JP2005262054A - Feedwater equipment - Google Patents

Feedwater equipment Download PDF

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JP2005262054A
JP2005262054A JP2004076719A JP2004076719A JP2005262054A JP 2005262054 A JP2005262054 A JP 2005262054A JP 2004076719 A JP2004076719 A JP 2004076719A JP 2004076719 A JP2004076719 A JP 2004076719A JP 2005262054 A JP2005262054 A JP 2005262054A
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water
chlorine
water supply
tank
detector
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Shoichi Matsunaga
昌一 松永
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FM VALVE SEISAKUSHO KK
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FM VALVE SEISAKUSHO KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide feedwater equipment which prevents excessive addition of chlorine and reliably controls residual chlorine when adding chlorine to water in a water storage tank and has a simple structure. <P>SOLUTION: This feedwater equipment is provided with a water level detector 7 for detecting water level of the water storage tank 1, a chlorine detector 8 for detecting the concentration of residual chlorine and a chlorine injection device 9 for injecting a chemical or water containing chlorine into the water storage tank. Therein, while the water level in the water storage tank 1 is kept within a prescribed water level range, water is fed. When the value of the remaining chlorine of water in the water storage tank 1 is lower than a preset value, the chlorine injection device 9 is actuated, thereby the chemical or water containing chlorine is injected into a feed water pipe 3 and chlorine is added while water is fed. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、貯水槽内の水の残留塩素濃度の低下を防止することができる給水設備に関する。さらに特定すれば、本発明は貯水槽内の水の残留塩素濃度が低下した場合に塩素を含む薬液または水を注入して残留塩素濃度の低下を防止するとともに塩素の過剰添加を防止し、またこの注入された塩素の拡散、混合を促進する給水設備に関する。   The present invention relates to a water supply facility capable of preventing a decrease in residual chlorine concentration of water in a water tank. More specifically, the present invention injects a chemical solution or water containing chlorine when the residual chlorine concentration of water in the water storage tank is lowered to prevent the residual chlorine concentration from being lowered and to prevent excessive addition of chlorine, The present invention relates to a water supply facility that promotes diffusion and mixing of the injected chlorine.

従来から、オフィスビル、マンション、病院、学校、ホテルなどの施設では、断水時の給水の確保、給水量の平準化などの目的のために、受水槽、高置水槽、その他の貯水槽
が設置されている。これらの貯水槽は、施設の水の消費量、施設の目的などによりその容量が設定され、必要な貯水量を確保するとともに、貯留された水と新たな給水との交換率を適度に設定し、貯水槽内の水の残留塩素濃度が所定値より低下しないように配慮されている。しかし、リゾート施設やイベント施設、学校などでは、曜日や季節により水の消費量が大きく変動するので、水の消費量が低下した場合にこの貯水槽内の水の交換率が低下し、塩素の散逸により水中の残留塩素濃度が低下し、雑菌の繁殖等、水質の低下を招く可能性がある。 Conventionally, in facilities such as office buildings, condominiums, hospitals, schools, and hotels, water tanks, elevated water tanks, and other water tanks have been installed for purposes such as securing water supply in the event of a water outage and leveling the water supply amount. Has been. The capacity of these water tanks is set according to the amount of water consumed by the facility, the purpose of the facility, etc., while ensuring the necessary amount of water storage and appropriately setting the exchange rate between the stored water and new water supply. Consideration is given so that the residual chlorine concentration of water in the water storage tank does not fall below a predetermined value. However, in resort facilities, event facilities, schools, etc., the water consumption varies greatly depending on the day of the week and the season, so when the water consumption decreases, the water exchange rate in this water tank decreases, and the chlorine Dissipation reduces the residual chlorine concentration in the water, which may lead to deterioration of water quality such as the propagation of various bacteria.

このため、従来から、このような貯水槽内の水の残留塩素濃度の低下を防止し、水質を維持する各種の試みがなされている。低下した残留塩素濃度を回復する確実な手段としては、従来から塩素を含む薬剤、たとえば次亜塩素酸ナトリウムの添加がある。しかし、従来は、貯水槽内の水の残留塩素濃度の測定、次亜塩素酸ナトリウムの投入などの作業をすべて人手に頼っており、多くの労力を必要とする。   For this reason, conventionally, various attempts have been made to prevent the decrease in the residual chlorine concentration of water in the water tank and maintain the water quality. As a reliable means of recovering the lowered residual chlorine concentration, there has conventionally been the addition of chemicals containing chlorine, such as sodium hypochlorite. Conventionally, however, all operations such as measurement of residual chlorine concentration in the water tank and injection of sodium hypochlorite are relied upon manually, requiring a lot of labor.

このような作業を自動化するため、たとえば特許文献１のようなものがある。このものは、貯水槽内に残留塩素濃度検出手段を設け、塩素濃度が低下した場合に自動的に次亜塩素酸ナトリウムを注入するものである。また、食塩水等の塩素イオンを含む水を電気分解していわゆる電解次亜塩素酸ソーダを生成し、このような塩素を含んだ水を貯水槽内に注入する装置もあり、特許文献２にはこのような装置の例が示されている。   In order to automate such an operation, there is, for example, Patent Document 1. In this system, a residual chlorine concentration detecting means is provided in the water tank, and sodium hypochlorite is automatically injected when the chlorine concentration is lowered. In addition, there is a device that electrolyzes water containing chlorine ions such as saline to produce so-called electrolytic sodium hypochlorite, and injects water containing such chlorine into a water tank. An example of such a device is shown.

ところで、このような塩素を含んだ薬剤または水を貯水槽内の水に自動的に添加する場合に、その添加量の制御の問題が発生する。すなわち、貯水槽内に塩素を含んだ薬剤または水を注入しても、この塩素が貯水槽内全体に拡散するには長時間を必要とし、塩素検出器による残留塩素濃度の上昇の検出には時間の遅れが生じ、正確な制御ができない。このため、上記の特許文献１のものは、貯水槽内の水をポンプにより循環させている。しかし、このように水を循環させるには、ポンプ、配管などの設備が必要であり、またポンプの運転に多くの電力を必要とする。   By the way, when such a chemical | medical agent or water containing chlorine is automatically added to the water in a water tank, the problem of control of the addition amount generate | occur | produces. In other words, even if chemicals or water containing chlorine is injected into the water tank, it takes a long time for this chlorine to diffuse throughout the water tank. Time delay occurs and accurate control is not possible. For this reason, the thing of said patent document 1 is circulating the water in a water tank with a pump. However, in order to circulate water in this way, facilities such as a pump and piping are necessary, and a large amount of electric power is required to operate the pump.

この不具合を解消するため、特許文献３に示すように、貯水槽内の残留塩素濃度が低下した場合にのみ循環ポンプを運転するものがある。このものは、電力の消費は抑制されるものの、やはり電力を必要とし、また設備の設置コストも高い。また、特許文献３に示すように、急速攪拌池の出口の残留塩素濃度を測定し、季節、気象等の条件から添加塩素必要量を計算するものがある。しかし、このようなものは、大規模な貯水設備を対象としたものであり、貯水槽などに適用することは実用的ではない。   In order to solve this problem, as shown in Patent Document 3, there is one that operates the circulation pump only when the residual chlorine concentration in the water storage tank is lowered. Although this consumes less power, it still requires power and the cost of installing the equipment is high. Moreover, as shown in Patent Document 3, there is a technique that measures the residual chlorine concentration at the outlet of the rapid stirring pond and calculates the required amount of added chlorine from conditions such as season and weather. However, such a thing is intended for a large-scale water storage facility, and it is not practical to apply it to a water storage tank or the like.

また、上述のように、残留塩素濃度の上昇の検出に時間遅れが生じることは、塩素の過剰添加の問題を生じることになる。特許文献４には、この問題を解消する技術が開示されており、塩素濃度が一定値以下に低下した場合には、残留塩素センサの測定値のしきい値を低く変更し、オーバーシュートすなわち塩素の過剰添加の傾向を解消する。また特許文献５にも同様に、残留塩素濃度が設定過剰範囲となった場合には、次回の次亜塩素酸ソーダの投入量を減少させることが開示されている。しかし、いずれも設備が複雑となり、また塩素の過剰添加の問題は本質的に解消されない。
特公昭６１−１１７３３８号公報 特開２００２−３２６０８６号公報 特開平１０−２０２２６８号公報 特許第３４３９１６８号公報 特開２００１−２３２３７０号公報 Further, as described above, the occurrence of a time delay in detecting the increase in the residual chlorine concentration causes a problem of excessive addition of chlorine. Patent Document 4 discloses a technique for solving this problem. When the chlorine concentration falls below a certain value, the threshold value of the measured value of the residual chlorine sensor is changed to be low, and overshoot, that is, chlorine Eliminate the tendency of excessive addition of. Similarly, Patent Document 5 discloses that when the residual chlorine concentration falls within an excessively set range, the amount of sodium hypochlorite input next time is reduced. However, in both cases, the facilities are complicated, and the problem of excessive addition of chlorine is not essentially solved.
Japanese Examined Patent Publication No. 61-117338 JP 2002-326086 A JP-A-10-202268 Japanese Patent No. 3439168 JP 2001-232370 A

本発明は以上の事情に基いてなされたもので、貯水槽内の水の残留塩素濃度を検出して残留塩素濃度が低下した場合に塩素を含む薬剤または水を添加するものにおいて、簡単な装置により塩素を含む薬剤または水の過剰添加を防止し、残留塩素を確実に制御するとともに構造が簡単な給水設備を提供するものである。   The present invention has been made on the basis of the above circumstances, and is a simple device for detecting the residual chlorine concentration of water in a water tank and adding a chemical or water containing chlorine when the residual chlorine concentration is lowered. Therefore, it is possible to prevent excessive addition of chemicals or water containing chlorine, to provide a water supply facility that can control residual chlorine reliably and has a simple structure.

請求項１に記載の本発明は、貯水槽と、この貯水槽内に給水をなす給水弁と、この給水弁から上記の貯水槽の上部との間に配管された給水管と、上記の貯水槽内の水位を検出する水位検出器と、上記の貯水槽の内部の水の残留塩素濃度を検出する塩素検出器と、塩素を含む薬液または水を上記の貯水槽内に注入する塩素注入装置と、上記の水位検出器および塩素検出器からの信号を受け、上記の給水弁の開閉制御をなし上記の貯水槽内の水位を給水停止水位と給水開始水位との間の所定の水位範囲に維持するとともに上記の貯水槽内の水の残留塩素の値が設定量より減少した場合に上記の塩素注入装置を作動させる制御装置とを備え、上記の塩素注入装置は上記の給水弁の下流側の上記給水管に塩素を含む薬剤または水を注入するものであり、また上記の制御装置は上記の給水弁が開弁している場合にのみ上記の塩素注入装置を作動させるものである。   The present invention described in claim 1 includes a water storage tank, a water supply valve for supplying water into the water storage tank, a water supply pipe piped between the water supply valve and the upper portion of the water storage tank, and the water storage A water level detector that detects the water level in the tank, a chlorine detector that detects the residual chlorine concentration of water inside the water tank, and a chlorine injector that injects a chemical solution or water containing chlorine into the water tank. And receiving signals from the water level detector and the chlorine detector, controlling the opening and closing of the water supply valve, and setting the water level in the water storage tank to a predetermined water level range between the water supply stop water level and the water supply start water level. And a control device that operates the chlorine injection device when the residual chlorine value of the water in the water storage tank decreases below a set amount, and the chlorine injection device is located downstream of the water supply valve. Injecting chemicals or water containing chlorine into the above water supply pipe The above control device is intended to actuate the chlorine injection device only when the water supply valve is open.

請求項２に記載の本発明は、前記の制御装置は、前記の塩素注入装置からの塩素を含む薬液または水の注入流量を設定可能なものである。   According to a second aspect of the present invention, the control device can set an injection flow rate of a chemical solution or water containing chlorine from the chlorine injection device.

請求項３に記載の本発明は、前記の給水弁は、前記の貯水槽の上面より下方に設置され、前記の給水管はこの給水弁から上方に立ち上がり前記の貯水槽の上部に達しているものであり、前記の塩素注入装置はこの給水管の前記給水弁の近傍箇所に塩素を含む薬剤または水を注入するものである。   According to a third aspect of the present invention, the water supply valve is installed below the upper surface of the water storage tank, and the water supply pipe rises upward from the water supply valve and reaches the upper part of the water storage tank. The chlorine injecting device injects chlorine-containing chemicals or water into the vicinity of the water supply valve of the water supply pipe.

請求項４に記載の本発明は、前記の塩素検出器は、前記の給水管の吐水口の下方より離れた位置に設置されているものである。   According to a fourth aspect of the present invention, the chlorine detector is installed at a position away from below the water outlet of the water supply pipe.

請求項１に記載の本発明は、上記の塩素注入装置は上記の給水弁の下流側の上記給水管に塩素を含む薬剤または水を注入するので、この薬剤または水は多量の給水中に混合、拡散されてから貯水槽内に流入し、かつこの給水は貯水槽内の水面に落下してさらに攪拌、拡散される。よって塩素の拡散が早く、この塩素濃度の上昇の検出の時間遅れが少なくなるので、塩素濃度の制御が確実となる。   In the first aspect of the present invention, since the chlorine injection device injects a chemical or water containing chlorine into the water supply pipe on the downstream side of the water supply valve, the chemical or water is mixed in a large amount of water supply. After being diffused, it flows into the water tank, and this water supply falls to the water surface in the water tank and is further stirred and diffused. Therefore, the diffusion of chlorine is fast, and the time delay in detecting this increase in chlorine concentration is reduced, so that the chlorine concentration is reliably controlled.

また給水弁が開弁している場合にのみ上記の塩素注入装置が作動し、給水中に塩素が注入され、希釈、拡散されたのち貯水槽内に流入するので、塩素の過剰添加が防止される。すなわち、このような給水設備では、貯水槽内の水位が給水開始水位まで低下した場合に給水が開始され、給水停止水位に達するまで給水がなされるので、１回の給水量は貯留されている水量に対して一定の割合である。よって、この給水中に所定の割合で塩素を添加すれば、貯水槽内の水に対する塩素の添加量は一定の割合以上にはならず、塩素の過剰添加の可能性がない。   In addition, the chlorine injection device operates only when the water supply valve is open, and chlorine is injected into the water supply, diluted, diffused, and then flows into the water tank, preventing excessive addition of chlorine. The That is, in such a water supply facility, water supply is started when the water level in the water storage tank drops to the water supply start water level, and water supply is performed until the water supply stop water level is reached, so that one water supply amount is stored. It is a fixed ratio to the amount of water. Therefore, if chlorine is added to the water supply at a predetermined ratio, the amount of chlorine added to the water in the water tank does not exceed a certain ratio, and there is no possibility of excessive addition of chlorine.

また、この給水設備は、貯水槽への給水を制御し、貯水槽内の水位を所定の範囲に維持する給水装置の基本的な構成に塩素検出器、塩素注入装置等を付加したものであり、貯水槽内の水位を所定の範囲に維持する給水装置と塩素注入装置や残留塩素濃度を測定制御する塩素濃度維持装置とを別々に設置する場合より構造が簡単であり、また装置のコスト、保守管理のコストも低減できる。   In addition, this water supply facility is configured by adding a chlorine detector, a chlorine injection device, etc. to the basic structure of the water supply device that controls the water supply to the water storage tank and maintains the water level in the water storage tank within a predetermined range. The structure is simpler than the case where a water supply device for maintaining the water level in the water tank in a predetermined range, a chlorine injection device, and a chlorine concentration maintenance device for measuring and controlling the residual chlorine concentration are separately installed, and the cost of the device Maintenance management costs can also be reduced.

また、請求項２に記載の本発明は、前記の制御装置は、前記の塩素注入装置からの塩素を含む薬液または水の注入流量を設定可能としたものである。よって、貯水槽の容量や水の消費量、その他の条件に対応して添加する塩素の量を調整できるので、塩素濃度をより正確に制御できる。   In the present invention according to claim 2, the control device is capable of setting an injection flow rate of a chemical solution or water containing chlorine from the chlorine injection device. Therefore, the chlorine concentration can be controlled more accurately because the amount of chlorine added corresponding to the capacity of the water storage tank, the amount of water consumption, and other conditions can be adjusted.

また、請求項３に記載の本発明は、給水弁から上方に立ち上がり前記の貯水槽の上部に達している給水管の給水弁の近傍箇所に塩素を注入するので、この塩素は給水と十分に攪拌されて貯水槽内に流入するので、この貯水槽内の水中での塩素の拡散がより早く、塩素濃度の制御がより正確となる。   Further, according to the third aspect of the present invention, chlorine is injected into the vicinity of the water supply valve of the water supply pipe that rises upward from the water supply valve and reaches the upper part of the water storage tank. Since it is stirred and flows into the water tank, the diffusion of chlorine in the water in the water tank is faster, and the control of the chlorine concentration becomes more accurate.

請求項４に記載の本発明は、前記の塩素検出器は、前記の給水管の吐水口の下方より離れた位置に設置されているものである。よって、この吐水口から給水される塩素濃度の高い水が塩素検出器に直接接触し、塩素濃度を平均より高く検出することがなく、制御が安定する。   According to a fourth aspect of the present invention, the chlorine detector is installed at a position away from below the water outlet of the water supply pipe. Therefore, the water with high chlorine concentration supplied from the water outlet directly contacts the chlorine detector, and the control is stabilized without detecting the chlorine concentration higher than the average.

以下、図を参照して本発明の実施形態を説明する。この実施形態は、上水の受水槽を対象としたものであるが、本発明は雑用水、その他塩素濃度を管理すべき水の貯水槽の給水設備に適用できることはもちろんである。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. This embodiment is intended for a water receiving tank, but the present invention is of course applicable to water supply equipment for water storage tanks for which water for miscellaneous use and other chlorine concentrations should be controlled.

図１には、この給水装置の全体を示す。図中の１は受水槽、高置水槽等の貯水槽である。この貯水槽１には給水弁２および給水管３を介して上水が給水される。また、この貯水槽１内に貯留された水は流出管４を介してポンプ等により末端の水栓等に給水される。なお、この実施形態では、上記の給水弁２として自力型の自動弁が用いられる。このような給水弁２は内部にシリンダ、ピストンなどを内蔵しており、シリンダ内の水圧を放圧することにより、給水の水圧により自動的に開閉する。なお、この給水弁２のシリンダ内の水を放出するためにパイロット管５および副弁６が接続されており、この副弁６が開弁すると上記の給水弁２も開弁し、またこの副弁６が閉弁すると給水弁２も閉弁する。なお、上記の副弁６は、電気的に開閉する電磁弁が使用されている。   FIG. 1 shows the entire water supply apparatus. In the figure, reference numeral 1 denotes a water storage tank such as a water receiving tank or an elevated water tank. The water storage tank 1 is supplied with clean water through a water supply valve 2 and a water supply pipe 3. Further, the water stored in the water storage tank 1 is supplied to a terminal faucet or the like through a discharge pipe 4 by a pump or the like. In this embodiment, a self-powered automatic valve is used as the water supply valve 2 described above. Such a water supply valve 2 has a built-in cylinder, piston, etc., and automatically opens and closes by the water pressure of the water supply by releasing the water pressure in the cylinder. The pilot pipe 5 and the sub-valve 6 are connected to discharge water in the cylinder of the water supply valve 2, and when the sub-valve 6 is opened, the water supply valve 2 is also opened. When the valve 6 is closed, the water supply valve 2 is also closed. The sub valve 6 is an electromagnetic valve that opens and closes electrically.

なお、上記の給水弁２は、上記の貯水槽１の上面より下方、たとえば貯水槽１の設置された床面の上に設置されたもので、上記の給水管３はこの給水弁２から上方に立ち上がって貯水槽１の上部に達するいわゆる立ち上がり管の形態をなしている。   The water supply valve 2 is installed below the upper surface of the water storage tank 1, for example, on the floor surface where the water storage tank 1 is installed. The water supply pipe 3 is located above the water supply valve 2. It is in the form of a so-called riser that rises to the top of the water storage tank 1.

また、この貯水槽１の底部には水位検出器７が取り付けられている。この水位検出器７は、この貯水槽１内底部の水圧すなわち水頭圧を測定し、この水頭圧からこの貯水槽１内の水位が算定される。   A water level detector 7 is attached to the bottom of the water tank 1. The water level detector 7 measures the water pressure at the bottom of the water tank 1, that is, the water head pressure, and the water level in the water tank 1 is calculated from the water head pressure.

また、この貯水槽１の内の底部中央部には、塩素検出器８が取り付けられている。この塩素検出器８は、たとえば特許第３３９０１５４号公報に開示されているような、起電力測定方式、または電流測定方式の電極式の残留塩素検出器が好ましい。この塩素検出器８は、この貯水槽１内の水の残留塩素濃度を測定する。この塩素検出器８は、上記の給水管３の吐水口の下方より離れた位置、たとえば給水管３の吐水口が貯水槽１の隅部に配置されている場合は上記のように貯水槽１の中央部に設置される。   A chlorine detector 8 is attached to the center of the bottom of the water tank 1. The chlorine detector 8 is preferably an electromotive force measurement type or current measurement type electrode type residual chlorine detector as disclosed in, for example, Japanese Patent No. 3390154. The chlorine detector 8 measures the residual chlorine concentration of water in the water tank 1. The chlorine detector 8 is located at a position away from the lower side of the water outlet of the water supply pipe 3, for example, when the water outlet of the water supply pipe 3 is arranged at the corner of the water tank 1, as described above. It is installed in the center of

また、９は塩素注入装置である。この塩素注入装置は、塩素を含む薬剤、たとえば次亜塩素酸ソーダ液をポンプ等により設定された所定量ずつ注入する装置であり、この実施形態の場合には、上記の給水管３の給水弁２の近傍位置においてこの給水管３内に次亜塩素酸ソーダを注入するように構成されている。なお、最近では、食塩水等の塩素イオンを含む水を電気分解し、電解次亜塩素酸ソーダを生成してこの塩素イオンを殺菌力のある遊離塩素に転換し、この塩素を含んだ水を注入する塩素注入装置も開発されており、このような塩素注入装置を使用してもよい。   Reference numeral 9 denotes a chlorine injection device. This chlorine injection device is a device for injecting a chemical containing chlorine, for example, sodium hypochlorite solution, by a predetermined amount set by a pump or the like. In this embodiment, the water supply valve of the water supply pipe 3 is used. 2 is configured to inject sodium hypochlorite into the water supply pipe 3 at a position near 2. Recently, water containing chlorine ions such as saline solution is electrolyzed to produce electrolytic sodium hypochlorite to convert this chlorine ions to free chlorine with bactericidal power. Chlorine injectors for injection have also been developed, and such chlorine injectors may be used.

また、１０はこの給水装置の制御装置であり、上記の副弁６、水位検出器７、塩素検出器８および塩素注入装置９ははこの制御装置に接続されている。図２にはこの制御装置１０の回路の概略的なブロック図を示し、１１はＣＰＵである。このＣＰＵ１１には、上述の水位検出器７、塩素検出器８、塩素注入装置９および前記の副弁６を開閉させる弁駆動回路１２がインターフェース１３を介してそれぞれ接続されている。   Reference numeral 10 denotes a control device for the water supply device, and the auxiliary valve 6, the water level detector 7, the chlorine detector 8 and the chlorine injection device 9 are connected to this control device. FIG. 2 shows a schematic block diagram of a circuit of the control device 10, and 11 is a CPU. The CPU 11 is connected to the above-described water level detector 7, chlorine detector 8, chlorine injector 9, and valve drive circuit 12 for opening and closing the auxiliary valve 6 via an interface 13.

また、このＣＰＵ１１には、作動プログラムを記憶したＲＯＭ１６、測定値や設定値を記憶するＲＡＭ１７、各種のスイッチ類１８、測定値や設定値を表示する表示器１９、クロック２０等が接続されている。また、このＣＰＵ１１には、水位設定回路２１、塩素濃度設定回路２２および塩素の注入量設定回路２３が接続されている。   The CPU 11 is connected to a ROM 16 that stores an operation program, a RAM 17 that stores measurement values and setting values, various switches 18, a display 19 that displays measurement values and setting values, a clock 20, and the like. . The CPU 11 is connected to a water level setting circuit 21, a chlorine concentration setting circuit 22, and a chlorine injection amount setting circuit 23.

この制御装置１０には図１に示すように前記の水位検出器７で検出された貯水槽１内の水位を表示する水位表示器１９ａが設けられている。また、１８ｄ、１８ｅは給水停止水位設定キー、給水開始設定キーであり、これらを操作して水位設定モードに切替え、アップダウンキー１８ａを操作して設定水位を水位表示器１９ａに表示させた後に設定することにより、給水停止水位および給水開始水位が設定される。そして、貯水槽１内の水位が給水開始水位まで低下すると、弁駆動回路１２からの信号により副弁６が開弁され、給水弁２が開弁して給水管２を介して貯水槽１内に給水がなされる。また、貯水槽１内の水位が給水停止位置まで上昇すると、給水弁２が閉弁され、給水が停止される。このようにして、この貯水槽１内の水位は、給水停止水位と給水開始水位の間の所定の水位範囲に制御される。   As shown in FIG. 1, the control device 10 is provided with a water level indicator 19 a for displaying the water level in the water tank 1 detected by the water level detector 7. Reference numerals 18d and 18e denote a water supply stop water level setting key and a water supply start setting key, which are operated to switch to the water level setting mode, and the set water level is displayed on the water level indicator 19a by operating the up / down key 18a. By setting, the water supply stop water level and the water supply start water level are set. And if the water level in the water tank 1 falls to a water supply start water level, the sub valve 6 will be opened by the signal from the valve drive circuit 12, the water supply valve 2 will open, and the water tank 1 will be opened via the water supply pipe 2 The water supply is made. When the water level in the water tank 1 rises to the water supply stop position, the water supply valve 2 is closed and water supply is stopped. In this way, the water level in the water tank 1 is controlled within a predetermined water level range between the water supply stop water level and the water supply start water level.

また、上記の塩素検出器８で検出された残留塩素濃度は塩素濃度表示器１９ｂに表示される。さらに、この貯水槽１内の水の残留塩素濃度が低下した場合に、上記の塩素注入装置９を作動させるための残留塩素濃度の値を設定する機能が設けられ、この残留塩素濃度の値の設定はアップダウンキー１８ｂにより行われる。   The residual chlorine concentration detected by the chlorine detector 8 is displayed on the chlorine concentration indicator 19b. Further, when the residual chlorine concentration of the water in the water tank 1 is lowered, a function of setting a residual chlorine concentration value for operating the chlorine injection device 9 is provided. Setting is performed by the up / down key 18b.

また、実施形態では、この制御装置１０には上記の塩素注入装置９から注入される次亜塩素酸ソーダの注入流量を設定する機能が備えられている。１９ｃは塩素の注入量の表示器であり、アップダウンキー１８ｃを操作することにより塩素の注入流量を所定の値に設定することができる。   In the embodiment, the control device 10 has a function of setting an injection flow rate of sodium hypochlorite injected from the chlorine injection device 9. 19c is a display device for the amount of chlorine injected, and the chlorine injection flow rate can be set to a predetermined value by operating the up / down key 18c.

また、この制御装置１０は、貯水槽１内の水の残留塩素濃度が低下した場合に、自動的に塩素注入器９を作動させて残留塩素濃度を維持する機能が備えられており、以下図３のフローチャートを参照してその作動を説明する。   Further, the control device 10 is provided with a function of automatically operating the chlorine injector 9 to maintain the residual chlorine concentration when the residual chlorine concentration of the water in the water tank 1 is lowered. The operation will be described with reference to the flowchart of FIG.

まず、ＳＴＥＰ１で貯水槽１内の水位が給水開始水位以下か否かが判別され、給水開始水位以上の場合には作動しない。そして、給水開始水位以下の場合には、まずＳＴＥＰ２により貯水槽１内の水の残留塩素濃度が測定される。そして、ＳＴＥＰ３でこの残留塩素濃度が設定された値以下か否かが判別され、残留塩素濃度が所定の設定値以上の場合にはＳＴＥＰ５に移行し、そのまま給水が開始される。   First, in STEP 1, it is determined whether or not the water level in the water tank 1 is equal to or lower than the water supply start water level. And when it is below a water supply start water level, the residual chlorine concentration of the water in the water tank 1 is first measured by STEP2. Then, in STEP3, it is determined whether or not the residual chlorine concentration is equal to or less than a set value. If the residual chlorine concentration is equal to or higher than a predetermined set value, the process proceeds to STEP5 and water supply is started as it is.

一方、ＳＴＥＰ３で残留塩素濃度が設定値以下と判別された場合には、ＳＴＥＰ４で上記の塩素注入装置９が作動され、次亜塩素酸ソーダの注入が開始され、さらにＳＴＥＰ５で給水が開始される。この場合に、塩素注入装置９から次亜塩素酸ソーダは給水管３の給水弁２の近傍位置に注入され、この給水管３内を流れる新たな給水と攪拌されて希釈されたのち、貯水槽１内に給水される。そして、貯水槽１内の水位が給水停止水位まで上昇すると、ＳＴＥＰ６でこれが判別され、ＳＴＥＰ７で給水が停止され、同時に塩素注入装置も停止される。なお、ＳＴＥＰ６において、給水停止水位に達しない場合は、次の処理を実行しない。   On the other hand, if it is determined in STEP 3 that the residual chlorine concentration is equal to or lower than the set value, the chlorine injection device 9 is operated in STEP 4, the injection of sodium hypochlorite is started, and the water supply is started in STEP 5. . In this case, sodium hypochlorite is injected from the chlorine injection device 9 into the water supply pipe 3 in the vicinity of the water supply valve 2, and is stirred and diluted with new water supply flowing through the water supply pipe 3. 1 is supplied with water. Then, when the water level in the water storage tank 1 rises to the water supply stop water level, this is determined in STEP 6, the water supply is stopped in STEP 7, and the chlorine injection device is also stopped at the same time. In STEP 6, when the water supply stop water level is not reached, the next process is not executed.

上記のように、貯水槽１内の水の残留塩素濃度が所定の濃度以下となった場合には、給水毎に塩素注入装置９が作動して次亜塩素酸ソーダを注入するので、この貯水槽１内の水の残留塩素濃度を所定の値以上に維持できる。また、この次亜塩素酸ソーダは、多量の給水とともにこれに希釈された形で給水さるので、この塩素は貯水槽１内の水に迅速に拡散し、均一な塩素濃度となる。このため、塩素の添加による貯水槽１内の水の塩素濃度の上昇の検出遅れが少なく、より確実な塩素濃度制御が可能となる。なお、前記の塩素検出器８は給水管３の吐水口の下方から離れた位置にあるので、塩素濃度の高い新たな給水がこの塩素検出器８に接触して平均より高い塩素濃度が検出されてしまうことがなく、誤作動を防止できる。   As described above, when the residual chlorine concentration of the water in the water storage tank 1 is equal to or lower than the predetermined concentration, the chlorine injecting device 9 operates to inject sodium hypochlorite for every water supply. The residual chlorine concentration of the water in the tank 1 can be maintained above a predetermined value. Further, since this sodium hypochlorite is supplied in a diluted form together with a large amount of water, this chlorine is quickly diffused into the water in the water tank 1 and has a uniform chlorine concentration. For this reason, there is little detection delay of the increase in the chlorine concentration of the water in the water tank 1 due to the addition of chlorine, and more reliable chlorine concentration control is possible. Since the chlorine detector 8 is located away from the lower side of the water outlet of the water supply pipe 3, a new water supply with a high chlorine concentration comes into contact with the chlorine detector 8 and a chlorine concentration higher than the average is detected. Malfunctions can be prevented.

また、１回の給水作動でこの貯水槽１内に給水される水の量は、この貯水槽１内の水の量に対して常に一定である。たとえば給水停止水位が３００ｃｍ、給水開始水位が２５０ｃｍに設定されていれば、１回の給水毎に貯水槽１内に貯留されている水の約２０％の水が新たに給水される。したがって、前記の制御装置１０で塩素注入装置９の注入流量を設定しておけば、１回の給水毎に添加される塩素の量を正確に設定でき、塩素の過剰添加の問題は発生しない。なお、この塩素の注入流量は、上述のような１回の給水量、貯水槽１の容量等の条件に対応して適宜設定でき、各種の給水設備に対応できる。   Further, the amount of water supplied into the water tank 1 by one water supply operation is always constant with respect to the amount of water in the water tank 1. For example, if the water supply stop water level is set to 300 cm and the water supply start water level is set to 250 cm, about 20% of the water stored in the water tank 1 is newly supplied for each water supply. Therefore, if the injection flow rate of the chlorine injection device 9 is set by the control device 10, the amount of chlorine added for each water supply can be set accurately, and the problem of excessive addition of chlorine does not occur. The chlorine injection flow rate can be set as appropriate according to the conditions such as the amount of water supplied once and the capacity of the water storage tank 1 as described above, and can correspond to various water supply facilities.

なお、本発明は上記の実施形態には限定されない。たとえば、給水弁が貯水槽の上方に設置され、そのまま下方に吐水されて給水をなすようなものにおいては、この給水弁の流出口に接続された立下り管である給水管に塩素を注入するようにしてもよい。   In addition, this invention is not limited to said embodiment. For example, in a case where a water supply valve is installed above a water storage tank and discharged as it is to supply water, chlorine is injected into a water supply pipe which is a down pipe connected to the outlet of the water supply valve. You may do it.

本発明の給水装置の全体の概略図。The schematic of the whole water supply apparatus of this invention. 制御装置の回路のブロック図。The block diagram of the circuit of a control apparatus. 設定水位変更作動のフローチャート。The flowchart of setting water level change operation.

符号の説明Explanation of symbols

１ 貯水槽
２ 給水弁
３ 給水管
７ 水位検出器
８ 塩素検出器
９ 塩素注入装置
１０ 制御装置
１１ ＣＰＵ
１２ 弁駆動回路
１９ 表示器
２１ 水位設定回路
２２ 塩素濃度設定回路
２３ 塩素注入量設定回路 DESCRIPTION OF SYMBOLS 1 Water tank 2 Water supply valve 3 Water supply pipe 7 Water level detector 8 Chlorine detector 9 Chlorine injection apparatus 10 Control apparatus 11 CPU
12 Valve drive circuit 19 Display 21 Water level setting circuit 22 Chlorine concentration setting circuit 23 Chlorine injection amount setting circuit

Claims (4)

貯水槽と、この貯水槽内に給水をなす給水弁と、この給水弁から上記の貯水槽の上部との間に配管された給水管と、上記の貯水槽内の水位を検出する水位検出器と、上記の貯水槽の内部の水の残留塩素濃度を検出する塩素検出器と、塩素を含む薬液または水を上記の貯水槽内に注入する塩素注入装置と、上記の水位検出器および塩素検出器からの信号を受け、上記の給水弁の開閉制御をなし上記の貯水槽内の水位を給水停止水位と給水開始水位との間の所定の水位範囲に維持するとともに上記の貯水槽内の水の残留塩素の値が設定量より減少した場合に上記の塩素注入装置を作動させる制御装置とを備え、上記の塩素注入装置は上記の給水弁の下流側の上記給水管に塩素を注入するものであり、また上記の制御装置は上記の給水弁が開弁している場合にのみ上記の塩素注入装置を作動させるものであることを特徴とする給水設備。   A water tank, a water supply valve for supplying water into the water tank, a water supply pipe piped between the water supply valve and the upper part of the water tank, and a water level detector for detecting the water level in the water tank A chlorine detector for detecting the residual chlorine concentration of water inside the water tank, a chlorine injector for injecting a chemical solution or water containing chlorine into the water tank, the water level detector and the chlorine detector In response to a signal from the water tank, the water supply valve is controlled to open and close, and the water level in the water tank is maintained within a predetermined water level range between the water supply stop water level and the water supply start water level, and the water in the water tank is And a control device that activates the chlorine injecting device when the residual chlorine value of the water decreases below a set amount, and the chlorine injecting device injects chlorine into the water supply pipe downstream of the water supply valve. In addition, the above control device has the above water supply valve opened. Water supply, characterized in that in which actuate the chlorine injection device only if you. 前記の制御装置は、前記の塩素注入装置からの塩素を含む薬液または水の注入流量を設定可能であることを特徴とする請求項１の給水設備。   The water supply equipment according to claim 1, wherein the control device is capable of setting an injection flow rate of a chemical solution or water containing chlorine from the chlorine injection device. 前記の給水弁は、前記の貯水槽の上面より下方に設置され、前記の給水管はこの給水弁から上方に立ち上がり前記の貯水槽の上部に達しているものであり、前記の塩素注入装置はこの給水管の前記給水弁の近傍箇所に塩素を注入するものであることを特徴とする請求項１の給水設備。   The water supply valve is installed below the upper surface of the water storage tank, the water supply pipe rises upward from the water supply valve and reaches the upper part of the water storage tank, and the chlorine injection device is 2. The water supply equipment according to claim 1, wherein chlorine is injected into a location in the vicinity of the water supply valve of the water supply pipe. 前記の塩素検出器は、前記の給水管の吐水口の下方より離れた位置に設置されていることを特徴とする請求項１の給水設備。   The said chlorine detector is installed in the position away from the downward direction of the spout of the said water supply pipe, The water supply equipment of Claim 1 characterized by the above-mentioned.
JP2004076719A 2004-03-17 2004-03-17 Feedwater equipment Pending JP2005262054A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014188481A (en) * 2013-03-28 2014-10-06 Panasonic Corp Injection device of nutrient for microbe
JP2015087920A (en) * 2013-10-30 2015-05-07 パナソニックＩｐマネジメント株式会社 Management apparatus of water supply facility and management system of water supply facility

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3672508A (en) * 1970-01-20 1972-06-27 James O Simon Swimming pool chlorinator apparatus
JPH0420617A (en) * 1990-05-14 1992-01-24 Hitachi Building Syst Eng & Service Co Ltd Water supply system of building
JPH07324356A (en) * 1995-07-03 1995-12-12 F M Valve Seisakusho:Kk Water level control device for water tank
US5611937A (en) * 1995-05-12 1997-03-18 The Coca-Cola Company Water Treating apparatus and method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3672508A (en) * 1970-01-20 1972-06-27 James O Simon Swimming pool chlorinator apparatus
JPH0420617A (en) * 1990-05-14 1992-01-24 Hitachi Building Syst Eng & Service Co Ltd Water supply system of building
US5611937A (en) * 1995-05-12 1997-03-18 The Coca-Cola Company Water Treating apparatus and method
JPH07324356A (en) * 1995-07-03 1995-12-12 F M Valve Seisakusho:Kk Water level control device for water tank

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014188481A (en) * 2013-03-28 2014-10-06 Panasonic Corp Injection device of nutrient for microbe
JP2015087920A (en) * 2013-10-30 2015-05-07 パナソニックＩｐマネジメント株式会社 Management apparatus of water supply facility and management system of water supply facility

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