JP2003089865A - Vacuum deposition material accommodation vessel, vacuum deposition apparatus, and method for feeding deposition material to vacuum vapor deposition apparatus - Google Patents
Vacuum deposition material accommodation vessel, vacuum deposition apparatus, and method for feeding deposition material to vacuum vapor deposition apparatusInfo
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- JP2003089865A JP2003089865A JP2001282934A JP2001282934A JP2003089865A JP 2003089865 A JP2003089865 A JP 2003089865A JP 2001282934 A JP2001282934 A JP 2001282934A JP 2001282934 A JP2001282934 A JP 2001282934A JP 2003089865 A JP2003089865 A JP 2003089865A
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- vapor deposition
- deposition material
- storage container
- vacuum
- valve
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、真空蒸着に使用す
る蒸着材料で、粒状体、粉状体、フレーク状体等の固体
物質を保管する容器、及び真空蒸着装置、特に坩堝に蒸
着材料を連続的または断続的に供給可能な真空蒸着装
置、並びに真空蒸着装置への蒸着材料供給方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition material used for vacuum vapor deposition, which is a container for storing solid substances such as particles, powders, flakes and the like, and a vacuum vapor deposition apparatus, especially a crucible. The present invention relates to a vacuum vapor deposition apparatus capable of supplying continuously or intermittently, and a vapor deposition material supply method to the vacuum vapor deposition apparatus.
【０００２】[0002]
【従来の技術】一般的な真空蒸着装置を大きく分類する
と、蒸着材料、基板、坩堝、蒸着材料の加熱機構、蒸発
室、シャッター、排気機構及び蒸着膜質に関連する補助
機構によって構成される。蒸着材料は、坩堝に充填され
た状態で、蒸発するまで加熱される材料であり、基板は
蒸発した材料が付着する部分であり、坩堝は蒸着材料を
充填する部分であり、加熱機構は坩堝に充填された材料
を蒸発可能な温度まで上昇させる機構であり、蒸発室は
蒸着材料が基板まで到達する空間であり、シャッターは
加熱によって蒸発する物質を基板まで一時的に到達しな
いように遮断する機構であり、排気機構は蒸発室から空
気などを抜き取り真空を実現する機構であり、補助機構
とは、例えば蒸着材料や不活性ガスをイオン化して運動
エネルギーやチャージの効果を求めるために利用するイ
オン銃などである。2. Description of the Related Art A general vacuum vapor deposition apparatus is roughly classified into a vapor deposition material, a substrate, a crucible, a vapor deposition material heating mechanism, an evaporation chamber, a shutter, an exhaust mechanism, and an auxiliary mechanism relating to the vapor deposition film quality. The vapor deposition material is a material that is heated until it evaporates in a state where it is filled in the crucible, the substrate is the portion to which the vaporized material is attached, the crucible is the portion that is filled with the vapor deposition material, and the heating mechanism is in the crucible. It is a mechanism that raises the temperature of the filled material to a temperature that allows evaporation, the evaporation chamber is the space where the evaporation material reaches the substrate, and the shutter is a mechanism that shuts off the substance that evaporates by heating so that it does not reach the substrate temporarily. The exhaust mechanism is a mechanism for extracting air from the evaporation chamber to realize a vacuum, and the auxiliary mechanism is, for example, an ion used to ionize a vapor deposition material or an inert gas to obtain the kinetic energy and the effect of charge. Such as a gun.
【０００３】上記真空蒸着装置の操作は、まず、蒸着材
料を坩堝に充填することから始まるが、蒸発室が開放さ
れていないと充填ができないから、充填は大気中で実行
される。蒸着材料の状態は粒体状また粉体状またはフレ
ーク状の固体であるが、大気中で坩堝に充填されるため
に、蒸着材料の集合の中には空気が含まれる。また、蒸
着材料表面には水蒸気や水酸基などが付着し、必ずしも
１００％の純度とは限らない。The operation of the above vacuum vapor deposition apparatus starts with filling the vapor deposition material into the crucible, but since the filling cannot be done unless the evaporation chamber is opened, the filling is carried out in the atmosphere. The state of the vapor deposition material is solid in the form of particles, powder, or flakes, but since the crucible is filled in the atmosphere, air is included in the set of vapor deposition materials. Further, water vapor and hydroxyl groups are attached to the surface of the vapor deposition material, and the purity is not always 100%.
【０００４】蒸着材料が坩堝に充填されると蒸発室は密
閉され、排気機構が作動し蒸発室は所定の気圧まで排気
され、いわゆる真空状態になる。続いて加熱機構が働
き、蒸着のための蒸着材料の蒸発が始まる。しかし蒸発
室が真空状態になっても、蒸着材料の集合が抱いている
空気や不純物の気体は加熱前に十分に抜け切ることはな
いから、最初にシャッターを閉じた状態で残存空気や気
化不純物をある程度抜き、次にシャッターを開いて基板
への蒸着材料の蒸着を開始する。When the crucible is filled with the vapor deposition material, the evaporation chamber is hermetically closed, the evacuation mechanism is activated, and the evaporation chamber is evacuated to a predetermined atmospheric pressure to be in a so-called vacuum state. Then, the heating mechanism works to start vaporization of the vapor deposition material for vapor deposition. However, even if the evaporation chamber is in a vacuum state, the air and impurities contained in the vapor deposition material will not fully escape before heating.Therefore, the residual air and vaporized impurities with the shutter closed first To some extent, and then the shutter is opened to start vapor deposition of the vapor deposition material on the substrate.
【０００５】しかし、この方法では、加熱開始直後のあ
る時間が無駄なものとなり、また蒸着材料の集合が抱い
ている空気や不純物は上層部近くでは取り除かれるが、
集合の下層部に存在するものは、シャッターを開いた後
に蒸発物質とともに基板に到達し、蒸着物のパッキング
密度を悪くしたり、不純物を含んだまま蒸着される。イ
オン銃などの補助機構は、高いパッキング密度や物性制
御を目指しているが、不純物に対しては必ずしも有効で
はない。However, in this method, a certain time immediately after the start of heating is wasted, and the air and impurities carried by the set of vapor deposition materials are removed near the upper layer,
Those existing in the lower layer of the assembly reach the substrate together with the vaporized substance after the shutter is opened, which deteriorates the packing density of the vapor deposition and is vapor deposited while containing impurities. Auxiliary mechanisms such as ion guns aim at high packing density and physical property control, but are not always effective against impurities.
【０００６】また、蒸着膜の膜厚を上げる場合や連続す
る基板に蒸着膜を形成するいわゆる連続蒸着などでは、
一度に多量の蒸着材料が必要となるが、坩堝に貯留でき
る量には限界があるため、蒸発室の外部より、坩堝に蒸
着材料を連続的または断続的に供給可能な真空蒸着装置
として、特開平６−２８００１６号公報所載のものが提
供されている。該真空蒸着装置においては、蒸発室の外
部に蒸着材料を貯留するホッパーを備え、蒸発室の真空
状態を維持したまま、振動フィーダーなどの手段にて蒸
着材料を坩堝に供給可能としている。Further, in the case of increasing the thickness of the vapor deposition film or in the so-called continuous vapor deposition in which the vapor deposition film is formed on a continuous substrate,
A large amount of vapor deposition material is required at one time, but there is a limit to the amount that can be stored in the crucible.Therefore, as a vacuum vapor deposition device that can supply vapor deposition material to the crucible continuously or intermittently from the outside of the evaporation chamber, The one disclosed in Kaihei 6-280016 is provided. In the vacuum vapor deposition apparatus, a hopper for storing the vapor deposition material is provided outside the vaporization chamber, and the vapor deposition material can be supplied to the crucible by means such as a vibrating feeder while maintaining the vacuum state of the vaporization chamber.
【０００７】しかしながら、前記真空蒸着装置において
も、蒸着材料が貯留されているホッパー内は空気と接触
状態であるため、坩堝に供給される段階では蒸着材料は
空気や不純物を含んでいる。However, even in the above vacuum vapor deposition apparatus, since the inside of the hopper in which the vapor deposition material is stored is in contact with air, the vapor deposition material contains air and impurities when it is supplied to the crucible.
【０００８】よって、上記従来の真空蒸着装置にて基板
表面に得られた蒸着膜は、いずれも空気や不純物が混入
する恐れが多いため、例えば蒸着膜の位置によって電気
抵抗値が変化したり、摩擦抵抗値に差が生じるなどの問
題があり、真空蒸着を基礎とした応用技術の近年の進歩
を妨げる大きな原因の一つになっている。Therefore, since the vapor deposition film obtained on the surface of the substrate by the above conventional vacuum vapor deposition apparatus is likely to be mixed with air and impurities, the electric resistance value may change depending on the position of the vapor deposition film, for example. There is a problem such as a difference in frictional resistance value, which is one of the major causes of the recent progress in the applied technology based on vacuum deposition.
【０００９】[0009]
【発明が解決しようとする課題】そこで本発明は、真空
蒸着において基板表面に良質な蒸着膜を得るために成さ
れたもので、坩堝に充填する蒸着材料中の空気や不純物
を除去する（脱気する）とともに、真空蒸発装置の蒸発
室の真空を維持した状態で、前記脱気された蒸着材料を
蒸発室内に備えられた坩堝に供給可能な真空蒸着用蒸着
材料容器及び真空蒸着装置、並びに蒸着材料供給方法を
提供することを課題とする。Therefore, the present invention has been made in order to obtain a good quality vapor deposition film on the surface of a substrate in vacuum vapor deposition, and removes air and impurities in the vapor deposition material with which the crucible is filled. And a vacuum evaporation apparatus capable of supplying the degassed evaporation material to a crucible provided in the evaporation chamber while maintaining the vacuum in the evaporation chamber of the vacuum evaporation apparatus, and a vacuum evaporation apparatus, An object is to provide a vapor deposition material supply method.
【００１０】[0010]
【課題を解決するための手段】本発明者らは、鋭意研究
した結果、下記の手段により前記課題が解決されること
を見出した。As a result of intensive studies, the present inventors have found that the above-mentioned problems can be solved by the following means.
【００１１】すなわち、従来の技術の項で説明したとお
り、坩堝に蒸着材料を充填する場合、蒸発室を一旦開放
して大気中でこれを行っているので、蒸着材料への空気
の混じり込みを防止することはできない。しかし、蒸発
室の真空状態を維持して坩堝に蒸着材料を充填すること
が可能になるならば、蒸着材料への空気や水蒸気成分な
どの不純物の混じり込みを防止することができる。その
ためには、坩堝とは別の位置に蒸着材料を置き、さらに
当該位置から坩堝へ蒸着材料の送り込み経路を設け、こ
れら各々を大気に露出しない状態、すなわち真空の蒸発
室内にこれら各々を配置しておけば良い。毎分当りに蒸
着材料が１個の坩堝から蒸発する物質の量は極めて僅か
である。従って坩堝とは別の位置にある蒸着材料が毎分
当りに坩堝に送り込まれる量も僅かである。よって坩堝
とは別の位置におかれた蒸着材料が、坩堝に僅かずつ移
動する過程は真空状態であるから、移動する、即ち運動
している過程で蒸着材料に混じり込んだ空気を脱気する
ことが可能であり、このほうが坩堝に充填した後の、即
ち静止状態の蒸着材料から脱気するよりも、より完全に
脱気できる。That is, as described in the section of the prior art, when the crucible is filled with the vapor deposition material, since the evaporation chamber is once opened and this is performed in the atmosphere, air is not mixed into the vapor deposition material. It cannot be prevented. However, if it is possible to fill the evaporation material in the crucible while maintaining the vacuum state of the evaporation chamber, it is possible to prevent impurities such as air and water vapor components from being mixed into the evaporation material. For that purpose, the vapor deposition material is placed at a position different from that of the crucible, and a route for feeding the vapor deposition material from that position to the crucible is further provided. You can leave it. The amount of the vaporized material evaporated from one crucible per minute is extremely small. Therefore, the amount of vapor deposition material located at a position different from that of the crucible is fed into the crucible per minute. Therefore, the vapor deposition material placed at a position different from the crucible is in a vacuum state when it is moved to the crucible little by little, so the air mixed with the vapor deposition material is degassed during the movement, that is, the movement. It is possible that this allows more complete degassing than degassing the vapor deposition material after filling the crucible, i.e. at rest.
【００１２】ここで、本発明の容器を坩堝とは別の位置
に置く蒸着材料の収納容器として用い、且つ真空蒸着装
置に該収納容器を接続可能な蒸着材料供給部を設けるこ
とにより、蒸発室（真空部）に収納容器内及び蒸着材料
の集合が抱き込んだ空気等の気体物質の移動を防止可能
になり、より良い蒸着膜を得ることができる。さらにそ
ればかりでなく、当該収納容器を蒸発室の外部に配置
し、長時間の連続した蒸着材料供給を実現することがで
きる。Here, the container according to the present invention is used as a container for depositing a vapor deposition material placed at a position different from that of the crucible, and the vapor deposition chamber is provided with a vapor deposition material supply section to which the container can be connected. It is possible to prevent the movement of a gaseous substance such as air that is contained in the storage container and the collection of the vapor deposition material in the (vacuum part), and a better vapor deposition film can be obtained. Further, not only that, the storage container can be arranged outside the evaporation chamber, and continuous vapor deposition material supply for a long time can be realized.
【００１３】そこで、請求項１の発明では、固体状の真
空蒸着用蒸着材料を収納する容器であって、容器内およ
び収納される蒸着材料から空気等の気体を抜き取るため
の脱気口及び脱気経路と、脱気経路を開閉する脱気用弁
と、蒸着材料を容器内に充填するための充填口及び充填
経路と、充填経路を開閉する充填用弁と、容器内に充填
された蒸着材料を真空蒸着装置の蒸発室内の坩堝に供給
するための供給口及び供給経路と、供給経路を開閉する
供給用弁とを有し、該収納容器の充填口は別設の一時保
管容器を接続可能に構成する。In view of the above, according to the first aspect of the present invention, there is provided a container for accommodating a solid vapor deposition material for vacuum vapor deposition, comprising a degassing port and a degassing port for extracting gas such as air from the vapor deposition material contained in the container. An air path, a degassing valve for opening and closing the degassing path, a filling port and a filling path for filling the vapor deposition material into the container, a filling valve for opening and closing the filling path, and a vapor deposition filled in the container. It has a supply port and a supply path for supplying the material to the crucible in the evaporation chamber of the vacuum evaporation apparatus, and a supply valve for opening and closing the supply path, and the filling port of the storage container is connected to a separate temporary storage container. Configure as possible.
【００１４】かかる請求項１の発明によれば、例えば脱
気口に真空ポンプを接続して収納容器内を脱気するとと
もに、蒸着材料供給部に接続した密閉状態を維持可能な
一時保管容器より蒸着材料を徐々に収納容器に移し変え
ることにより、蒸着材料の粒子を分散させ、蒸着材料の
間隙に含有する不純気体も脱気することが可能である。
そして、脱気された蒸着材料は、供給口から真空蒸着装
置の蒸発室内に配置された坩堝に真空を維持した状態で
供給される。また、収納容器を脱気した後に脱気用開閉
弁及び材料用開閉弁を閉じることにより、真空状態を維
持しつつ、蒸着材料を保管または移動できる。According to the first aspect of the present invention, for example, a vacuum pump is connected to the degassing port to degas the inside of the storage container, and a temporary storage container connected to the vapor deposition material supply section capable of maintaining a closed state is used. By gradually moving the vapor deposition material to the storage container, it is possible to disperse the particles of the vapor deposition material and degas the impure gas contained in the gap between the vapor deposition materials.
Then, the degassed vapor deposition material is supplied from the supply port to the crucible arranged in the evaporation chamber of the vacuum vapor deposition apparatus while maintaining the vacuum. Further, by closing the deaeration on-off valve and the material on-off valve after deaeration of the storage container, the vapor deposition material can be stored or moved while maintaining the vacuum state.
【００１５】さらに、請求項２の発明は、請求項１の収
納容器において、脱気口、脱気経路及び脱気用弁が、供
給口、供給経路及び供給用弁を兼ねるよう構成するもの
である。Further, the invention according to claim 2 is such that, in the storage container according to claim 1, the deaeration port, the deaeration path and the deaeration valve also serve as a supply port, a supply path and a supply valve. is there.
【００１６】かかる請求項２の発明によれば、収納容器
の構造が簡素化され、コスト削減にもつながる。According to the invention of claim 2, the structure of the storage container is simplified and the cost is reduced.
【００１７】請求項３の発明においては、請求項１また
は２の収納容器において、充填口、充填経路及び充填用
弁が、供給口、供給経路及び供給用弁を兼ねるよう構成
する。According to a third aspect of the present invention, in the storage container according to the first or second aspect, the filling port, the filling path and the filling valve also serve as the supply port, the supply path and the feeding valve.
【００１８】かかる請求項３の発明によれば、上記請求
項２と同様の効果が得られる。According to the invention of claim 3, the same effect as that of claim 2 can be obtained.
【００１９】また、請求項４の発明は、請求項１乃至３
いずれかの収納容器において、外部からの加熱によって
蒸着材料中に含まれる不純気体を脱気し、且つ脱気状態
で保存すべく構成するものである。The invention of claim 4 is the same as claims 1 to 3.
In any one of the storage containers, the impure gas contained in the vapor deposition material is degassed by heating from the outside and is stored in the degassed state.
【００２０】かかる請求項４の発明によれば、蒸着材料
を一時保管容器より収納容器に移し変える際に、蒸着材
料が気化しない温度にて収納容器を外部から加熱するこ
とにより、蒸着材料の集合の間隙に存在する不純物質だ
けが気化するため、不純物質の除去率が向上する。According to the fourth aspect of the present invention, when the vapor deposition material is transferred from the temporary storage container to the storage container, the storage container is heated from the outside at a temperature at which the vapor deposition material is not vaporized, so that the vapor deposition material is collected. Since only the impurities present in the gap are vaporized, the removal rate of impurities is improved.
【００２１】請求項５の発明は、請求項１乃至４いずれ
かの収納容器において、内部の状態を目視すべく、収納
容器の全体または一部が透明であるよう構成するもので
ある。According to a fifth aspect of the present invention, in the storage container according to any one of the first to fourth aspects, the whole or a part of the storage container is transparent so that the internal state can be visually checked.
【００２２】かかる請求項５の発明によれば、蒸着材料
を一時保管容器より収納容器へ移し変える際に、蒸着材
料の投入量の不足または過多を防止できるとともに、収
納容器より蒸着材料を真空蒸着装置の蒸発室内に設けた
坩堝に供給する際は、収納容器内の蒸着材料の残量を確
認することも可能になる。According to the fifth aspect of the present invention, when the vapor deposition material is transferred from the temporary storage container to the storage container, it is possible to prevent a shortage or excessive supply of the vapor deposition material, and to vacuum deposit the vapor deposition material from the storage container. When supplying to the crucible provided in the evaporation chamber of the apparatus, it becomes possible to confirm the remaining amount of the vapor deposition material in the storage container.
【００２３】また、請求項６の発明では、真空蒸着装置
の蒸発室の真空を維持した状態で蒸着材料を蒸発室内の
坩堝に供給可能な真空蒸着装置において、脱気した蒸着
材料が充填された収納容器を接続する蒸着材料供給部
と、蒸発室と外気とを遮断するために該蒸着材料供給部
に設けた真空維持弁と、蒸着材料供給部と蒸発室内の坩
堝を連通する導通経路を備えるよう構成する。Further, in the invention of claim 6, in the vacuum vapor deposition apparatus capable of supplying the vapor deposition material to the crucible in the vaporization chamber while maintaining the vacuum of the vaporization chamber of the vacuum vapor deposition apparatus, the degassed vapor deposition material is filled. A vapor deposition material supply unit that connects the storage container, a vacuum maintenance valve provided in the vapor deposition material supply unit to shut off the evaporation chamber from the outside air, and a conduction path that connects the vapor deposition material supply unit and the crucible in the evaporation chamber Configure as follows.
【００２４】かかる請求項６の発明によれば、真空蒸着
装置の蒸着材料供給部に蒸着材料が充填された収納容器
を接続することにより、蒸着材料を空気に接触させる
（空気中の水蒸気成分や塵埃等の不純物が混入する）こ
となく、しかも蒸発室の真空状態を維持して、坩堝に蒸
着材料を供給できる。また、真空維持弁を設けることに
より、蒸着材料供給部になにも接続されていない時は、
真空維持弁を閉止すれば、蒸発室の真空状態は維持され
る。According to the sixth aspect of the present invention, the vapor deposition material is brought into contact with air by connecting the vapor deposition material supply unit of the vacuum vapor deposition apparatus to the storage container filled with the vapor deposition material (the vapor component in the air or It is possible to supply the vapor deposition material to the crucible while maintaining the vacuum state of the evaporation chamber without mixing impurities such as dust). Also, by providing a vacuum maintenance valve, when nothing is connected to the vapor deposition material supply section,
The vacuum state of the evaporation chamber is maintained by closing the vacuum maintenance valve.
【００２５】さらに、請求項７の発明では、脱気された
状態で蒸着材料が充填された収納容器を、真空蒸着装置
の蒸発室内に設けた坩堝に連通する蒸着材料供給部に接
続し、蒸発室の真空を維持した状態で、蒸着材料を坩堝
に供給することを特徴とする蒸着材料供給方法である。Further, in the invention of claim 7, the storage container filled with the vapor deposition material in a degassed state is connected to a vapor deposition material supply section which communicates with a crucible provided in the vaporization chamber of the vacuum vapor deposition apparatus, and vaporizes. The vapor deposition material supply method is characterized in that the vapor deposition material is supplied to the crucible while the vacuum of the chamber is maintained.
【００２６】かかる請求項７の発明によれば、基板を蒸
発室に配置し、蒸発室を脱気した後の作業は、すべて真
空中で行われ、また、坩堝に供給される蒸着材料も脱気
されているため、蒸着膜への空気や不純物の混入が、ほ
とんど無く、上質な蒸着膜が取得される。According to the seventh aspect of the present invention, the work after placing the substrate in the evaporation chamber and degassing the evaporation chamber is all performed in a vacuum, and the vapor deposition material supplied to the crucible is also removed. Since the vaporized film is vaporized, almost no air or impurities are mixed into the vapor-deposited film, and a high-quality vapor-deposited film is obtained.
【００２７】[0027]
【発明の実施の形態】以下、本発明の第一実施形態につ
いて、添付の図に従って詳細を説明する。図１は、本発
明の第一実施形態にかかる収納容器Ａaを示す。容器部
１は坩堝に充填するに必要な量の蒸着材料１１を収納・
保管する部分であり、また外部加熱を施す部分でもあっ
て、耐熱材料で形成されている。容器部１の上方部には
３箇所の開口部、即ち脱気口２、充填口５及び供給口８
が設けられ、各々脱気経路３、充填経路６及び供給経路
９を介し容器部１に連通している。また、脱気用弁４、
充填用弁７及び供給用弁１０は、各々前記脱気経路３、
充填経路６及び供給経路９を開閉自在に設けられた開閉
弁であり、３箇所の開閉弁（脱気用弁４、充填用弁７及
び供給用弁１０）を閉じている限り、収納容器Ａａ内に
収納された蒸着材料１１は外界から遮断されている。BEST MODE FOR CARRYING OUT THE INVENTION The first embodiment of the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 shows a storage container Aa according to the first embodiment of the present invention. The container portion 1 stores the vapor deposition material 11 in an amount necessary for filling the crucible.
It is a part to be stored and also a part to be subjected to external heating, and is made of a heat resistant material. There are three openings in the upper part of the container 1, that is, the degassing port 2, the filling port 5 and the supply port 8.
Are provided and communicate with the container unit 1 via the degassing path 3, the filling path 6 and the supply path 9, respectively. In addition, the degassing valve 4,
The filling valve 7 and the supply valve 10 are respectively connected to the degassing path 3,
It is an open / close valve that can open and close the filling path 6 and the supply path 9, and as long as the three opening / closing valves (the deaeration valve 4, the filling valve 7, and the supply valve 10) are closed, the storage container Aa. The vapor deposition material 11 housed inside is shielded from the outside world.
【００２８】脱気口２は、別置きの真空ポンプ（図示省
略）等を接続し、容器部１内から空気や不純気体を抜き
取る部分であり、真空ポンプ等と接続可能な、例えばネ
ジ構造などの接続手段を備えている。充填口５は、後述
する別に用意された一時保管容器Ｂ（図２）から蒸着材
料１１を徐々に移し変える部分であり、一時保管容器Ｂ
と接続可能な接続手段を備えている。また、供給口８
は、真空蒸着装置１５（図３）に接続し、容器部１内の
蒸着材料１１を真空蒸着装置１５の蒸発室１６内に具備
した坩堝に供給する部分であり、上記同様、真空蒸着装
置１５と接続可能な接続手段を備えて構成している。The degassing port 2 is a part to which a vacuum pump (not shown) or the like, which is separately installed, is connected to extract air or impure gas from the container portion 1. It is equipped with a connecting means. The filling port 5 is a portion where the vapor deposition material 11 is gradually transferred from a separately prepared temporary storage container B (FIG. 2) described later.
It is provided with a connecting means that can be connected to. Also, the supply port 8
Is a portion which is connected to the vacuum vapor deposition apparatus 15 (FIG. 3) and supplies the vapor deposition material 11 in the container unit 1 to a crucible provided in the evaporation chamber 16 of the vacuum vapor deposition apparatus 15. It is configured by including a connecting means that can be connected to.
【００２９】次に図２に示す一時保管容器Ｂは、蒸着材
料１１を含気状態で収納するための容器であって、容器
本体１７はガラスや金属などの材質で作られ、外気が通
過しない構造である。また一時保管容器Ｂは、蒸着材料
１１の充填口であって且つ収納容器Ａに接続して蒸着材
料１１を収納容器Ａに移し変える開放口１８を除き、開
放部分を持たない。該開放口１８には封止弁１９が設け
られており、一時保管容器Ｂを転倒させても容器本体１
７に貯留された蒸着材料１１が漏出しない構造になって
いる。また、開放口１８にも収納容器Ａａの充填口５と
密封状態で接続可能な接続手段が設けられていることは
言うまでもない。更に、必要により該開放口１８に真空
ポンプを接続して内部の空気を粗引きすることも可能
で、この場合、封止弁１９は外気を遮断する。Next, the temporary storage container B shown in FIG. 2 is a container for storing the vapor deposition material 11 in an air-containing state, and the container body 17 is made of a material such as glass or metal, and the outside air does not pass through. It is a structure. Further, the temporary storage container B does not have an open portion except the opening 18 which is a filling port for the vapor deposition material 11 and which is connected to the storage container A and transfers the vapor deposition material 11 to the storage container A. A sealing valve 19 is provided at the opening 18 so that the container body 1 can be operated even if the temporary storage container B is turned over.
The structure is such that the vapor deposition material 11 stored in 7 does not leak. Further, it goes without saying that the opening port 18 is also provided with a connecting means capable of connecting to the filling port 5 of the storage container Aa in a sealed state. Further, if necessary, a vacuum pump can be connected to the opening 18 to roughly draw the air inside, and in this case, the sealing valve 19 shuts off the outside air.
【００３０】脱気操作は次の手順で行われる。大気中
で、一時保管容器Ｂに蒸着材料１１を十分充填する。次
に、収納容器Ａａの充填口５に、全ての弁を閉じた状態
で、蒸着材料１１を収納した一時保管容器Ｂを接続す
る。この場合、蒸着材料１１は重力落下することを前提
としているが、粉体のようにブロックを形成しやすく、
流れの悪いものには振動移動を採用しても良い。The degassing operation is performed in the following procedure. In the air, the temporary storage container B is sufficiently filled with the vapor deposition material 11. Next, the temporary storage container B containing the vapor deposition material 11 is connected to the filling port 5 of the storage container Aa with all the valves closed. In this case, the vapor deposition material 11 is assumed to fall by gravity, but it is easy to form a block like powder,
Vibration movement may be adopted for a material having a poor flow.
【００３１】次に収納容器Ａａの脱気口２に真空ポンプ
を接続し、脱気用弁４を開いて、脱気を開始する。次に
充填用弁５及び封止弁１９を開く。すると一時保管容器
Ｂから収納容器Ａａに徐々に蒸着材料１１が移し変えな
がら、脱気が実行される。この時、充填用弁５または封
止弁１９の開口量を調節することにより、収納容器Ａａ
への蒸着材料１１の投入量を調整することもできる。収
納容器Ａａを外部から加熱しながら移し変えれば、蒸着
材料１１が抱いている不純物質も気化して、同時に脱気
される。移し変えが所定の量まで達したら、充填用弁５
及び封止弁１９を閉じ、脱気用弁４も閉じる。収納容器
Ａａの全体または一部が透明ならば、移し変えの量や状
態を目視できる。Next, a vacuum pump is connected to the degassing port 2 of the storage container Aa and the degassing valve 4 is opened to start degassing. Next, the filling valve 5 and the sealing valve 19 are opened. Then, while the vapor deposition material 11 is gradually transferred from the temporary storage container B to the storage container Aa, deaeration is performed. At this time, the storage container Aa is adjusted by adjusting the opening amount of the filling valve 5 or the sealing valve 19.
It is also possible to adjust the amount of the vapor deposition material 11 to be charged. If the storage container Aa is transferred while being heated from the outside, the impurities contained in the vapor deposition material 11 are also vaporized and simultaneously degassed. When the transfer reaches a predetermined amount, the filling valve 5
Also, the sealing valve 19 is closed, and the degassing valve 4 is also closed. If the whole or part of the storage container Aa is transparent, the amount and state of transfer can be visually checked.
【００３２】以上の一連の手順によって、収納容器Ａａ
には脱気された状態の蒸着材料１１が収納された状態に
なる。次に、図３に示すように、収納容器Ａａの供給口
８を真空蒸着装置１５の蒸発室１６の外部（つまり、真
空蒸着装置１５の外周部等の大気雰囲気の部位であっ
て、容易に手が届き、且つ収納容器Ａａを着脱可能な部
位）に設けられた蒸着材料供給部１２に接続する。蒸着
材料１１は、該供給口８より蒸着材料供給部１２に接続
された導通経路１４を介して蒸発室１６内の坩堝（図示
省略）に供給される。また、真空蒸着装置１５の蒸着材
料供給部１２には真空維持弁１３が備えられており、蒸
着材料１１を投入しない時は完全に閉じられている。ま
たこの真空維持弁１３または脱気用弁４は、蒸着材料１
１の坩堝への供給量を調節するための投入量調整弁を兼
ねることができる。この場合の投入も、重力落下を前提
とするが、粉体のようにブロックを形成しやすく、流れ
の悪いものには振動搬送を採用しても良い。By the above series of procedures, the storage container Aa
In this state, the vapor deposition material 11 in a degassed state is stored. Next, as shown in FIG. 3, the supply port 8 of the storage container Aa is easily connected to the outside of the evaporation chamber 16 of the vacuum vapor deposition device 15 (that is, a portion of the atmospheric atmosphere such as the outer peripheral portion of the vacuum vapor deposition device 15). It is connected to the vapor deposition material supply unit 12 which is accessible and where the storage container Aa is detachable. The vapor deposition material 11 is supplied from the supply port 8 to a crucible (not shown) in the evaporation chamber 16 via a conduction path 14 connected to the vapor deposition material supply unit 12. Further, the vapor deposition material supply unit 12 of the vacuum vapor deposition apparatus 15 is provided with a vacuum maintenance valve 13, which is completely closed when the vapor deposition material 11 is not charged. The vacuum maintaining valve 13 or the degassing valve 4 is used for the vapor deposition material 1
It can also serve as an input amount adjusting valve for adjusting the supply amount of No. 1 to the crucible. The charging in this case is also premised on gravitational fall, but it is also possible to employ vibration transfer for those that easily form blocks such as powder and have a poor flow.
【００３３】なお、本発明に係る収納容器Ａａは、前記
第一実施形態に限定されるものではなく、本発明の要旨
を逸脱しない範囲にて種々の変更が可能である。例え
ば、充填口５、供給口８、脱気口２、開放口１８、及び
蒸着材料供給部１２に設けられた接続手段は、ワンタッ
チプラグ（エアホースジョイント、ガスホースジョイン
トなどに類するもの）などであってもよい。つまり、着
脱自在な接続手段であればよい。ワンタッチプラグなど
の場合は、雌プラグを収納容器Ａａ側、つまり脱気口
２、充填口５及び供給口８に採用する方が好ましい。な
ぜなら、ワンタッチプラグの雌プラグ側は、雄プラグを
接続していない時は、自動的にプラグ口は閉止される構
造となっているため、密閉が必要な収納容器Ａａに設け
る方がよいからである。The storage container Aa according to the present invention is not limited to the first embodiment, and various modifications can be made without departing from the gist of the present invention. For example, the connection means provided in the filling port 5, the supply port 8, the degassing port 2, the opening port 18, and the vapor deposition material supply unit 12 are one-touch plugs (similar to an air hose joint, a gas hose joint, etc.), etc. Good. That is, any connecting means that can be attached and detached may be used. In the case of a one-touch plug or the like, it is preferable to employ a female plug on the side of the storage container Aa, that is, the degassing port 2, the filling port 5 and the supply port 8. This is because the female plug side of the one-touch plug has a structure in which the plug port is automatically closed when the male plug is not connected, so it is better to install it in the storage container Aa that needs to be sealed. is there.
【００３４】また、収納容器Ａａにおいて、供給口８、
供給経路９及び供給用弁１０は、容器部１の上方側に設
けているが、容器部１の下方側でもよい。Further, in the storage container Aa, the supply port 8,
The supply path 9 and the supply valve 10 are provided on the upper side of the container unit 1, but may be on the lower side of the container unit 1.
【００３５】さらに、一時保管容器Ｂに設けられた封止
弁１９は無くてもよい。この場合、収納容器Ａａに蒸着
材料１１の移し変えを行う際は、充填用弁７の開口量を
調節することにより、蒸着材料１１の移し変え量を調整
すればよいし、また、収納容器Ａａが転倒した際の蒸着
材料１１の漏出防止手段として、開放口１８に蓋等を設
けてもよい。Further, the sealing valve 19 provided in the temporary storage container B may be omitted. In this case, when the vapor deposition material 11 is transferred to the storage container Aa, the transfer amount of the vapor deposition material 11 may be adjusted by adjusting the opening amount of the filling valve 7. A lid or the like may be provided at the opening 18 as a means for preventing the vapor deposition material 11 from leaking when the material falls.
【００３６】また、前記第一実施形態では、蒸着材料供
給部１２は、蒸発室１３の外部に設けられているが、蒸
発室１３内部（真空部）に設けてもよい。この場合、真
空維持弁１１の開閉ツマミは蒸発室１３の外部（大気
中）に配置し、蒸発室１３の外部から蒸着材料１１の投
入量調整を行えるようにする方が好ましい。Further, in the first embodiment, the vapor deposition material supply section 12 is provided outside the evaporation chamber 13, but it may be provided inside the evaporation chamber 13 (vacuum section). In this case, it is preferable that the opening / closing knob of the vacuum maintaining valve 11 is arranged outside the evaporation chamber 13 (in the atmosphere) so that the amount of the vapor deposition material 11 can be adjusted from the outside of the evaporation chamber 13.
【００３７】次に、本発明にかかる収納容器の第二実施
形態について、図４を参酌して説明する。図４は、本発
明の第二実施形態にかかる収納容器Ａｂを示す。容器部
１は坩堝に充填するに必要な量の蒸着材料１１を収納・
保管する部分であり、また外部加熱を施す部分でもあっ
て、耐熱材料で形成されている。容器部１の上方部には
２箇所の開口部、即ち充填口５及び共有口２０が設けら
れ、各々充填経路６及び共有経路２１を介し容器部１に
連通している。また、充填用弁７及び共有弁２２は、各
々前記充填経路６及び共有経路２１を開閉自在に設けら
れた開閉弁である。さらに、収納容器Ａｂ内部の状態が
目視可能なように、容器部１の全体または一部は透明で
ある方が好ましい。Next, a second embodiment of the storage container according to the present invention will be described with reference to FIG. FIG. 4 shows a storage container Ab according to the second embodiment of the present invention. The container portion 1 stores the vapor deposition material 11 in an amount necessary for filling the crucible.
It is a part to be stored and also a part to be subjected to external heating, and is made of a heat resistant material. Two openings, that is, a filling port 5 and a common port 20 are provided in the upper part of the container unit 1, and communicate with the container unit 1 via a filling path 6 and a common path 21, respectively. Further, the filling valve 7 and the common valve 22 are opening / closing valves that are provided to open and close the filling path 6 and the common path 21, respectively. Furthermore, it is preferable that the whole or a part of the container part 1 is transparent so that the state inside the storage container Ab can be visually observed.
【００３８】つまり、収納容器Ａａとの相違点は、容器
部１上方部に設けられた共有口２０であり、該共有口２
０は、収納容器Ａａで言うところの脱気口２及び供給口
８を兼用した開口部である。That is, the difference from the storage container Aa is the shared port 20 provided in the upper part of the container part 1 and the shared port 2
Reference numeral 0 denotes an opening which is also used as the deaeration port 2 and the supply port 8 in the storage container Aa.
【００３９】また、図２に示す一時保管容器Ｂについて
は、上述の第一実施形態とまったく同一である。The temporary storage container B shown in FIG. 2 is exactly the same as that of the first embodiment described above.
【００４０】上記構成からなる収納容器Ａｂを用いた脱
気方法については、上述の第一実施形態とほぼ同様であ
るので、簡単に説明する。大気中で蒸着材料１１が十分
充填された一時保管容器Ｂの開放口１８を、全ての弁
（充填用弁７、共有弁２２及び封止弁１９）が閉じた状
態で、収納容器Ａｂの充填口５に接続する。収納容器Ａ
ｂの共有口２０に真空ポンプを接続し、共有弁２２を開
いて、脱気を開始する。そして次に充填用弁７及び封止
弁１９を開き、蒸着材料１１の移し変えを実行する。最
後に移し変えが所定の量まで達したら、充填用弁７及び
封止弁１９を閉じ、共有弁２２も閉じる。前記第一実施
形態の時と同様、充填用弁７または封止弁１９で移し変
え量の調整を行うと共に、一時収納容器Ａｂを外部から
加熱しながら蒸着材料１１の移し変えを行えば、更に効
果的な脱気が行える。The degassing method using the storage container Ab having the above structure is almost the same as that of the first embodiment described above, and therefore will be briefly described. Filling the storage container Ab with all the valves (the filling valve 7, the common valve 22, and the sealing valve 19) closed in the opening 18 of the temporary storage container B that is sufficiently filled with the vapor deposition material 11 in the atmosphere. Connect to mouth 5. Storage container A
A vacuum pump is connected to the common port 20 of b, the common valve 22 is opened, and deaeration is started. Then, next, the filling valve 7 and the sealing valve 19 are opened to transfer the vapor deposition material 11. Finally, when the transfer amount reaches a predetermined amount, the filling valve 7 and the sealing valve 19 are closed, and the common valve 22 is also closed. As in the case of the first embodiment, the transfer valve 7 or the sealing valve 19 is used to adjust the transfer amount, and the evaporation material 11 is transferred while heating the temporary storage container Ab from the outside. Effective degassing can be performed.
【００４１】次に、収納容器Ａｂから真空蒸着装置１５
への蒸着材料１１の供給する際は、収納容器Ａｂの共有
口２０を蒸着材料供給部１２に接続する。そして、共有
弁２２及び蒸着材料供給部１２に備えた真空維持弁１３
を開き、蒸着材料１１を導通経路１４を介して蒸発室１
６内の坩堝に供給するのである。つまり、共有口２０を
蒸着材料供給部１２に接続する以外は、上記第一実施形
態に示した収納容器Ａａと同様の手順で行えばよい。Next, the vacuum evaporation device 15 is moved from the storage container Ab.
When supplying the vapor deposition material 11 to the vapor deposition material 11, the common port 20 of the storage container Ab is connected to the vapor deposition material supply unit 12. Then, the common valve 22 and the vacuum maintenance valve 13 provided in the vapor deposition material supply unit 12
To open the evaporation material 11 through the conduction path 14 and the evaporation chamber 1
It is supplied to the crucible in 6. That is, except that the common port 20 is connected to the vapor deposition material supply unit 12, the procedure may be the same as that of the storage container Aa shown in the first embodiment.
【００４２】収納容器Ａｂによれば、収納容器Ａａに比
べ、開口部が少なくなるため、構造が簡素になると共
に、開閉弁の緩み、劣化及び開閉弁の閉め忘れ等による
空気洩れトラブルも減少するという利点が生じる。Since the storage container Ab has a smaller number of openings than the storage container Aa, the structure is simplified and air leakage troubles due to loosening of the on-off valve, deterioration, forgetting to close the on-off valve, etc. are reduced. There is an advantage.
【００４３】なお、本発明に係る収納容器Ａｂについで
も、前記第二実施形態に限定されるものではなく、本発
明の要旨を逸脱しない範囲にて種々の変更が可能であ
る。例えば、上述の第一実施形態同様、充填口５及び共
有口２０に設けられた接続手段は、ワンタッチプラグな
どであってもよい。The storage container Ab according to the present invention is not limited to the second embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, as in the first embodiment described above, the connecting means provided in the filling port 5 and the common port 20 may be a one-touch plug or the like.
【００４４】また、前記第二実施形態では、共有口２０
は脱気用開口部と供給用開口部（収納容器Ａａで言う脱
気口２及び供給口８）を兼用しているが、充填口５を充
填用開口部と供給用開口部（収納容器Ａａで言う充填口
５及び供給口８）の兼用とし、共有口２０を脱気用開口
（同じく収納容器Ａａで言う脱気口２）を独立に設けて
もよい。この場合、収納容器Ａｂ内の脱気を行う際は、
共有口２０に真空ポンプ等を接続すると共に、充填口５
に一時保管容器Ｂを接続する。そして、真空蒸着装置１
５に蒸着材料１１を供給する際は、充填口５を真空蒸着
装置１５の蒸着材料供給部（図示省略）に接続すればよ
い。Further, in the second embodiment, the common port 20 is used.
Uses both the degassing opening and the supply opening (the degassing port 2 and the supply port 8 in the storage container Aa), but the filling port 5 is used as the filling opening and the supply opening (storage container Aa. The filling port 5 and the supply port 8) described above may be used together, and the shared port 20 may be provided with a degassing opening (also the degassing port 2 also referred to as the storage container Aa) independently. In this case, when deaerating the inside of the storage container Ab,
A vacuum pump or the like is connected to the common port 20 and the filling port 5
Connect the temporary storage container B to. And the vacuum vapor deposition device 1
When supplying the vapor deposition material 11 to 5, the filling port 5 may be connected to the vapor deposition material supply unit (not shown) of the vacuum vapor deposition apparatus 15.
【００４５】[0045]
【実施例】以下、本発明を実施例をあげて説明する。真
空蒸着される物質は数多くあるが、例えば一酸化珪素
（ＳｉＯ）を蒸発させて蒸着させる場合、直径約０．１
ｍｍの粒体状のものが容易に入手できる。これを坩堝に
充填して加熱した場合、およそ１２００℃に達すると蒸
発が始まる。時間当りの蒸発量は、ＳｉＯのバルク密
度、坩堝の容量、加熱方式、与える温度等によって異な
るが、仮に１基の坩堝で毎分０．０１ｃｃ蒸発させるこ
とができれば、これは決して少ない蒸発量ではない。従
って毎分０．０１ｃｃの蒸発量で１００分間蒸発を継続
するためには、坩堝に少なくとも１ｃｃを充填しなけれ
ばならない。EXAMPLES The present invention will be described below with reference to examples. There are many materials that can be vacuum-deposited. For example, when silicon monoxide (SiO) is evaporated and deposited, the diameter is about 0.1.
mm particles are easily available. When this is filled in a crucible and heated, when it reaches approximately 1200 ° C., evaporation starts. The amount of evaporation per hour differs depending on the bulk density of SiO, the capacity of the crucible, the heating method, the temperature to be applied, etc. However, if it is possible to evaporate 0.01 cc per minute with one crucible, this is a very small evaporation amount. Absent. Therefore, in order to continue evaporation at an evaporation rate of 0.01 cc per minute for 100 minutes, the crucible must be filled with at least 1 cc.
【００４６】ここで、従来の真空蒸着装置では、１ｃｃ
を５ｍｍの堆積層で坩堝に充填すると面積が２ｃｍ2と
なり、全体的に平均した加熱が実用上難しい。一方５ｍ
ｍの堆積層から、真空室全体の真空度の中で空気やその
他の不純物質を脱気することも、短時間では極めて困難
である。Here, in the conventional vacuum vapor deposition apparatus, 1 cc
When the crucible was filled with 5 mm of the deposited layer, the area became 2 cm 2 , and it was difficult to practically average the heating. On the other hand, 5m
It is also extremely difficult to deaerate air and other impurities from the deposited layer of m within the vacuum degree of the entire vacuum chamber in a short time.
【００４７】一方、本発明に従い、ステンレスで製作
し、脱気経路に冷却部を設けた別途の収納容器Ａでは、
収納容器Ａ外部からＳｉＯに６００℃の温度を与えなが
ら脱気して、３０分で容易に３０ｃｃを収納することが
できた。因みに収納容器Ａの内径は１０ｍｍであり、全
体の高さは１００ｍｍに抑えることができたので、重量
も軽く、取り扱いも容易である。On the other hand, according to the present invention, in a separate storage container A made of stainless steel and provided with a cooling unit in the degassing path,
It was possible to store 30 cc easily in 30 minutes by degassing while applying a temperature of 600 ° C. to SiO from the outside of the storage container A. Incidentally, since the inner diameter of the storage container A was 10 mm and the total height could be suppressed to 100 mm, the weight was light and the handling was easy.
【００４８】上記実施例より明らかなように、本発明
は、３０分という短時間で、３０回分の蒸着量に相当す
る多量の脱気された蒸着材料が得られ、上述の如く、従
来の真空蒸着装置では坩堝内で１ｃｃずつ蒸着材料の脱
気（不純物の除去）を行うことが困難なのに対して、作
業面でも効率化できるという結果が取得された。As is clear from the above examples, according to the present invention, a large amount of degassed vapor deposition material corresponding to the vapor deposition amount of 30 times can be obtained in a short time of 30 minutes. While it is difficult for the vapor deposition apparatus to deaerate the vapor deposition material (remove impurities) in the crucible in increments of 1 cc, it has been obtained that work efficiency can be improved.
【００４９】[0049]
【発明の効果】本発明による収納容器を、真空蒸着装置
の蒸発室の真空度を維持した状態で外部の蒸着材料供給
部に結合し、坩堝に充填・加熱することが可能である。
こうして蒸発室に供給された蒸着材料より得た蒸着膜
は、パッキング密度も安定し、従来法では得られない良
好な膜質である。さらに、収納容器内の蒸着材料は一度
に使い切ることをしなくとも、収納容器の全ての開閉弁
を完全に閉じて長時間保管し、残量を再度利用すること
ができる。これらの効果は、ＳｉＯに限られたものでは
なく、広く応用できるので、真空蒸着技術を更に向上さ
せることができる。The storage container according to the present invention can be connected to an external vapor deposition material supply section in a state where the degree of vacuum of the evaporation chamber of the vacuum vapor deposition apparatus is maintained, and the crucible can be filled and heated.
The vapor-deposited film obtained from the vapor-deposited material supplied to the evaporation chamber in this manner has a stable packing density and has a good film quality that cannot be obtained by the conventional method. Furthermore, the vapor deposition material in the storage container can be stored for a long time by completely closing all the on-off valves of the storage container without reuse of the vapor deposition material at once, and the remaining amount can be reused. These effects are not limited to SiO and can be widely applied, so that the vacuum evaporation technique can be further improved.
【００５０】[0050]
【図１】本発明の第一実施形態にかかる収納容器Ａａの
全体概略断面図を示す。FIG. 1 shows an overall schematic sectional view of a storage container Aa according to a first embodiment of the present invention.
【図２】同第一実施形態及び第二実施形態にかかる一時
保管容器Ｂの全体概略断面図を示す。FIG. 2 is an overall schematic cross-sectional view of a temporary storage container B according to the first and second embodiments.
【図３】同第一実施形態にかかる真空蒸着装置の蒸着材
料供給部近傍の構成を示す断面図である。FIG. 3 is a cross-sectional view showing a configuration near a vapor deposition material supply unit of the vacuum vapor deposition apparatus according to the first embodiment.
【図４】同第二実施形態にかかる収納容器Ａｂの全体概
略断面図を示す。FIG. 4 is an overall schematic sectional view of a storage container Ab according to the second embodiment.
Ａａ，Ａｂ…収納容器、Ｂ…一時保管容器、１…容器
部、２…脱気口、３…脱気経路、４…脱気用弁、５…充
填口、６…充填経路、７…充填用弁、８…供給口、９…
供給経路、１０…供給用弁、１１…蒸着材料、１２…蒸
着材料供給部、１３…真空維持弁、１４…導通経路、１
５…真空蒸着装置、１６…蒸発室（真空部）、１７…容
器本体、１８…開放口、１９…封止弁、２０…共有口、
２１…共有経路、２２…共有弁Aa, Ab ... Storage container, B ... Temporary storage container, 1 ... Container part, 2 ... Degassing port, 3 ... Degassing path, 4 ... Degassing valve, 5 ... Filling port, 6 ... Filling path, 7 ... Filling Valve, 8 ... Supply port, 9 ...
Supply path, 10 ... Supply valve, 11 ... Deposition material, 12 ... Deposition material supply section, 13 ... Vacuum maintenance valve, 14 ... Conduction path, 1
5 ... Vacuum deposition apparatus, 16 ... Evaporating chamber (vacuum part), 17 ... Container body, 18 ... Opening port, 19 ... Sealing valve, 20 ... Shared port,
21 ... shared path, 22 ... shared valve
───────────────────────────────────────────────────── フロントページの続き (72)発明者 臼井 博明 東京都西東京市中町３−５−21ＲＡ52 (72)発明者 中村 宏毅 千葉県船橋市山手２丁目２−１−203 (72)発明者 川口 晴彦 千葉県千葉市緑区土気町1809−106 Ｆターム(参考） 4K029 BA46 CA01 DB05 DB10 DB15 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Hiroaki Usui 3-5-21 RA52, Nakamachi, Nishi-Tokyo, Tokyo (72) Inventor Hiroki Nakamura 2-2-1-203 Yamate, Funabashi City, Chiba Prefecture (72) Inventor Haruhiko Kawaguchi 1809-106 Toki-cho, Midori-ku, Chiba-shi, Chiba F-term (reference) 4K029 BA46 CA01 DB05 DB10 DB15
Claims (7)
れる固体状の蒸着材料を収納する収納容器であって、収
納容器内および収納される蒸着材料から空気等の気体を
抜き取るための脱気口及び脱気経路と、脱気経路を開閉
する脱気用弁と、蒸着材料を容器内に充填するための充
填口及び充填経路と、充填経路を開閉する充填用弁と、
容器内に充填された蒸着材料を真空蒸着装置の蒸発室内
の坩堝に供給するための供給口及び供給経路と、供給経
路を開閉する供給用弁とを有し、該収納容器の充填口は
別設の一時保管容器を接続可能に構成してなり、一時保
管容器から収納容器に蒸着材料を移し変える過程で、大
気の混入を防止すると共に、双方の容器内及び蒸着材料
の集合に含まれる空気等の気体を脱気して真空化が可能
なことを特徴とする収納容器。1. A storage container for storing a solid vapor deposition material used in a vacuum vapor deposition process in a vacuum vapor deposition apparatus, the desorption for extracting a gas such as air from the vapor deposition material in the storage container. An air vent and a degassing path, a degassing valve that opens and closes the degassing path, a filling port and a filling path for filling the vapor deposition material into the container, and a filling valve that opens and closes the filling path,
It has a supply port and a supply path for supplying the vapor deposition material filled in the container to the crucible in the evaporation chamber of the vacuum vapor deposition device, and a supply valve for opening and closing the supply route, and the filling port of the storage container is separate. A temporary storage container is provided so that it can be connected to prevent air from entering in the process of transferring the vapor deposition material from the temporary storage container to the storage container, and to prevent air from being included in both vessels and in the collection of vapor deposition material. A storage container characterized by being able to be evacuated by degassing gases such as.
気用弁が、供給口、供給経路及び供給用弁と同一である
ことを特徴とする請求項１記載の収納容器。2. The storage container according to claim 1, wherein the degassing port, the degassing path, and the degassing valve of the storage container are the same as the supply port, the supply path, and the supply valve.
填用弁が、供給口、供給経路及び供給用弁と同一である
ことを特徴とする請求項１または２記載の収納容器。3. The storage container according to claim 1, wherein the filling port, the filling path, and the filling valve of the storage container are the same as the supply port, the supply path, and the supply valve.
まれる不純気体を脱気した状態で、該蒸着材料を保存す
べく構成されることを特徴とする請求項１乃至３いずれ
かに記載の収納容器。4. The vapor deposition material according to claim 1, wherein the vapor deposition material is preserved in a state where the impure gas contained in the vapor deposition material is degassed by heating from the outside. Storage container.
納容器の全体または一部が透明であることを特徴とする
請求項１乃至４のいずれかに記載の収納容器。5. The storage container according to claim 1, wherein the storage container is wholly or partially transparent so that the internal state can be visually observed.
を蒸発室内の坩堝に供給可能な真空蒸着装置であって、
脱気した蒸着材料が充填された収納容器を接続する蒸着
材料供給部と、蒸発室と外気とを遮断するために該蒸着
材料供給部に設けた真空維持弁と、蒸着材料供給部と蒸
発室内の坩堝とを連通する導通経路とを備えたことを特
徴とする真空蒸着装置。6. A vacuum vapor deposition apparatus capable of supplying a vapor deposition material to a crucible in an evaporation chamber while maintaining the vacuum of the evaporation chamber,
A vapor deposition material supply unit for connecting a storage container filled with degassed vapor deposition material, a vacuum maintaining valve provided in the vapor deposition material supply unit to shut off the vaporization chamber from the outside air, a vapor deposition material supply unit and an vaporization chamber And a conduction path that communicates with the crucible.
収納容器を、真空蒸着装置の蒸発室内に設けた坩堝に連
通する蒸着材料供給部に接続し、蒸発室の真空を維持し
た状態で、蒸着材料を坩堝に供給することを特徴とする
蒸着材料供給方法。7. A state in which a storage container filled with vapor deposition material in a degassed state is connected to a vapor deposition material supply section communicating with a crucible provided in the vaporization chamber of a vacuum vapor deposition apparatus to maintain a vacuum in the vaporization chamber. 2. A method for supplying a vapor deposition material, which comprises supplying the vapor deposition material to a crucible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001282934A JP2003089865A (en) | 2001-09-18 | 2001-09-18 | Vacuum deposition material accommodation vessel, vacuum deposition apparatus, and method for feeding deposition material to vacuum vapor deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001282934A JP2003089865A (en) | 2001-09-18 | 2001-09-18 | Vacuum deposition material accommodation vessel, vacuum deposition apparatus, and method for feeding deposition material to vacuum vapor deposition apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004376025A Division JP2005163184A (en) | 2004-12-27 | 2004-12-27 | Vacuum deposition system and method for supplying vapor deposition material to vacuum deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003089865A true JP2003089865A (en) | 2003-03-28 |
Family
ID=19106511
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001282934A Pending JP2003089865A (en) | 2001-09-18 | 2001-09-18 | Vacuum deposition material accommodation vessel, vacuum deposition apparatus, and method for feeding deposition material to vacuum vapor deposition apparatus |
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| Country | Link |
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| JP (1) | JP2003089865A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008513964A (en) * | 2004-09-21 | 2008-05-01 | イーストマン コダック カンパニー | Supply of particulate material to the vaporization zone |
| KR100945469B1 (en) | 2002-02-05 | 2010-03-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device |
-
2001
- 2001-09-18 JP JP2001282934A patent/JP2003089865A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100945469B1 (en) | 2002-02-05 | 2010-03-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device |
| JP2008513964A (en) * | 2004-09-21 | 2008-05-01 | イーストマン コダック カンパニー | Supply of particulate material to the vaporization zone |
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