JP2002249839A - Alloy composition for high-density longitudinal magnetic recording medium - Google Patents

Alloy composition for high-density longitudinal magnetic recording medium

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Publication number
JP2002249839A
JP2002249839A JP2001029888A JP2001029888A JP2002249839A JP 2002249839 A JP2002249839 A JP 2002249839A JP 2001029888 A JP2001029888 A JP 2001029888A JP 2001029888 A JP2001029888 A JP 2001029888A JP 2002249839 A JP2002249839 A JP 2002249839A
Authority
JP
Japan
Prior art keywords
thin film
recording medium
texture
magnetic recording
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001029888A
Other languages
Japanese (ja)
Other versions
JP3412133B2 (en
Inventor
Ho Shin Kyun
キュン・ホ・シン
Jun Son Ha
ハ・ジュン・ソン
Ju Kuwon Soon
ソーン・ジュ・クォン
Yoru Hon Soo
ソー・ヨル・ホン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Institute of Science and Technology KIST
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Korea Institute of Science and Technology KIST
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Publication of JP2002249839A publication Critical patent/JP2002249839A/en
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Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/07Alloys based on nickel or cobalt based on cobalt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Hard Magnetic Materials (AREA)
  • Thin Magnetic Films (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method for a nonmagnetic Co-Cr alloy thin film having hexagonal close-packed(hcp) structure by which an tough (10.0) texture can be spontaneously induced by adding a specified element even in the case of vapor deposition onto an amorphous substrate. SOLUTION: A thin-film material used in this method is composed of Co-Cr- Mn alloy, and, when a proper amount of Mn is added, the texture of the alloy thin film is changed from (0002) or random to (10.0). Owning to such a phenomenon where the c-axis of hcp is spontaneously arranged parallel to the thin-film surface, a magnetic recording medium can be manufactured using only a material having hcp structure when this material is applied to a longitudinal magnetic recording medium, and improvement in many characteristics can be expected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高密度な水平磁気記
録媒体用の合金組成物に関し、より詳しくはCoCr系
磁性層と同一な六方最密(hcp)の結晶構造を有しな
がらも、c軸が薄膜面に平行な特性を示すため高記録密
度を実現することができる磁気記録媒体用の合金組成物
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alloy composition for a high-density horizontal magnetic recording medium, and more particularly to a c-type alloy layer having the same hexagonal close-packed (hcp) crystal structure as a CoCr-based magnetic layer. The present invention relates to an alloy composition for a magnetic recording medium capable of realizing a high recording density because its axis is parallel to a thin film surface.

【0002】[0002]

【従来の技術】現在、代表的な磁気記録媒体材料として
用いられているCoCr系合金は六方最密(hcp)構
造を有し、水平記録方式では磁化容易軸であるc軸を薄
膜面上に平行によく配向させることが最も基本的な問題
だと言える。
2. Description of the Related Art CoCr-based alloys currently used as typical magnetic recording medium materials have a hexagonal close-packed (hcp) structure. In the horizontal recording system, the c-axis, which is the axis of easy magnetization, is formed on the thin film surface. It can be said that the most basic problem is to orient parallel.

【0003】そのため、現在に至るまで主として体心立
方構造(bcc)を有する材料が下地層として用いられ
ている。しかし、たとえこれら下地層の材料がCoCr
系磁性体のc軸配向や微細構造的な側面から多くの効果
を奏しているとしても、根本的に磁性層との結晶構造が
互いに異なるため、磁性層と下地層間の不一致や初期遷
移磁性層の存在など記録特性を更に向上させるために解
決せねばならない問題はたくさんある。特に、初期遷移
層の存在は磁性層の厚さが薄くなる場合その影響が更に
増大するため、高密度な磁気記録のための低Mrt[M
rt;残留磁化(Mr)と媒体の磁性層厚さ(t)との
積]領域にてその重要性が特に大きいものと言える。
[0003] Therefore, a material having a body-centered cubic structure (bcc) has been used as an underlayer until now. However, even if the material of these underlayers is CoCr
Even if many effects are obtained from the c-axis orientation and microstructural aspects of the system magnetic material, the crystal structure of the magnetic layer is fundamentally different from that of the magnetic layer. There are many problems that need to be solved in order to further improve the recording characteristics, such as the presence of the image. In particular, the influence of the presence of the initial transition layer is further increased when the thickness of the magnetic layer is reduced, so that a low Mrt [M
rt; product of remanent magnetization (Mr) and magnetic layer thickness (t) of medium].

【0004】hcp系列の合金を磁気記録媒体の磁性層
の直ぐ下に蒸着させる場合、既存のbcc系列の合金と
比べて層間不一致が減り、磁性層のc軸配向度が向上さ
れ、相対的に磁性特性が劣悪な初期遷移層が減少し磁性
特性が更に向上されるということが一般的な報告であ
る。
[0004] When an hcp series alloy is deposited immediately below a magnetic layer of a magnetic recording medium, interlayer mismatch is reduced as compared with an existing bcc series alloy, and the degree of c-axis orientation of the magnetic layer is improved. It is a general report that the initial transition layer having poor magnetic properties is reduced and the magnetic properties are further improved.

【0005】従って、自発的にc軸が薄膜面に配向する
hcp合金薄膜は、既存のbcc系列の下地層を用いず
とも記録メディアを作ることができるため、新たな下地
層又は根底材料として応用可能性が大きいと言える。
Therefore, the hcp alloy thin film in which the c-axis is spontaneously oriented to the thin film surface can be used as a new underlayer or a new underlying material because a recording medium can be made without using an existing bcc-based underlayer. It can be said that the possibility is great.

【0006】[0006]

【発明が解決しようとする課題】そのためには非磁性h
cp材料からc軸が薄膜面に平行に配向される材料を作
らねばならぬが、本発明者は、適正組成のCoCrMn
合金によりc軸が薄膜面に平行に配向される強い(1
0.0)集合組織が形成され得ることを発見し、本発明
を完成した。ここで、(10.0)とは(1010)
で、左から3番目の1の上にバーを付した結晶面を意味
する。
For this purpose, a non-magnetic h
From the cp material, a material in which the c-axis is oriented parallel to the thin film surface must be made.
The c-axis is oriented parallel to the thin film surface by the alloy.
0.0) We discovered that a texture could be formed and completed the present invention. Here, (10.0) means (1010)
Means a crystal plane with a bar on the third 1 from the left.

【0007】従って、本発明の目的は従来のbcc系列
下地層が有する問題点を改善するために案出されたもの
として、CoCr系磁性層と同一な六方最密(hcp)
の結晶構造を有しながらも、c軸が薄膜面に平行な特性
を示すため高記録密度を実現することができる磁気記録
媒体用の合金組成物を提供しようとするものである。
Therefore, an object of the present invention was devised to improve the problems of the conventional bcc-based underlayer, and it was proposed that the same hexagonal closest packing (hcp) as that of the CoCr-based magnetic layer be used.
It is an object of the present invention to provide an alloy composition for a magnetic recording medium capable of realizing a high recording density because the c-axis shows a characteristic parallel to the thin film surface while having the crystal structure of the above.

【0008】[0008]

【課題を解決するための手段】前記の目的を達成するた
めに本発明によると、一般式CoxCryMnzとして表
示される磁気記録媒体用の合金組成物が提供される。前
記式の内、xは原子%で55以上64以下であり、yは
原子%で26以上37以下であり、zは原子%で5以上
12以下であり、x+y+z=100である。
According to the present invention, in order to solve the problems] To achieve the above object, the alloy composition for a magnetic recording medium which is displayed as the general formula Co x Cr y Mn z is provided. In the above formula, x is 55 to 64 in atomic%, y is 26 to 37 in atomic%, z is 5 to 12 in atomic%, and x + y + z = 100.

【0009】前記CoCrMn合金薄膜は、SiO2
ような非晶質基板上で基板温度を約100℃以上に維持
したままスパッタリング蒸着させると蒸着パワーやアル
ゴンガスの圧力のような他の工程変数に大きく関わらず
(10.0)集合組織を形成する。
When the CoCrMn alloy thin film is sputter-deposited on an amorphous substrate such as SiO 2 while maintaining the substrate temperature at about 100 ° C. or higher, other process variables such as the deposition power and the pressure of the argon gas are reduced. Regardless of the size, a (10.0) texture is formed.

【0010】本発明による前記の組成領域の内、強い
(10.0)集合組織が形成されるためのより望ましい
CoCrMn合金薄膜の組成領域は、前記式CoxCry
Mnzで、xは原子%で57以上63以下であり、yは
原子%で28以上34以下であり、zは原子%で7以上
11以下の値を有する領域である。
[0010] Among the composition region according to the present invention, a strong (10.0) composition region of more desirable CoCrMn alloy thin film for texture is formed, the formula Co x Cr y
In Mn z, x is at least 57 63 or less in atomic%, y is at 28 or more 34 or less in atomic%, z is a region having 7 to 11 values in atomic%.

【0011】[0011]

【発明の実施の形態】以下に、本発明を実施例に基づい
てより具体的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described more specifically based on embodiments.

【0012】(第1実施の形態)日本ANELVA社の
モデル名SPF−312H直流マグネトロンスパッタリ
ング装備を用いてCoCrMn合金薄膜を製造した。基
板はコーニング社製のコーニンク7059ガラスと表面
に約200nmの熱酸化層のあるSiO2/Si(10
0)を用いたが両基板とも同一な集合組織が観察され
た。
(First Embodiment) A CoCrMn alloy thin film was manufactured by using a DC magnetron sputtering device of model name SPF-312H manufactured by Anelva Japan. The substrate was Corning 7059 glass manufactured by Corning and SiO 2 / Si (10
Although 0) was used, the same texture was observed on both substrates.

【0013】基板温度は200℃にし、蒸着させる時の
パワーは100W、アルゴンガスの圧力は10mTor
rであった。蒸着を始める前の初期真空度は5×10-7
orr以下に維持した。
[0013] substrate temperature to 200 ° C., power is 100W, the pressure of the argon gas when depositing the 10mTor
r. Initial vacuum before starting deposition is 5 × 10 -7
orr.

【0014】薄膜の組成は、Co73Cr17ターゲットや
Co65Cr35ターゲット上にCrとMnチップを用いて
変化させた。集合組織の分析のための薄膜試料は厚さ1
00nmに固定し、成分分析はICPとAAS、集合組
織の分析はXRDを用いて行った。
The composition of the thin film was changed on a Co 73 Cr 17 target or a Co 65 Cr 35 target using Cr and Mn chips. The thin film sample for texture analysis has a thickness of 1
The sample was fixed at 00 nm, component analysis was performed using ICP and AAS, and texture analysis was performed using XRD.

【0015】前記の如く製造されたCoCrMn薄膜の
組成による集合組織の変化を図1に示した。図1にて分
かるように、Mnの量が段々増加するに連れて最初のC
oCrの場合[図1の(a)]で示されていたランダム
集合組織が段々とc軸が薄膜面に平行に配向する方へと
発展されることが分かる[図1の(c)図示]。
FIG. 1 shows a change in texture according to the composition of the CoCrMn thin film manufactured as described above. As can be seen from FIG. 1, as the amount of Mn increases, the first C
In the case of oCr, it can be seen that the random texture shown in (a) of FIG. 1 is gradually developed so that the c-axis is oriented parallel to the thin film surface (shown in (c) of FIG. 1). .

【0016】このようにCoCrMnの組成を体系的に
変化させながらc軸が薄膜面に平行に成長する組成領域
[強い(10.0)集合組織を示す組成領域]を図2の
Co−Cr−Mn三元系状態図上に示した。図2の状態
図上の黒い点で表示した部分が強い(10.0)集合組
織を示す領域だが比較的に狭い領域に渡っていることが
分かる。
As described above, the composition region where the c-axis grows parallel to the thin film surface while the composition of CoCrMn is systematically changed [composition region showing a strong (10.0) texture] is shown in FIG. It is shown on the Mn ternary phase diagram. It can be seen that the portion indicated by a black dot on the state diagram of FIG. 2 is a region showing a strong (10.0) texture but extends over a relatively narrow region.

【0017】(第2実施の形態)蒸着条件がCoCrM
n薄膜に及ぼす影響を確かめるために、第1実施の形態
にて求めた組成の内、Co58Cr33Mn9[図1の
(c)、以下別途の言及が無い場合、CoCrMnはこ
の組成を意味する]を選択し蒸着パワーを100−30
0W、アルゴンガスの圧力を5−10mTorrに変化
させながら薄膜を製造した。薄膜の厚さは100nmに
固定し、基板の温度は200℃で蒸着させた。
(Second Embodiment) The deposition condition is CoCrM
In order to confirm the effect on the n-thin film, Co 58 Cr 33 Mn 9 [(c) in FIG. 1, unless otherwise specified, CoCrMn has the same composition as the composition determined in the first embodiment. Means] and the deposition power is 100-30
A thin film was manufactured while changing the pressure of 0 W and argon gas to 5 to 10 mTorr. The thickness of the thin film was fixed at 100 nm, and the temperature of the substrate was deposited at 200 ° C.

【0018】その結果を図3に示したが、CoCrMn
合金薄膜の集合組織は蒸着パワーやアルゴンガスの圧力
には大きな変化を受けないことが分かる。
FIG. 3 shows the results.
It can be seen that the texture of the alloy thin film is not significantly changed by the deposition power or the pressure of the argon gas.

【0019】図4は、蒸着パワーとアルゴンガスの圧力
をそれぞれ100W、10mTorrに固定し基板温度
を上げながらCoCrMnを100nm蒸着させた結果
である。常温にて蒸着させた時には弱い(0002)ピ
ークが示されるが、基板温度が100℃以上では(1
0.0)ピークが優勢に示されることが分かる。
FIG. 4 shows the result of depositing 100 nm of CoCrMn while raising the substrate temperature while fixing the deposition power and the pressure of the argon gas at 100 W and 10 mTorr, respectively. A weak (0002) peak is shown when vapor deposition is performed at room temperature, but when the substrate temperature is 100 ° C or higher, (1)
0.0) It can be seen that the peak is predominantly shown.

【0020】以上の実験結果からCoCrMnが比較的
に狭い組成範囲だけで(10.0)集合組織を示すが製
造工程には大きな影響を受けないことが分かる。このよ
うな特性は、実際記録媒体用の多層薄膜を製造する時の
製造工程上、かなりの融通性を提供するものとして応用
側面において有利に作用するものと思われる。
From the above experimental results, it can be seen that CoCrMn shows a (10.0) texture only in a relatively narrow composition range, but is not significantly affected by the manufacturing process. Such characteristics are considered to provide a great deal of flexibility in the production process when actually producing a multilayer thin film for a recording medium, and thus it is thought to advantageously work in application aspects.

【0021】(第3実施の形態)本発明にて提案された
CoCrMn薄膜の実際の応用可能性を確かめるために
水平磁気記録方式にて用いられる代表的な下地層の材料
であるCrとその特性を比較した。
(Third Embodiment) In order to confirm the practical applicability of the CoCrMn thin film proposed in the present invention, a typical underlayer material Cr used in a horizontal magnetic recording system and its characteristics are described. Were compared.

【0022】磁性層はCoCrPtを用いて、磁性層の
厚さを30nm、下地層の厚さを10nmにした。基板
はコーニング7059ガラスを用いた。
The magnetic layer was made of CoCrPt, and the thickness of the magnetic layer was 30 nm and the thickness of the underlayer was 10 nm. The substrate used was Corning 7059 glass.

【0023】製造したサンプルの磁気的特性変化を表1
に整理した。下記表1中のHcは保磁力、S*は保磁力
角形比、そしてSは角形比を意味する。
Table 1 shows changes in magnetic properties of the manufactured samples.
Organized. In Table 1 below, Hc is the coercive force, S * is the coercive force squareness, and S is the squareness ratio.

【0024】[0024]

【表1】 表1にて示されるとおり、下地層としてCoCrMnを
用いた場合、Cr下地層と比べて保磁力が約24%程、
向上された。
[Table 1] As shown in Table 1, when CoCrMn was used as the underlayer, the coercive force was about 24% lower than that of the Cr underlayer.
Improved.

【0025】図5は透過電子顕微鏡を用いて下地層によ
る微細構造の変化を確かめたものである。一般的に磁性
層の微細構造は下地層により影響を大きく受けるが、高
密度な記録のためには磁性層の結晶粒サイズが小さく均
一でなければならない。図5から、CoCrMn下地層
を用いた場合の磁性層の平均結晶粒サイズは、Cr下地
層を用いた場合と似ているが、結晶粒のサイズ分布がC
r下地層と比べて均一であることが分かる。このように
磁性層の結晶粒のサイズが均一であれば媒体のノイズ減
少に有利である。
FIG. 5 shows changes in the fine structure caused by the underlayer using a transmission electron microscope. Generally, the fine structure of the magnetic layer is greatly affected by the underlayer, but for high-density recording, the magnetic layer must have a small and uniform crystal grain size. FIG. 5 shows that the average crystal grain size of the magnetic layer when the CoCrMn underlayer is used is similar to that when the Cr underlayer is used, but the crystal grain size distribution is C
It turns out that it is uniform compared with r underlayer. The uniform size of the crystal grains of the magnetic layer is advantageous for reducing noise of the medium.

【0026】図6の(a),(b)は、それぞれCr薄
膜およびCoCrMn薄膜をCoCrPt磁性層の下地
層として用いた場合のCoCrPt磁性層と下地層間の
界面構造を示す写真である。Cr下地層の場合(図6の
(a))は、磁性層との間に薄い遷移層が存在するのと
比べて、CoCrMnの場合(図6の(b))にはCr
下地層に比べて非常にきれいな界面を示している。
FIGS. 6A and 6B are photographs showing the interface structure between the CoCrPt magnetic layer and the underlayer when the Cr thin film and the CoCrMn thin film are used as the underlayer of the CoCrPt magnetic layer, respectively. In the case of a Cr underlayer (FIG. 6 (a)), a thin transition layer exists between the magnetic underlayer and the CoCrMn (FIG. 6 (b)).
It shows a very clean interface compared to the underlayer.

【0027】磁性層で遷移層の磁性特性は他の部分と比
べて相対的に劣悪なため遷移層の存在は全体的な記録特
性に悪影響を与えることになる。記録密度の向上のため
には磁性層の厚さが段々薄くならねばならないため、こ
のような遷移層の有無が実際記録媒体を製造する時かな
り重要なものとなる。
Since the magnetic properties of the transition layer in the magnetic layer are relatively inferior to other parts, the presence of the transition layer adversely affects the overall recording characteristics. In order to improve the recording density, the thickness of the magnetic layer must be gradually reduced. Therefore, the presence or absence of such a transition layer is considerably important when actually manufacturing a recording medium.

【0028】[0028]

【発明の効果】本発明により製造されたCoCrMn薄
膜は、磁性層と同一なhcp構造を有しながらも、c軸
が薄膜面に平行に配列する特性とCr下地層のような既
存のbcc系列下地層と比べて磁性層の微細構造や層間
界面構造でも高記録密度を実現するのに有利な特性とを
示し、これからもその応用可能性が大きいものと思われ
る。
The CoCrMn thin film manufactured according to the present invention has the same hcp structure as the magnetic layer, but the c-axis is arranged parallel to the thin film surface, and the existing bcc series such as Cr underlayer. Compared to the underlayer, the magnetic layer has a more advantageous characteristic for realizing a high recording density even in the fine structure and the interlayer interface structure of the magnetic layer, and it is considered that its application potential will be great in the future.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるCoCrMn合金組成物の組成変
化による集合組織の変化を示すグラフ図。
FIG. 1 is a graph showing a change in texture due to a change in the composition of a CoCrMn alloy composition according to the present invention.

【図2】基板温度200℃で蒸着させる時の強い(1
0.0)集合組織を示すCoCrMn合金組成領域を示
すグラフ図。
FIG. 2 shows a strong (1)
0.0) A graph showing a CoCrMn alloy composition region showing a texture.

【図3】スパッタリングでCo58Cr33Mn19からなる
100nmの合金薄膜を製造する時蒸着パワーとアルゴ
ンガスの圧力変化が薄膜の集合組織に与える影響を示す
グラフ図。
FIG. 3 is a graph showing the effect of changes in deposition power and argon gas pressure on the texture of the thin film when a 100 nm alloy thin film made of Co 58 Cr 33 Mn 19 is produced by sputtering.

【図4】スパッタリングでCo58Cr33Mn19からなる
100nmの合金薄膜を製造する時の基板温度が薄膜の
集合組織に与える影響を示すグラフ図。
FIG. 4 is a graph showing the effect of the substrate temperature on the texture of the thin film when producing a 100 nm alloy thin film made of Co 58 Cr 33 Mn 19 by sputtering.

【図5】Cr薄膜およびCoCrMn薄膜をそれぞれC
oCrPt磁性層の下地層として用いた時のCoCrP
t磁性層の微細構造写真と結晶粒サイズ分布を示すグラ
フ図。
FIG. 5 shows that a Cr thin film and a CoCrMn thin film
CoCrP when used as an underlayer of oCrPt magnetic layer
FIG. 4 is a graph showing a microstructure photograph and a crystal grain size distribution of a t-magnetic layer.

【図6】Cr薄膜およびCoCrMn薄膜をそれぞれC
oCrPt磁性層の下地層として用いた場合のCoCr
Pt磁性層と下地層間の界面構造を示す写真。
FIG. 6 shows that a Cr thin film and a CoCrMn thin film are respectively C
CoCr when used as an underlayer of oCrPt magnetic layer
4 is a photograph showing an interface structure between a Pt magnetic layer and an underlayer.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01F 10/16 H01F 1/04 S (72)発明者 ハ・ジュン・ソン 大韓民国、クァンヨク−シ、クァンジュ、 ナム−ク、ボンスン−ドン、ライン・サー ド・アパートメント 302−603 (72)発明者 ソーン・ジュ・クォン 大韓民国、キョンブク、ポハン−シ、ナム −ク、ジゴク−ドン、プロフェッサー・ア パートメント 7−1303 (72)発明者 ソー・ヨル・ホン アメリカ合衆国、カリフォルニア州 94086、サニーベール、エム111、サウス・ フェア・オークス・アベニュー 655 Fターム(参考) 4K029 BA24 BC06 BD11 DC04 5D006 BB02 BB07 EA03 5E040 AA14 AA19 CA06 HB15 NN01 5E049 AA04 AA09 BA06 DB06 HC02──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme court ゛ (Reference) H01F 10/16 H01F 1/04 S (72) Inventor Ha Jun Sung In Korea, Gwangyoku-shi, Gwangju Nam-k, Bong-sung-Dong, Rhine-Sard Apartment 302-603 1303 (72) Inventor So Yoru Hong United States, 94086, California, Sunnyvale, M111, South Fair Oaks Avenue 655 F term (reference) 4K029 BA24 BC06 BD11 DC04 5D006 BB02 BB07 EA03 5E040 AA14 AA19 CA06 HB15 NN01 5E049 AA04 AA09 BA06 DB06 HC0 Two

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一般式CoxCryMnzとして表示さ
れ、前記式の内、xは原子%で55以上64以下であ
り、yは原子%で26以上37以下であり、zは原子%
で5以上12以下であり、x+y+z=100であるこ
とを特徴とする磁気記録媒体用の合金組成物。
1. A appears as the general formula Co x Cr y Mn z, of said formula, x is 55 or more 64 or less in atomic%, y is 26 or more 37 or less in atomic%, z is the atomic%
5 to 12 and x + y + z = 100.
【請求項2】 前記xは、原子%で57以上63以下で
あり、前記yは原子%で28以上34以下であり、前記
zは原子%で7以上11以下であり、x+y+z=10
0であることを特徴とする請求項1記載の磁気記録媒体
用の合金組成物。
2. The x is 57 to 63 in atomic%, the y is 28 to 34 in atomic%, the z is 7 to 11 in atomic%, and x + y + z = 10
The alloy composition for a magnetic recording medium according to claim 1, wherein the composition is 0.
JP2001029888A 2001-01-31 2001-02-06 Alloy for underlayer of high density horizontal magnetic recording media Expired - Fee Related JP3412133B2 (en)

Applications Claiming Priority (2)

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KR2001-4501 2001-01-31
KR10-2001-0004501A KR100390391B1 (en) 2001-01-31 2001-01-31 Alloy Compositions for Base Layer of High Density Longitudinal Magnetic Recording Media

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Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57155339A (en) * 1981-03-20 1982-09-25 Matsushita Electric Ind Co Ltd Magnetic head and production thereof
JPS60228637A (en) * 1984-04-25 1985-11-13 Toshiba Corp Co alloy for magnetic recording medium
JP2001312814A (en) * 2000-04-28 2001-11-09 Fuji Electric Co Ltd Magnetic recording medium

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