formed are set in an exposure machine (Topcon Co., Ltd.) whose temperature is controlled to ± 0.5 ° C., and the first photosensitive layer 21 is set. Pattern exposure is performed. Further, development processing was performed with an alkaline developer to form the first intaglio 20 in which the alignment mark opening 22 and the frame pattern opening 23 were formed in the first photosensitive layer 21 on the printing plate base substrate 11. (See FIG. 2 (b)).
Here, the frame pattern of the exposure mask was designed to be 450 μm.

次に、第１凹版２０上にネガ型ドライフィルムレジストをロールラミネーターにてラミネートし、１０μｍ厚の第２感光層３１を形成した（図２（ｃ）参照）。   Next, a negative dry film resist was laminated on the first intaglio 20 with a roll laminator to form a second photosensitive layer 31 having a thickness of 10 μm (see FIG. 2C).

次に、±０．５℃に温度制御された露光機（トプコン社製）に露光用マスクと第２感光層３１が形成された刷版ベース基材１１とをセットして第２感光層３１にパターン露光を行う。アルカリ系の現像液で現像処理し、２００℃１時間加熱処理して、第１凹版２０上にアライメントマーク用開口部３２、額縁パターン用開口部３３及び画素パターン用開口部３４が形成された第２凹版３０を形成し、本発明のパターン毎に版深が異なる刷版用凹版１００を作製した（図２（ｄ）参照）。   Next, the exposure mask and the printing plate base substrate 11 on which the second photosensitive layer 31 is formed are set in an exposure machine (Topcon Co., Ltd.) whose temperature is controlled to ± 0.5 ° C., and the second photosensitive layer 31 is set. Pattern exposure is performed. Development is performed with an alkaline developer, and heat treatment is performed at 200 ° C. for 1 hour to form alignment mark openings 32, frame pattern openings 33, and pixel pattern openings 34 on the first intaglio 20. Two intaglio plates 30 were formed, and an intaglio plate 100 for printing plates having different plate depths for each pattern of the present invention was produced (see FIG. 2D).

実施例１で得られた刷版用凹版１００のパタン寸法の面内バラツキは±０．５μｍ、画素パターン用開口部の版深は７μｍ、額縁パターン用開口部の版深は３５μｍ、トータルピッチは±２μｍであった。   The in-plane variation of the pattern size of the intaglio plate 100 obtained in Example 1 is ± 0.5 μm, the plate depth of the pixel pattern opening is 7 μm, the plate depth of the frame pattern opening is 35 μm, and the total pitch is It was ± 2 μm.

実施例１で得られた刷版用凹版１００を用いて、反転印刷法にて５５０×６５０×０．７ｍｍｔの低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる被転写基板１２に形成された色パタンのパタン寸法の面内バラツ
キは±０．５μｍ、画素パタンの中抜けは無く、トータルピッチは±２μｍであった。 A 550 × 650 × 0.7 mmt low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm) using the intaglio plate for printing plate 100 obtained in Example 1 by reversal printing. The in-plane variation of the pattern size of the color pattern formed on the transferred substrate 12 composed of / cm / ° C. was ± 0.5 μm, there was no pixel pattern void, and the total pitch was ± 2 μm.

実施例１と同様に、刷版用凹版の画素パタンはライン巾２０μｍ、周囲のアライメントマークは５００μｍの線幅で設計した。
まず、低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる刷版ベース基材１１上にポジ型感光性レジストをダイコートし、４０μｍ厚の感光層４１を形成した（図３（ａ）参照）。 In the same manner as in Example 1, the pixel pattern of the intaglio for printing plate was designed with a line width of 20 μm, and the surrounding alignment marks were designed with a line width of 500 μm.
First, a positive photosensitive resist was die-coated on a printing plate base substrate 11 made of a low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm / cm / ° C.) A photosensitive layer 41 was formed (see FIG. 3A).

次に、±０．５℃に温度制御された露光機（トプコン社製）に額縁パタン用開口部パターンとアライメントマーク用開口部パターンのｉ線透過率を１００％に、画素パターン用開口部パターンのｉ線透過率を２０％に設定した露光用マスクとと感光層４１が形成された刷版ベース基材１１とをセットして感光層４１にパターン露光を行う。さらに、アルカリ系の現像液で現像処理し、刷版ベース基材１１上にアライメントマーク用開口部４２、額縁パターン用開口部４３及び画素パターン用開口部４４が形成された凹版４０を形成し、本発明のパターン毎に版深が異なる刷版用凹版１００を作製した（図３（ｂ）参照）。   Next, the exposure pattern (topcon), whose temperature is controlled to ± 0.5 ° C., is set so that the i-line transmittance of the frame pattern opening pattern and the alignment mark opening pattern is 100%, and the pixel pattern opening pattern. The exposure mask with the i-line transmittance set to 20% and the printing plate base substrate 11 on which the photosensitive layer 41 is formed are set, and pattern exposure is performed on the photosensitive layer 41. Further, development processing is performed with an alkaline developer to form an intaglio 40 in which the alignment mark opening 42, the frame pattern opening 43, and the pixel pattern opening 44 are formed on the printing plate base substrate 11, An intaglio plate for printing plate 100 having a different plate depth for each pattern of the present invention was produced (see FIG. 3B).

実施例２で得られた刷版用凹版２００のパタン寸法の面内バラツキは±０．５μｍ、画素パターン用開口部の版深は７μｍ、額縁パターン用開口部の版深は３５μｍ、トータルピッチは±２μｍであった。   The in-plane variation of the pattern size of the intaglio plate 200 obtained in Example 2 is ± 0.5 μm, the plate depth of the pixel pattern opening is 7 μm, the plate depth of the frame pattern opening is 35 μm, and the total pitch is It was ± 2 μm.

実施例２で得られた刷版用凹版２００を用いて、反転印刷法にて５５０×６５０×０．７ｍｍｔの低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる被転写基板１２に形成された色パタンのパタン寸法の面内バラツキは±０．５μｍ、画素パタンの中抜けは無く、トータルピッチは±２μｍであった。 550 × 650 × 0.7 mmt low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm) using the intaglio plate for printing plate 200 obtained in Example 2 by reversal printing. The in-plane variation of the pattern size of the color pattern formed on the transferred substrate 12 composed of / cm / ° C. was ± 0.5 μm, there was no pixel pattern void, and the total pitch was ± 2 μm.

実施例１と同様に、刷版用凹版の画素パタンはライン巾２０μｍ、周囲のアライメントマークは５００μｍの線幅で設計した。
まず、低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる刷版ベース基材１１上にネガ型ドライフィルムレジストをロールラミネーターにてラミネートし、３０μｍ厚の第１感光層２１を形成した（図４（ａ）参照）。 In the same manner as in Example 1, the pixel pattern of the intaglio for printing plate was designed with a line width of 20 μm, and the surrounding alignment marks were designed with a line width of 500 μm.
First, a negative dry film resist was laminated on a printing plate base substrate 11 made of a low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm / cm / ° C.) with a roll laminator. A first photosensitive layer 21 having a thickness of 30 μm was formed (see FIG. 4A).

次に、±０．５℃に温度制御された露光機（トプコン社製）に露光用マスクと第１感光層２１が形成された刷版ベース基材１１とをセットして第１感光層２１にパターン露光を行い、パターン露光され第１感光層２１ａを形成した（図４（ｂ）参照）。   Next, the exposure mask and the printing plate base substrate 11 on which the first photosensitive layer 21 is formed are set in an exposure machine (Topcon Co., Ltd.) whose temperature is controlled to ± 0.5 ° C., and the first photosensitive layer 21 is set. Then, pattern exposure was performed to form a first photosensitive layer 21a (see FIG. 4B).

次に、パターン露光されパターン露光２１ａ上にネガ型ドライフィルムレジストをロールラミネーターにてラミネートし、１０μｍ厚の第２感光層３１を形成した（図４（ｃ）参照）。   Next, pattern exposure was performed, and a negative dry film resist was laminated on the pattern exposure 21a with a roll laminator to form a second photosensitive layer 31 having a thickness of 10 μm (see FIG. 4C).

次に、±０．５℃に温度制御された露光機（トプコン社製）に露光用マスクと第２感光層３１が形成された刷版ベース基材１１とをセットして第２感光層３１にパターン露光を行い、パターン露光された第２感光層３１ａを形成した（図４（ｄ）参照）。   Next, the exposure mask and the printing plate base substrate 11 on which the second photosensitive layer 31 is formed are set in an exposure machine (Topcon Co., Ltd.) whose temperature is controlled to ± 0.5 ° C., and the second photosensitive layer 31 is set. Then, pattern exposure was performed to form a second photosensitive layer 31a subjected to pattern exposure (see FIG. 4D).

次に、パターン露光された第１感光層２１ａ及びパターン露光された第２感光層３１ａをアルカリ系の現像液で一括現像処理して、刷版ベース基材１１上にアライメントマーク用開口部５２、額縁パターン用開口部５３及び画素パターン用開口部５４が形成された凹版５０を形成し、本発明のパターン毎に版深が異なる刷版用凹版３００を作製した（図４
（ｅ）参照）。 Next, the pattern-exposed first photosensitive layer 21a and the pattern-exposed second photosensitive layer 31a are collectively developed with an alkaline developer to form alignment mark openings 52 on the plate base substrate 11, An intaglio 50 having a frame pattern opening 53 and a pixel pattern opening 54 was formed, and an intaglio 300 for printing plate having a different plate depth for each pattern of the present invention was produced (FIG. 4).
(See (e)).

実施例３で得られた刷版用凹版３００のパタン寸法の面内バラツキは±０．５μｍ、画素パターン用開口部の版深は７μｍ、額縁パターン用開口部の版深は３５μｍ、トータルピッチは±２μｍであった。   In-plane variation of the pattern size of the intaglio plate 300 obtained in Example 3 is ± 0.5 μm, the plate depth of the pixel pattern opening is 7 μm, the plate depth of the frame pattern opening is 35 μm, and the total pitch is It was ± 2 μm.

実施例３で得られた刷版用凹版３００を用いて、反転印刷法にて５５０×６５０×０．７ｍｍｔの低膨張ガラス基板（１７３７ガラス：コーニング社製；膨張率：３×１０-6ｃｍ／ｃｍ／℃）からなる被転写基板１２に形成された色パタンのパタン寸法の面内バラツキは±０．５μｍ、画素パタンの中抜けは無く、トータルピッチは±２μｍであった。 Using the intaglio 300 for printing plate obtained in Example 3, a low expansion glass substrate (1737 glass: manufactured by Corning; expansion coefficient: 3 × 10 −6 cm) by reversal printing method. The in-plane variation of the pattern size of the color pattern formed on the transferred substrate 12 composed of / cm / ° C. was ± 0.5 μm, there was no pixel pattern void, and the total pitch was ± 2 μm.

（ａ）〜（ｃ）は、本発明のパターン毎に版深が異なる刷版用凹版の一実施例を示す模式構成断面図である。(A)-(c) is typical structure sectional drawing which shows one Example of the intaglio for printing plates from which plate depth differs for every pattern of this invention. （ａ）〜（ｄ）は、請求項２に係るパターン毎に版深が異なる刷版用凹版１００の製造方法の一実施例の主要工程を示す説明図である。(A)-(d) is explanatory drawing which shows the main processes of one Example of the manufacturing method of the intaglio plate 100 for printing plates from which plate depth differs for every pattern which concerns on Claim 2. FIG. （ａ）〜（ｂ）は、請求項３に係るパターン毎に版深が異なる刷版用凹版２００の製造方法の一実施例の主要工程を示す説明図である。(A)-(b) is explanatory drawing which shows the main processes of one Example of the manufacturing method of the intaglio plate 200 for printing plates from which the plate depth differs for every pattern which concerns on Claim 3. FIG. （ａ）〜（ｅ）は、請求項４に係るパターン毎に版深が異なる刷版用凹版３００の製造方法の一実施例の主要工程を示す説明図である。(A)-(e) is explanatory drawing which shows the main processes of one Example of the manufacturing method of the intaglio 300 for printing plates from which plate depth differs for every pattern which concerns on Claim 4. FIG. （ａ）〜（ｅ）は、本発明のパターン毎に版深が異なる刷版用凹版を用いた反転印刷法の主要工程を示す説明図である。(A)-(e) is explanatory drawing which shows the main processes of the reversal printing method using the intaglio for printing plates from which plate depth differs for every pattern of this invention.

符号の説明Explanation of symbols

１１……刷版ベース基材
１２……被転写基板
２０……第１凹版
２１……第１感光層
２１ａ……パターン露光された第１感光層
２２、３２、４２、５２……アライメントマーク用開口部
２３、３３、４３、５３……額縁パターン用開口部
３０……第２凹版
３１……第２感光層
３１ａ……パターン露光された第２感光層
３４、４４、５４……画素パターン用開口部
４０、５０……凹版
４１……感光層
６０……オフセットシリンダー
６０ａ……インキ被膜が形成されたオフセットシリンダー
６０ｂ……パターンが形成されたオフセットシリンダー
６１……シリンダー胴
６２……オフセットブランケット
７１……インキ被膜
７１ａ……画素パターン
７１ｂ……額縁パターン
７１ｃ……アライメントマーク
１００、２００、３００……アライメントマーク DESCRIPTION OF SYMBOLS 11 ... Plate base base material 12 ... Transfer substrate 20 ... 1st intaglio 21 ... 1st photosensitive layer 21a ... 1st photosensitive layer 22, 32, 42, 52 ... by which pattern exposure was carried out Opening 23, 33, 43, 53 ... Frame pattern opening 30 ... Second intaglio 31 ... Second photosensitive layer 31a ... Pattern-exposed second photosensitive layers 34, 44, 54 ... For pixel pattern Opening 40, 50 ... Intaglio 41 ... Photosensitive layer 60 ... Offset cylinder 60a ... Offset cylinder 60b with ink coating formed ... Offset cylinder 61 with pattern formed ... Cylinder cylinder 62 ... Offset blanket 71 ... Ink coating 71a ... Pixel pattern 71b ... Frame pattern 71c ... Alignment marks 100, 200, 300 ... Alignment mark

Claims (5)

液晶カラーフィルターを反転印刷法により製造する為の刷版用凹版であって、パタンの寸法、形状に応じて凹形状の深さを変えたことを特徴とするパターン毎に版深が異なる刷版用凹版。   An intaglio plate for producing liquid crystal color filters by reversal printing, wherein the depth of the indentation is changed according to the size and shape of the pattern. Intaglio. 少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法。
（ａ）刷版ベース基材上に第１感光層を形成する工程。
（ｂ）前記第１感光層をパターン露光、現像処理して前記刷版ベース基材上に第１凹版を形成する工程。
（ｃ）第１凹版上に第２感光層を形成する工程。
（ｄ）前記第２感光層をパターン露光、現像処理して前記第１凹版上に第２凹版を形成する工程。
（ｅ）上記（ｃ）及び（ｄ）の工程を必要回数繰り返して、パターン毎に版深が異なる刷版用凹版を作製する工程。 The method for producing an intaglio plate for printing plates having different plate depths for each pattern according to claim 1, comprising at least the following steps.
(A) A step of forming a first photosensitive layer on the printing plate base substrate.
(B) A step of pattern-exposing and developing the first photosensitive layer to form a first intaglio on the printing plate base substrate.
(C) A step of forming a second photosensitive layer on the first intaglio.
(D) forming a second intaglio on the first intaglio by pattern exposure and developing the second photosensitive layer.
(E) The process of producing the intaglio plate for printing plates in which plate depth differs for every pattern by repeating the process of said (c) and (d) required number of times. 少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法。
（ａ）刷版ベース基材上に感光層を形成する工程。
（ｂ）前記感光層に版深の異なるパターン毎に露光量を変えたパターン露光を行う工程。（ｃ）前記感光層を現像処理して、パターン毎に版深が異なる刷版用凹版を作製する工程。 The method for producing an intaglio plate for printing plates having different plate depths for each pattern according to claim 1, comprising at least the following steps.
(A) A step of forming a photosensitive layer on the printing plate base substrate.
(B) A step of performing pattern exposure in which the exposure amount is changed for each pattern having a different plate depth on the photosensitive layer. (C) A step of developing the photosensitive layer to produce a printing plate intaglio having a different plate depth for each pattern. 少なくとも以下の工程を具備することを特徴とする請求項１記載のパターン毎に版深が異なる刷版用凹版の製造方法。
（ａ）刷版ベース基材上に第１感光層を形成する工程。
（ｂ）前記第１感光層をパターン露光する工程。
（ｃ）露光された前記第１感光層上に第２感光層を形成する工程。
（ｄ）前記第２感光層をパターン露光する工程。
（ｃ）上記（ｃ）及び（ｄ）の工程を必要回数繰り返す工程。
（ｅ）露光された感光層を一括現像処理して、パターン毎に版深が異なる刷版用凹版を作製する工程。 The method for producing an intaglio plate for printing plates having different plate depths for each pattern according to claim 1, comprising at least the following steps.
(A) A step of forming a first photosensitive layer on the printing plate base substrate.
(B) A step of pattern exposing the first photosensitive layer.
(C) forming a second photosensitive layer on the exposed first photosensitive layer.
(D) A step of pattern-exposing the second photosensitive layer.
(C) A step of repeating the steps (c) and (d) as many times as necessary.
(E) A step of batch-developing the exposed photosensitive layer to produce an intaglio for printing plate having a different plate depth for each pattern. 前記刷版ベース基材とパターン形成用の被転写基板との熱膨張率差が１５×１０-7ｃｍ／ｃｍ／℃以下であることを特徴とする請求項２乃至４のいずれか一項に記載のパターン毎に版深が異なる刷版用凹版の製造方法。 5. The difference in thermal expansion coefficient between the printing plate base substrate and the pattern-formed transfer substrate is 15 × 10 −7 cm / cm / ° C. or less. 5. A method for producing an intaglio plate for printing plates having a different plate depth for each pattern described.
JP2004359499A 2004-12-13 2004-12-13 Intaglio printing plate for machine plate with plate depth different from one another in every pattern Pending JP2006167937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004359499A JP2006167937A (en) 2004-12-13 2004-12-13 Intaglio printing plate for machine plate with plate depth different from one another in every pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004359499A JP2006167937A (en) 2004-12-13 2004-12-13 Intaglio printing plate for machine plate with plate depth different from one another in every pattern

Publications (1)

Publication Number Publication Date
JP2006167937A true JP2006167937A (en) 2006-06-29

Family

ID=36669198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004359499A Pending JP2006167937A (en) 2004-12-13 2004-12-13 Intaglio printing plate for machine plate with plate depth different from one another in every pattern

Country Status (1)

Country Link
JP (1) JP2006167937A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006231827A (en) * 2005-02-28 2006-09-07 Toppan Printing Co Ltd Manufacturing method for intaglio
JP2009274299A (en) * 2008-05-14 2009-11-26 Sony Corp Intaglio for printing, method for manufacturing intaglio for printing, method for manufacturing electronic substrate, and method for manufacturing displaying unit
JP2010000673A (en) * 2008-06-19 2010-01-07 Sumitomo Chemical Co Ltd Method of manufacturing printing plate, printing plate and reversal printing method
JP2012078464A (en) * 2010-09-30 2012-04-19 Toppan Printing Co Ltd Printing method and printing apparatus
DE102010037213B4 (en) * 2009-12-07 2014-07-17 Lg Display Co., Ltd. A method of making a printing block and method of forming a thin film pattern using the same

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614063A (en) * 1984-06-18 1986-01-09 Sakata Shokai Ltd Formation of projection and recess of photosensitive resin layer and light semishielding material and original with stuck material
JPH0279853A (en) * 1988-09-16 1990-03-20 Murakami Screen Kk Photosensitive resin intaglio plate and its production
JPH02132446A (en) * 1988-07-26 1990-05-21 Matsushita Electric Ind Co Ltd Formation of fine resist pattern
JPH0361574A (en) * 1989-07-31 1991-03-18 Toppan Printing Co Ltd Method for printing fine pattern
JPH05241340A (en) * 1992-02-26 1993-09-21 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH05323111A (en) * 1992-05-18 1993-12-07 Toshiba Corp Production of color filter
JPH06202314A (en) * 1993-01-05 1994-07-22 G T C:Kk Printing plate, its production and pattern forming method using the plate
JPH10119455A (en) * 1996-10-17 1998-05-12 Sumitomo Rubber Ind Ltd Printing blanket, its manufacture, and manufacture of color filter using the blanket
JP2000011865A (en) * 1998-06-24 2000-01-14 Fujitsu Ltd Original form for barrier rib transfer engraving press and plasma display panel barrier rib formation method using the same
JP2000289320A (en) * 1999-04-02 2000-10-17 Mitsumura Printing Co Ltd Imaging device
JP2001093816A (en) * 1999-09-24 2001-04-06 Clariant (Japan) Kk Method of forming resist pattern with improved dry- etching strength
JP2002268230A (en) * 2001-03-09 2002-09-18 Asahi Kasei Corp Method and device for manufacturing photosensitive resin letterpress
JP2003029393A (en) * 2001-07-12 2003-01-29 Matsushita Electric Ind Co Ltd Mask, pattern forming method using the same, and lithography
JP2003031132A (en) * 2001-07-12 2003-01-31 Nec Corp Pattern processed object and manufacturing method of the same
JP2004299264A (en) * 2003-03-31 2004-10-28 Mitsui Chemicals Inc Method for manufacturing original printing plate for lithographic printing plate
JP2004310042A (en) * 2002-12-18 2004-11-04 Lg Phillips Lcd Co Ltd Method for manufacturing liquid crystal display element

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614063A (en) * 1984-06-18 1986-01-09 Sakata Shokai Ltd Formation of projection and recess of photosensitive resin layer and light semishielding material and original with stuck material
JPH02132446A (en) * 1988-07-26 1990-05-21 Matsushita Electric Ind Co Ltd Formation of fine resist pattern
JPH0279853A (en) * 1988-09-16 1990-03-20 Murakami Screen Kk Photosensitive resin intaglio plate and its production
JPH0361574A (en) * 1989-07-31 1991-03-18 Toppan Printing Co Ltd Method for printing fine pattern
JPH05241340A (en) * 1992-02-26 1993-09-21 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH05323111A (en) * 1992-05-18 1993-12-07 Toshiba Corp Production of color filter
JPH06202314A (en) * 1993-01-05 1994-07-22 G T C:Kk Printing plate, its production and pattern forming method using the plate
JPH10119455A (en) * 1996-10-17 1998-05-12 Sumitomo Rubber Ind Ltd Printing blanket, its manufacture, and manufacture of color filter using the blanket
JP2000011865A (en) * 1998-06-24 2000-01-14 Fujitsu Ltd Original form for barrier rib transfer engraving press and plasma display panel barrier rib formation method using the same
JP2000289320A (en) * 1999-04-02 2000-10-17 Mitsumura Printing Co Ltd Imaging device
JP2001093816A (en) * 1999-09-24 2001-04-06 Clariant (Japan) Kk Method of forming resist pattern with improved dry- etching strength
JP2002268230A (en) * 2001-03-09 2002-09-18 Asahi Kasei Corp Method and device for manufacturing photosensitive resin letterpress
JP2003029393A (en) * 2001-07-12 2003-01-29 Matsushita Electric Ind Co Ltd Mask, pattern forming method using the same, and lithography
JP2003031132A (en) * 2001-07-12 2003-01-31 Nec Corp Pattern processed object and manufacturing method of the same
JP2004310042A (en) * 2002-12-18 2004-11-04 Lg Phillips Lcd Co Ltd Method for manufacturing liquid crystal display element
JP2004299264A (en) * 2003-03-31 2004-10-28 Mitsui Chemicals Inc Method for manufacturing original printing plate for lithographic printing plate

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006231827A (en) * 2005-02-28 2006-09-07 Toppan Printing Co Ltd Manufacturing method for intaglio
JP2009274299A (en) * 2008-05-14 2009-11-26 Sony Corp Intaglio for printing, method for manufacturing intaglio for printing, method for manufacturing electronic substrate, and method for manufacturing displaying unit
JP4683239B2 (en) * 2008-05-14 2011-05-18 ソニー株式会社 Method for producing printing intaglio, method for producing electric substrate, and method for producing display device
CN101581884B (en) * 2008-05-14 2012-10-03 索尼株式会社 Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device
US8291820B2 (en) * 2008-05-14 2012-10-23 Sony Corporation Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device
JP2010000673A (en) * 2008-06-19 2010-01-07 Sumitomo Chemical Co Ltd Method of manufacturing printing plate, printing plate and reversal printing method
DE102010037213B4 (en) * 2009-12-07 2014-07-17 Lg Display Co., Ltd. A method of making a printing block and method of forming a thin film pattern using the same
US8882953B2 (en) 2009-12-07 2014-11-11 Lg Display Co., Ltd. Method for fabricating cliché, and method for forming thin film pattern by using the same
JP2012078464A (en) * 2010-09-30 2012-04-19 Toppan Printing Co Ltd Printing method and printing apparatus

Similar Documents

Publication Publication Date Title
JP4683239B2 (en) Method for producing printing intaglio, method for producing electric substrate, and method for producing display device
JP2008246829A (en) Printing plate for letterpress reversing offset printing, and its manufacturing method, and displaying apparatus, and manufacturing method of board for displaying apparatus
JP2007076209A (en) Printing plate and printing method
KR100481144B1 (en) Graytone mask producing method, blank for producing graytone mask, and pattern transfer method
JP2009163036A (en) Photomask, method for manufacturing photo spacer, and method for manufacturing color filter substrate
JP2009009058A (en) Color filter substrate, photomask to be used for manufacturing the same, and liquid crystal display
KR20090119358A (en) Method of forming cliche and resist pattern printing apparatus including the same
TWI520857B (en) Cliche and method for preparing the same
US8736991B2 (en) Color filter array and manufacturing method thereof
JP5090265B2 (en) Printing plate manufacturing method, printing plate and reverse printing method
JP2007069553A (en) Manufacturing process and printing process of intaglio
TWI522024B (en) Cliche for offset printing and method for preparing the same
JP2006231827A (en) Manufacturing method for intaglio
JP2006167937A (en) Intaglio printing plate for machine plate with plate depth different from one another in every pattern
JP2007083408A (en) Intaglio for reverse printing
JP2008281594A (en) Liquid crystal display device and its manufacturing method
KR20100072969A (en) Method of fabricating cliche for roll print and method of fabricating liquid crystal display device using thereof
CN106526957B (en) Color membrane substrates and its manufacturing method, display panel
KR101250236B1 (en) Fabrication method for color filter substrate and liquid crystal display device having thereof
US20120224276A1 (en) Color filter array and manufacturing method thereof
JP4369543B2 (en) Color filter and manufacturing method thereof
US7169517B2 (en) Method of fabricating a color filter in liquid crystal display device without using a photo mask
JP4736484B2 (en) Manufacturing method of color filter
JP4968429B2 (en) Manufacturing method of color filter forming substrate for liquid crystal display device
JP4978666B2 (en) Black matrix substrate manufacturing method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071122

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100601

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100608

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100806

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101005

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101206

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110104

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110225

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20121204