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化学処理液と不活性ガスを接触させ、化学処理液中の水分を不活性ガス中に蒸発させることを特徴とする化学処理液の濃縮方法。 A method for concentrating a chemical treatment liquid, comprising bringing a chemical treatment liquid into contact with an inert gas and evaporating water in the chemical treatment liquid into the inert gas. 化学処理液を、循環手段により化学処理液貯槽と蒸発器の間で循環させ、当該蒸発器において化学処理液と不活性ガスを接触させることを特徴とする請求項第１項記載の化学処理液の濃縮方法。 The chemical treatment liquid according to claim 1, wherein the chemical treatment liquid is circulated between the chemical treatment liquid storage tank and the evaporator by a circulation means, and the chemical treatment liquid and the inert gas are brought into contact with each other in the evaporator. Concentration method. 化学処理液と減圧ガスを接触させ、化学処理液中の水分を減圧ガス中に蒸発させることを特徴とする化学処理液の濃縮方法。 A method for concentrating a chemical treatment liquid, comprising contacting the chemical treatment liquid and a reduced pressure gas to evaporate water in the chemical treatment liquid into the reduced pressure gas. 化学処理液を、循環手段により化学処理液貯槽と蒸発器の間で循環させ、当該蒸発器において化学処理液と減圧ガスを接触させることを特徴とする請求項第３項記載の化学処理液の濃縮方法。The chemical treatment liquid, circulation means by cycled during chemical processing liquid tank and the evaporator, the chemical treatment solution of claim 3 wherein wherein contacting the vacuum gas chemical process liquid in the evaporator Concentration method. 化学処理液が、化学めっき前の触媒付与液である請求項第１項ないし第４項の何れかの項記載の化学処理液の濃縮方法。The method for concentrating a chemical treatment liquid according to any one of claims 1 to 4 , wherein the chemical treatment liquid is a catalyst application liquid before chemical plating. 化学処理液が、パラジウム、コバルト、タングステン、白金、鉄、ニッケル、銅または銀から選ばれる金属成分と、硫酸、酢酸または塩酸から選ばれる酸成分とを含有する触媒付与液である請求項第５項記載の化学処理液の濃縮方法。Chemical treatment solution, palladium, cobalt, tungsten, platinum, iron, and metal component selected from nickel, copper or silver, a claim is a catalyst application liquid containing an acid component selected from sulfuric acid, acetic acid or hydrochloric acid 5 A method for concentrating the chemical treatment liquid according to Item. 化学処理槽と供給および戻り配管により連通される化学処理液貯槽と、当該化学処理液貯槽と循環手段を介して連通され、不活性ガスを流通可能とした蒸発器および当該蒸発器からの不活性ガスを流通可能とした気液分離手段を有する化学処理液の濃縮装置。 A chemical treatment tank connected to the chemical treatment tank by a supply and return pipe, an evaporator communicated with the chemical treatment liquid storage tank via a circulation means, and an inert gas that can be circulated, and an inert gas from the evaporator An apparatus for concentrating a chemical treatment liquid having gas-liquid separation means capable of circulating gas. 化学処理槽と供給および戻り配管により連通される化学処理液貯槽と、当該化学処理液貯槽と循環手段を介して連通され、減圧ガスを流通可能とした蒸発器および当該蒸発器からの減圧ガスを流通可能とした気液分離手段を有する化学処理液の濃縮装置。 A chemical treatment liquid storage tank communicated with the chemical treatment tank by the supply and return pipes, an evaporator communicated with the chemical treatment liquid storage tank via the circulation means, and the reduced pressure gas from the evaporator, which allows the reduced pressure gas to flow. An apparatus for concentrating chemical treatment liquid having gas-liquid separation means that can be circulated.
JP2002065502A2002-03-112002-03-11Method for concentrating chemical treating liquid and device to be used therefor
PendingJP2003260301A
(en)
A method for simultaneously cleaning and annealing a metallic layer plated on a workpiece having an insulating substrate, a method for cleaning and annealing a plated workpiece, a method for altering the grain size and the texture of a metallic layer...