JP2003183425A - Plastic substrate for microchip and method for producing the same - Google Patents
Plastic substrate for microchip and method for producing the sameInfo
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- JP2003183425A JP2003183425A JP2001382448A JP2001382448A JP2003183425A JP 2003183425 A JP2003183425 A JP 2003183425A JP 2001382448 A JP2001382448 A JP 2001382448A JP 2001382448 A JP2001382448 A JP 2001382448A JP 2003183425 A JP2003183425 A JP 2003183425A
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- JP
- Japan
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- substrate
- plastic substrate
- microchip
- oxidation treatment
- polyolefin resin
- Prior art date
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- Treatments Of Macromolecular Shaped Articles (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、マイクロチップ用
プラスチック基板及びその製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a microchip plastic substrate and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】近年、様々な遺伝子解析技術が開発さ
れ、生命機能の解明に拍車がかかっている。医療におい
て各種疾患と動的に対応する遺伝子多型のデータベース
を構築できれば、ターゲットとなる疾患関連遺伝子群の
同定が可能となり、さらにはカスタムメイド治療や新し
いドラッグデザインによる新薬の開発などを進めること
ができると考えられている。こうした中で、非常にスモ
ールスケールな抽出、反応、検出など行えるマイクロア
レイや、多数の遺伝子、あるいは多数の試料を同時に測
定できるということで、遺伝子多型解析の最有力技術と
してＤＮＡチップといったようなマイクロチップが注目
されている。2. Description of the Related Art In recent years, various gene analysis techniques have been developed, which have spurred elucidation of life functions. If a database of gene polymorphisms that dynamically respond to various diseases in medical care can be constructed, it will be possible to identify target disease-related gene groups, and further advance the development of new drugs by custom-made treatment and new drug design. It is considered possible. Under such circumstances, microarrays capable of very small-scale extraction, reaction, detection, etc., and the ability to simultaneously measure a large number of genes or a large number of samples, make microchips such as DNA chips the most powerful technique for gene polymorphism analysis. Chips are receiving attention.
【０００３】しかし、マイクロチップにはまだ多くの課
題が存在している。ＤＮＡチップには数百〜数万種類の
ＤＮＡがスポッティングで配列されており非常に高価で
あるが、比較的多く使われているスタンフォード式の基
板のスライドガラスに製造、輸送や検査で取扱う過程に
おいて落下などの衝撃が加わった場合、非常に破損しや
すい難点がある。マイクロアレイもガラスに高度な微細
加工技術を用いて精密に加工が施されており、製造コス
トが非常に高くなってしまう。However, many problems still exist in the microchip. Although hundreds to tens of thousands of kinds of DNA are arrayed by spotting on a DNA chip, it is very expensive, but in the process of manufacturing, transporting and inspecting the slide glass of Stanford type substrate which is used relatively often. If there is a shock such as a drop, it is very easy to break. The microarray is also processed precisely on the glass by using the advanced fine processing technology, and the manufacturing cost becomes very high.
【０００４】そのため、医療において広く一般的に用い
られるには、患者から試料を採取して行う遺伝子解析の
前に行なわれる種々の過程を簡便に実施出来るように現
在よりもさらに取り扱いやすく、安価な製品が望まれて
おり、この課題を解決する為に最近では、落下等の衝撃
に強く、低価格での供給が可能な基板として、シリコン
ウェハーやスライドガラスの代わりにプラスチックの成
形品を利用する試みが行なわれ始めているところであ
る。さらに基板の材質としてプラスチックを選択するこ
とにより、抽出、混合や反応を行なうことが可能な微細
加工によるマイクロリアクターの機能を付加した様々な
形状を射出成形などの方法によって量産が可能となる利
点がある。またＤＮＡチップでＤＮＡの担体として電極
や振動子が用いられている場合でも、核酸を固定するス
ペーサーとしてプラスチックが用いられる場合もある
（特開昭６３−５０１９２０号公報）。Therefore, in order to be widely and generally used in medicine, it is easier and cheaper to handle than at present so that various processes carried out before gene analysis performed by collecting a sample from a patient can be carried out easily. A product is desired, and recently, in order to solve this problem, a plastic molded product is used instead of a silicon wafer or a slide glass as a substrate that is strong against impact such as dropping and can be supplied at a low price. Attempts are beginning to be made. Furthermore, by selecting plastic as the material of the substrate, there is an advantage that various shapes that add the function of a microreactor by microfabrication that can perform extraction, mixing and reaction can be mass-produced by a method such as injection molding. is there. Further, even when an electrode or a vibrator is used as a DNA carrier in a DNA chip, a plastic may be used as a spacer for fixing nucleic acid (Japanese Patent Laid-Open No. 63-501920).
【０００５】しかし、プラスチックをマイクロアレイや
ＤＮＡチップの基板として用いる場合、基板を構成する
物質の分子構造によっては基板自体が蛍光を放つ。基板
から発せられた蛍光はノイズとなって蛍光標識が発する
蛍光シグナルと混在する。この蛍光は蛍光標識物質を用
いた検出系において検出感度を下げる大きな要因となっ
ている。However, when plastic is used as a substrate for a microarray or a DNA chip, the substrate itself emits fluorescence depending on the molecular structure of the substance constituting the substrate. The fluorescence emitted from the substrate becomes noise and is mixed with the fluorescence signal emitted by the fluorescent label. This fluorescence is a major factor in lowering detection sensitivity in a detection system using a fluorescent labeling substance.
【０００６】これらの課題を改善する方法として、極力
蛍光を放たないプラスチックとしてｎ電子やπ電子を持
たない高分子ポリマー、例えば特開２００１−２３１５
５６号公報に開示されているように環状オレフィン構造
を有する重合体単独または環状オレフィンとα−オレフ
ィンとの共重合体を水素添加した飽和重合体（以下、飽
和環状ポリオレフィン系樹脂とする）等、を基板の材料
として選択して用いることができる。これに酸化処理を
加えたて水酸基を導入した後、特開昭６０−１５５６０
号公報に開示されているようにアミノシラン化剤をコー
トしてアミノ基を導入することで、蛍光法を用いた検出
方法を行えるプラスチック製の基板を供給することがで
きる。As a method for solving these problems, a plastic polymer that does not emit fluorescence as much as possible, a high molecular polymer having no n-electrons or π-electrons, for example, JP 2001-2315 A
As disclosed in JP-A-56, a saturated polymer obtained by hydrogenating a polymer having a cyclic olefin structure alone or a copolymer of a cyclic olefin and an α-olefin (hereinafter referred to as a saturated cyclic polyolefin-based resin), etc., Can be selected and used as the material of the substrate. After adding an oxidation treatment to this to introduce a hydroxyl group, it is disclosed in JP-A-60-15560.
As disclosed in Japanese Patent Publication No. JP-A-2003-187, by coating an aminosilane agent and introducing an amino group, it is possible to supply a plastic substrate capable of performing a detection method using a fluorescence method.
【０００７】しかし、上記の方法を駆使することで蛍光
法を用いた検出方法を行えるようになったが、酸化処理
を行うことによって、ある特定の波長では石英ガラス製
の基板と比べると蛍光が強く発せられる場合があり、ま
だ十分な解決策を得るまでに達していなかった。However, although the detection method using the fluorescence method can be performed by making full use of the above-mentioned method, the oxidation treatment causes fluorescence at a certain specific wavelength as compared with a quartz glass substrate. It could be slammed hard, and we hadn't reached a sufficient solution yet.
【０００８】[0008]
【発明が解決しようとする課題】本発明の目的は、基板
に酸化処理を加えた基板のることによって増大する蛍光
を抑制したマイクロチップ用プラスチック基板を提供す
ることである。SUMMARY OF THE INVENTION An object of the present invention is to provide a plastic substrate for a microchip, in which fluorescence which is increased by the substrate obtained by subjecting the substrate to an oxidation treatment is suppressed.
【０００９】[0009]
【課題を解決するための手段】本発明者らは、これらの
課題の解決について鋭意研究を重ねた結果、酸化処理の
段階の一つとして、例えばノルボルネン樹脂の基板に酸
素ガス低温プラズマ放電処理を行ない、この処理を行っ
た直後に溶媒が水である液体に浸漬することにより、蛍
光が酸化処理を行う以前の基板とほぼ同程度であるプラ
スチック基板を製造できることを見出し、本発明を完成
するに至った。As a result of intensive studies on the solution of these problems, the inventors of the present invention have carried out oxygen gas low temperature plasma discharge treatment on a substrate of, for example, norbornene resin as one of the steps of oxidation treatment. It was found that a plastic substrate whose fluorescence is almost the same as that of the substrate before the oxidation treatment can be produced by immersing in a liquid whose solvent is water immediately after carrying out this treatment, and to complete the present invention. I arrived.
【００１０】即ち本発明は、（１）飽和環状ポリオレフ
ィン系樹脂を有するプラスチック基板であって、基板の
表面に水酸基が導入されていることを特徴とするマイク
ロチップ用プラスチック基板、（２）飽和環状ポリオレ
フィン系樹脂はノルボルネンまたはノルボルネン誘導物
の少なくとも一つがモノマー単位として含まれている
（１）記載のマイクロチップ用プラスチック基板、
（３）基板の表面を構成する分子層に存在する炭素原子
で、π結合を有する炭素原子が１５％以下である（１）
又は（２）記載のマイクロチップ用プラスチック基板。That is, the present invention provides (1) a plastic substrate having a saturated cyclic polyolefin resin, wherein a hydroxyl group is introduced into the surface of the substrate, and (2) a saturated cyclic substrate. The polyolefin resin contains at least one of norbornene or a norbornene derivative as a monomer unit (1), a plastic substrate for a microchip,
(3) 15% or less of carbon atoms having a π bond among the carbon atoms existing in the molecular layer forming the surface of the substrate (1)
Alternatively, the plastic substrate for a microchip according to (2).
【００１１】（４）水酸基を導入する方法が酸化処理で
ある（１）〜（３）記載のいずれかのマイクロチップ用
プラスチック基板、（５）酸化処理が酸素又は酸素を含
むガス雰囲気下の低温プラズマ放電処理である（４）記
載のマイクロチップ用プラスチック基板、（６）飽和環
状ポリオレフィン系樹脂を有するプラスチック基板の表
面を酸化処理した直後に、ラジカル状態あるいはπ結合
している炭素原子に水酸基を導入することを特徴とする
マイクロチップ用プラスチック基板の製造方法、（７）
水酸基をの導入する方法が水分子に接触することである
（６）記載のマイクロチップ用プラスチック基板の製造
方法である。(4) The plastic substrate for a microchip according to any one of (1) to (3), wherein the method of introducing a hydroxyl group is an oxidation treatment, and (5) the oxidation treatment is oxygen or a low temperature in a gas atmosphere containing oxygen. Immediately after the surface of the plastic substrate for a microchip according to (4), which is a plasma discharge treatment, or the plastic substrate having a saturated cyclic polyolefin-based resin (6), is oxidized, a hydroxyl group is added to a radical state or a π-bonded carbon atom. A method for producing a plastic substrate for microchips, which is characterized in that (7)
The method for producing a plastic substrate for a microchip according to (6), wherein the method of introducing the hydroxyl group is to contact with water molecules.
【００１２】[0012]
【発明の実施の形態】本発明で用いられる飽和環状ポリ
オレフィン系樹脂は、環状オレフィン構造を有する重合
体単独または環状オレフィンとα−オレフィンとの共重
合体を水素添加した飽和重合体が好ましい。前者の例と
して、例えば、一般式（１）で表されるノルボルネンの
開環重合体の水素添加物等が挙げられる。BEST MODE FOR CARRYING OUT THE INVENTION The saturated cyclic polyolefin resin used in the present invention is preferably a homopolymer having a cyclic olefin structure or a saturated polymer obtained by hydrogenating a copolymer of a cyclic olefin and an α-olefin. Examples of the former include a hydrogenated product of a norbornene ring-opening polymer represented by the general formula (1).
【００１３】[0013]
【化１】
（ただし、上記式（１）中、Ｒ1およびＲ2は水素または
炭素数１〜１０の炭化水素残基でそれぞれ同一または異
なっていても良く、また、Ｒ1およびＲ2は互いに環を形
成しても良い。）[Chemical 1] (However, in the above formula (1), R 1 and R 2 may be the same or different from each other as hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, and R 1 and R 2 form a ring with each other. You may.)
【００１４】一般式（１）で表せる構造単位を有する重
合体は、モノマーとしてノルボルネン、及びそのアルキ
ル又はアルキリデン置換体であり、具体的には、５−メ
チル−２−ノルボルネン、５，６−ジメチル−２−ノル
ボルネン、５−エチリデン−２−ノルボルネン等があ
り、これ以外にもジシクロペンタジエン、２，３−ジヒ
ドロジシクロペンタジエン、及びこれらのメチル、エチ
ル等のアルキル置換体を使用し、開環重合で得られる開
環重合体を水素添加して製造される飽和重合体がある。The polymer having a structural unit represented by the general formula (1) is norbornene as a monomer, and an alkyl or alkylidene substitution product thereof, specifically, 5-methyl-2-norbornene and 5,6-dimethyl. -2-norbornene, 5-ethylidene-2-norbornene, etc. are available. In addition to these, dicyclopentadiene, 2,3-dihydrodicyclopentadiene, and their alkyl-substituted compounds such as methyl and ethyl are used for ring-opening. There is a saturated polymer produced by hydrogenating a ring-opening polymer obtained by polymerization.
【００１５】また、一般式（２）で示される環状オレフ
ィン系モノマーの重合体、或いはエチレン、プロピレ
ン、イソプロピレン、１−ブテン、３−メチル−１−ブ
テン、１−ペンテン、１−ヘキセン等のα−オレフィン
と一般式（２）で示される環状オレフィン系モノマーの
ランダム共重合体を水素添加することにより製造される
飽和重合体を用いても良い。Further, a polymer of a cyclic olefin monomer represented by the general formula (2), ethylene, propylene, isopropylene, 1-butene, 3-methyl-1-butene, 1-pentene, 1-hexene, or the like. A saturated polymer produced by hydrogenating a random copolymer of α-olefin and the cyclic olefin-based monomer represented by the general formula (2) may be used.
【００１６】[0016]
【化２】
（ただし、上記式（２）中、Ｒ1およびＲ8は水素及びハ
ロゲン原子及び炭化水素残基よりなる群から選ばれ、Ｒ
5〜Ｒ8は互いに環を形成しても良い。）[Chemical 2] (However, in the above formula (2), R 1 and R 8 are selected from the group consisting of hydrogen, a halogen atom and a hydrocarbon residue;
5 to R 8 may form a ring with each other. )
【００１７】さらには、一般式（３）で示される環状オ
レフィン系モノマーの重合体、或いはエチレン、プロピ
レン、イソプロピレン、１−ブテン、３−メチル−１−
ブテン、１−ペンテン、１−ヘキセン等のα−オレフィ
ンと一般式（３）で示される環状オレフィン系モノマー
のランダム共重合体を水素添加することにより製造され
る飽和重合体を用いても良い。Furthermore, a polymer of a cyclic olefin-based monomer represented by the general formula (3), or ethylene, propylene, isopropylene, 1-butene, 3-methyl-1-
A saturated polymer produced by hydrogenating a random copolymer of an α-olefin such as butene, 1-pentene, 1-hexene and the cyclic olefin monomer represented by the general formula (3) may be used.
【００１８】[0018]
【化３】
（ただし、上記式（２）中、Ｒ1およびＲ12は水素及び
ハロゲン原子及び炭化水素残基よりなる群から選ばれ、
Ｒ9〜Ｒ12は互いに環を形成しても良い。）[Chemical 3] (However, in the above formula (2), R 1 and R 12 are selected from the group consisting of hydrogen, a halogen atom and a hydrocarbon residue,
R 9 to R 12 may form a ring with each other. )
【００１９】一般式（１）〜（３）記載の飽和したポリ
オレフィン系樹脂を原材料としてマイクロチップ用プラ
スチック基板を成形する上でには、基板の成形方法及び
形状には特に制限はない。成形性を考慮すると、押出成
形、圧縮成形、射出成形又は、エマルジョン成形等の方
法が好適であり、また試験方法やハンドリングを考慮
し、フィルムシート、ビーズ、スライド板等が基板の形
状として好ましい。When molding a plastic substrate for microchips using a saturated polyolefin resin represented by the general formulas (1) to (3) as a raw material, the molding method and shape of the substrate are not particularly limited. From the viewpoint of moldability, extrusion molding, compression molding, injection molding, emulsion molding and the like are preferable, and in consideration of the test method and handling, film sheet, beads, slide plate and the like are preferable as the shape of the substrate.
【００２０】次に、これら基板に物理化学的に酸化処理
を施して、基板の表面に水酸基を導入する。酸化処理の
方法には特に制限はなく、紫外線処理、コロナ放電処
理、電子線処理、低周波及び高周波低温プラズマ放電処
理、酸化反応剤を含む化学処理溶液を用いる方法等が考
えられる。この中でも簡便かつ形状に制限されないで、
酸化反応試薬の廃棄処理に問題なく、かつ水酸基の導入
密度を調節しやすい、酸素ガス雰囲気下での低温プラズ
マ放電処理が最も好ましい。Next, these substrates are subjected to physicochemical oxidation treatment to introduce hydroxyl groups into the surfaces of the substrates. The method of oxidation treatment is not particularly limited, and ultraviolet treatment, corona discharge treatment, electron beam treatment, low-frequency and high-frequency low-temperature plasma discharge treatment, a method using a chemical treatment solution containing an oxidation reaction agent, and the like can be considered. Of these, simple and not limited to shape,
The low-temperature plasma discharge treatment under an oxygen gas atmosphere is most preferable because there is no problem in the disposal treatment of the oxidation reaction reagent and the introduction density of hydroxyl groups can be easily adjusted.
【００２１】上記の方法により、基板の表面に水酸基を
導入した直後、さらにラジカル状態あるいはπ結合して
いる炭素原子に水酸基の導入を施した。この段階での水
酸基の導入方法は処理及び後処理で水分子と接触する機
会があるものが好ましく、過マンガン酸塩の希アルカリ
性水溶液、アルコール−水混合溶媒、純水などの溶液に
浸漬したり、濃硫酸に浸漬した後に純水に浸漬したり、
湿度８０〜１００％雰囲気と接触させる方法が考えられ
る。この中でも簡便かつ形状に制限されないで、廃棄処
理の問題がない純水に浸漬する方法が最も好適である。Immediately after introducing a hydroxyl group on the surface of the substrate by the above method, a hydroxyl group was introduced into a radical state or a carbon atom having a π bond. The method of introducing a hydroxyl group at this stage is preferably one that has the opportunity to come into contact with water molecules in the treatment and post-treatment, and may be immersed in a solution such as a dilute alkaline aqueous solution of permanganate, an alcohol-water mixed solvent or pure water. , Soaked in concentrated sulfuric acid and then in pure water,
A method of contacting with an atmosphere having a humidity of 80 to 100% can be considered. Among them, the method of immersing in pure water, which is simple and is not limited to the shape and has no problem of disposal, is most preferable.
【００２２】酸化処理として酸素ガス低温プラズマ放電
処理を行った場合には、基板表面の炭素原子は酸素ラジ
カルによって炭素原子のラジカル状態やπ結合が生成す
ることが予想される。他の種類の光透過率が高い樹脂で
あるポリスチレンやポリカーボネートでは元来ポリマー
の分子構造に芳香環を含むため樹脂自身の蛍光が強く、
酸化処理によって増加する蛍光のノイズとして問題にな
らなかった。When the oxygen gas low temperature plasma discharge treatment is performed as the oxidation treatment, it is expected that the carbon atoms on the surface of the substrate will form a radical state of the carbon atoms or a π bond due to the oxygen radicals. In other types of resins with high light transmittance such as polystyrene and polycarbonate, since the molecular structure of the polymer originally contains an aromatic ring, the fluorescence of the resin itself is strong,
There was no problem as fluorescence noise increased by the oxidation treatment.
【００２３】しかし、ノルボルネン樹脂のような飽和環
状ポリオレフィン系樹脂の分子構造にはπ結合が含まれ
ておらず、元々の樹脂自身の蛍光は非常に小さい。酸素
ガス低温プラズマ放電処理を施した場合、基板表面上に
存在する炭素原子の約１０〜２５％がπ結合を有し、こ
れが酸素ガス低温プラズマ放電処理により基板自体の蛍
光増加の要因になったと考えられる。However, the molecular structure of a saturated cyclic polyolefin resin such as norbornene resin does not contain a π bond, and the original fluorescence of the resin itself is very small. When the oxygen gas low temperature plasma discharge treatment was performed, about 10 to 25% of carbon atoms existing on the substrate surface had a π bond, and this was a factor for increasing the fluorescence of the substrate itself by the oxygen gas low temperature plasma discharge treatment. Conceivable.
【００２４】酸素ガス低温プラズマ放電処理による基板
自体の蛍光増加は、酸素ガス低温プラズマ放電処理直後
に純水に浸漬するだけでも、ラジカル状態の炭素原子に
水酸基を導入し、酸化処理による自己蛍光の増加を抑制
することが可能である。基板の表面を構成する分子層に
存在する炭素原子で、π結合を有する炭素原子の割合が
１５％以下であれば、自己蛍光によるノイズは測定に支
障がない。これより基板の表面を構成する分子層に存在
する炭素原子で、π結合を有する炭素原子の割合は１５
％以下が好ましく、さらに好ましいのは１０％以下であ
る。The increase in fluorescence of the substrate itself due to the oxygen gas low-temperature plasma discharge treatment is caused by introducing a hydroxyl group into a carbon atom in a radical state even if the substrate is immersed in pure water immediately after the oxygen gas low-temperature plasma discharge treatment to cause autofluorescence due to the oxidation treatment. It is possible to suppress the increase. When the ratio of carbon atoms having a π bond among the carbon atoms existing in the molecular layer constituting the surface of the substrate is 15% or less, noise due to autofluorescence does not hinder the measurement. As a result, the ratio of carbon atoms having a π bond among the carbon atoms existing in the molecular layer constituting the surface of the substrate is 15
% Or less, and more preferably 10% or less.
【００２５】また上記の処理を施すことにより、基板表
面に水酸基を多く導入でき、基板に表面処理を加える上
で反応部位が増加する効果も得られる。例えば、従来の
技術に記載した特開昭６０−１５５６０号公報に開示さ
れているようにアミノシラン化剤をコートする場合、基
板表面上に水酸基が多く存在するほどアミノシラン化剤
を多くコートすることが可能である。後述の実施例のよ
うに、飽和環状ポリオレフィン系樹脂の基板に酸素ガス
低温プラズマ放電処理を施すだけに比べて、酸素ガス低
温プラズマ放電処理直後に純水に浸漬した基板は、基板
の表面を構成する分子層に存在する水酸基が約１．５倍
多く導入できる。Further, by carrying out the above treatment, many hydroxyl groups can be introduced into the surface of the substrate, and the effect of increasing the number of reaction sites can be obtained when the surface treatment is applied to the substrate. For example, in the case of coating with an aminosilane agent as disclosed in JP-A-60-15560 described in the prior art, the aminosilane agent may be coated more as the number of hydroxyl groups on the substrate surface increases. It is possible. As in the examples described below, compared to only subjecting the saturated cyclic polyolefin resin substrate to the oxygen gas low temperature plasma discharge treatment, the substrate immersed in pure water immediately after the oxygen gas low temperature plasma discharge treatment constitutes the surface of the substrate. The number of hydroxyl groups present in the molecular layer can be increased about 1.5 times.
【００２６】[0026]
【実施例】次に本発明について実施例によりさらに詳細
に説明する。
（実施例）エチレンとノルボルネン誘導物であるジシク
ロペンタジエンのランダム共重合体の水素添加物を用い
てスライドを射出成形し、成形品Ａを得た。これを減圧
下で酸素ガスを通気しながら高周波低温プラズマを発生
させて１０分間の酸化処理をした。その直後に純水に１
０秒間浸漬処理を施した。EXAMPLES The present invention will be described in more detail with reference to examples. (Example) A slide was injection-molded using a hydrogenated product of a random copolymer of ethylene and a dicyclopentadiene which is a norbornene derivative to obtain a molded product A. This was subjected to an oxidation treatment for 10 minutes by generating a high frequency low temperature plasma while passing oxygen gas under reduced pressure. Immediately after that, add 1 to pure water
Immersion treatment was performed for 0 seconds.
【００２７】（比較例）実施例の成形品Ａを減圧下で酸
素ガスを通気しながら高周波低温プラズマを発生させて
１０分間の酸化処理を施した。(Comparative Example) The molded product A of the example was subjected to an oxidation treatment for 10 minutes by generating a high-frequency low-temperature plasma while passing oxygen gas under reduced pressure.
【００２８】［１］自己蛍光
実施例、比較例のスライドを、落射式蛍光顕微鏡（励起
光波長５３２ｎｍ、蛍光波長５６０ｎｍ）で観察した。
ＣＣＤカメラで蛍光を撮影し画像データより蛍光量を比
較評価した。評価結果を表１に示す。これより本発明の
処方を施すことによって、バックグラウンドの蛍光を抑
えられることが認められた。[1] Autofluorescence The slides of Examples and Comparative Examples were observed with an epi-illumination fluorescence microscope (excitation light wavelength 532 nm, fluorescence wavelength 560 nm).
Fluorescence was photographed with a CCD camera and the amount of fluorescence was compared and evaluated from the image data. The evaluation results are shown in Table 1. From this, it was confirmed that the background fluorescence can be suppressed by applying the formulation of the present invention.
【００２９】［２］ＥＳＣＡ分析
実施例、比較例から切り出した試験片をＥＳＣＡ（機
種：ＦＩ ＳＵＲＦＡＣＥ ＳＹＳＴＥＭＳ社製 ＥＳ
ＣＡＬＡＢ ２２０ｉ−ＸＬ、分析面積：０．６ｍｍ
φ、光電子脱出角：９０ｄｅｇ、真空度：１．５×１０
-6Ｐａ、Ｘ線原：ＡｌＫα線）により表面分析を行な
い、基板の表面を構成する分子層に存在する炭素原子の
結合状態別の割合を比較評価した。評価結果を表２に示
す。これより本発明の処方を施すことによって、水酸基
が増加し、π結合を有する炭素原子が減少することが認
められた。[2] ESCA Analysis The test pieces cut out from the examples and comparative examples were ESCA (model: ES manufactured by FI SURFACE SYSTEMS).
CALAB 220i-XL, analysis area: 0.6 mm
φ, photoelectron escape angle: 90 deg, vacuum degree: 1.5 × 10
Surface analysis was carried out by -6 Pa, X-ray source: AlKα ray) to compare and evaluate the proportion of carbon atoms existing in the molecular layer constituting the surface of the substrate for each bonding state. The evaluation results are shown in Table 2. From this, it was confirmed that by applying the formulation of the present invention, the number of hydroxyl groups was increased and the number of carbon atoms having a π bond was decreased.
【００３０】[0030]
【表１】 [Table 1]
【００３１】[0031]
【表２】 [Table 2]
【００３２】[0032]
【発明の効果】本発明の処方により、基板に酸化処理を
加えることで増大する基板自身の蛍光を抑制したマイク
ロチップ用プラスチック基板を製造することが可能であ
る。Industrial Applicability According to the formulation of the present invention, it is possible to manufacture a plastic substrate for microchips in which fluorescence of the substrate itself, which is increased by oxidizing the substrate, is suppressed.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 4F073 AA14 AA31 BA06 BB01 BB09 CA01 DA01 EA11 4J100 AR11P BA03H CA31 GC00 HA01 HA61 ─────────────────────────────────────────────────── ─── Continued front page F term (reference) 4F073 AA14 AA31 BA06 BB01 BB09 CA01 DA01 EA11 4J100 AR11P BA03H CA31 GC00 HA01 HA61
Claims (7)
プラスチック基板であって、基板の表面に水酸基が導入
されていることを特徴とするマイクロチップ用プラスチ
ック基板。1. A plastic substrate for a microchip, which is a plastic substrate having a saturated cyclic polyolefin resin, wherein a hydroxyl group is introduced into the surface of the substrate.
ルネンまたはノルボルネン誘導物の少なくとも一つがモ
ノマー単位として含まれている請求項１記載のマイクロ
チップ用プラスチック基板。2. The plastic substrate for a microchip according to claim 1, wherein the saturated cyclic polyolefin resin contains at least one of norbornene or a derivative of norbornene as a monomer unit.
炭素原子で、π結合を有する炭素原子が１５％以下であ
る請求項１又は２記載のマイクロチップ用プラスチック
基板。3. The plastic substrate for a microchip according to claim 1 or 2, wherein carbon atoms having a π bond are 15% or less among the carbon atoms existing in the molecular layer constituting the surface of the substrate.
請求項１〜３記載のいずれかのマイクロチップ用プラス
チック基板。4. The plastic substrate for a microchip according to claim 1, wherein the method of introducing a hydroxyl group is an oxidation treatment.
気下の低温プラズマ放電処理である請求項４記載のマイ
クロチップ用プラスチック基板。5. The plastic substrate for a microchip according to claim 4, wherein the oxidation treatment is a low temperature plasma discharge treatment in an atmosphere of oxygen or a gas containing oxygen.
プラスチック基板の表面を酸化処理した直後に、ラジカ
ル状態あるいはπ結合している炭素原子に水酸基を導入
することを特徴とするマイクロチップ用プラスチック基
板の製造方法。6. A method for producing a plastic substrate for a microchip, which comprises introducing a hydroxyl group into a radical or a π-bonded carbon atom immediately after the surface of a plastic substrate having a saturated cyclic polyolefin resin is oxidized. Method.
ることである請求項６記載のマイクロチップ用プラスチ
ック基板の製造方法。7. The method for producing a plastic substrate for a microchip according to claim 6, wherein the method of introducing the hydroxyl group is to contact with water molecules.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001382448A JP3960791B2 (en) | 2001-12-17 | 2001-12-17 | Plastic substrate for microchip and manufacturing method thereof |
| US10/495,743 US20050176003A1 (en) | 2001-11-27 | 2002-11-15 | Plastic substrate for microchips |
| PCT/JP2002/011938 WO2003046562A1 (en) | 2001-11-27 | 2002-11-15 | Plastic substrate for microchips |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001382448A JP3960791B2 (en) | 2001-12-17 | 2001-12-17 | Plastic substrate for microchip and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003183425A true JP2003183425A (en) | 2003-07-03 |
| JP3960791B2 JP3960791B2 (en) | 2007-08-15 |
Family
ID=27592788
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001382448A Expired - Fee Related JP3960791B2 (en) | 2001-11-27 | 2001-12-17 | Plastic substrate for microchip and manufacturing method thereof |
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| Country | Link |
|---|---|
| JP (1) | JP3960791B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006177745A (en) * | 2004-12-22 | 2006-07-06 | Sumitomo Bakelite Co Ltd | Solid-phase carrier and its use method |
| JP2006284395A (en) * | 2005-03-31 | 2006-10-19 | Univ Nagoya | Nucleic acid microarray and its manufacturing method |
| WO2007043748A1 (en) * | 2005-10-14 | 2007-04-19 | Lg Life Sciences, Ltd. | Method of manufacturing plastic substrate using plasma process and plastic substrate manufactured using the method |
| KR100729953B1 (en) | 2005-10-14 | 2007-06-20 | 주식회사 엘지생명과학 | Method for manufacturing plastics substrate by plasma process and plastics substrate manufactured using the same |
| KR100805816B1 (en) | 2006-12-04 | 2008-02-21 | 한국전자통신연구원 | Surface modification of cycloolefin copolymer substrate |
| US7349093B2 (en) | 2005-02-17 | 2008-03-25 | Matsushita Electric Industrial Co., Ltd. | Fluorescence measurement apparatus |
| JP2010241984A (en) * | 2009-04-07 | 2010-10-28 | Kyushu Univ | Method for treatment of cyclic olefin-based resin and molded product |
| JP2013535541A (en) * | 2010-07-30 | 2013-09-12 | ソニー株式会社 | Polymer compound substrate having glass-like surface, and chip made of said polymer compound substrate |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006177745A (en) * | 2004-12-22 | 2006-07-06 | Sumitomo Bakelite Co Ltd | Solid-phase carrier and its use method |
| JP4581673B2 (en) * | 2004-12-22 | 2010-11-17 | 住友ベークライト株式会社 | Solid phase carrier and method of use thereof |
| US7349093B2 (en) | 2005-02-17 | 2008-03-25 | Matsushita Electric Industrial Co., Ltd. | Fluorescence measurement apparatus |
| JP2006284395A (en) * | 2005-03-31 | 2006-10-19 | Univ Nagoya | Nucleic acid microarray and its manufacturing method |
| JP4691383B2 (en) * | 2005-03-31 | 2011-06-01 | 国立大学法人名古屋大学 | Nucleic acid microarray and manufacturing method thereof |
| WO2007043748A1 (en) * | 2005-10-14 | 2007-04-19 | Lg Life Sciences, Ltd. | Method of manufacturing plastic substrate using plasma process and plastic substrate manufactured using the method |
| KR100729953B1 (en) | 2005-10-14 | 2007-06-20 | 주식회사 엘지생명과학 | Method for manufacturing plastics substrate by plasma process and plastics substrate manufactured using the same |
| KR100805816B1 (en) | 2006-12-04 | 2008-02-21 | 한국전자통신연구원 | Surface modification of cycloolefin copolymer substrate |
| JP2010241984A (en) * | 2009-04-07 | 2010-10-28 | Kyushu Univ | Method for treatment of cyclic olefin-based resin and molded product |
| JP2013535541A (en) * | 2010-07-30 | 2013-09-12 | ソニー株式会社 | Polymer compound substrate having glass-like surface, and chip made of said polymer compound substrate |
| JP2016222913A (en) * | 2010-07-30 | 2016-12-28 | ソニー株式会社 | Polymer compound substrate having glass-like surface and chip manufactured by polymer compound substrate |
| US9586810B2 (en) | 2010-07-30 | 2017-03-07 | Sony Corporation | Polymeric substrate having an etched-glass-like surface and a microfluidic chip made of said polymeric substrate |
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