JP2002172355A - Thin film forming method and apparatus - Google Patents
Thin film forming method and apparatusInfo
- Publication number
- JP2002172355A JP2002172355A JP2000370240A JP2000370240A JP2002172355A JP 2002172355 A JP2002172355 A JP 2002172355A JP 2000370240 A JP2000370240 A JP 2000370240A JP 2000370240 A JP2000370240 A JP 2000370240A JP 2002172355 A JP2002172355 A JP 2002172355A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- thin film
- atomized
- liquid solvent
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、所定の基材上に
高分子有機材料の薄膜を形成する薄膜形成方法及び薄膜
形成装置に関する。The present invention relates to a thin film forming method and a thin film forming apparatus for forming a thin film of a polymer organic material on a predetermined substrate.
【０００２】[0002]
【従来の技術】この種の従来の 薄膜形成装置として、
例えば、スピンコート法または印刷法などを利用したも
のがある。2. Description of the Related Art As a conventional thin film forming apparatus of this kind,
For example, there is a method using a spin coating method or a printing method.
【０００３】スピンコート法は、基板に塗布された高分
子有機材料を遠心力により飛散させて膜厚を調整する方
法である。[0003] The spin coating method is a method in which a polymer organic material applied to a substrate is scattered by centrifugal force to adjust the film thickness.
【０００４】印刷法はインクジェット法とも呼ばれ、イ
ンクの微粒子を基材に着弾させて高分子有機材料の溶液
を印刷してパターン形成を行うことから、複雑なパター
ン形成を行うことが可能となり、例えばフルカラーの有
機ＥＬ表示パネルの表示パターンとして基材上に多色を
塗り分けることが可能となる。[0004] The printing method is also called an ink-jet method, in which fine particles of ink are landed on a base material and a solution of a high-molecular organic material is printed to form a pattern, so that a complicated pattern can be formed. For example, it is possible to separately apply multiple colors on a substrate as a display pattern of a full-color organic EL display panel.
【０００５】[0005]
【発明が解決しようとする課題】スピンコート法では、
飛散された高分子材料がそのまま廃棄されることから、
高分子有機材料の使用効率が悪い。また、スピンコート
法は、基板の上面の全てに均一に高分子材料を塗布する
のには有効な方法であるが、基材上に多色を塗り分ける
ことは困難である。このため、バックライトや単色デバ
イス等の製造に用途が限定されてしまう。SUMMARY OF THE INVENTION In the spin coating method,
Since the scattered polymer material is discarded as it is,
Poor use efficiency of high molecular organic materials. In addition, the spin coating method is an effective method for uniformly applying a polymer material to the entire upper surface of a substrate, but it is difficult to separately apply multiple colors on a substrate. For this reason, the use is limited to the manufacture of a backlight, a monochrome device, and the like.
【０００６】また、インクジェット法では、パターン精
度、すなわちインクの着弾精度を上げるために、基板上
に複雑な前処理を施す必要がある。具体的には、ガラス
基板上にポリイミド等の高分子膜を予め塗布し、これを
フォトエッチングによりパターニングした後、さらに酸
素プラズマやＣＦ4プラズマを照射し、ポリイミド表面
をフッ素化させてから、インクを着弾させることが必要
となる。このため、製造工程が複雑になってしまう。In the ink jet method, it is necessary to perform complicated pretreatment on the substrate in order to increase the pattern accuracy, that is, the ink landing accuracy. Specifically, a polymer film such as polyimide is applied in advance on a glass substrate, patterned by photoetching, and further irradiated with oxygen plasma or CF 4 plasma to fluorinate the polyimide surface, and then ink Must be landed. This complicates the manufacturing process.
【０００７】そこで、所定の材料を液体溶媒に溶解させ
てなる溶液を霧化する霧化容器と、前記材料の薄膜を形
成する基材を収容した閉空間との間を霧化溶液の導入管
で連通させ、霧化容器から導入管を経て霧化溶液を閉じ
空間に導入して、基材の表面に霧化溶液を付着させるこ
とにより、基材の表面に高分子有機材料の薄膜を形成す
ることも可能である（特開2000-044238 号公報）。この
場合、比較的大きな基板であっても容易に薄膜を形成で
きるという利点があるが、ある程度以上の霧積みを行わ
ないと薄膜が平坦化しない。また、平坦化するまで堆積
させると、乾燥過程において、堆積した溶液の中で流動
が起こり厚みムラが生じやすくなるという問題があり、
高分子有機材料の溶質を基材の表面にいかに均一に定着
させるかが重大な課題となっていた。Therefore, an atomizing solution introducing pipe is provided between an atomizing container for atomizing a solution obtained by dissolving a predetermined material in a liquid solvent and a closed space containing a base material for forming a thin film of the material. The atomizing solution is introduced from the atomizing container through the introduction pipe into the closed space through the introduction tube, and the atomizing solution is attached to the surface of the base material, thereby forming a thin film of a polymer organic material on the surface of the base material It is also possible (Japanese Patent Laid-Open No. 2000-044238). In this case, there is an advantage that a thin film can be easily formed even with a relatively large substrate, but the thin film is not flattened unless a certain amount of spraying is performed. In addition, when deposited until flattened, in the drying process, there is a problem that flow occurs in the deposited solution and thickness unevenness easily occurs,
How to fix the solute of the high-molecular organic material uniformly on the surface of the base material has been a serious problem.
【０００８】そこで、この発明の課題は、霧化溶液を導
入して基材の表面に高分子有機材料の薄膜を形成する場
合に、溶質を基材の表面に均一に定着させることの可能
な薄膜形成方法及び薄膜形成装置を提供することにあ
る。Accordingly, an object of the present invention is to make it possible to uniformly fix a solute on the surface of a base material when forming a thin film of a high-molecular organic material on the surface of the base material by introducing an atomization solution. A thin film forming method and a thin film forming apparatus are provided.
【０００９】[0009]
【課題を解決するための手段】上記課題を解決すべく、
請求項１に記載の発明は、第１の霧化装置の第１の超音
波振動子によって、高分子有機材料の溶質が所定の液体
溶媒に溶解させた材料溶液を加振して霧化し、この霧化
された霧化溶液を所定の基材上に堆積させて高分子有機
材料の薄膜を形成する薄膜形成方法であって、前記液体
溶媒を、第２の霧化装置の第２の超音波振動子によって
加振して霧化し、この霧化された霧化溶媒を前記基材上
に降り積もらせて前記液体溶媒を堆積させる第１の工程
と、前記第１の霧化装置の前記第１の超音波振動子によ
って、前記材料溶液を加振して霧化し、この霧化された
霧化溶液を前記基材上に堆積された前記液体溶媒に溶け
込ませる第２の工程とを備えるものである。Means for Solving the Problems In order to solve the above problems,
According to the first aspect of the present invention, a material solution in which a solute of a polymer organic material is dissolved in a predetermined liquid solvent is vibrated and atomized by a first ultrasonic vibrator of a first atomizing device, A thin film forming method for forming a thin film of a high molecular weight organic material by depositing the atomized atomized solution on a predetermined base material, wherein the liquid solvent is supplied to a second atomizing device of a second atomizing device. A first step of vibrating and atomizing by a sonic vibrator, depositing the liquid solvent by dropping the atomized solvent onto the substrate, and the first step of the first atomizing device. Vibrating and atomizing the material solution by a first ultrasonic vibrator, and dissolving the atomized solution into the liquid solvent deposited on the base material. Things.
【００１０】請求項２に記載の発明は、所定の基材上に
高分子有機材料の薄膜を形成する薄膜形成装置であっ
て、前記高分子有機材料の薄膜を表面に形成するための
基材を収容する基材収容閉空間と、前記高分子有機材料
からなる溶質を所定の液体溶媒に溶解させた材料溶液を
霧化して前記基材収容閉空間で前記基材上に堆積させる
第１の霧化装置と、前記第１の霧化装置により霧化した
前記材料溶液の前記基板への堆積前に、前記液体溶媒の
みを霧化して前記基材収容閉空間で前記基材上に堆積さ
せる第２の霧化装置とを備えるものである。According to a second aspect of the present invention, there is provided a thin film forming apparatus for forming a thin film of a high molecular organic material on a predetermined base material, wherein the thin film of the high molecular organic material is formed on a surface of the thin film. And a first solution in which a material solution obtained by dissolving a solute composed of the high-molecular-weight organic material in a predetermined liquid solvent is atomized and deposited on the base material in the base material-containing closed space. Before the material solution atomized by the first atomizing device is deposited on the substrate, only the liquid solvent is atomized and deposited on the substrate in the substrate-containing closed space. And a second atomizing device.
【００１１】[0011]
【発明の実施の形態】図１はこの発明の実施の形態に係
る薄膜形成方法に使用される薄膜形成装置の概略構成を
示す縦断面図である。尚、この実施の形態では、有機Ｅ
Ｌ（エレクトロルミネッセンス）表示パネルの発光層を
形成する例を挙げて以下に説明する。FIG. 1 is a longitudinal sectional view showing a schematic configuration of a thin film forming apparatus used in a thin film forming method according to an embodiment of the present invention. In this embodiment, the organic E
An example in which a light emitting layer of an L (electroluminescence) display panel is formed will be described below.
【００１２】この薄膜形成装置は、所定材料（溶質）を
所定の液体溶媒１に溶解させた材料溶液２を霧化する第
１の霧化装置３と、液体溶媒１のみを霧化する第２の霧
化装置４と、溶質の薄膜を表面に形成する基材５を収容
する基材収容閉空間６と、第１の霧化装置３による霧化
溶液Ａを基材収容閉空間６に送る第１の送り経路７と、
第２の霧化装置４による霧化溶媒Ｂを基材収容閉空間６
に送る第２の送り経路８と、各送り経路７，８に設置さ
れた開閉弁９，１０とを備える。This thin film forming apparatus comprises a first atomizing device 3 for atomizing a material solution 2 in which a predetermined material (solute) is dissolved in a predetermined liquid solvent 1, and a second atomizing device 3 for atomizing only the liquid solvent 1. , A closed space 6 for accommodating a substrate 5 on which a solute thin film is formed on the surface, and an atomized solution A from the first atomizing device 3 is sent to the closed space 6 for accommodating the substrate. A first feed path 7;
The atomized solvent B by the second atomizing device 4 is filled with the base material containing closed space 6.
A second feed path 8 for feeding the water to the feed paths 7 and opening / closing valves 9 and 10 installed in the respective feed paths 7 and 8 are provided.
【００１３】ここで、有機ＥＬ表示パネルの発光層に適
した溶質としては例えばポリフルオレン等の所定の高分
子材料が適しており、液体溶媒１としてはキシレン溶液
等が適している。そして、材料溶液２としては、上記液
体溶媒１に対して例えば１重量％で上記の溶質を溶解さ
せたものが適している。また、基材５としては、ガラス
基板等の所定の基板上にＩＴＯ（インジウム−チン−オ
キサイド）等からなる電極層（陽極等）が形成され、さ
らにこの電極層上にバッファ／ホール輸送層が形成され
たもの等が適している。ただし、これらの各要素は上記
の材料に限定されて適用されるものではない。Here, as a solute suitable for the light emitting layer of the organic EL display panel, a predetermined polymer material such as polyfluorene is suitable, and as the liquid solvent 1, a xylene solution or the like is suitable. As the material solution 2, a solution in which the above-mentioned solute is dissolved in, for example, 1% by weight with respect to the above-mentioned liquid solvent 1 is suitable. As the substrate 5, an electrode layer (anode or the like) made of ITO (indium-tin-oxide) or the like is formed on a predetermined substrate such as a glass substrate, and a buffer / hole transport layer is further formed on this electrode layer. Those formed are suitable. However, these elements are not limited to the above-mentioned materials and are not applied.
【００１４】第１の霧化装置３は、材料溶液２を収容す
る第１の密閉容器１１内に、その材料溶液２を加振して
微粒子に霧化する第１の超音波振動子１２を設置して構
成される。The first atomizing device 3 includes a first ultrasonic vibrator 12 for vibrating the material solution 2 and atomizing the material solution 2 into fine particles in a first closed container 11 containing the material solution 2. Installed and configured.
【００１５】第２の霧化装置４は、液体溶媒１を収容す
る第２の密閉容器１３内に、その液体溶媒１を加振して
微粒子に霧化する第２の超音波振動子１４を設置して構
成される。The second atomizer 4 includes a second ultrasonic vibrator 14 for vibrating the liquid solvent 1 and atomizing it into fine particles in a second closed container 13 containing the liquid solvent 1. Installed and configured.
【００１６】尚、第１及び第２の超音波振動子１２，１
４は、１ＭＨｚ以上、望ましくは２．４ＭＨｚ程度の周
波数で材料溶液２または液体溶媒１をそれぞれ加振する
ようになっている。The first and second ultrasonic vibrators 12, 1
Numeral 4 vibrates the material solution 2 or the liquid solvent 1 at a frequency of 1 MHz or more, preferably about 2.4 MHz.
【００１７】基材収容閉空間６は、基材５を搬送するベ
ルトコンベアなどの搬送体１５と、この搬送体１５の搬
送面１５ａを上方から覆う囲壁体１６とで構成され、そ
の囲壁体１６には基材収容閉空間６内における霧化溶液
Ａまたは霧化溶媒Ｂの飽和状態を検知する飽和検知セン
サ１７が設置されている。The closed space 6 for accommodating the base material is composed of a carrier 15 such as a belt conveyor for carrying the substrate 5 and an enclosing wall 16 for covering the conveying surface 15a of the conveyer 15 from above. Is provided with a saturation detection sensor 17 for detecting a saturated state of the atomized solution A or the atomized solvent B in the closed space 6 for accommodating the base material.
【００１８】第１の送り経路７は、第１の霧化装置３を
構成する第１の密閉容器１１内における材料溶液２の液
位より高位置の部分と、基材収容閉空間６を構成する囲
壁体１６内の上位置の部分とを連通させる連通管からな
り、その途中の部分に第１の開閉弁９が介在させてあ
る。The first feed path 7 constitutes a portion higher than the liquid level of the material solution 2 in the first closed vessel 11 constituting the first atomizing device 3 and the closed space 6 for accommodating the base material. A first opening / closing valve 9 is interposed in a middle portion of the communication pipe for communicating with an upper portion in the surrounding wall body 16.
【００１９】第２の送り経路８は、第２の霧化装置４を
構成する第２の密閉容器１３内における液体溶媒１の液
位より高位置の部分と、基材収容閉空間６を構成する囲
壁体１６内の側壁位置の部分とを連通させる連通管から
なり、その途中の部分に第２の開閉弁１０が介在させて
ある。The second feed path 8 constitutes a portion higher than the liquid level of the liquid solvent 1 in the second hermetic container 13 constituting the second atomizing device 4 and the closed space 6 for accommodating the base material. A communication pipe is provided to communicate with a portion of the side wall position in the surrounding wall body 16, and a second opening / closing valve 10 is interposed in a middle portion thereof.
【００２０】次に、上記構成の薄膜形成装置により、基
材５の表面に、例えば有機ＥＬ表示パネルの発光層とな
る高分子有機材料の薄膜を形成する場合の動作を説明す
る。尚、温度環境としては２０℃〜５０℃程度に設定さ
れる。Next, an operation in the case of forming a thin film of a polymer organic material to be a light emitting layer of an organic EL display panel on the surface of the base material 5 by the thin film forming apparatus having the above structure will be described. The temperature environment is set at about 20 ° C. to 50 ° C.
【００２１】まず事前段階として、第１の霧化装置３の
第１の密閉容器１１内には、高分子材料の溶質を液体溶
媒１で溶解してなる材料溶液２が収容され、第２の霧化
装置４の第２の密閉容器１３内には、液体溶媒１のみが
収容されている。また、両開閉弁９，１０は初期状態で
いずれも閉塞されているものとする。First, as a preparatory step, a material solution 2 obtained by dissolving a solute of a polymer material in a liquid solvent 1 is accommodated in a first closed container 11 of a first atomizer 3. Only the liquid solvent 1 is accommodated in the second closed container 13 of the atomizing device 4. Also, it is assumed that both of the on-off valves 9 and 10 are closed in an initial state.
【００２２】そして、第１の霧化装置３内の材料溶液２
を第１の超音波振動子１２が加振することにより、材料
溶液２が微粒子に霧化されて霧化溶液Ａとなり、また、
第２の霧化装置４内の液体溶媒１を第２の超音波振動子
１４が加振することにより、液体溶媒１が微粒子に霧化
されて霧化溶媒Ｂとなる。Then, the material solution 2 in the first atomizing device 3
Is vibrated by the first ultrasonic vibrator 12 so that the material solution 2 is atomized into fine particles and becomes an atomized solution A.
When the second ultrasonic vibrator 14 vibrates the liquid solvent 1 in the second atomizing device 4, the liquid solvent 1 is atomized into fine particles to become the atomized solvent B.
【００２３】ここで、第１の開閉弁９を閉塞したまま、
第２の開閉弁１０を開放する。そうすると、第２の霧化
装置４内の霧化溶媒Ｂは第２の送り経路８を通じて基材
収容閉空間６に順次導入される。基材収容閉空間６に導
入された霧化溶媒Ｂが飽和状態となったことを、飽和検
知センサ１７が検知すると、これに応答して搬送体１５
が搬入作動し、この搬送体１５によって基材収容閉空間
６内に基材５が搬入される。これにより、基材５の表面
に霧化溶媒Ｂのみが付着し、液体溶媒１が堆積する。こ
の際、液体溶媒１の粘度は極めて低く、故に液体溶媒１
自身の表面張力により、基材５上に均一に液体溶媒１が
堆積される。Here, with the first on-off valve 9 closed,
The second on-off valve 10 is opened. Then, the atomizing solvent B in the second atomizing device 4 is sequentially introduced into the base material accommodation closed space 6 through the second feed path 8. When the saturation detection sensor 17 detects that the atomized solvent B introduced into the base material accommodating closed space 6 has become saturated, the carrier 15 responds thereto.
Is carried in, and the base material 5 is carried into the base material accommodation closed space 6 by the carrier 15. As a result, only the atomizing solvent B adheres to the surface of the substrate 5, and the liquid solvent 1 is deposited. At this time, the viscosity of the liquid solvent 1 is extremely low, and
The liquid solvent 1 is uniformly deposited on the substrate 5 by its own surface tension.
【００２４】次に、基材５上の液体溶媒１の厚さが数μ
ｍ〜数十μｍ程度になった時点で、第２の開閉弁１０が
閉塞され、第１の開閉弁９が開放される。そうすると、
第１の霧化装置３内の霧化溶液Ａは、第１の送り経路７
を通じて基材収容閉空間６に順次導入される。Next, the thickness of the liquid solvent 1 on the substrate 5 is several μm.
When the distance becomes about m to several tens of μm, the second on-off valve 10 is closed and the first on-off valve 9 is opened. Then,
The atomization solution A in the first atomization device 3 is supplied to the first feed path 7
Through the base material accommodating closed space 6.
【００２５】この時点で、基材５の表面には、図２の如
く、既に液体溶媒１が均一な厚さで堆積しており、この
均一な厚さで堆積された液体溶媒１に溶け込むようにし
て、基材５の表面に霧化溶液Ａが徐々に付着していく。
したがって、材料溶液２の薄膜が均一な厚さで基材５上
に堆積することになる。At this point, as shown in FIG. 2, the liquid solvent 1 has already been deposited on the surface of the base material 5 with a uniform thickness, and the liquid solvent 1 is dissolved in the liquid solvent 1 deposited with this uniform thickness. Then, the atomized solution A gradually adheres to the surface of the substrate 5.
Therefore, a thin film of the material solution 2 is deposited on the substrate 5 with a uniform thickness.
【００２６】しかる後、基材５上の材料溶液２が乾燥さ
れ、溶質としての高分子有機材料の薄膜が基材５上に形
成される。このとき、均一な厚さの材料溶液２を乾燥さ
せているので、乾燥後に形成される溶質の薄膜は均一な
厚みで形成される。この場合、基材５上の高分子有機材
料の薄膜の厚さは、数十ｎｍ〜数百ｎｍに均一に設定さ
れる。Thereafter, the material solution 2 on the substrate 5 is dried, and a thin film of a high-molecular organic material as a solute is formed on the substrate 5. At this time, since the material solution 2 having a uniform thickness is dried, the solute thin film formed after the drying is formed with a uniform thickness. In this case, the thickness of the high-molecular-weight organic material thin film on the base material 5 is uniformly set to several tens to several hundreds of nm.
【００２７】尚、上記実施の形態では、有機ＥＬ表示パ
ネルの発光層としての薄膜形成方法について例示した
が、これに限るものではない。In the above embodiment, a method of forming a thin film as a light emitting layer of an organic EL display panel has been described as an example, but the present invention is not limited to this.
【００２８】また、上記実施の形態では、第１の霧化装
置３と第２の霧化装置４とを別々の密閉容器１１，１３
に分けて設置していたが、これらを同一の密閉容器に収
納し、その内部に材料溶液２用の液槽と液体溶媒１用の
液槽とを分けて、各液槽に超音波振動子１２，１４を設
置するようにしてもよい。この場合、さらにこの同一の
密閉容器を、基材収容閉空間６を形成するための囲壁体
１６と兼用してもよい。この場合、同一の囲壁体１６と
しての密閉容器内で形成される基材収容閉空間６に、基
材５と材料溶液２用の液槽と液体溶媒１用の液槽の全て
が収納される。In the above embodiment, the first atomizing device 3 and the second atomizing device 4 are provided in separate closed containers 11 and 13 respectively.
These are housed in the same closed container, and a liquid tank for the material solution 2 and a liquid tank for the liquid solvent 1 are divided therein. 12 and 14 may be installed. In this case, the same closed container may be used also as the surrounding wall body 16 for forming the base material housing closed space 6. In this case, the base material 5, the liquid tank for the material solution 2, and the liquid tank for the liquid solvent 1 are all stored in the closed space 6 formed in the closed container as the same enclosure 16. .
【００２９】[0029]
【発明の効果】請求項１及び請求項２に記載の発明によ
れば、まず液体溶媒のみを、第２の霧化装置の第２の超
音波振動子によって加振して霧化し、この霧化された霧
化溶媒を粘度の低い液体の液体溶媒としてその表面張力
により均一な厚さで基材上に降り積もらせて堆積させた
後に、第１の霧化装置の第１の超音波振動子によって霧
化された霧化溶液を、基材上に堆積された均一な厚さの
液体溶媒に溶け込むようにして堆積させることができる
ので、材料溶液の薄膜を均一な厚さで基材上に堆積させ
ることができるという効果がある。According to the first and second aspects of the present invention, only the liquid solvent is first vibrated and atomized by the second ultrasonic vibrator of the second atomizing device. After the atomized solvent is deposited as a liquid solvent having a low viscosity on a substrate with a uniform thickness due to its surface tension, the first ultrasonic vibration of the first atomizer is performed. The atomized solution atomized by the particles can be deposited by dissolving it in the liquid solvent of uniform thickness deposited on the substrate, so that a thin film of the material solution can be deposited on the substrate with uniform thickness. There is an effect that it can be deposited on the surface.
【図１】この発明の一の実施の形態に係る薄膜形成装置
を示す模式図である。FIG. 1 is a schematic diagram showing a thin film forming apparatus according to one embodiment of the present invention.
【図２】基材上に堆積された液体溶媒に霧化溶液を溶け
込ませる様子を示す図である。FIG. 2 is a diagram showing a state in which an atomization solution is dissolved in a liquid solvent deposited on a substrate.
１ 液体溶媒 ２ 材料溶液 ３ 霧化装置 ４ 霧化装置 ５ 基材 ６ 基材収容閉空間 ７ 経路 ８ 経路 ９ 第１の開閉弁 １０ 第２の開閉弁 １１ 第１の密閉容器 １２ 第１の超音波振動子 １３ 第２の密閉容器 １４ 第２の超音波振動子 １５ 搬送体 １６ 囲壁体 １７ 飽和検知センサ Ａ 霧化溶液 Ｂ 霧化溶媒 DESCRIPTION OF SYMBOLS 1 Liquid solvent 2 Material solution 3 Atomizer 4 Atomizer 5 Substrate 6 Substrate accommodation closed space 7 Path 8 Path 9 1st on-off valve 10 2nd on-off valve 11 1st closed container 12 1st super Acoustic vibrator 13 Second closed container 14 Second ultrasonic vibrator 15 Carrier 16 Enclosure 17 Saturation detection sensor A Atomizing solution B Atomizing solvent
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 貴則 愛知県名古屋市南区菊住１丁目７番10号 株式会社オートネットワーク技術研究所内 Ｆターム(参考） 3K007 AB18 CA01 CB01 DA01 DB03 EB00 FA01 4D074 AA01 BB02 DD03 DD18 DD32 DD43 4D075 AA01 AA76 AE12 CA48 CB08 DA06 DB13 DC24 EA07 EB11 ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Takanori Ito 1-7-10 Kikuzumi, Minami-ku, Nagoya-shi, Aichi F-term in Auto Network Engineering Laboratory Co., Ltd. (Reference) 3K007 AB18 CA01 CB01 DA01 DB03 EB00 FA01 4D074 AA01 BB02 DD03 DD18 DD32 DD43 4D075 AA01 AA76 AE12 CA48 CB08 DA06 DB13 DC24 EA07 EB11
Claims (2)
よって、高分子有機材料の溶質が所定の液体溶媒に溶解
させた材料溶液を加振して霧化し、この霧化された霧化
溶液を所定の基材上に堆積させて高分子有機材料の薄膜
を形成する薄膜形成方法であって、 前記液体溶媒を、第２の霧化装置の第２の超音波振動子
によって加振して霧化し、この霧化された霧化溶媒を前
記基材上に降り積もらせて前記液体溶媒を堆積させる第
１の工程と、 前記第１の霧化装置の前記第１の超音波振動子によっ
て、前記材料溶液を加振して霧化し、この霧化された霧
化溶液を前記基材上に堆積された前記液体溶媒に溶け込
ませる第２の工程とを備える薄膜形成方法。1. A material solution in which a solute of a high molecular weight organic material is dissolved in a predetermined liquid solvent is vibrated and atomized by a first ultrasonic vibrator of a first atomization device. A thin film of a high-molecular organic material by depositing the atomized solution on a predetermined substrate, wherein the liquid solvent is formed by a second ultrasonic oscillator of a second atomizer. Vibrating and atomizing, a first step of depositing the liquid solvent by dropping the atomized solvent onto the base material, and a first step of the first atomizing device. And vibrating the material solution with a sonic vibrator to atomize the material solution, and dissolving the atomized solution into the liquid solvent deposited on the base material.
形成する薄膜形成装置であって、 前記高分子有機材料の薄膜を表面に形成するための基材
を収容する基材収容閉空間と、 前記高分子有機材料からなる溶質を所定の液体溶媒に溶
解させた材料溶液を霧化して前記基材収容閉空間で前記
基材上に堆積させる第１の霧化装置と、 前記第１の霧化装置により霧化した前記材料溶液の前記
基板への堆積前に、前記液体溶媒のみを霧化して前記基
材収容閉空間で前記基材上に堆積させる第２の霧化装置
とを備える薄膜形成装置。2. A thin film forming apparatus for forming a thin film of a high molecular organic material on a predetermined base material, comprising: a base material housing for housing a base material for forming a thin film of the high molecular organic material on the surface. A space, a first atomizing device for atomizing a material solution in which a solute composed of the high-molecular-weight organic material is dissolved in a predetermined liquid solvent and depositing the material solution on the substrate in the substrate-containing closed space; A second atomizing device for atomizing only the liquid solvent and depositing on the substrate in the substrate-containing closed space before depositing the material solution atomized by the atomizing device on the substrate; A thin film forming apparatus comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000370240A JP2002172355A (en) | 2000-12-05 | 2000-12-05 | Thin film forming method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000370240A JP2002172355A (en) | 2000-12-05 | 2000-12-05 | Thin film forming method and apparatus |
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| Publication Number | Publication Date |
|---|---|
| JP2002172355A true JP2002172355A (en) | 2002-06-18 |
Family
ID=18840158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000370240A Pending JP2002172355A (en) | 2000-12-05 | 2000-12-05 | Thin film forming method and apparatus |
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| Country | Link |
|---|---|
| JP (1) | JP2002172355A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009187681A (en) * | 2008-02-01 | 2009-08-20 | Tokyo Electron Ltd | Forming method of organic thin film, and organic device |
| JP2016041423A (en) * | 2015-09-18 | 2016-03-31 | イーエイチエス レンズ フィリピン インク | Method of forming processing layer |
| JP2020049440A (en) * | 2018-09-27 | 2020-04-02 | 凸版印刷株式会社 | Thin film forming method, thin film forming device, and functional thin film |
| WO2023234136A1 (en) * | 2022-06-03 | 2023-12-07 | 東洋紡株式会社 | Method for producing functional layer of photoelectric conversion element and method for producing photoelectric conversion element |
-
2000
- 2000-12-05 JP JP2000370240A patent/JP2002172355A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009187681A (en) * | 2008-02-01 | 2009-08-20 | Tokyo Electron Ltd | Forming method of organic thin film, and organic device |
| JP2016041423A (en) * | 2015-09-18 | 2016-03-31 | イーエイチエス レンズ フィリピン インク | Method of forming processing layer |
| JP2020049440A (en) * | 2018-09-27 | 2020-04-02 | 凸版印刷株式会社 | Thin film forming method, thin film forming device, and functional thin film |
| JP7434705B2 (en) | 2018-09-27 | 2024-02-21 | Ｔｏｐｐａｎホールディングス株式会社 | Thin film forming method, thin film forming apparatus, and functional thin film |
| WO2023234136A1 (en) * | 2022-06-03 | 2023-12-07 | 東洋紡株式会社 | Method for producing functional layer of photoelectric conversion element and method for producing photoelectric conversion element |
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