JP2003234020A5 - - Google Patents
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- Publication number
- JP2003234020A5 JP2003234020A5 JP2002029784A JP2002029784A JP2003234020A5 JP 2003234020 A5 JP2003234020 A5 JP 2003234020A5 JP 2002029784 A JP2002029784 A JP 2002029784A JP 2002029784 A JP2002029784 A JP 2002029784A JP 2003234020 A5 JP2003234020 A5 JP 2003234020A5
- Authority
- JP
- Japan
- Prior art keywords
- particle
- metal layer
- conductive
- average
- conductive metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Claims (3)
前記導電性金属層は、表面に前記導電性金属層の最外層と実質的に連続である高さ0.05〜4μmの微小突起を有する
ことを特徴とする導電性微粒子。Core particles, conductive metal layer formed on the surface of the core particle, and conductive fine particles comprising an insulating layer formed on the surface of the conductive metal layer, the core particle is an average The particle size is 0.5-30 μm,
The conductive metal layer has a fine projection having a height of 0.05 to 4 μm substantially continuous with the outermost layer of the conductive metal layer on a surface thereof.
D=N/[4×(r+h)2÷(2×r×h+h2)] (2)
式中、Dは突起密度係数を表し、Nは1粒子当たりの平均突起数を表し、rは導電性微粒子の平均半径を表し、hは微小突起の平均高さを表す。3. The fine protrusions have an average number of protrusions per particle of 8 or more and a protrusion density coefficient represented by the following formula (2) of 0.25 or more. Insulating coated conductive fine particles.
D = N / [4 × (r + h) 2 ÷ (2 × r × h + h 2 )] (2)
In the formula, D represents the projection density coefficient, N represents the average number of projections per particle, r represents the average radius of the conductive fine particles, and h represents the average height of the microprojections.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002029784A JP2003234020A (en) | 2002-02-06 | 2002-02-06 | Conductive minute particle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002029784A JP2003234020A (en) | 2002-02-06 | 2002-02-06 | Conductive minute particle |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003234020A JP2003234020A (en) | 2003-08-22 |
JP2003234020A5 true JP2003234020A5 (en) | 2005-08-11 |
Family
ID=27773836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002029784A Pending JP2003234020A (en) | 2002-02-06 | 2002-02-06 | Conductive minute particle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003234020A (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005317270A (en) * | 2004-04-27 | 2005-11-10 | Sekisui Chem Co Ltd | Conductive fine particulate and conductive connection structure |
JP4563110B2 (en) * | 2004-08-20 | 2010-10-13 | 積水化学工業株式会社 | Method for producing conductive fine particles |
CN100590751C (en) * | 2004-09-02 | 2010-02-17 | 积水化学工业株式会社 | Electroconductive fine particle and anisotropically electroconductive material |
JP4674096B2 (en) * | 2005-02-15 | 2011-04-20 | 積水化学工業株式会社 | Conductive fine particles and anisotropic conductive materials |
JP2006269296A (en) * | 2005-03-24 | 2006-10-05 | Sekisui Chem Co Ltd | Manufacturing method of particle with protrusions, particle with protrusions, conductive particle with protrusions, and anisotropic conductive material |
JP4772490B2 (en) * | 2005-05-20 | 2011-09-14 | 積水化学工業株式会社 | Method for producing conductive particles |
JP4589810B2 (en) * | 2005-06-07 | 2010-12-01 | 積水化学工業株式会社 | Conductive fine particles and anisotropic conductive materials |
JP4598621B2 (en) * | 2005-07-29 | 2010-12-15 | 積水化学工業株式会社 | Conductive fine particles and anisotropic conductive material |
JP4718926B2 (en) * | 2005-07-29 | 2011-07-06 | 積水化学工業株式会社 | Conductive fine particles and anisotropic conductive material |
JP2011049612A (en) * | 2006-01-16 | 2011-03-10 | Hitachi Chem Co Ltd | Method of manufacturing solar cell module |
JP2007207665A (en) * | 2006-02-03 | 2007-08-16 | Sekisui Chem Co Ltd | Manufacturing method of conductive particle, conductive particle and anisotropic conductive material |
CN101512781B (en) | 2006-08-29 | 2013-01-23 | 日立化成工业株式会社 | Conductive adhesive film and solar cell module |
KR100879578B1 (en) * | 2007-04-23 | 2009-01-22 | 한화석유화학 주식회사 | Manufacturing method of conductive electroless plating powder |
JPWO2009063827A1 (en) * | 2007-11-12 | 2011-03-31 | 日立化成工業株式会社 | Circuit connection material and circuit member connection structure |
JP5421982B2 (en) * | 2011-12-22 | 2014-02-19 | 積水化学工業株式会社 | Conductive fine particles, anisotropic conductive material, and connection structure |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1171560A (en) * | 1997-08-28 | 1999-03-16 | Ricoh Co Ltd | Anisotropically electroconductive adhesive material, and liquid crystal display and its production |
JPH1173818A (en) * | 1997-08-28 | 1999-03-16 | Ricoh Co Ltd | Conductive particle, anisotropic conductive adhesive and liquid crystal display device |
JP3379456B2 (en) * | 1998-12-25 | 2003-02-24 | ソニーケミカル株式会社 | Anisotropic conductive adhesive film |
JP3696429B2 (en) * | 1999-02-22 | 2005-09-21 | 日本化学工業株式会社 | Conductive electroless plating powder, method for producing the same, and conductive material comprising the plating powder |
-
2002
- 2002-02-06 JP JP2002029784A patent/JP2003234020A/en active Pending
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