JP2004029322A - Method and device for manufacturing display device - Google Patents

Method and device for manufacturing display device Download PDF

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JP2004029322A
JP2004029322A JP2002184616A JP2002184616A JP2004029322A JP 2004029322 A JP2004029322 A JP 2004029322A JP 2002184616 A JP2002184616 A JP 2002184616A JP 2002184616 A JP2002184616 A JP 2002184616A JP 2004029322 A JP2004029322 A JP 2004029322A
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sealant
sealing agent
heat ray
glass substrate
application
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Hironori Takabayashi
高林　弘徳
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Toshiba Corp
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Toshiba Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and a device for manufacturing a display device with which processing time is shortened and chances for dust to settle thereon are decreased by integrating a sealant applying step and a drying step and reducing an area occupied by the device. <P>SOLUTION: An XY table 2 to place and hold a glass substrate W and moving to the XY direction, a sealant applying mechanism 5 held so as to be freely movable via a Z axis actuator 4 and so as to always maintain a definite distance from the glass substrate placed on and held with the XY table and continuously applying the sealant P to the glass substrate and a heat ray irradiation mechanism 6 following a sealant applying operation of the applying mechanism 5, making the heat ray irradiate the sealant immediately after sealant application in a concentrated manner so as to evaporate a solvent contained in the sealant and to dry the sealant are equipped for the device for manufacturing a liquid crystal device. <P>COPYRIGHT: (C)2004,JPO

Description

【０００１】
【発明の属する技術分野】
本発明は、一対のガラス基板相互の空間部に液晶材料等を充填してなる表示装置を製造するための製造方法と製造装置に関する。
【０００２】
【従来の技術】
表示装置である液晶装置を製造するのに、洗浄したガラス基板に対して所定のパターンでシール剤を塗布する塗布工程をなし、この塗布工程を経た一対のガラス基板をシール剤を介して貼り合せる封着工程をなす。
そして、これらガラス基板相互の空間部に、液晶材料や、ＲＧＢ、トランジスタなどの電子部品、あるいはカラーフィルタなどを備えて液晶装置として完成する。
なお、上記シール剤は、エポキシ等熱硬化性樹脂材が用いられていて、柔軟性を保持して円滑な塗布作用をなすため溶剤を含有している。そこで、塗布工程の後で、封着工程の前に、ガラス基板に塗布されたシール剤を加熱して溶剤を揮発させる乾燥工程が必要となっている。
【０００３】
したがって、シール剤塗布装置で所定のパターンにシール剤を塗布したあと、そのガラス基板をシール剤塗布装置から取り出し、今度はシール乾燥炉内に入れて乾燥させる。
上記シール乾燥炉は、実際には恒温炉であって、炉内を１６０℃程度の加熱雰囲気となし、炉内にガラス基板を収容して一定時間放置する。すると、シール剤に含有する溶剤が揮発し、シール剤が乾燥する乾燥工程が行われる。
【０００４】
【発明が解決しようとする課題】
このようにして液晶装置を製造するのに、シール剤塗布装置と、シール乾燥炉の２つの装置が必ず必要であり、上記封着工程をなす加熱ユニットや、各装置間にガラス基板を搬送する搬送系等を含めると、製造装置の占有スペースが極めて大となっている。
また、シール剤の塗布工程と、乾燥工程とは完全に独立して行うため、一工程ごとにガラス基板を各装置から出し入れを繰り返すので、処理時間がかかるばかりでなく、ガラス基板に埃りが付着する機会が多くなってしまう。
【０００５】
本発明は、上記事情に着目してなされたものであり、その目的とするところは、シール剤の塗布工程と乾燥工程を一体化し、装置の占有スペースの縮小を図り、処理時間の短縮と、埃りが付着する機会を少なくした表示装置の製造方法と製造装置を提供しようとするものである。
【０００６】
【課題を解決するための手段】
上記課題を解決し目的を達成するため本発明は、一対のガラス基板をシール剤を介して貼り合せ、これらガラス基板相互の空間部に液晶材料等を充填してなる表示装置を製造する製造方法において、
ガラス基板を洗浄する洗浄工程と、この洗浄工程で洗浄したガラス基板に対して所定のパターンでシール剤を塗布する塗布工程と、この塗布工程でガラス基板に塗布されたシール剤に含有する溶剤を揮発させシール剤を乾燥させる乾燥工程と、この乾燥工程が終了した一対のガラス基板をシール剤を介して貼り合せる封着工程とを具備し、上記乾燥工程は、上記塗布工程におけるシール剤塗布処理に追従し、シール剤の塗布直後に、シール剤に対し集中して熱線照射をなす。
【０００７】
さらに、上記塗布工程はシール剤をガラス基板に対して矩形枠状パターンに塗布し、上記乾燥工程は複数の熱線照射源を備えシール剤の矩形枠状パターンにおけるそれぞれの辺部に対応する熱線照射源から熱線を照射する。
さらに、上記乾燥工程で用いられる熱線照射源から照射される熱線のビーム直径をＤ、塗布されるシール剤の線幅をｄ、矩形枠状パターンにおけるコーナー部の半径をＲとしたとき、
Ｄ　≧　（２−√２）＊Ｒ＋（√２／２）＊ｄ
を満足するように熱線のビーム直径Ｄを設定する。
【０００８】
上記課題を解決し目的を達成するため本発明は、一対のガラス基板をシール剤を介して貼り合せ、これらガラス基板相互の空間部に液晶材料等を充填してなる表示装置を製造する製造装置において、
ガラス基板を載置し、かつＸＹ方向に移動する移動手段と、この移動手段に載置されるガラス基板との間隔が常に一定量になるようにＺ方向に移動自在に支持されかつガラス基板に対してシール剤を連続的に塗布する塗布手段と、この塗布手段のシール剤塗布作用に追従し、シール剤の塗布直後に、シール剤に対して熱線を集中して照射し、シール剤に含有する溶剤を揮発させシール剤を乾燥させる乾燥手段とを具備した。
【０００９】
【発明の実施の形態】
以下、本発明の一実施の形態を図面にもとづいて説明する。
図１はシール剤塗布・乾燥装置の外観図、図２はその主要部を拡大した斜視図、図３はシール剤塗布工程における高さ検知の説明図、図４はシール剤塗布とシール剤乾燥の概要図、図５はシール剤塗布点と熱線照射位置との関係を説明する図、図６はコーナー部におけるシール剤塗布と熱線照射の関係を説明する図である。
【００１０】
はじめに、図１と図２からシール剤塗布・乾燥装置および、この装置の主要部の概要を説明をする。
図中１は基台であって、この基台１上にガラス基板であるワークＷを載置するＸＹテーブル（移動手段）２が設けられる。さらに、基台１上には上記ＸＹテーブル２に対して跨設状態で架台３が設けられていて、この架台３の中央部にはＺ軸アクチュエータ４が軸方向を垂直に向けて取付けられる。
【００１１】
上記Ｚ軸アクチュエータ４には、シール剤塗布機構（塗布手段）５および複数の熱線照射機構（乾燥手段）６が取付けられていて、Ｚ軸アクチュエータ４によってシール剤塗布機構５と複数の熱線照射機構６がともに上下動（Ｚ方向）変位するようになっている。
上記シール剤塗布機構５は、先端部から所定の圧力でシール剤を吐出するディスペンサである。このディスペンサ５の先端は上記ワークＷに対して向けられていて、連続的にワークにシール剤を塗布するように制御されている。
【００１２】
上記熱線照射機構６は、ここでは４組取付けられていて、上記シール剤塗布機構５を中心として、この周囲を囲むように９０°間隔を存して配置される。各熱線照射機構５の先端はワークＷに対向していて、この先端から赤外線もしくはレーザー光などの熱線をビーム照射する。
なお説明すれば、ここではシール剤塗布機構５はワークＷに対して矩形枠状のシールパターンを連続して形成する。そして、シールパターンの辺部が四辺あるところから、上記熱線照射機構６は４組備えられる。
【００１３】
後述するように、シール剤のパターンに対する各熱線照射機構６の照射位置が調整され、かつ各熱線照射機構のうちの１組の熱線照射機構６のみが熱線照射をなすとともに、熱線照射を順に切換えるタイミングが設定されている。
上記架台３におけるＺ軸アクチュエータ４の両側には、それぞれが上記ワークＷに描かれている位置合わせマークを認識して位置補正するための認識カメラ７が配置されている。
【００１４】
特に、図３に示すように、上記シール剤塗布機構５の近傍にはレーザ変位計８が取付け固定される。このレーザ変位計８は、上記Ｚ軸アクチュエータ４に取付けられる反射鏡９を介してワークＷ表面にレーザ光Ｌを照射し、シール剤塗布機構５を構成するディスペンサ先端とワークＷとの距離を測定する。
これは、上記ワークＷやＸＹテーブル２は多少反っていたり凹凸を持っていて、単純に上記ＸＹステージ２を動かしただけではシール剤塗布機構５先端とワークＷとの間隔が一定にならない。そのため、シール剤Ｐを塗布した状態で塗布幅や塗布高さが増減したり、塗布かすれが発生したりする。
【００１５】
通常、ワークＷ面とシール剤塗布機構５先端との距離を２５μｍ±４μｍに、かつ塗布されたシール剤Ｐの幅寸法が４００μｍになるよう、高精度が要求されていて、そのための手段として上記レーザ変位計８が用いられる。
すなわち、レーザ変位計８でワークＷ面とシール剤塗布機構５先端との間隔をリアルタイムで計測しながら、この距離にもとづいてＺ軸アクチュエータ４を動作させ、上記間隔を一定に保つようにしている。
【００１６】
このようにして構成されるシール剤塗布・乾燥装置であって、この前の洗浄工程で洗浄されたワークＷを図示しないロボットなどの搬送系でＸＹテーブル２上に載置する。そのあと、認識カメラ７でワークＷの位置合せマークを認識し、位置補正を行う。
続いて、図４に示すように、ワークＷを矢印方向に移動制御しながらシール剤塗布機構５を作用させ、シール剤ＰをワークＷに塗布する塗布工程が行われる。上記ＸＹテーブルは予め入力していた所定のパターンにしたがってワークＷを移動せしめ、シール剤Ｐがワークに線引き塗布される。
【００１７】
そしてさらに、熱線照射機構５がシール剤Ｐに対して熱線（レーザー光）Ｌを照射する乾燥工程が行われる。この乾燥工程では、シール剤Ｐの塗布処理に追従して熱線Ｌの照射が行われる。しかも、熱線照射位置をシール剤Ｐが塗布された直後位置に集中させている。
塗布されたシール剤Ｐは直ちに加熱されることとなり、シール剤に含有する溶剤が揮発してシール剤は乾燥化する。したがって、ワークＷにシール剤Ｐが所定パターンに形成された直後に、シール剤全体が乾燥する。
【００１８】
このワークＷはシール剤塗布・乾燥装置から取り出され、次工程であるトランスファ塗布工程を経て２枚のガラス基板を貼り合わせる封着工程などに至ることとなる。
したがって、ワークＷにシール剤Ｐを塗布する塗布工程と、塗布されたシール剤を乾燥させる乾燥工程をタイミングをずらせて行うので、互いに独立して処理する従来の工程と比較して処理時間が短縮し、生産性の向上を図れる。
【００１９】
シール剤塗布工程と乾燥工程を同一の装置内で行うようにしたから、別個に装置を配置した従来構成と比較して、装置の一体化が実現し、占有スペースの縮小を図れる。
シール剤に対する局所的な加熱であるので、従来のようにガラス基板全体を加熱雰囲気に浸すことと比較して、必要な熱エネルギーが少なくてすみ、コスト的に極めて有利となる。
【００２０】
なお、４組備えられる熱線照射機構６のそれぞれは、図５に示すように照射切換えの制御がなされる。この場合、シール剤Ｐは矩形枠状のパターンに形成されることを条件とする。
図において、Ｓはガラス基板であるワークＷ上に描かれる矩形枠状のパターンであり、このパターン上のマークはシール剤塗布機構５であるディスペンサの先端を示していて、マーク一端の半円状部が塗布方向を表している。
【００２１】
上記シール剤塗布機構５の周囲には、第１〜第４の熱線照射機構６ａ〜６ｄが９０°間隔を存して配置される。すなわち、図における左右両側部位と、上下両側部位に第１〜第４の熱線照射機構６ａ〜６ｄが設けられる。
実際には、ワークＷがＸＹテーブル２により矢印方向に移動され、シール剤塗布機構５と熱線照射機構６ａ〜６ｄが固定されているが、説明の都合上、ワークが固定でシール剤塗布機構と熱線照射機構が移動するものとする。
【００２２】
はじめに、図中（イ）の位置からシール剤塗布がスタートすると仮定し、図中左側方向の辺部Ｓ１に沿ってシール剤塗布機構５および４組の熱線照射機構６ａ〜６ｄが同時に移動する。
この状態で、シール剤塗布機構５の進行方向とは逆の後側に位置する第１の熱線照射機構６ａがシール直後に、シール剤塗布の軌跡であるパターンＳに沿って熱線を照射する。
【００２３】
上記辺部Ｓ１の全てにシール剤Ｐを塗布したあと、連続して図中（ロ）の位置に沿う辺部Ｓ２にシール剤が塗布される。この辺部Ｓ２のシール剤塗布をなしている間は、上記第１の熱線照射機構６ａの作用が停止され、代ってシール剤塗布機構５の進行方向とは逆の後側に位置する第２の熱線照射機構６ｂが熱線照射を継続する。
上記辺部Ｓ２の全てにシール剤Ｐを塗布したあと、連続して図中（ハ）の位置に沿う辺部Ｓ３にシール剤が塗布される。この辺部Ｓ３のシール剤塗布をなしている間は、上記第２の熱線照射機構６ｂの作用が停止され、代ってシール剤塗布機構５の進行方向とは逆の後側に位置する第３の熱線照射機構６ｃが熱線照射を継続する。
【００２４】
上記の辺部Ｓ３の全てにシール剤Ｐを塗布したあと、連続して図中（ニ）の位置に沿う辺部Ｓ４にシール剤が塗布される。この辺部Ｓ４のシール剤塗布をなしている間は、上記第３の熱線照射機構６ｃの作用が停止され、代ってシール剤塗布機構５の進行方向とは逆の後側に位置する第４の熱線照射機構６ｄが熱線照射を継続する。
このようにして、矩形枠状に形成されるシールパターンＳであるとき、第１〜第４の熱線照射機構６ａ〜６ｄは各辺Ｓ１〜Ｓ４のそれぞれの辺部に対応して照射作用をなすよう切換え制御される。
【００２５】
たとえば、１組の熱線照射機構のみをシール塗布機構５の周囲に沿って回動自在に備え、各辺Ｓ１〜Ｓ４のシール剤塗布が終了した時点で９０°ずつ回動変位させ、結果として上述の４組の熱線照射機構６ａ〜６ｄを備えたものと同様に作用させることは可能である。
ただし、４組の熱線照射機構６ａ〜６ｄを備えている場合は、回動駆動機構は不要であり、機構的に簡素化する利点がある。各辺Ｓ１〜Ｓ４ごとに熱線を照射する装置を切換える制御が必要であるが、１組の熱線照射機構を各辺ごとに９０°づつ回動する制御と比較してほとんど同程度である。
【００２６】
なお、シールパターンＳが矩形枠状に形成されることで各コーナー部はある程度のＲ状をなしている。上述したように、各辺Ｓ１〜Ｓ４ごとに対応した熱線照射機構６ａ〜６ｄが作用するが、実際には辺部における直線部分のみを照射し、コーナー部に対するシール剤塗布をなしている間は熱線照射を停止する。
そして、コーナー部を経て他方の辺部の直線部分に移ったところで、次の熱線照射機構が照射を開始する。以下、同様に、熱線照射機構は辺部の直線部分を照射し、コーナー部に至ったら照射を停止する。次の辺部の直線部分に到達したら別の熱線照射機構が熱線照射を開始する。
【００２７】
図６（Ａ）に、シールパターンＳのコーナー部Ｋにおけるシール剤塗布と熱線照射の関係を示している。
すなわち、シールパターンＳのいずれかの辺部で直線部分に対していずれかの熱線照射機構が熱線を照射し、停止線Ｔ１である最終位置に到達したところで、その熱線照射機構の照射を停止する。
【００２８】
上記シール剤塗布機構がコーナー部Ｋを塗布している間、いずれの熱線照射機構も熱線照射を停止し、次の辺部の直線部分Ｔから別の熱線照射機構が熱線照射を開始する。
ここで、塗布されるシールパターンＳの幅寸法をｄ、コーナー部Ｋの半径をＲとして、照射される熱線のビーム直径ｄをシールパターンＳの幅寸法ｄと同一とする。
【００２９】
各熱線照射機構がシールパターンＳの辺部における直線部分のみを熱線照射し、コーナー部Ｋでは熱線照射を停止すると、コーナー部Ｋにおける内径部分の一部と外径部分の一部に熱線が照射されない部分（図で交差ハッチングで示す）Ｚが生じて均一乾燥が得られなくなる。
これに対して、図６（Ｂ）に示すように、シールパターンＳの幅寸法をｄ、コーナー部Ｋの半径をＲとし、熱線のビーム直径をＤとすれば、各辺部における直線部分のみに対する照射でも、コーナー部Ｋ全体をカバーできる均一乾燥を得られる。
上記熱線のビーム直径Ｄは、以下の式から設定される。
Ｄ　≧　（２−√２）＊Ｒ＋（√２／２）＊ｄ
なお、本発明は上記実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲で種々変形実施可能であるのは勿論である。
【００３０】
【発明の効果】
以上説明したように本発明によれば、シール剤の塗布工程と乾燥工程を一体化したので、装置の占有スペースの縮小を図り、処理時間の短縮化を得るとともに、埃りが付着する機会を少なくして信頼性の向上を得るなどの効果を奏する。
【図面の簡単な説明】
【図１】本発明の実施の形態に係る、シール剤塗布・乾燥装置の外観図。
【図２】同実施の形態に係る、シール剤塗布・乾燥装置の主要部を拡大した斜視図。
【図３】同実施の形態に係る、シール剤塗布工程での高さ検知を説明する図。
【図４】同実施の形態に係る、シール剤塗布とシール剤乾燥の概要図。
【図５】同実施の形態に係る、シール剤塗布点と熱線照射位置との関係を説明する図。
【図６】同実施の形態に係る、コーナー部におけるシール剤塗布と熱線照射の関係を説明する図。
【符号の説明】
Ｗ…ワーク（ガラス基板）、
Ｐ…シール剤、
２…ＸＹテーブル（移動手段）、
４…Ｚ軸アクチュエータ、
５…シール剤塗布機構（塗布手段）、
６…熱線照射機構（乾燥手段）。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a manufacturing method and a manufacturing apparatus for manufacturing a display device in which a space between a pair of glass substrates is filled with a liquid crystal material or the like.
[0002]
[Prior art]
To manufacture a liquid crystal device as a display device, an application step of applying a sealant to a washed glass substrate in a predetermined pattern is performed, and a pair of glass substrates that have undergone this application step are bonded together via the sealant. Perform the sealing process.
Then, a liquid crystal material, electronic components such as RGB and transistors, a color filter, and the like are provided in a space between the glass substrates to complete a liquid crystal device.
The sealing agent is made of a thermosetting resin material such as epoxy, and contains a solvent for maintaining flexibility and performing a smooth coating action. Therefore, after the coating step and before the sealing step, a drying step of heating the sealing agent applied to the glass substrate to volatilize the solvent is required.
[0003]
Therefore, after applying the sealant in a predetermined pattern by the sealant application device, the glass substrate is taken out of the sealant application device, and then placed in a seal drying furnace and dried.
The seal drying furnace is actually a constant temperature furnace in which the inside of the furnace has a heating atmosphere of about 160 ° C., and a glass substrate is housed in the furnace and left for a certain time. Then, the solvent contained in the sealing agent is volatilized, and a drying step is performed in which the sealing agent is dried.
[0004]
[Problems to be solved by the invention]
In order to manufacture a liquid crystal device in this manner, two devices, a sealant application device and a seal drying furnace, are necessarily required, and a heating unit for performing the above-mentioned sealing step and a glass substrate transferred between the devices. Including the transport system and the like, the space occupied by the manufacturing apparatus is extremely large.
In addition, since the application process of the sealant and the drying process are performed completely independently, the glass substrate is repeatedly taken in and out of each device for each process. The chance of adhesion increases.
[0005]
The present invention has been made in view of the above circumstances, and the purpose thereof is to integrate the application step and the drying step of the sealant, reduce the space occupied by the apparatus, shorten the processing time, An object of the present invention is to provide a method and an apparatus for manufacturing a display device in which the chance of dust being attached is reduced.
[0006]
[Means for Solving the Problems]
In order to solve the above problems and achieve the object, the present invention provides a manufacturing method for manufacturing a display device in which a pair of glass substrates are bonded together via a sealant, and a space between the glass substrates is filled with a liquid crystal material or the like. At
A cleaning step of cleaning the glass substrate, an application step of applying a sealing agent in a predetermined pattern to the glass substrate cleaned in the cleaning step, and a solvent contained in the sealing agent applied to the glass substrate in the application step. A drying step of volatilizing and drying the sealant; and a sealing step of bonding the pair of glass substrates after the drying step to each other via a sealant, wherein the drying step is a sealant application process in the application step. Immediately after the application of the sealant, heat rays are radiated intensively on the sealant.
[0007]
Further, the applying step applies the sealant to the glass substrate in a rectangular frame-like pattern, and the drying step includes a plurality of heat ray irradiating sources and irradiates the sealant with heat ray corresponding to each side in the rectangular frame-like pattern of the sealant. Irradiate heat rays from the source.
Further, when the beam diameter of the heat ray irradiated from the heat ray irradiation source used in the drying step is D, the line width of the applied sealant is d, and the radius of the corner in the rectangular frame-shaped pattern is R,
D ≧ (2-√2) * R + (√2 / 2) * d
Is set such that the beam diameter D of the hot wire is satisfied.
[0008]
In order to solve the above-mentioned problems and achieve the object, the present invention provides a manufacturing apparatus for manufacturing a display device in which a pair of glass substrates are bonded together via a sealant, and a space between the glass substrates is filled with a liquid crystal material or the like. At
A moving means for mounting a glass substrate and moving in the X and Y directions, and being supported movably in the Z direction so that the distance between the glass substrate mounted on the moving means always becomes a constant amount, and An application means for continuously applying the sealant to the sealant, and following the sealant application action of the application means, immediately after the application of the sealant, heat rays are intensively applied to the sealant for irradiation. Drying means for volatilizing the solvent to be dried and drying the sealant.
[0009]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
1 is an external view of a sealant applying / drying apparatus, FIG. 2 is an enlarged perspective view of a main part thereof, FIG. 3 is an explanatory view of height detection in a sealant applying step, and FIG. 4 is sealant applying and sealing agent drying. FIG. 5 is a diagram for explaining a relationship between a sealant application point and a heat ray irradiation position, and FIG. 6 is a diagram for explaining a relationship between a sealant application and a heat ray irradiation at a corner portion.
[0010]
First, an outline of a sealant application / drying apparatus and a main part of the apparatus will be described with reference to FIGS.
In the figure, reference numeral 1 denotes a base, on which an XY table (moving means) 2 on which a work W as a glass substrate is placed is provided. Further, a gantry 3 is provided on the base 1 so as to straddle the XY table 2, and a Z-axis actuator 4 is attached to the center of the gantry 3 with its axial direction oriented vertically.
[0011]
A sealant application mechanism (application means) 5 and a plurality of heat ray irradiation mechanisms (drying means) 6 are attached to the Z-axis actuator 4. 6 are vertically displaced (Z direction).
The sealant application mechanism 5 is a dispenser that discharges the sealant at a predetermined pressure from the tip. The tip of the dispenser 5 is directed toward the work W, and is controlled so as to continuously apply a sealant to the work.
[0012]
Here, four sets of the heat ray irradiating mechanisms 6 are mounted, and are arranged at 90 ° intervals around the sealing agent applying mechanism 5 so as to surround the periphery thereof. The tip of each heat ray irradiation mechanism 5 faces the work W, and emits a beam of heat rays such as infrared rays or laser light from the tips.
In this case, the sealant application mechanism 5 continuously forms a rectangular frame-shaped seal pattern on the work W here. Then, since there are four sides of the seal pattern, four sets of the heat ray irradiation mechanism 6 are provided.
[0013]
As described later, the irradiation position of each heat ray irradiation mechanism 6 with respect to the pattern of the sealant is adjusted, and only one set of the heat ray irradiation mechanisms 6 among the heat ray irradiation mechanisms performs the heat ray irradiation and sequentially switches the heat ray irradiation. Timing is set.
On both sides of the Z-axis actuator 4 in the gantry 3, recognition cameras 7 for recognizing and correcting the position of each alignment mark drawn on the workpiece W are arranged.
[0014]
In particular, as shown in FIG. 3, a laser displacement meter 8 is attached and fixed near the sealant application mechanism 5. The laser displacement meter 8 irradiates the surface of the work W with laser light L via a reflecting mirror 9 attached to the Z-axis actuator 4 to measure the distance between the tip of a dispenser constituting the sealant applying mechanism 5 and the work W. I do.
This is because the work W and the XY table 2 are slightly warped or have irregularities, and simply moving the XY stage 2 does not make the distance between the tip of the sealant application mechanism 5 and the work W constant. Therefore, the application width and the application height increase or decrease in the state where the sealant P is applied, or the application is blurred.
[0015]
Usually, high precision is required so that the distance between the surface of the work W and the tip of the sealant applying mechanism 5 is 25 μm ± 4 μm, and the width of the applied sealant P is 400 μm. A laser displacement meter 8 is used.
That is, while the distance between the work W surface and the tip of the sealant applying mechanism 5 is measured in real time by the laser displacement meter 8, the Z-axis actuator 4 is operated based on this distance to keep the distance constant. .
[0016]
In the sealant application / drying apparatus configured as described above, the work W cleaned in the previous cleaning step is placed on the XY table 2 by a transfer system such as a robot (not shown). Then, the recognition mark of the work W is recognized by the recognition camera 7 and the position is corrected.
Subsequently, as shown in FIG. 4, an application step of applying the sealant P to the work W by operating the sealant application mechanism 5 while controlling the movement of the work W in the arrow direction is performed. The XY table moves the work W in accordance with a predetermined pattern input in advance, and the sealant P is drawn and applied to the work.
[0017]
Further, a drying step in which the heat ray irradiation mechanism 5 irradiates the sealant P with heat rays (laser light) L is performed. In this drying step, irradiation of the heat ray L is performed following the application processing of the sealant P. In addition, the heat ray irradiation position is concentrated on the position immediately after the application of the sealant P.
The applied sealing agent P is immediately heated, and the solvent contained in the sealing agent volatilizes and the sealing agent dries. Accordingly, immediately after the sealant P is formed on the work W in a predetermined pattern, the entire sealant dries.
[0018]
The work W is taken out of the sealant application / drying apparatus, and reaches a sealing step of bonding two glass substrates through a next step, a transfer application step.
Therefore, since the application step of applying the sealant P to the work W and the drying step of drying the applied sealant are performed at different timings, the processing time is shortened as compared with the conventional step of performing processing independently of each other. And improve productivity.
[0019]
Since the sealant application step and the drying step are performed in the same apparatus, the integration of the apparatuses can be realized and the occupied space can be reduced as compared with the conventional configuration in which the apparatuses are separately arranged.
Since the heating is local to the sealant, less heat energy is required as compared with the conventional method in which the entire glass substrate is immersed in a heating atmosphere, which is extremely advantageous in terms of cost.
[0020]
In addition, each of the four sets of heat ray irradiation mechanisms 6 is controlled to switch the irradiation as shown in FIG. In this case, the condition is that the sealant P is formed in a rectangular frame-like pattern.
In the figure, S is a rectangular frame-shaped pattern drawn on a work W which is a glass substrate, and the mark on this pattern indicates the tip of the dispenser which is the sealant applying mechanism 5, and a semicircular shape at one end of the mark. The part indicates the application direction.
[0021]
Around the sealant application mechanism 5, first to fourth heat ray irradiation mechanisms 6a to 6d are arranged at intervals of 90 °. That is, the first to fourth heat ray irradiation mechanisms 6a to 6d are provided on both left and right portions and upper and lower portions in the drawing.
Actually, the work W is moved in the direction of the arrow by the XY table 2, and the sealant applying mechanism 5 and the heat ray irradiation mechanisms 6a to 6d are fixed. However, for the sake of explanation, the work is fixed and the sealant applying mechanism is fixed. It is assumed that the heat ray irradiation mechanism moves.
[0022]
First, assuming that the application of the sealant starts from the position (a) in the figure, the sealant application mechanism 5 and the four sets of heat ray irradiation mechanisms 6a to 6d simultaneously move along the left side S1 in the figure.
In this state, the first heat ray irradiating mechanism 6a located on the rear side opposite to the traveling direction of the sealant applying mechanism 5 irradiates the heat rays along the pattern S which is the locus of the sealant application immediately after sealing.
[0023]
After the sealing agent P is applied to all of the side portions S1, the sealing agent is applied continuously to the side portion S2 along the position (b) in the drawing. During the application of the sealant on the side portion S2, the operation of the first heat ray irradiation mechanism 6a is stopped, and the second heat ray irradiating mechanism 6a is replaced with the second heat ray irradiating mechanism 6a located on the rear side opposite to the traveling direction of the sealant application mechanism 5. The heat ray irradiation mechanism 6b continues the heat ray irradiation.
After the sealing agent P is applied to all of the side portions S2, the sealing agent is continuously applied to the side portion S3 along the position (c) in the drawing. During the application of the sealant on the side portion S3, the operation of the second heat ray irradiation mechanism 6b is stopped, and the third heat ray irradiating mechanism 6b is replaced by the third heat ray irradiating mechanism 6b. The heat ray irradiation mechanism 6c continues the heat ray irradiation.
[0024]
After the sealing agent P is applied to all of the sides S3, the sealing agent is continuously applied to the side S4 along the position (d) in the drawing. While the sealant is being applied to the side portion S4, the operation of the third heat ray irradiation mechanism 6c is stopped, and the fourth heat ray irradiating mechanism 6c is replaced by the fourth heat ray irradiating mechanism 6c located on the rear side opposite to the moving direction of the sealant applying mechanism 5. The heat ray irradiation mechanism 6d continues the heat ray irradiation.
In this way, when the seal pattern S is formed in a rectangular frame shape, the first to fourth heat ray irradiation mechanisms 6a to 6d perform an irradiation action corresponding to each of the sides S1 to S4. The switching is controlled as follows.
[0025]
For example, only one set of heat ray irradiation mechanism is rotatably provided along the periphery of the seal applying mechanism 5, and is rotated and displaced by 90 ° at the time when the application of the sealant on each side S1 to S4 is completed. Can be operated in the same manner as the apparatus having the four sets of heat ray irradiation mechanisms 6a to 6d.
However, when four sets of heat ray irradiation mechanisms 6a to 6d are provided, the rotation drive mechanism is unnecessary, and there is an advantage that the mechanism is simplified mechanically. It is necessary to control the switching of the device for irradiating the heat ray for each of the sides S1 to S4, but it is almost the same as the control of rotating one set of the heat ray irradiation mechanism by 90 ° for each side.
[0026]
Each corner portion has a certain degree of R shape by forming the seal pattern S in a rectangular frame shape. As described above, the heat ray irradiating mechanisms 6a to 6d corresponding to each of the sides S1 to S4 operate. However, actually, only the linear portions on the sides are irradiated and the sealant is applied to the corners. Stop heating.
Then, when the light beam has moved to the straight portion on the other side through the corner, the next heat ray irradiation mechanism starts irradiation. Hereinafter, similarly, the heat ray irradiating mechanism irradiates the linear portion of the side portion, and stops the irradiation when reaching the corner portion. When the next linear portion of the side is reached, another hot-beam irradiation mechanism starts hot-beam irradiation.
[0027]
FIG. 6A shows the relationship between the application of the sealant and the irradiation of heat rays at the corner K of the seal pattern S.
That is, any one of the heat ray irradiating mechanisms irradiates a heat ray to a straight line portion on any one side of the seal pattern S, and stops irradiating the heat ray irradiating mechanism when reaching the final position which is the stop line T1. .
[0028]
While the sealant application mechanism is applying the corner K, any of the heat ray irradiation mechanisms stops the heat ray irradiation, and another heat ray irradiation mechanism starts the heat ray irradiation from the linear portion T on the next side.
Here, the width of the seal pattern S to be applied is d, the radius of the corner K is R, and the beam diameter d of the irradiated heat ray is the same as the width d of the seal pattern S.
[0029]
When each of the heat ray irradiating mechanisms irradiates only the linear portion on the side of the seal pattern S with the heat ray, and stops the heat ray irradiation at the corner K, the heat ray irradiates a part of the inner diameter part and a part of the outer diameter part of the corner K. An undesired portion (indicated by cross hatching in the drawing) Z occurs, and uniform drying cannot be obtained.
On the other hand, as shown in FIG. 6B, if the width dimension of the seal pattern S is d, the radius of the corner K is R, and the beam diameter of the hot wire is D, only the straight line portion on each side is obtained. Irradiation can obtain uniform drying that can cover the entire corner K.
The beam diameter D of the hot wire is set by the following equation.
D ≧ (2-√2) * R + (√2 / 2) * d
It should be noted that the present invention is not limited to the above-described embodiment, and it goes without saying that various modifications can be made without departing from the spirit of the present invention.
[0030]
【The invention's effect】
As described above, according to the present invention, since the application step and the drying step of the sealant are integrated, the space occupied by the apparatus can be reduced, the processing time can be shortened, and the opportunity for dust to adhere is reduced. The effect of reducing the number and improving the reliability is obtained.
[Brief description of the drawings]
FIG. 1 is an external view of a sealant application / drying device according to an embodiment of the present invention.
FIG. 2 is an enlarged perspective view of a main part of the sealant application / drying device according to the embodiment;
FIG. 3 is a view for explaining height detection in a sealant application step according to the embodiment;
FIG. 4 is a schematic diagram of sealant application and sealant drying according to the embodiment.
FIG. 5 is a diagram illustrating a relationship between a sealant application point and a heat ray irradiation position according to the embodiment.
FIG. 6 is a view for explaining a relationship between application of a sealant and irradiation of heat rays at a corner portion according to the embodiment.
[Explanation of symbols]
W: Work (glass substrate),
P ... sealant,
2. XY table (moving means),
4: Z-axis actuator,
5. Sealing agent application mechanism (application means)
6. Heat ray irradiation mechanism (drying means).

Claims (4)

一対のガラス基板をシール剤を介して貼り合せ、これらガラス基板相互の空間部に液晶材料等を充填してなる表示装置を製造する製造方法において、
ガラス基板を洗浄する洗浄工程と、この洗浄工程で洗浄したガラス基板に対して所定のパターンでシール剤を塗布する塗布工程と、この塗布工程でガラス基板に塗布されたシール剤に含有する溶剤を揮発させシール剤を乾燥させる乾燥工程と、この乾燥工程が終了した一対のガラス基板をシール剤を介して貼り合せる封着工程とを具備し、
上記乾燥工程は、上記塗布工程におけるシール剤塗布処理に追従し、シール剤の塗布直後に、シール剤に対し集中して熱線照射をなすことを特徴とする表示装置の製造方法。In a manufacturing method for manufacturing a display device in which a pair of glass substrates are bonded together via a sealant and a space between the glass substrates is filled with a liquid crystal material or the like,
A cleaning step of cleaning the glass substrate, an application step of applying a sealing agent in a predetermined pattern to the glass substrate cleaned in the cleaning step, and a solvent contained in the sealing agent applied to the glass substrate in the application step. A drying step of volatilizing and drying the sealant, and a sealing step of bonding the pair of glass substrates after the drying step to each other via a sealant,
The method of manufacturing a display device, wherein the drying step follows a sealing agent application process in the applying step, and heat rays are concentrated on the sealing agent immediately after the application of the sealing agent. 上記塗布工程は、上記シール剤を上記ガラス基板に対して矩形枠状パターンに塗布し、
上記乾燥工程は、複数の熱線照射源を備え、シール剤の矩形枠状パターンにおけるそれぞれの辺部に対応する熱線照射源から熱線を照射することを特徴とする請求項１記載の表示装置の製造方法。In the applying step, the sealing agent is applied to the glass substrate in a rectangular frame pattern,
2. The manufacturing method of a display device according to claim 1, wherein the drying step includes a plurality of heat ray irradiation sources, and irradiates heat rays from heat ray irradiation sources corresponding to respective sides of the rectangular frame pattern of the sealant. Method. 上記乾燥工程で用いられる熱線照射源から照射される熱線のビーム直径をＤ、塗布されるシール剤の線幅をｄ、矩形枠状パターンにおけるコーナー部の半径をＲとしたとき、
Figure 2004029322
を満足するように熱線のビーム直径Ｄを設定することを特徴とする請求項２記載の表示装置の製造方法。When the beam diameter of the heat ray irradiated from the heat ray irradiation source used in the drying step is D, the line width of the applied sealant is d, and the radius of the corner in the rectangular frame pattern is R,
Figure 2004029322
3. The method for manufacturing a display device according to claim 2, wherein the beam diameter D of the hot wire is set so as to satisfy the following condition. 一対のガラス基板をシール剤を介して貼り合せ、これらガラス基板相互の空間部に液晶材料等を充填してなる表示装置を製造する製造装置において、
ガラス基板を載置し、かつＸＹ方向に移動する移動手段と、
この移動手段に載置されるガラス基板との間隔が常に一定量になるようにＺ方向に移動自在に支持され、かつガラス基板に対してシール剤を連続的に塗布する塗布手段と、
この塗布手段のシール剤塗布作用に追従し、シール剤の塗布直後に、シール剤に対して熱線を集中して照射し、シール剤に含有する溶剤を揮発させシール剤を乾燥させる乾燥手段とを具備したことを特徴とする表示装置の製造装置。In a manufacturing apparatus for manufacturing a display device in which a pair of glass substrates are bonded via a sealant, and a space between the glass substrates is filled with a liquid crystal material or the like,
Moving means for mounting the glass substrate and moving in the XY directions;
Coating means for movably supported in the Z direction so that the distance between the glass substrate and the glass substrate placed on the moving means is always constant, and for continuously applying a sealant to the glass substrate;
A drying means for following the sealing agent applying action of the applying means and immediately irradiating the sealing agent with heat rays immediately after the application of the sealing agent, volatilizing the solvent contained in the sealing agent and drying the sealing agent. An apparatus for manufacturing a display device, comprising:
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CN111299080A (en) * 2020-03-19 2020-06-19 Tcl王牌电器(惠州)有限公司 Frame coating machine
KR20210053717A (en) * 2019-11-04 2021-05-12 (주)에스티아이 Display lamination system and display lamination method using the same
CN113289864A (en) * 2020-10-17 2021-08-24 惠州市兴日生实业有限公司 Glass dispensing device for assembling glass fish tank
CN114130613A (en) * 2021-12-06 2022-03-04 江西和兴光电有限公司 Component dispensing device for electronic components

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KR20070101618A (en) * 2006-04-11 2007-10-17 주식회사 에이디피엔지니어링 Substrate treatment apparatus
KR100786542B1 (en) 2006-08-14 2007-12-21 (주)에스티아이 Apparatus for dispensing sealant of liquid crystal display device and method for dispensing sealant using the same
JP2011079052A (en) * 2009-10-05 2011-04-21 Samsung Mobile Display Co Ltd Laser irradiation system
JP2011200760A (en) * 2010-03-24 2011-10-13 Toshiba Corp Seal application apparatus
KR101208029B1 (en) 2012-09-19 2012-12-04 (주)프랜즈시스템 Side sealing apparatus for planar display panel
KR101428557B1 (en) 2014-04-15 2014-08-12 (주)프랜즈시스템 Side sealing system for woled display module
CN105583124A (en) * 2016-03-18 2016-05-18 昆山市祥云隆精密设备有限公司 Ab glue dispensing device
KR101818597B1 (en) 2017-05-22 2018-01-15 주식회사 멀티코시 Plate molding method using photocurable material
CN107262333A (en) * 2017-08-01 2017-10-20 深圳市新益昌自动化设备有限公司 A kind of two point plastic structure of LED bonders
KR20210053717A (en) * 2019-11-04 2021-05-12 (주)에스티아이 Display lamination system and display lamination method using the same
KR102295056B1 (en) * 2019-11-04 2021-08-27 (주)에스티아이 Display lamination system and display lamination method using the same
CN111299080A (en) * 2020-03-19 2020-06-19 Tcl王牌电器(惠州)有限公司 Frame coating machine
CN113289864A (en) * 2020-10-17 2021-08-24 惠州市兴日生实业有限公司 Glass dispensing device for assembling glass fish tank
CN114130613A (en) * 2021-12-06 2022-03-04 江西和兴光电有限公司 Component dispensing device for electronic components

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