JP2004292302A - 炭素ナノチューブのマトリックス構造及びその製造方法 - Google Patents
炭素ナノチューブのマトリックス構造及びその製造方法 Download PDFInfo
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- JP2004292302A JP2004292302A JP2003300366A JP2003300366A JP2004292302A JP 2004292302 A JP2004292302 A JP 2004292302A JP 2003300366 A JP2003300366 A JP 2003300366A JP 2003300366 A JP2003300366 A JP 2003300366A JP 2004292302 A JP2004292302 A JP 2004292302A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 239000002041 carbon nanotube Substances 0.000 title claims abstract description 49
- 229910021393 carbon nanotube Inorganic materials 0.000 title claims abstract description 49
- 239000011159 matrix material Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000003054 catalyst Substances 0.000 claims abstract description 68
- 239000002245 particle Substances 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000000956 alloy Substances 0.000 claims abstract description 7
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 4
- 238000000137 annealing Methods 0.000 claims abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 18
- 238000001704 evaporation Methods 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910021426 porous silicon Inorganic materials 0.000 claims description 3
- 239000002105 nanoparticle Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- 238000002207 thermal evaporation Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 2
- 238000003491 array Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002109 single walled nanotube Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
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- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F9/00—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
- D01F9/08—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
- D01F9/12—Carbon filaments; Apparatus specially adapted for the manufacture thereof
- D01F9/127—Carbon filaments; Apparatus specially adapted for the manufacture thereof by thermal decomposition of hydrocarbon gases or vapours or other carbon-containing compounds in the form of gas or vapour, e.g. carbon monoxide, alcohols
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/734—Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.
- Y10S977/742—Carbon nanotubes, CNTs
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
Abstract
【解決手段】 本発明は炭素ナノチューブのマトリックス構造を提供し、それは基板、該基板に形成された触媒合金粒子、及び該触媒合金粒子に成長された炭素ナノチューブのマトリックスを含み、該触媒層は複数の寸法が異なった触媒粒子を含み、且つ該触媒粒子の寸法が一定の方向に沿って大きくなり、該炭素ナノチューブのマトリックスは触媒粒子が大きくなった方向へ曲げる。
また、前記構造の製法を提供し、基板に一定の方向に沿って厚くなった触媒層を形成し、保護ガス雰囲気でアニールし、該酸化層を触媒粒子に収縮させ、炭化水素ガスを導入し、該触媒粒子に炭素ナノチューブを成長する。
【選択図】 図3
Description
「Room-temperature transistor based on a single carbon nanotube」,Nature,1998,第393巻,p. 49 「Self-oriented regular arrays of carbon nanotubes and their field emission properties」,Science,1999,第283巻,p. 512−514 「Synthesis of large arrays of well-aligned carbon nanotubes on glass」,Science,1998,第282巻,p. 1105〜1107 「Organized assembly of carbon nanotubes」,Nature,2002,第416巻,p. 495〜496 「Electric-field-directed growth of aligned single-walled carbon nanotubes」,Applied Physics Letters,2001,第79巻,p. 19
(1)基板の表面に一定の方向に沿って厚くなった触媒層を形成する。
(2)保護ガス雰囲気でアニールし、該酸化層をナノオーダーの触媒粒子に収縮させる。
(3)炭化水素ガスを導入し、化学的気相堆積法により前記触媒粒子に炭素ナノチューブを成長する。
11 光抵抗層
13 触媒層
131 触媒粒子
14 炭素ナノチューブのマトリックス
40 炭素ナノチューブのマトリックス構造
Claims (10)
- 基板、該基板に形成された触媒層、及び該触媒層に成長された炭素ナノチューブのマトリックスを含む炭素ナノチューブのマトリックス構造であって、
該触媒層は複数の寸法が異なったナノオーダーの触媒粒子を含み、且つ該触媒粒子の寸法が一定の方向に沿って大きくなり、該炭素ナノチューブのマトリックスは触媒粒子が大きい方向へ曲がっていることを特徴とする炭素ナノチューブのマトリックス構造。 - 前記触媒層は鉄、コバルト、ニッケル或はその合金のうちの一つが選ばれることを特徴とする請求項1に記載の炭素ナノチューブのマトリックス構造。
- 前記基板材料は、多孔シリコンであることを特徴とする請求項1に記載の炭素ナノチューブのマトリックス構造。
- (1)基板の表面に一定の方向に沿って厚くなった触媒層を形成するステップと、
(2)保護ガス雰囲気でアニールし、該酸化層をナノオーダーの触媒粒子に収縮させるステップと、
(3)炭化水素ガスを導入し、化学的気相堆積法により前記触媒粒子に炭素ナノチューブを成長させるステップと、
を含むことを特徴とする炭素ナノチューブのマトリックス構造の製造方法。 - 前記酸化層は、より薄い端部が厚さ2〜3nmの範囲であり、より厚い端部が厚さ6〜8nmの範囲であることを特徴とする請求項4に記載の炭素ナノチューブのマトリックス構造の製造方法。
- 前記触媒層の堆積法は、熱蒸発法或はビーム蒸発法を含むことを特徴とする請求項4に記載の炭素ナノチューブのマトリックス構造の製造方法。
- 前記触媒層を堆積する際に、該触媒の蒸発源は線型蒸発源であることを特徴とする請求項6に記載の炭素ナノチューブのマトリックス構造の製造方法。
- 前記触媒層を堆積する際に、該触媒の蒸発源は直線に沿って移動する点蒸発源であることを特徴とする請求項6に記載の炭素ナノチューブのマトリックス構造の製造方法。
- 前記触媒層は鉄、コバルト、ニッケル或はその合金のうちの一つが選ばれることを特徴とする請求項4に記載の炭素ナノチューブのマトリックス構造の製造方法。
- 前記基板材料は、多孔シリコンであることを特徴とする請求項4に記載の炭素ナノチューブのマトリックス構造の製造方法。
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CNB031140572A CN1244491C (zh) | 2003-03-25 | 2003-03-25 | 一种碳纳米管阵列结构及其制备方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006052122A (ja) * | 2004-08-11 | 2006-02-23 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | 炭素ナノチューブのマトリックス構造及びその製造方法 |
JP2007031271A (ja) * | 2005-07-22 | 2007-02-08 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | カーボンナノチューブのマトリックスの製造方法 |
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US7273095B2 (en) * | 2003-03-11 | 2007-09-25 | United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Nanoengineered thermal materials based on carbon nanotube array composites |
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2003
- 2003-03-25 CN CNB031140572A patent/CN1244491C/zh not_active Expired - Lifetime
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006052122A (ja) * | 2004-08-11 | 2006-02-23 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | 炭素ナノチューブのマトリックス構造及びその製造方法 |
JP4508894B2 (ja) * | 2004-08-11 | 2010-07-21 | 鴻富錦精密工業(深▲セン▼)有限公司 | 炭素ナノチューブのマトリックス構造及びその製造方法 |
JP2007031271A (ja) * | 2005-07-22 | 2007-02-08 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | カーボンナノチューブのマトリックスの製造方法 |
JP4546428B2 (ja) * | 2005-07-22 | 2010-09-15 | 鴻富錦精密工業(深▲セン▼)有限公司 | カーボンナノチューブのマトリックスの製造方法 |
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US7147831B2 (en) | 2006-12-12 |
CN1244491C (zh) | 2006-03-08 |
CN1532143A (zh) | 2004-09-29 |
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