JP2006154040A - Surface treatment anti-glare board - Google Patents
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本発明は表面処理防眩板に関し、詳しくは防眩性の基板表面に表面処理膜が被覆されてなる表面処理防眩面を有する表面処理防眩板に関する。 The present invention relates to a surface-treated anti-glare plate, and more particularly to a surface-treated anti-glare plate having a surface-treated anti-glare surface obtained by coating a surface-treated film on an anti-glare substrate surface.
基板(10)の表面(10a)に細かな凹凸を設けて防眩性を付与し、この凹凸により、外光などの写り込みを防止した防眩板は、例えば画像表示装置の最前面に配置される前面板などとして広く用いられており、例えば図１に示すように、基板表面(10a)に、傷付き防止のためのハードコート膜などの表面処理膜(11)を被覆して表面処理防眩面(1a)とした、表面処理防眩板(1)も広く用いられている〔特許文献１：特開２００４−１３７２号公報、特許文献２：特開２００３−３１１８９１号公報〕。 An anti-glare plate that provides anti-glare properties by providing fine irregularities on the surface (10a) of the substrate (10), and prevents the reflection of external light etc. by this irregularities, for example, is placed on the forefront of the image display device For example, as shown in FIG. 1, the substrate surface (10a) is coated with a surface treatment film (11) such as a hard coat film for preventing scratches as shown in FIG. A surface-treated antiglare plate (1) having an antiglare surface (1a) is also widely used [Patent Document 1: Japanese Patent Laid-Open No. 2004-1372, Patent Document 2: Japanese Patent Laid-Open No. 2003-311891].
従来より、このような表面処理防眩板(1)としては、表面処理防眩面(1a)の凹凸が比較的浅くて、６０°光沢度〔Ｇ60(1)〕が１２０グロスを超えるものが使用されており、通常は６０°光沢度〔Ｇ60(10)〕が５０グロスを超える基板表面(10a)に表面処理膜(11)を被覆して製造されていた。 Conventionally, as such a surface-treated antiglare plate (1), the surface-treated antiglare surface (1a) has relatively shallow irregularities and a 60 ° gloss [G 60 (1)] exceeds 120 gloss. In general, the substrate surface (10a) having a 60 ° glossiness [G 60 (10)] of more than 50 gloss is coated with the surface treatment film (11).
最近では、このような表面処理防眩板(1)として、表面処理防眩面(1a)の凹凸がより深くて、より低い６０°光沢度〔Ｇ60(1)〕、具体的には１２０グロス以下の６０°光沢度を示すものが求められている。このような表面処理防眩板(1)を得るには、基板(10)として、表面(10a)の凹凸がより深くて、６０°光沢度〔Ｇ60(10)〕が５０グロス以下のものを用い、これに、基板表面(10a)の凹凸を平滑化させないよう、できるだけ薄い膜厚、通常は３〜４μｍ程度の膜厚で、表面処理膜(11)を被覆すればよい。 Recently, as such a surface-treated antiglare plate (1), the unevenness of the surface-treated antiglare surface (1a) is deeper and lower 60 ° glossiness [G 60 (1)], specifically 120 What has a glossiness of 60 ° below gloss is demanded. In order to obtain such a surface-treated anti-glare plate (1), the substrate (10) has a deep surface (10a) with an uneven surface and a 60 ° gloss [G 60 (10)] of 50 gloss or less. In order to prevent the unevenness of the substrate surface (10a) from being smoothed, the surface treatment film (11) may be coated with a film thickness as thin as possible, usually about 3 to 4 μm.
しかし、表面処理膜(11)は、膜厚に±０．５μｍ以上のムラがあるのが通常であり、基板表面(10a)の６０°光沢度〔Ｇ60(10)〕が５０グロス以下では、この膜厚ムラに起因して、表面処理防眩面(1a)の光沢にムラが生じ易いという問題があった。 However, the surface treatment film (11) usually has a non-uniformity of ± 0.5 μm or more, and when the 60 ° glossiness [G 60 (10)] of the substrate surface (10a) is 50 gloss or less. Due to this unevenness in film thickness, there has been a problem that unevenness is likely to occur in the gloss of the surface-treated antiglare surface (1a).
光沢にムラのない表面処理防眩板(1)を得るには、表面処理膜(11)の膜厚を均一にすればよいが、±０．５μｍ未満の均一な膜厚で表面処理膜(11)を被覆して表面処理防眩板(1)を製造することは意外に困難であり、この傾向は表面処理防眩板(1)の面積が大きくなるほど顕著である。 In order to obtain a surface-treated antiglare plate (1) having no unevenness in gloss, the surface-treated film (11) may be made uniform in thickness, but the surface-treated film (with a uniform film thickness of less than ± 0.5 μm ( It is unexpectedly difficult to produce the surface-treated antiglare plate (1) by covering 11), and this tendency becomes more prominent as the area of the surface-treated antiglare plate (1) increases.
そこで本発明者は、簡便に製造でき、広い面積にわたって均一な光沢を示す表面処理防眩板(1)を開発するべく鋭意検討した結果、基板表面(10a)の６０°光沢度〔Ｇ60(10)〕と表面処理膜(11)の平均膜厚〔ｔ(11)〕との比〔Ｇ60(10)／ｔ(11)〕が７．５グロス／μｍ以下であれば、光沢へ与える影響が小さく、膜厚に±０．５μｍ以上のムラがあっても、均一な光沢の表面処理防眩板(1)と為しうることを見出し、本発明に至った。 Therefore, as a result of intensive studies to develop a surface-treated antiglare plate (1) that can be easily manufactured and exhibits a uniform gloss over a wide area, the present inventors have found that the 60 ° glossiness [G 60 (G 60 ( 10)] and the average film thickness [t (11)] of the surface treatment film (11) [G 60 (10) / t (11)] is 7.5 gloss / μm or less, it gives to gloss The present inventors have found that even if the influence is small and the film thickness has a variation of ± 0.5 μm or more, it can be made as a surface-treated antiglare plate (1) having a uniform gloss.
すなわち本発明は、６０°光沢度〔Ｇ60(10)〕が５０グロス以下の基板表面(10a)に表面処理膜(11)が被覆されてなる表面処理防眩面(1a)を有し、
前記６０°光沢度〔Ｇ60(10)〕と、前記表面処理膜(11)の平均膜厚〔ｔ(11)〕との比〔Ｇ60(10)／ｔ(11)〕が７．５グロス／μｍ以下であることを特徴とする表面処理防眩板(1)を提供するものである。
That is, the present invention has a surface-treated antiglare surface (1a) in which a surface treatment film (11) is coated on a substrate surface (10a) having a 60 ° glossiness [G 60 (10)] of 50 gloss or less,
The ratio [G 60 (10) / t (11)] of the 60 ° glossiness [G 60 (10)] to the average film thickness [t (11)] of the surface treatment film (11) is 7.5. It is intended to provide a surface-treated antiglare plate (1) characterized by having a gloss / μm or less.
本発明によれば、表面処理膜(11)の膜厚にムラがあっても、均一でムラのない光沢を示す表面処理防眩板(1)とすることができる。 According to the present invention, even when the film thickness of the surface treatment film (11) is uneven, the surface-treated antiglare plate (1) showing a uniform and non-uniform gloss can be obtained.
図１に示すように、本発明の表面処理防眩板(1)は、基板(10)の表面(10a)に表面処理膜(11)が被覆されてなる。基板(10)として、通常は樹脂製のものが用いられ、具体的には、吸湿による反りが少ない点で、メタクリル酸メチル−スチレン共重合体樹脂（ＭＳ樹脂）、ポリカーボネート樹脂（ＰＣ樹脂）、環状ポリオレフィン樹脂などの熱可塑性樹脂からなるものが好ましく用いられる。 As shown in FIG. 1, the surface-treated antiglare plate (1) of the present invention is obtained by coating a surface (10a) of a substrate (10) with a surface-treated film (11). As the substrate (10), a resin-made one is usually used. Specifically, in terms of less warpage due to moisture absorption, methyl methacrylate-styrene copolymer resin (MS resin), polycarbonate resin (PC resin), What consists of thermoplastic resins, such as cyclic polyolefin resin, is used preferably.
ＭＳ樹脂とは、メタクリル酸メチルおよびスチレンを共重合させて得られる熱可塑性樹脂であって、メタクリル酸メチル単位とスチレン単位との質量比は通常２０：８０〜８０：２０、好ましくは４０：６０〜７０：３０程度である。ＭＳ樹脂は、メタクリル酸メチル、スチレン以外の単量体単位を含んでいてもよい。 The MS resin is a thermoplastic resin obtained by copolymerizing methyl methacrylate and styrene, and the mass ratio of methyl methacrylate units to styrene units is usually 20:80 to 80:20, preferably 40:60. It is about ~ 70: 30. The MS resin may contain monomer units other than methyl methacrylate and styrene.
基板(10)の表面(10a)には細かな凹凸が形成されており、法線(a)から６０°の方向(Li)から光を入射させたときに、その正反射方向(Lo)から測定される６０°光沢度〔Ｇ60(10)〕は５０グロス以下、好ましくは２５グロス〜４０グロス程度である。 Fine irregularities are formed on the surface (10a) of the substrate (10). When light is incident from a direction (L i ) at 60 ° from the normal (a), the regular reflection direction (L o ), The 60 ° glossiness [G 60 (10)] is 50 gloss or less, preferably about 25 to 40 gloss.
このような６０°光沢度〔Ｇ60(10)〕を示す基板(10)は、例えば表面に凹凸を有するロールを用い、加熱溶融状態でダイから板状に押出された直後の樹脂の表面に、凹凸を設ける押出ロール転写成形法、内面に凹凸を有する金型を用いて樹脂を射出成形する方法、内面に凹凸を有するセルを用いて原料単量体を重合させる注型成形法などの方法により製造することができる。 The substrate (10) having such a 60 ° glossiness [G 60 (10)] is formed on the surface of the resin immediately after being extruded into a plate shape from a die in a heated and melted state using, for example, a roll having irregularities on the surface. , An extrusion roll transfer molding method for providing irregularities, a method for injection molding a resin using a mold having irregularities on the inner surface, a casting molding method for polymerizing raw material monomers using cells having irregularities on the inner surface, etc. Can be manufactured.
基板(10)は、例えば図２に示すように、熱可塑性樹脂(A)に不溶性樹脂粒子(B)を分散させて熱可塑性樹脂組成物(P)とし、これを加熱溶融状態でダイ(D)から押出したのち、表面(10a)を押圧することなく、そのまま冷却させる押出成形方法により製造することもできる。ダイ(D)から板状に押し出された熱可塑性樹脂組成物(P)は、その表面(10a)に不溶性樹脂粒子(B)による細かな凹凸が形成されて、防眩性の基板表面(10a)を形成する。 For example, as shown in FIG. 2, the substrate (10) is obtained by dispersing insoluble resin particles (B) in a thermoplastic resin (A) to obtain a thermoplastic resin composition (P), which is then heated in a molten state to a die (D ) And then extruding from the surface (10a) without pressing the surface (10a). The thermoplastic resin composition (P) extruded in a plate shape from the die (D) has fine irregularities formed by insoluble resin particles (B) on its surface (10a), and the antiglare substrate surface (10a ).
不溶性樹脂粒子(B)とは、熱可塑性樹脂(A)と共に加熱し、熱可塑性樹脂(A)を溶融させても、自らは溶融することなく、粒子状のままで熱可塑性樹脂(A)中に分散しうる樹脂粒子(B)である。不溶性樹脂粒子(B)としては、架橋樹脂粒子が用いることができ、具体的には、基板(10)を構成する樹脂としてＭＳ樹脂を用いた場合には、メタクリル酸メチルおよびスチレンと、ラジカル重合可能な官能基を２個以上有する多官能単量体とを共重合させて得られるものが挙げられる。 The insoluble resin particles (B) are heated together with the thermoplastic resin (A), and even when the thermoplastic resin (A) is melted, it does not melt itself but remains in the particulate form in the thermoplastic resin (A). Resin particles (B) that can be dispersed in As the insoluble resin particles (B), cross-linked resin particles can be used. Specifically, when MS resin is used as the resin constituting the substrate (10), radical polymerization is performed with methyl methacrylate and styrene. Examples thereof include those obtained by copolymerizing a polyfunctional monomer having two or more possible functional groups.
不溶性樹脂粒子(B)の粒子径は、十分な防眩性を発揮できる点で通常１０μｍ以上であり、本発明で規定する６０°光沢度(Ｇ60)を示す防眩性表面処理板(1)が容易に得られる点で、通常２０μｍ以下であり、粒子径の最小値と最大値との差が１０μｍ以下、さらには４μｍ以下であることが好ましい。 The particle diameter of the insoluble resin particles (B) is usually 10 μm or more in that sufficient antiglare properties can be exhibited, and the antiglare surface-treated plate (1) exhibiting 60 ° glossiness (G 60 ) as defined in the present invention. ) Is usually 20 μm or less, and the difference between the minimum and maximum particle diameters is preferably 10 μm or less, and more preferably 4 μm or less.
不溶性樹脂粒子(B)の使用量は、押出条件、特に押出し後の冷却条件により異なるが、例えば基板(10)を構成する樹脂１００質量部あたり５質量部〜１５質量部程度である。 The amount of the insoluble resin particles (B) used varies depending on the extrusion conditions, particularly the cooling conditions after extrusion, but is, for example, about 5 to 15 parts by mass per 100 parts by mass of the resin constituting the substrate (10).
不溶性樹脂粒子(B)は、基板(10)の厚み方向にわたって均一に存在していてもよいが、不溶性樹脂粒子(B)が分散された表面層と、不溶性樹脂粒子(B)を含まないか、または表面層よりも含有量の少ない基材層とを含む多層構造とすることが、不溶性樹脂粒子(B)の使用量を削減できて好ましい。このような多層構造の基板(10)は、例えば不溶性樹脂粒子を分散させた熱可塑性樹脂組成物(P)と、不溶性樹脂粒子を含まない熱可塑性樹脂とを共押出しする多層押出成形法により、２種２層板として製造することができる。 The insoluble resin particles (B) may be present uniformly in the thickness direction of the substrate (10), but the surface layer in which the insoluble resin particles (B) are dispersed and the insoluble resin particles (B) are not included. Alternatively, a multilayer structure including a base material layer having a lower content than the surface layer is preferable because the amount of insoluble resin particles (B) used can be reduced. The substrate (10) having such a multilayer structure is obtained by, for example, a multilayer extrusion molding method in which a thermoplastic resin composition (P) in which insoluble resin particles are dispersed and a thermoplastic resin not containing insoluble resin particles are coextruded. It can be manufactured as a two-type two-layer plate.
表面処理膜(11)は通常、かかる基板表面(10a)に表面処理剤を塗布する方法により被覆される。表面処理剤としては、例えば耐擦傷性塗料が挙げられる。耐擦傷性塗料は紫外線などのエネルギー線を照射されることにより硬化するエネルギー線硬化性のものであってもよいし、加熱されることにより硬化する熱硬化性のものであってもよい。耐擦傷性塗料としては種々のものが知られているが、例えば基板(10)を構成する樹脂としてＭＳ樹脂を用いた場合には、分子中に芳香族環および（メタ）アクリロイルオキシ基を有する硬化性化合物を含有し、芳香族環１個あたりの（メタ）アクリロイルオキシ基の数が３個以上となる割合で存在する耐擦傷性塗料〔特許文献１：特開２００４−１３７２号公報〕、 The surface treatment film (11) is usually coated by a method of applying a surface treatment agent to the substrate surface (10a). Examples of the surface treatment agent include a scratch-resistant paint. The scratch-resistant paint may be an energy ray curable material that cures when irradiated with energy rays such as ultraviolet rays, or may be a thermosetting material that cures when heated. Various scratch-resistant paints are known. For example, when MS resin is used as the resin constituting the substrate (10), the molecule has an aromatic ring and a (meth) acryloyloxy group. A scratch-resistant paint containing a curable compound and present at a ratio of 3 or more (meth) acryloyloxy groups per aromatic ring [Patent Document 1: Japanese Patent Application Laid-Open No. 2004-1372],
分子中に脂環式環および（メタ）アクリロイルオキシ基を有する硬化性化合物と、分子中に３個以上の（メタ）アクリロイルオキシ基を有する硬化性化合物またはそのオリゴマーを含む耐擦傷性塗料〔特許文献２：特開２００３−３１１８９１号公報〕などが好ましく用いられる。なお、（メタ）アクリロイルオキシ基とは、メタクリロイルオキシ基またはアクリロイルオキシ基をいう。かかる耐擦傷性塗料は、ハードコート剤とも呼ばれており、ハードコート剤を塗布することにより、ハードコート膜として表面処理膜(11)を形成することができる。 Scratch resistant paint comprising a curable compound having an alicyclic ring and a (meth) acryloyloxy group in the molecule, and a curable compound having 3 or more (meth) acryloyloxy groups in the molecule or an oligomer thereof [Patent Document 2: Japanese Patent Laid-Open No. 2003-311891] is preferably used. In addition, a (meth) acryloyloxy group means a methacryloyloxy group or an acryloyloxy group. Such a scratch-resistant paint is also called a hard coat agent, and the surface treatment film (11) can be formed as a hard coat film by applying the hard coat agent.
耐擦傷性塗料には、例えば導電性無機化合物の微粒子が分散されていてもよい。かかる微粒子の粒子径は、例えば０．１μｍ以下である〔特許文献１：特開２００４−１３７２号公報、特許文献２：特開２００３−３１１８９１号公報〕。このような微粒子が分散された耐擦傷性塗料を用いることで、帯電防止性の耐擦傷性膜(11)が形成されて、帯電防止性の表面処理防眩板(1)とすることができる。 For example, fine particles of a conductive inorganic compound may be dispersed in the scratch-resistant paint. The particle diameter of such fine particles is, for example, 0.1 μm or less [Patent Document 1: Japanese Patent Laid-Open No. 2004-1372, Patent Document 2: Japanese Patent Laid-Open No. 2003-311891]. By using the scratch-resistant paint in which such fine particles are dispersed, an antistatic scratch-resistant film (11) can be formed, and an antistatic surface-treated antiglare plate (1) can be obtained. .
表面処理剤を基板表面(10a)に塗布する方法は特に限定されるものではなく、通常と同様の方法、例えばバーコート法、ロールコート法、ディッピング法などの塗布方法により塗布することができる。 The method for applying the surface treating agent to the substrate surface (10a) is not particularly limited, and it can be applied by the same method as usual, for example, a coating method such as a bar coating method, a roll coating method or a dipping method.
表面処理剤を塗布した後、表面処理剤に含まれる揮発成分を揮発させて皮膜とし、これを硬化させることにより、表面処理膜(11)を形成することができる。硬化させる方法は、表面処理剤の種類により異なり、エネルギー線硬化性の表面処理剤を用いた場合には、エネルギー線を照射すればよく、エネルギー線の強度や照射時間などは、用いた硬化性表面処理剤の種類、平均膜厚〔ｔ(11)〕などにより適宜選択される。また熱硬化性の表面処理剤を用いた場合には加熱すればよく、加熱時間や加熱温度などは、用いた熱効果性表面処理剤の種類、平均膜厚〔ｔ(11)〕などにより適宜選択される。硬化は、揮発成分を揮発させた後に行ってもよいし、揮発成分の揮発と同時に行ってもよい。 After applying the surface treatment agent, the volatile components contained in the surface treatment agent are volatilized to form a film, which is cured to form the surface treatment film (11). The curing method varies depending on the type of the surface treatment agent. When an energy ray curable surface treatment agent is used, it is sufficient to irradiate the energy beam. The intensity of the energy beam, the irradiation time, etc. It is appropriately selected depending on the type of surface treatment agent, average film thickness [t (11)] and the like. In addition, when a thermosetting surface treatment agent is used, it may be heated, and the heating time and heating temperature are appropriately determined depending on the type of the heat-effective surface treatment agent used, the average film thickness [t (11)], and the like. Selected. Curing may be performed after volatilizing the volatile component, or may be performed simultaneously with volatilization of the volatile component.
表面処理膜(11)は、基板表面(10a)の６０°光沢度〔Ｇ60(10)〕と平均膜厚〔ｔ(11)〕との比〔Ｇ60(10)／ｔ(11)〕が７．５グロス／μｍ以下、好ましくは７．０グロス／μｍ以下、通常は４．５グロス／μｍ以上となるように被覆される。このように表面処理膜(11)を被覆するには、例えば基板(10)として凹凸が深くて６０°光沢度〔Ｇ60(10)〕がより小さなものを用い、表面処理膜(11)の膜厚を厚くすればよい。膜厚を厚くするには、例えばバーコート法、ロールコート法などの方法により表面処理剤を塗布して表面処理膜(11)を形成する場合には、表面処理剤に含まれる溶剤その他の揮発成分の含有量を少なくして粘度を上げてもよいし、防眩性基板(10)と、使用するバーまたはロールとの間の距離を適宜調節して大きくしてもよい。繰り返し表面処理剤を塗布する重ね塗りにより、膜厚を厚くしてもよい。 The surface treatment film (11) has a 60 ° gloss [G 60 (10)] ratio of the substrate surface (10a) to the average film thickness [t (11)] [G 60 (10) / t (11)]. Is 7.5 gloss / μm or less, preferably 7.0 gloss / μm or less, and usually 4.5 gloss / μm or more. In order to cover the surface treatment film (11) in this way, for example, a substrate (10) having a deep unevenness and a smaller 60 ° gloss [G 60 (10)] is used. The film thickness may be increased. In order to increase the film thickness, for example, when the surface treatment film (11) is formed by applying a surface treatment agent by a method such as a bar coating method or a roll coating method, a solvent or other volatile matter contained in the surface treatment agent is used. The component content may be decreased to increase the viscosity, or the distance between the antiglare substrate (10) and the bar or roll to be used may be adjusted appropriately to increase the viscosity. The film thickness may be increased by repetitive coating in which the surface treatment agent is repeatedly applied.
本発明の表面処理防眩板(1)は、表面処理膜(11)の膜厚に±０．５μｍ以上のムラがあっても、光沢度のムラを生じないので、例えば表面処理剤を塗布するという通常の方法において膜厚を厚くするという簡便な方法により表面処理膜(11)を形成しても、光沢度のムラを生じない。 The surface-treated anti-glare plate (1) of the present invention does not cause uneven gloss even if the surface-treated film (11) has a thickness of ± 0.5 μm or more. Even if the surface treatment film (11) is formed by a simple method of increasing the film thickness in the usual method of doing, uneven glossiness does not occur.
本発明の表面処理防眩板(1)は、例えば陰極線管（ＣＲＴ）、液晶表示装置（ＬＣＤ）、プラズマディスプレイパネル（ＰＤＰ）、エレクトロルミネッセンスディスプレイ（ＥＬＤ）、発光ダイオードディスプレイなどの画像表示装置の最前面に配置される前面板として有用である。 The surface-treated antiglare plate (1) of the present invention is used for image display devices such as a cathode ray tube (CRT), a liquid crystal display device (LCD), a plasma display panel (PDP), an electroluminescence display (ELD), and a light emitting diode display. It is useful as a front plate disposed on the forefront.
また、本発明の表面処理防眩板(1)は、図３に示すような、プロジェクションテレビ(2)の最前面に配置される前面板として用いることもできる。プロジェクションテレビ(2)とは、スクリーン(3)の背面側に投影機(4)から画像を映し出して表示する装置である。投影機(4)からの画像は通常、プロジェクションテレビの奥行きを短くするために、反射板(5)により反射されてスクリーン(3)に映し出される。これら投影機(4)および反射板(5)は通常、外光の影響をさけるために、筐体(図示せず)の中に納められている。 The surface-treated antiglare plate (1) of the present invention can also be used as a front plate disposed on the forefront of the projection television (2) as shown in FIG. The projection television (2) is a device that projects and displays an image from the projector (4) on the back side of the screen (3). The image from the projector (4) is usually reflected by the reflector (5) and projected on the screen (3) in order to shorten the depth of the projection television. These projector (4) and reflector (5) are usually housed in a housing (not shown) in order to avoid the influence of external light.
本発明の表面処理防眩板(1)をプロジェクションテレビの前面板として用いる場合には、例えば図４に示すように、プロジェクションテレビのスクリーン(3)を構成するフィルム状のレンチキュラーレンズ(6)を貼合するための支持板(1)として用いることができる。フィルム状レンチキュラーレンズ(6)は通常、表面処理防眩面(1a)とは反対側の面(1b)に貼合される。フィルム状レンチキュラーレンズ(3)側には、通常、これ(3)と間隔を開けてフレネルレンズ(7)が配置される。 When the surface-treated antiglare plate (1) of the present invention is used as a front plate of a projection television, for example, as shown in FIG. 4, a film-like lenticular lens (6) constituting the screen (3) of the projection television is used. It can be used as a support plate (1) for bonding. The film-like lenticular lens (6) is usually bonded to the surface (1b) opposite to the surface-treated antiglare surface (1a). On the film-like lenticular lens (3) side, a Fresnel lens (7) is usually arranged at a distance from this (3).
以下、実施例によって本発明をより詳細に説明するが、本発明は、かかる実施例により限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited by this Example.
なお、各実施例における評価方法は以下のとおりである。
（１）６０°光沢度〔Ｇ60(10)、Ｇ60(1)、グロス〕
ＪＩＳ Ｚ８７４１に準拠して、光沢計〔ミノルタ(株)製、「ＧＭ−２６８」〕を用いて測定した（単位はグロス）。
（２）表面処理膜の平均膜厚〔ｔ(11)、μｍ〕
各実施例で得た防眩性基板(10)に代えて、メタクリル酸メチル単位６０質量％とスチレン単位４０質量％の共重合体〔住友化学(株)製、「スミペックスＨＳ」〕を押出成形して得られ、表面が平滑なＭＳ樹脂押出板を用いた以外は各実施例と同様に操作して、表面処理剤を塗布し、硬化させて表面処理膜(11)を形成し、この表面処理膜(11)の膜厚〔ｔ(11)〕を瞬間マルチ測光システム〔大塚電子(株)製、「「ＭＣＰＤ−２０００」」により測定した（単位はμｍ）。
（３）硬度
スチールウール００００番を荷重５００ｇｆ／ｃｍ2（４９ｋＰａ）で１０回往復させたのちの表面処理膜(11)の傷の有無を目視で判断し、傷がないものを「○」、あったものを「×」とした。
（４）表面抵抗
ＡＳＴＭ Ｄ２５７に準拠して、表面抵抗率計〔東亜電波工業(株)製、「ＳＭ−８２１０」〕を用いて測定した。
（５）密着性
ＪＩＳ Ｋ５４００に準拠して、碁盤目テープ法により表面処理層に設けた碁盤目１００目盛りあたりの剥離数として測定した。
（６）外観
光沢度のムラの有無を目視にて判定した。ムラが見られなかったものを「○」とし、見られたものを「×」とした。
In addition, the evaluation method in each Example is as follows.
(1) 60 ° glossiness [G 60 (10), G 60 (1), gloss]
Based on JIS Z8741, it measured using the gloss meter [Minolta Co., Ltd. make, "GM-268"] (a unit is gross).
(2) Average film thickness of surface treatment film [t (11), μm]
Instead of the antiglare substrate (10) obtained in each Example, a copolymer of 60% by mass of methyl methacrylate and 40% by mass of styrene (“Sumipex HS” manufactured by Sumitomo Chemical Co., Ltd.) was extruded. The surface treatment agent was applied and cured in the same manner as in each example except that an MS resin extruded plate with a smooth surface was used to form a surface treatment film (11). The film thickness [t (11)] of the treated film (11) was measured by an instantaneous multi-photometry system [“MCPD-2000” manufactured by Otsuka Electronics Co., Ltd. (unit: μm).
(3) Hardness Steel wool No. 0000 was reciprocated 10 times with a load of 500 gf / cm 2 (49 kPa). What was there was taken as "x".
(4) Surface resistance It was measured using a surface resistivity meter [manufactured by Toa Denpa Kogyo Co., Ltd., “SM-8210”] according to ASTM D257.
(5) Adhesiveness Based on JIS K5400, it measured as the number of peels per 100 scale grids provided on the surface treatment layer by the grid tape method.
(6) The presence / absence of unevenness in appearance glossiness was visually determined. The case where no unevenness was observed was indicated as “◯”, and the case where unevenness was observed was indicated as “X”.
実施例１
〔防眩性の基板の調製〕
メタクリル酸メチル単位６０質量％とスチレン単位４０質量％の共重合体樹脂〔住友化学(株)製、「スミペックスＨＳ」〕(A)１００質量部に、架橋樹脂粒子〔メタクリル酸メチルおよびスチレンを主成分とし、エチレングリコールジメタクリレート（多官能単量体）を含む単量体の重合体、粒子径は１１μｍ〜１４μｍ、重量平均粒子径１２．５μｍ、屈折率１．５０〕(B)９質量部を加えて得た熱可塑性樹脂組成物(P)を表層とし、上記と同じ共重合体樹脂(A)１００質量部に上記と同じ架橋樹脂粒子(B)１．３質量部を加えて得た熱可塑性樹脂組成物(P)を基材層として、加熱溶融状態で混練しながらダイ(D)から押し出して成形して、２種２層構成〔表層１３０μｍ、層厚み２．０ｍｍ〕で、表面(10a)の６０°光沢度〔Ｇ60(10)〕が３１グロスの基板(10)を得た。
Example 1
[Preparation of antiglare substrate]
Copolymer resin of 60% by mass of methyl methacrylate and 40% by mass of styrene (“SUMIPEX HS”, manufactured by Sumitomo Chemical Co., Ltd.) (A) 100 parts by mass of crosslinked resin particles [mainly methyl methacrylate and styrene. Polymer of monomer containing ethylene glycol dimethacrylate (polyfunctional monomer) as a component, particle diameter is 11 μm to 14 μm, weight average particle diameter is 12.5 μm, refractive index is 1.50] (B) 9 parts by mass Was obtained by adding 1.3 parts by mass of the same crosslinked resin particles (B) as described above to 100 parts by mass of the same copolymer resin (A) as described above. Thermoplastic resin composition (P) as a base material layer, extruded and molded from a die (D) while kneading in a heated and melted state, formed into two types and two layers (surface layer 130 μm, layer thickness 2.0 mm), surface 60 ° gloss of (10a) [G 60 (10)] is 31 gloss of the substrate (10) Obtained.
〔帯電防止耐擦傷性塗料の調製〕
ジペンタエリスリトールヘキサアクリレート〔新中村化学(株)、「ＮＫエステルＡ−９５３０」〕２０質量部、２，２’−ビス（４−アクリロイルオキシジエトキシ）フェニルプロパン−２−プロパノール〔共栄社化学(株)、「ライトアクリレート ＢＰ−４ＥＡ」〕２５質量部、２−メチル−１−プロパノール５０質量部の混合物に、１−ヒドロキシシクロヘキシルフェニルケトン〔チバ・スペシャリティーケミカルズ社、「イルガキュア １８４」、重合開始剤〕１．２５質量部を加えて混合して、耐擦傷性塗料を調製した。
[Preparation of antistatic scratch-resistant paint]
Dipentaerythritol hexaacrylate [Shin Nakamura Chemical Co., Ltd., “NK Ester A-9530”] 20 parts by mass, 2,2′-bis (4-acryloyloxydiethoxy) phenylpropane-2-propanol [Kyoeisha Chemical Co., Ltd. ), “Light acrylate BP-4EA”] in a mixture of 25 parts by mass and 50 parts by mass of 2-methyl-1-propanol, 1-hydroxycyclohexyl phenyl ketone [Ciba Specialty Chemicals, “Irgacure 184”, polymerization initiator 1.25 parts by mass were added and mixed to prepare a scratch-resistant paint.
この耐擦傷性塗料９０質量部に五酸化二アンチモン分散液〔Ｓｂ2Ｏ5、触媒化成工業(株)、「ＥＬＥＣＯＭ ＥＣ−１４」、濃度２０質量％、五酸化二アンチモンの粒子径は２０ｎｍ〜３０ｎｍ〕１０質量部添加して、帯電防止耐擦傷性塗料を得た。 To 90 parts by mass of this scratch-resistant paint, an antimony pentoxide dispersion [Sb 2 O 5 , Catalyst Chemical Industry Co., Ltd., “ELECOM EC-14”, a concentration of 20% by mass, and the particle size of diantimony pentoxide is 20 nm to 30 nm] 10 parts by mass was added to obtain an antistatic scratch-resistant paint.
〔帯電防止耐擦傷性膜の被覆〕
上記で得た基板(10)の表面(10a)に、上記で得た帯電防止耐擦傷性塗料を塗布し、乾燥後、紫外線を照射して硬化させることにより、帯電防止耐擦傷性膜(11)を被覆して、表面処理防眩板(1)を得た。
[Coating of antistatic scratch-resistant film]
By applying the antistatic scratch-resistant paint obtained above to the surface (10a) of the substrate (10) obtained above, drying and irradiating it with ultraviolet rays, the antistatic scratch-resistant film (11 ) To obtain a surface-treated antiglare plate (1).
得られた表面処理防眩板(1)の表面(10a)に形成された表面処理膜(11)の平均膜厚〔ｔ(11)〕は５．１μｍであり、膜厚の振れは±１．０μｍであった。この表面処理防眩板(1)の評価結果を第１表に示す。 The average film thickness [t (11)] of the surface treatment film (11) formed on the surface (10a) of the obtained surface treatment antiglare plate (1) is 5.1 μm, and the film thickness fluctuation is ± 1. 0.0 μm. The evaluation results of this surface-treated antiglare plate (1) are shown in Table 1.
比較例１
帯電防止耐擦傷性塗料の塗布量を少なくした以外は実施例１と同様に操作して、表面処理防眩板(1)を得た。この表面処理防眩板(1)に形成された帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕は３．４μｍであり、膜厚の振れは±１．０μｍであった。評価結果を第１表に示す。
Comparative Example 1
A surface-treated antiglare plate (1) was obtained in the same manner as in Example 1 except that the application amount of the antistatic scratch-resistant paint was reduced. The average film thickness [t (11)] of the antistatic scratch-resistant film (11) formed on this surface-treated antiglare plate (1) was 3.4 μm, and the film thickness fluctuation was ± 1.0 μm. It was. The evaluation results are shown in Table 1.
実施例２
実施例１で用いた基板(10)に代えて、実施例１と同様に操作して得られ、表面(10)の６０°光沢度〔Ｇ60(10)〕が２９グロスの基板(10)を用いた以外は実施例１と同様に操作することにより、帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕が５．１μｍであり、膜厚の振れが±０．１μｍである帯電防止耐擦傷性膜(11)で被覆された表面処理防眩板(1)を得た。評価結果を第１表に示す。
Example 2
Instead of the substrate (10) used in Example 1, the substrate (10) obtained by operating in the same manner as in Example 1 and having a 60 ° gloss [G 60 (10)] of the surface (10) of 29 gloss The average film thickness [t (11)] of the antistatic scratch-resistant film (11) is 5.1 μm and the film thickness fluctuation is ± 0. A surface-treated antiglare plate (1) coated with an antistatic scratch-resistant film (11) having a thickness of 1 μm was obtained. The evaluation results are shown in Table 1.
比較例２
帯電防止耐擦傷性塗料の塗布量を少なくした以外は実施例２と同様に操作して、表面処理防眩板(1)を得た。この表面処理防眩板(1)に形成された帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕は３．４μｍであり、膜厚の振れは±１．０μｍであった。評価結果を第１表に示す。
Comparative Example 2
A surface-treated antiglare plate (1) was obtained in the same manner as in Example 2 except that the coating amount of the antistatic scratch-resistant paint was reduced. The average film thickness [t (11)] of the antistatic scratch-resistant film (11) formed on this surface-treated antiglare plate (1) was 3.4 μm, and the film thickness fluctuation was ± 1.0 μm. It was. The evaluation results are shown in Table 1.
実施例３
実施例１で用いた基板(10)に代えて、実施例１と同様に操作して得られ、表面(10)の６０°光沢度〔Ｇ60(10)〕が２８グロスの基板(10)を用いた以外は実施例１と同様に操作することにより、帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕が５．１μｍであり、膜厚の振れが±０．１μｍである帯電防止耐擦傷性膜(11)で被覆された表面処理防眩板(1)を得た。評価結果を第１表に示す。
Example 3
Instead of the substrate (10) used in Example 1, the substrate (10) obtained by operating in the same manner as in Example 1 and having a 60 ° gloss [G 60 (10)] of the surface (10) of 28 gloss The average film thickness [t (11)] of the antistatic scratch-resistant film (11) is 5.1 μm and the film thickness fluctuation is ± 0. A surface-treated antiglare plate (1) coated with an antistatic scratch-resistant film (11) having a thickness of 1 μm was obtained. The evaluation results are shown in Table 1.
比較例３
帯電防止耐擦傷性塗料の塗布量を少なくした以外は実施例３と同様に操作して、表面処理防眩板(1)を得た。この表面処理防眩板(1)に形成された帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕は３．４μｍであり、膜厚の振れは±１．０μｍであった。評価結果を第１表に示す。
Comparative Example 3
A surface-treated antiglare plate (1) was obtained in the same manner as in Example 3 except that the application amount of the antistatic scratch-resistant paint was reduced. The average film thickness [t (11)] of the antistatic scratch-resistant film (11) formed on this surface-treated antiglare plate (1) was 3.4 μm, and the film thickness fluctuation was ± 1.0 μm. It was. The evaluation results are shown in Table 1.
実施例４
実施例１で用いた基板(10)に代えて、実施例１と同様に操作して得られ、表面(10)の６０°光沢度〔Ｇ60(10)〕が２７グロスの基板(10)を用いた以外は実施例１と同様に操作することにより、帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕が５．１μｍであり、膜厚の振れが±０．１μｍである帯電防止耐擦傷性膜(11)で被覆された表面処理防眩板(1)を得た。評価結果を第１表に示す。
Example 4
Instead of the substrate (10) used in Example 1, the substrate (10) obtained by operating in the same manner as in Example 1 and having a 60 ° gloss [G 60 (10)] of the surface (10) of 27 gloss The average film thickness [t (11)] of the antistatic scratch-resistant film (11) is 5.1 μm and the film thickness fluctuation is ± 0. A surface-treated antiglare plate (1) coated with an antistatic scratch-resistant film (11) having a thickness of 1 μm was obtained. The evaluation results are shown in Table 1.
比較例３
帯電防止耐擦傷性塗料の塗布量を少なくした以外は実施例３と同様に操作して、表面処理防眩板(1)を得た。この表面処理防眩板(1)に形成された帯電防止耐擦傷性膜(11)の平均膜厚〔ｔ(11)〕は３．４μｍであり、膜厚の振れは±１．０μｍであった。評価結果を第１表に示す。
Comparative Example 3
A surface-treated antiglare plate (1) was obtained in the same manner as in Example 3 except that the application amount of the antistatic scratch-resistant paint was reduced. The average film thickness [t (11)] of the antistatic scratch-resistant film (11) formed on this surface-treated antiglare plate (1) was 3.4 μm, and the film thickness fluctuation was ± 1.0 μm. It was. The evaluation results are shown in Table 1.
第 １ 表
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
基板(10) 表面処理防眩板(1) G60(10)/t(11)
G60(10) t(11) G60(1) 硬度 表面抵抗 密着性 外観
(グロス) (μm) (グロス) (Ω／□) (グロス/μｍ)
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
実施例１ 30〜31 5.1 78〜103 ○ 1.0×1012 ０ ○ 5.3
比較例１ 30〜31 3.4 63〜 92 × 1.0×1012 ０ × 9.1
実施例２ 29 5.1 91〜 99 ○ 1.0×1012 ０ ○ 5.7
比較例２ 29 3.4 58〜 92 × 1.0×1012 ０ × 8.5
実施例３ 28 5.1 93〜 98 ○ 1.0×1012 ０ ○ 5.5
比較例３ 28 3.4 55〜 93 × 1.0×1012 ０ × 8.2
実施例４ 27 5.1 88〜101 ○ 1.0×1012 ０ ○ 5.3
比較例４ 27 3.4 53〜 88 × 1.0×1012 ０ × 7.9
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
Table 1
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
Substrate (10) Surface treatment anti-glare plate (1) G 60 (10) / t (11)
G 60 (10) t (11) G 60 (1) Hardness Surface resistance Adhesion Appearance
(Gloss) (μm) (Gloss) (Ω / □) (Gloss / μm)
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
Example 1 30-31 5.1 78-103 ○ 1.0 × 10 12 0 ○ 5.3
Comparative Example 1 30~31 3.4 63~ 92 × 1.0 × 10 12 0 × 9.1
Example 2 29 5.1 91-99 ○ 1.0 × 10 12 0 ○ 5.7
Comparative Example 2 29 3.4 58~ 92 × 1.0 × 10 12 0 × 8.5
Example 3 28 5.1 93-98 ○ 1.0 × 10 12 0 ○ 5.5
Comparative Example 3 28 3.4 55~ 93 × 1.0 × 10 12 0 × 8.2
Example 4 27 5.1 88-101 ○ 1.0 × 10 12 0 ○ 5.3
Comparative Example 4 27 3.4 53~ 88 × 1.0 × 10 12 0 × 7.9
━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━
１：表面処理防眩板（支持板）
1a：表面処理防眩面 1b：反対面
10：基板 10a:基板表面
11：表面処理層 ｔ(11)：平均膜厚
ａ：法線
２：プロジェクションテレビ
３：スクリーン ４：投影機 ５：反射板
６：フィルム状レンチキュラーレンズ ７：フレネルレンズ
Ｐ：熱可塑性樹脂組成物
Ａ：熱可塑性樹脂 Ｂ：不溶性樹脂粒子
1: Surface treatment anti-glare plate (support plate)
1a: Surface treatment antiglare
10:
11: Surface treatment layer t (11): Average film thickness a: Normal 2: Projection television 3: Screen 4: Projector 5: Reflector 6: Film-like lenticular lens 7: Fresnel lens P: Thermoplastic resin composition A : Thermoplastic resin B: Insoluble resin particles
Claims (1)
前記６０°光沢度〔Ｇ60(10)〕と、前記表面処理膜(11)の平均膜厚〔ｔ(11)〕との比〔Ｇ60(10)／ｔ(11)〕が７．５グロス／μｍ以下であることを特徴とする表面処理防眩板(1)。 A surface-treated antiglare surface (1a) in which a surface treatment film (11) is coated on a substrate surface (10a) having a 60 ° gloss [G 60 (10)] of 50 gloss or less,
The ratio [G 60 (10) / t (11)] of the 60 ° glossiness [G 60 (10)] to the average film thickness [t (11)] of the surface treatment film (11) is 7.5. A surface-treated antiglare plate (1) characterized by a gloss / μm or less.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5945084B1 (en) * | 2015-11-27 | 2016-07-05 | ダイアモールディング株式会社 | Front panel manufacturing method |
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| JP2005345983A (en) * | 2004-06-07 | 2005-12-15 | Nitto Denko Corp | Glare-proof antireflection film, optical element and image display device |
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| JPH0798414A (en) * | 1993-04-15 | 1995-04-11 | Seiko Epson Corp | Polarizing plate and production of polarizing plate |
| JP2003307735A (en) * | 1997-09-25 | 2003-10-31 | Sharp Corp | Liquid crystal display device |
| JP2004326137A (en) * | 1997-09-25 | 2004-11-18 | Sharp Corp | Liquid crystal display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5945084B1 (en) * | 2015-11-27 | 2016-07-05 | ダイアモールディング株式会社 | Front panel manufacturing method |
| CN106842380A (en) * | 2015-11-27 | 2017-06-13 | Dia成型株式会社 | The manufacture method of front panel |
| CN106842380B (en) * | 2015-11-27 | 2018-05-11 | Dia成型株式会社 | The manufacture method of front panel |
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