JP2005535135A - Method for manufacturing an electrical substrate frame, method for manufacturing a surface mountable semiconductor device and substrate frame strip - Google Patents

Method for manufacturing an electrical substrate frame, method for manufacturing a surface mountable semiconductor device and substrate frame strip Download PDF

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JP2005535135A
JP2005535135A JP2004526605A JP2004526605A JP2005535135A JP 2005535135 A JP2005535135 A JP 2005535135A JP 2004526605 A JP2004526605 A JP 2004526605A JP 2004526605 A JP2004526605 A JP 2004526605A JP 2005535135 A JP2005535135 A JP 2005535135A
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layer
connection
chip
window
plastic
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JP4653484B2 (en
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クロイター ゲルトルート
エリッヒ ゾルク イェルク
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Ams Osram International GmbH
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Osram Opto Semiconductors GmbH
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Abstract

本発明は、殊に発光ダイオード素子用の電気的な基板フレーム（１０）の製造のための方法であって、電気的な第１及び第２の少なくとも１つの接続導体（２，３）を備えるものに関する。該方法は次のような工程を有しており：
ａ）電気絶縁性の支持体層（１０１）及び導電性の接続導体層（１０２）から成る層複合体の成形、
ｂ）支持体層（１０１）のパターン形成、これによって該支持体層に接続導体層（１０２）への少なくとも１つの接触窓（７）を成形し、
ｃ）接続導体層（１０２）のパターン形成、これによって電気的な第１及び第２の接続導体（２，３）を成形し、該接続導体のうちの少なくとも１つは接触窓（７）を通して電気的に接続可能になっている。本発明はさらに、接続導体層及び接続支持体層を備えた基板フレームストリップに関し、基板フレームストリップに、複数の素子領域を含む１つの区画が形成されており、この場合に接続導体層は隣接のそれぞれ２つの素子領域間の切断線に沿って少なくとも部分的に除去されている。The invention is a method for the manufacture of an electrical substrate frame (10), in particular for light-emitting diode elements, comprising electrical first and second at least one connecting conductor (2, 3). About things. The method comprises the following steps:
a) Molding of a layer composite comprising an electrically insulating support layer (101) and a conductive connecting conductor layer (102),
b) patterning the support layer (101), thereby forming at least one contact window (7) to the connecting conductor layer (102) in the support layer;
c) patterning of the connection conductor layer (102), thereby shaping the electrical first and second connection conductors (2, 3), at least one of the connection conductors passing through the contact window (7) It can be connected electrically. The present invention further relates to a substrate frame strip provided with a connection conductor layer and a connection support layer, wherein the substrate frame strip is formed with one section including a plurality of element regions, in which case the connection conductor layer is adjacent to each other. Each is at least partially removed along the cutting line between the two device regions.

Description

本発明は、電気的な基板フレームの製造、殊に表面実装可能な半導体素子用の電気的な基板フレームの製造のための方法であって、１つの半導体チップ、該半導体チップの電気的な少なくとも２つの接点に導電的に接続された外部の電気的な少なくとも２つの接続部、及びチップ被覆体を備えるものに関する。本発明はさらに、表面実装可能な半導体素子の製造のための方法及び基板フレームストリップに関する。   The invention relates to a method for the manufacture of an electrical substrate frame, in particular for the manufacture of an electrical substrate frame for a surface-mountable semiconductor element, comprising one semiconductor chip, the electrical at least of the semiconductor chip. The present invention relates to an external electrical at least two connection parts electrically connected to two contact points and a chip covering body. The invention further relates to a method and a substrate frame strip for the manufacture of surface-mountable semiconductor elements.

使用領域の拡大及び製造コストの削減のために、半導体構成部分若しくは半導体素子をより小さい寸法で構成することが試みられている。例えば携帯電話機のキーのバックライトのために極めて小さいルミネセンスダイオードを必要としている。   In order to expand the area of use and reduce manufacturing costs, attempts have been made to configure semiconductor components or semiconductor elements with smaller dimensions. For example, a very small luminescence diode is required for the backlight of a cellular phone key.

これまでに、寸法0402（これは０．５ｍｍ×１．０ｍｍに相当する）の設置面積及び４００μｍ乃至６００μｍの構成高さのルミネセンスダイオード・ケーシングは使用されるようになっている。例として、構造形式QTLP690C-xのFAIRCHILD SEMICONDUCTOR（Ｒ）のデーターシートを参照できる。対応する構成コンセプトは米国特許４８４３２８０号明細書に記載してある。 To date, luminescent diode casings with a footprint of size 0402 (which corresponds to 0.5 mm × 1.0 mm) and a height of 400 μm to 600 μm have been used. As an example, reference can be made to the FAIRCHILD SEMICONDUCTOR (R) data sheet in the structure format QTLP690C-x. A corresponding construction concept is described in US Pat. No. 4,843,280.

構成高さの更なるダウンサイズを望まれているものの、従来のケーシング構成では極めて困難である。   Although further downsizing of the construction height is desired, it is extremely difficult with the conventional casing construction.

本発明の課題は、表面実装可能な半導体素子、殊に表面実装可能な極小ルミネセンスダイオード素子及び／又はフォトダイオード素子のための構成を提供して、構成寸法、特に構成高さのさらなる縮小を可能にすることである。   The object of the present invention is to provide a structure for a surface-mountable semiconductor element, in particular a surface-mountable minimal luminescence diode element and / or a photodiode element, to further reduce the dimensions, in particular the height of the structure. Is to make it possible.

前記課題が、請求項１に記載の特徴を有する方法によって解決される。表面実装可能な半導体素子の製造のための方法は、請求項１８若しくは請求項２０に記載してある。基板フレームの有利な構成は請求項３６に記載してある。   The object is solved by a method having the features of claim 1. A method for the production of a surface-mountable semiconductor element is described in claim 18 or claim 20. An advantageous configuration of the substrate frame is described in claim 36.

前記方法及び基板フレームの有利な実施態様を従属請求項に記載してある。   Advantageous embodiments of the method and the substrate frame are described in the dependent claims.

前記方法においてはまず、電気絶縁性の支持体層及び導電性の接続導体層を備えるラミネートを成形する。ラミネートは有利にはもっぱら前記両方の層からのみ成っている。両方の層は全くパターン形成されておらず、例えば接着剤層によって互いに結合されていてよい。続く工程で、ラミネートの各素子層において支持体層に接続導体層への少なくとも１つの接触窓を成形し、かつ接続導体層に電気的な第１及び第２の少なくとも１つの接続導体を成形し、該接続導体のうちの少なくとも１つは接触窓を通して電気的に接続されるようになっている。   In the method, first, a laminate including an electrically insulating support layer and a conductive connecting conductor layer is formed. The laminate advantageously consists exclusively of both layers. Both layers are not patterned at all and may be bonded together, for example by an adhesive layer. In the subsequent step, at least one contact window to the connection conductor layer is formed on the support layer in each element layer of the laminate, and at least one electrical first and second connection conductors are formed on the connection conductor layer. , At least one of the connecting conductors is electrically connected through the contact window.

前述の基板フレームは素子ケーシングの、発光ダイオードチップの高さに比べて極めて低い高さを有する発光ダイオード素子に有利に適している。該基板フレームは、発光ダイオードが支持体層の接触窓内で熱伝導性の結合材、例えば導体接着剤若しくははんだを用いて直接に接続路に組み付けられる場合に発光ダイオードからの極めて良好な熱排出を可能にするものである。   The aforementioned substrate frame is advantageously suitable for light emitting diode elements having a very low height in the element casing relative to the height of the light emitting diode chip. The substrate frame provides a very good heat dissipation from the light emitting diodes when the light emitting diodes are assembled directly into the connection path using a thermally conductive bonding material, such as a conductive adhesive or solder, within the contact window of the support layer. Is possible.

支持体層のパターン形成は有利には、接続導体層のパターン形成の前に行われる。このような順序は逆にされてもよい。   The patterning of the support layer is advantageously performed before the patterning of the connecting conductor layer. Such an order may be reversed.

支持体層は有利には、マスキング及びエッチング技術によってパターン形成可能なプラスチック層、特にプラスチック・シート、特に有利にはポリイミドシートである。接続導体層は同じく有利には、マスキング及びエッチング技術によってパターン形成可能な導電性のシート、特に有利には金属シートである。支持体層及び接続導体層の厚さは８０μｍよりも小さく、殊に３０μｍと６０μｍとの間である。このような寸法規定は以下に述べるすべての実施態様にとっても当てはまる。   The support layer is preferably a plastic layer that can be patterned by masking and etching techniques, in particular a plastic sheet, particularly preferably a polyimide sheet. The connecting conductor layer is also preferably a conductive sheet that can be patterned by masking and etching techniques, particularly preferably a metal sheet. The thickness of the support layer and the connecting conductor layer is less than 80 μm, in particular between 30 μm and 60 μm. Such sizing is also true for all embodiments described below.

特に有利には、支持体層に第１の接続路への第１の接触窓、例えばチップ組み込み窓、並びに第２の接続路への第２の接触窓、例えば導線接続窓を成形するようになっている。   It is particularly advantageous to mold the support layer with a first contact window to the first connection path, for example a chip integration window, and a second contact window to the second connection path, for example a conductor connection window. It has become.

方法の特に有利な実施態様では支持体層は少なくとも、パターン形成すべき領域で有利には溶解可能なプラスチック層から成っている。支持体層は接触窓の面を除いて、かつ必要に応じて後で除去すべき領域も除いて有利には硬化によって溶解不能にされている。このことは、支持体層がほかの領域で溶解剤に対して耐性にされていることを意味している。   In a particularly advantageous embodiment of the method, the support layer comprises at least a plastic layer that is preferably soluble in the area to be patterned. The support layer is preferably rendered insoluble by curing, except for the face of the contact window and, if necessary, the areas to be removed later. This means that the support layer is made resistant to the solubilizer in other areas.

プラスチック層のパターン形成のために、まずプラスチック層上にマスク層、殊にフォトレジスト層を施すようになっている。マスク層は、接触窓の領域及び後で除去すべき別の領域がマスク層によって遮蔽されるようにパターン形成され、若しくはパターン形成して被着される。続いてプラスチック層は接続導体層に残すべき領域を硬化され、次いで少なくとも接触窓の領域でフォトレジスト層及びその下にあるプラスチック層は接続導体層から除去される。硬化されていないプラスチック層は有利には溶融によって接続導体層から除去される。   For patterning the plastic layer, a mask layer, in particular a photoresist layer, is first applied on the plastic layer. The mask layer is patterned or patterned and deposited such that the area of the contact window and other areas to be removed later are shielded by the mask layer. Subsequently, the plastic layer is cured in the areas to be left in the connecting conductor layer, and then the photoresist layer and the underlying plastic layer are removed from the connecting conductor layer at least in the area of the contact window. The uncured plastic layer is advantageously removed from the connecting conductor layer by melting.

方法の別の有利な実施態様ではプラスチック層のパターン形成のために、まずプラスチック層の上にフォトマスクを配置し、該フォトマスクは接触窓の領域を遮蔽するようになっている。続いてプラスチック層は、接続導体層に残すべき遮蔽されていない領域を硬化される。このためにプラスチック層は有利にはＵＶ・放射（ＵＶ・ビーム）によって硬化される。これにとって有利には、ポリイミド・モノマーを含む材料が適している。別の例として、熱放射によって硬化可能なプラスチック層を用いてよい。次いでフォトマスク層は外されて、プラスチック層は接触窓の領域で接続導体層から除去される。このことは有利には湿式の化学的な溶解によって行われる。別の例として、プラズマ焼失除去も可能である。   In another advantageous embodiment of the method, for patterning the plastic layer, a photomask is first placed on the plastic layer, the photomask being adapted to shield the area of the contact window. The plastic layer is then cured in the unshielded areas that should remain in the connecting conductor layer. For this purpose, the plastic layer is preferably cured by UV radiation (UV beam). For this, materials containing polyimide monomers are suitable. As another example, a plastic layer curable by thermal radiation may be used. The photomask layer is then removed and the plastic layer is removed from the connecting conductor layer in the area of the contact window. This is preferably done by wet chemical dissolution. As another example, plasma burnout removal is also possible.

接続導体層は同じく有利にはマスクを用いかつ湿式の化学的なエッチング法によってパターン形成される。例えば金属層のためのこの種のパターン形成法は基板技術において公知であり、本発明の方法にも有利に用いられる。   The connecting conductor layer is also advantageously patterned using a mask and by wet chemical etching. Such patterning methods, for example for metal layers, are known in the substrate art and are advantageously used in the method of the invention.

複数の素子区分若しくは構成エレメント区分を備えた基板フレームストリップの製造のための方法においては、有利には接続導体層としての金属シート及び支持体層としてのポリイミドシートから成る１つのラミネートストリップに、前述の方法によって、複数の接触窓及び該接触窓に対応して配置（対応配置）された電気的な接続路を成形するようになっている。接触窓は接続路まで達している。接触窓及び該接触窓に対応配置された接続路から成る各グループは、ラミネートストリップ上の並べて配置された複数の素子区分から成る１つの区画（フィールド[field]）においてそれぞれ１つの素子区分内に配置されている。   In a method for the production of a substrate frame strip with a plurality of element sections or component element sections, it is advantageous to combine a metal sheet as a connecting conductor layer and a polyimide sheet as a support layer into one laminate strip. By this method, a plurality of contact windows and electrical connection paths arranged corresponding to the contact windows are formed. The contact window reaches the connection path. Each group of contact windows and connection paths arranged corresponding to the contact windows is within one element section in one field (field) consisting of a plurality of element sections arranged side by side on the laminate strip. Is arranged.

特に有利な実施態様では、接続導体層は隣接の各２つの素子領域間の切断線（分割線）に沿って部分的に除去される。このような手段は、切断線に沿って例えばのこぎり加工（ソーイング）若しくは打ち抜きによって行われるラミネートストリップの分割切断を容易にして有利である。   In a particularly advantageous embodiment, the connecting conductor layer is partly removed along a cutting line (partition line) between each two adjacent element regions. Such a means is advantageous for facilitating the divisional cutting of the laminate strip which is carried out along the cutting line, for example by sawing or stamping.

本発明に基づく方法は特に有利には、少なくとも１つの半導体チップ、半導体チップの電気的な各接点に接続された外部の電気的な少なくとも２つの接続導体並びに、半導体チップの被覆若しくは封止のためのプラスチックケーシングを備える表面実装可能な半導体素子の製造のために適している。   The method according to the invention is particularly advantageous for at least one semiconductor chip, at least two external electrical connection conductors connected to electrical contacts of the semiconductor chip, and for covering or sealing the semiconductor chip. Suitable for the production of surface-mountable semiconductor elements with a plastic casing.

この場合に第１の実施態様では、まず導電性の接続導体層に電気絶縁性の支持体層を施すようになっている。次いで支持体層に少なくとも１つのチップ窓及び少なくとも１つの導線接続窓をパターン形成し、かつ接続導体層に外部の電気的な少なくとも２つの接続導体をパターン形成するようになっている。チップ窓内には後から半導体チップを組み込み、半導体チップの電気的な少なくとも１つの接点は、ボンディングワイヤによって導線接続窓を介して１つの接続導体に電気的に接続される。続いて、パターン形成された接続導体層、パターン形成された支持体層、半導体チップ及びボンディングワイヤから成るユニット（結合体）は射出成形金型内に装着され、射出成形金型内で半導体チップはボンディングワイヤも含めて被覆材料で射出成形被覆され、次いで被覆材料は少なくとも部分的に硬化される。   In this case, in the first embodiment, an electrically insulating support layer is first applied to the conductive connecting conductor layer. The support layer is then patterned with at least one chip window and at least one conductor connection window, and the connection conductor layer is patterned with at least two external electrical connection conductors. A semiconductor chip is later incorporated into the chip window, and at least one electrical contact of the semiconductor chip is electrically connected to one connection conductor via a conductor connection window by a bonding wire. Subsequently, a unit (combined body) composed of a patterned connection conductor layer, a patterned support layer, a semiconductor chip and a bonding wire is mounted in an injection mold, and the semiconductor chip is placed in the injection mold. The coating material, including bonding wires, is injection molded with the coating material, and then the coating material is at least partially cured.

複数の半導体素子の同時的な製造のための方法では、接続導体層及び支持体層から成るラミネートストリップに、それぞれ複数の素子領域（素子区分）から成る区画を形成するようになっており、区画内において各素子領域はそれぞれ少なくとも１つのチップ窓、少なくとも１つの導線接続窓及び外部の電気的な少なくとも２つの接続導体を有している。半導体チップは各チップ窓内に組み込まれる。次いで、半導体チップの電気的な接点はそれぞれボンディングワイヤを用いて導線接続窓を通して外部の電気的な接続導体に接続される。区画は個別に順次に若しくはグループ毎に順次に１つの射出成形金型内に装着され、この場合に射出成形金型はそれぞれ１つの区画にとって、該区画のすべての素子領域に亘って広がっていてかつほぼもっぱら半導体チップの側で中空室を形成する唯一のキャビティーを有している。キャビティー内に被覆材料を射出し、被覆材料はそこで少なくとも部分的に硬化される。次いで区画は射出成形金型から取り出されて、被覆材料及び支持体層、並びに必要に応じて接続導体層の分割切断によって、互いに分離された半導体素子に個別化（分割）される。   In the method for the simultaneous production of a plurality of semiconductor elements, sections each composed of a plurality of element regions (element sections) are formed on a laminate strip composed of a connection conductor layer and a support layer. Each element region has at least one chip window, at least one conductor connection window and at least two external electrical connection conductors. The semiconductor chip is incorporated in each chip window. Next, the electrical contacts of the semiconductor chip are each connected to an external electrical connection conductor through a conductor connection window using bonding wires. The compartments are mounted individually or sequentially in groups in one injection mold, in which case the injection molds for each compartment extend over the entire element area of the compartment. And it has a single cavity that forms a hollow chamber almost exclusively on the side of the semiconductor chip. The coating material is injected into the cavity where it is at least partially cured. The compartments are then removed from the injection mold and individualized (divided) into separate semiconductor elements by splitting the coating material and the support layer and, if necessary, the connecting conductor layer.

第２の実施態様では、同じくまず導電性の接続導体層に電気絶縁性の支持体層を施すようになっている。次いで支持体層に少なくとも１つのチップ窓を成形しかつ接続導体層に外部の電気的な少なくとも２つの接続導体を成形し、接続導体はチップ窓と部分的にオーバーラップしている。このような構成は例えば、電気的な少なくとも２つの接続導体を同一の側に配置されてなる半導体チップに適している。このようなチップはチップ窓内で接点と一緒に接続導体上に組み付けられて電気的に接続される。このようにして、パターン形成された接続導体層、パターン形成された支持体層及び半導体チップから成るユニットは続いて射出成形金型内に装着され、射出成形金型内で半導体チップは被覆材料によって射出成形被覆され、該被覆材料は続いて少なくとも部分的に硬化される。   In the second embodiment, an electrically insulating support layer is first applied to the conductive connecting conductor layer. Then, at least one chip window is formed on the support layer and at least two external electrical connection conductors are formed on the connection conductor layer, the connection conductor partially overlapping the chip window. Such a configuration is suitable, for example, for a semiconductor chip in which at least two electrical connection conductors are arranged on the same side. Such a chip is assembled on the connection conductor together with the contacts in the chip window to be electrically connected. In this way, the unit comprising the patterned connection conductor layer, the patterned support layer and the semiconductor chip is subsequently mounted in an injection mold, in which the semiconductor chip is covered by the coating material. It is injection molded coated and the coating material is subsequently at least partially cured.

複数の半導体素子の同時的な製造のための方法においては、接続導体層及び支持体層から成るラミネートストリップに、それぞれ複数の素子領域から成る複数の区画を形成し、この場合に各区画において各素子領域は、それぞれ少なくとも１つのチップ窓及び外部の電気的な少なくとも２つの接続導体を有している。次いで前述の方法と同様に各チップ窓内にそれぞれ少なくとも１つの半導体チップを組み込む。区画の射出成形被覆及び個別化は、前述の方法と同じ形式で行われる。   In the method for simultaneous manufacture of a plurality of semiconductor elements, a plurality of sections each including a plurality of element regions are formed on a laminate strip composed of a connecting conductor layer and a support layer, and in this case, each section is divided into each section. Each element region has at least one chip window and at least two external electrical connection conductors. Next, at least one semiconductor chip is incorporated in each chip window in the same manner as described above. The injection molding coating and individualization of the compartments takes place in the same manner as described above.

本発明に基づく該方法は、基板フレーム上に発光ダイオードを組み付けてなる発光ダイオード素子の製造に特に適している。   The method according to the invention is particularly suitable for the production of light-emitting diode elements comprising a light-emitting diode assembled on a substrate frame.

接続導体層（有利にはパターン形成された金属シートから成る）及び支持体層（有利にはパターン形成されたプラスチックシートから成る）を備えていて区画（該区画内に複数の素子領域が設けられている）を成形されている基板フレームストリップにおいて、接続導体層は隣接のそれぞれ２つの素子領域間の切断線に沿って少なくとも部分的に除去されている。接続導体層の切断線に沿った除去は、区画の射出成形被覆の後の基板フレームの分割切断（個別化）を容易にする。   A connecting conductor layer (preferably consisting of a patterned metal sheet) and a support layer (preferably consisting of a patterned plastic sheet) are provided with a compartment (in which a plurality of device regions are provided). The connecting conductor layer is at least partially removed along the cutting line between each two adjacent element regions. The removal of the connecting conductor layer along the cutting line facilitates the split cutting (individualization) of the substrate frame after the injection molding coating of the compartments.

接触窓は、チップ組み付け及び導線敷設位置の調節の際の容易な監視を可能にする。チップ組み付け位置及び／又は導線敷設位置の不当に大きな誤差は迅速に識別可能であり、それというのは半導体チップ若しくは接続導線は組み付けの後に接触窓の縁部に載っている場合にはシートに付着しないからである。このことは構成寸法を小さくすればするほど重要であり、それというのは一面で素子の信頼性は、チップ封体の容積を小さくすればするほどチップ組み付けの調節誤差によって大きく損なわれ、かつ他面で調節誤差を直ちに識別できない場合の不良品量は素子の高いパッケージ密度ひいては基板フレーム帯材の単位長さ当たりに形成される素子の数量の大きいことに基づき極めて大きくなるからである。   The contact window allows for easy monitoring during chip assembly and conductor laying position adjustment. Unreasonably large errors in the chip assembly position and / or conductor laying position can be quickly identified because the semiconductor chip or connecting conductor adheres to the sheet if it is on the edge of the contact window after assembly. Because it does not. This is more important as the component size is smaller, because the reliability of the device is greatly impaired by the adjustment error of the chip assembly as the volume of the chip envelope is reduced. This is because the amount of defective products in the case where the adjustment error cannot be immediately identified on the surface becomes extremely large due to the high package density of the elements and the large number of elements formed per unit length of the substrate frame strip.

本発明の有利なさらなる構成は図示の実施例に関連して説明する。   Advantageous further configurations of the invention are described in connection with the illustrated embodiment.

図１は、本発明の方法に基づき成形された半導体素子の第１の実施例の概略断面図であり、
図２は、本発明の方法に基づき成形された半導体素子の第２の実施例の概略断面図であり、
図３ａ乃至図３ｆは、本発明に基づく方法の１つの実施例の工程経過を示す概略図であり、
図４ａ乃至図４ｅは、本発明に基づく方法の別の実施例の工程経過を示す概略図であり、
図５ａ及び図５ｂは、本発明に基づく基板フレームの概略的な下面図及び概略的な平面図であり、
図６ａ及び図６ｂは、射出成形被覆された半導体チップを備える基板フレームストリップの一部分の概略的な平面図及び概略的な下面図であり、
図７は、基板フレームストリップの装着されている射出成形金型の部分的な概略断面図であり、
図８は、射出成形被覆された半導体チップを備えた基板フレームストリップの部分的な概略断面図である。 FIG. 1 is a schematic cross-sectional view of a first embodiment of a semiconductor device formed according to the method of the present invention,
FIG. 2 is a schematic cross-sectional view of a second embodiment of a semiconductor device molded according to the method of the present invention,
Figures 3a to 3f are schematic diagrams showing the process steps of one embodiment of the method according to the invention,
Figures 4a to 4e are schematic diagrams showing the process sequence of another embodiment of the method according to the invention,
5a and 5b are a schematic bottom view and schematic plan view of a substrate frame according to the present invention,
6a and 6b are a schematic plan view and a schematic bottom view of a portion of a substrate frame strip comprising an injection molded coated semiconductor chip;
FIG. 7 is a partial schematic cross-sectional view of an injection mold on which a substrate frame strip is mounted,
FIG. 8 is a partial schematic cross-sectional view of a substrate frame strip with an injection molded coated semiconductor chip.

図示の実施例で同じ機能の構成部分（構成要素）には同じ符号を付けてある。   In the illustrated embodiment, components (components) having the same function are denoted by the same reference numerals.

図１若しくは図２に示す表面実装可能な半導体素子、例えば例として光を発する半導体素子のための基板フレーム１０の製造方法は、通常は次のような工程を有しており、即ち
ａ）電気絶縁性の支持体層１０１及び導電性の接続導体層１０２（これに適した材料は、例えば銅及び銅合金）から成る層複合体の製造、支持体層は有利にはポリイミド若しくは、ポリイミド含有の材料から成るプラスチック・シートである（図３ａ及び図４ａ）、
ｂ）マスク及びエッチングによる支持体層１０１のパターン形成、この場合、支持体層内に第１の接触窓７及び第２の接触窓８を形成して、該接触窓は後の第１の接続導体２及び第２の接続導体３に通じ（図３ｂ〜図３ｄ及び図４ｂ〜図４ｃ）、
ｃ）マスク及びエッチングによる接続導体層１０２のパターン形成、この場合、第１の電気的な接続導体２及び第２の電気的な接続導体３を形成して、該接続導体は第１の接触窓７若しくは第２の接触窓８を介して電気的に接続可能であり（図３ｅ〜図３ｆ及び図４ｄ〜図４ｅ）
工程ｃ）は変化例として工程ｂ）の前に行われてよい。接続支持体層１０１の厚さは３０μｍ乃至６０μｍであり、このことは接続導体層１０２の厚さにも当てはまる。 The manufacturing method of the substrate frame 10 for a surface-mountable semiconductor element shown in FIG. 1 or 2, for example, a semiconductor element that emits light, for example, usually includes the following steps: a) Electricity The production of a layer composite consisting of an insulating support layer 101 and a conductive connecting conductor layer 102 (materials suitable for this being, for example, copper and copper alloys), the support layer being preferably polyimide or polyimide-containing A plastic sheet of material (FIGS. 3a and 4a),
b) Patterning of the support layer 101 by masking and etching, in this case forming a first contact window 7 and a second contact window 8 in the support layer, the contact windows being the first connection after Leads to the conductor 2 and the second connecting conductor 3 (FIGS. 3b to 3d and 4b to 4c);
c) Pattern formation of the connection conductor layer 102 by masking and etching, in this case, forming the first electrical connection conductor 2 and the second electrical connection conductor 3, the connection conductor being the first contact window 7 or the second contact window 8 can be electrically connected (FIGS. 3e to 3f and 4d to 4e).
Step c) may be performed before step b) as a variant. The thickness of the connection support layer 101 is 30 μm to 60 μm, and this also applies to the thickness of the connection conductor layer 102.

支持体層１０１はパターン形成の前には少なくともパターン形成すべき領域をまだ硬化されておらずに、適当な溶剤によって除去可能であり、接触窓７，８の面を除いてかつ必要に応じて後でさらに除去すべき残りの領域を除いて溶解の前に硬化される。支持体層の硬化されていない領域は後で除去される。   Prior to pattern formation, the support layer 101 is not yet cured at least in the region to be patterned, and can be removed with a suitable solvent, except for the surfaces of the contact windows 7 and 8, and as required. It is cured prior to dissolution except for the remaining areas to be further removed later. The uncured area of the support layer is later removed.

プラスチック層のパターン形成のために、まずプラスチック層上にフォトレジスト層１０３を形成し（図３ｂ）、フォトレジスト層は公知の方法でパターン形成されて、接触窓７，８の領域７０，８０はフォトレジスト層１０３によって被覆されている（図３ｃ）。プラスチック層は、被覆されていない領域を有利にはＵＶ・放射１０５によって硬化される（図３ｃ）。続いて領域７０，８０でフォトレジスト層１０３及び該層の下側にあるプラスチック層は接続導体層１０２から離される。このための適当な溶剤は、例えばIPA(Isopropanol イソプロパノール)やアセトンである。   In order to pattern the plastic layer, first, a photoresist layer 103 is formed on the plastic layer (FIG. 3b). The photoresist layer is patterned by a known method, and the regions 70 and 80 of the contact windows 7 and 8 are formed. Covered by a photoresist layer 103 (FIG. 3c). The plastic layer is preferably cured in the uncoated areas by UV radiation 105 (FIG. 3c). Subsequently, in regions 70 and 80, the photoresist layer 103 and the plastic layer below the layer are separated from the connecting conductor layer 102. Suitable solvents for this are, for example, IPA (Isopropanol isopropanol) or acetone.

プラスチック層のパターン形成のために異なる例では、まずプラスチック層の上にフォトマスク１０４を配置して、フォトマスクは接触窓７，８の領域７０，８０を遮蔽している（図４ｂ）。次いでプラスチック層は、接続導体層１０２上に残されるべき領域を有利にはＵＶ・放射１０５によって硬化される（図４ｂ）。続いてフォトマスク１０４は取り除かれて、接触窓７，８の領域７０，８０でプラスチック層は適当な溶剤１０６を用いて接続導体層１０２からエッチング除去される（図４ｃ）。   In a different example for patterning the plastic layer, a photomask 104 is first placed on the plastic layer, which masks the areas 70, 80 of the contact windows 7, 8 (FIG. 4b). The plastic layer is then cured, preferably by UV radiation 105, in the areas to be left on the connecting conductor layer 102 (FIG. 4b). Subsequently, the photomask 104 is removed and the plastic layer is etched away from the connecting conductor layer 102 using a suitable solvent 106 in the regions 70, 80 of the contact windows 7, 8 (FIG. 4c).

複数の素子領域を有する導体フレームストリップ２００を製造する方法では、各素子領域に前述の方法によって少なくとも１つの接触窓７及び少なくとも２つの接続導体２，３を成形するようになっている。   In the method of manufacturing the conductor frame strip 200 having a plurality of element regions, at least one contact window 7 and at least two connection conductors 2 and 3 are formed in each element region by the method described above.

隣接する各２つの素子領域間の切断線１１０に沿って接続導体層は有利には、接続導体層の除去された切欠き１１１，１１２を有している（図５ａ及び図６ｂ）。   The connection conductor layer advantageously has notches 111, 112 from which the connection conductor layer has been removed along the cutting line 110 between each two adjacent element regions (FIGS. 5a and 6b).

図１に示すように少なくとも１つの発光ダイオードチップ１若しくはレーザーダイオードチップ、該半導体チップ１の少なくとも２つの接点４，５に接続された少なくとも２つの接続導体２，３並びに、接続支持体９及びチップ被覆体６から成るチップケーシング１１を備えた発光性の表面実装可能な構成素子の製造のための１つの方法では、
ａ）接続導体層１０２上に支持体層１０１を形成し、次いで支持体層１０１内に少なくとも１つのチップ窓７及び少なくとも１つの導線窓８をパターン形成しかつ接続導体層１０２内に外部の電気的な接続導体２，３をパターン形成し；
ｂ）半導体チップ１をチップ窓７内に組み込み；
ｃ）半導体チップ１の少なくとも１つの電気的な接点５を、ボンディングワイヤ５０によって導線窓８を介して接続導体３に電気的に接続し；
ｄ）パターン形成された接続導体層１０２、パターン形成された支持体層１０１、半導体チップ１及びボンディングワイヤ５０から成るユニットを射出成形金型内に装着し、
ｅ）半導体チップ１をボンディングワイヤ５０と一緒に被覆材料６によって射出成形被覆し、次いで被覆材料を少なくとも部分的に硬化する。 As shown in FIG. 1, at least one light-emitting diode chip 1 or laser diode chip, at least two connection conductors 2, 3 connected to at least two contacts 4, 5 of the semiconductor chip 1, and a connection support 9 and chip In one method for the production of a luminescent surface-mountable component with a chip casing 11 consisting of a covering 6,
a) A support layer 101 is formed on the connection conductor layer 102, and then at least one chip window 7 and at least one conductor window 8 are patterned in the support layer 101 and external electrical power is connected in the connection conductor layer 102. Patterning the connecting conductors 2, 3;
b) incorporating the semiconductor chip 1 into the chip window 7;
c) at least one electrical contact 5 of the semiconductor chip 1 is electrically connected to the connection conductor 3 via the conductor window 8 by means of a bonding wire 50;
d) A unit comprising the patterned connection conductor layer 102, the patterned support layer 101, the semiconductor chip 1 and the bonding wire 50 is mounted in an injection mold,
e) The semiconductor chip 1 is injection-molded with the coating material 6 together with the bonding wires 50 and then the coating material is at least partially cured.

この種の構成素子の大量生産のためには、接続導体層１０２及び支持体層１０１から成る積層ストリップ内に、それぞれ少なくとも１つのチップ窓７、少なくとも１つの導線接続窓８及び少なくとも２つの接続導体２，３から成る複数の素子領域２０２を備えた区画２０１が成形される（図６ａ及び図６ｂ、参照）。半導体チップ１をチップ窓７内に組み込みかつ半導体チップ１と接続導体２，３とを電気的に接続した後に、各区画（フィールド）は射出成形金型５００（図７）内に装着されるようになっており、射出成形金型は、各区画２０１にとって該各１つの区画２０１のすべての素子領域２０２に亘って広がっていてかつもっぱら半導体チップ１の側で空間を成すそれぞれ唯一のキャビティー５０１を有している。被覆材料６０をキャビティー５０１内に射出しかつ少なくとも部分的に硬化させた後に、区画２０１は射出成形金型５００から取り出されて、被覆材料６０及び支持体層１０１の分割によって、互いに分離された半導体素子に個別化される。   For mass production of this type of component, at least one chip window 7, at least one conductor connection window 8 and at least two connection conductors, respectively, in a laminated strip comprising a connection conductor layer 102 and a support layer 101. A section 201 having a plurality of element regions 202 composed of two or three is formed (see FIGS. 6a and 6b). After the semiconductor chip 1 is assembled in the chip window 7 and the semiconductor chip 1 and the connection conductors 2 and 3 are electrically connected, each section (field) is mounted in the injection mold 500 (FIG. 7). The injection mold has a unique cavity 501 that extends over all element regions 202 of each section 201 for each section 201 and forms a space exclusively on the side of the semiconductor chip 1. have. After the coating material 60 is injected into the cavity 501 and at least partially cured, the compartment 201 is removed from the injection mold 500 and separated from each other by splitting the coating material 60 and the support layer 101. Individualized into semiconductor elements.

少なくとも１つの発光ダイオードチップ１若しくはレーザーダイオードチップ１、該半導体チップ１の電気的な少なくとも２つの接点４，５に接続された少なくとも２つの接続導体２，３及び、接続支持体９及びチップ被覆体６から成るチップケーシング１１を備えた図２に示す自発光式の表面実装可能な素子の製造のための方法は、前述の方法に対してもっぱら次のことによって異なっており、即ち、各素子領域は１つのチップ窓のみを有し、導線接続窓を有しておらず、チップ１は反転されてチップ窓７内で、光の放出されるエピタキシャル側を接続導体２，３に向けて該接続導体上に組み付けられる。電気的な両方の接点４，５はチップ１の同じ側に存在している。接点４は接続導体２に接触し、かつ接点５は接続導体３に接触している。   At least one light-emitting diode chip 1 or laser diode chip 1, at least two connection conductors 2, 3 connected to at least two electrical contacts 4, 5 of the semiconductor chip 1, and a connection support 9 and a chip covering The method for manufacturing the self-luminous surface-mountable element shown in FIG. 2 with a chip casing 11 consisting of 6 differs from the above-described method exclusively by the following: Has only one chip window, no conductor connection window, the chip 1 is inverted and connected in the chip window 7 with the light-emitting epitaxial side facing the connection conductors 2 and 3 It is assembled on the conductor. Both electrical contacts 4 and 5 are on the same side of the chip 1. The contact 4 is in contact with the connection conductor 2, and the contact 5 is in contact with the connection conductor 3.

支持体層は、前に述べてあるように有利にはＵＶ・放射（ＵＶ・照射）によって硬化可能である。別の例として支持体層は熱放射によって硬化可能であってよい。支持体層は有利にはポリイミド・モノマーから成っている。   The support layer is preferably curable by UV-radiation (UV-irradiation), as mentioned previously. As another example, the support layer may be curable by thermal radiation. The support layer preferably consists of a polyimide monomer.

本発明に基づく方法は有利には、電磁的なビームを放出及び／又は受け取る１つ若しくは複数の半導体チップを含む構成素子の製造のために適している。該方法は特に、寸法０４０２（０．５ｍｍ×１．０ｍｍに相当）若しくはそれより小さくかつ高さ４００μｍ、特に３５０μｍ以下のケーシング形状を有するルミネセンスダイオード・素子の製造に適している。   The method according to the invention is advantageously suitable for the manufacture of components comprising one or more semiconductor chips that emit and / or receive electromagnetic beams. The method is particularly suitable for the manufacture of luminescent diodes / elements having a casing shape of dimension 0402 (corresponding to 0.5 mm × 1.0 mm) or smaller and a height of 400 μm, in particular 350 μm or less.

光電式の構成素子においては、チップ被覆体若しくはチップ封止体は、電磁ビームを透過させる材料から、発光の場合に特に透明若しくは半透明な材料から形成される。有利な被覆材料は透明なプラスチック材料である。このような材料は知られているので、詳細は省略する。   In the photoelectric component, the chip covering body or the chip sealing body is formed from a material that transmits an electromagnetic beam, and from a transparent or translucent material particularly in the case of light emission. An advantageous coating material is a transparent plastic material. Since such materials are known, details are omitted.

混合色の光を放出するルミネセンスダイオード素子の製造のためには、チップ被覆体は発光物質を混合されており、発光物質はルミネセンスダイオードチップから放出された電磁ビームの少なくとも一部分を吸収して、次いで異なる波長及び色の電磁ビームを放出する。   For the manufacture of luminescent diode elements that emit light of mixed colors, the chip covering is mixed with a luminescent material that absorbs at least a portion of the electromagnetic beam emitted from the luminescent diode chip. And then emitting electromagnetic beams of different wavelengths and colors.

キャビティー内への被覆材料の射出は有利には側面からスリットノズルを介して行われる。被覆材料を少なくとも部分的に硬化させた後に、区画は射出成形金型から取り出されて、素子領域間でチップ被覆材料及び基板フレームを分割することによって個別の半導体素子に個別化される。   Injection of the coating material into the cavity is preferably effected from the side via a slit nozzle. After at least partially curing the coating material, the compartment is removed from the injection mold and individualized into individual semiconductor devices by dividing the chip coating material and the substrate frame between the device regions.

チップ被覆は有利には半導体チップ上及び必要に応じて１つ若しくは複数のボンディング線上の中央領域で、中央領域の周囲の縁部区分よりも大きな厚さで形成されている。このために、キャビティー５０１は、平面で見て各半導体チップ１と合致する、即ち覆い重なる複数の凹設部５０２を有している。これによって、被覆材料の体積は被覆材料の厚さを、許される領域、即ち縁部区分で、半導体チップの領域及び必要に応じて半導体チップへの１つ若しくは複数のボンディング線５０の領域、即ち中央領域よりも小さくすることに基づき、減少されている。その結果、製造過程中に基板フレーム用積層板とチップ被覆との異なる熱膨張に起因する素子・区画の反りは避けられる。   The chip covering is preferably formed in the central region on the semiconductor chip and optionally on one or more bonding lines, with a thickness greater than the edge section around the central region. For this purpose, the cavity 501 has a plurality of recessed portions 502 that coincide with the semiconductor chips 1 when viewed in plan, that is, overlap each other. Thereby, the volume of the coating material determines the thickness of the coating material in the allowed area, i.e. the edge section, the area of the semiconductor chip and optionally the area of one or more bonding lines 50 to the semiconductor chip, i.e. It is reduced based on making it smaller than the central region. As a result, warpage of elements and sections due to different thermal expansion between the substrate frame laminate and the chip coating during the manufacturing process can be avoided.

有利には区画の各１つの半導体チップ上にそれぞれ個別の１つの凹設部５０２を設けてあり、これによって被覆材料は射出成形の後に、並べて配置された複数の***部５１を有し、即ち板チョコレートに類似の構造パターンを有している（図８、参照）。   Advantageously, there is a separate recess 502 on each semiconductor chip of the compartment, whereby the coating material has a plurality of ridges 51 arranged side by side after injection molding, i.e. It has a structural pattern similar to chocolate bar (see FIG. 8).

区画の個別化は有利には、被覆材料及び基板フレームを***部５１間の溝５２で分割切断することによって行われる。   The individualization of the compartments is advantageously performed by dividing and cutting the coating material and the substrate frame at the grooves 52 between the ridges 51.

有利には射出成形金型５００内への区画の装着の前に、基板フレーム上への被覆材料の付着の改善に役立つ付着媒体を支持体層１０１に塗布するとよい。このために、有利には上塗り用PIワニスを用いるとよい。   Advantageously, prior to mounting the compartments in the injection mold 500, an attachment medium that helps to improve the adhesion of the coating material onto the substrate frame is applied to the support layer 101. For this purpose, it is advantageous to use a PI varnish for overcoating.

個別化の後の半導体素子の技術的に簡単な取り扱いを目的として、基板フレームは射出成形金型内への装着の前に裏面に補助シート４００を積層されてよい。補助シートは一面では接続導体２，３を機械的な損傷（引っ掻き）に対して保護し、かつ他面では接続導体を被覆材料の不都合な付着に対して、即ち基板フレームストリップの裏面への射出漏れに対して保護している。   For the purpose of technically simple handling of the semiconductor elements after individualization, the substrate frame may be laminated with an auxiliary sheet 400 on the back surface before mounting in the injection mold. The auxiliary sheet protects the connecting conductors 2 and 3 against mechanical damage (scratching) on one side and the connecting conductor on the other side against inadvertent adhesion of the coating material, ie injection onto the back side of the substrate frame strip. Protects against leaks.

補助シートは有利には、被覆材料と類似の熱膨張係数若しくは大きな熱膨張係数を有していて、区画の射出成形被覆の後に行われる被覆材料の硬化及び／又は冷却に際して被覆材料の、基板フレームよりも大きい収縮に起因して生じる区画の反りに抗して作用するようになっている。   The auxiliary sheet preferably has a coefficient of thermal expansion similar to or greater than that of the coating material, and the substrate frame of the coating material upon curing and / or cooling of the coating material after the injection molding coating of the compartment It acts against the warping of the compartment caused by greater contraction.

原理的に同じ目的で、ラミネートストリップは区画の外側に、異なる熱膨張及び／又は材料収縮に起因して生じる応力を減少させるために孔、貫通開口及び／又はスリットを有していてよい。   For the same purpose in principle, the laminate strip may have holes, through-openings and / or slits on the outside of the compartment in order to reduce the stresses caused by different thermal expansion and / or material shrinkage.

別の手段として若しくは付加的な手段として、反らせ形の射出成形金型を用いることも可能であり、該射出成形金型内では区画は、後で熱膨張係数の大きな材料を装填される側から見て凸面状に湾曲されている。   As another means or as an additional means, it is also possible to use a warped injection mold, in which the compartment is from the side which is subsequently loaded with a material having a high coefficient of thermal expansion. It is curved in a convex shape as seen.

半導体素子の電気的及び／又は光学的なテストを可能にするために、区画は個別化の前に被覆側にシートを被着され、次いで必要に応じて補助シートは基板フレームの裏面側から剥がされる。半導体素子の光学的な測定を必要とする場合には、シートは有利には電磁線を透過させるものであり、測定はシートを通して行われる。   To allow electrical and / or optical testing of the semiconductor elements, the compartments are coated with a sheet on the coated side prior to individualization, and then the auxiliary sheet is peeled off from the back side of the substrate frame if necessary. It is. If optical measurement of the semiconductor element is required, the sheet is preferably transparent to electromagnetic radiation and the measurement is performed through the sheet.

前述のすべての方法において、区画の個別化（分割切断）は有利には、鋸切断、レーザー切断及び／又は水流ジェット切断によって行われる。   In all the above-mentioned methods, the individualization of the compartments (split cutting) is advantageously performed by saw cutting, laser cutting and / or water jet cutting.

本発明は図示の実施例に限定されるものではなく、本発明の前述の実施例並びに請求項に記載の各手段は、個別に用いて、若しくは適切に組み合わせて用いて実施され得るものである。   The present invention is not limited to the embodiments shown in the drawings, and each of the means described in the above embodiments and claims of the present invention can be implemented individually or in appropriate combination. .

本発明の方法に基づき成形された半導体素子の第１の実施例の概略断面図1 is a schematic cross-sectional view of a first embodiment of a semiconductor device formed according to the method of the present invention. 本発明の方法に基づき成形された半導体素子の第２の実施例の概略断面図Schematic sectional view of a second embodiment of a semiconductor device molded according to the method of the present invention 本発明に基づく方法の１つの実施例の第１の製造工程を示す概略図Schematic showing the first manufacturing process of one embodiment of the method according to the invention 本発明に基づく方法の１つの実施例の第２の製造工程を示す概略図Schematic showing the second manufacturing step of one embodiment of the method according to the invention 本発明に基づく方法の１つの実施例の第３の製造工程を示す概略図Schematic showing the third manufacturing step of one embodiment of the method according to the invention 本発明に基づく方法の１つの実施例の第４の製造工程を示す概略図Schematic showing the fourth manufacturing step of one embodiment of the method according to the invention 本発明に基づく方法の１つの実施例の第５の製造工程を示す概略図Schematic showing the fifth manufacturing step of one embodiment of the method according to the invention 本発明に基づく方法の１つの実施例の第６の製造工程を示す概略図Schematic showing the sixth manufacturing step of one embodiment of the method according to the invention 本発明に基づく方法の別の実施例の第１の製造工程を示す概略図Schematic showing the first manufacturing process of another embodiment of the method according to the invention 本発明に基づく方法の別の実施例の第２の製造工程を示す概略図Schematic showing the second manufacturing step of another embodiment of the method according to the invention 本発明に基づく方法の別の実施例の第３の製造工程を示す概略図Schematic showing the third manufacturing process of another embodiment of the method according to the invention 本発明に基づく方法の別の実施例の第４の製造工程を示す概略図Schematic showing the fourth manufacturing step of another embodiment of the method according to the invention 本発明に基づく方法の別の実施例の第５の製造工程を示す概略図Schematic showing the fifth manufacturing step of another embodiment of the method according to the invention 本発明に基づく基板フレームの概略的な下面図Schematic bottom view of a substrate frame according to the present invention 本発明に基づく基板フレームの概略的な平面図Schematic plan view of a substrate frame according to the invention 射出成形被覆された半導体チップを備える基板フレームストリップの一部分の概略的な平面図Schematic top view of a portion of a substrate frame strip comprising an injection molded coated semiconductor chip 射出成形被覆された半導体チップを備える基板フレームストリップの一部分の概略的な下面図Schematic bottom view of a portion of a substrate frame strip with injection molded coated semiconductor chips 基板フレームストリップの装着されている射出成形金型の部分的な概略断面図Partial schematic cross-sectional view of an injection mold on which a substrate frame strip is mounted 射出成形被覆された半導体チップを備える基板フレームストリップの部分的な概略断面図Partial schematic cross-sectional view of a substrate frame strip comprising an injection molded coated semiconductor chip

符号の説明Explanation of symbols

２，３ 接続導体、 ４，５ 接点、 ６ チップ被覆体、 ７，８ 接触窓、 ９ 接続支持体、 １０ 基板フレーム、 ５１ ***部、 ５２ 溝、 ６０ 被覆体、 ７０，８０ 領域、 １０１ 支持体層、 １０２ 接続導体層、 １０３ フォトレジスト層、 １０４ フォトマスク、 １１０ 切断線、 １１１，１１２ 切欠き、 ２０１ 区画、 ２０２ 素子領域、 ４００ 補助シート、 ５００ 射出成形金型、 ５０１ キャビティー   2, 3 connection conductors, 4, 5 contacts, 6 chip cover, 7, 8 contact window, 9 connection support, 10 substrate frame, 51 raised portion, 52 groove, 60 cover, 70, 80 region, 101 support Layer, 102 connecting conductor layer, 103 photoresist layer, 104 photomask, 110 cutting line, 111, 112 notch, 201 section, 202 element region, 400 auxiliary sheet, 500 injection mold, 501 cavity

Claims (41)

電気的な基板フレーム（１０）の製造のための方法、殊に発光ダイオード素子のための電気的な基板フレームの製造のための方法であって、電気的な第１及び第２の少なくとも１つの接続導体（２，３）を備えていて、次の工程を有しおり、即ち
ａ）電気絶縁性の支持体層（１０１）及び導電性の接続導体層（１０２）から成る層複合体を成形する工程、
ｂ）支持体層（１０１）をパターン形成して、該支持体層に接続導体層（１０２）への少なくとも１つの接触窓（７）を成形する工程、
ｃ）接続導体層（１０２）をパターン形成して、電気的な第１の接続導体（２）及び電気的な第２の接続導体（３）を成形する工程を有し、該接続導体の少なくとも１つの接続導体は接触窓（７）を介して電気的に接続されるものであることを特徴とする、電気的な基板フレームの製造のための方法。 Method for the manufacture of an electrical substrate frame (10), in particular a method for the manufacture of an electrical substrate frame for a light-emitting diode element, wherein the electrical first and second at least one A connecting composite (2, 3) comprising the following steps: a) forming a layer composite comprising an electrically insulating support layer (101) and a conductive connecting conductor layer (102) Process,
b) patterning the support layer (101) and forming at least one contact window (7) to the connecting conductor layer (102) in the support layer;
c) patterning the connection conductor layer (102) to form an electrical first connection conductor (2) and an electrical second connection conductor (3), wherein at least one of the connection conductors A method for manufacturing an electrical substrate frame, characterized in that one connection conductor is electrically connected via a contact window (7). 工程ｃ）を工程ｂ）の前に行う請求項１記載の方法。   The method of claim 1 wherein step c) is performed prior to step b). 支持体層（１０１）が、マスク技術及びエッチング技術によってパターン形成可能なプラスチック層である請求項１又は２記載の方法。   The method according to claim 1 or 2, wherein the support layer (101) is a plastic layer that can be patterned by masking and etching techniques. 支持体層（１０１）がプラスチック・シートであり、かつ接続導体層（１０２）が、ほぼ金属から成るシートである請求項１から３のいずれか１項記載の方法。   4. A method according to claim 1, wherein the support layer (101) is a plastic sheet and the connecting conductor layer (102) is a sheet consisting essentially of metal. 支持体層（１０１）の厚さが８０μｍよりも小さい値、殊に３０μｍと６０μｍとの間の値を有している請求項１から４のいずれか１項記載の方法。   5. The process as claimed in claim 1, wherein the thickness of the support layer (101) has a value of less than 80 [mu] m, in particular between 30 and 60 [mu] m. 接続導体層（１０２）の厚さが８０μｍよりも小さい値、殊に３０μｍと６０μｍとの間の値を有している請求項１から５のいずれか１項記載の方法。   6. The method as claimed in claim 1, wherein the thickness of the connecting conductor layer (102) has a value of less than 80 [mu] m, in particular between 30 and 60 [mu] m. 支持体層（１０１）に第１の接触窓（７）及び第２の接触窓（８）を成形し、接触窓が第１の接続導体（２）若しくは第２の接続導体（３）に通じている請求項１から６のいずれか１項記載の方法。   A first contact window (7) and a second contact window (8) are formed on the support layer (101), and the contact window communicates with the first connection conductor (2) or the second connection conductor (3). A method according to any one of claims 1 to 6. 支持体層（１０１）がパターン形成の前には少なくともパターン形成すべき領域を、硬化されていないエッチング可能なプラスチック層から成っていて、接触窓（７，８）の面を除いて、かつ必要に応じて後で再び除去すべき領域を除いて、硬化され、続いて接触窓（７，８）の硬化されていない領域を除去する請求項１から７のいずれか１項記載の方法。   Prior to patterning of the support layer (101), at least the area to be patterned is made of an uncured etchable plastic layer, excluding the face of the contact window (7, 8) and necessary 8. The method according to claim 1, further comprising the step of removing the uncured areas of the contact window (7, 8), with the exception of those areas which are to be removed again later. プラスチック層のパターン形成のために、まずプラスチック層にマスク層（１０３）、特にフォトレジスト層を施し、マスク層（１０３）をパターン形成して、若しくはパターン形成されたマスク層（１０３）を設けて、接触窓（７，８）の領域（７０，８０）をマスク層によって覆い、プラスチック層が接続導体層（１０２）に残すべき領域を硬化されて、次いで少なくとも接触窓（７，８）の領域（７０，８０）でフォトレジスト層及びその下にあるプラスチック層を接続導体層（１０２）から除去する請求項８記載の方法。   For pattern formation of the plastic layer, first, a mask layer (103), in particular, a photoresist layer is applied to the plastic layer, and the mask layer (103) is patterned, or a patterned mask layer (103) is provided. The region (70, 80) of the contact window (7, 8) is covered with a mask layer, the region where the plastic layer should be left on the connecting conductor layer (102) is cured, and then at least the region of the contact window (7, 8) The method of claim 8, wherein the photoresist layer and the underlying plastic layer are removed from the connecting conductor layer (102) at (70, 80). プラスチック層のパターン形成のために、まずプラスチック層の上にフォトマスク（１０４）を配置して、フォトマスクによって接触窓（７，８）の領域（７０，８０）を遮蔽し、プラスチック層は接続導体層（１０２）に残すべき領域を硬化されて、次いでフォトマスク層（１０４）を外し、続いて接触窓（７，８）の領域（７０，８０）でプラスチック層を接続導体層（１０２）から除去する請求項８記載の方法。   In order to pattern the plastic layer, a photomask (104) is first placed on the plastic layer, and the region (70, 80) of the contact window (7, 8) is shielded by the photomask, and the plastic layer is connected. The area to be left in the conductor layer (102) is cured, and then the photomask layer (104) is removed, and then the plastic layer is connected to the conductor layer (102) in the area (70, 80) of the contact window (7, 8). 9. The method of claim 8, wherein the method is removed from. プラスチック層をＵＶ・放射（１０５）によって硬化する請求項９又は１０記載の方法。   11. A method according to claim 9 or 10, wherein the plastic layer is cured by UV radiation (105). プラスチック層を熱放射によって硬化する請求項９又は１０記載の方法。   11. A method according to claim 9 or 10, wherein the plastic layer is cured by thermal radiation. プラスチック層はポリイミド・モノマーを含んでいる請求項８から１２のいずれか１項記載の方法。   13. A method according to any one of claims 8 to 12, wherein the plastic layer comprises a polyimide monomer. 硬化されていないプラスチック層をエッチング（１０６）によって接続導体層（１０２）から除去する請求項９から１３のいずれか１項記載の方法。   14. The method according to any one of claims 9 to 13, wherein the uncured plastic layer is removed from the connecting conductor layer (102) by etching (106). 接続導体層（１０２）をエッチングによってパターン形成する請求項９から１４のいずれか１項記載の方法。   The method according to claim 9, wherein the connecting conductor layer is patterned by etching. 複数の素子領域（２０２）から成る基板フレームストリップ（２００）を製造するための方法において、各素子領域（２０２）内に、先行の請求項のいずれか１項に記載の方法によって少なくとも１つの接触窓（７）及び電気的な少なくとも２つの接続導体（２，３）を成形することを特徴とする、基板フレームストリップの製造のための方法。   A method for manufacturing a substrate frame strip (200) comprising a plurality of device regions (202), wherein each device region (202) has at least one contact by a method according to any of the preceding claims. Method for the production of a substrate frame strip, characterized in that a window (7) and at least two electrical connection conductors (2, 3) are formed. 接続導体層（１０２）は隣接の各２つの素子領域間の切断線（１１０）に沿って少なくとも部分的に除去される請求項１６記載の方法。   The method of claim 16, wherein the connecting conductor layer (102) is at least partially removed along a cutting line (110) between each two adjacent element regions. 接続導体層を金属シートによって形成する請求項１から１７のいずれか１項記載の方法。   The method according to claim 1, wherein the connecting conductor layer is formed of a metal sheet. 表面実装可能な半導体素子を製造するための方法であって、少なくとも１つの半導体チップ（１）、半導体チップ（１）の電気的な少なくとも２つの接点（４，５）に接続された外部の電気的な少なくとも２つの接続導体（２，３）並びに、接続支持体（９）及びチップ被覆体（６）から成るチップケーシング（１１）を備えており、
ａ）まず導電性の接続導体層（１０２）に電気絶縁性の支持体層（１０１）を施し、次いで支持体層（１０１）に少なくとも１つのチップ窓（７）及び少なくとも１つの導線接続窓（８）をパターン形成し、かつ接続導体層（１０２）に外部の電気的な接続導体（２，３）をパターン形成し、
ｂ）半導体チップ（１）をチップ窓（７）内に組み込み、
ｃ）半導体チップ（１）の電気的な少なくとも１つの接点（５）を、ボンディングワイヤ（５０）によって導線接続窓（８）を介して１つの接続導体（３）に電気的に接続し、
ｄ）パターン形成された接続導体層（１０２）、パターン形成された支持体層（１０１）、半導体チップ（１）及びボンディングワイヤ（５０）から成るユニットを射出成形金型内に装着し、
ｅ）半導体チップ（１）をボンディングワイヤ（５０）も含み被覆材料（６）で射出成形被覆して、次いで被覆材料を少なくとも部分的に硬化することを特徴とする、表面実装可能な半導体素子の製造のための方法。 A method for manufacturing a surface-mountable semiconductor device comprising at least one semiconductor chip (1) and an external electrical connection connected to at least two electrical contacts (4, 5) of the semiconductor chip (1) Comprising at least two connecting conductors (2, 3) and a chip casing (11) comprising a connection support (9) and a chip covering (6),
a) First, an electrically insulating support layer (101) is applied to the conductive connection conductor layer (102), and then the support layer (101) is provided with at least one chip window (7) and at least one conductor connection window ( 8) and pattern external electrical connection conductors (2, 3) on the connection conductor layer (102),
b) incorporating the semiconductor chip (1) into the chip window (7);
c) electrically connecting at least one electrical contact (5) of the semiconductor chip (1) to one connection conductor (3) via a wire connection window (8) by means of a bonding wire (50);
d) A unit comprising a patterned connection conductor layer (102), a patterned support layer (101), a semiconductor chip (1) and a bonding wire (50) is mounted in an injection mold,
e) a surface-mountable semiconductor element, characterized in that the semiconductor chip (1), including the bonding wires (50), is injection-molded with a coating material (6) and then the coating material is at least partially cured. Method for manufacturing. 表面実装可能な半導体素子を製造するための方法であって、少なくとも１つの半導体チップ（１）、半導体チップ（１）の電気的な少なくとも２つの接点（４，５）に接続された外部の電気的な少なくとも２つの接続導体（２，３）並びに、接続支持体（９）及びチップ被覆体（６）から成るチップケーシング（１１）を備えており、
ａ）まず導電性の接続導体層（１０２）に電気絶縁性の支持体層（１０１）を施し、次いで支持体層（１０１）に少なくとも１つのチップ窓（７）をパターン形成し、かつ接続導体層（１０２）に外部の電気的な接続導体（２，３）をパターン形成し、この場合に両方の接続導体（２，３）をチップ窓（７）と部分的にオーバーラップさせ、
ｂ）半導体チップ（１）をチップ窓（７）内で接続導体（２，３）上に組み付けて、半導体チップ（１）の第１の接点（４）及び第２の接点（５）を電気的な接続導体のうちの第１の接続導体（２）若しくは第２の接続導体（３）に接触させかつ該接続導体と電気的に接続し、
ｃ）パターン形成された接続導体層（１０２）、パターン形成された支持体層（１０１）及び半導体チップ（１）から成るユニットを射出成形金型（５００）内に装着し、
ｄ）半導体チップ（１）を被覆材料（６）で射出成形被覆して、次いで被覆材料を少なくとも部分的に硬化することを特徴とする、表面実装可能な半導体素子の製造のための方法。 A method for manufacturing a surface-mountable semiconductor element, comprising at least one semiconductor chip (1), an external electrical connection connected to at least two electrical contacts (4, 5) of the semiconductor chip (1) And at least two connecting conductors (2, 3) and a chip casing (11) comprising a connection support (9) and a chip covering (6),
a) First, an electrically insulating support layer (101) is applied to the conductive connection conductor layer (102), and then at least one chip window (7) is patterned on the support layer (101), and the connection conductor is formed. Pattern external electrical connection conductors (2, 3) in layer (102), in which case both connection conductors (2, 3) partially overlap the chip window (7);
b) The semiconductor chip (1) is assembled on the connection conductors (2, 3) in the chip window (7), and the first contact (4) and the second contact (5) of the semiconductor chip (1) are electrically connected. Contacting the first connection conductor (2) or the second connection conductor (3) of the electrical connection conductors and electrically connecting to the connection conductor;
c) A unit consisting of a patterned connection conductor layer (102), a patterned support layer (101) and a semiconductor chip (1) is mounted in an injection mold (500),
d) A method for the production of surface-mountable semiconductor elements, characterized in that the semiconductor chip (1) is injection-molded coated with a coating material (6) and then the coating material is at least partially cured. 複数の半導体素子を請求項１９に記載の方法に基づき同時に製造するための方法において、
工程ａ）で、接続導体層（１０２）及び支持体層（１０１）から成る複合体に、それぞれ少なくとも１つのチップ窓（７）、少なくとも１つの導線接続窓（８）及び外部の電気的な少なくとも２つの接続導体（２，３）の備えられた複数の素子領域（２０２）から成る１つの区画（２０１）を形成し、
工程ｂ）及び工程ｃ）で、複数の半導体チップ（１）をチップ窓（７）内に組み込み、かつ半導体チップ（１）の電気的な接点（５）をボンディングワイヤ（５０）によって外部の電気的な接続導体（３）に接続し、
工程ｄ）で、区画を１つの射出成形金型（５００）内に装着し、射出成形金型内に、区画（２０１）全体にとって該区画（２０１）のすべての素子領域（２０２）に亘って広がっていてかつほぼもっぱら半導体チップ（１）の側で中空室を形成する唯一のキャビティー（５０１）を設けてあり、
工程ｅ）で、被覆材料（６０）をキャビティー（５０１）内に射出して、そこで少なくとも部分的に硬化させ、
続いて、区画（２０１）を射出成形金型（５００）から取り出して、被覆材料（６０）及び支持体層（１０１）の切断によって、互いに分離された半導体素子に個別化することを特徴とする、半導体素子の製造のための方法。 A method for simultaneously manufacturing a plurality of semiconductor devices according to the method of claim 19,
In step a), at least one chip window (7), at least one conductor connection window (8) and at least an external electrical connection are formed on the composite comprising the connection conductor layer (102) and the support layer (101), respectively. Forming a section (201) consisting of a plurality of element regions (202) provided with two connecting conductors (2, 3);
In step b) and step c), a plurality of semiconductor chips (1) are incorporated into the chip window (7), and the electrical contacts (5) of the semiconductor chip (1) are externally connected by bonding wires (50). Connected to a typical connecting conductor (3)
In step d), the compartment is mounted in one injection mold (500), and within the injection mold, the entire compartment (201) spans all element regions (202) of the compartment (201). A single cavity (501) is provided which is wide and forms a hollow chamber almost exclusively on the side of the semiconductor chip (1);
In step e), the coating material (60) is injected into the cavity (501) where it is at least partially cured;
Subsequently, the section (201) is taken out from the injection mold (500) and is separated into semiconductor elements separated from each other by cutting the coating material (60) and the support layer (101). A method for the manufacture of semiconductor devices. 複数の半導体素子を請求項２０に記載の方法に基づき同時に製造するための方法において、
工程ａ）で、接続導体層（１０２）及び支持体層（１０１）から成る複合体に、それぞれ少なくとも１つのチップ窓（７）及び外部の電気的な少なくとも２つの接続導体（２，３）の備えられた複数の素子領域（２０２）から成る１つの区画（２０１）を形成し、
工程ｂ）で、複数の半導体チップ（１）をチップ窓（７）内に組み込み、かつ所属の接続導体（２，３）に接続し、
工程ｃ）で、区画を１つの射出成形金型（５００）内に装着し、射出成形金型内に、区画（２０１）全体にとって該区画（２０１）のすべての半導体チップ（１）に亘って広がっていてかつほぼもっぱら半導体チップ（１）の側で中空室を形成する唯一のキャビティー（５０１）を設けてあり、
工程ｄ）で、被覆材料（６０）をキャビティー（５０１）内に射出して、そこで少なくとも部分的に硬化させ、
続いて、区画（２０１）を射出成形金型（５００）から取り出して、被覆材料（６０）及び支持体層（１０１）の切断によって、互いに分離された半導体素子に個別化することを特徴とする、半導体素子の製造のための方法。 A method for simultaneously manufacturing a plurality of semiconductor devices based on the method of claim 20,
In step a), at least one chip window (7) and at least two external electrical connection conductors (2, 3) are applied to the composite comprising the connection conductor layer (102) and the support layer (101), respectively. Forming a section (201) comprising a plurality of element regions (202) provided;
In step b), a plurality of semiconductor chips (1) are assembled in the chip window (7) and connected to the associated connecting conductors (2, 3),
In step c), the compartment is mounted in one injection mold (500), and within the injection mold, the entire compartment (201) spans all the semiconductor chips (1) in the compartment (201). A single cavity (501) is provided which is wide and forms a hollow chamber almost exclusively on the side of the semiconductor chip (1);
In step d), the coating material (60) is injected into the cavity (501) where it is at least partially cured;
Subsequently, the section (201) is taken out from the injection mold (500) and is separated into semiconductor elements separated from each other by cutting the coating material (60) and the support layer (101). A method for the manufacture of semiconductor devices. 半導体チップ（１）は発光ダイオードチップである請求項１９から２２のいずれか１項記載の方法。   23. A method according to any one of claims 19 to 22, wherein the semiconductor chip (1) is a light emitting diode chip. 発光ダイオードチップはエピタキシャル層を外部の電気的な接続導体に向けて、該接続導体上に組み付けられる請求項２３及び２０又は２２記載の方法。   23. The method according to claim 23, 20 or 22, wherein the light emitting diode chip is assembled on the connection conductor with the epitaxial layer facing the external electrical connection conductor. 支持体層（１０１）は、マスキング技術若しくはエッチング技術によってパターン形成可能なプラスチック層である請求項１９から２４のいずれか１項記載の方法。   25. A method according to any one of claims 19 to 24, wherein the support layer (101) is a plastic layer that can be patterned by masking or etching techniques. 支持体層（１０１）はプラスチック・シートであり、接続導体層（１０２）はほぼ金属から成るシートである請求項１９から２５のいずれか１項記載の方法。   26. A method according to any one of claims 19 to 25, wherein the support layer (101) is a plastic sheet and the connecting conductor layer (102) is a sheet consisting essentially of metal. 支持体層（１０１）の厚さは８０μｍよりも小さく、殊に３０μｍと６０μｍとの間である請求項１９から２６のいずれか１項記載の方法。   27. A method according to any one of claims 19 to 26, wherein the thickness of the support layer (101) is less than 80 [mu] m, in particular between 30 [mu] m and 60 [mu] m. 接続導体層（１０２）の厚さは８０μｍよりも小さく、殊に３０μｍと６０μｍとの間である請求項１９から２７のいずれか１項記載の方法。   28. A method according to any one of claims 19 to 27, wherein the thickness of the connecting conductor layer (102) is less than 80 [mu] m, in particular between 30 [mu] m and 60 [mu] m. 支持体層（１０１）に第１の接触窓（７）及び第２の接触窓（８）を成形し、これらの接触窓は第１の接続導体（２）若しくは第２の接続導体（３）に通じている請求項１９、２１及び２３から２８のいずれか１項記載の方法。   A first contact window (7) and a second contact window (8) are formed on the support layer (101), and these contact windows are the first connection conductor (2) or the second connection conductor (3). 29. A method according to any one of claims 19, 21 and 23 to 28, which leads to 支持体層（１０１）はパターン形成の前には少なくとも、パターン形成すべき領域を、未硬化でエッチング可能なプラスチック層から成っていて、接触窓（７，８）の面及び必要に応じて後で除去すべきほかの領域を除いて、硬化され、かつ、接触窓（７，８）の硬化されていない領域は続いて除去される請求項１９から２９のいずれか１項記載の方法。   Prior to patterning, the support layer (101) consists of an uncured and etchable plastic layer at least in the area to be patterned, and after the surface of the contact window (7, 8) and if necessary. 30. A method as claimed in any one of claims 19 to 29, wherein the hardened and unhardened areas of the contact window (7, 8) are subsequently removed, except for other areas to be removed in step (b). プラスチック層のパターン形成のために、まずプラスチック層上にマスク層（１０３）、殊にフォトレジスト層を施しかつパターン形成して、若しくはパターン形成されたマスク層（１０３）を設けて、接触窓（７，８）の領域（７０，８０）をマスク層（１０３）によって遮蔽し、プラスチック層は接続導体層（１０２）に残すべき領域を硬化されて、次いで少なくとも接触窓（７，８）の領域（７０，８０）でフォトレジスト層及びその下にあるプラスチック層を接続導体層（１０２）から除去する請求項３０記載の方法。   For patterning of the plastic layer, first a mask layer (103), in particular a photoresist layer and patterning, or a patterned mask layer (103) is provided on the plastic layer, and a contact window ( 7,8) is shielded by the mask layer (103), the plastic layer is hardened on the area to be left on the connecting conductor layer (102) and then at least the area of the contact window (7,8). 31. The method of claim 30, wherein the photoresist layer and the underlying plastic layer are removed from the connecting conductor layer (102) at (70, 80). プラスチック層のパターン形成のために、まずプラスチック層の上にフォトマスク（１０４）を配置して、フォトマスクによって接触窓（７，８）の領域（７０，８０）を遮蔽し、プラスチック層は接続導体層（１０２）に残すべき領域を硬化されて、次いでフォトマスク（１０４）を外し、続いて接触窓（７，８）の領域（７０，８０）でプラスチック層を接続導体層（１０２）から除去する請求項３０記載の方法。   In order to pattern the plastic layer, a photomask (104) is first placed on the plastic layer, and the region (70, 80) of the contact window (7, 8) is shielded by the photomask, and the plastic layer is connected. The area to be left in the conductor layer (102) is cured, then the photomask (104) is removed, and the plastic layer is subsequently removed from the connecting conductor layer (102) in the area (70, 80) of the contact window (7, 8). 32. The method of claim 30, wherein the method is removed. プラスチック層をＵＶ・放射（１０５）によって硬化する請求項３１又は３２記載の方法。   33. A method according to claim 31 or 32, wherein the plastic layer is cured by UV radiation (105). プラスチック層を熱放射によって硬化する請求項３１又は３２記載の方法。   33. A method according to claim 31 or 32, wherein the plastic layer is cured by thermal radiation. プラスチック層はポリイミド・モノマーを含んでいる請求項３１から３４のいずれか１項記載の方法。   35. A method according to any one of claims 31 to 34, wherein the plastic layer comprises a polyimide monomer. 硬化されていないプラスチック層をエッチング（１０６）によって接続導体層（１０２）から除去する請求項３１から３５のいずれか１項記載の方法。   36. A method according to any one of claims 31 to 35, wherein the uncured plastic layer is removed from the connecting conductor layer (102) by etching (106). 接続導体層（１０２）及び支持体層（１０１）を備えた基板フレームストリップ（２００）であって、基板フレームストリップに、複数の素子領域（２０２）を備える１つの区画（２０１）が形成されており、支持体層（１０１）は隣接の各２つの素子領域（２０２）間の切断線（１１０）に沿って部分的に除去されていることを特徴とする基板フレームストリップ。   A substrate frame strip (200) provided with a connection conductor layer (102) and a support layer (101), wherein one section (201) including a plurality of element regions (202) is formed on the substrate frame strip. The substrate frame strip is characterized in that the support layer (101) is partially removed along a cutting line (110) between each two adjacent element regions (202). 接続導体層（１０２）は、パターン形成された金属シートから成っている請求項３７記載の基板フレームストリップ。   38. A substrate frame strip according to claim 37, wherein the connecting conductor layer (102) comprises a patterned metal sheet. 支持体層（１０１）はパターン形成されたプラスチックシートから成っている請求項３７又は３８記載の基板フレームストリップ。   39. Substrate frame strip according to claim 37 or 38, wherein the support layer (101) consists of a patterned plastic sheet. プラスチックシートはポリイミド材料を含んでいる請求項３９記載の基板フレームストリップ。   40. The substrate frame strip of claim 39, wherein the plastic sheet comprises a polyimide material. プラスチックシートはフォトリソグラフィ技術によってパターン形成されている請求項４０記載の基板フレームストリップ。   41. The substrate frame strip of claim 40, wherein the plastic sheet is patterned by photolithography technology.
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