JP2006149156A - Electrostatic attractor, and transfer method of sheet type attracted material using its electrostatic attractor - Google Patents

Electrostatic attractor, and transfer method of sheet type attracted material using its electrostatic attractor Download PDF

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JP2006149156A
JP2006149156A JP2004339077A JP2004339077A JP2006149156A JP 2006149156 A JP2006149156 A JP 2006149156A JP 2004339077 A JP2004339077 A JP 2004339077A JP 2004339077 A JP2004339077 A JP 2004339077A JP 2006149156 A JP2006149156 A JP 2006149156A
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electrode
electrostatic
insulating material
strip
electrostatic chuck
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JP4866543B2 (en
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Kinya Miyashita
欣也 宮下
Hiroshi Fujisawa
博 藤澤
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CREATIVE TECHNOLOGY KK
Creative Technology Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrostatic attractor by which attracted materials of each kind of sheet types are evenly and securely attracted with good flatness, and which is transferred with no tension applied to the sheet type attracted materials, and to provide a transfer method of the sheet type attracted materials by which the materials are evenly and securely attracted and transferred with good flatness, without applying extra tension to the sheet type attracted materials, and without causing wrinkles, distortions, rubs, tears or the like. <P>SOLUTION: In the electrostatic attractor X, an electrostatic chuck having an electrode member is provided on an outer peripheral surface of a columnar or a cylindrical support, and the electrostatic chuck forms an attracting face which attracts the attracted materials, wherein the electrode member includes a first electrode and a second electrode to which voltages of different polarities are applied, and an insulating material provided between the first electrode and the second electrode. In the transfer method of the sheet type adsorbed materials, the electrostatic attractor X is used, and the attracted materials are transferred while attracting the sheet type attracted materials on at least a part of the attracting face. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明は、柱状又は筒状の支持体の外周面に静電チャックを設けた静電吸着体と、この静電吸着体を用いてシート状の被吸着物を移送する移送方法に関する。   The present invention relates to an electrostatic attraction body provided with an electrostatic chuck on an outer peripheral surface of a columnar or cylindrical support, and a transfer method for transferring a sheet-shaped object to be adsorbed using the electrostatic attraction body.

近年、フラットパネルディスプレイが注目を集めており、液晶やプラズマディスプレイ等が急速に市場を拡大していると共に、有機EL(Electroluminescence)やFED(Filed Emission Display)等の次世代フラットパネルディスプレイの候補と呼ばれる技術の研究・開発も盛んに行われている。
例えば有機ELは、液晶と比べて高輝度、かつ、高コントラストであり、また、有機EL自身が発光する自発光型であるという点などから液晶より優れた素性を有する。しかしながら、有機EL素子を製造する上での課題は多く、そのひとつとして、有機ELディスプレイを安価に効率良く量産するための技術開発が望まれている。
In recent years, flat panel displays have been attracting attention, and liquid crystal displays and plasma displays are rapidly expanding the market, as well as candidates for next-generation flat panel displays such as organic EL (Electroluminescence) and FED (Filed Emission Display). Research and development of the so-called technology is also actively conducted.
For example, the organic EL has higher brightness and higher contrast than the liquid crystal, and has characteristics superior to the liquid crystal in that it is a self-luminous type that emits light. However, there are many problems in manufacturing an organic EL element, and as one of them, technical development for efficiently mass-producing organic EL displays at low cost is desired.

これまで、プラスチックフィルム等の大面積の基板に対しロールツーロール方式でフレキシブル有機EL素子用の陰極や発光層のパターニングを行う方法(例えば特許文献1参照)や、ITO薄膜よりなる透明電極を形成した透明高分子シートを工程の前後のロールで巻き取って移動させながら正孔輸送層や電子輸送層等を蒸着させる方法(例えば特許文献2参照)が提案されている。これらの方法によれば、有機EL素子を連続的に大量に製造することが可能となる。   Up to now, a method of patterning a cathode and a light emitting layer for a flexible organic EL element on a large area substrate such as a plastic film by a roll-to-roll method (for example, see Patent Document 1), or forming a transparent electrode made of an ITO thin film A method of depositing a hole transport layer, an electron transport layer, or the like while winding and moving the resulting transparent polymer sheet with a roll before and after the process has been proposed (for example, see Patent Document 2). According to these methods, it becomes possible to manufacture a large number of organic EL elements continuously.

しかしながら、ロールツーロール方式の場合には、ローラーのニップの調整が非常に重要となり、この調整が不十分であるとプラスチックフィルム基板にしわが生じたり、場合によっては製造工程中でフィルム基板が破ける等の問題を引き起こすおそれがある。特にプラスチックフィルム基板の厚みが薄くなるにつれて、これらの問題は顕著になる。また、上記のような大量生産用の連続工程中には多数のローラーが存在するため、これらのローラーのニップ調整には多大な労力、時間及びコストを必要とし、製造におけるノウハウとして高い技術力が必要とされる。
ローラーに高分子シートを巻き取りながら所定の蒸着を行っていく方法の場合には、蒸着ターゲットとなる高分子シートの部位において、高分子シートが均一、かつ、平坦性良く保持されている必要がある。この際、高分子シートの幅方向に対しテンションが均一にかかるように調整されていないと、高分子シートにしわや歪みが生じてしまい、蒸着を正確、かつ、確実に行うことができなくなる。実際には高分子シート自体の膜厚が不均一であったりするなどして、これらの高分子シートに均一にテンションをかけることは非常に困難である。特にシート幅が広いものや、高分子シートの厚みが薄いものなどについてはこの問題は顕著になり、最悪の場合には高分子シートがやぶけてしまうこともある。また、巻き取る速度調整が適切でないと、上記の問題のほか、高分子シートの擦れによるトラブルを引き起こすおそれもある。更には高分子シートの材料の選定、シートの幅や厚みに制限がでてくる。
However, in the roll-to-roll system, it is very important to adjust the nip of the roller. If this adjustment is insufficient, the plastic film substrate may be wrinkled or the film substrate may be broken during the manufacturing process. It may cause problems such as. In particular, as the thickness of the plastic film substrate becomes thinner, these problems become more prominent. In addition, since there are a large number of rollers in the continuous process for mass production as described above, the nip adjustment of these rollers requires a great deal of labor, time and cost, and has high technical capabilities as know-how in manufacturing. Needed.
In the case of a method of performing predetermined vapor deposition while winding the polymer sheet around a roller, the polymer sheet needs to be held uniformly and with good flatness at the site of the polymer sheet to be the vapor deposition target. is there. At this time, if the tension is not uniformly applied in the width direction of the polymer sheet, the polymer sheet is wrinkled or distorted, and the deposition cannot be performed accurately and reliably. Actually, it is very difficult to apply a uniform tension to the polymer sheets because the thickness of the polymer sheets themselves is not uniform. In particular, this problem becomes remarkable when the sheet width is wide or the polymer sheet is thin. In the worst case, the polymer sheet may be blurred. In addition, if the winding speed adjustment is not appropriate, in addition to the above problems, there is a risk of causing trouble due to rubbing of the polymer sheet. Furthermore, there are restrictions on the selection of the polymer sheet material and the sheet width and thickness.

ところで、これらの方法で用いられるプラスチックフィルム基板や透明高分子シートについては、あらかじめその表面にITO膜がパターニングされている必要があり、ITO膜をフィルム上に形成する際には一般に200℃程度の高温になる。そのため、用いるフィルムの種類によっては、のび、ゆがみ、しわの発生等が問題になり、これらITO膜の形成の際にも、その工程中でのフィルムにかかるテンションの調整やフィルムの移送速度の設定等が非常に重要となり、調整のための労力、時間、コスト等が必要となるほか、ノウハウとして高い技術力も要求される。   By the way, about the plastic film substrate and transparent polymer sheet used in these methods, an ITO film needs to be patterned on the surface in advance, and when the ITO film is formed on the film, it is generally about 200 ° C. It becomes hot. Therefore, depending on the type of film used, there are problems such as the occurrence of spread, distortion, and wrinkles. Even when these ITO films are formed, the tension applied to the film in the process and the setting of the film transfer speed are set. Etc. are very important, and labor, time, and cost for adjustment are required, and high technical skills are also required as know-how.

一方、液晶やプラズマディスプレイ等のフラットパネルディスプレイのみならず、携帯電話、パソコン、デジタルカメラ等の様々な電気機器や電子機器では、近時特に小型化・薄型化が共通して求められる。これらの製品においては、電子回路がパターニングされたフレキシブルプリント基板が大量に使用されている。これらのフレキシブルプリント基板を形成する銅張り積層板についてもますます薄型化が進み、厚さ20μm前後、場合によってはそれ以下の厚みのものが製造されている。このような銅張り積層板の製造においては、厚さ10μm程度、場合によってはそれ以下の厚みの銅箔やポリイミドフィルムがローラー搬送によって各種工程間を移送されため、これらの銅箔やポリイミドフィルムはしわやゆがみの発生がないようにローラー上で均一、かつ、平坦に保持されることが重要となる。銅箔やポリイミドフィルム自体には、適切なテンションがかかるように調整される必要があるが、この調整が適切でないと余計なテンションがかかって銅箔やポリイミドフィルムにしわやゆがみが生じたり、最悪の場合には破けてしまうこともある。これらのテンションの調整や移送速度の設定等には多大な労力、コスト、時間等が要求されるほか、ノウハウとして高い技術力が必要となる。
WO01/05194 A1パンフレット 特開平11−31586号公報
On the other hand, not only flat panel displays such as liquid crystals and plasma displays, but also various electric and electronic devices such as mobile phones, personal computers, and digital cameras are recently required to be particularly small and thin. In these products, a large amount of flexible printed circuit boards on which electronic circuits are patterned are used. The copper-clad laminates that form these flexible printed boards are also becoming increasingly thinner, and a thickness of about 20 μm or less is sometimes produced. In the production of such a copper-clad laminate, a copper foil or polyimide film having a thickness of about 10 μm or less is sometimes transferred between various processes by roller conveyance. It is important that the roller is kept uniform and flat so that wrinkles and distortion do not occur. The copper foil or polyimide film itself needs to be adjusted so that appropriate tension is applied, but if this adjustment is not appropriate, excessive tension will be applied and the copper foil or polyimide film will be wrinkled or distorted. In the case of, it may be broken. Adjustment of these tensions, setting of the transfer speed, etc. require a great deal of labor, cost, time, etc., as well as high technical skills as know-how.
WO01 / 05194 A1 brochure JP-A-11-31586

そこで、本発明者らは、フレキシブル有機EL素子の連続製造で用いられる高分子フィルム、銅張り積層板を形成するための銅箔やポリイミドフィルム、液晶ディスプレイ等に用いられる偏光フィルム、光を拡散するためのフィルム、フィルムコンデンサの製造に用いられるフィルム、導電性樹脂フィルム、接着テープのフィルム、表面保護のためのフィルム、マスキングテープのフィルム、フレキシブルプリント基板のフィルム、包装用のフィルム、鏡などに使用される偏向・反射防止のフィルム、写真用フィルム、グラビア印刷の対象となるフィルム等の各種シート状のものをしわ、ゆがみ、擦れ等の発生ややぶけの問題を解消でき、かつ、ローラー調整等に要する労力等を可及的に低減することができる移送手段について鋭意検討した結果、柱状又は筒状の支持体の外周面に静電チャックを設けた静電吸着体を用いることによって、これらの問題を全て解決することができることを見出し、本発明を完成した。   Therefore, the present inventors diffused light, a polymer film used in continuous production of flexible organic EL elements, a copper film or a polyimide film for forming a copper-clad laminate, a polarizing film used in a liquid crystal display, etc. Film, film used for manufacturing film capacitors, conductive resin film, adhesive tape film, surface protection film, masking tape film, flexible printed circuit board film, packaging film, mirror, etc. Various wrinkled, distorted, rubbing, and blurring problems can be solved, and roller adjustment, etc. Eagerly examined the means of transportation that can reduce the labor required for the work as much as possible Fruit, by using the electrostatic chuck body provided an electrostatic chuck on the outer peripheral surface of a columnar or cylindrical support, found that it is possible to solve all these problems, the present invention has been completed.

従って、本発明の目的は、各種シート状の被吸着物を均一に、かつ、平坦性良く確実に吸着することができて、これらのシート状の被吸着物に対してテンションをかけずに移送することができる静電吸着体を提供することにある。
また、本発明の別の目的は、各種シート状の被吸着物に対して余計なテンションをかけずにしわ、ゆがみ、こすれ、やぶけ等の問題を発生することなく、均一に平坦性良く確実に吸着して移送することができるシート状被吸着物の移送方法を提供することにある。
Accordingly, the object of the present invention is to be able to adsorb various sheet-like objects to be adsorbed uniformly and with good flatness, and to transfer these sheet-like objects without applying tension. It is in providing the electrostatic attraction body which can do.
Another object of the present invention is to ensure uniform and flatness without causing problems such as wrinkles, distortion, rubbing, and blurring without applying extra tension to various sheet-like objects to be adsorbed. It is an object of the present invention to provide a method for transferring a sheet-like adsorbent that can be adsorbed and transferred onto a sheet.

すなわち、本発明は、互いに極性の異なる電圧が印加される第一電極及び第二電極と、これら第一電極と第二電極との間に設けられる電極間絶縁材とからなる電極部材を有した静電チャックが柱状又は筒状の支持体の外周面に設けられ、この静電チャックが被吸着物を吸着する吸着面を形成する、静電吸着体である。
また、本発明は、上記静電吸着体を用い、吸着面の少なくとも一部にシート状の被吸着物を吸着しながらこの被吸着物を移送する、シート状被吸着物の移送方法である。
That is, the present invention has an electrode member composed of a first electrode and a second electrode to which voltages having different polarities are applied, and an interelectrode insulating material provided between the first electrode and the second electrode. An electrostatic chuck is provided with an electrostatic chuck provided on the outer peripheral surface of a columnar or cylindrical support, and the electrostatic chuck forms an attracting surface for attracting an object to be attracted.
In addition, the present invention is a method for transferring a sheet-shaped object to be adsorbed, wherein the object to be adsorbed is transferred while adsorbing the sheet-shaped object to be adsorbed on at least a part of the adsorption surface using the electrostatic adsorbent.

本発明における支持体は、柱状又は筒状のものであればよく、例えばその長さについては、移送する吸着物の移送方向に対する横幅にあわせて適宜設計することができ、また、支持体の断面の外周形状については円状、三角形、四角形等の多角形状等であってもよい。断面の外周形状については、好ましくは円状である円柱状又は円筒状の支持体であるのがよく、この円柱状又は円筒状の支持体の外周面に静電チャックを設けて形成する静電吸着体を静電吸着ローラーとするのが好ましい。   The support in the present invention may be a columnar or cylindrical one. For example, the length of the support can be appropriately designed according to the lateral width of the adsorbate to be transferred in the transfer direction. The outer peripheral shape may be a circular shape, a polygonal shape such as a triangle, a quadrangle, or the like. The outer peripheral shape of the cross section is preferably a circular columnar or cylindrical support, and an electrostatic chuck formed by providing an electrostatic chuck on the outer peripheral surface of the columnar or cylindrical support. The adsorbent is preferably an electrostatic attraction roller.

上記支持体の材質についてはアルミニウム又はアルミニウム合金、銅、ステンレス等からなる金属製であってもよく、アクリル、エポキシ、ABS、FRP等の樹脂製であってもよく、さらには上記金属とセラミックの複合材、あるいは前記金属とセラミックもしくは炭素繊維との複合材であってもよい。また、この支持体の内部には冷却水、熱水、冷却ガス等の熱媒体を流す管路を設けてもよい。このような熱媒体が流れる管路を有することで、吸着物を吸着して移送する際、同時に吸着物を冷却したり、恒温に維持したりすることが可能となる。更には、この支持体には回転を可能とするためのモーターやギヤボックス等からなる駆動伝達部を連結してもよく、また、外周面に設けられた静電チャックに対し電圧を供給するための手段や、ロータリージョイントやスリップリング等を設けるようにしてもよい。   The material of the support may be made of metal such as aluminum or aluminum alloy, copper, stainless steel, may be made of resin such as acrylic, epoxy, ABS, FRP, and further, the metal and ceramic. It may be a composite material, or a composite material of the metal and ceramic or carbon fiber. Further, a pipe line through which a heat medium such as cooling water, hot water, or cooling gas flows may be provided inside the support. By having such a pipe line through which the heat medium flows, it is possible to simultaneously cool the adsorbate or maintain it at a constant temperature when adsorbed and transferred. Further, the support may be connected with a drive transmission unit composed of a motor, a gear box or the like for enabling rotation, and for supplying a voltage to the electrostatic chuck provided on the outer peripheral surface. These means, a rotary joint, a slip ring, etc. may be provided.

上記支持体の外周面に設けられる静電チャックについては、互いに極性の異なる電圧が印加される第一電極及び第二電極と、これら第一電極と第二電極との間に設けられる電極間絶縁材とからなる電極部材を有し、この静電チャックが支持体の外周面に吸着面を形成することができるものであればよい。好ましくは静電吸着体の長さ方向及び外周方向に均一な吸着力(静電引力)を発生することができるように、上記第一電極と第二電極とが配置されて電極部材を形成するのがよい。このような好ましい電極部材を形成するための第一電極と第二電極の配置例について、以下で具体的に説明する。   For the electrostatic chuck provided on the outer peripheral surface of the support, a first electrode and a second electrode to which voltages having different polarities are applied, and interelectrode insulation provided between the first electrode and the second electrode As long as it has an electrode member made of a material and this electrostatic chuck can form a suction surface on the outer peripheral surface of the support, it is only necessary. Preferably, the first electrode and the second electrode are arranged to form an electrode member so that a uniform attracting force (electrostatic attractive force) can be generated in the length direction and the outer peripheral direction of the electrostatic attracting body. It is good. An arrangement example of the first electrode and the second electrode for forming such a preferable electrode member will be specifically described below.

先ず、第一電極と第二電極との少なくとも一部が同一面内に存在する場合の配置例として、次のような好ましい電極部材を挙げることができる。
すなわち、第一電極及び第二電極がそれぞれ帯状に形成された複数の帯状電極部を有し、これら第一電極の帯状電極部と第二電極の帯状電極部とが互いに所定の隙間xを有して支持体の長さ方向に交互に配列されると共に、この隙間xには電極間絶縁材を充たして電極部材を形成するのがよい。また、上記第一電極の帯状電極部と第二電極の帯状電極部とが互いに所定の隙間xを有して支持体の外周方向に交互に配列されると共に、この隙間xには電極間絶縁材を充たして電極部材を形成するのがよい。更には、第一電極及び第二電極がそれぞれ所定の幅を有する帯状電極であり、これら第一電極の帯状電極と第二電極の帯状電極とが互いに所定の隙間xを有して支持体の長さ方向にらせん状に配列されると共に、この隙間xには電極間絶縁材を充たして電極部材を形成するのがよい。
First, the following preferable electrode members can be mentioned as an arrangement example when at least a part of the first electrode and the second electrode are present in the same plane.
That is, the first electrode and the second electrode each have a plurality of strip electrode portions formed in a strip shape, and the strip electrode portion of the first electrode and the strip electrode portion of the second electrode have a predetermined gap x from each other. Then, it is preferable that the electrode members are formed by alternately arranging the gap x with an interelectrode insulating material while being alternately arranged in the length direction of the support. Further, the strip electrode portion of the first electrode and the strip electrode portion of the second electrode are alternately arranged in the outer peripheral direction of the support with a predetermined gap x, and the gap x is insulated between the electrodes. The electrode member may be formed by filling a material. Furthermore, the first electrode and the second electrode are band-shaped electrodes each having a predetermined width, and the band-shaped electrode of the first electrode and the band-shaped electrode of the second electrode have a predetermined gap x between each other and the support body. It is preferable that the electrode members are formed by arranging the gaps x in a spiral shape and filling the gap x with an interelectrode insulating material.

上記のように第一電極と第二電極との少なくとも一部が同一面内に存在する場合、第一電極と第二電極との隙間x(電極間距離)については、好ましくは0.5mm〜2mmの範囲であるのがよい。この隙間xが0.5mmより小さいと電極間での放電のおそれがあり、反対に2mmより大きくなると電極間に発生する静電引力が小さくなって優れた吸着力を発揮できなくなるおそれがある。   When at least a part of the first electrode and the second electrode is present in the same plane as described above, the gap x (interelectrode distance) between the first electrode and the second electrode is preferably 0.5 mm to It should be in the range of 2 mm. If the gap x is smaller than 0.5 mm, there is a risk of electric discharge between the electrodes. Conversely, if the gap x is larger than 2 mm, the electrostatic attractive force generated between the electrodes may be reduced and an excellent attractive force may not be exhibited.

また、上記第一電極と第二電極との隙間xを充たす電極間絶縁材については、例えばポリイミド、ポリアミドイミド、ポリエステル、ポリエチレンテレフタレート、エポキシ、及びアクリルから選ばれた1種又は2種以上の樹脂であってもよく、酸化アルミニウム、窒化アルミニウム、炭化珪素、窒化珪素、ジルコニア及びチタニアから選ばれた1種又は2種以上のセラミックスであってもよい。耐絶縁性や化学的耐性の観点から好ましくはポリイミドであるのがよい。   The interelectrode insulating material that fills the gap x between the first electrode and the second electrode is, for example, one or more resins selected from polyimide, polyamideimide, polyester, polyethylene terephthalate, epoxy, and acrylic. It may be one or two or more ceramics selected from aluminum oxide, aluminum nitride, silicon carbide, silicon nitride, zirconia and titania. From the viewpoint of insulation resistance and chemical resistance, polyimide is preferable.

次に、第一電極と第二電極とが同一面内に存在しない場合の配置例として、次のような好ましい電極部材を挙げることができる。
すなわち、電極部材の厚さ方向に吸着面から近い順に第一電極、電極間絶縁材及び第二電極が順次積層されると共に、上記第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有して電極部材を形成するのがよい。ここで、第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有するとは、第一電極から電極部材の厚み方向に第二電極を覗いた場合に第二電極の少なくとも一部が覗けることを意味し、第二電極が電極部材の厚み方向に第一電極と重ならない場合であってもよく、あるいは第二電極の一部が電極部材の厚み方向に第一電極と重なる場合であってもよい。
Next, the following preferable electrode members can be mentioned as an example of arrangement when the first electrode and the second electrode do not exist in the same plane.
That is, the first electrode, the interelectrode insulating material, and the second electrode are sequentially laminated in the thickness direction of the electrode member in order from the adsorption surface, and the second electrode is directed to the first electrode in the thickness direction of the electrode member. The electrode member is preferably formed so as to have a non-overlapping region. Here, the second electrode having a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member means that when the second electrode is viewed from the first electrode in the thickness direction of the electrode member, This means that a part of the second electrode does not overlap with the first electrode in the thickness direction of the electrode member, or a part of the second electrode is connected to the first electrode in the thickness direction of the electrode member. It may be a case of overlapping.

第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有する場合の第1の例として、例えば第一電極と第二電極とがそれぞれ帯状に形成された複数の帯状電極部を有し、この第一電極の帯状電極部が互いに所定の隙間yを有して支持体の長さ方向に配列されると共に、第二電極の帯状電極部が第一電極の帯状電極部によって形成された上記隙間yに対応する電極部材の厚み方向の位置に配列される場合を挙げることができる。また、上記第一電極の帯状電極部が互いに所定の隙間yを有して支持体の外周方向に配列されると共に、上記第二電極の帯状電極部が第一電極の帯状電極部によって形成された上記隙間yに対応する電極部材の厚さ方向の位置に配列される場合を挙げることができる。上記のように第一電極及び第二電極が帯状電極部を有する場合としては、例えば第一電極と第二電極とがそれぞれ帯状電極部を有したくし歯状電極であり、これら二つのくし歯状電極の帯状電極部が、それぞれ互い違いに入り組まれて第二電極の帯状電極部が電極部材の厚み方向に第一電極の帯状電極部と重ならない又は互いの帯状電極部とが一部重なるように配置され、かつ、これら第一電極と第二電極との間に電極間絶縁材が介装される場合を挙げることができる。なお、第一電極の複数の帯状電極部が互いに独立して形成され、これらの帯状電極部には同じ電位の電圧が印加されるようにしてもよく、同様に、第二電極の複数の帯状電極部が互いに独立して形成され、これらの帯状電極部には同じ電位の電圧が印加されるようにしてもよい。   As a first example in the case where the second electrode has a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member, for example, a plurality of strip electrode portions in which the first electrode and the second electrode are each formed in a strip shape The strip electrode portions of the first electrode are arranged in the longitudinal direction of the support with a predetermined gap y between them, and the strip electrode portion of the second electrode is arranged by the strip electrode portion of the first electrode. The case where it arranges in the position of the thickness direction of the electrode member corresponding to the above-mentioned gap y formed can be mentioned. In addition, the strip electrode portions of the first electrode are arranged in the outer peripheral direction of the support with a predetermined gap y, and the strip electrode portion of the second electrode is formed by the strip electrode portion of the first electrode. Moreover, the case where it arranges in the position of the thickness direction of the electrode member corresponding to the said clearance gap y can be mentioned. As described above, when the first electrode and the second electrode have the band-shaped electrode part, for example, the first electrode and the second electrode are comb-shaped electrodes each having the band-shaped electrode part, and these two comb teeth The strip electrode portions of the electrode strips are staggered so that the strip electrode portions of the second electrode do not overlap with the strip electrode portions of the first electrode in the thickness direction of the electrode member or part of the strip electrode portions overlap each other. And an interelectrode insulating material is interposed between the first electrode and the second electrode. The plurality of strip electrode portions of the first electrode may be formed independently of each other, and the same potential voltage may be applied to these strip electrode portions. Similarly, the plurality of strip electrodes of the second electrode The electrode portions may be formed independently of each other, and a voltage having the same potential may be applied to these strip electrode portions.

第一電極と第二電極とがそれぞれ複数の帯状電極部を有する場合、吸着面に優れた吸着力(静電引力)を発生させる観点から、上記隙間yについては好ましくは0.15mm〜0.5mmの範囲内とするのがよい。また、吸着面に優れた吸着力を均一に発生させる観点からは、第一電極の帯状電極部が形成する隙間yとこの第一電極の帯状電極部の電極幅とが同じになるようにすると共に、第二電極の帯状電極部の電極幅とこの帯状電極部が配列されるピッチ(第二電極の帯状電極部が形成する間隔)とを同じにして、吸着面から電極部材の厚み方向に第一電極と第二電極とを覗いた場合に第一電極の帯状電極部と第二電極の帯状電極部とが隙間なく交互に配列されるのが好ましい。   In the case where each of the first electrode and the second electrode has a plurality of strip-like electrode portions, the gap y is preferably 0.15 mm to 0.00 mm from the viewpoint of generating an excellent attracting force (electrostatic attractive force) on the attracting surface. It is preferable to be within a range of 5 mm. Further, from the viewpoint of uniformly generating an excellent suction force on the suction surface, the gap y formed by the strip electrode portion of the first electrode is made equal to the electrode width of the strip electrode portion of the first electrode. In addition, the electrode width of the strip electrode portion of the second electrode and the pitch at which the strip electrode portions are arranged (interval formed by the strip electrode portion of the second electrode) are made the same from the suction surface in the thickness direction of the electrode member. When looking through the first electrode and the second electrode, it is preferable that the strip electrode portions of the first electrode and the strip electrode portions of the second electrode are alternately arranged without gaps.

また、第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有する場合の第2の例として、例えば第一電極が帯状に形成された複数の帯状電極部を有してこれら帯状電極部が所定の隙間yを有して支持体の長さ方向に配列され、第二電極が所定の範囲を有する面電極である場合を挙げることができる。また、上記第一電極の帯状電極部が所定の隙間yを有して支持体の外周方向に配列され、第二電極が所定の範囲を有する面電極である場合を挙げることができる。上記のように第一電極が帯状電極部を有する場合については、第一電極の複数の帯状電極部が互いに独立して形成され、これらの帯状電極部に同じ電位の電圧を印加するようにしてもよく、また、これらの複数の帯状電極部を有したくし歯状電極としてもよい。なお、この例の場合、第一電極の帯状電極部が形成する隙間yとこの帯状電極部の電極幅については、先に説明した第一の例の場合と同様とするのが好ましい。   In addition, as a second example when the second electrode has a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member, for example, the first electrode has a plurality of band-shaped electrode portions formed in a band shape. A case where these strip electrode portions are arranged in the length direction of the support with a predetermined gap y and the second electrode is a surface electrode having a predetermined range can be mentioned. Moreover, the case where the strip electrode part of said 1st electrode is arranged in the outer peripheral direction of a support body with the predetermined clearance gap y, and a 2nd electrode is a surface electrode which has a predetermined range can be mentioned. As described above, when the first electrode has a strip electrode portion, a plurality of strip electrode portions of the first electrode are formed independently of each other, and a voltage having the same potential is applied to these strip electrode portions. Alternatively, a comb-like electrode having a plurality of band-like electrode portions may be used. In this example, the gap y formed by the strip electrode portion of the first electrode and the electrode width of the strip electrode portion are preferably the same as those in the first example described above.

更に、第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有する場合の第3の例として、第一電極が所定の範囲を有する面電極であると共に、この面電極の範囲内には複数の開口部が設けられ、かつ、第二電極が所定の範囲を有する面電極である場合を挙げることができる。上記開口部の形状については円形であってもよく、三角形、四角形等の多角形であってもよい。また、この開口部の大きさ(円形の場合には直径、四角形以上の場合には対角線の長さ)については、隣接する開口部との距離と同程度か、あるいは隣接する開口部と開口部との距離の120%程度となるように形成するのがよい。第一電極をこのような開口部を有する面電極とすることにより、第二電極からの電界の漏れを適度に多くすることができ、優れた吸着力を発生させることができる。なお、吸着面に吸着力を均一に発生させる観点から、このような開口部が第一電極の面電極内に均一に存在させるようにするのがよい。   Furthermore, as a third example in the case where the second electrode has a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member, the first electrode is a surface electrode having a predetermined range. A case where a plurality of openings are provided in the range and the second electrode is a surface electrode having a predetermined range can be exemplified. The shape of the opening may be a circle or a polygon such as a triangle or a rectangle. In addition, the size of the opening (diameter in the case of a circle, diagonal length in the case of a square or more) is approximately the same as the distance between adjacent openings, or adjacent openings and openings. It is good to form so that it may become about 120% of distance. By making the first electrode a planar electrode having such an opening, the leakage of the electric field from the second electrode can be increased moderately, and an excellent adsorption force can be generated. In addition, it is good to make such an opening part exist uniformly in the surface electrode of a 1st electrode from a viewpoint of generating the adsorption | suction force uniformly on an adsorption | suction surface.

更にまた、第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有する場合の第4の例として、第一電極が所定の幅を有する帯状電極であって支持体の長さ方向にらせん状に配列され、第二電極が所定の範囲を有する面電極である場合を挙げることができる。この例の場合、第一電極の帯状電極の電極幅とこの帯状電極をらせん状に配列する場合の帯状電極間の隙間(ピッチ)については、先に説明した第一の例の場合と同様とするのが好ましい。   Furthermore, as a fourth example in which the second electrode has a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member, the first electrode is a strip electrode having a predetermined width, and the length of the support body A case where the second electrode is a planar electrode arranged in a spiral shape in the vertical direction and having a predetermined range can be exemplified. In the case of this example, the electrode width of the strip electrode of the first electrode and the gap (pitch) between the strip electrodes when this strip electrode is arranged in a spiral shape are the same as in the case of the first example described above. It is preferable to do this.

第一電極と第二電極とが同一面内に存在しない場合、すなわち、電極部材の厚さ方向に吸着面から近い順に第一電極、電極間絶縁材及び第二電極を順次積層して電極部材を形成する場合の電極間絶縁材については、例えばポリイミド、ポリアミドイミド、ポリエステル、ポリエチレンテレフタレート、エポキシ、及びアクリルから選ばれた1種又は2種以上の樹脂からなる樹脂層によって形成してもよく、酸化アルミ、窒化アルミ、炭化珪素、窒化珪素、ジルコニア及びチタニアから選ばれた1種又は2種以上からなるセラミックス層によって形成してもよく、あるいは、珪素及び二酸化珪素から選ばれた1種又は2種からなる層などによって形成してもよい。このうち、量産性の観点から、好ましくはポリイミド、ポリアミドイミド、ポリエステル、ポリエチレンテレフタレート及びエポキシから選ればれた1種又は2種以上の樹脂からなる樹脂層によって形成するのがよく、耐絶縁性や化学的耐性の観点から更に好ましくはポリイミドであるのがよい。   When the first electrode and the second electrode do not exist in the same plane, that is, the electrode member is formed by sequentially laminating the first electrode, the interelectrode insulating material, and the second electrode in order from the adsorption surface in the thickness direction of the electrode member. For the interelectrode insulating material in the case of forming, may be formed by a resin layer composed of one or more resins selected from, for example, polyimide, polyamideimide, polyester, polyethylene terephthalate, epoxy, and acrylic, You may form with the ceramic layer which consists of 1 type, or 2 or more types chosen from aluminum oxide, aluminum nitride, silicon carbide, silicon nitride, zirconia and titania, or 1 type or 2 chosen from silicon and silicon dioxide You may form by the layer which consists of seeds. Among these, from the viewpoint of mass productivity, it is preferable to form by a resin layer composed of one or more resins selected from polyimide, polyamideimide, polyester, polyethylene terephthalate and epoxy, From the viewpoint of chemical resistance, polyimide is more preferable.

上記樹脂層については、好ましくは1又は2以上の樹脂フィルムからなるのがよい。このような樹脂フィルムとしては、具体的には、カプトン(東レ・デュポン社製商品名)、ユーピレックスADシート(宇部興産社製商品名)、アピカル(鐘淵化学工業社製商品名)等を挙げることができ、更に好ましくはポリイミドからなるカプトンである。電極間絶縁材樹脂フィルムから形成することで、第一電極と第二電極との間にボイド等が存在するおそれを可及的に排除して信頼性のある電極部材を形成することができ、絶縁耐性に優れた静電吸着体を得ることができる。例えばカプトン(東レ・デュポン社製商品名)の絶縁破壊電界強度は160MV/mであるとされており、このカプトンを電極間絶縁材とした場合には、更に優れた絶縁耐性を発揮し得る。   The resin layer is preferably composed of one or two or more resin films. Specific examples of such resin films include Kapton (trade name, manufactured by Toray DuPont), Upilex AD sheet (trade name, manufactured by Ube Industries), Apical (trade name, manufactured by Kaneka Chemical Co., Ltd.), and the like. More preferred is a kapton made of polyimide. By forming from an inter-electrode insulating material resin film, it is possible to form a reliable electrode member by eliminating as much as possible the presence of voids between the first electrode and the second electrode, An electrostatic adsorbent having excellent insulation resistance can be obtained. For example, the dielectric breakdown electric field strength of Kapton (trade name manufactured by Toray DuPont) is 160 MV / m, and when this Kapton is used as an interelectrode insulating material, further excellent insulation resistance can be exhibited.

電極間絶縁材を樹脂層により形成する場合には、樹脂層の厚みについては1μm〜1000μm、好ましくは1μm〜500μmであるのがよい。樹脂層の厚みが1000μmより大きくなると静電吸着体を形成した際に熱伝導性の観点で好ましくない。反対に厚みが1μmより小さいと、例えば絶縁性フィルムの表裏両面に金属層を有するような市販の積層板を利用して電極部材を形成する場合に、電極間絶縁材を形成する絶縁性フィルムが1μmより薄いものを入手することが困難である。また、樹脂層の厚みが500μm以下であれば得られた静電吸着体が数kV程度の低電圧動作によって必要な吸着力(静電引力)を発現せしめることができる。   When the interelectrode insulating material is formed of a resin layer, the thickness of the resin layer is 1 μm to 1000 μm, preferably 1 μm to 500 μm. When the thickness of the resin layer is larger than 1000 μm, it is not preferable from the viewpoint of thermal conductivity when an electrostatic adsorbent is formed. On the other hand, if the thickness is smaller than 1 μm, for example, when an electrode member is formed using a commercially available laminated plate having metal layers on both the front and back surfaces of the insulating film, the insulating film for forming the interelectrode insulating material is It is difficult to obtain a material thinner than 1 μm. Moreover, if the thickness of the resin layer is 500 μm or less, the obtained electrostatic adsorbent can exhibit a necessary adsorption force (electrostatic attractive force) by a low voltage operation of about several kV.

また、電極間絶縁材をセラミックス層から形成する場合は、酸化アルミニウム、窒化アルミニウム、炭化珪素、窒化珪素、ジルコニア、イットリア、マグネシア、及びチタニアの単体又はこれらの複合体を大気あるいはプラズマなどによる溶射によって形成してよく、また、焼結済みセラミックス薄板を用いて形成してもよい。
溶射によって形成する際には、電極間絶縁材の膜厚は、一般的な溶射技術によって30〜500μm程度の範囲で形成することができ、必要に応じて最大3mm程度の厚みまでは厚くすることも可能である。この膜厚が30μmより小さいと均一な層が形成し難く、反対に500μmより大きくなると静電引力が小さくなってしまう。また、静電吸着体を得た後に、静電吸着体自体が侵食によって汚染を引き起こす可能性を可及的に低減させる目的や、耐絶縁性に優れる観点から、好ましくは99.99%以上の純度の高いものを用いて溶射によりセラミックス層を形成するのがよい。更に好ましくは、吸着面に吸着させた吸着物を効率良く冷却させる観点から、窒化アルミニウム等の熱伝導性の高いものを用いるのがよい。
溶射によってセラミックス層を形成する場合は、溶射後の上面を機械加工等により平坦化するのがよい。この際の平坦度については、絶縁体内における電極の位置関係から重要であって、電界の形成を均一にして静電引力による吸着力を吸着面において均一にする観点から、表面粗さRa(算術平均粗さ:JIS B 0601-1994)を5〜50μm程度とするのがよく、好ましくは10μm以下とするのがよい。
When the interelectrode insulating material is formed from a ceramic layer, aluminum oxide, aluminum nitride, silicon carbide, silicon nitride, zirconia, yttria, magnesia, and titania alone or a composite thereof are sprayed by air or plasma. It may be formed, or may be formed using a sintered ceramic thin plate.
When forming by thermal spraying, the film thickness of the interelectrode insulating material can be formed in a range of about 30 to 500 μm by a general thermal spraying technique, and it is increased to a maximum thickness of about 3 mm as necessary. Is also possible. If this film thickness is less than 30 μm, it is difficult to form a uniform layer. Conversely, if the film thickness is greater than 500 μm, the electrostatic attractive force is reduced. In addition, after obtaining the electrostatic adsorbent, preferably 99.99% or more from the viewpoint of reducing the possibility that the electrostatic adsorbent itself causes contamination due to erosion and excellent insulation resistance. A ceramic layer is preferably formed by thermal spraying using a high purity material. More preferably, from the viewpoint of efficiently cooling the adsorbed material adsorbed on the adsorption surface, it is preferable to use a material having high thermal conductivity such as aluminum nitride.
When the ceramic layer is formed by thermal spraying, the upper surface after thermal spraying is preferably flattened by machining or the like. The flatness at this time is important because of the positional relationship of the electrodes in the insulator, and the surface roughness Ra (arithmetic) is used from the viewpoint of uniform formation of the electric field and uniform adsorption force due to electrostatic attraction on the adsorption surface. Average roughness: JIS B 0601-1994) should be about 5 to 50 μm, preferably 10 μm or less.

本発明における第一電極と第二電極については、例えば銅、タングステン、アルミニウム、ニッケル、クロム、銀、白金、錫、モリブデン、マグネシウム、パラジウム等から形成することができ、電導性あるいは生産性の観点から好ましくは銅、アルミニウムであるのがよい。また、第一電極と第二電極とは同じ材質から形成してもよく、互いに異なる材質から形成してもよい。   The first electrode and the second electrode in the present invention can be formed from, for example, copper, tungsten, aluminum, nickel, chromium, silver, platinum, tin, molybdenum, magnesium, palladium, and the like, from the viewpoint of conductivity or productivity. Of these, copper and aluminum are preferred. Further, the first electrode and the second electrode may be formed from the same material, or may be formed from different materials.

ここで、第一電極と第二電極とが同一面内に存在する場合、支持体の外周面に直接、あるいは後述する下部絶縁層に対して通常のスパッタ法を用いて上記金属からなる電極面を形成し、次いでこの電極面を通常のエッチング方法を用いて第一電極及び第二電極の所定の形状となるようにしてもよい。また、上記金属の1種又は2種以上をペースト状にして、印刷処理によって第一電極及び第二電極の所定の形状となるようにしてもよい。更にはイオンプレーティング蒸着法を用いた処理、メッキ処理、気相成長法で成膜の後に所定のパターンにエッチングする方法、モリブデン、タングステン、タンタル等の高融点金属を用いた溶射等の方法を用いてもよく、所定の形状となるように必要な処理を行って第一電極及び第二電極を形成してもよい。   Here, when the first electrode and the second electrode are present in the same plane, the electrode surface made of the above metal directly on the outer peripheral surface of the support or using a normal sputtering method for the lower insulating layer described later Then, this electrode surface may be formed into a predetermined shape of the first electrode and the second electrode by using a normal etching method. Alternatively, one or more of the above metals may be pasted into a predetermined shape for the first electrode and the second electrode by a printing process. Furthermore, a process using ion plating vapor deposition, a plating process, a method of etching into a predetermined pattern after film formation by vapor deposition, and a method of thermal spraying using a refractory metal such as molybdenum, tungsten, tantalum, etc. It may be used, and the first electrode and the second electrode may be formed by performing necessary treatment so as to obtain a predetermined shape.

一方、第一電極と第二電極とが同一面内に存在しない場合、先ず、上述したいずれかの方法によって支持体の外周面に直接、あるいは後述する下部絶縁層に対して第二電極を所定の形状に形成する。次いで、電極間絶縁材を介して、この電極間絶縁材の表面に、第二電極を形成する場合と同様にして、所定の形状を有する第一電極を形成する。また、ポリイミド銅張積層板である市販のユピセルN(宇部興産株式会社製商品名)やネオフレックス(三井化学株式会社製商品名)等の銅表面層を有するポリイミドシートをはじめ、絶縁フィルムの表裏両面に金属箔を有する市販の積層体を利用し、これらの金属箔をエッチング等によって所定の形状を有した第一電極及び第二電極を得てもよく、この際、絶縁性フィルムが電極間絶縁材に相当する。   On the other hand, when the first electrode and the second electrode do not exist in the same plane, first, the second electrode is predetermined on the outer peripheral surface of the support directly by one of the methods described above or on the lower insulating layer described later. The shape is formed. Next, a first electrode having a predetermined shape is formed on the surface of the interelectrode insulating material via the interelectrode insulating material in the same manner as in the case of forming the second electrode. In addition, polyimide sheets with copper surface layers such as commercially available Iupicel N (trade name, manufactured by Ube Industries Co., Ltd.) and Neoprex (trade name, manufactured by Mitsui Chemicals), which are polyimide copper clad laminates, and the front and back sides of insulating films A commercially available laminate having metal foils on both sides may be used, and these metal foils may be obtained by etching or the like to obtain a first electrode and a second electrode having a predetermined shape. Corresponds to insulating material.

また、本発明においては、静電チャックが電極部材の支持体側の面に下部絶縁材を有してもよい。電極部材を支持体の外周面にこの下部絶縁材を介して固着することができると共に、特に支持体が金属製の場合には電極部材との絶縁性を確保する意味で必要となる。また、静電チャックが電極部材の支持体と反対側の面に上部絶縁材を有しもよい。静電チャックが上部絶縁材を有することで、この上部絶縁材によって吸着面を形成することができる。なお、上部絶縁材及び下部絶縁材の上下とは、吸着面に近い方を上部、遠い方を下部と呼ぶ意味である。   In the present invention, the electrostatic chuck may have a lower insulating material on the surface of the electrode member on the support side. The electrode member can be fixed to the outer peripheral surface of the support via the lower insulating material, and particularly in the case where the support is made of metal, it is necessary to ensure insulation with the electrode member. The electrostatic chuck may have an upper insulating material on the surface opposite to the electrode member support. Since the electrostatic chuck has the upper insulating material, the adsorption surface can be formed by the upper insulating material. In addition, the upper and lower sides of the upper insulating material and the lower insulating material mean that the side closer to the adsorption surface is called the upper part and the far side is called the lower part.

上部絶縁材と下部絶縁材については、それぞれポリイミド、ポリイミド、ポリアミド、ポリエステル、ポリエチレンテレフタレート、及びエポキシから選ばれた1種又は2種以上の樹脂からなる樹脂層から形成してもよく、酸化アルミニウム、窒化アルミニウム、炭化珪素、窒化珪素、ジルコニア、イットリア、マグネシア、及びチタニアから選ばれた1種又は2種以上からなるセラミックス層から形成してもよく、上部絶縁材と下部絶縁材とをこれらの組み合わせによって形成してもよい。静電吸着体の吸着面の凹凸を容易に可及的に低減できることから、好ましくは上部絶縁材及び下部絶縁材を上記樹脂層によって形成するのがよく、更に好ましくはこれらの樹脂層が少なくとも一方の面に熱可塑性ポリイミドを有したものであるのがよい。   The upper insulating material and the lower insulating material may be formed from a resin layer made of one or more resins selected from polyimide, polyimide, polyamide, polyester, polyethylene terephthalate, and epoxy, respectively, aluminum oxide, It may be formed from one or more ceramic layers selected from aluminum nitride, silicon carbide, silicon nitride, zirconia, yttria, magnesia, and titania, and the upper insulating material and the lower insulating material are combined. May be formed. Since the unevenness of the attracting surface of the electrostatic attracting body can be reduced as easily as possible, the upper insulating material and the lower insulating material are preferably formed of the resin layer, more preferably at least one of these resin layers. It is preferable to have thermoplastic polyimide on the surface.

上部絶縁材及び/又は下部絶縁材を樹脂層により形成する場合、電極間絶縁材の場合と同様のものを用いることができ、上部絶縁材及び/又は下部絶縁材をセラミックス層によって形成する場合についても、電極間絶縁材の場合と同様にすることができる。また、上部絶縁材及び下部絶縁材の膜厚についてはそれぞれ10μm〜200μmであるのがよい。これらの膜厚が10μmより小さいと耐電圧性の観点からこれらを設ける効果が薄れ、反対に200μmを超えると静電吸着体から吸着物への熱伝導性の点で問題が生じるおそれがある。   When the upper insulating material and / or the lower insulating material is formed of a resin layer, the same material as that of the interelectrode insulating material can be used, and the upper insulating material and / or the lower insulating material is formed of a ceramic layer. The same can be applied to the case of the interelectrode insulating material. The film thickness of the upper insulating material and the lower insulating material is preferably 10 μm to 200 μm, respectively. If these film thicknesses are smaller than 10 μm, the effect of providing them is reduced from the viewpoint of withstand voltage, and conversely if they exceed 200 μm, there is a risk of problems in terms of thermal conductivity from the electrostatic adsorber to the adsorbate.

本発明における静電吸着体を製造する方法としては、支持体の外周面に上述したような方法によって第一電極、電極間絶縁材及び第二電極を所定の形状に形成し、静電吸着体を得てもよい。また、電極部材を上部絶縁材及び/又は下部絶縁材と積層して静電チャックシートを形成し、この静電チャックシートを支持体の外周面に巻き付け固着させてもよく、好ましくは上部絶縁材、電極部材、及び下部絶縁材を順次積層して静電チャックシートを形成し、この静電チャックシートの下部絶縁材側の面を支持体の外周面に巻き付けて固着させ、この静電チャックシートの上部絶縁材の面を吸着面として静電吸着体を得るのがよい。   As a method of manufacturing the electrostatic attraction body in the present invention, the first electrode, the interelectrode insulating material and the second electrode are formed in a predetermined shape on the outer peripheral surface of the support by the above-described method, and the electrostatic attraction body You may get Further, the electrostatic chuck sheet may be formed by laminating the electrode member with the upper insulating material and / or the lower insulating material, and the electrostatic chuck sheet may be wound and fixed to the outer peripheral surface of the support, preferably the upper insulating material. The electrostatic chuck sheet is formed by sequentially laminating the electrode member and the lower insulating material, and the surface of the lower insulating material side of the electrostatic chuck sheet is wound around and fixed to the outer peripheral surface of the support. It is preferable to obtain an electrostatic attraction body using the surface of the upper insulating material as the attraction surface.

上記のような静電チャックシートを得る方法として、例えば電極部材に上部絶縁材及び/又は下部絶縁材を所定の順に重ね合わせ(この際、上部絶縁材と下部絶縁材とについては、それぞれ電極部材に対向する面に熱可塑性ポリイミドフィルム等の接着性フィルムを有するのが好ましい)、処理温度100〜250℃、圧力0.1〜5MPaの条件で低温熱圧着成型して静電チャックシートを得てもよい。また、上記の上部絶縁材又は下部絶縁材のいずれか一方と電極部材とを予め上記の低温熱圧着成型を行い、次いでこの成型して得たものを残りの絶縁材と重ねて低温熱圧着成型して静電チャックシートを得てもよい。   As a method of obtaining the electrostatic chuck sheet as described above, for example, an upper insulating material and / or a lower insulating material are superposed on an electrode member in a predetermined order (in this case, the upper insulating material and the lower insulating material are respectively electrode members). It is preferable to have an adhesive film such as a thermoplastic polyimide film on the surface facing the surface), and an electrostatic chuck sheet is obtained by low-temperature thermocompression molding under conditions of a processing temperature of 100 to 250 ° C. and a pressure of 0.1 to 5 MPa. Also good. In addition, either one of the upper insulating material or the lower insulating material and the electrode member are previously subjected to the above-mentioned low temperature thermocompression molding, and then this molding is overlapped with the remaining insulating material to form a low temperature thermocompression molding. Thus, an electrostatic chuck sheet may be obtained.

静電チャックシートを支持体の外周面に固着させる方法としては、例えばエポキシ等の接着剤や熱可塑性ポリイミドフィルム等の接着フィルムを用いて接着してもよい。このとき、静電チャックシートの両端に切り欠き部を形成しておき、この静電チャックシートを支持体の外周面に巻き付けて固着する際に上記切り欠き部を互いに重ね合わせて静電チャックシートの両端を接合することにより、余計な凹凸を形成することなく滑らかな吸着面を得ることができる。あるいは、支持体の長さ方向に静電チャックシートの両端が折り込まれる折り込み溝を設けておき、静電チャックシートの両端を上記折り込み溝に折り込ませて支持体に固着させてもよい。このような折り込み溝を利用することで、静電チャックシートの両端を正確につないで、吸着面に余計な凹凸を形成することなく滑らかに仕上げることができる。 As a method for fixing the electrostatic chuck sheet to the outer peripheral surface of the support, for example, an adhesive such as epoxy or an adhesive film such as a thermoplastic polyimide film may be used for bonding. At this time, a notch portion is formed at both ends of the electrostatic chuck sheet, and when the electrostatic chuck sheet is wound around the outer peripheral surface of the support and fixed, the notch portions are overlapped with each other to form the electrostatic chuck sheet. By joining both ends, a smooth suction surface can be obtained without forming extra unevenness. Alternatively, a folding groove in which both ends of the electrostatic chuck sheet are folded in the length direction of the support may be provided, and both ends of the electrostatic chuck sheet may be folded into the folding groove and fixed to the support. By using such a folding groove, both ends of the electrostatic chuck sheet can be accurately connected and finished smoothly without forming extra unevenness on the attracting surface.

本発明の静電吸着体が吸着して移送するシート状の被吸着物については、枚葉紙のように所定の長さで区切られたものであってもよく、巻取り紙のように連続して巻き取られたようなものであってもよい。これらのシート状の被吸着物としては、例えばフレキシブル有機EL素子の連続製造で用いられる高分子フィルム、銅張り積層板を形成するための銅箔やポリイミドフィルム、液晶ディスプレイ等に用いられる偏光フィルム、光を拡散するためのフィルム、フィルムコンデンサの製造に用いられるフィルム、導電性樹脂フィルム接着テープのフィルム、表面保護のためのフィルム、マスキングテープのフィルム、フレキシブルプリント基板のフィルム、包装用のフィルム、鏡などに使用される偏向・反射防止のフィルム、写真用フィルム、グラビア印刷の対象となるフィルム等のような各種製造に用いられるシート状のものを例示することができ、これらについては誘電体、導電体、半導体であれば特に制限されない。   The sheet-like object to be adsorbed and transported by the electrostatic attraction body of the present invention may be separated by a predetermined length like a sheet of paper, or continuous like a web. Then, it may be wound up. As these sheet-like adsorbents, for example, polymer films used in continuous production of flexible organic EL elements, copper foils and polyimide films for forming copper-clad laminates, polarizing films used in liquid crystal displays, Film for diffusing light, film used for manufacturing film capacitors, film for conductive resin film adhesive tape, film for surface protection, film for masking tape, film for flexible printed circuit board, film for packaging, mirror Examples of the sheet-like material used in various productions such as a deflection / antireflection film, a photographic film, a film to be subjected to gravure printing, etc. used for such as, dielectric, conductive The body and the semiconductor are not particularly limited.

本発明における静電吸着体は、支持体の外周面に静電引力による吸着力を発生させる静電チャックを備えるため、この静電吸着体の吸着面に各種シート状の被吸着物を幅方向(静電吸着体の長さ方向)に対して均一に、かつ、平坦性良く吸着することができる。そのため、この静電吸着体が回転することにより、例えばフレキシブル有機EL素子の連続製造で用いられる高分子フィルム、銅張り積層板を形成するための銅箔やポリイミドフィルム、液晶ディスプレイ等に用いられる偏光フィルム、光を拡散するためのフィルム、フィルムコンデンサの製造に用いられるフィルム、導電性樹脂フィルム、接着テープのフィルム、表面保護のためのフィルム、マスキングテープのフィルム、フレキシブルプリント基板のフィルム、包装用のフィルム、鏡などに使用される偏向・反射防止のフィルム、写真用フイルム、グラビア印刷の対象となるフィルム等のような各種製造に用いられるシート状のものを移送することができる。この際、シート状の被吸着物に余分なテンションをかけることがないため、しわ、ゆがみ、こすれ、やぶけ等の問題を生じることなく正確かつ確実に移送することができる。特に、厚みがうすく、強度的に劣るような材質からなるシート状の被吸着物の移送・搬送においても、上記のような問題を生じることなく、効率的良く確実に移送・搬送を行うことができる。   Since the electrostatic attraction body in the present invention includes an electrostatic chuck that generates an attracting force due to electrostatic attraction on the outer peripheral surface of the support, various sheet-like objects to be adsorbed on the attraction surface of the electrostatic attraction body in the width direction. It is possible to adsorb uniformly and with good flatness with respect to the length direction of the electrostatic adsorber. Therefore, when this electrostatic adsorbent rotates, for example, polymer films used in continuous production of flexible organic EL elements, copper foils and polyimide films for forming copper-clad laminates, polarized light used in liquid crystal displays, etc. Film, film for diffusing light, film used for manufacturing film capacitor, conductive resin film, adhesive tape film, surface protection film, masking tape film, flexible printed circuit board film, packaging Sheet-like materials used in various productions such as films for deflection and antireflection used for films, mirrors, photographic films, films for gravure printing, and the like can be transferred. At this time, since no extra tension is applied to the sheet-like object to be adsorbed, it can be accurately and reliably transferred without causing problems such as wrinkles, distortion, rubbing and blurring. In particular, even when transporting and transporting a sheet-like object to be adsorbed made of a material that is thin and inferior in strength, it can be transported and transported efficiently and reliably without causing the above problems. it can.

また、ロールツーロール方式の場合のようなローラーのニップ調整等が不要であるため、シート状の被吸着物の移送・搬送を行う従来の方法と比べて労力、時間、コスト等をはるかに削減することができる。更には、本発明の静電吸着体を用いれば、ロールツーロール方式の場合に必要なローラー総数よりはるかに少ない数の静電吸着体でシート状の被吸着物の移送・搬送を行うことが可能なため、製造装置の省スペース化やコスト低減を図ることができる。特に微細加工や加工精度が要求される製造プロセスや、複数の処理室を経る必要のある工程数が多い製造プロセスの場合に発揮するこれらの効果は絶大である。   In addition, since it is not necessary to adjust the roller nip as in the case of the roll-to-roll method, the labor, time, cost, etc. are greatly reduced compared to the conventional method of transferring and transporting the sheet-like adsorbent. can do. Furthermore, if the electrostatic attraction body of the present invention is used, a sheet-like object to be adsorbed can be transferred and conveyed by a much smaller number of electrostatic attraction bodies than the total number of rollers required for the roll-to-roll method. Since this is possible, space saving and cost reduction of the manufacturing apparatus can be achieved. In particular, these effects exerted in the case of a manufacturing process that requires fine processing and processing accuracy and a manufacturing process that requires a large number of processing chambers are numerous.

以下、添付図面に示す実施例に基づいて、本発明の好適な実施の形態を具体的に説明する。   Hereinafter, preferred embodiments of the present invention will be specifically described based on examples shown in the accompanying drawings.

図1は、実施例1に係る静電吸着体Xの斜視説明図を示す。静電吸着体Xは、直径20cm×長さ30cmからなる円柱状のアルミニウム合金製支持体1の外周面に、静電チャックシート2が巻き付けられて形成されており、この静電チャックシート2の外周面によって吸着面3が形成されている。
図2には、静電チャックシート2の斜視分解説明図が示されており、膜厚50μmであって一方の面に熱可塑性ポリイミドフィルムを有したポリイミドフィルムからなる上部絶縁材4と、銅からなる第一電極5と、膜厚50μmのポリイミドフィルムからなる電極間絶縁材6と、銅からなる第二電極7と、膜厚50μmであって一方の面に熱可塑性ポリイミドフィルムを有したポリイミドフィルムからなる下部絶縁材8とからなる。
FIG. 1 is a perspective explanatory view of the electrostatic attraction body X according to the first embodiment. The electrostatic chuck body X is formed by winding an electrostatic chuck sheet 2 around the outer peripheral surface of a cylindrical aluminum alloy support body 1 having a diameter of 20 cm and a length of 30 cm. The suction surface 3 is formed by the outer peripheral surface.
FIG. 2 shows an exploded perspective view of the electrostatic chuck sheet 2. The upper insulating material 4 is made of a polyimide film having a film thickness of 50 μm and having a thermoplastic polyimide film on one side, and copper. A first electrode 5, an interelectrode insulating material 6 made of a polyimide film having a thickness of 50 μm, a second electrode 7 made of copper, and a polyimide film having a thickness of 50 μm and having a thermoplastic polyimide film on one surface And a lower insulating material 8 made of

この実施例1に係る静電チャックシート2は次のようにして得た。先ず、膜厚50μmのポリイミドフィルムの表裏両面に銅箔(表裏とも膜厚3μm)を有した銅張積層シートであるネオフレックス(三井化学株式会社製商品名)を、縦が上記支持体1の円周と同じであり、横が支持体1の長さと同じ30cmとなるように用意した。この銅張積層シートの表裏両面にシルク印刷によって所定の電極のレジストパターンを形成し、次いで塩化第二鉄からなる腐食剤を用いてエッチングを行って、それぞれ縦(支持体1の円周方向)630mm×横(支持体1の長さ方向)298mmのくし歯状電極からなる第一電極4と第二電極6とがポリイミドフィルム(電極間絶縁材5)の表裏両面に形成された電極部材9を得た。   The electrostatic chuck sheet 2 according to Example 1 was obtained as follows. First, neoprex (trade name, manufactured by Mitsui Chemicals, Inc.), which is a copper-clad laminate sheet having copper foils (thickness: 3 μm on both sides) on both sides of a polyimide film having a thickness of 50 μm, The circumference was the same, and the side was prepared to be 30 cm, which is the same as the length of the support 1. A resist pattern of a predetermined electrode is formed on both the front and back surfaces of the copper-clad laminate sheet by silk printing, and etching is then performed using a corrosive agent made of ferric chloride, respectively, in the vertical direction (circumferential direction of the support 1). An electrode member 9 in which a first electrode 4 and a second electrode 6 made of comb-like electrodes of 630 mm × horizontal (length direction of the support 1) are formed on both front and back surfaces of a polyimide film (interelectrode insulating material 5). Got.

次いで、熱可塑性ポリイミドフィルムを有した面を電極部材側に向けた上部絶縁材4と、上記電極部材9と、熱可塑性ポリイミドフィルムを有した面を電極部材側に向けた下部絶縁材8とを順次重ねて、処理温度150℃、圧力2MPaの条件で低温熱圧着成型を行って静電チャックシート2を得た。   Next, the upper insulating material 4 with the surface having the thermoplastic polyimide film facing the electrode member side, the electrode member 9, and the lower insulating material 8 with the surface having the thermoplastic polyimide film facing the electrode member side. The electrostatic chuck sheet 2 was obtained by successively superposing and performing low temperature thermocompression molding under the conditions of a processing temperature of 150 ° C. and a pressure of 2 MPa.

図3は、上記で製造した静電チャックシート2の断面説明図(図2におけるA-A’断面)を示す。第一電極5のくし歯状電極と第二電極7のくし歯状電極は、それぞれのくし歯状電極を形成する帯状電極部5aと帯状電極部7aとが支持体1の長さ方向に互い違いに入り組まれて並び、電極部材9の厚み方向に第一電極5の帯状電極部5aと第二電極7の帯状電極部7aとが互いに線で接するように配置されている。ここで、第一電極5の帯状電極部5aは電極幅1mm及び厚さ3μmであり、この帯状電極部5aは1mmピッチで並び、電極幅3mm及び厚さ3μmの根元電極部5bと一体となってくし歯状電極を形成している。第二電極7についても、同様に電極幅1mm及び厚さ3μmの帯状電極部7aが1mmピッチで並び、電極幅3mm及び厚さ3μmの根元電極部7bと一体となってくし歯状電極を形成している。また、第一電極5と第二電極7との電極間距離は上記電極間絶縁材6の膜厚に相当する50μmである。なお、電極間絶縁材6を形成する上記ポリイミドフィルムは、絶縁耐圧160MV/mであるため、この実施例1に係る静電チャックシート2は8kVの絶縁耐性を備えることになる。   FIG. 3 is a cross-sectional explanatory view (A-A ′ cross section in FIG. 2) of the electrostatic chuck sheet 2 manufactured as described above. The comb-like electrode of the first electrode 5 and the comb-like electrode of the second electrode 7 are such that the strip-like electrode portion 5a and the strip-like electrode portion 7a forming the respective comb-like electrodes are staggered in the length direction of the support 1. The strip electrode portion 5a of the first electrode 5 and the strip electrode portion 7a of the second electrode 7 are arranged in line with each other in the thickness direction of the electrode member 9. Here, the strip electrode portion 5a of the first electrode 5 has an electrode width of 1 mm and a thickness of 3 μm. The strip electrode portions 5a are arranged at a pitch of 1 mm and are integrated with the base electrode portion 5b having an electrode width of 3 mm and a thickness of 3 μm. A comb-like electrode is formed. Similarly, for the second electrode 7, strip electrode portions 7 a having an electrode width of 1 mm and a thickness of 3 μm are arranged at a pitch of 1 mm, and a comb-like electrode is formed integrally with the base electrode portion 7 b having an electrode width of 3 mm and a thickness of 3 μm. is doing. The interelectrode distance between the first electrode 5 and the second electrode 7 is 50 μm corresponding to the film thickness of the interelectrode insulating material 6. In addition, since the said polyimide film which forms the insulating material 6 between electrodes is the withstand voltage 160MV / m, the electrostatic chuck sheet 2 which concerns on this Example 1 is equipped with the insulation tolerance of 8 kV.

そして、上記静電チャックシート2を図示外の熱可塑性ポリイミドフィルムを介して先に説明した低温熱圧着処理と同じ条件で支持体1の外周面に巻き付けて固着し、静電吸着体Xを完成させた。尚、この静電吸着体Xは、第一電極5がマイナス極、第二電極7がプラス極となるように支持体1の内部より供給される直流電源(図示外)と接続されており、また、支持体1はグランド電極とされる。   Then, the electrostatic chuck sheet 2 is wound and fixed on the outer peripheral surface of the support 1 through the thermoplastic polyimide film (not shown) under the same conditions as the low-temperature thermocompression treatment described above, and the electrostatic chuck X is completed. I let you. The electrostatic attraction body X is connected to a DC power source (not shown) supplied from the inside of the support body 1 so that the first electrode 5 has a negative pole and the second electrode 7 has a positive pole. The support 1 is a ground electrode.

図4は、実施例1における静電チャックシート2の変形例を示す断面説明図(A-A’断面)である。この実施例2に係る静電吸着体Xは、静電チャックシート2を形成する第二電極17の帯状電極部17aの電極幅を0.6mmに形成し、この第二電極17の帯状電極部17aが、第一電極5の帯状電極部5aによって形成される隙間(1mm)の中央に位置するように配置した。なお、この実施例2に係る静電チャックシート2の形成の際、上部絶縁材4、電極間絶縁材6及び下部絶縁材8のそれぞれの長さ(支持体1の外周面への巻き付け方向の長さ)が実施例1と比べて20mm程度長くなるように形成した。   FIG. 4 is a cross-sectional explanatory view (A-A ′ cross section) showing a modification of the electrostatic chuck sheet 2 in the first embodiment. In the electrostatic attraction body X according to the second embodiment, the electrode width of the strip electrode portion 17a of the second electrode 17 forming the electrostatic chuck sheet 2 is formed to be 0.6 mm, and the strip electrode portion of the second electrode 17 is formed. 17a was arrange | positioned so that it might be located in the center of the clearance gap (1 mm) formed by the strip | belt-shaped electrode part 5a of the 1st electrode 5. FIG. When forming the electrostatic chuck sheet 2 according to Example 2, the lengths of the upper insulating material 4, the interelectrode insulating material 6, and the lower insulating material 8 (in the winding direction around the outer peripheral surface of the support 1). The length was longer than that of Example 1 by about 20 mm.

一方、支持体1にはその長さ方向に凹溝(折り込み溝)1aを設けた。この凹溝1aの溝の幅は上記静電チャックシート2の厚さの2倍より若干(数μm〜数十μm)大きくし、溝の深さは10mm程度とした。そして、この支持体1の外周面に上記静電チャックシート2を巻き付けて固着する際、図5に示したようにこの静電チャックシート2の両端を上記凹溝1aに折り込ませてエポキシ等の接着剤で固定した。なお、静電チャックシート2の折り込み部分には電極が存在しないようにした。
上記で説明した以外は実施例1と同様にして、この実施例2に係る静電吸着体Xを完成させた。
On the other hand, the support 1 is provided with a concave groove (folding groove) 1a in its length direction. The width of the groove 1a is slightly larger (several micrometers to several tens of micrometers) than twice the thickness of the electrostatic chuck sheet 2, and the depth of the groove is about 10 mm. Then, when the electrostatic chuck sheet 2 is wound around and fixed to the outer peripheral surface of the support 1, both ends of the electrostatic chuck sheet 2 are folded into the concave groove 1a as shown in FIG. Fixed with adhesive. It should be noted that no electrode was present in the folded portion of the electrostatic chuck sheet 2.
Except for the above description, the electrostatic chuck X according to Example 2 was completed in the same manner as Example 1.

図6は、実施例1における静電チャックシート2の変形例を示す断面説明図(A-A’断面)である。静電チャックシート2を形成する第二電極27を縦(支持体1の円周方向)630mm×横(支持体1の長さ方向)298mmの範囲の平面領域を有する面電極で形成した。また、実施例3においては、図7の断面説明図に示したように、得られた静電チャックシート2の両端に切り欠き部2aをそれぞれ形成し、この静電チャックシート2を支持体1の外周面に巻き付ける際、上記切り欠き部2aを互いに重ね合わせて静電チャックシート2の両端を接合すると共に、支持体1の外周面に固着させた。
上記で説明した以外は実施例1と同様にして、この実施例3に係る静電吸着体Xを完成させた。
FIG. 6 is a cross-sectional explanatory view (AA ′ cross section) showing a modification of the electrostatic chuck sheet 2 in the first embodiment. The second electrode 27 forming the electrostatic chuck sheet 2 was formed of a planar electrode having a planar area in the range of 630 mm in the vertical direction (circumferential direction of the support 1) × 298 mm in the horizontal direction (length direction of the support 1). Further, in Example 3, as shown in the cross-sectional explanatory view of FIG. 7, cutout portions 2 a are respectively formed at both ends of the obtained electrostatic chuck sheet 2, and the electrostatic chuck sheet 2 is supported by the support 1. At the time of winding around the outer peripheral surface, the notch portions 2a were overlapped with each other to join both ends of the electrostatic chuck sheet 2 and fixed to the outer peripheral surface of the support 1.
Except for the above description, the electrostatic chuck X according to Example 3 was completed in the same manner as Example 1.

図8は、実施例4の静電チャックシート2を形成する第一電極15の平面説明図を示す。この実施例4に係る静電チャックシート2では、厚さ3μmの第一電極15が井桁状に形成されており、この井桁状の第一電極15は、縦(支持体1の円周方向)630mm×横(支持体1の長さ方向)298mmの範囲に、縦3mm×横3mmの正方形の開口部15aが縦横3mmピッチで配列(井桁を形成する電極部分の幅が3mmとなる)されてなる。第二電極27については実施例3と同様とした。その他の条件は実施例1と同様にして、この実施例4に係る静電吸着体Xを完成させた。   FIG. 8 is an explanatory plan view of the first electrode 15 forming the electrostatic chuck sheet 2 of the fourth embodiment. In the electrostatic chuck sheet 2 according to Example 4, the first electrode 15 having a thickness of 3 μm is formed in a cross beam shape, and the first electrode 15 in the cross beam shape is vertically (circumferential direction of the support 1). Square openings 15a having a length of 3 mm and a width of 3 mm are arranged at a pitch of 3 mm in the range of 630 mm × width (length direction of the support 1) 298 mm (the width of the electrode portion forming the cross beam is 3 mm). Become. The second electrode 27 was the same as in Example 3. Other conditions were the same as in Example 1, and the electrostatic attractant X according to Example 4 was completed.

図9は、実施例5の静電チャックシート2を形成する第一電極25の平面説明図を示す。この実施例5に係る静電チャックシート2を形成する第一電極25は、厚さ3μmであって、縦(支持体1の円周方向)630mm×横(支持体1の長さ方向)298mmの範囲に半径0.6mmの円形開口部25aが均一に存在して形成されている。この第一電極25では、ひとつの開口部25aに着目すると、その周りに同じ形状の開口部25aが6つ存在し、これらの6つの開口部25aは正六角形の頂点の位置にその中心がくるように配置されている。中央の開口部25aの中心と隣り合う開口部25aの中心との距離Rは1.5mmであり、また、中央の開口部25aと隣り合う開口部25aとの間隔rは0.3mmとした。第二電極27については実施例3と同様とした。その他の条件は実施例1と同様にして、この実施例5に係る静電吸着体Xを完成させた。   FIG. 9 is an explanatory plan view of the first electrode 25 forming the electrostatic chuck sheet 2 of the fifth embodiment. The first electrode 25 forming the electrostatic chuck sheet 2 according to Example 5 has a thickness of 3 μm, and is 630 mm in length (circumferential direction of the support 1) × 630 mm in length (in the length direction of the support 1) 298 mm. The circular openings 25a having a radius of 0.6 mm are uniformly formed in the range of. In the first electrode 25, when attention is paid to one opening 25a, there are six openings 25a having the same shape around the opening 25a, and these six openings 25a are centered at the apex of the regular hexagon. Are arranged as follows. The distance R between the center of the central opening 25a and the center of the adjacent opening 25a is 1.5 mm, and the distance r between the central opening 25a and the adjacent opening 25a is 0.3 mm. The second electrode 27 was the same as in Example 3. Other conditions were the same as in Example 1, and the electrostatic attractant X according to Example 5 was completed.

図10(a)は、実施例6の静電吸着体Xの外周面における第一電極35の様子を示す平面説明図である。この実施例6に係る静電吸着体Xは次のようにして製造した。
先ず、実施例1と同じ支持体1の外周面に、アルミナを用いてプラズマによる溶射によって膜厚0.2mmのセラミックス層からなる下部絶縁材18を均一に形成した。次いで、この下部絶縁材18の表面を機械加工により算術平均粗さRaが10μmとなるように平坦化処理を行った。
FIG. 10A is an explanatory plan view showing a state of the first electrode 35 on the outer peripheral surface of the electrostatic attraction body X of the sixth embodiment. The electrostatic attraction body X according to Example 6 was manufactured as follows.
First, a lower insulating material 18 made of a ceramic layer having a thickness of 0.2 mm was uniformly formed on the outer peripheral surface of the same support 1 as in Example 1 by plasma spraying using alumina. Next, the surface of the lower insulating material 18 was flattened by machining so that the arithmetic average roughness Ra becomes 10 μm.

次いで、上記の下部絶縁材18の表面に対して均一にモリブデンを溶射して膜厚50μmの第二電極37を形成した。この第二電極37を形成するために用いたモリブデンは、下部絶縁材18を形成するセラミックス層の熱膨張係数と同程度となるようにすることから選定しており、これにより熱歪を抑えることができる。
次いで、上記第二電極37の表面に、下部絶縁材18の場合と同様の手段によって膜厚0.1mmの電極間絶縁材16を均一に形成した。この電極間絶縁材16の表面を下部絶縁材18の場合と同様に平坦化処理を行った後、更にこの電極間絶縁材16の表面に膜厚50μmの第一電極35を均一に形成するため、上記第二電極37における形成の場合と同様にモリブデンを溶射した。
Next, molybdenum was uniformly sprayed on the surface of the lower insulating material 18 to form a second electrode 37 having a thickness of 50 μm. Molybdenum used for forming the second electrode 37 is selected so as to have the same thermal expansion coefficient as that of the ceramic layer forming the lower insulating material 18, thereby suppressing thermal strain. Can do.
Next, the interelectrode insulating material 16 having a film thickness of 0.1 mm was uniformly formed on the surface of the second electrode 37 by the same means as in the case of the lower insulating material 18. In order to uniformly form the first electrode 35 having a film thickness of 50 μm on the surface of the interelectrode insulating material 16 after the surface of the interelectrode insulating material 16 is planarized in the same manner as the lower insulating material 18. In the same manner as in the formation of the second electrode 37, molybdenum was sprayed.

次に、図10(b)の断面説明図(B−B’断面)に示したように、上記で形成した第一電極35の表面に砥石10をあてて、支持体1を所定の速度で回転させると共に、この砥石10を支持体1の長さ方向に所定の速度で移動させて、第一電極35のみを削り落として、第一電極35の形状をらせん状に仕上げた。このらせん状の第一電極35は電極幅1mm、電極間ピッチ(隣り合う第一電極との距離)1mmとなるようにした。
その後、下部絶縁材18及び電極間絶縁材16の場合と同様にして、らせん状の第一電極35を有した支持体1の表面に対して均一に膜厚0.1mmのセラミックス層からなる上部絶縁材(図示外)を設けた。この上部絶縁材の表面については、研摩処理を行った後、その表面全面を封孔するための真空含浸をエポキシあるいはシリコンで行い、更にその表面を算術平均粗さRa5〜20μmの範囲であって製造プロセスで要求される基準値、偏差内となるように機械加工を行い、吸着面を形成した。
Next, as shown in the cross-sectional explanatory view (BB ′ cross section) of FIG. 10B, the grindstone 10 is applied to the surface of the first electrode 35 formed above, and the support 1 is moved at a predetermined speed. While rotating, this grindstone 10 was moved in the length direction of the support body 1 at a predetermined speed, and only the first electrode 35 was scraped off to finish the shape of the first electrode 35 into a spiral shape. The spiral first electrode 35 was made to have an electrode width of 1 mm and an inter-electrode pitch (distance between adjacent first electrodes) of 1 mm.
Thereafter, in the same manner as in the case of the lower insulating material 18 and the interelectrode insulating material 16, the upper portion made of a ceramic layer having a thickness of 0.1 mm uniformly with respect to the surface of the support 1 having the spiral first electrode 35. An insulating material (not shown) was provided. About the surface of this upper insulating material, after performing the polishing treatment, vacuum impregnation for sealing the entire surface is performed with epoxy or silicon, and the surface has an arithmetic average roughness Ra of 5 to 20 μm. Machining was performed so as to be within the standard value and deviation required in the manufacturing process, and an adsorption surface was formed.

上記のように、下部絶縁材、第一電極、電極間絶縁材、第二電極、及び上部絶縁材をそれぞれセラミックスから形成して得た静電吸着体Xによれば、これらのセラミックスは耐摩耗性に優れることから、パーティクルの発生が多く使用する環境が厳しい場合においても、その耐性において優れた性能を発揮する。また、比較的安価に静電吸着体Xを得ることができることから量産にも適する。   As described above, according to the electrostatic adsorbent X obtained by forming the lower insulating material, the first electrode, the interelectrode insulating material, the second electrode, and the upper insulating material from ceramics, these ceramics are resistant to wear. Because of its excellent properties, even when the environment in which the generation of particles is large and used is severe, it exhibits excellent performance in its resistance. Further, since the electrostatic adsorbent X can be obtained at a relatively low cost, it is also suitable for mass production.

図11は、実施例7に係る静電吸着体Xの断面説明図(B-B’断面)を示す。この実施例7に係る静電吸着体Xは次のようにして製造した。
支持体1の外周面に下部絶縁材14を形成して平坦化処理を行うとこまでは実施例6と同様にした。次いで、上記の下部絶縁材14の表面に対してモリブデンを溶射を行い、膜厚50μmの電極層を均一に形成した。次いで、この電極層に対して所定のパターンエッチングを行い、それぞれ電極幅1mmの帯状電極部45aと帯状電極部47aとが1mmの隙間を有するように支持体1の長さ方向に交互に配列する第一電極45及び第二電極47を形成した。次いで、これら第一電極45と第二電極47を有する支持体1の表面にモリブデン溶射を行って、膜厚0.1mmのセラミックス層からなる上部絶縁材18を設けた。この際、上記第一電極の帯状電極部45aと第二電極の帯状電極部47aとの間の隙間に入り込んだ部絶縁材18の一部によって電極間絶縁材を兼ねるようにした。その後、この上部絶縁材26の表面を実施例6と同様にして研摩処理、封孔処理、及び機械加工処理を行って吸着面を形成し、静電吸着体Xを完成させた。
FIG. 11 is a cross-sectional explanatory view (BB ′ cross section) of the electrostatic attraction body X according to the seventh embodiment. The electrostatic chuck X according to Example 7 was manufactured as follows.
The same process as in Example 6 was performed until the lower insulating material 14 was formed on the outer peripheral surface of the support 1 and the planarization process was performed. Next, molybdenum was sprayed onto the surface of the lower insulating material 14 to uniformly form an electrode layer having a thickness of 50 μm. Next, a predetermined pattern etching is performed on the electrode layer, and the strip electrode portions 45a and the strip electrode portions 47a each having an electrode width of 1 mm are alternately arranged in the length direction of the support 1 so as to have a gap of 1 mm. A first electrode 45 and a second electrode 47 were formed. Next, molybdenum spraying was performed on the surface of the support 1 having the first electrode 45 and the second electrode 47 to provide an upper insulating material 18 made of a ceramic layer having a thickness of 0.1 mm. At this time, a part of the partial insulating material 18 that has entered the gap between the strip electrode portion 45a of the first electrode and the strip electrode portion 47a of the second electrode also serves as an interelectrode insulating material. Thereafter, the surface of the upper insulating material 26 was subjected to polishing treatment, sealing treatment, and machining treatment in the same manner as in Example 6 to form an adsorption surface, and the electrostatic adsorption body X was completed.

図12には、本発明の実施例1に係る静電吸着体Xを用いたフレキシブルEL素子の製造装置の構成例を示す。このフレキシブルEL素子の製造装置は、図示外の真空チャンバ内に収納されており、図示外の供給ロールに巻き付けられたプラスチックフィルム基板51が、蒸着源ごとに区画された処理室内を経由し、図示外の回転駆動部と連結した巻取りロール52によって巻き取られる。プラスチックフィルム基板51は膜厚0.1〜1mmのポリエチレンテレフタレート、ポリカーボネート又はポリエーテルスルホン等の透明な樹脂シートからなり、幅300mm、総長さは100mである。各処理室53の内部には本発明の実施例1に係る静電吸着体Xが配設されており、この静電吸着体Xはモーターとギヤボックスからなる図示外の動力伝達部と連結されている。また、この静電吸着体Xの内部には熱媒体が流れる管路と第一電極5及び第二電極7へと±1.5kVの印加電圧を供給する電圧供給線が設けられている(何れも図示外)。各処理室53内には蒸着源が収容された蒸着るつぼ54と、この蒸着るつぼ54から供給される蒸着粒子の流れを制限する遮蔽板55とが設けられており、プラスチックフィルム基板51を吸着した静電吸着体Xの円周の約1/4に蒸着るつぼ54から供給される蒸着粒子が届くようにしている。また、各処理室53へとプラスチックフィルム基板51を移送する手前には上記と同様の実施例1に係る静電吸着体Xが配設され、各処理室53から移送されてきたプラスチックフィルム基板51は回転可能なガイドローラー56を介して次の処理室53(最終の処理室53の場合は巻取りロール52)側へと移送される。   In FIG. 12, the structural example of the manufacturing apparatus of the flexible EL element using the electrostatic attraction body X which concerns on Example 1 of this invention is shown. This flexible EL device manufacturing apparatus is housed in a vacuum chamber (not shown), and a plastic film substrate 51 wound around a supply roll (not shown) passes through a processing chamber partitioned for each vapor deposition source. It is wound up by a winding roll 52 connected to an outer rotational drive unit. The plastic film substrate 51 is made of a transparent resin sheet such as polyethylene terephthalate, polycarbonate, or polyethersulfone having a film thickness of 0.1 to 1 mm, and has a width of 300 mm and a total length of 100 m. Each processing chamber 53 is provided with an electrostatic attraction body X according to the first embodiment of the present invention. The electrostatic attraction body X is connected to a power transmission unit (not shown) including a motor and a gear box. ing. In addition, a voltage supply line for supplying an applied voltage of ± 1.5 kV to the conduit through which the heat medium flows and the first electrode 5 and the second electrode 7 is provided inside the electrostatic attraction body X (whichever (Not shown). Each processing chamber 53 is provided with a vapor deposition crucible 54 in which a vapor deposition source is accommodated, and a shielding plate 55 for restricting the flow of vapor deposition particles supplied from the vapor deposition crucible 54, and adsorbs the plastic film substrate 51. The vapor deposition particles supplied from the vapor deposition crucible 54 reach about ¼ of the circumference of the electrostatic adsorbent X. Also, before the plastic film substrate 51 is transferred to each processing chamber 53, the electrostatic adsorbent X according to the first embodiment is disposed, and the plastic film substrate 51 transferred from each processing chamber 53 is disposed. Is transferred to the next processing chamber 53 (in the case of the final processing chamber 53, the take-up roll 52) through a rotatable guide roller 56.

上記処理室53のひとつは、例えばフレキシブル有機EL素子の陰極を形成するために用いられこの処理室53内の蒸着るつぼ54にはアルミニウム陰極を形成するための蒸着源が収容されている。この処理室53は真空度2×10-4Paに減圧されており、上記蒸着るつぼ54は電力1kWのヒーター(図示外)によって加熱され、プラスチックフィルム基板51上に成膜速度1nm/秒の割合でアルミニウムを蒸着する。静電吸着体Xの熱媒体用管路(図示外)にはその吸着面3が室温に保持されるように熱媒体が流されており、回転速度400秒/回転の速度でプラスチックフィルム基板51を移送する。この際、静電吸着体Xの吸着面3がプラスチックフィルム基板51を吸着してプラスチックフィルム基板51を移送させる方向に作用する引っ張り力は5gf/cm2であり、静電吸着体Xの吸着面3がその円周方向の約1/4程度にプラスチックフィルム基板51を吸着して移送する際にはプラスチックフィルム基板51に対して約2.4kgfの引っ張り力が発生している。このような構成により、最終的にプラスチックフィルム基板51上に膜厚100nmのアルミニウム陰極を形成した。 One of the processing chambers 53 is used, for example, to form a cathode of a flexible organic EL element, and a vapor deposition crucible 54 in the processing chamber 53 accommodates a vapor deposition source for forming an aluminum cathode. The processing chamber 53 is depressurized to a vacuum degree of 2 × 10 −4 Pa, and the vapor deposition crucible 54 is heated by a heater (not shown) having a power of 1 kW, and a film formation rate of 1 nm / second on the plastic film substrate 51. Vapor deposit aluminum. A heat medium is flown through the heat medium pipe (not shown) of the electrostatic adsorber X so that the adsorption surface 3 is kept at room temperature, and the plastic film substrate 51 is rotated at a rotation speed of 400 seconds / rotation. Transport. At this time, the tensile force acting in the direction in which the adsorption surface 3 of the electrostatic adsorption body X adsorbs the plastic film substrate 51 and moves the plastic film substrate 51 is 5 gf / cm 2 , and the adsorption surface of the electrostatic adsorption body X When the plastic film substrate 51 is attracted and transferred to about 1/4 of the circumferential direction of the plastic film substrate 3, a tensile force of about 2.4 kgf is generated against the plastic film substrate 51. With such a configuration, an aluminum cathode having a film thickness of 100 nm was finally formed on the plastic film substrate 51.

この実施例8に示したような静電吸着体Xを用いたフレキシブルEL素子の製造によれば、静電吸着体Xがプラスチックフィルム基板51を吸着しなが移送することができるため、プラスチックフィルム基板51にかかるテンションを可及的に低減でき、しわの発生や、フィルムの歪み、フィルムの伸び等の問題を解消することができる。また、ロールツーロール方式の場合に比べてローラー総数が削減できて、製造装置の省スペース化やコスト低減を図ることができる。特に微細加工や加工精度が要求される製造プロセスや、複数の処理室を経る必要のある工程数が多い製造プロセスの場合に発揮する効果は絶大である。   According to the manufacture of the flexible EL element using the electrostatic adsorbent X as shown in the eighth embodiment, since the electrostatic adsorbent X can adsorb the plastic film substrate 51 and transfer it, the plastic film The tension applied to the substrate 51 can be reduced as much as possible, and problems such as wrinkles, film distortion, and film elongation can be solved. In addition, the total number of rollers can be reduced as compared with the roll-to-roll method, and the manufacturing apparatus can save space and cost. In particular, the effects exerted in the case of a manufacturing process that requires fine processing and processing accuracy and a manufacturing process that requires a large number of processes through a plurality of processing chambers are enormous.

本発明の静電吸着体は、フレキシブル有機EL素子、液晶ディスプレイ等のフラットパネルディスプレイの構成品、フレキシブルプリント基板を形成するための積層板、偏光フィルム、光を拡散するためのフィルム、フィルムコンデンサ、接着テープのフィルム、表面保護のためのフィルム、マスキングテープのフィルム、フレキシブルプリント基板のフィルム、包装用のフィルム、鏡などに使用される偏向・反射防止のフィルム、写真用フイルム、グラビア印刷の対象となるフィルム等の電子・電気部品の製造において、高分子フィルム、金属箔、絶縁性フィルム、導電性フィルム、フィルム基板等のシート状のものを移送・搬送やガイドローラーとして好適に用いることができる。その他、プリンター、印刷機、コピー機、写真現像機、フィルム製造装置等を構成するローラー、ガイド等にも適用することができる。   The electrostatic adsorbent of the present invention is a flexible organic EL element, a component of a flat panel display such as a liquid crystal display, a laminate for forming a flexible printed board, a polarizing film, a film for diffusing light, a film capacitor, Adhesive tape film, surface protection film, masking tape film, flexible printed circuit board film, packaging film, deflection / antireflection film used for mirrors, photographic film, gravure printing In the manufacture of electronic / electrical parts such as films, sheet-like materials such as polymer films, metal foils, insulating films, conductive films, and film substrates can be suitably used as transfer / conveyance and guide rollers. In addition, the present invention can also be applied to rollers, guides, and the like that constitute printers, printing machines, copiers, photographic developing machines, film manufacturing apparatuses, and the like.

図1は、本発明の実施例1に係る静電吸着体Xの斜視説明図である。FIG. 1 is a perspective explanatory view of an electrostatic attraction body X according to Embodiment 1 of the present invention. 図2は、実施例1における静電チャックシートの斜視分解説明図である。FIG. 2 is an exploded perspective view of the electrostatic chuck sheet according to the first embodiment. 図3は、実施例1における静電チャックシートのA-A’断面説明図(一部)である。FIG. 3 is an explanatory view (partial) of the A-A ′ cross section of the electrostatic chuck sheet in the first embodiment. 図4は、本発明の実施例2に係る静電チャックシートのA-A’断面説明図(一部)である。FIG. 4 is an A-A ′ cross-sectional explanatory view (part) of the electrostatic chuck sheet according to the second embodiment of the present invention. 図5は、実施例2に係る静電吸着体Xの側面説明図である。FIG. 5 is an explanatory side view of the electrostatic attraction body X according to the second embodiment. 図6は、本発明の実施例3における静電チャックシートのA-A’断面説明図(一部)である。FIG. 6 is a cross-sectional explanatory view (a part) taken along the line A-A ′ of the electrostatic chuck sheet according to the third embodiment of the present invention. 図7は、実施例3における静電チャックシートのA-A’断面説明図である。FIG. 7 is an A-A ′ cross-sectional explanatory view of the electrostatic chuck sheet in Example 3. 図8は、本発明の実施例4の静電チャックシートを形成する第一電極の平面説明図(一部)である。FIG. 8 is an explanatory plan view (partial) of the first electrode forming the electrostatic chuck sheet of Example 4 of the present invention. 図9は、本発明の実施例5の静電チャックシートを形成する第一電極の平面説明図(一部)である。FIG. 9 is an explanatory plan view (partial) of the first electrode forming the electrostatic chuck sheet of Example 5 of the present invention. 図10(a)は本発明の実施例6に係る静電吸着体Xの外周面における第一電極の様子を示す平面説明図(一部)であり、図10(b)は実施例6の第一電極を所定の形状に加工する様子を表した静電吸着体XのB-B’断面説明図(一部)である。FIG. 10A is an explanatory plan view (a part) illustrating the state of the first electrode on the outer peripheral surface of the electrostatic attraction body X according to the sixth embodiment of the present invention, and FIG. It is BB 'cross section explanatory drawing (part) of the electrostatic attraction body X showing a mode that a 1st electrode was processed into a defined shape. 図11は、本発明の実施例7に係る静電吸着体Xの断面説明図(B-B’断面)である。FIG. 11 is an explanatory cross-sectional view (B-B ′ cross section) of the electrostatic attraction body X according to the seventh embodiment of the present invention. 図12は、本発明の実施例1に係る静電吸着体Xを用いたフレキシブルEL素子の製造装置の構成例を示す(実施例8)。FIG. 12 shows a configuration example of a flexible EL element manufacturing apparatus using the electrostatic attraction body X according to Example 1 of the present invention (Example 8).

符号の説明Explanation of symbols

X:静電吸着体、1:支持体、1a:凹溝、2:静電チャックシート、2a:静電チャックシートの端部、3:吸着面、4,14:上部絶縁材:5,15,25,35,45:第一電極、5a,45a:帯状電極部、5b:根元電極部、15a,25a:開口部、6,16:電極間絶縁材、7,17,27,37,47:第二電極、7a,17a,47a:帯状電極部、7b:根元電極部、8,18:下部絶縁材、9:電極部材、10:砥石、51:プラスチックフィルム基板、52:巻取りロール、53:処理室、54:蒸着るつぼ、55:遮蔽板、56:ガイドローラー。   X: electrostatic chuck, 1: support, 1a: concave groove, 2: electrostatic chuck sheet, 2a: end of electrostatic chuck sheet, 3: chucking surface, 4, 14: upper insulating material: 5, 15 , 25, 35, 45: first electrode, 5a, 45a: strip electrode part, 5b: root electrode part, 15a, 25a: opening, 6, 16: insulating material between electrodes, 7, 17, 27, 37, 47 : Second electrode, 7a, 17a, 47a: strip electrode part, 7b: root electrode part, 8, 18: lower insulating material, 9: electrode member, 10: grindstone, 51: plastic film substrate, 52: winding roll, 53: processing chamber, 54: vapor deposition crucible, 55: shielding plate, 56: guide roller.

Claims (19)

互いに極性の異なる電圧が印加される第一電極及び第二電極と、これら第一電極と第二電極との間に設けられる電極間絶縁材とからなる電極部材を有した静電チャックが柱状又は筒状の支持体の外周面に設けられ、この静電チャックが被吸着物を吸着する吸着面を形成することを特徴とする静電吸着体。   An electrostatic chuck having an electrode member composed of a first electrode and a second electrode to which voltages having different polarities are applied, and an interelectrode insulating material provided between the first electrode and the second electrode is columnar or An electrostatic attraction body, wherein the electrostatic chuck is provided on an outer peripheral surface of a cylindrical support, and the electrostatic chuck forms an adsorption surface for adsorbing an object to be adsorbed. 第一電極及び第二電極がそれぞれ帯状に形成された複数の帯状電極部を有し、これら第一電極の帯状電極部と第二電極の帯状電極部とが互いに所定の隙間を有して支持体の長さ方向に交互に配列されると共に、上記隙間には電極間絶縁材が充たされて電極部材が形成される請求項1に記載の静電吸着体。   The first electrode and the second electrode each have a plurality of strip electrode portions formed in a strip shape, and the strip electrode portion of the first electrode and the strip electrode portion of the second electrode are supported with a predetermined gap therebetween. The electrostatic attraction body according to claim 1, wherein the electrostatic attraction body is alternately arranged in a body length direction, and the gap is filled with an interelectrode insulating material to form an electrode member. 第一電極及び第二電極がそれぞれ帯状に形成された複数の帯状電極部を有し、これら第一電極の帯状電極部と第二電極の帯状電極部とが互いに所定の隙間を有して支持体の外周方向に交互に配列されると共に、上記隙間には電極間絶縁材が充たされて電極部材が形成される請求項1に記載の静電吸着体。   The first electrode and the second electrode each have a plurality of strip electrode portions formed in a strip shape, and the strip electrode portion of the first electrode and the strip electrode portion of the second electrode are supported with a predetermined gap therebetween. The electrostatic attraction body according to claim 1, wherein the electrostatic attraction body is alternately arranged in the outer peripheral direction of the body, and the gap is filled with an interelectrode insulating material to form an electrode member. 第一電極及び第二電極がそれぞれ所定の幅を有する帯状電極であり、これら第一電極の帯状電極と第二電極の帯状電極とが互いに所定の隙間を有して支持体の長さ方向にらせん状に配列されると共に、上記隙間には電極間絶縁材が充たされて電極部材が形成される請求項1に記載の静電吸着体。   The first electrode and the second electrode are band-shaped electrodes each having a predetermined width, and the band-shaped electrode of the first electrode and the band-shaped electrode of the second electrode have a predetermined gap between each other in the longitudinal direction of the support. The electrostatic attraction body according to claim 1, wherein the electrostatic attraction body is arranged in a spiral shape and the gap is filled with an interelectrode insulating material to form an electrode member. 電極部材の厚み方向に吸着面から近い順に第一電極、電極間絶縁材及び第二電極が順次積層されると共に、上記第二電極が電極部材の厚み方向に第一電極に対して非重畳領域を有して電極部材が形成される請求項1に記載の静電吸着体。   The first electrode, the interelectrode insulating material, and the second electrode are sequentially stacked in order from the adsorption surface in the thickness direction of the electrode member, and the second electrode is a non-overlapping region with respect to the first electrode in the thickness direction of the electrode member The electrostatic attraction body according to claim 1, wherein the electrode member is formed. 第一電極と第二電極とがそれぞれ帯状に形成された複数の帯状電極部を有し、上記第一電極の帯状電極部が互いに所定の隙間を有して支持体の長さ方向に配列されると共に、上記第二電極の帯状電極部が上記隙間に対応する電極部材の厚み方向の位置に配列される請求項5に記載の静電吸着体。   The first electrode and the second electrode each have a plurality of strip electrode portions formed in a strip shape, and the strip electrode portions of the first electrode are arranged in the longitudinal direction of the support with a predetermined gap therebetween. The electrostatic attraction body according to claim 5, wherein the strip electrode portions of the second electrode are arranged at positions in the thickness direction of the electrode members corresponding to the gaps. 第一電極と第二電極とがそれぞれ帯状に形成された複数の帯状電極部を有し、上記第一電極の帯状電極部が互いに所定の隙間を有して支持体の外周方向に配列されると共に、上記第二電極の帯状電極部が上記隙間に対応する電極部材の厚み方向の位置に配列される請求項5に記載の静電吸着体。   The first electrode and the second electrode each have a plurality of strip electrode portions formed in a strip shape, and the strip electrode portions of the first electrode are arranged in the outer peripheral direction of the support with a predetermined gap therebetween. The electrostatic attraction body according to claim 5, wherein the strip electrode portions of the second electrode are arranged at positions in the thickness direction of the electrode members corresponding to the gaps. 第一電極が帯状に形成された複数の帯状電極部を有してこれら帯状電極部が所定の隙間を有して支持体の長さ方向に配列され、第二電極が所定の範囲を有する面電極である請求項5に記載の静電吸着体。   The first electrode has a plurality of strip electrode portions formed in a strip shape, the strip electrode portions are arranged in the length direction of the support with a predetermined gap, and the second electrode has a predetermined range The electrostatic attraction body according to claim 5 which is an electrode. 第一電極が帯状に形成された複数の帯状電極部を有してこれら帯状電極部が所定の隙間を有して支持体の外周方向に配列され、第二電極が所定の範囲を有する面電極である請求項5に記載の静電吸着体。   A surface electrode in which the first electrode has a plurality of band electrode portions formed in a band shape, the band electrode portions are arranged in the outer peripheral direction of the support with a predetermined gap, and the second electrode has a predetermined range The electrostatic attraction body according to claim 5 which is. 第一電極が所定の範囲を有する面電極であると共に、この面電極の範囲内には複数の開口部が設けられ、第二電極が所定の範囲を有する面電極である請求項5に記載の静電吸着体。   The first electrode is a surface electrode having a predetermined range, a plurality of openings are provided in the range of the surface electrode, and the second electrode is a surface electrode having a predetermined range. Electrostatic attractant. 第一電極が所定の幅を有する帯状電極であって支持体の長さ方向にらせん状に配列され、第二電極が所定の範囲を有する面電極である請求項5に記載の静電吸着体。   6. The electrostatic attraction body according to claim 5, wherein the first electrode is a strip electrode having a predetermined width and is arranged in a spiral shape in the length direction of the support, and the second electrode is a surface electrode having a predetermined range. . 静電チャックが、電極部材の支持体側の面に下部絶縁材を有している請求項1〜11のいずれかに記載の静電吸着体。   The electrostatic chuck according to claim 1, wherein the electrostatic chuck has a lower insulating material on a surface of the electrode member on the support side. 静電チャックが、電極部材の支持体と反対側の面に上部絶縁材を有している請求項1〜12のいずれかに記載の静電吸着体。   The electrostatic chuck according to claim 1, wherein the electrostatic chuck has an upper insulating material on a surface opposite to the support of the electrode member. 静電チャックが上部絶縁材、電極部材、及び下部絶縁材を順次積層して形成した静電チャックシートであり、この静電チャックシートの下部絶縁材側の面を支持体の外周面に巻き付けて固着し、この静電チャックシートの上部絶縁材の面が吸着面を形成する請求項12又は13に記載の静電吸着体。   The electrostatic chuck is an electrostatic chuck sheet formed by sequentially laminating an upper insulating material, an electrode member, and a lower insulating material, and the lower insulating material side surface of the electrostatic chuck sheet is wound around the outer peripheral surface of the support. The electrostatic attraction body according to claim 12 or 13, wherein the electrostatic attraction body is fixed and an upper insulating material surface of the electrostatic chuck sheet forms an adsorption surface. 静電チャックシートの両端に切り欠き部を形成し、この静電チャックシートを支持体の外周面に巻き付ける際に上記切り欠き部を互いに重ね合わせて静電チャックシートの両端を接合する請求項14に記載の静電吸着体。   15. A notch is formed at both ends of the electrostatic chuck sheet, and the notch is overlapped with each other when the electrostatic chuck sheet is wound around the outer peripheral surface of the support to join the both ends of the electrostatic chuck sheet. The electrostatic attraction body described in 1. 支持体が長さ方向に静電チャックシートの両端が折り込まれる折り込み溝を有し、静電チャックシートの両端を上記折り込み溝に折り込ませて支持体に固着する請求項14に記載の静電吸着体。   The electrostatic chuck according to claim 14, wherein the support has folding grooves in which both ends of the electrostatic chuck sheet are folded in the length direction, and both ends of the electrostatic chuck sheet are folded in the folding grooves and fixed to the support. body. 支持体が円柱状又は円筒状である請求項1〜16のいずれかに記載の静電吸着体。   The electrostatic attraction body according to any one of claims 1 to 16, wherein the support is columnar or cylindrical. 支持体の内部には熱媒体を流す管路が設けられている請求項1〜17のいずれかに記載の静電吸着体。   The electrostatic attraction body according to any one of claims 1 to 17, wherein a pipe for flowing a heat medium is provided inside the support. 請求項1〜18のいずれかに記載の静電吸着体を用い、吸着面の少なくとも一部にシート状の被吸着物を吸着しながらこの被吸着物を移送することを特徴とするシート状被吸着物の移送方法。   A sheet-like substrate comprising the electrostatic adsorbent according to claim 1, wherein the adsorbent is transported while adsorbing the sheet-like object to be adsorbed on at least a part of the adsorption surface. Transfer method of adsorbate.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007110192A1 (en) * 2006-03-23 2007-10-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and apparatus for electrostatic fixing of substrates with molecules which can be polarized
WO2008078446A1 (en) * 2006-12-22 2008-07-03 Riso Kagaku Corporation Sheet transporting device
JP2011066209A (en) * 2009-09-17 2011-03-31 Sumitomo Metal Mining Co Ltd Method of manufacturing three-dimensional circuit board
WO2015029698A1 (en) * 2013-09-02 2015-03-05 株式会社クリエイティブ テクノロジー Particle collector system and dust collection method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6238501B1 (en) * 2017-03-27 2017-11-29 株式会社ソディック Electrostatic chuck

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6481743A (en) * 1987-09-24 1989-03-28 Toho Seiki Kk Reversing device in paper loading mechanism
JPH04179670A (en) * 1990-11-14 1992-06-26 Toshiba Seiki Kk Method for folding cutform
JP2000044081A (en) * 1998-07-29 2000-02-15 Ricoh Co Ltd Attracting device
JP2004235563A (en) * 2003-01-31 2004-08-19 Tomoegawa Paper Co Ltd Electrode sheet for electrostatic chuck device and electrostatic chuck device using it

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6481743A (en) * 1987-09-24 1989-03-28 Toho Seiki Kk Reversing device in paper loading mechanism
JPH04179670A (en) * 1990-11-14 1992-06-26 Toshiba Seiki Kk Method for folding cutform
JP2000044081A (en) * 1998-07-29 2000-02-15 Ricoh Co Ltd Attracting device
JP2004235563A (en) * 2003-01-31 2004-08-19 Tomoegawa Paper Co Ltd Electrode sheet for electrostatic chuck device and electrostatic chuck device using it

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007110192A1 (en) * 2006-03-23 2007-10-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and apparatus for electrostatic fixing of substrates with molecules which can be polarized
US7733624B2 (en) 2006-03-23 2010-06-08 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Method and device for electrostatic fixing of substrates with polarized molecules
WO2008078446A1 (en) * 2006-12-22 2008-07-03 Riso Kagaku Corporation Sheet transporting device
JP2008156049A (en) * 2006-12-22 2008-07-10 Riso Kagaku Corp Sheet carrying device
JP4648297B2 (en) * 2006-12-22 2011-03-09 理想科学工業株式会社 Sheet transport device
JP2011066209A (en) * 2009-09-17 2011-03-31 Sumitomo Metal Mining Co Ltd Method of manufacturing three-dimensional circuit board
WO2015029698A1 (en) * 2013-09-02 2015-03-05 株式会社クリエイティブ テクノロジー Particle collector system and dust collection method
CN105492121A (en) * 2013-09-02 2016-04-13 株式会社创意科技 Particle collector system and dust collection method
KR20160047470A (en) * 2013-09-02 2016-05-02 가부시키가이샤 크리에이티브 테크놀러지 Particle collector system and dust collection method
JPWO2015029698A1 (en) * 2013-09-02 2017-03-02 株式会社クリエイティブテクノロジー Particle collector system and dust collection method
US10005087B2 (en) 2013-09-02 2018-06-26 Creative Technology Corporation Particle collector system and dust collection method
KR102253772B1 (en) * 2013-09-02 2021-05-18 가부시키가이샤 크리에이티브 테크놀러지 Particle collector system and dust collection method

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