JP2003054984A - Glass substrate for flat panel display unit - Google Patents
Glass substrate for flat panel display unitInfo
- Publication number
- JP2003054984A JP2003054984A JP2001245180A JP2001245180A JP2003054984A JP 2003054984 A JP2003054984 A JP 2003054984A JP 2001245180 A JP2001245180 A JP 2001245180A JP 2001245180 A JP2001245180 A JP 2001245180A JP 2003054984 A JP2003054984 A JP 2003054984A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- glass substrate
- flat panel
- strain point
- panel display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、フラットパネルディス
プレイ装置、特にプラズマディスプレイ装置用ガラス基
板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display device, and more particularly to a glass substrate for a plasma display device.
【０００２】[0002]
【従来の技術】プラズマディスプレイ装置は、一般にＩ
ＴＯ膜、ネサ膜等からなる透明電極が形成された前面ガ
ラス基板表面に誘電体ペーストを塗布し、Ａｌ、Ａｇ、
Ｎｉからなる電極が形成された背面ガラス基板表面にリ
ブペーストを塗布してから５００〜６００℃程度の温度
で焼成することにより回路を形成し、その後、前面ガラ
ス基板と背面ガラス基板を対向させ、周囲を５００〜６
００℃程度の温度でフリットシールすることにより作製
される。従来、ガラス基板としては、建築用または自動
車用として広く用いられているソーダ石灰ガラスや高歪
点ガラスが一般的に用いられてきた。2. Description of the Related Art A plasma display device generally has an I
A dielectric paste is applied to the surface of the front glass substrate on which a transparent electrode made of a TO film, a NES film, etc. is formed, and Al, Ag,
A circuit is formed by applying a rib paste to the surface of the rear glass substrate on which the electrode made of Ni is formed and then firing it at a temperature of about 500 to 600 ° C., and thereafter, the front glass substrate and the rear glass substrate are opposed to each other, 500 to 6 around
It is produced by frit sealing at a temperature of about 00 ° C. Conventionally, soda-lime glass and high strain point glass, which are widely used for construction or automobiles, have been generally used as glass substrates.
【０００３】[0003]
【発明が解決しようとする課題】ところが、ソーダ石灰
ガラスは歪点が５００℃程度と低く、５７０〜６００℃
程度の温度で熱処理する際、熱変形や熱収縮により、寸
法が著しく変化するため、前面ガラス基板と背面ガラス
基板を対向させる際、電極の位置合わせを精度よく実現
することが難しく、大型のプラズマディスプレイ装置を
作製する上で困難が生じていた。また、ガラスの熱膨張
係数が８４×１０-7／℃と高いため、５７０〜６００℃
の温度で熱処理した後、急冷すると熱応力に起因する割
れが生じていた。However, the strain point of soda-lime glass is as low as 500 ° C, and it is 570-600 ° C.
When heat treatment is performed at a moderate temperature, the dimensions change significantly due to thermal deformation and heat contraction.Therefore, it is difficult to accurately align the electrodes when the front glass substrate and the rear glass substrate are opposed to each other. Difficulties have occurred in producing the display device. Moreover, since the coefficient of thermal expansion of glass is as high as 84 × 10 −7 / ° C., it is 570 to 600 ° C.
When heat-treated at the temperature of 1 and then rapidly cooled, cracks due to thermal stress were generated.
【０００４】一方、歪点が高いプラズマディスプレイ装
置用ガラス基板は、歪点が５７０℃程度であるため、熱
収縮によるズレは小さく、大型のプラズマディスプレイ
装置を作製することは可能である。しかし、デジタルテ
レビ等のように高精細品の場合は、歪点が５７０℃程度
のガラス基板を用いても熱収縮が未だ不十分である。ま
た、熱膨張係数が８０〜９０×１０-7／℃と大きいた
め、５７０〜６００℃の温度で熱処理した後、急冷する
と熱応力に起因する割れが生じていた。On the other hand, the glass substrate for a plasma display device having a high strain point has a strain point of about 570 ° C., so that the displacement due to thermal contraction is small and a large-sized plasma display device can be manufactured. However, in the case of high-definition products such as digital televisions, the heat shrinkage is still insufficient even if a glass substrate having a strain point of about 570 ° C. is used. Moreover, since the thermal expansion coefficient is as large as 80 to 90 × 10 −7 / ° C., when heat-treated at a temperature of 570 to 600 ° C. and then rapidly cooled, cracks due to thermal stress were generated.
【０００５】本発明の目的は、耐熱衝撃性が優れ、５７
０〜６００℃の温度で熱処理しても熱変形や熱収縮が問
題とならないフラットパネルディスプレイ装置用ガラス
基板を提供することである。The object of the present invention is to provide excellent thermal shock resistance, 57
It is an object of the present invention to provide a glass substrate for a flat panel display device in which thermal deformation and thermal contraction do not pose a problem even when heat-treated at a temperature of 0 to 600 ° C.
【０００６】[0006]
【課題を解決するための手段】本発明のフラットパネル
ディスプレイ装置用ガラス基板は、質量％で、ＳｉＯ 2
５０〜６５％、Ａｌ2Ｏ3 ５〜１５％、ＭｇＯ ４．
５〜９％、ＣａＯ ０〜５％、ＳｒＯ ６．５〜１５
％、ＢａＯ ０〜５％、ＭｇＯ＋ＣａＯ＋ＳｒＯ＋Ｂａ
Ｏ １５〜２０％、Ｎａ2Ｏ ０〜５％、Ｋ2Ｏ ４〜１
１％、Ｎａ2Ｏ＋Ｋ2Ｏ ８〜１２％、ＺｒＯ2 ０．３
〜２％の組成を有することを特徴とする。The flat panel of the present invention
The glass substrate for a display device contains SiO 2 in mass%. 2
50-65%, Al2O3 5-15%, MgO 4.
5-9%, CaO 0-5%, SrO 6.5-15
%, BaO 0-5%, MgO + CaO + SrO + Ba
O 15-20%, Na2O 0-5%, K2O 4-1
1%, Na2O + K2O 8-12%, ZrO2 0.3
Characterized by having a composition of ˜2%.
【０００７】[0007]
【作用】本発明のフラットパネルディスプレイ装置用ガ
ラス基板は、Ａｌ2Ｏ3を５％以上、ＭｇＯを４．５％以
上含有しているため、基板ガラスの歪点を６２０℃以上
にすることができ、５７０〜６００℃の温度で熱処理し
た場合に熱変形や熱収縮は問題とならない。ＭｇＯの含
有量が高いことで失透しやすくなる懸念があるが、Ｃａ
Ｏを５％以下、ＺｒＯ2を２％以下に抑え、ＳｒＯを
６．５％以上含有することで、失透を抑えることができ
るためガラスの成形が容易である。The glass substrate for a flat panel display device of the present invention contains 5% or more of Al 2 O 3 and 4.5% or more of MgO. Therefore, the strain point of the substrate glass can be 620 ° C. or more. However, when heat-treated at a temperature of 570 to 600 ° C., thermal deformation and thermal contraction do not pose a problem. High content of MgO may cause devitrification, but Ca
When O is contained in 5% or less, ZrO 2 is contained in 2% or less, and SrO is contained in 6.5% or more, devitrification can be suppressed, so that glass molding is easy.
【０００８】本発明のガラス基板において、各成分の割
合を上記のように限定した理由を以下に述べる。In the glass substrate of the present invention, the reason why the ratio of each component is limited as described above will be described below.
【０００９】ＳｉＯ2は、ガラス形成成分であり、その
含有量は、質量％で５０〜６５％、好ましくは５６〜６
４％である。５０％より少なくなるとガラスの歪点が低
くなって熱変形や熱収縮が大きくなり、６５％より多く
なると溶融性が悪化するため好ましくない。SiO 2 is a glass-forming component, and the content thereof is 50 to 65% by mass, preferably 56 to 6%.
4%. When it is less than 50%, the strain point of the glass becomes low, and thermal deformation and thermal contraction increase, and when it exceeds 65%, the meltability deteriorates, which is not preferable.
【００１０】Ａｌ2Ｏ3は、ガラスの歪点を高める成分で
あり、その含有量は、質量％で５〜１５％、好ましくは
６〜１２％である。５％より少なくなるとガラスの歪点
が低くなり、１５％より多くなると高温粘度が高くなっ
てガラスの成形が困難となるため好ましくない。Al 2 O 3 is a component for increasing the strain point of glass, and the content thereof is 5 to 15% by mass, preferably 6 to 12%. If it is less than 5%, the strain point of the glass will be low, and if it is more than 15%, the high temperature viscosity will be high and molding of the glass will be difficult.
【００１１】ＭｇＯは、ガラスの歪点を高めたり、ガラ
スの高温粘度を低下させてガラスの溶融性や成形性を高
める成分であり、その含有量は、質量％で４．５〜９
％、好ましくは５〜８％である。４．５％より少なくな
るとガラスの歪点が低下し、また、高温粘度が高くなっ
て溶融性や成形性が困難となる。一方、９％より多くな
るとガラスが失透しやすくなるため好ましくない。MgO is a component which raises the strain point of the glass and lowers the high temperature viscosity of the glass to enhance the meltability and formability of the glass, and the content thereof is 4.5-9% by mass.
%, Preferably 5-8%. If it is less than 4.5%, the strain point of the glass is lowered, and the viscosity at high temperature becomes high, so that the meltability and moldability become difficult. On the other hand, if it exceeds 9%, the glass tends to devitrify, which is not preferable.
【００１２】ＣａＯは、ガラスの高温粘度を低下させて
ガラスの溶融性や成形性を高める成分であり、その含有
量は、質量％で０〜５％、好ましくは０〜３％である。
５％より多くなるとガラスが失透しやすくなるため好ま
しくない。CaO is a component that lowers the high temperature viscosity of glass and enhances the meltability and formability of glass, and its content is 0 to 5% by mass, preferably 0 to 3%.
If it exceeds 5%, the glass tends to devitrify, which is not preferable.
【００１３】ＳｒＯは、ガラスの高温粘度を低下させて
ガラスの溶融性や成形性を高める成分であり、その含有
量は、質量％で６．５〜１５％、好ましくは７〜１４％
である。６．５％より少なくなると高温粘度が高くなっ
てガラスの溶融性や成形性が困難になり失透性改善の効
果はない。一方、１５％以上になるとガラスの歪点が低
下するため好ましくない。SrO is a component that lowers the high temperature viscosity of the glass and enhances the meltability and formability of the glass, and the content thereof is 6.5 to 15% by mass, preferably 7 to 14%.
Is. If it is less than 6.5%, the viscosity at high temperature becomes high and the melting property and moldability of the glass become difficult, and there is no effect of improving devitrification. On the other hand, if it is 15% or more, the strain point of the glass decreases, which is not preferable.
【００１４】ＢａＯは、ガラスの高温粘度を低下させて
ガラスの溶融性や成形性を高める成分であり、その含有
量は、質量％で０〜５％、好ましくは０〜３％である。
５％より多くなるとガラスの歪点が低下するため好まし
くない。BaO is a component that lowers the high temperature viscosity of the glass and enhances the meltability and formability of the glass, and the content thereof is 0 to 5% by mass, preferably 0 to 3%.
If it exceeds 5%, the strain point of the glass is lowered, which is not preferable.
【００１５】また、ＭｇＯ、ＣａＯ、ＳｒＯ及びＢａＯ
の合量は、質量％で１５〜２０％、好ましくは１６〜１
９％である。それらの合量が１５％より少なくなるとガ
ラスの溶融性が低下し、２０％より多くなるとガラスが
失透しやすくなるため好ましくない。In addition, MgO, CaO, SrO and BaO
15 to 20% by mass, preferably 16 to 1
9%. If the total amount is less than 15%, the meltability of the glass is lowered, and if it exceeds 20%, the glass tends to devitrify, which is not preferable.
【００１６】Ｎａ2Ｏは、ガラスの熱膨張係数を制御し
たり、ガラスの溶融性を高める成分であり、その含有量
は、質量％で０〜５％、好ましくは０〜３％である。そ
の含有量が５％より多くなるとガラスの歪点が低下する
ため好ましくない。Na 2 O is a component that controls the thermal expansion coefficient of glass and enhances the meltability of glass, and its content is from 0 to 5% by mass, preferably from 0 to 3%. If the content is more than 5%, the strain point of the glass decreases, which is not preferable.
【００１７】Ｋ2Ｏは、Ｎａ2Ｏと同様、ガラスの熱膨張
係数を制御したり、ガラスの溶融性を高める成分であ
り、その含有量は、質量％で４〜１１％、好ましくは５
〜１０％である。その含有量が４％より少なくなると熱
膨張係数が低くなりすぎ、１１％より多くなると歪点が
低下するため好ましくない。Like Na 2 O, K 2 O is a component that controls the thermal expansion coefficient of glass and enhances the meltability of glass, and its content is 4 to 11% by mass, preferably 5%.
-10%. If the content is less than 4%, the thermal expansion coefficient becomes too low, and if it is more than 11%, the strain point decreases, which is not preferable.
【００１８】Ｎａ2Ｏ及びＫ2Ｏの合量が、質量％で８〜
１２％、好ましくは９〜１１％である。８％より少なく
なると溶融性が低下し、１２％より多くなるとガラスの
歪点が低下するため好ましくない。The total amount of Na 2 O and K 2 O is 8% by mass.
It is 12%, preferably 9 to 11%. When it is less than 8%, the meltability is lowered, and when it is more than 12%, the strain point of the glass is lowered, which is not preferable.
【００１９】ＺｒＯ2は、ガラスの歪点を高める成分で
あり、その含有量は、質量％で０．３〜２％、好ましく
は０．５〜１．５％である。その含有量が０．３％より
少ないとガラスの歪点が低くなり、２％より多くなると
ガラスが失透しやすくなるので好ましくない。ZrO 2 is a component that raises the strain point of glass, and its content is 0.3 to 2% by mass, preferably 0.5 to 1.5%. If the content is less than 0.3%, the strain point of the glass becomes low, and if it exceeds 2%, the glass tends to devitrify, which is not preferable.
【００２０】また本発明においては、上記成分以外にも
種々の成分を添加することができる。例えば、紫外線に
よる着色を防止するためにＴｉＯ2を３％まで、耐クラ
ック性を向上させるためにＰ2Ｏ5を２％まで添加するこ
とが可能である。更に、Ａｓ 2Ｏ3、Ｓｂ2Ｏ3、ＳＯ3、
Ｃｌ等の清澄剤成分を合量で１％まで、Ｆｅ2Ｏ3、Ｃｏ
Ｏ、ＮｉＯ、Ｃｒ2Ｏ3、ＣｅＯ3等の着色剤成分を各々
１％まで添加することが可能である。Further, in the present invention, in addition to the above components,
Various ingredients can be added. For example, to ultraviolet rays
TiO to prevent coloring due to2Resistance to 3%
P to improve2OFiveUp to 2%
And are possible. Furthermore, As 2O3, Sb2O3, SO3,
The total amount of fining agents such as Cl up to 1%, Fe2O3, Co
O, NiO, Cr2O3, CeO3Colorant components such as
It is possible to add up to 1%.
【００２１】上記組成を有するガラス基板は、熱膨張係
数が６５×１０-7／℃以上、８０×１０-7／℃未満であ
るため、熱応力に起因する割れを抑えることができ、し
かも、歪点が６２０℃以上であり、熱変形や熱収縮も起
こらず、電極の位置合わせを精度よく行うことができ
る。The glass substrate having the above composition has a coefficient of thermal expansion of 65 × 10 −7 / ° C. or more and less than 80 × 10 −7 / ° C., so that cracking due to thermal stress can be suppressed, and further, The strain point is 620 ° C. or higher, thermal deformation and thermal contraction do not occur, and the electrodes can be accurately aligned.
【００２２】また、１５０℃での体積電気抵抗率（ｌｏ
ｇρ）が１０．５Ω・ｃｍ以上と高く、ガラス中のアル
カリ成分の移動度が小さい。そのため、ガラス中のアル
カリ成分とＩＴＯ膜やネサ膜等の薄膜電極と反応し難
い。Further, the volume electric resistivity (lo) at 150 ° C.
gρ) is as high as 10.5 Ω · cm or more, and the mobility of the alkaline component in the glass is small. Therefore, it is difficult for the alkaline component in the glass to react with the thin film electrode such as the ITO film or the NES film.
【００２３】[0023]
【実施例】以下、本発明を実施例に基づいて説明する。EXAMPLES The present invention will be described below based on examples.
【００２４】本発明の実施例（試料Ｎｏ．１〜７）と比
較例（試料Ｎｏ．８〜１０）を表１、２に示す。なお、
比較例の試料Ｎｏ．１０は、ソーダ石灰ガラスである。Tables 1 and 2 show examples of the present invention (Sample Nos. 1 to 7) and comparative examples (Sample Nos. 8 to 10). In addition,
Sample No. of the comparative example. 10 is soda-lime glass.
【００２５】[0025]
【表１】 [Table 1]
【００２６】[0026]
【表２】 [Table 2]
【００２７】表中の各試料は、次のようにして作製し
た。Each sample in the table was prepared as follows.
【００２８】まず、表の組成となるようにガラス原料を
調合し、白金ポットを用いて１４５０〜１６００℃で４
時間溶融した。その後、溶融ガラスをカーボン板の上に
流し出して板状に成形し、徐冷後、板厚が２．８ｍｍに
なるように両面研磨した。このようにして得られた板ガ
ラスを２００ｍｍ角の大きさに切断加工することによっ
て、試料ガラスを作製した。First, glass raw materials were prepared so as to have the composition shown in the table, and the mixture was heated at 1450 to 1600 ° C. for 4 hours using a platinum pot.
Melted for hours. Then, the molten glass was poured onto a carbon plate to form a plate shape, gradually cooled, and then double-sided polished to a plate thickness of 2.8 mm. A sample glass was prepared by cutting the plate glass thus obtained into a size of 200 mm square.
【００２９】このようして得られた各試料について、熱
膨張係数、密度、歪点及び体積電気抵抗率を測定して、
その結果を表に示した。The thermal expansion coefficient, density, strain point and volume electric resistivity of each of the samples thus obtained were measured,
The results are shown in the table.
【００３０】熱膨張係数は、ディラトメーターで３０〜
３８０℃における平均熱膨張係数として測定した。密度
は、周知のアルキメデス法で測定した。歪点は、ＡＳＴ
ＭＣ３３６−７１に基づいたファイバーエロンゲーショ
ン法によって測定した。また、体積電気抵抗について
は、ＡＳＴＭ Ｃ６５７−７８に基づいて１５０℃にお
ける値を測定した。The coefficient of thermal expansion is 30 to 30 with a dilatometer.
It was measured as an average coefficient of thermal expansion at 380 ° C. The density was measured by the well-known Archimedes method. The strain point is AST
It was measured by the fiber elongation method based on MC336-71. Regarding the volume electric resistance, the value at 150 ° C was measured based on ASTM C657-78.
【００３１】表から明らかなように、実施例である試料
Ｎｏ．１〜７の各試料は、熱膨張係数が６７．１〜７
３．６×１０-7／℃で、歪点が６２３℃以上と高かっ
た。また、１５０℃における体積電気抵抗（ｌｏｇρ）
も１０．９Ω・ｃｍ以上と高かった。As is apparent from the table, the sample No. Each sample of 1 to 7 has a coefficient of thermal expansion of 67.1 to 7
The strain point was as high as 623 ° C. or higher at 3.6 × 10 −7 / ° C. Also, volume electrical resistance (log ρ) at 150 ° C
Was as high as 10.9 Ω · cm or more.
【００３２】これに対して、比較例である試料Ｎｏ．８
は、ＭｇＯ含有量が３．０％、試料Ｎｏ．９は、Ａｌ2
Ｏ3含有量が４．０％であるため、歪点はそれぞれ５９
８℃、５８６℃と低かった。また、試料Ｎｏ．１０は、
ソーダ石灰ガラスであるため、歪点が５１２℃と低かっ
た。On the other hand, sample No. 8
Has a MgO content of 3.0% and sample No. 9 is Al 2
Since the O 3 content is 4.0%, the strain points are 59
It was as low as 8 ° C and 586 ° C. In addition, the sample No. 10 is
Since it was soda-lime glass, the strain point was as low as 512 ° C.
【００３３】[0033]
【発明の効果】以上のように本発明のフラットパネルデ
ィスプレイ装置用ガラス基板は、熱膨張係数が８０×１
０-7／℃未満であるため、耐熱衝撃性に優れ、歪点が６
２０℃以上と高いため、電極の位置合わせも良好に行う
ことができる。しかも、ガラス成形性に優れているた
め、フラットパネルディスプレイ装置、特にプラズマデ
ィスプレイ装置のガラス基板として好適である。As described above, the glass substrate for a flat panel display device of the present invention has a thermal expansion coefficient of 80 × 1.
Since it is less than 0 -7 / ° C, it has excellent thermal shock resistance and a strain point of 6
Since the temperature is as high as 20 ° C. or higher, the electrodes can be aligned well. Moreover, since it is excellent in glass moldability, it is suitable as a glass substrate for flat panel display devices, particularly plasma display devices.
フロントページの続き Ｆターム(参考） 4G062 AA01 BB01 DA06 DB03 DB04 DC01 DD01 DD02 DD03 DE01 DF01 EA01 EB01 EB02 EB03 EC03 EC04 ED03 EE01 EE02 EE03 EF03 EF04 EG01 EG02 EG03 FA01 FB01 FB02 FB03 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 GA01 GB01 GB02 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH08 HH09 HH11 HH12 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ04 JJ05 JJ06 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN29 NN31 5C040 GA09 KA07 KB03 KB11 KB28 MA09 MA23 Continued front page F-term (reference) 4G062 AA01 BB01 DA06 DB03 DB04 DC01 DD01 DD02 DD03 DE01 DF01 EA01 EB01 EB02 EB03 EC03 EC04 ED03 EE01 EE02 EE03 EF03 EF04 EG01 EG02 EG03 FA01 FB01 FB02 FB03 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 GA01 GB01 GB02 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH08 HH09 HH11 HH12 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ04 JJ05 JJ06 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN29 NN31 5C040 GA09 KA07 KB03 KB11 KB28 MA09 MA23
Claims (2)
ｌ2Ｏ3 ５〜１５％、ＭｇＯ ４．５〜９％、ＣａＯ
０〜５％、ＳｒＯ ６．５〜１５％、ＢａＯ０〜５％、
ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ １５〜２０％、Ｎａ
2Ｏ ０〜５％、Ｋ2Ｏ ４〜１１％、Ｎａ2Ｏ＋Ｋ2Ｏ
８〜１２％、ＺｒＯ2 ０．３〜２％の組成を有するこ
とを特徴とするフラットパネルディスプレイ装置用ガラ
ス基板。1. SiO 2 50 to 65% by weight, A
l 2 O 3 5~15%, MgO 4.5~9%, CaO
0-5%, SrO 6.5-15%, BaO 0-5%,
MgO + CaO + SrO + BaO 15-20%, Na
2 O 0-5%, K 2 O 4-11%, Na 2 O + K 2 O
A glass substrate for a flat panel display device, which has a composition of 8 to 12% and ZrO 2 0.3 to 2 %.
０×１０-7／℃未満、歪点が６２０℃以上であることを
特徴とする請求項１に記載のフラットパネルディスプレ
イ装置用ガラス基板。2. A thermal expansion coefficient of 65 × 10 −7 / ° C. or more, 8
The glass substrate for a flat panel display device according to claim 1, which has a strain point of less than 0 × 10 −7 / ° C. and a strain point of 620 ° C. or more.
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| JP2001245180A JP4924974B2 (en) | 2001-08-13 | 2001-08-13 | Glass substrate for flat panel display |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001245180A JP4924974B2 (en) | 2001-08-13 | 2001-08-13 | Glass substrate for flat panel display |
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|---|---|
| JP2003054984A true JP2003054984A (en) | 2003-02-26 |
| JP4924974B2 JP4924974B2 (en) | 2012-04-25 |
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ID=19074981
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001245180A Expired - Fee Related JP4924974B2 (en) | 2001-08-13 | 2001-08-13 | Glass substrate for flat panel display |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006525213A (en) * | 2003-05-07 | 2006-11-09 | サン−ゴバン グラス フランス | In particular, soda lime silica glass composition for making substrates |
| WO2015023561A3 (en) * | 2013-08-15 | 2015-04-23 | Corning Incorporated | Intermediate to high cte glasses and glass articles comprising the same |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
| US11951713B2 (en) | 2020-12-10 | 2024-04-09 | Corning Incorporated | Glass with unique fracture behavior for vehicle windshield |
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| JPH1025129A (en) * | 1996-07-12 | 1998-01-27 | Nippon Electric Glass Co Ltd | Glass for substrate |
| JPH1045423A (en) * | 1996-08-01 | 1998-02-17 | Nippon Electric Glass Co Ltd | Plasma display device |
| JPH10152338A (en) * | 1996-03-14 | 1998-06-09 | Asahi Glass Co Ltd | Glass composition for substrate |
| JP2001058843A (en) * | 1999-06-08 | 2001-03-06 | Asahi Glass Co Ltd | Glass for substrate and glass substrate |
| JP2001064034A (en) * | 1999-08-24 | 2001-03-13 | Asahi Glass Co Ltd | Glass base plate for display |
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| JPH10152338A (en) * | 1996-03-14 | 1998-06-09 | Asahi Glass Co Ltd | Glass composition for substrate |
| JPH1025130A (en) * | 1996-07-12 | 1998-01-27 | Nippon Electric Glass Co Ltd | Glass for substrate |
| JPH1025129A (en) * | 1996-07-12 | 1998-01-27 | Nippon Electric Glass Co Ltd | Glass for substrate |
| JPH1045423A (en) * | 1996-08-01 | 1998-02-17 | Nippon Electric Glass Co Ltd | Plasma display device |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006525213A (en) * | 2003-05-07 | 2006-11-09 | サン−ゴバン グラス フランス | In particular, soda lime silica glass composition for making substrates |
| WO2015023561A3 (en) * | 2013-08-15 | 2015-04-23 | Corning Incorporated | Intermediate to high cte glasses and glass articles comprising the same |
| US9346705B2 (en) | 2013-08-15 | 2016-05-24 | Corning Incorporated | Intermediate to high CTE glasses and glass articles comprising the same |
| CN105980147A (en) * | 2013-08-15 | 2016-09-28 | 康宁公司 | Intermediate to high CTE glasses and glass articles comprising the same |
| US10112865B2 (en) | 2013-08-15 | 2018-10-30 | Corning Incorporated | Intermediate to high CTE glasses and glass articles comprising the same |
| US10988405B2 (en) | 2013-08-15 | 2021-04-27 | Corning Incorporated | Intermediate to high CTE glasses and glass articles comprising the same |
| US11168018B2 (en) | 2013-08-15 | 2021-11-09 | Corning Incorporated | Aluminoborosilicate glass substantially free of alkali oxides |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
| US11951713B2 (en) | 2020-12-10 | 2024-04-09 | Corning Incorporated | Glass with unique fracture behavior for vehicle windshield |
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|---|---|
| JP4924974B2 (en) | 2012-04-25 |
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