JP2002284849A - Liquid resin composition and semiconductor device - Google Patents

Liquid resin composition and semiconductor device

Info

Publication number
JP2002284849A
JP2002284849A JP2001086925A JP2001086925A JP2002284849A JP 2002284849 A JP2002284849 A JP 2002284849A JP 2001086925 A JP2001086925 A JP 2001086925A JP 2001086925 A JP2001086925 A JP 2001086925A JP 2002284849 A JP2002284849 A JP 2002284849A
Authority
JP
Japan
Prior art keywords
resin composition
resin
epoxy resin
underfill
liquid resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001086925A
Other languages
Japanese (ja)
Inventor
Motoyoshi Kurokawa
元喜 黒川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2001086925A priority Critical patent/JP2002284849A/en
Publication of JP2002284849A publication Critical patent/JP2002284849A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an underfill liquid resin composition which enables filling in a short time and does not cause voids by volatile components in the underfill liquid resin composition. SOLUTION: The low viscosity underfill liquid resin composition comprises (A) a resin component composed of an epoxy resin such as an aromatic diamine and bisphenol type epoxy resin, a novolak type epoxy resin, a cresol epoxy resin, a cyclic aliphatic epoxy resin, a glycidyl ester based resin, and a glycidyl amine based resin and (B) an inorganic filler. Furthermore, a semiconductor device is manufactured by using this underfill liquid resin composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はフリップチップ実装
方式の半導体装置の封止に用いられる液状樹脂組成物に
関するものであり、それを用いて封止した半導体装置で
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid resin composition used for sealing a flip-chip mounting type semiconductor device, and a semiconductor device sealed using the same.

【0002】[0002]

【従来の技術】フリップチップ実装方式の半導体装置で
は半導体チップと回路基板の隙間にアンダーフィル材と
呼ばれる液状樹脂組成物を充填注入する封止方法が行わ
れている。アンダーフィル用液状樹脂組成物は一般に熱
硬化性樹脂と充填材から構成され、毛細管現象などを利
用して半導体チップ、回路基板、接続端子(以下バンプ
という)の間隙を充填する。
2. Description of the Related Art In a flip-chip mounting type semiconductor device, a sealing method of filling and injecting a liquid resin composition called an underfill material into a gap between a semiconductor chip and a circuit board has been performed. The underfill liquid resin composition is generally composed of a thermosetting resin and a filler, and fills a gap between a semiconductor chip, a circuit board, and a connection terminal (hereinafter, referred to as a bump) by utilizing a capillary phenomenon or the like.

【0003】アンダーフィル材を用いて充填注入する封
止方法は、半導体装置の生産工程においてアンダーフィ
ル材の充填に長時間を要する。生産工程の効率化にはア
ンダーフィル材の充填時間の短縮化が必要であり、充填
時間の短縮化にはアンダーフィル材の樹脂組成物の粘度
を低下させる手法がある。しかし、樹脂組成物の低粘度
化のために従来の低粘度有機化合物を用いると揮発成分
が増加し、フリップチップ実装方式の半導体装置では半
導体チップ、回路基板間に揮発成分由来の空隙が存在す
ると半導体装置の作動信頼性が著しく低下する。このた
め従来の生産工程においては揮発成分の少ない粘凋な樹
脂組成物を用いて充填時間を十分に取る必要があった。
このようにフリップチップ実装方式の半導体装置生産工
程は信頼性を得るために生産性を犠牲にしなければなら
ないという問題があった。
In the sealing method of filling and injecting using an underfill material, it takes a long time to fill the underfill material in a semiconductor device production process. To improve the efficiency of the production process, it is necessary to shorten the filling time of the underfill material. To shorten the filling time, there is a method of reducing the viscosity of the resin composition of the underfill material. However, when a conventional low-viscosity organic compound is used to reduce the viscosity of the resin composition, the volatile component increases, and in a flip-chip mounting type semiconductor device, a semiconductor chip and a void derived from the volatile component exist between circuit boards. The operation reliability of the semiconductor device is significantly reduced. For this reason, in the conventional production process, it was necessary to use a viscous resin composition having a small amount of volatile components and take a sufficient filling time.
As described above, there is a problem that the productivity of the flip-chip mounting type semiconductor device must be sacrificed in order to obtain reliability.

【0004】[0004]

【発明が解決しようとする課題】本発明は、フリップチ
ップ実装方式による半導体装置の生産工程において、充
填時間の短縮化をはかりながら、半導体装置の空隙を抑
制することができ、高度の信頼性を有するアンダーフィ
ル用液状樹脂組成物を提供することにある。
SUMMARY OF THE INVENTION According to the present invention, in the production process of a semiconductor device by the flip-chip mounting method, the gap of the semiconductor device can be suppressed while shortening the filling time, and high reliability can be achieved. To provide a liquid resin composition for underfill having the same.

【0005】[0005]

【課題を解決するための手段】一般式(1)で表される
芳香族ジアミンとビスフェノール型エポキシ樹脂、ノボ
ラック型エポキシ樹脂、クレゾールエポキシ樹脂、環状
脂肪族エポキシ樹脂、グリシジルエステル系樹脂、グリ
シジルアミン系樹脂から選択されるエポキシ樹脂からな
る樹脂成分(A)と無機フィラー(B)からなる低粘度
アンダーフィル用液状樹脂組成物である。
Means for Solving the Problems Aromatic diamine represented by the general formula (1) and bisphenol type epoxy resin, novolak type epoxy resin, cresol epoxy resin, cycloaliphatic epoxy resin, glycidyl ester resin, glycidylamine resin A low-viscosity underfill liquid resin composition comprising a resin component (A) composed of an epoxy resin selected from resins and an inorganic filler (B).

【化2】 更に好ましい形態としては、エポキシ樹脂がビスフェノ
ール型エポキシ樹脂であり、樹脂成分(A)と無機フィ
ラー(B)の合計に占める無機フィラー(B)の重量割
合が0.3〜0.7である低粘度アンダーフィル用液状
樹脂組成物である。更に上記の低粘度アンダーフィル用
液状樹脂組成物を用いて作製した半導体装置である。
Embedded image In a more preferred embodiment, the epoxy resin is a bisphenol-type epoxy resin, and the weight ratio of the inorganic filler (B) to the total of the resin component (A) and the inorganic filler (B) is 0.3 to 0.7. It is a liquid resin composition for viscosity underfill. Furthermore, a semiconductor device manufactured using the above-mentioned low-viscosity underfill liquid resin composition.

【0006】[0006]

【発明の実施の形態】本発明に用いられる芳香族ジアミ
ンは、エポキシ樹脂の硬化剤として用いられ一般式
(1)で示される。具体的な例としては、例えば、式
(2)で示された3,5−ジエチル−1,3−フェニレ
ンジアミンが挙げられ、これらを必要に応じて単独もし
くは複数用いることができる。
BEST MODE FOR CARRYING OUT THE INVENTION The aromatic diamine used in the present invention is used as a curing agent for an epoxy resin and is represented by the general formula (1). Specific examples include, for example, 3,5-diethyl-1,3-phenylenediamine represented by the formula (2), and these can be used alone or in combination as needed.

【化3】 Embedded image

【0007】本発明に用いられるエポキシ樹脂は、ビス
フェノール型エポキシ樹脂、ノボラック型エポキシ樹
脂、環状脂肪族エポキシ樹脂、グリシジルエステル系樹
脂、グリシジルアミン系樹脂から選択されるエポキシ樹
脂を1種又は複数種併用して用いることができる。これ
らの中でビスフェノール型エポキシ樹脂が耐熱性、耐吸
湿性に強いことから好ましい。
The epoxy resin used in the present invention is one or more epoxy resins selected from bisphenol type epoxy resins, novolak type epoxy resins, cycloaliphatic epoxy resins, glycidyl ester resins and glycidylamine resins. Can be used. Of these, bisphenol-type epoxy resins are preferred because of their high heat resistance and moisture absorption resistance.

【0008】(B)の無機フィラーとしては、樹脂の充
填に用いることができるものなら何れも使用できる。そ
の中でもシリカが供給安定性、コスト、純度等から好ん
で用いられる。形状は一般に球状、破砕状、フレーク状
などがあるが、良好な流動性を得るためには球状の無機
充填材がもっとも良い。
As the inorganic filler (B), any inorganic filler that can be used for filling a resin can be used. Among them, silica is preferably used in view of supply stability, cost, purity and the like. The shape generally has a spherical shape, a crushed shape, a flake shape, and the like, but a spherical inorganic filler is best for obtaining good fluidity.

【0009】無機フィラー(B)の添加量は、芳香族ジ
アミンとエポキシ樹脂からなる樹脂成分(A)に対し、
下記の式 (B)/((A)+(B))=0.2〜0.7 を満足することが望ましく、更に好ましくは0.4〜
0.6である。0.2未満だと硬化物の線膨張係数が大
きくなり、硬化後のパッケージへの応力蓄積や温度サイ
クル試験(T/C試験)での樹脂クラックを起こす恐れ
がある。一方、0.7を越えると結果として得られる液
状樹脂組成物の粘度が高くなり過ぎ、アンダーフィル材
として用いることができないため好ましくない。
The amount of the inorganic filler (B) added is based on the resin component (A) comprising an aromatic diamine and an epoxy resin.
It is desirable to satisfy the following expression (B) / ((A) + (B)) = 0.2 to 0.7, more preferably 0.4 to 0.7.
0.6. If it is less than 0.2, the coefficient of linear expansion of the cured product becomes large, which may cause stress accumulation in the package after curing and resin cracks in a temperature cycle test (T / C test). On the other hand, if it exceeds 0.7, the viscosity of the resulting liquid resin composition becomes too high and cannot be used as an underfill material, which is not preferable.

【0010】本発明の液状樹脂組成物の粘度は、後述の
粘度の測定方法において、0.5rpmで12Pa・s
以下であり、2.5rpmで14Pa・s以下である。
それぞれの粘度が、12Pas・s、14Pa・sを越
えると粘度が高くなりすぎ、アンダーフィル用として用
いることができない可能性がある。
[0010] The viscosity of the liquid resin composition of the present invention is determined by the method for measuring viscosity described below at 0.5 rpm and 12 Pa · s.
Or less, and 14 Pa · s or less at 2.5 rpm.
If the respective viscosities exceed 12 Pas · s and 14 Pa · s, the viscosities become too high and may not be used for underfill.

【0011】本発明のアンダーフィル用液状樹脂組成物
には、前記の必須成分の他に必要に応じて、その他のエ
ポキシ樹脂、エポキシ樹脂硬化剤、硬化促進剤、希釈
材、顔料、カップリング剤、難燃剤、レベリング剤、消
泡剤等の添加物を加えても差し支えない。アンダーフィ
ル用液状樹脂組成物は、各成分、添加物などを3本ロー
ルにて分散混練し、真空下で脱泡処理して製造する。半
導体装置の製造方法は公知の方法を用いることができ
る。
The liquid resin composition for underfill of the present invention may further comprise, if necessary, other epoxy resin, epoxy resin curing agent, curing accelerator, diluent, pigment, coupling agent in addition to the above-mentioned essential components. Additives such as a flame retardant, a leveling agent and an antifoaming agent may be added. The underfill liquid resin composition is manufactured by dispersing and kneading each component, additive, and the like with a three-roll mill, and performing a defoaming treatment under vacuum. A known method can be used as a method for manufacturing a semiconductor device.

【0012】[0012]

【実施例】本発明を実施例及び比較例で説明する。 <実施例1>式(2)で示される芳香族ジアミン(当量
44.6)26.9重量部とビスフェノールF型エポキ
シ樹脂(エポキシ当量166)100重量部を充填材と
して平均粒径6μm、最大粒径50μmの球状シリカ1
80重量部、カーボンブラック0.1重量部を秤量し、
これらの原材料を3本ロールにて分散混練し、真空脱泡
処理をしてアンダーフィル用液状樹脂組成物を得た。次
に、得られたアンダーフィル用液状樹脂組成物を用いて
下記の試験方法に記載した試験片を作製し評価を行っ
た。
EXAMPLES The present invention will be described with reference to Examples and Comparative Examples. <Example 1> 26.9 parts by weight of an aromatic diamine represented by the formula (2) (equivalent 44.6) and 100 parts by weight of a bisphenol F type epoxy resin (epoxy equivalent 166) were used as fillers, and the average particle diameter was 6 µm and the maximum Spherical silica 1 with a particle size of 50 μm
80 parts by weight, 0.1 parts by weight of carbon black are weighed,
These raw materials were dispersed and kneaded with three rolls and subjected to vacuum defoaming treatment to obtain a liquid resin composition for underfill. Next, using the obtained liquid resin composition for underfill, test pieces described in the following test method were prepared and evaluated.

【0013】<実施例2>式(2)で示される芳香族ジ
アミン(当量44.6)45.7重量部とビスフェノー
ルF型エポキシ(エポキシ当量97.5)100重量部
を充填材として平均粒径6μm、最大粒径50μmの球
状シリカ160重量部、カーボンブラック0.1重量部
を秤量し、これらの原材料を3本ロールにて分散混練
し、真空脱泡処理をしてアンダーフィル用液状樹脂組成
物を得た。次に、実施例1と同様にして評価を行った。
<Example 2> 45.7 parts by weight of an aromatic diamine represented by the formula (2) (equivalent weight 44.6) and 100 parts by weight of a bisphenol F type epoxy (epoxy equivalent weight 97.5) were used as fillers to obtain an average particle size. 160 parts by weight of spherical silica having a diameter of 6 μm and a maximum particle diameter of 50 μm, and 0.1 parts by weight of carbon black are weighed, and these raw materials are dispersed and kneaded with three rolls, subjected to vacuum defoaming treatment, and subjected to a liquid resin for underfill. A composition was obtained. Next, evaluation was performed in the same manner as in Example 1.

【0014】<比較例1>硬化剤としてジアミノジエチ
ルジフェニルメタン(当量63)38.0重量部とビス
フェノールF型エポキシ(エポキシ当量166)100
重量部を充填材として平均粒径6μm、最大粒径50μ
mの球状シリカ150重量部、カーボンブラック0.1
重量部を秤量し、これらの原材料を3本ロールにて分散
混練し、真空脱泡処理をしてアンダーフィル用液状樹脂
組成物を得た。次に、実施例1と同様にして評価を行っ
た。
<Comparative Example 1> 38.0 parts by weight of diaminodiethyldiphenylmethane (equivalent 63) as a curing agent and bisphenol F type epoxy (epoxy equivalent 166) 100
The average particle diameter is 6 μm and the maximum particle diameter is 50 μ with the parts by weight as filler.
m spherical silica 150 parts by weight, carbon black 0.1
A weight part was weighed, these raw materials were dispersed and kneaded with three rolls, and subjected to a vacuum defoaming treatment to obtain a liquid resin composition for underfill. Next, evaluation was performed in the same manner as in Example 1.

【0015】<比較例2>硬化剤としてジアミノジエチ
ルジフェニルメタン(当量63)64.6重量部とビス
フェノールF型エポキシ(エポキシ当量97.5)10
0重量部を充填材として平均粒径6μm、最大粒径50
μmの球状シリカ180重量部、カーボンブラック1重
量部を秤量し、これらの原材料を3本ロールにて分散混
練し、真空脱泡処理をしてアンダーフィル用液状樹脂組
成物を得た。次に、実施例1と同様にして評価を行っ
た。
Comparative Example 2 64.6 parts by weight of diaminodiethyldiphenylmethane (equivalent 63) as a curing agent and bisphenol F type epoxy (epoxy equivalent 97.5) 10
0 parts by weight as filler, average particle size 6 μm, maximum particle size 50
180 parts by weight of μm spherical silica and 1 part by weight of carbon black were weighed, and these raw materials were dispersed and kneaded with three rolls, followed by vacuum defoaming treatment to obtain a liquid resin composition for underfill. Next, evaluation was performed in the same manner as in Example 1.

【0016】各試験方法は次のとおりである。 <樹脂特性> 1)粘度:東機産業(株)製E型粘度計を用い25℃
で、0.5及び2.5rpmにおける粘度を測定した。
チキソトロピー比は(0.5rpmでの粘度/2.5r
pmでの粘度)によって算出した。 2)充填時間:100℃の熱板上で封止前の半導体装置
を加熱し、フリップチップの一辺にアンダーフィル材を
ディスペンスし、充填時間測定を行った。フィレット部
分を観察しながら、チップ四辺が完全に充填されるまで
の時間を計測した。測定に用いたフリップチップ方式の
半導体装置に用いたチップはサイズが10mm×10m
m×0.3mm、回路基板はガラスエポキシ基板、半田
バンプの高さ(半導体チップ−回路基板間隔)は0.5
mmであり、半導体チップと回路基板はバンプによりペ
リフェラルに接合されている。用いたサンプルは10個
である。
Each test method is as follows. <Resin Properties> 1) Viscosity: 25 ° C. using an E-type viscometer manufactured by Toki Sangyo Co., Ltd.
The viscosity at 0.5 and 2.5 rpm was measured.
The thixotropic ratio is (viscosity at 0.5 rpm / 2.5 r
(viscosity in pm). 2) Filling time: The semiconductor device before sealing was heated on a hot plate at 100 ° C., an underfill material was dispensed on one side of the flip chip, and the filling time was measured. While observing the fillet portion, the time until the four sides of the chip were completely filled was measured. The chip used for the flip-chip type semiconductor device used for the measurement has a size of 10 mm × 10 m.
mx 0.3 mm, circuit board is glass epoxy board, solder bump height (semiconductor chip-circuit board spacing) is 0.5
mm, and the semiconductor chip and the circuit board are joined to the peripheral by bumps. Ten samples were used.

【0017】<信頼性>上記の充填時間測定で使用した
試験片を用いた。次に、T/C処理(−65℃/30分
←→150℃/30分、1000サイクル)を施した
後、超音波探傷機(SAT)にて半導体チップと回路基
板界面との剥離、クラックの有無を確認した。試験に用
いたサンプル数は10個である。
<Reliability> The test piece used in the above filling time measurement was used. Next, after performing T / C treatment (−65 ° C./30 minutes →→ 150 ° C./30 minutes, 1000 cycles), peeling and cracking of the interface between the semiconductor chip and the circuit board are performed by an ultrasonic flaw detector (SAT). Was checked. The number of samples used for the test is 10.

【0018】樹脂特性を表1に信頼性試験不良個数の結
果を表2示す。
Table 1 shows the resin characteristics and Table 2 shows the results of the number of failures in the reliability test.

【表1】 [Table 1]

【0019】[0019]

【表2】 [Table 2]

【0020】[0020]

【発明の効果】本発明のアンダーフィル用液状樹脂組成
物は、低粘度であるため短時間での充填封止が可能であ
り、従来の半導体装置作成工程より生産性に優れたもの
である。また、本発明のアンダーフィル用液状樹脂組成
物を用いて作成された半導体装置は空隙が非常に少な
く、信頼性が高い半導体装置である。
The liquid resin composition for underfill of the present invention has a low viscosity and can be filled and sealed in a short time, and is superior in productivity to the conventional semiconductor device manufacturing process. In addition, a semiconductor device manufactured using the liquid resin composition for underfill of the present invention has very few voids and is a highly reliable semiconductor device.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J002 CD021 CD051 CD061 CD081 CD131 DJ016 EN077 FD016 FD147 GQ05 4J036 AA01 AD08 AD21 AF06 AF08 AG01 AG03 AG13 AH01 AH04 AH15 AJ08 DC04 DC10 FA01 FA05 JA07 KA01 4M109 AA01 BA03 BA07 CA05 EA03 EB02 EB12 EC20 GA10  ──────────────────────────────────────────────────続 き Continued on front page F-term (reference) 4J002 CD021 CD051 CD061 CD081 CD131 DJ016 EN077 FD016 FD147 GQ05 4J036 AA01 AD08 AD21 AF06 AF08 AG01 AG03 AG13 AH01 AH04 AH15 AJ08 DC04 DC10 FA01 FA05 JA07 KA01 4M109 AAEBEA03BA03 EC20 GA10

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 一般式(1)で表される芳香族ジアミン
とビスフェノール型エポキシ樹脂、ノボラック型エポキ
シ樹脂、クレゾールエポキシ樹脂、環状脂肪族エポキシ
樹脂、グリシジルエステル系樹脂、グリシジルアミン系
樹脂から選択されるエポキシ樹脂からなる樹脂成分
(A)及び無機フィラー(B)からなることを特徴とす
る低粘度アンダーフィル用液状樹脂組成物。 【化1】
1. An aromatic diamine represented by the general formula (1) and a bisphenol epoxy resin, a novolak epoxy resin, a cresol epoxy resin, a cyclic aliphatic epoxy resin, a glycidyl ester resin, or a glycidylamine resin. A low-viscosity underfill liquid resin composition comprising a resin component (A) comprising an epoxy resin and an inorganic filler (B). Embedded image
【請求項2】 エポキシ樹脂がビスフェノール型エポキ
シ樹脂である請求項1記載の低粘度アンダーフィル用液
状樹脂組成物。
2. The low-viscosity underfill liquid resin composition according to claim 1, wherein the epoxy resin is a bisphenol-type epoxy resin.
【請求項3】 樹脂成分(A)と無機フィラー(B)の
合計に占める無機フィラー(B)の重量割合が0.2〜
0.7である請求項1記載の低粘度アンダーフィル用液
状樹脂組成物。
3. The weight ratio of the inorganic filler (B) to the total of the resin component (A) and the inorganic filler (B) is from 0.2 to 0.2.
The low viscosity underfill liquid resin composition according to claim 1, which is 0.7.
【請求項4】 請求項1〜3のいずれかに記載の低粘度
アンダーフィル用液状樹脂組成物を用いて作製した半導
体装置。
4. A semiconductor device manufactured by using the liquid resin composition for underfill underfill according to claim 1.
JP2001086925A 2001-03-26 2001-03-26 Liquid resin composition and semiconductor device Pending JP2002284849A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001086925A JP2002284849A (en) 2001-03-26 2001-03-26 Liquid resin composition and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001086925A JP2002284849A (en) 2001-03-26 2001-03-26 Liquid resin composition and semiconductor device

Publications (1)

Publication Number Publication Date
JP2002284849A true JP2002284849A (en) 2002-10-03

Family

ID=18942233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001086925A Pending JP2002284849A (en) 2001-03-26 2001-03-26 Liquid resin composition and semiconductor device

Country Status (1)

Country Link
JP (1) JP2002284849A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007050611A1 (en) * 2005-10-25 2007-05-03 Henkel Corporation Low exothermic thermosetting resin compositions useful as underfill sealants and having reworkability
US20100244279A1 (en) * 2009-03-31 2010-09-30 Namics Corporation Liquid resin composition for underfill, flip-chip mounted body and method for manufacturing the same
JP2013067814A (en) * 2013-01-08 2013-04-18 Hitachi Chemical Co Ltd Method for manufacturing resin-sealed semiconductor device, and resin-sealed semiconductor device
US8545667B2 (en) 2006-10-06 2013-10-01 Henkel Ag & Co. Kgaa Pumpable epoxy paste adhesives resistant to wash-off
US8673108B2 (en) 2006-07-31 2014-03-18 Henkel Ag & Co. Kgaa Curable epoxy resin-based adhesive compositions
JP2014196521A (en) * 2014-07-25 2014-10-16 日立化成株式会社 Liquid epoxy resin composition and electronic part device
US20140377539A1 (en) * 2012-02-17 2014-12-25 Hitachi,Ltd. Electrical Insulation Resin Composition, Cured Product Thereof, Methods of Preparing the Composition and the Product, and High Voltage Apparatuses and Power Transmission and Distribution Apparatuses Using the Composition and the Product
JP2015110803A (en) * 2015-02-26 2015-06-18 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015180759A (en) * 2015-07-22 2015-10-15 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015180760A (en) * 2015-07-22 2015-10-15 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015193851A (en) * 2015-07-22 2015-11-05 日立化成株式会社 Liquid epoxy resin composition and electronic part device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8075721B2 (en) * 2005-10-25 2011-12-13 Henkel Corporation Low exothermic thermosetting resin compositions useful as underfill sealants and having reworkability
WO2007050611A1 (en) * 2005-10-25 2007-05-03 Henkel Corporation Low exothermic thermosetting resin compositions useful as underfill sealants and having reworkability
KR101308307B1 (en) * 2005-10-25 2013-09-17 헨켈 코포레이션 Low exothermic thermosetting resin compositions useful as underfill sealants and having reworkability
US8673108B2 (en) 2006-07-31 2014-03-18 Henkel Ag & Co. Kgaa Curable epoxy resin-based adhesive compositions
US8545667B2 (en) 2006-10-06 2013-10-01 Henkel Ag & Co. Kgaa Pumpable epoxy paste adhesives resistant to wash-off
US20100244279A1 (en) * 2009-03-31 2010-09-30 Namics Corporation Liquid resin composition for underfill, flip-chip mounted body and method for manufacturing the same
US20140377539A1 (en) * 2012-02-17 2014-12-25 Hitachi,Ltd. Electrical Insulation Resin Composition, Cured Product Thereof, Methods of Preparing the Composition and the Product, and High Voltage Apparatuses and Power Transmission and Distribution Apparatuses Using the Composition and the Product
JP2013067814A (en) * 2013-01-08 2013-04-18 Hitachi Chemical Co Ltd Method for manufacturing resin-sealed semiconductor device, and resin-sealed semiconductor device
JP2014196521A (en) * 2014-07-25 2014-10-16 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015110803A (en) * 2015-02-26 2015-06-18 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015180759A (en) * 2015-07-22 2015-10-15 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015180760A (en) * 2015-07-22 2015-10-15 日立化成株式会社 Liquid epoxy resin composition and electronic part device
JP2015193851A (en) * 2015-07-22 2015-11-05 日立化成株式会社 Liquid epoxy resin composition and electronic part device

Similar Documents

Publication Publication Date Title
US6083774A (en) Method of fabricating a flip chip mold injected package
JP4887850B2 (en) Liquid resin composition for underfill, semiconductor device manufacturing method using the same, and semiconductor device
JP6800140B2 (en) Flip-chip mount manufacturing method, flip-chip mount, and pre-supplied underfill resin composition
JP2002284849A (en) Liquid resin composition and semiconductor device
JP4816333B2 (en) Manufacturing method of semiconductor device
JP3351974B2 (en) Liquid injection underfill material
JPH10231351A (en) Liquid injection sealing underfilling material
EP1966306A1 (en) Low exothermic thermosetting resin compositions useful as underfill sealants and having reworkability
JP3958102B2 (en) Liquid encapsulating resin composition, semiconductor device manufacturing method, and semiconductor device
JP5449860B2 (en) Method for producing surface-treated silica particles, surface-treated silica particles, epoxy resin composition, and semiconductor device
JP2002097254A (en) Epoxy resin composition and semiconductor device
JP2001106767A (en) Resin paste for semiconductor and semiconductor device using the same
JPH11288979A (en) Manufacture of semiconductor device
JPH1129624A (en) Semiconductor sealing liquid epoxy resin composition
JP2003212963A (en) Thermosetting liquid sealing resin composition and semiconductor device
JP3555930B2 (en) Resin paste for semiconductor and semiconductor device using the same
JP2000036506A (en) Manufacture of semiconductor device
JP2001106873A (en) Resin paste for semiconductor and semiconductor device using the same
JP4112306B2 (en) Liquid encapsulating resin composition, semiconductor device using the same, and method for manufacturing semiconductor device
JP4940486B2 (en) Epoxy resin composition, semiconductor device and manufacturing method thereof
JP3422446B2 (en) Semiconductor device manufacturing method
JPH10242211A (en) Manufacturing method of semiconductor device
JP2004256646A (en) Resin composition for underfilling, and semiconductor device
JP2003342449A (en) Liquid resin composition, method for producing the same, and semiconductor device
JP2004090021A (en) Hardenable flux

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050914

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060110

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060509