JP2002177766A - Atmospheric pressure plasma treating device provided with unit for recovering/reusing inert gas - Google Patents
Atmospheric pressure plasma treating device provided with unit for recovering/reusing inert gasInfo
- Publication number
- JP2002177766A JP2002177766A JP2000383321A JP2000383321A JP2002177766A JP 2002177766 A JP2002177766 A JP 2002177766A JP 2000383321 A JP2000383321 A JP 2000383321A JP 2000383321 A JP2000383321 A JP 2000383321A JP 2002177766 A JP2002177766 A JP 2002177766A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- inert gas
- helium
- atmospheric pressure
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、例えばポリエチレ
ンやポリプロピレン、ＰＴＦＥ（ポリ四フッ化エチレ
ン）などの撥水性を有する樹脂に塗料を塗布するとか水
性インクで印刷を施す際にその表面を親水性に改質した
り、プラスチックの表面に酸素のプラズマ処理によって
濡れ性を付与したり、ガラス、セラミックス、金属、半
導体等の疎水性表面を親水化したり、表面に付着した有
機物を洗浄したりするなどの表面処理を行なう場合に用
いられるプラズマ処理装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for applying a coating to a water-repellent resin such as polyethylene, polypropylene, PTFE (polytetrafluoroethylene) or the like when printing with a water-based ink. To improve wettability by applying oxygen plasma treatment to plastic surfaces, hydrophilize hydrophobic surfaces of glass, ceramics, metals, semiconductors, etc., and wash organic substances attached to the surfaces. The present invention relates to a plasma processing apparatus used when performing the surface treatment described above.
【０００２】[0002]
【従来の技術】上記のような表面改質や有機物洗浄等の
表面処理に用いられるプラズマ処理装置として、本出願
人は、例えば特願平１１−２６９２１１号や特願２００
０−２０８１６０号等で、ヘリウムを含む不活性ガスも
しくは不活性ガスと酸素あるいはフルオロカーボン系の
含フッ素化合物ガス等の反応性気体とを混合してなる反
応ガスを大気圧もしくは大気圧近傍（弱減圧または弱加
圧）圧力下で高圧電極と接地電極との間に形成される放
電部に導入し通過させるとともに両電極に高周波電圧を
印加することにより放電部にグロー放電プラズマを発生
させて該プラズマにより生成される化学的に活性な励起
種を含むガス流を被処理物の表面に向けて吹出して所定
の表面処理を行なうように構成された大気圧プラズマ処
理装置を既に提案している。2. Description of the Related Art As a plasma processing apparatus used for surface treatment such as surface modification and organic substance washing as described above, the present applicant has disclosed, for example, Japanese Patent Application Nos.
No. 0-208160 or the like, an inert gas containing helium or a reaction gas obtained by mixing an inert gas with a reactive gas such as oxygen or a fluorocarbon-based fluorine-containing compound gas is subjected to atmospheric pressure or near atmospheric pressure (slightly reduced pressure). Or weakly pressurized), the glow discharge plasma is generated in the discharge part by introducing and passing through a discharge part formed between the high-voltage electrode and the ground electrode and applying a high-frequency voltage to both electrodes. An atmospheric pressure plasma processing apparatus configured to perform a predetermined surface treatment by blowing a gas stream containing a chemically active excited species generated by the method toward a surface of an object to be processed has already been proposed.
【０００３】これら本出願人が既に提案しているプラズ
マ処理装置は大気圧下での表面処理が実現可能であっ
て、それ以前から採用されていた低圧グロー放電プラズ
マによる処理装置、例えば真空容器内に互いに対向状態
に配置した高圧電極と接地電極との間の放電部に酸素等
の放電用反応ガスを導入させて両電極に高周波電圧を印
加することにより低圧グロー放電プラズマを発生させ、
該プラズマにより生成される化学的に活性な励起種を含
むガスによって接地電極上に設置保持させた被処理物の
表面を処理するように構成されていたプラスマ処理装置
に比べて、真空系を形成するための装置及び設備が不要
であることから、装置全体の小型化および低コスト化が
図れるとともに、被処理物を電極上に設置する必要もな
いので、被処理物の面積や厚み、形状に対応させやす
く、多種多様な被処理物に対する表面処理に適用可能で
あり、また、生産プロセスのインラインへの組込みも容
易で生産性の向上も図れるといった多くの特長を有して
いる。[0003] The plasma processing apparatus proposed by the present applicant is capable of performing surface treatment under atmospheric pressure, and a processing apparatus using a low-pressure glow discharge plasma which has been employed before that, for example, a vacuum chamber. A low-pressure glow discharge plasma is generated by applying a high-frequency voltage to both electrodes by introducing a discharge reaction gas such as oxygen into a discharge portion between a high-voltage electrode and a ground electrode arranged in opposition to each other,
A vacuum system is formed as compared with a plasma processing apparatus that is configured to process the surface of an object to be processed installed and held on a ground electrode with a gas containing a chemically active excited species generated by the plasma. Since the apparatus and equipment for performing the processing are not required, the size and cost of the entire apparatus can be reduced, and the object to be processed does not need to be installed on the electrode. It has many features that it can be easily adapted, can be applied to surface treatment for a wide variety of workpieces, and can be easily incorporated into a production process in-line to improve productivity.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、本出願
人による既提案の大気圧プラズマ処理装置においては、
該大気圧プラズマ処理装置を設置したチャンバーからヘ
リウム等の不活性ガスを含む排気ガスの全てを気体のま
まで外部（大気）に排出していた。この排気ガスの成分
は不活性ガス、酸素、水蒸気が大半であり、大気汚染等
の問題は殆ど生じないものの、長時間連続してプラズマ
処理を行なう際、常時、必要量の新規かつ高純度のヘリ
ウム等の不活性ガスを供給消費しなければならず、これ
がランニングコストの上昇原因の一つであり、この点で
改良の余地が残されていた。However, in the atmospheric pressure plasma processing apparatus already proposed by the present applicant,
All of the exhaust gas including an inert gas such as helium was discharged to the outside (atmosphere) as it was from the chamber in which the atmospheric pressure plasma processing apparatus was installed. Most of the components of this exhaust gas are inert gas, oxygen, and water vapor, and while there is almost no problem such as air pollution, when performing plasma treatment continuously for a long time, the required amount of new and high-purity It is necessary to supply and consume an inert gas such as helium, which is one of the causes of an increase in running cost, and there is room for improvement in this respect.
【０００５】本発明は上記のような実情に鑑みてなされ
たもので、簡単な構成を付加することで排気ガス中の不
活性ガスを回収し循環再利用することを可能にし、連続
プラズマ処理時のランニングコストの低減に寄与するこ
とができる不活性ガス回収再利用装置付き大気圧プラズ
マ処理装置を提供することを目的としている。[0005] The present invention has been made in view of the above circumstances, and by adding a simple structure, it is possible to recover the inert gas in the exhaust gas and to recycle and recycle it, and to perform continuous plasma processing. It is an object of the present invention to provide an atmospheric pressure plasma processing apparatus with an inert gas recovery and reuse apparatus that can contribute to a reduction in running cost of the apparatus.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に、本発明に係る不活性ガス回収再利用装置付き大気圧
プラズマ処理装置は、高圧電極とこの高圧電極に絶縁体
を挟んで対向配置された接地電極との間に放電ギャップ
及び混合反応ガス噴出部が形成され、この放電ギャップ
及び混合反応ガス噴出部に、少なくともヘリウムを含む
不活性ガスもしくは不活性ガスと酸素またはフルオロカ
ーボン系の含フッ素化合物ガスを含む反応性気体との混
合反応ガスを大気圧もしくは大気圧近傍下で導入すると
ともに、両電極に高周波電圧を印加して放電ギャップに
グロー放電プラズマを発生させることにより、その放電
プラズマにより生成される化学的に活性な励起種を含む
ガス流を上記混合反応ガス噴出部の吹出口から被処理物
の表面に吹き出し照射させるように構成されている大気
圧プラズマ処理装置を設置したチャンバーに不活性ガス
を含む排気ガスの排出路を接続し、この排気ガス排出路
に、排気ガス中の不活性ガスに共存する不純物を除去す
る不純物除去装置を設置するとともに、不純物が除去さ
れた不活性ガスを強制回収し、かつ、その回収不活性ガ
スを上記大気圧プラズマ処理装置における不活性ガスま
たは混合反応ガスの供給通路に還流させて再利用するよ
うに構成していることを特徴とするものである。In order to achieve the above object, an atmospheric pressure plasma processing apparatus with an inert gas recovery and reuse device according to the present invention comprises a high pressure electrode and a high pressure electrode opposed to each other with an insulator interposed therebetween. A discharge gap and a mixed reaction gas ejection portion are formed between the discharge gap and the mixed reaction gas ejection portion, and an inert gas or an inert gas containing at least helium and oxygen or fluorocarbon-based fluorine are formed in the discharge gap and the mixed reaction gas ejection portion. A reaction gas containing a compound gas and a mixed reaction gas are introduced at or near atmospheric pressure, and a high-frequency voltage is applied to both electrodes to generate a glow discharge plasma in a discharge gap. A gas flow containing the generated chemically active excited species is blown out from the outlet of the mixed reaction gas blowout part onto the surface of the object to be processed. A discharge path for an exhaust gas containing an inert gas is connected to a chamber provided with an atmospheric pressure plasma processing apparatus configured to emit the impurities, and an impurity coexisting with the inert gas in the exhaust gas is connected to the exhaust gas discharge path. Is installed, and the inert gas from which the impurities are removed is forcibly recovered, and the recovered inert gas is supplied to the supply path of the inert gas or the mixed reaction gas in the atmospheric pressure plasma processing apparatus. It is characterized in that it is configured to be refluxed and reused.
【０００７】上記構成の本発明によれば、チャンバー内
に設置の大気圧プラズマ処理装置における放電ギャップ
に発生される放電プラズマにより生成される化学的に活
性な励起種を含むガス流を混合反応ガス噴出部の吹出口
から被処理物の表面に向けて吹き出し照射させることに
より、表面改質や有機物洗浄等の所定のプラズマ処理を
行ない、このプラズマ処理時にチャンバー内に放出され
るヘリウム等の不活性ガスを含む排気ガスは排出路に導
かれる。この排出路に導かれた排気ガスは不純物除去装
置に通され、ここで排気ガス中の不活性ガスに共存して
いる不要な水蒸気や酸素等の不純物が除去されてヘリウ
ム等の不活性ガスのみが回収され、その後、回収不活性
ガスが大気圧プラズマ処理装置における不活性ガスまた
は混合反応ガスの供給通路に還流されてプラズマ処理用
不活性ガスとして再利用されることになる。このように
連続プラズマ処理に必要な不活性ガスの大部分を循環再
使用することによって、新規な不活性ガスは不足分を補
給するだけの極く少量なものですみ、不活性ガスの無駄
な消費を抑えてランニングコストの低減を図ることが可
能である。According to the present invention having the above structure, a gas flow containing a chemically active excited species generated by a discharge plasma generated in a discharge gap in an atmospheric pressure plasma processing apparatus installed in a chamber is mixed with a reaction gas. Predetermined plasma processing such as surface modification and organic substance cleaning is performed by blowing and irradiating the surface of the object to be processed from the outlet of the blowing part, and inert gas such as helium released into the chamber during this plasma processing is performed. Exhaust gas containing gas is led to an exhaust path. The exhaust gas led to this discharge path is passed through an impurity removing device, where unnecessary impurities such as water vapor and oxygen coexisting with the inert gas in the exhaust gas are removed, and only an inert gas such as helium is removed. Is recovered, and thereafter, the recovered inert gas is returned to the supply path of the inert gas or the mixed reaction gas in the atmospheric pressure plasma processing apparatus, and is reused as the inert gas for plasma processing. By circulating and reusing most of the inert gas necessary for continuous plasma processing in this way, only a small amount of new inert gas is needed to replenish the shortage and waste of inert gas is reduced. It is possible to reduce running cost while suppressing consumption.
【０００８】上述の不純物除去装置としては、少なくと
も、排気ガス中の水分を冷却によって液化し除去するト
ラップと、水分除去後の排気ガスを通過させて酸素を除
去する酸素除去フィルターとを有するものを用いること
で、回収再利用される不活性ガスの成分を新規ガスとほ
とんど変わらない成分に保ち、循環再使用によるコスト
ダウンを図りながらも表面改質等の所定のプラズマ処理
性能を確実かつ安定よいものに維持することができる。The above-described impurity removing apparatus has at least a trap for liquefying and removing moisture in exhaust gas by cooling, and an oxygen removing filter for removing oxygen by passing exhaust gas after removing moisture. By using, the component of the inert gas to be recovered and reused is kept almost the same as that of the new gas, and the predetermined plasma processing performance such as surface reforming is reliably and stably performed while reducing the cost by circulating reuse. Things can be maintained.
【０００９】特に、回収対象とする不活性ガスがヘリウ
ムである場合の不純物除去装置として、排気ガス中の水
分を冷却によって液化し除去して粗ヘリウムとするトラ
ップと、その粗ヘリウムを冷却活性炭に通して高純度ヘ
リウムとするフィルターとを有するものを使用すること
により、回収再利用されるヘリウムの純度を高めること
が可能で、ヘリウムの循環再使用によるコストダウンを
図りながらも表面改質等の所定のプラズマ処理性能の安
定維持を一層確実なものとすることができる。In particular, as an impurity removing device when the inert gas to be recovered is helium, a trap that liquefies and removes moisture in exhaust gas to cool helium by cooling, and the crude helium is converted into cooled activated carbon By using a filter with high-purity helium through the filter, it is possible to increase the purity of helium that is recovered and reused. The stable maintenance of the predetermined plasma processing performance can be further ensured.
【００１０】[0010]
【発明の実施の形態】以下、本発明の実施の形態を図面
にもとづいて説明する。図１は本発明に係る不活性ガス
回収再利用装置付き大気圧プラズマ処理装置全体の構成
を示す系統図であり、この実施の形態では、回収対象と
する不活性ガスがヘリウムである場合について説明す
る。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a system diagram showing the overall configuration of an atmospheric pressure plasma processing apparatus with an inert gas recovery and reuse device according to the present invention. In this embodiment, a case where the inert gas to be recovered is helium will be described. I do.
【００１１】図１において、後述する大気圧プラズマ処
理装置２０はほぼ密閉されたチャンバー２１内に設置さ
れている。このチャンバー２１には排気ガス排出路２２
が接続されているとともに、その排気ガス排出路２２に
三方弁２３を介してダイヤフラムポンプ等の吸排気ポン
プ２４を備えたヘリウム強制回収路２５が接続されてい
る。In FIG. 1, an atmospheric pressure plasma processing apparatus 20, which will be described later, is installed in a substantially closed chamber 21. This chamber 21 has an exhaust gas exhaust passage 22
And a helium forced recovery passage 25 provided with an intake / exhaust pump 24 such as a diaphragm pump via a three-way valve 23 to the exhaust gas discharge passage 22.
【００１２】上記排気ガス排出路２２には、チャンバー
２１から吸引される排気ガス中のヘリウムに共存する水
分や酸素等の不純物を除去する不純物除去装置２６が設
置されている。この不純物除去装置２６としては、例え
ば二酸化炭素（ＣＯ2 ）で冷却したエタノール中にヘリ
ウムを混在する排気ガスを通過させて冷却することによ
り、その排気ガス中に含まれている水蒸気（Ｈ2 Ｏ）を
液化し除去して粗ヘリウムとする水分トラップ２６Ａ
と、その粗ヘリウムを液体窒素で冷却された活性炭に通
すことにより酸素等を除去して純度９９．９９５％のヘ
リウムとするフィルター２６Ｂとの少なくとも二段の不
純物除去装置を備えたものを用いことが望ましい。それ
以外に混合反応ガスに各種の薬品類を添加する場合は、
排気ガス中に含まれている各種薬品類を除去するトラッ
プを付加してもよいこともちろんである。The exhaust gas discharge passage 22 is provided with an impurity removing device 26 for removing impurities such as moisture and oxygen coexisting with helium in the exhaust gas sucked from the chamber 21. The impurity removing device 26 is cooled by passing an exhaust gas containing helium in ethanol cooled with, for example, carbon dioxide (CO 2 ), thereby cooling water vapor (H 2 O) contained in the exhaust gas. ) Is liquefied and removed to obtain crude helium.
And a filter 26B for removing oxygen and the like by passing the crude helium through activated carbon cooled with liquid nitrogen to obtain helium having a purity of 99.995%, and using a filter having at least two-stage impurity removing device. Is desirable. In addition, when adding various chemicals to the mixed reaction gas,
It goes without saying that a trap for removing various chemicals contained in the exhaust gas may be added.
【００１３】また、上記ヘリウム強制回収路２５には、
圧力計２７及び安全弁２８等を備えたヘリウム貯蔵タン
ク２９が接続されており、この貯蔵タンク２９の出口
を、開閉弁３０、逆止弁３１、圧力調整用減圧弁３２、
圧力計３３及び酸素またはフルオロカーボン系の含フッ
素化合物ガスを含む反応性気体との混合器３４等を備え
たヘリウム供給通路３５の途中に開閉弁３６を介して接
続することにより、貯蔵タンク２９に回収し貯蔵したヘ
リウムを大気圧プラズマ処理装置２０における混合反応
ガス供給通路に還流させて循環再利用するように構成し
ている。In the helium forced recovery path 25,
A helium storage tank 29 equipped with a pressure gauge 27 and a safety valve 28 is connected, and the outlet of the storage tank 29 is connected to an on-off valve 30, a check valve 31, a pressure regulating pressure reducing valve 32,
The helium supply passage 35 provided with a pressure gauge 33 and a mixer 34 with a reactive gas containing oxygen or a fluorocarbon-based fluorine-containing compound gas is connected to a storage tank 29 in the middle of a helium supply passage 35 via an on-off valve 36. The stored helium is recirculated to the mixed reaction gas supply passage in the atmospheric pressure plasma processing apparatus 20 to be circulated and reused.
【００１４】なお、上記排気ガス排出路２２の下流側部
分からヘリウム供給通路３５の混合器３４よりも上流側
部分までの間に位置する三方弁２３、吸排気ポンプ２
４、貯蔵タンク２９、開閉弁３６、減圧弁３２、圧力計
３３等は単一のボックス３７内に収納配置されている。The three-way valve 23 and the suction / exhaust pump 2 are located between the downstream portion of the exhaust gas discharge passage 22 and the upstream portion of the helium supply passage 35 with respect to the mixer 34.
4. The storage tank 29, the on-off valve 36, the pressure reducing valve 32, the pressure gauge 33 and the like are housed and arranged in a single box 37.
【００１５】上記のように構成された不活性ガス（ヘリ
ウム）回収再利用装置付き大気圧プラズマ処理装置にお
いては、チャンバー２１内に設置の大気圧プラズマ処理
装置２０における放電ギャップに発生される放電プラズ
マにより生成される化学的に活性な励起種を含むガス流
を混合反応ガス噴出部の吹出口から被処理物の表面に向
けて吹き出し照射させることにより表面改質や有機物洗
浄等の所定のプラズマ処理を行なう。このプラズマ処理
時にチャンバー２１内に放出されるヘリウムを含む排気
ガスは吸排気ポンプ２４を介して排出路２２に設置され
た不純物除去装置２６に導入される。In the atmospheric pressure plasma processing apparatus with the inert gas (helium) recovery and recycling apparatus configured as described above, the discharge plasma generated in the discharge gap in the atmospheric pressure plasma processing apparatus 20 installed in the chamber 21 A predetermined plasma treatment such as surface modification or organic matter washing is performed by irradiating a gas flow containing a chemically active excited species generated by the above from the outlet of the mixed reaction gas ejection part toward the surface of the object to be treated. Perform Exhaust gas containing helium released into the chamber 21 at the time of this plasma processing is introduced into the impurity removing device 26 provided in the exhaust passage 22 via the intake / exhaust pump 24.
【００１６】この不純物除去装置２６に導入された排気
ガスが、まず水分トラップ２６Ａにおいて冷却エタノー
ル中に通過されて冷却されることにより、その排気ガス
中に含まれている水蒸気（Ｈ2 Ｏ）が液化し除去されて
粗ヘリウムとなる。続いて、その粗ヘリウムがフィルタ
ー２６Ｂの冷却活性炭に通されることにより酸素等が除
去されて純度９９．９９５％のヘリウムとなり、その高
純度のヘリウムは強制回収路２５を経て貯蔵タンク２９
内に回収され貯蔵される。そして、貯蔵タンク２９内の
回収ヘリウムは開閉弁３６を経てヘリウム供給路３５に
導かれ混合器３４で酸素またはフルオロカーボン系の含
フッ素化合物ガスを含む反応性気体と混合されたのち、
大気圧プラズマ処理装置２０における反応ガス供給通路
（後述する）に還流されて不活性ガスのヘリウムとして
再利用されることになる。The exhaust gas introduced into the impurity removing device 26 is first passed through cooled ethanol in the moisture trap 26A and cooled, so that water vapor (H 2 O) contained in the exhaust gas is removed. It is liquefied and removed to become crude helium. Subsequently, the crude helium is passed through the cooling activated carbon of the filter 26B to remove oxygen and the like to become helium having a purity of 99.995%, and the high-purity helium passes through the forced recovery path 25 and is stored in the storage tank 29.
Collected and stored inside. Then, the recovered helium in the storage tank 29 is guided to the helium supply path 35 via the on-off valve 36 and mixed with the reactive gas containing oxygen or fluorocarbon-based fluorine-containing compound gas by the mixer 34.
The gas is returned to a reaction gas supply passage (described later) in the atmospheric pressure plasma processing apparatus 20 and is reused as helium as an inert gas.
【００１７】このように不活性ガスとして用いられるヘ
リウムは化学的に安定で他の元素と化合物を作らないと
いう特性を有しており、この特性を活用して排気ガス中
に含まれているヘリウムを不純物である他の排気ガス成
分から分離回収し、かつ、これを高純度ヘリウムに再生
した上で連続プラズマ処理を行なう際に必要なヘリウム
の大部分として循環再使用することによって、ヘリウム
供給路３５には不足分の新規ヘリウムを補給するだけで
よくなり、ヘリウムの無駄な消費を抑えてランニングコ
ストの低減を図りながら、所定のプラズマ処理を安定よ
く行なうことが可能である。Helium used as an inert gas in this way has the property of being chemically stable and not forming a compound with another element, and utilizing this property, helium contained in exhaust gas is utilized. Is separated and recovered from other exhaust gas components that are impurities, and is recycled and reused as most of the helium required when performing continuous plasma processing after regenerating it into high-purity helium. It is only necessary to replenish the shortage of new helium to 35, and it is possible to stably perform predetermined plasma processing while suppressing unnecessary consumption of helium and reducing running costs.
【００１８】なお、チャンバー２１内に設置する大気圧
プラズマ処理装置２０としては、大気圧もしくは大気圧
近傍（弱減圧または弱加圧）圧力下で混合反応ガスを供
給するだけで、グロー放電プラズマによりイオン、ラジ
カル等の化学的に活性な励起種を含む反応性ガス流を生
成しこれを被処理物の表面に向けて噴出可能なものであ
れば、どのような構造のものであってもよいが、以下、
その代表的な二つの例を図面とともに説明する。The atmospheric pressure plasma processing apparatus 20 installed in the chamber 21 simply supplies the mixed reaction gas under the atmospheric pressure or a pressure near the atmospheric pressure (weakly decompressed or weakly pressurized). Any structure may be used as long as it can generate a reactive gas stream containing chemically active excited species such as ions and radicals and eject the reactive gas stream toward the surface of the workpiece. But
Two representative examples will be described with reference to the drawings.
【００１９】図２〜図５は大気圧プラズマ処理装置２０
の一例を示す。この大気圧プラズマ処理装置２０は、中
実帯板状に形成された高圧電極１と、この高圧電極１の
厚み方向（図３のｘ−ｘ方向）の両側にそれぞれ、四弗
化樹脂板など帯状の絶縁板２，２を挟んで対向配置する
ことで上記高圧電極１に対して電気的に隔離してアース
接地された表裏一対の帯板状の接地電極３，３と、これ
ら高圧電極１、接地電極３，３及び絶縁板２，２のうち
短辺方向（図３及び図５のｚ−ｚ方向）の一端部側で高
圧電極１と接地電極３，３との間に形成される放電ギャ
ップ１５，１５及び混合反応ガス噴出通路（噴出部）１
６，１６を除く全体を包囲するように角Ｕ字形状に形成
されたアルミニウム製等のカバーケーシング４とからな
る。2 to 5 show an atmospheric pressure plasma processing apparatus 20.
An example is shown below. The atmospheric pressure plasma processing apparatus 20 includes a high voltage electrode 1 formed in a solid band plate shape and a tetrafluoride resin plate on both sides in the thickness direction (the xx direction in FIG. 3) of the high voltage electrode 1. A pair of front and back strip-shaped ground electrodes 3 and 3 electrically opposed to the high-voltage electrode 1 and grounded by being opposed to each other with the strip-shaped insulating plates 2 and 2 interposed therebetween. , The ground electrodes 3 and 3 and the insulating plates 2 and 2 are formed between the high-voltage electrode 1 and the ground electrodes 3 and 3 on one end side in the short side direction (the zz direction in FIGS. 3 and 5). Discharge gaps 15, 15 and mixed reaction gas ejection passage (ejection portion) 1
And a cover casing 4 made of aluminum or the like formed in a square U-shape so as to surround the whole except 6 and 16.
【００２０】上記高圧電極１の短辺方向（図３のｚ−ｚ
方向）の一端部分１Ａは、図３及び図４に示すように、
その両側面１ａ，１ａが先端部に近付くほど漸次接近す
るような傾斜面となる略二等辺三角形状に形成され、そ
の先端部は円弧状の湾曲面１ｂに形成されている。この
略二等辺三角形状部分１Ａの両側傾斜面１ａ，１ａ及び
先端湾曲面１ｂは、セラミックコーティングにより形成
される絶縁体９で被覆されている。The short side direction of the high voltage electrode 1 (z-z in FIG. 3)
Direction), as shown in FIG. 3 and FIG.
The sides 1a, 1a are formed in an approximately isosceles triangular shape having an inclined surface that gradually approaches as they approach the tip, and the tip is formed in an arcuate curved surface 1b. The inclined surfaces 1a, 1a on both sides and the curved end surface 1b of the substantially isosceles triangular portion 1A are covered with an insulator 9 formed by ceramic coating.
【００２１】一方、上記一対の接地電極３，３の各中実
内部には、図５に示すように、電極長辺方向（図５のｙ
−ｙ方向）の全長に亘る孔明け加工及びその孔両端部へ
の栓５の圧入固定（図５参照）によってヘリウムガスま
たはヘリウムガス及び水素を含む不活性ガスと酸素また
はフルオロカーボン系の含フッ素化合物ガスを含む反応
性気体との混合反応ガスを大気圧下で供給する反応ガス
供給通路６，６が電極長辺方向に沿わせて形成されてい
るとともに、該反応ガス供給通路６，６よりも上部の中
実内部には、電極長辺方向の全長に亘る孔明け加工及び
その孔両端部への栓７の圧入固定によって上記反応ガス
供給通路６，６に並行する状態の冷却水循環用通路８，
８が形成されている。なお、上記高圧電極１の中実内部
にも上記接地電極３の冷却水循環用通路８と同様にして
冷却水循環用通路１８が形成されている。On the other hand, as shown in FIG. 5, inside the solids of the pair of ground electrodes 3 and 3, as shown in FIG.
The inert gas containing helium gas or helium gas and hydrogen and the oxygen- or fluorocarbon-based fluorine-containing compound are formed by drilling the entire length of the hole (−y direction) and press-fitting and fixing the plug 5 to both ends of the hole (see FIG. 5). Reaction gas supply passages 6 and 6 for supplying a mixed reaction gas with a reactive gas containing a gas at atmospheric pressure are formed along the long side direction of the electrode, and the reaction gas supply passages 6 and 6 A cooling water circulation passage 8 parallel to the reaction gas supply passages 6 and 6 is formed in the upper solid body by drilling a hole over the entire length in the long side direction of the electrode and press-fitting a plug 7 into both ends of the hole. ,
8 are formed. A cooling water circulation passage 18 is also formed inside the solid of the high voltage electrode 1 in the same manner as the cooling water circulation passage 8 of the ground electrode 3.
【００２２】また、上記一対の接地電極３，３の短辺方
向（ｚ−ｚ方向）の一端部３Ａ，３Ａ側にはそれぞれ、
図３及び図４に示すように、上記高圧電極１の略二等辺
三角形状部分１Ａの両側傾斜面１ａ，１ａに平行状態で
対向する傾斜面３ａ，３ａが形成されている。これら傾
斜面３ａ，３ａのうち、基端部及び長辺方向の両端部を
除く部分に切り込みが設けられており、その切り込まれ
た傾斜面部分３ａ´，３ａ´と上記高圧電極１の略二等
辺三角形状部分１Ａの両側傾斜面１ａ，１ａとの間にそ
れぞれ放電ギャップ１５，１５及び混合反応ガス噴出通
路１６，１６が形成され、かつ、これら吹出し通路１
６，１６の下流側に被処理物表面に向けての吹出し部１
７が形成されている。なお、高圧電極１の短辺方向一端
側の略二等辺三角形状部分１Ａの両側傾斜面１ａ，１ａ
の交差角度θは、両側放電ギャップ１５，１５及び噴出
通路１６，１６を通過して噴出されるガス流同士が吹出
し部１７よりも噴出方向（図４の矢印ｗ方向）の下流位
置で衝突し合流する角度に設定されている。Further, one end portions 3A, 3A of the pair of ground electrodes 3, 3 in the short side direction (z-z direction) are respectively provided.
As shown in FIGS. 3 and 4, inclined surfaces 3 a, 3 a are formed in parallel with and opposed to both inclined surfaces 1 a, 1 a of the approximately isosceles triangular portion 1 A of the high-voltage electrode 1. Of these inclined surfaces 3a, 3a, a cut is provided in a portion excluding the base end and both ends in the long side direction, and the cut inclined surface portions 3a ', 3a' and the high voltage electrode 1 are roughly cut. Discharge gaps 15, 15 and mixed reaction gas ejection passages 16, 16 are formed between the two inclined surfaces 1 a, 1 a of the isosceles triangular portion 1 A, respectively.
Blowing part 1 toward the surface of the workpiece on the downstream side of 6, 16
7 are formed. It should be noted that both side inclined surfaces 1a, 1a of the approximately isosceles triangular portion 1A at one end side in the short side direction of the high voltage electrode 1 are provided.
Is set at the intersection angle θ, the gas flows ejected through the both-side discharge gaps 15 and the ejection passages 16 and 16 collide with each other at a position downstream of the ejection portion 17 in the ejection direction (the direction of the arrow w in FIG. 4). The angle is set to meet.
【００２３】さらに、上記接地電極３，３の短辺方向の
一端部３Ａ，３Ａの内部にはそれぞれ、電極長辺方向に
等間隔を隔てて、一端が上記反応ガス供給通路６に連通
接続し他端が傾斜面部分３ａ´，３ａ´に開口する複数
個の混合反応ガス吹出孔１０…，１０…が形成されてお
り、これら吹出孔１０…，１０…から上記高圧電極１の
傾斜面１ａ，１ａと一対の接地電極３，３の傾斜面部分
３ａ´，３ａ´間に形成される両側放電ギャップ１５，
１５及び噴出通路１６，１６に混合反応ガスを導入し通
過させるとともに、高圧電極１に高周波電圧を印加する
ことにより、放電ギャップ１５，１５でのグロー放電プ
ラズマの発生に伴い生成される化学的に活性な励起種を
含むガス流（以下、プラズマフレアと称するものも含
む）を両側噴出通路１６，１６を通して吹出し部１７か
ら被処理物の表面に直線状に噴出するように構成されて
いる。Further, one ends of the ground electrodes 3 and 3 are connected to the reaction gas supply passage 6 at equal intervals in the long side direction of the electrodes, respectively, inside the one end portions 3A and 3A in the short side direction. A plurality of mixed reaction gas blowout holes 10..., 10... Having the other ends open to the inclined surface portions 3 a ′, 3 a ′ are formed, and the slopes 1 a of the high-voltage electrode 1 are formed from these blowout holes 10. , 1a and the two-sided discharge gaps 15, formed between the inclined surface portions 3a ', 3a' of the pair of ground electrodes 3, 3,
By introducing and passing the mixed reaction gas through the discharge gaps 15 and the jet passages 16 and 16 and applying a high-frequency voltage to the high-voltage electrode 1, chemically generated gas is generated along with the generation of glow discharge plasma in the discharge gaps 15 and 15. A gas flow (hereinafter, also referred to as a plasma flare) containing an active excited species is configured to be ejected linearly from the ejection portion 17 through the ejection passages 16 on both sides to the surface of the workpiece.
【００２４】上記のように構成された大気圧プラズマ処
理装置２０は、例えば図６に示すように、被処理物の一
例であるＰＴＦＥなどの樹脂シート材１３を水平姿勢に
載置して連続搬送可能なコンベア１４の搬送経路中間位
置の上部に横断状態に設置固定して使用される。そし
て、上記コンベア１４によって樹脂シート材１３を水平
搬送させつつ、大気圧もしくは大気圧近傍（弱減圧また
は弱加圧）圧力下で上記反応ガス供給通路６，６に混合
反応ガスを供給し、この混合反応ガスを複数個のガス吹
出し孔１０…，１０…を通して高圧電極１と接地電極
３，３との間に形成される放電ギャップ部１５，１５に
導入するとともに上記高圧電極１に高周波電圧（１０Ｋ
Ｈｚ〜５００ＭＨｚ）を印加することによって、上記放
電ギャップ１５，１５に大気圧下でグロー放電プラズマ
を発生させ、該プラズマにより生成されるイオン、ラジ
カルなどの化学的に活性な励起種を含む反応性ガス流、
すなわち、プラズマフレアを両側噴出通路１６，１６を
通して吹出し部１７に向けて流し、この吹出し部１７か
ら樹脂シート材１３の表面に向け直線状に噴出させるこ
とによって、それら噴出プラズマフレア同士を樹脂シー
ト材１３の表面上で互いに衝突合流させて途切れのない
一直線状のプラズマフレアを樹脂シート材１３の表面全
域に均等に作用させることが可能となり、これによっ
て、樹脂シート材１３の表面を親水性に改質して樹脂シ
ート材１３に対する塗料やインクののり具合や接着性を
著しく改善するといった所定のプラズマ処理を行なう。In the atmospheric pressure plasma processing apparatus 20 configured as described above, for example, as shown in FIG. 6, a resin sheet material 13 such as PTFE, which is an example of an object to be processed, is placed in a horizontal position and continuously transported. It is installed and fixed in a transverse state above the intermediate position of the transport path of the possible conveyor 14. Then, while the resin sheet material 13 is horizontally conveyed by the conveyor 14, the mixed reaction gas is supplied to the reaction gas supply passages 6, 6 under the atmospheric pressure or a pressure close to the atmospheric pressure (weakly decompressed or weakly pressurized). The mixed reaction gas is introduced into the discharge gaps 15, 15 formed between the high-voltage electrode 1 and the ground electrodes 3, 3 through a plurality of gas blowing holes 10,. 10K
Hz to 500 MHz), a glow discharge plasma is generated under atmospheric pressure in the discharge gaps 15, 15, and a reactive gas containing chemically active excited species such as ions and radicals generated by the plasma is generated. Gas flow,
That is, the plasma flares are caused to flow toward the blowing portion 17 through the both-side blowing passages 16 and 16 and are blown straight from the blowing portion 17 toward the surface of the resin sheet material 13 so that the blown plasma flares are connected to each other by the resin sheet material. The surfaces of the resin sheet material 13 can be made hydrophilic by uniformly collapsing and merging with each other on the surface of the resin sheet material 13 so as to uniformly act on the entire surface of the resin sheet material 13. Then, a predetermined plasma treatment is performed to remarkably improve the degree of adhesion and adhesion of the paint or ink to the resin sheet material 13.
【００２５】図７及び図８は大気圧プラズマ処理装置２
０の他の一例を示す。この大気圧プラズマ処理装置２０
は、高圧電極１と接地電極３，３との間に形成された混
合反応ガス噴出通路１６，１６下流の吹出し部１７に対
向する箇所に補助電極４１を設け、これを接地するか、
または、この補助電極４１に直流のバイアス電圧を印加
する直流電源４２を設け、また、補助電極４１の内部に
も冷却水循環用通路４３を形成したものであり、その他
の構成は図２〜図５に示したものと同一であるため、同
一の構成及び相当する部位に同一の符号を付して、それ
らの詳しい説明は省略する。FIGS. 7 and 8 show an atmospheric pressure plasma processing apparatus 2.
0 shows another example. This atmospheric pressure plasma processing apparatus 20
Is to provide an auxiliary electrode 41 at a position opposed to the blowing section 17 downstream of the mixed reaction gas blowing passages 16 formed between the high voltage electrode 1 and the grounding electrodes 3, 3, and to ground the auxiliary electrode 41,
Alternatively, a DC power supply 42 for applying a DC bias voltage is provided to the auxiliary electrode 41, and a cooling water circulation passage 43 is also formed inside the auxiliary electrode 41. Other configurations are shown in FIGS. , The same configurations and corresponding parts are denoted by the same reference numerals, and detailed description thereof will be omitted.
【００２６】上記のような構成を有する図７及び図８に
示す大気圧プラズマ処理装置２０においても、図６と同
様に、コンベア１４によって水平搬送されるＰＴＦＥな
どの樹脂シート材（被処理物）１３の表面に向けて、放
電ギャップ１５，１５でのグロー放電プラズマの発生に
伴い生成されるイオン、ラジカルなどの化学的に活性な
励起種を含む反応性ガス流、すなわち、プラズマフレア
を両側噴出通路１６，１６下流の吹出し部１７から直線
状に噴出させ、それら噴出プラズマフレア同士を樹脂シ
ート材１３の表面上で互いに衝突合流させて途切れのな
い一直線状のプラズマフレアを樹脂シート材１３の表面
全域に均等に作用させることによって、樹脂シート材１
３の表面を親水性に改質して樹脂シート材１３に対する
塗料やインクののり具合や接着性を著しく改善するとい
った所定のプラズマ処理を行なうが、このとき、補助電
極４１に直流電源４２を介して直流のバイアス電圧を印
加することによって、高周波電圧をスパークやアーク放
電などの異常放電による電力ロスが生じない比較的低い
値に設定し電力消費を節減しながらも、大気圧下でグロ
ー放電プラズマを確実かつ安定よく発生させて反応活性
度を大きくし所定のプラズマ処理速度及び処理性能を向
上できるものである。In the atmospheric pressure plasma processing apparatus 20 shown in FIGS. 7 and 8 having the above configuration, similarly to FIG. 6, a resin sheet material such as PTFE (object to be processed) horizontally conveyed by the conveyor 14. A reactive gas flow containing chemically active excited species such as ions and radicals generated by the generation of glow discharge plasma in the discharge gaps 15, that is, a plasma flare is ejected to both surfaces toward the surface 13. The plasma flares are ejected linearly from the outlets 17 downstream of the passages 16, and the ejected plasma flares collide with each other on the surface of the resin sheet material 13 to form an uninterrupted linear plasma flare on the surface of the resin sheet material 13. By acting evenly over the entire area, the resin sheet material 1
3 is subjected to a predetermined plasma treatment such as modifying the surface of the resin sheet 3 to be hydrophilic so as to remarkably improve the degree of adhesion and adhesion of the paint or ink to the resin sheet material 13. By applying a DC bias voltage, the high-frequency voltage is set to a relatively low value that does not cause power loss due to abnormal discharge such as spark or arc discharge. Is generated reliably and stably to increase the reaction activity and improve the predetermined plasma processing speed and processing performance.
【００２７】なお、上記実施の形態では、不活性ガスの
うち化学的に安定で他の元素と化合物を作らないという
特性を有するヘリウムを回収し循環再利用する場合につ
いて説明したが、ヘリウム以外に、例えばアルゴンなど
の不活性ガスを排気ガスから分離回収して循環再利用す
る場合に適用しても、上記と同様に、ランニングコスト
の低減が図れることはもちろんである。In the above-described embodiment, a case has been described in which helium having the property of being chemically stable and not forming a compound with another element is collected from the inert gas and is recycled for reuse. For example, even when the present invention is applied to a case where an inert gas such as argon is separated and collected from exhaust gas and is recycled, the running cost can be reduced as described above.
【００２８】[0028]
【発明の効果】以上のように、本発明によれば、プラズ
マ処理時にチャンバー内に放出される排気ガス中にヘリ
ウム等の不活性ガスと共存する水蒸気や酸素等の不純物
を除去して不活性ガスを回収し、その回収不活性ガスを
大気圧プラズマ処理装置における不活性ガスまたは混合
反応ガスの供給通路に還流して再利用することにより、
新規な不活性ガスは循環再利用不活性ガスの不足分を補
給するだけの極く少量なものとし、長時間に亘る連続プ
ラズマ処理時の不活性ガスの消費量を著しく節減するこ
とができ、したがって、不活性ガスの不必要な消費ロス
を抑えてランニングコストの低減を図ることができると
いう効果を奏する。As described above, according to the present invention, an inert gas such as water vapor or oxygen coexisting with an inert gas such as helium is removed from an exhaust gas discharged into a chamber during plasma processing. By recovering the gas, returning the recovered inert gas to the supply path of the inert gas or mixed reaction gas in the atmospheric pressure plasma processing apparatus and reusing it,
The new inert gas is used in a very small amount to replenish the shortage of the circulating and reused inert gas, and it is possible to significantly reduce the consumption of the inert gas during continuous plasma processing for a long time. Therefore, there is an effect that the running cost can be reduced by suppressing unnecessary consumption loss of the inert gas.
【００２９】特に、回収対象をヘリウムとする場合の不
純物除去装置として、少なくとも、排気ガス中の水分を
冷却によって液化し除去して粗ヘリウムとするトラップ
と、その粗ヘリウムを冷却活性炭に通して高純度ヘリウ
ムとするフィルターとを有するものを用いることによ
り、回収再利用されるヘリウムの純度を高めることが可
能で、ヘリウムの循環再使用によるコストダウンを図り
ながらも表面改質等の所定のプラズマ処理性能を確実か
つ安定よく維持することができる。In particular, as a device for removing impurities when helium is to be collected, at least a trap that liquefies and removes moisture in exhaust gas by cooling to remove crude helium, and passes the crude helium through cooled activated carbon to attain high purity. By using a filter having a helium purity filter, it is possible to increase the purity of helium that is recovered and reused. Performance can be reliably and stably maintained.
【図１】本発明に係るヘリウム回収再利用装置付き大気
圧プラズマ処理装置全体の構成を示す系統図である。FIG. 1 is a system diagram showing the overall configuration of an atmospheric pressure plasma processing apparatus with a helium recovery and reuse device according to the present invention.
【図２】大気圧プラズマ処理装置の一例を示す側面図で
ある。FIG. 2 is a side view showing an example of an atmospheric pressure plasma processing apparatus.
【図３】図２のＡ−Ａ線に沿った縦断正面図である。FIG. 3 is a longitudinal sectional front view taken along line AA of FIG. 2;
【図４】図３の要部の拡大図である。FIG. 4 is an enlarged view of a main part of FIG. 3;
【図５】図２の大気圧プラズマ処理装置の縦断側面図で
ある。FIG. 5 is a vertical sectional side view of the atmospheric pressure plasma processing apparatus of FIG. 2;
【図６】同上大気圧プラズマ処理装置の使用形態を示す
概略斜視図である。FIG. 6 is a schematic perspective view showing a usage mode of the atmospheric pressure plasma processing apparatus.
【図７】大気圧プラズマ処理装置の他の例を示す側面図
である。FIG. 7 is a side view showing another example of the atmospheric pressure plasma processing apparatus.
【図８】図７のＢ−Ｂ線に沿った縦断正面図である。8 is a vertical sectional front view taken along line BB of FIG. 7;
１ 高圧電極 ２ 絶縁板 ３ 接地電極 ６，３２ 反応ガス供給通路 １５ 放電ギャツプ １７ 吹出口 ２０ 大気圧プラズマ処理装置 ２１ チャンバー ２２ 排気ガス排出路 ２５ ヘリウム強制回収路 ２６ 不純物除去装置 ２６Ａ 水分トラップ ２６Ｂ フィルター ２９ 回収ヘリウム貯蔵タンク ３５ ヘリウム供給通路 REFERENCE SIGNS LIST 1 high voltage electrode 2 insulating plate 3 ground electrode 6, 32 reaction gas supply passage 15 discharge gap 17 outlet 20 atmospheric pressure plasma treatment device 21 chamber 22 exhaust gas discharge passage 25 helium forced recovery passage 26 impurity removal device 26A moisture trap 26B filter 29 Recovery helium storage tank 35 Helium supply passage
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０１Ｌ 21/302 Ｂ Ｆターム(参考） 4D052 AA03 BA05 GA01 GB11 HB01 4G075 AA30 BA05 BB04 BB07 BC02 BC06 BD05 BD14 CA03 CA16 CA47 EB42 4K030 AA16 DA02 EA12 LA15 5F004 AA14 AA16 BA20 BB18 BB24 BC04 DA00 DA01 DA02 DA03 DA22 DA23 DA24 DA26 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (Reference) H01L 21/302 BF Term (Reference) 4D052 AA03 BA05 GA01 GB11 HB01 4G075 AA30 BA05 BB04 BB07 BC02 BC06 BD05 BD14 CA03 CA16 CA47 EB42 4K030 AA16 DA02 EA12 LA15 5F004 AA14 AA16 BA20 BB18 BB24 BC04 DA00 DA01 DA02 DA03 DA22 DA23 DA24 DA26
Claims (3)
で対向配置された接地電極との間に放電ギャップ及び混
合反応ガス噴出部が形成され、この放電ギャップ及び混
合反応ガス噴出部に、少なくともヘリウムを含む不活性
ガスもしくは不活性ガスと酸素またはフルオロカーボン
系の含フッ素化合物ガスを含む反応性気体との混合反応
ガスを大気圧もしくは大気圧近傍下で導入するととも
に、両電極に高周波電圧を印加して放電ギャップにグロ
ー放電プラズマを発生させることにより、その放電プラ
ズマにより生成される化学的に活性な励起種を含むガス
流を上記混合反応ガス噴出部の吹出口から被処理物の表
面に吹き出し照射させるように構成されている大気圧プ
ラズマ処理装置を設置したチャンバーに不活性ガスを含
む排気ガスの排出路を接続し、 この排気ガス排出路に、排気ガス中の不活性ガスに共存
する不純物を除去する不純物除去装置を設置するととも
に、 不純物が除去された不活性ガスを強制回収し、かつ、そ
の回収不活性ガスを上記大気圧プラズマ処理装置におけ
る不活性ガスまたは混合反応ガスの供給通路に還流させ
て再利用するように構成していることを特徴とする不活
性ガス回収再利用装置付き大気圧プラズマ処理装置。A discharge gap and a mixed reactant gas jet are formed between the high voltage electrode and a ground electrode opposed to the high electrode with an insulator interposed therebetween. Introducing a reaction gas containing at least an inert gas containing helium or a reactive gas containing oxygen or a fluorocarbon-based fluorine-containing compound gas at or near atmospheric pressure, and applying a high-frequency voltage to both electrodes. By generating a glow discharge plasma in the discharge gap by applying the gas, the gas flow containing the chemically active excited species generated by the discharge plasma is applied from the outlet of the mixed reaction gas ejection part to the surface of the workpiece. A discharge path for exhaust gas containing inert gas is provided in a chamber in which an atmospheric pressure plasma processing apparatus configured to perform blowout irradiation is installed. In this exhaust gas discharge path, an impurity removal device that removes impurities coexisting with the inert gas in the exhaust gas is installed, and the inert gas from which the impurities have been removed is forcibly recovered. Atmospheric-pressure plasma processing with an inert-gas recovery and reuse device, wherein the active gas is configured to be recirculated to the supply path of the inert gas or the mixed reaction gas in the atmospheric-pressure plasma processing apparatus and reused. apparatus.
分を冷却によって液化し除去するトラップと、水分除去
後の排気ガスを通過させて酸素を除去する酸素除去フィ
ルターとを少なくとも有している請求項１に記載の不活
性ガス回収再利用装置付き大気圧プラズマ処理装置。2. The apparatus for removing impurities according to claim 1, further comprising: a trap for liquefying and removing moisture in the exhaust gas by cooling, and an oxygen removing filter for removing the oxygen by passing the exhaust gas after removing the moisture. An atmospheric pressure plasma processing apparatus with an inert gas recovery and reuse apparatus according to claim 1.
り、上記不純物除去装置が、排気ガス中の水分を冷却に
よって液化し除去して粗ヘリウムとするトラップと、そ
の粗ヘリウムを冷却活性炭に通して高純度ヘリウムとす
るフィルターとを有している請求項１に記載の不活性ガ
ス回収再利用装置付き大気圧プラズマ処理装置。3. An inert gas of interest is helium, and the impurity removing device liquefies and removes moisture in exhaust gas by cooling to make coarse helium, and passes the crude helium through cooled activated carbon. The atmospheric pressure plasma processing apparatus with an inert gas recovery and reuse apparatus according to claim 1, further comprising a filter for converting the inert gas to high purity helium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000383321A JP2002177766A (en) | 2000-12-18 | 2000-12-18 | Atmospheric pressure plasma treating device provided with unit for recovering/reusing inert gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000383321A JP2002177766A (en) | 2000-12-18 | 2000-12-18 | Atmospheric pressure plasma treating device provided with unit for recovering/reusing inert gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002177766A true JP2002177766A (en) | 2002-06-25 |
Family
ID=18850995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000383321A Pending JP2002177766A (en) | 2000-12-18 | 2000-12-18 | Atmospheric pressure plasma treating device provided with unit for recovering/reusing inert gas |
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| Country | Link |
|---|---|
| JP (1) | JP2002177766A (en) |
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