JP2004338984A

JP2004338984A - Method of manufacturing ornament

Info

Publication number: JP2004338984A
Application number: JP2003136033A
Authority: JP
Inventors: Toru Mashida; 亨真志田; Junji Yasui; 純次安井
Original assignee: NCO SEISAKUSHO KK
Current assignee: NCO SEISAKUSHO KK
Priority date: 2003-05-14
Filing date: 2003-05-14
Publication date: 2004-12-02
Anticipated expiration: 2023-05-14
Also published as: JP4416434B2

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an ornament which has diversified hues, brilliance and complicated patterns and of which the color and the brightness are variously changed. <P>SOLUTION: In the method of manufacturing the ornament having a light interferential surface layer having beautiful hues and formed by vapor-depositing a thin film 3 on the glazed surface of a base body 1 on which glazing 2 is applied and treating the resultant body at a high temperature to make the glazing 2 semi-flowable, the thin film 3 is formed by stacking a plurality of unit layers 4 and 5 while making the stacking speed of at least two layers different. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【０００１】
【発明の属する技術分野】
本発明は、耐熱性を有する基体の表面に、多彩な色相を有する表面層を設けた装飾体の製造法に関する。
【０００２】
【従来の技術】
光干渉性表面層を有する物体は、独特の微妙な光沢を放つため、装飾体として好んで用いられる。
本出願人は、このような装飾体を製造する方法として、釉を施した基体の釉面に真空蒸着、スパッタリング、イオンプレーティング、気相成長及びメッキのいずれかの方法で薄膜を形成し、これを釉が半流動性となる温度で高温処理し、美的模様を示す光干渉性表面層を形成する装飾体の製造法（特許文献１参照）、及び、釉を施した基体の釉面に真空蒸着、スパッタリング、イオンプレーティング、気相成長及びメッキのいずれかの方法で薄膜を形成し、さらにその上に、上記いずれかの方法で無機化合物薄膜を形成し、これを釉が半流動性となる温度で高温処理し、美的模様を示す光干渉性表面層を形成する装飾体の製造法（特許文献２参照）を提案した。
【０００３】
【特許文献１】
特公昭６１−１６３３８号公報
【特許文献２】
特公平１−３７３５３号公報
【０００４】
【発明が解決しようとする課題】
この発明は、干渉色の美しさを主とした従来の技術に、光の特定波長吸収に伴う多色性を加えて、更に多彩、且つ、微妙な美しさを有する装飾体の製造法を提供することを課題とする。
【０００５】
【課題を解決するための手段】
本発明の装飾体の製造法は、釉を施した基体の釉面に薄膜を蒸着し、これを釉が半流動性となる温度で高温処理し、光干渉性や多様な色相を有する表面層を形成するものであって、前記薄膜は、複数の単位層を積層すると共に、少なくとも２つの単位層の積層速度を異ならせて形成される。
本発明において、基体としては、銅、銀、金、鉄、鋼、ステンレスその他の合金等の金属、セラミックス、陶磁器、ガラス等の耐熱性材料が用いられる。
釉には、陶磁器用の釉と、金属用の釉（ホーロー釉、七宝釉）とがあるが、基体の材質に合わせて適した釉を用い、釉の種類に応じた温度で焼成する。また、基体に釉を施す方法としては、従来知られている方法を採用する。
【０００６】
基体の釉面に設ける薄膜は、複数の単位層を重ねて形成される。
複数の単位層は、Ｔｉ、Ａｕ、Ａｇ、Ａｌ、Ｆｅ、Ｃｒ、Ｎｉ、Ｃｕ、Ｐｔ、Ｐｄ、Ｚｎ、Ｍｎ、Ｍｇ、Ｙ、Ｚｒ、Ｓｉ、Ｐｂ、Ｓｎ、Ｉｎ、Ｓｂ、Ｃｏ、Ｍｏ、Ｃｅ、Ｐｒ、Ｅｕ、Ｅｒ等の金属、又は、金属化合物より成り、少なくとも２つの単位層は互いに積層速度が異なる。
各単位層の厚みは、積層時間を変えることにより、材質、層数等に応じて任意に制御する。
各単位層は、基体の温度が一定であれば、積層速度が大きくなるに従って緻密になっていき、積層速度が小さいと粗となるので、各単位層の積層速度の組み合わせを変化させることにより、表面層の美しさが多様に変化する。単位層の緻密さと積層速度との関係は、蒸着、スパッタリング、気相成長等において同様の傾向を示す。
【０００７】
このように、基体の釉面に薄膜を形成したものを、電気炉、窯業炉、バーナー加熱、赤外線加熱或いは誘導加熱などにより高温処理する。高温処理の温度は、薄膜や釉の材質によって異なるが、通常３００〜１６００℃とする。
すると、薄膜が表面から酸化され、多層の単位層の酸化による複雑で美しい色相を現す。薄膜の色は、表面からどの深さまで酸化されたかによって変わり、各単位層は微細であるから、高温処理する温度及び時間を注意して制御する必要がある。
また、薄膜を、少なくとも２つのものどうしで積層速度が異なる複数の単位層で構成したので、単位層の材質、層数、層厚、積層速度を変えることにより、色相及び輝きを多様に変化させることができる。
【０００８】
高温処理することにより、釉は加熱されて半流動性となり、ガラス転移点に達してガラス状態になってから急激に比容、熱膨張率が増大し、この結果、薄膜に皺、突条、亀裂、泡穴、突沸部などが生じて、薄膜の表面に不規則な模様が現出する。
そして、高温処理した結果、薄膜が強固に釉と結合するので、耐摩耗性が向上する。
【０００９】
複数の単位層の少なくとも一つを、金属単体より成るものとしても良い。ここで、金属単体とは、酸化物、水酸化物、硫化物等の金属化合物を除いたものである。金属単体は金属化合物のように簡単に釉に溶解されて干渉色を失うことがなく、高温処理によって酸化された部分が一部消失するが、美しい光沢を維持しやすい。
複数の単位層は、隣接するものどうしの少なくとも一組が同種のものであっても良く、また、複数の単位層を、隣接するものどうしがすべて異なる種類としても良い。
【００１０】
【発明の実施の形態】
以下、本発明を実施例により詳細に説明する。なお、各実施例において、蒸着は電子ビームによる真空蒸着であり、蒸着開始に当たって、加熱温度を２３０℃、蒸着開始圧力を２×１０^−３Ｐａとして基体の不純物を蒸発させ、各単位層の厚みは、水晶振動子センサーによる制御の値を記載する。
【００１１】
実施例１
図１に示すように、アルミナより成る基体１を清浄にし、その表面に釉２を施し、釉２の表面に薄膜３を蒸着した。薄膜３は、釉面に近い側から順に、Ｃｒを毎秒８Åで２０００Åの厚みに蒸着した第１の単位層４と、Ｔｉを毎秒６Åで２０００Åの厚みに蒸着した第２の単位層５とから成る。
次に、これを７５０℃の電気炉に入れ、１２分間加熱焼成した。
すると、薄膜３及び釉２の膨張による適度のひびと着色により、単純な干渉色のみとは異なる紫／青緑の鮮やかな色相が得られた。
【００１２】
実施例２
図２に示すように、アルミナより成る基体１の表面に釉２を施し、釉２の表面に、第１の単位層４、第２の単位層５及び第３の単位層６を順次蒸着して薄膜３を形成した。
第１の単位層４は、Ｃｒを毎秒３Åで２９００Åの厚みに蒸着し、第２の単位層５は、Ａｕを毎秒１Åで５０Åの厚みに蒸着し、第３の単位層６は、Ｃｒを毎秒１Åで２５Åの厚みに蒸着して成る。
これを９００〜１０００℃で３０秒〜２分焼成した。
焼成時の温度及び時間によって、金色から紫に至る色相の変化に富む表面が得られた。
【００１３】
実施例３
釉２を施して焼成したアルミナより成る基体１の釉面に、図３に示すような薄膜３を蒸着した。
薄膜３は、基体１側から順に、Ｃｒを毎秒３Åで２５００Åの厚みに蒸着した第１の単位層４と、Ａｇを毎秒１Åで３０Åの厚みに蒸着した第２の単位層５と、Ｃｒを毎秒２Åで５０Åの厚みに蒸着した第３の単位層６と、Ａｕを毎秒１Åで２０Åの厚みに蒸着した第４の単位層７と、Ｃｒを毎秒２Åで２０Åの厚みに蒸着した第５の単位層８とから成る。
これを、９５０℃〜１０００℃で３０秒〜１分３０秒焼成した。
この結果、美しい黄金色、酸化クロムの緑、赤、紫等の色彩に、釉２との反応により亀裂が生じて、複雑な美しさのある表面となった。
【００１４】
実施例４
釉２を施して焼成したアルミナより成る基体１の釉面に、基体１側から順に、第１の単位層４、第２の単位層５、第３の単位層６、第４の単位層７及び第５の単位層８より成る薄膜３を蒸着した。
第１の単位層４は、Ｓｎを毎秒０．１Åで８Åの厚みに蒸着したものであり、第２の単位層５は、Ａｕを毎秒０．１Åで４Åの厚みに蒸着したものであり、第３の単位層６は、Ａｌを毎秒０．１Åで１７Åの厚みに蒸着したものである。また、第４の単位層７は、Ｓｎを毎秒０．１Åで８Åの厚みに蒸着したものであり、第５の単位層８は、Ｔｉを毎秒３Åで２５００Åの厚みに蒸着したものである。
これを７５０℃〜７７５℃の温度で４０秒〜１分焼成した。
この結果、透明感のある美しい青乃至バラ色の表面を得た。表面の色彩の差は、金コロイドの粒径の差によるものと思われる。
【００１５】
実施例５
釉２を施して焼成したアルミナより成る基体１の釉面に、図４示すように、薄膜３を蒸着した。
薄膜３は、基体１側から順に、Ｓｎを毎秒０．１Åで８Åの厚みに蒸着した第１の単位層４と、Ａｌを毎秒０．１Åで１５Åの厚みに蒸着した第２の単位層５と、Ｓｎを毎秒０．１Åで８Åの厚みに蒸着した第３の単位層６と、Ｔｉを毎秒４Åで２５００Åの厚みに蒸着した第４の単位層７とから成る。
これを７２５℃で３分間焼成した。
膨張係数が大きく、且つ、低融点層である合計３０Åの厚みを有する第１の単位層４、第２の単位層５及び第３の単位層６を設けたことにより、第４の単位層７に細かい亀裂が多数生じ、複雑で美しいチタニアの表面が得られた。
【００１６】
実施例６
アルミナより成る基体１の表面に釉２を施し、釉２の表面に、Ｓｎを毎秒０．１Åで４Åの厚みに蒸着した第１の単位層４と、Ａｕを毎秒０．１Åで７Åの厚みに蒸着した第２の単位層５と、Ａｇを毎秒０．１Åで１Åの厚みに蒸着した第３の単位層６と、Ｔｉを毎秒４Åで２５００Åの厚みに蒸着した第４の単位層７とから成る薄膜３を形成した（図４）。
これを９００℃で３０秒間、複数回に亘って加熱した。
この結果、酸化チタンの透明層を通して、金・銀の薄層が美しいバラ色に輝く表面を得た。
【００１７】
実施例７
釉２を施して焼成したアルミナより成る基体１の釉面に薄膜３を蒸着した。
薄膜３は、基体１側から順に、Ｓｎを毎秒０．１Åで５Åの厚みに蒸着した第１の単位層４と、Ａｕを毎秒０．１Åで４Åの厚みに蒸着した第２の単位層５と、Ａｇを毎秒０．１Åで２Åの厚みに蒸着した第３の単位層６と、Ｓｎを毎秒０．１Åで５Åの厚みに蒸着した第４の単位層７と、Ｔｉを毎秒３Åで２５００Åの厚みに蒸着した第５の単位層８とから成る。
これを、９００℃で２０秒間焼成することを複数回繰り返した。
この結果、透明な酸化チタンを通して、金・銀の美しい緑色の輝きを得た。
【００１８】
実施例８
アルミナより成る基体１の表面に釉２を施し、釉２の表面に、基体１側から順に、第１の単位層４、第２の単位層５、第３の単位層６、第４の単位層７、第５の単位層８及び第６の単位層９より成る薄膜３を蒸着した。
第１の単位層４は、Ｃｒを毎秒４Åで２８５０Åの厚みに蒸着し、第２の単位層５は、Ｃｒを毎秒１Åで５０Åの厚みに蒸着し、第３の単位層６は、Ａｕを毎秒１Åで３０Åの厚みに蒸着し、第４の単位層７は、Ｆｅを毎秒０．２Åで１０Åの厚みに蒸着し、第５の単位層８は、Ｃｏを毎秒０．２Åで１０Åの厚みに蒸着し、第６の単位層９は、Ｃｒを毎秒０．２Åで２５Åの厚みに蒸着して成る。これを７５０℃で１０分〜１５分焼成して、黒色の艶消し状態の表面を得た。
【００１９】
実施例９
アルミナより成る基体１の表面に釉２を施し、釉２の表面に薄膜３を蒸着した。薄膜３は、釉面に近い側から順に、Ｔｉを毎秒１．５Åで１３００Åの厚みに蒸着した第１の単位層４と、Ｔｉを毎秒３Åで１２００Åの厚みに蒸着した第２の単位層５とから成る。
次に、これを７２５℃で１分間、複数回に亘って加熱焼成した。
Ｔｉは亀裂を生じにくい金属であるが、結晶密度の異なる単位層を２層積層したことにより、細かい亀裂のある酸化チタンの表面層が得られた。
【００２０】
実施例１０
図２に示すように、アルミナより成る基体１の表面に釉２を施し、釉２の表面に第１の単位層４を積層し、次いで、第２の単位層５、さらに第３の単位層６を積層して、薄膜３を形成した。
第１の単位層４は、Ａｌ_２Ｏ_３を７４重量％、ＭｇＯを２５．５重量％、ＳｉＯ_２を０．５重量％混合して成るスピネル微粒子を、Ｃｒ中にその１重量％未満分散したものを、毎秒２Åで２９００Åの厚みに蒸着した。
第２の単位層５は、Ａｇを毎秒０．３Åで５０Åの厚みに蒸着し、第３の単位層６は、第１の単位層４と同じ材料を毎秒１Åで２５Åの厚みに蒸着した。
これを１１５０℃で２０〜３０秒間焼成し、適度な小さい凹凸と亀裂を伴う若草色の表面を得た。
【００２１】
【発明の効果】
本発明によれば、多彩な色相及び輝きと、複雑な模様を持ち、耐摩耗性に富んだ表面を有する装飾体が得られる。
また、薄膜を形成する単位層の層数、種類、層厚、積層速度を適宜変更して組み合わせることにより、色相及び輝きを多様に変えることができる。
単位層の少なくとも一つを金属単体とすれば、高温処理によって色相も安定したものが得られる。
【図面の簡単な説明】
【図１】実施例１及び９に係る釉面に薄膜を形成した基体の端面図。
【図２】実施例２及び１０に係る釉面に薄膜を形成した基体の端面図。
【図３】実施例３、４及び７に係る釉面に薄膜を形成した基体の端面図。
【図４】実施例５及び６に係る釉面に薄膜を形成した基体の端面図。
【図５】実施例８に係る釉面に薄膜を形成した基体の端面図。
【符号の説明】
１基体
２釉
３薄膜
４第１の単位層
５第２の単位層
６第３の単位層
７第４の単位層
８第５の単位層
９第６の単位層[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for manufacturing a decorative body in which a surface layer having various colors is provided on a surface of a substrate having heat resistance.
[0002]
[Prior art]
An object having a light interference surface layer is preferably used as a decorative body because it emits a unique subtle luster.
As a method of manufacturing such a decorative body, the present applicant forms a thin film on a glaze surface of a glazed substrate by vacuum evaporation, sputtering, ion plating, vapor phase growth, or plating, This is subjected to a high-temperature treatment at a temperature at which the glaze becomes semi-fluid, and a method for producing a decorative body for forming a light interference surface layer showing an aesthetic pattern (see Patent Document 1). A thin film is formed by one of the methods of vacuum deposition, sputtering, ion plating, vapor phase growth, and plating, and an inorganic compound thin film is further formed thereon by any of the above methods. A method of manufacturing a decorative body that forms a light coherent surface layer exhibiting an aesthetic pattern by performing high-temperature treatment at a temperature (see Patent Document 2).
[0003]
[Patent Document 1]
Japanese Patent Publication No. 61-16338 [Patent Document 2]
Japanese Patent Publication No. 1-37353
[Problems to be solved by the invention]
The present invention provides a method for manufacturing a decorative body having a more versatile and subtle beauty by adding polychromaticity associated with absorption of a specific wavelength of light to a conventional technique mainly involving the beauty of interference colors. The task is to
[0005]
[Means for Solving the Problems]
The method for producing a decorative body of the present invention comprises depositing a thin film on a glaze surface of a glazed substrate, subjecting the thin film to a high-temperature treatment at a temperature at which the glaze becomes semi-fluid, and forming a surface layer having light interference and various hues. Wherein the thin film is formed by stacking a plurality of unit layers and at different stacking speeds of at least two unit layers.
In the present invention, a heat-resistant material such as metal such as copper, silver, gold, iron, steel, stainless steel and other alloys, ceramics, ceramics, and glass is used as the substrate.
There are two types of glaze: ceramic glaze and metal glaze (enamel glaze, cloisonne glaze). Use a glaze suitable for the base material and fire at a temperature according to the type of glaze. As a method for applying glaze to the base, a conventionally known method is employed.
[0006]
The thin film provided on the glaze surface of the base is formed by stacking a plurality of unit layers.
The plurality of unit layers include Ti, Au, Ag, Al, Fe, Cr, Ni, Cu, Pt, Pd, Zn, Mn, Mg, Y, Zr, Si, Pb, Sn, In, Sb, Co, Mo, It is made of a metal such as Ce, Pr, Eu, or Er or a metal compound, and at least two unit layers have different lamination speeds.
The thickness of each unit layer is arbitrarily controlled according to the material, the number of layers, and the like by changing the lamination time.
Each unit layer, if the temperature of the substrate is constant, becomes dense as the lamination speed increases, and becomes coarse if the lamination speed is low, so by changing the combination of the lamination speed of each unit layer, The beauty of the surface layer changes in various ways. The relationship between the density of the unit layer and the lamination speed shows a similar tendency in vapor deposition, sputtering, vapor phase growth, and the like.
[0007]
The thin film formed on the glaze surface of the substrate as described above is subjected to a high-temperature treatment by an electric furnace, a ceramic furnace, burner heating, infrared heating or induction heating. The temperature of the high temperature treatment varies depending on the material of the thin film or the glaze, but is usually 300 to 1600 ° C.
Then, the thin film is oxidized from the surface, and exhibits a complex and beautiful hue due to oxidation of the multilayer unit layer. The color of the thin film changes depending on the depth to which it is oxidized from the surface, and since each unit layer is fine, it is necessary to carefully control the temperature and time for high temperature processing.
In addition, since the thin film is composed of a plurality of unit layers having different lamination speeds for at least two members, the hue and the brightness are variously changed by changing the material, the number of layers, the layer thickness, and the lamination speed of the unit layers. be able to.
[0008]
By the high temperature treatment, the glaze is heated and becomes semi-fluid, and after reaching the glass transition point to be in a glassy state, the specific volume and the coefficient of thermal expansion increase rapidly, and as a result, the thin film has wrinkles, ridges, Cracks, bubble holes, bumps, etc. occur, and irregular patterns appear on the surface of the thin film.
Then, as a result of the high-temperature treatment, the thin film is firmly bonded to the glaze, so that the wear resistance is improved.
[0009]
At least one of the plurality of unit layers may be made of a simple metal. Here, the simple metal refers to a substance excluding a metal compound such as an oxide, a hydroxide, and a sulfide. The metal simple substance is not easily dissolved in the glaze like a metal compound and does not lose the interference color, and a part oxidized by the high temperature treatment is partially lost, but it is easy to maintain beautiful luster.
At least one set of adjacent unit layers may be of the same type, or the unit layers may be of different types.
[0010]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described in detail with reference to examples. In each example, the vapor deposition is vacuum vapor deposition using an electron beam. At the start of the vapor deposition, the heating temperature is set to 230 ° C., the vapor deposition start pressure is set to 2 × 10 ⁻³ Pa, and the impurities of the base are evaporated, and the thickness of each unit layer is increased. Describes the value of control by the quartz oscillator sensor.
[0011]
Example 1
As shown in FIG. 1, a substrate 1 made of alumina was cleaned, its surface was coated with a glaze 2, and a thin film 3 was deposited on the surface of the glaze 2. The thin film 3 is composed of, in order from the side closer to the glaze surface, a first unit layer 4 in which Cr is deposited at a rate of 2000 ° at 8 ° per second and a second unit layer 5 in which Ti is deposited at a rate of 2000 ° at 6 ° per second. Become.
Next, it was placed in an electric furnace at 750 ° C. and baked for 12 minutes.
Then, a vivid hue of purple / blue-green different from only the simple interference color was obtained by appropriate cracking and coloring due to expansion of the thin film 3 and the glaze 2.
[0012]
Example 2
As shown in FIG. 2, a glaze 2 is applied to the surface of a substrate 1 made of alumina, and a first unit layer 4, a second unit layer 5, and a third unit layer 6 are sequentially deposited on the surface of the glaze 2. Thus, a thin film 3 was formed.
The first unit layer 4 deposits Cr at a thickness of 2900 ° at 3 ° / sec, the second unit layer 5 deposits Au at a thickness of 50 ° at 1 ° / sec, and the third unit layer 6 deposits Cr at a thickness of 50 °. It is deposited at a rate of 1 ° per second to a thickness of 25 °.
This was fired at 900 to 1000 ° C. for 30 seconds to 2 minutes.
Depending on the temperature and time at the time of firing, a surface rich in change in hue from gold to purple was obtained.
[0013]
Example 3
A thin film 3 as shown in FIG. 3 was deposited on a glaze surface of a substrate 1 made of alumina fired with a glaze 2.
The thin film 3 includes, in order from the substrate 1 side, a first unit layer 4 in which Cr is deposited at a rate of 2500 at 3 ° per second, a second unit layer 5 in which Ag is deposited at a thickness of 30 ° at 1 ° per second, A third unit layer 6 deposited at a thickness of 50 ° at 2 ° per second, a fourth unit layer 7 deposited at a thickness of 20 ° at 1 ° per second, and a fifth unit deposited at a thickness of 20 ° at 2 ° per second. And a unit layer 8.
This was baked at 950 ° C. to 1000 ° C. for 30 seconds to 1 minute 30 seconds.
As a result, cracks were generated by the reaction with the glaze 2 in a beautiful golden color, green, red, purple or the like of chromium oxide, resulting in a complex beautiful surface.
[0014]
Example 4
A first unit layer 4, a second unit layer 5, a third unit layer 6, and a fourth unit layer 7 are formed on the glaze surface of a base 1 made of alumina fired with the glaze 2 in order from the base 1 side. And a thin film 3 composed of a fifth unit layer 8 was deposited.
The first unit layer 4 is formed by depositing Sn to a thickness of 8 ° at 0.1 ° per second, and the second unit layer 5 is formed by depositing Au to a thickness of 4 ° at 0.1 ° per second. The third unit layer 6 is formed by evaporating Al at a rate of 0.1 ° per second to a thickness of 17 °. The fourth unit layer 7 is formed by depositing Sn at a thickness of 8 ° at 0.1 ° per second, and the fifth unit layer 8 is formed by depositing Ti at a thickness of 2500 ° at 3 ° per second.
This was fired at a temperature of 750 ° C to 775 ° C for 40 seconds to 1 minute.
As a result, a beautiful blue or rose-colored surface having a transparent feeling was obtained. The difference in the color of the surface is considered to be due to the difference in the particle size of the gold colloid.
[0015]
Example 5
As shown in FIG. 4, a thin film 3 was deposited on a glaze surface of a substrate 1 made of alumina fired with a glaze 2.
The thin film 3 is composed of a first unit layer 4 in which Sn is deposited at a thickness of 8 ° at 0.1 ° / sec and a second unit layer 5 in which Al is deposited at a thickness of 15 ° at 0.1 ° / sec in order from the substrate 1 side. And a third unit layer 6 in which Sn is deposited at a thickness of 8 ° at 0.1 ° per second and a fourth unit layer 7 in which Ti is deposited at a thickness of 2500 ° at 4 ° per second.
This was baked at 725 ° C. for 3 minutes.
By providing the first unit layer 4, the second unit layer 5, and the third unit layer 6 having a large expansion coefficient and a low melting point layer and a total thickness of 30 °, the fourth unit layer 7 A number of fine cracks were formed on the surface, resulting in a complex and beautiful surface of titania.
[0016]
Example 6
A glaze 2 is applied to the surface of a substrate 1 made of alumina, and on the surface of the glaze 2, a first unit layer 4 in which Sn is deposited at a thickness of 4 ° at 0.1 ° / sec, and Au is deposited at a thickness of 7 ° at 0.1 ° / sec. A third unit layer 6 in which Ag is deposited to a thickness of 1 ° at 0.1 ° per second, and a fourth unit layer 7 in which Ti is deposited to a thickness of 2500 ° at 4 ° per second. Was formed (FIG. 4).
This was heated at 900 ° C. for 30 seconds multiple times.
As a result, a beautiful rosy surface with a thin layer of gold and silver was obtained through the transparent layer of titanium oxide.
[0017]
Example 7
A thin film 3 was deposited on a glaze surface of a substrate 1 made of alumina fired with a glaze 2.
The thin film 3 is composed of a first unit layer 4 in which Sn is vapor-deposited at a thickness of 0.1 ° / sec and a thickness of 5 °, and a second unit layer 5 in which Au is vapor-deposited at a thickness of 0.1 ° / sec. A third unit layer 6 in which Ag is deposited at a thickness of 2 ° at 0.1 ° per second, a fourth unit layer 7 in which Sn is deposited at a thickness of 5 ° at 0.1 ° per second, and Ti is 2500 ° at 3 ° per second. And a fifth unit layer 8 deposited to a thickness of
This was repeated a plurality of times of firing at 900 ° C. for 20 seconds.
As a result, a beautiful green shine of gold and silver was obtained through the transparent titanium oxide.
[0018]
Example 8
A glaze 2 is applied to the surface of a substrate 1 made of alumina, and a first unit layer 4, a second unit layer 5, a third unit layer 6, and a fourth unit are formed on the surface of the glaze 2 in order from the base 1 side. The thin film 3 composed of the layer 7, the fifth unit layer 8, and the sixth unit layer 9 was deposited.
The first unit layer 4 deposits Cr with a thickness of 2850 ° at 4 ° per second, the second unit layer 5 deposits Cr with a thickness of 50 ° at 1 ° per second, and the third unit layer 6 deposits Au. The fourth unit layer 7 deposits Fe to a thickness of 10 ° at 0.2 ° / sec, and the fifth unit layer 8 deposits Co to a thickness of 10 ° at 0.2 ° / sec. The sixth unit layer 9 is formed by depositing Cr at a rate of 0.2 ° per second and a thickness of 25 °. This was baked at 750 ° C. for 10 to 15 minutes to obtain a black matte surface.
[0019]
Example 9
A glaze 2 was applied to the surface of a substrate 1 made of alumina, and a thin film 3 was deposited on the surface of the glaze 2. The thin film 3 is composed of, in order from the side close to the glaze surface, a first unit layer 4 in which Ti is deposited at a rate of 1.5 ° per second at a thickness of 1300 ° and a second unit layer 5 in which Ti is deposited at a rate of 3 ° per second at a thickness of 1200 °. Consisting of
Next, this was heated and fired at 725 ° C. for one minute several times.
Although Ti is a metal that does not easily crack, a surface layer of titanium oxide having fine cracks was obtained by laminating two unit layers having different crystal densities.
[0020]
Example 10
As shown in FIG. 2, a glaze 2 is applied to the surface of a substrate 1 made of alumina, a first unit layer 4 is laminated on the surface of the glaze 2, then a second unit layer 5, and further a third unit layer. 6 were laminated to form a thin film 3.
The first unit layer 4 is composed of a mixture of 74% by weight of Al ₂ O ₃ , 25.5% by weight of MgO, and 0.5% by weight of SiO ₂ in which spinel fine particles are dispersed in Cr by less than 1% by weight. The deposited material was deposited at a rate of 2 ° per second to a thickness of 2900 °.
The second unit layer 5 was formed by evaporating Ag at a rate of 0.3 ° per second to a thickness of 50 °, and the third unit layer 6 was formed by evaporating the same material as the first unit layer 4 at a rate of 1 ° per second to a thickness of 25 °.
This was baked at 1150 ° C. for 20 to 30 seconds to obtain a bright green surface with moderately small irregularities and cracks.
[0021]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the decorative body which has various hues and brightness, a complicated pattern, and has the surface which was rich in abrasion resistance is obtained.
Further, by appropriately changing and combining the number, type, layer thickness, and lamination speed of the unit layers forming the thin film, the hue and brightness can be variously changed.
If at least one of the unit layers is made of a single metal, a stable hue can be obtained by the high-temperature treatment.
[Brief description of the drawings]
FIG. 1 is an end view of a substrate having a thin film formed on a glaze surface according to Examples 1 and 9.
FIG. 2 is an end view of a base body having a thin film formed on a glaze surface according to Examples 2 and 10.
FIG. 3 is an end view of a base body having a thin film formed on a glaze surface according to Examples 3, 4 and 7;
FIG. 4 is an end view of a substrate having a thin film formed on a glaze surface according to Examples 5 and 6.
FIG. 5 is an end view of a base body having a thin film formed on a glaze surface according to Example 8.
[Explanation of symbols]
REFERENCE SIGNS LIST 1 base 2 glaze 3 thin film 4 first unit layer 5 second unit layer 6 third unit layer 7 fourth unit layer 8 fifth unit layer 9 sixth unit layer

Claims

釉を施した基体の釉面に薄膜を蒸着し、これを釉が半流動性となる温度で高温処理し、光干渉性や多様な色相を有する表面層を形成する装飾体の製造法において、前記薄膜は複数の単位層を積層すると共に、少なくとも２つの単位層の積層速度を異ならせたことを特徴とする装飾体の製造法。In a method of manufacturing a decorative body, a thin film is deposited on a glaze surface of a glazed substrate, and the thin film is subjected to high-temperature treatment at a temperature at which the glaze becomes semi-fluid to form a surface layer having light interference and various hues. A method for manufacturing a decorative body, comprising: laminating a plurality of unit layers on the thin film, and varying a laminating speed of at least two unit layers.

前記複数の単位層の少なくとも一つが、金属単体より成る請求項１に記載の装飾体の製造方法。The method for manufacturing a decorative body according to claim 1, wherein at least one of the plurality of unit layers is made of a single metal.

前記複数の単位層は、隣接するものどうしの少なくとも一組が同種のものである請求項１又は２に記載の装飾体の製造方法。The method for manufacturing a decorative body according to claim 1, wherein at least one pair of the plurality of unit layers adjacent to each other is of the same type.

前記複数の単位層は、隣接するものどうしがすべて異なる種類から成る請求項１又は２に記載の装飾体の製造方法。The method of manufacturing a decorative body according to claim 1, wherein the plurality of unit layers are of different types, all of which are adjacent to each other.