JP2003234020A5 - - Google Patents

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Publication number
JP2003234020A5
JP2003234020A5 JP2002029784A JP2002029784A JP2003234020A5 JP 2003234020 A5 JP2003234020 A5 JP 2003234020A5 JP 2002029784 A JP2002029784 A JP 2002029784A JP 2002029784 A JP2002029784 A JP 2002029784A JP 2003234020 A5 JP2003234020 A5 JP 2003234020A5
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JP
Japan
Prior art keywords
particle
metal layer
conductive
average
conductive metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002029784A
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Japanese (ja)
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JP2003234020A (en
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Publication date
Application filed filed Critical
Priority to JP2002029784A priority Critical patent/JP2003234020A/en
Priority claimed from JP2002029784A external-priority patent/JP2003234020A/en
Publication of JP2003234020A publication Critical patent/JP2003234020A/en
Publication of JP2003234020A5 publication Critical patent/JP2003234020A5/ja
Pending legal-status Critical Current

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Claims (3)

芯材粒子、前記芯材粒子の表面に形成された導電性金属層、及び、前記導電性金属層の表面に形成された絶縁層からなる導電性微粒子であって、前記芯材粒子は、平均粒子径が0.5〜30μmであり、
前記導電性金属層は、表面に前記導電性金属層の最外層と実質的に連続である高さ0.05〜4μmの微小突起を有する
ことを特徴とする導電性微粒子。
Core particles, conductive metal layer formed on the surface of the core particle, and conductive fine particles comprising an insulating layer formed on the surface of the conductive metal layer, the core particle is an average The particle size is 0.5-30 μm,
The conductive metal layer has a fine projection having a height of 0.05 to 4 μm substantially continuous with the outermost layer of the conductive metal layer on a surface thereof.
芯材粒子は、樹脂からなることを特徴とする請求項1記載の導電性微粒子。  2. The conductive fine particle according to claim 1, wherein the core particle is made of a resin. 微小突起は、1粒子当たりの平均突起数が8以上であり、かつ、下記式(2)で表される突起密度係数が0.25以上であることを特徴とする請求項1または2記載の絶縁被覆導電性微粒子。
D=N/[4×(r+h)2÷(2×r×h+h2)] (2)
式中、Dは突起密度係数を表し、Nは1粒子当たりの平均突起数を表し、rは導電性微粒子の平均半径を表し、hは微小突起の平均高さを表す。
3. The fine protrusions have an average number of protrusions per particle of 8 or more and a protrusion density coefficient represented by the following formula (2) of 0.25 or more. Insulating coated conductive fine particles.
D = N / [4 × (r + h) 2 ÷ (2 × r × h + h 2 )] (2)
In the formula, D represents the projection density coefficient, N represents the average number of projections per particle, r represents the average radius of the conductive fine particles, and h represents the average height of the microprojections.
JP2002029784A 2002-02-06 2002-02-06 Conductive minute particle Pending JP2003234020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002029784A JP2003234020A (en) 2002-02-06 2002-02-06 Conductive minute particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002029784A JP2003234020A (en) 2002-02-06 2002-02-06 Conductive minute particle

Publications (2)

Publication Number Publication Date
JP2003234020A JP2003234020A (en) 2003-08-22
JP2003234020A5 true JP2003234020A5 (en) 2005-08-11

Family

ID=27773836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002029784A Pending JP2003234020A (en) 2002-02-06 2002-02-06 Conductive minute particle

Country Status (1)

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JP (1) JP2003234020A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005317270A (en) * 2004-04-27 2005-11-10 Sekisui Chem Co Ltd Conductive fine particulate and conductive connection structure
JP4563110B2 (en) * 2004-08-20 2010-10-13 積水化学工業株式会社 Method for producing conductive fine particles
CN100590751C (en) * 2004-09-02 2010-02-17 积水化学工业株式会社 Electroconductive fine particle and anisotropically electroconductive material
JP4674096B2 (en) * 2005-02-15 2011-04-20 積水化学工業株式会社 Conductive fine particles and anisotropic conductive materials
JP2006269296A (en) * 2005-03-24 2006-10-05 Sekisui Chem Co Ltd Manufacturing method of particle with protrusions, particle with protrusions, conductive particle with protrusions, and anisotropic conductive material
JP4772490B2 (en) * 2005-05-20 2011-09-14 積水化学工業株式会社 Method for producing conductive particles
JP4589810B2 (en) * 2005-06-07 2010-12-01 積水化学工業株式会社 Conductive fine particles and anisotropic conductive materials
JP4598621B2 (en) * 2005-07-29 2010-12-15 積水化学工業株式会社 Conductive fine particles and anisotropic conductive material
JP4718926B2 (en) * 2005-07-29 2011-07-06 積水化学工業株式会社 Conductive fine particles and anisotropic conductive material
JP2011049612A (en) * 2006-01-16 2011-03-10 Hitachi Chem Co Ltd Method of manufacturing solar cell module
JP2007207665A (en) * 2006-02-03 2007-08-16 Sekisui Chem Co Ltd Manufacturing method of conductive particle, conductive particle and anisotropic conductive material
CN101512781B (en) 2006-08-29 2013-01-23 日立化成工业株式会社 Conductive adhesive film and solar cell module
KR100879578B1 (en) * 2007-04-23 2009-01-22 한화석유화학 주식회사 Manufacturing method of conductive electroless plating powder
JPWO2009063827A1 (en) * 2007-11-12 2011-03-31 日立化成工業株式会社 Circuit connection material and circuit member connection structure
JP5421982B2 (en) * 2011-12-22 2014-02-19 積水化学工業株式会社 Conductive fine particles, anisotropic conductive material, and connection structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1171560A (en) * 1997-08-28 1999-03-16 Ricoh Co Ltd Anisotropically electroconductive adhesive material, and liquid crystal display and its production
JPH1173818A (en) * 1997-08-28 1999-03-16 Ricoh Co Ltd Conductive particle, anisotropic conductive adhesive and liquid crystal display device
JP3379456B2 (en) * 1998-12-25 2003-02-24 ソニーケミカル株式会社 Anisotropic conductive adhesive film
JP3696429B2 (en) * 1999-02-22 2005-09-21 日本化学工業株式会社 Conductive electroless plating powder, method for producing the same, and conductive material comprising the plating powder

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