JP2002028496A - Photocatalyst and its usage - Google Patents

Photocatalyst and its usage

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Publication number
JP2002028496A
JP2002028496A JP2000213682A JP2000213682A JP2002028496A JP 2002028496 A JP2002028496 A JP 2002028496A JP 2000213682 A JP2000213682 A JP 2000213682A JP 2000213682 A JP2000213682 A JP 2000213682A JP 2002028496 A JP2002028496 A JP 2002028496A
Authority
JP
Japan
Prior art keywords
photocatalyst
hydrated
clay
aggregate
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000213682A
Other languages
Japanese (ja)
Inventor
Takako Iwami
貴子 石水
Kenichi Sekiguchi
謙一 関口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP2000213682A priority Critical patent/JP2002028496A/en
Publication of JP2002028496A publication Critical patent/JP2002028496A/en
Pending legal-status Critical Current

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  • Catalysts (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a photocatalyst which enables quickly decomposing and removing photocatalytically reactive substances such as a malodorous substance in the air, a plant growth promoter and a poisonous substance and is resistant to shock and vibration. SOLUTION: This photocatalyst comprises a hydration aggregate 1 of a formed clay or a hydraulic compound which contains semiconductors having band gaps of 0.5-5 eV and an electrically conductive wire material 2. This usage of the photocatalyst is composed of a process of heating the photocatalyst, a process of bringing the gas including photocatalytically reactive substances into contact with the photocatalyst and a process of irradiating the photocatalyst with ultraviolet rays.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、光触媒体に関し、
詳しくは、衝撃や振動に対して割れにくく、メルカプタ
ン、アンモニアなどの悪臭物質、エチレンなどの植物成
長促進物質などの空気中の光触媒反応性物質の除去など
に好適な光触媒体に関する。
[0001] The present invention relates to a photocatalyst,
More specifically, the present invention relates to a photocatalyst which is hardly cracked by impact or vibration and is suitable for removing photocatalytically reactive substances in the air, such as malodorous substances such as mercaptan and ammonia, and plant growth promoting substances such as ethylene.

【0002】[0002]

【従来の技術】従来より化学工場、家庭などから発生す
る悪臭物質、青果物から発生するエチレンなどの植物成
長促進物質および、NOなどの有毒物質などを有効
に除去する技術の開発が求められている。なかでも、上
記悪臭物質などを紫外線照射下で0.5〜5eVの禁止
帯幅を有する半導体(光触媒)に接触させて分解する方
法が有望視されているが、一般に前記光触媒は粒状であ
るためハンドリングしにくいという問題がある。この問
題を解決する方法として、本出願人は以前に光触媒の粉
末を粘土に分散させて成形物とする方法(特開平2−2
73514号公報)、石膏のような水硬性化合物に分散
させて水和固化する方法(特開平6−327965号公
報)などを提案した。 しかしながら、これらの方法に
よって光触媒のハンドリングは改善されるものの、粘土
や水硬性化合物を用いた成形物は、衝撃や振動による割
れ、崩れを起こし易いため、さらなる改良が望まれてい
る。
Conventionally than chemical plants, malodorous substances generated like the home, plant growth promoters and ethylene generated from fresh produce, with the development of technology is required to effectively remove such toxic substances, such as NO X I have. Above all, a method of decomposing the above-mentioned malodorous substance by contacting it with a semiconductor (photocatalyst) having a forbidden band width of 0.5 to 5 eV under ultraviolet irradiation is considered to be promising. However, since the photocatalyst is generally granular, There is a problem that it is difficult to handle. As a method for solving this problem, the present applicant has previously disclosed a method in which a powder of a photocatalyst is dispersed in clay to form a molded product (Japanese Patent Laid-Open No. 2-2)
No. 73514) and a method of dispersing in a hydraulic compound such as gypsum to solidify by hydration (Japanese Patent Laid-Open No. 6-327965). However, although the handling of the photocatalyst is improved by these methods, a molded article using a clay or a hydraulic compound is liable to be cracked or broken by impact or vibration, and thus further improvement is desired.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、衝撃
や振動を受けても割れや崩れを起こしにくい光触媒体を
提供することにある。また、本発明の他の目的は、かか
る光触媒体を使用して空気中の悪臭物質、植物成長物
質、有毒物質などの光触媒反応性物質を迅速に分解除去
する方法を提供することである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a photocatalyst which is hardly cracked or collapsed even when subjected to shock or vibration. Another object of the present invention is to provide a method for rapidly decomposing and removing photocatalytically reactive substances such as malodorous substances, plant growth substances, and toxic substances in the air using the photocatalyst.

【0004】[0004]

【課題を解決するための手段】本発明者らは鋭意研究し
た結果、二酸化チタンの粉末を含有する粘土成形物の外
側をステンレス製金網で補強すると衝撃を受けても割れ
にくくなり、さらに金網を加熱すると粘土成形物などが
加熱され、光触媒反応が活性化されることを見出し、こ
の知見に基づいて本発明を完成するに至った。かくして
本発明によれば、(1)0.5〜5eVの禁止帯幅を有
する半導体を含有する粘土成形物または水硬性化合物の
水和凝集物と導電性線状材とから構成される光触媒体、
(2)上記(1)記載の光触媒体を加熱する工程と、前
記光触媒体に光触媒反応性物質を含有する気体を接触さ
せる工程と、前記光触媒体に紫外線を照射する工程とを
有する光触媒体の使用方法、が提供される。
Means for Solving the Problems As a result of intensive studies, the present inventors have found that if the outside of a clay molded product containing titanium dioxide powder is reinforced with a stainless steel wire mesh, it becomes difficult to break even when subjected to an impact. It has been found that when heated, the clay molded product is heated and the photocatalytic reaction is activated, and based on this finding, the present invention has been completed. Thus, according to the present invention, (1) a photocatalyst comprising a clay molded product or a hydrated aggregate of a hydraulic compound containing a semiconductor having a band gap of 0.5 to 5 eV and a conductive linear material ,
(2) A photocatalyst comprising: a step of heating the photocatalyst according to the above (1); a step of bringing a gas containing a photocatalytically reactive substance into contact with the photocatalyst; and a step of irradiating the photocatalyst with ultraviolet rays. A method of use is provided.

【0005】[0005]

【作用】本発明によれば、第1に導電性線状材によって
補強された光触媒体は、衝撃や振動を受けても割れや崩
れを起こしにくく、また、例え部分的な割れや崩れが起
きても光触媒体が取り付け架台などから崩落することを
防ぐことができる。さらに第2に、導電性線状材を伝熱
または電熱などにより加熱することによって粘土成形物
または水硬性化合物の水和凝集物が加温され、その結果
光触媒体の触媒反応を活性化させることができる。
According to the present invention, firstly, the photocatalyst reinforced by the conductive linear material is unlikely to be cracked or collapsed even when subjected to shock or vibration. Even so, it is possible to prevent the photocatalyst from falling down from the mounting base or the like. Second, by heating the conductive linear material by heat transfer or electric heat, the clay molded product or the hydrated aggregate of the hydraulic compound is heated, and as a result, the catalytic reaction of the photocatalyst is activated. Can be.

【0006】[0006]

【発明の実施の形態】以下、本発明について詳述する。
本発明で使用する0.5〜5eVの禁止帯幅を有する半
導体(以下、単に「半導体」と記す。)は、半導体に禁
止帯幅以上のエネルギーを有する光を照射することによ
り、光触媒反応を生じる半導体である。かかる半導体に
光を照射すると、価電子帯から伝導帯への電子励起が生
じ、価電子帯に正孔、伝導帯に電子が生成し、これらの
正孔および電子が半導体表面でそれと接する気相や水相
で光触媒反応を行うことが知られている。なお、禁止帯
幅は1〜3eVであることが好ましい。前記半導体とし
ては、二酸化チタン、二酸化スズ、酸化亜鉛、三酸化タ
ングステン、酸化セリウム、チタン酸バリウム、酸化第
二鉄などの金属酸化物;硫化亜鉛、硫化カドミウム、硫
化鉛、セレン化亜鉛、セレン化カドミウムなどの金属カ
ルコゲナイド;シリコン、ゲルマニウムなどの第VI族
元素;ガリウムリン、ガリウムヒ素、インジウムリンな
どの第III族元素と第V族元素との化合物;ポリアセ
チレン、ポリピロール、ポリチオフェン、ポリアニリ
ン、ポリビニルカルバゾールなどの有機半導体などが挙
げられる。これらの中で二酸化チタン、酸化亜塩、三酸
化タングステン、酸化セリウムなどの金属酸化物が好適
である。また、半導体に白金、銀などの貴金属を担持さ
せて触媒作用を高めることもできる。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The semiconductor having a band gap of 0.5 to 5 eV (hereinafter, simply referred to as “semiconductor”) used in the present invention is capable of performing a photocatalytic reaction by irradiating the semiconductor with light having energy equal to or larger than the band gap. The resulting semiconductor. When such a semiconductor is irradiated with light, electronic excitation occurs from the valence band to the conduction band, and holes are generated in the valence band and electrons are generated in the conduction band, and these holes and electrons are in contact with the semiconductor surface at the gas phase. It is known to carry out a photocatalytic reaction in an aqueous phase. Note that the forbidden band width is preferably 1 to 3 eV. Examples of the semiconductor include metal oxides such as titanium dioxide, tin dioxide, zinc oxide, tungsten trioxide, cerium oxide, barium titanate, and ferric oxide; zinc sulfide, cadmium sulfide, lead sulfide, zinc selenide, and selenide. Metal chalcogenides such as cadmium; group VI elements such as silicon and germanium; compounds of group III and group V elements such as gallium phosphide, gallium arsenide and indium phosphide; polyacetylene, polypyrrole, polythiophene, polyaniline, polyvinyl carbazole and the like Organic semiconductor and the like. Among them, metal oxides such as titanium dioxide, suboxide, tungsten trioxide, and cerium oxide are preferable. In addition, a noble metal such as platinum or silver can be carried on the semiconductor to enhance the catalytic action.

【0007】前記半導体は、通常、粉末状のものが使用
される。半導体の粉末粒子は、一次粒子が1〜1000
nmのものが表面積が大きいので光触媒反応には有利で
ある。一次粒子を顆粒状に凝集させて粒径10〜200
μmの二次粒子にしたものを使用する場合は、粘土や水
硬性化合物に分散させる過程で大部分を一次粒子にほぐ
すことが好ましい。
The semiconductor is usually in the form of a powder. Semiconductor powder particles have primary particles of 1 to 1000
Since the surface area of nm is large, it is advantageous for the photocatalytic reaction. The primary particles are agglomerated into granules to form a particle size of 10 to 200.
In the case of using secondary particles having a particle diameter of μm, it is preferable that most of the secondary particles be loosened into primary particles in the process of dispersing in clay or a hydraulic compound.

【0008】本発明で使用する粘土は、水と混ぜて捏ね
ると可塑性を生じ、乾燥して固化すれば剛性を示すもの
である。同時に半導体を粘土の中に分散して固定させる
ことができる。具体的には、カオリン、スメクタイト、
イライト、リョクデイ石、アロフェンなどの含水ケイ酸
塩からなる粘土鉱物を一種類以上含み、粒径がコロイド
状から微砂状に亘るものであって、これらの中で、少な
い水で可塑性が出ることから、カオリン、イライト、リ
ョクデイ石を多く含む粘土を好適に使用することができ
る。本発明においては、例えば、耐火物、陶磁器、製紙
工業、ゴム工業などで使用されている粘土が使用でき
る。
The clay used in the present invention exhibits plasticity when mixed with water and kneaded, and exhibits rigidity when dried and solidified. At the same time, the semiconductor can be dispersed and fixed in the clay. Specifically, kaolin, smectite,
It contains at least one clay mineral composed of hydrated silicates such as illite, ryokudeite, and allophane, and has a particle size ranging from colloidal to fine sandy. Therefore, clay containing a large amount of kaolin, illite, and ryokudeite can be preferably used. In the present invention, for example, clays used in refractory, ceramics, paper industry, rubber industry and the like can be used.

【0009】本発明で使用する水硬性化合物は、水と反
応して水和物を生成し凝集する性質を有する無機化合物
である。水硬性化合物は、水と練り合わせることによっ
て水和反応を起こし、水和凝集物を生成させることがで
き、同時に半導体を水和凝集物の中に分散して固定させ
ることができる。この水硬性化合物は、例えば土木建設
分野などにおいて無機質接着剤として一般的に用いられ
ている。具体的には、硫酸カルシウム、ケイ酸カルシウ
ム、アルミン酸カルシウム、鉄酸カルシウム、セリッ
ト、シーライト、ゲーレナイト、灰長石、ドロマイトな
どが挙げられる。さらに水硬性化合物には、これらの化
合物を原料として得られる、焼石膏、ポルトランドセメ
ント、ドロマイトプラスター、石灰火山灰セメント、ア
ルミナセメント、マグネシアセメントなどが含まれる。
本発明には特に、硫酸カルシウムおよび焼石膏が好適で
ある。
The hydraulic compound used in the present invention is an inorganic compound having the property of reacting with water to form a hydrate and to aggregate. The hydraulic compound causes a hydration reaction by kneading with water to generate a hydrated aggregate, and at the same time, the semiconductor can be dispersed and fixed in the hydrated aggregate. This hydraulic compound is generally used as an inorganic adhesive, for example, in the field of civil engineering and construction. Specific examples include calcium sulfate, calcium silicate, calcium aluminate, calcium ferrate, celite, celite, gohrenite, anorthite, and dolomite. Further, the hydraulic compounds include calcined gypsum, portland cement, dolomite plaster, lime volcanic ash cement, alumina cement, magnesia cement, etc., obtained using these compounds as raw materials.
In the present invention, calcium sulfate and calcined gypsum are particularly suitable.

【0010】本発明で使用する前記半導体を含有する粘
土成型物(以下、単に「粘土成形物」という。)または
前記半導体を含有する水硬性化合物の水和凝集物(以
下、単に「水和凝集物」と記す。)は、通常、粘土また
は水硬性化合物100重量部に対して粉末状の前記半導
体10〜1000重量部、好ましくは20〜600重量
部、および水100〜1100重量部、好ましくは12
0〜700重量部を添加して混合し、レンガ状、タイル
状、かまぼこ板状などの型を用いて賦形してから、粘土
の場合は150〜1000℃にて乾燥、固化して粘土成
形物とし、また、水硬性化合物の場合は水和反応させて
水和凝集物とする。なお、水硬性化合物の水和反応は、
通常、練り合わせて8分以上経つと凝集し始める。水和
反応は必ずしも加熱する必要はないが、加熱するとき
は、通常、300℃以下、好ましくは150℃以下であ
る。300℃を越えると水和反応の反応速度よりも逆反
応の脱水反応の速度が大きくなって水和凝集物が得られ
ないことがあるので好ましくない。粘土成形物または水
和凝集物の形状、大きさは限定されるものではなく、通
常、縦が10〜1000mm、好ましくは100〜50
0mm、横が10〜500mm、好ましくは10〜20
0mm、厚みが0.1〜100mm、好ましくは1〜2
0mmの板状体が好ましい。また、必要に応じてかかる
板状体よりも一回り大きな枠体および裏打ち材からなる
ケースに嵌めて補強した構造であってもよい。
A clay molding containing the semiconductor (hereinafter simply referred to as “clay molding”) used in the present invention or a hydrated aggregate of a hydraulic compound containing the semiconductor (hereinafter simply referred to as “hydrated aggregation”) Is usually 10 to 1000 parts by weight, preferably 20 to 600 parts by weight, and 100 to 1100 parts by weight of water, preferably 100 to 100 parts by weight of the powdery semiconductor with respect to 100 parts by weight of clay or hydraulic compound. 12
0 to 700 parts by weight are added and mixed, and the mixture is shaped using a mold such as a brick, tile, or kamaboko plate. In the case of clay, the clay is dried and solidified at 150 to 1000 ° C. to form a clay. In the case of a hydraulic compound, a hydration reaction is performed to form a hydrated aggregate. Incidentally, the hydration reaction of the hydraulic compound,
Usually, after 8 minutes of kneading, agglomeration starts. The hydration reaction does not necessarily need to be heated, but when heated, it is usually at most 300 ° C, preferably at most 150 ° C. If the temperature exceeds 300 ° C., the rate of the dehydration reaction of the reverse reaction becomes higher than the reaction rate of the hydration reaction, so that a hydrated aggregate may not be obtained. The shape and size of the clay molded product or the hydrated aggregate are not limited, and the length is usually 10 to 1000 mm, preferably 100 to 50 mm.
0 mm, 10 to 500 mm in width, preferably 10 to 20
0 mm, thickness 0.1-100 mm, preferably 1-2
A 0 mm plate is preferred. Further, if necessary, the structure may be reinforced by fitting a case made of a frame and a backing material which is slightly larger than the plate-like body.

【0011】本発明で使用する導電性線状材は、前記粘
土成形物または水和凝集物を衝撃などから保護し、か
つ、電熱、伝熱などにより加熱することができるもので
あれば限定されない。そのような導電性線状材の例とし
ては、針金、フィラメント、フィスカーなどの金属製の
細線;金属製の細管;電線、コードヒーターなどの金属
線を樹脂、ゴム、繊維などで絶縁被覆した被覆線などが
含まれる。金属製の細管の中にニクロム線などの熱線を
通して使用することもできる。また、前記線状材を用い
た金網、樹脂被覆金網などの金属製の網;ガラス繊維製
の網に導電性樹脂を被覆したネットなども使用すること
ができる。導電性線状材の径は、通常、0.1〜100
mm、好ましくは0.5〜10mmである。この構成線
状材の径が過度に細いと粘土成形物または水和凝集物を
衝撃や振動から保護する効果が低下するおそれがあり、
逆に、過度に太いと光触媒に紫外線が照射する面積が減
少する可能性があるので好ましくない。粘土成形物また
は水和凝集物の表面積に対する導電性線状材の投影面積
の割合(被覆率)は、通常、5〜80%、好ましくは2
0〜70%である。被覆率が過度に小さいと粘土成形物
または水和凝集物の衝撃や振動からの保護や光触媒反応
の加熱による活性化効果が小さくなるおそれがあり、逆
に、被覆率が過度に大きいと光が有効に粘土成形物また
は水和凝集物に届かなくなる可能性があるので好ましく
ない。導電性線状材を用いる態様としては、導電性線状
材を粘土成形物または水和凝集物の縦方向、横方向また
は斜め方向に等間隔または非等間隔に巻く態様、前記態
様における線状材の一部または全部を細管状の電熱ヒー
ターとする態様、網状ヒーターで粘土成形物または水和
凝集物をくるむ態様などが挙げられる。また、線状材を
粘土成形物または水和凝集物の内部に埋設させること
も、本発明の目的が同様に達せられるので可能である。
The conductive linear material used in the present invention is not limited as long as it protects the clay molded product or the hydrated aggregate from impact or the like and can be heated by electric heat, heat transfer or the like. . Examples of such conductive linear materials include metal thin wires such as wires, filaments, and fiskers; metal thin tubes; coatings obtained by insulating metal wires such as electric wires and cord heaters with resin, rubber, fiber, and the like. Lines are included. It can also be used by passing a hot wire such as a nichrome wire through a thin metal tube. In addition, metal nets such as wire nets and resin-coated wire nets using the linear material; nets made of glass fiber nets coated with a conductive resin can also be used. The diameter of the conductive linear material is usually 0.1 to 100.
mm, preferably 0.5 to 10 mm. If the diameter of the constituent linear material is excessively small, the effect of protecting the clay molded product or the hydrated aggregate from impact or vibration may be reduced,
Conversely, an excessively large thickness is not preferable because the area of the photocatalyst irradiated with ultraviolet rays may decrease. The ratio (coverage) of the projected area of the conductive linear material to the surface area of the clay molded product or the hydrated aggregate is usually 5 to 80%, preferably 2%.
0 to 70%. If the coverage is too small, the clay moldings or hydrated aggregates may be protected from shock or vibration, and the activation effect of heating the photocatalytic reaction may be reduced. It is not preferable because the clay moldings or the hydrated aggregates may not be effectively reached. As an embodiment using a conductive linear material, an embodiment in which the conductive linear material is wound at equal or non-equidistant intervals in a longitudinal direction, a lateral direction, or an oblique direction of a clay molded product or a hydrated agglomerate, Examples include a mode in which a part or all of the material is a tubular electric heater, and a mode in which a clay molded product or a hydrated aggregate is wrapped by a mesh heater. It is also possible to embed the linear material inside the clay molded product or the hydrated aggregate, since the object of the present invention is similarly achieved.

【0012】本発明で使用する導電性線状材を加熱する
ことにより光触媒反応を活性化することができる。加熱
する方法としては、特に限定されず、例えば熱源から線
状材に伝熱する方法、または線状材に通電して電熱によ
り加熱する方法などを挙げることができる。加熱の熱源
の例としては、電熱ヒーター、スチームヒーター、オイ
ルヒーター、熱水、温泉熱、太陽熱などが挙げられる。
光触媒体が加熱されるときの好ましい温度は、粘土成形
物または水和凝集物の紫外線が照射する面において1〜
500℃、より好ましくは5〜100℃である。光触媒
体の加熱される温度が過度に低いと光触媒反応はあまり
促進されないおそれがあり、逆に、光触媒体の加熱され
る温度が過度に高いと光触媒の性能が低下する可能性が
ある。
The photocatalytic reaction can be activated by heating the conductive linear material used in the present invention. The heating method is not particularly limited, and examples thereof include a method in which heat is transferred from a heat source to a linear material, and a method in which electric current is applied to the linear material to heat the linear material. Examples of the heat source for heating include an electric heater, a steam heater, an oil heater, hot water, hot spring heat, and solar heat.
The preferable temperature when the photocatalyst is heated is 1 to 3 on the surface of the clay molded product or the hydrated aggregate that is irradiated with ultraviolet rays.
The temperature is 500 ° C, more preferably 5 to 100 ° C. If the temperature at which the photocatalyst is heated is too low, the photocatalytic reaction may not be promoted much. Conversely, if the temperature at which the photocatalyst is heated is too high, the performance of the photocatalyst may be reduced.

【0013】光触媒体には、特に、波長400nm〜2
00nmの紫外線を照射すると光触媒反応が活発になる
ので好適である。紫外線の他に可視光線、赤外線が同時
に照射されてもよい。紫外線の光源としては、超高圧水
銀灯、キセノン灯、低圧水銀灯、ケミカルランプ、レー
ザー、LED、蛍光灯などが挙げられる。紫外線の光源
と光触媒体との間隔は、通常、1〜500mm、好まし
くは5〜100mmである。間隔が1mmより小さいと
光触媒反応性物質を含有する気体を光触媒反応の場に供
給することが困難になる傾向があり、逆に、間隔が50
0mmを越えると、光触媒反応性物質除去の反応が弱く
なるおそれがある。
The photocatalyst has a wavelength of 400 nm to 2 nm.
Irradiation with ultraviolet light of 00 nm is preferable because the photocatalytic reaction becomes active. Visible light and infrared light may be simultaneously irradiated in addition to ultraviolet light. Examples of the ultraviolet light source include an ultra-high pressure mercury lamp, a xenon lamp, a low-pressure mercury lamp, a chemical lamp, a laser, an LED, and a fluorescent lamp. The distance between the ultraviolet light source and the photocatalyst is usually 1 to 500 mm, preferably 5 to 100 mm. If the interval is smaller than 1 mm, it tends to be difficult to supply the gas containing the photocatalytically reactive substance to the photocatalytic reaction field.
If it exceeds 0 mm, the reaction of removing the photocatalytically reactive substance may be weak.

【0014】本発明の光触媒体が適用される用途として
は、アンモニア、アミン、メチルメルカプタン、硫化水
素、イソ吉草酸などの悪臭物質;エチレン、アセトアル
デヒドなどの植物成長促進物質;NO、SO
ホルマリンなどの人体有毒物質などの光触媒反応性物質
の分解除去である。これらの光触媒反応性物質を含有す
る気体を光触媒体に接触させて光触媒反応を起こして光
触媒反応性物質を分解除去することにより空気を清浄化
することができるので、悪臭を分解除去して快適な住空
間を得ることができ、植物成長促進物質を分解除去して
野菜、花卉などの園芸作物の鮮度を長期保持することが
でき、あるいはNO、SO、ホルマリンなどの
有毒物質を分解除去して健康な生活環境を確保すること
が可能となる。
[0014] As the applications in which photocatalyst of the present invention is applied, ammonia, amines, methyl mercaptan, hydrogen sulfide, malodorous substances such as isovaleric acid, ethylene, plant growth promoting substance, such as acetaldehyde; NO X, SO X,
It is the decomposition and removal of photocatalytically reactive substances such as human toxic substances such as formalin. The gas containing these photocatalytically reactive substances is brought into contact with the photocatalyst to cause a photocatalytic reaction to decompose and remove the photocatalytically reactive substances, thereby purifying the air. It can be obtained living space, and decomposed and removed plant growth promoting substances vegetables, fresh horticultural crops can be long retained, such as flowers, or NO X, SO X, the toxic decomposition removed as formalin It is possible to secure a healthy living environment.

【0015】本発明の光触媒体の使用方法は、半導体を
含有する粘土成形物または水和凝集物と導電性線状材と
から構成される光触媒体を加熱してこれに光触媒反応性
物質を含有する気体を接触させつつ紫外線を照射させて
もよいし、加熱された光触媒体に紫外線を照射させつつ
光触媒反応性物質を含有する気体を接触させてもよい。
また、光触媒反応性物質を含有する気体が接触する光触
媒体に紫外線を照射させつつ光触媒体を加熱してもよい
し、紫外線が照射している光触媒体に光触媒反応性物質
を接触させつつ光触媒体を加熱してもよい。すなわち、
本発明の光触媒体の使用方法は、光触媒体を加熱する工
程と、光触媒体に光触媒反応性物質を含有する気体を接
触させる工程と、光触媒体に紫外線を照射する工程の3
つの工程が組み合わされていれば順序はいずれでもよ
い。紫外線の光源と、その周りに形成される光触媒体群
との間隙に、光触媒反応性物質を含有する気体を流通さ
せるための手段、例えばファンを備えることにより光触
媒反応性物質を強制的に光触媒体に供給すると、有害物
質除去速度が向上するので好ましい。このように、紫外
線の光源と、その周りに形成される光触媒体群と、気体
を流通させる手段とで有害物質除去設備を構成しても良
い。
The method of using the photocatalyst of the present invention comprises heating a photocatalyst composed of a clay molding or hydrated aggregate containing a semiconductor and a conductive linear material, and containing a photocatalytically reactive substance therein. The gas containing the photocatalytic substance may be contacted while irradiating the ultraviolet rays to the heated photocatalyst while bringing the gas to be contacted into contact.
Further, the photocatalyst may be heated while irradiating the photocatalyst contacted with the gas containing the photocatalytic reactive substance with ultraviolet light, or may be contacted with the photocatalyst reactive substance on the photocatalyst irradiated with ultraviolet light. May be heated. That is,
The method for using the photocatalyst of the present invention includes the steps of heating the photocatalyst, contacting the photocatalyst with a gas containing a photocatalytically reactive substance, and irradiating the photocatalyst with ultraviolet light.
The order may be any as long as the three steps are combined. In the gap between the ultraviolet light source and the group of photocatalysts formed therearound, means for flowing a gas containing the photocatalytically reactive substance, for example, by providing a fan, the photocatalytically reactive substance is forcibly dispensed with the photocatalyst. Is preferable because the speed of removing harmful substances is improved. As described above, the harmful substance removing equipment may be configured by the ultraviolet light source, the photocatalyst group formed around the ultraviolet light source, and the means for flowing the gas.

【0016】次に、本発明の光触媒体の実施形態を図面
により説明する。図1は本発明に係る光触媒体の一実施
形態を示す斜視図である。水和凝集物1は、二酸化チタ
ンの粉末を、焼石膏の粉末に分散し水を加え、型に入れ
てから120〜150℃で水和反応して固めて形成した
板状体で、その表面は材質SUS、径1mmの針金から
なる金網2で被覆率40%で保護されている。水和凝集
物1と金網2とから本発明の光触媒体が形成されてい
る。電熱ヒーター3(フレキシブルリボンヒーター)が
銅ブロック4に巻かれており、図示していないスライダ
ックで温度設定する加熱手段に金網2が接触しているこ
とにより伝熱で水和凝集物1が加熱されている。水和凝
集物1の大きさは、縦180〜200mm、横50〜6
0mm、厚み5〜10mmのである。水和凝集物1が金
網2で覆われているので、例え衝撃や振動により石膏に
ひびが入るようなことがあっても崩落を防ぐことができ
る。電熱ヒーター3の熱を金網2が伝熱することにより
水和凝集物1が好ましくは1〜500℃に、更に好まし
くは5〜100℃に加温されるので、紫外線照射下で悪
臭物質、植物成長物質、有毒物質などのような光触媒反
応性物質を光触媒体1に接触させると、加熱されていな
い時に比して有利に光触媒反応により分解させることが
できる。
Next, an embodiment of the photocatalyst of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing an embodiment of the photocatalyst according to the present invention. The hydrated aggregate 1 is a plate-like body formed by dispersing titanium dioxide powder in calcined gypsum powder, adding water, placing the mixture in a mold, and hydrating at 120 to 150 ° C. to form a solid. Is protected by a wire mesh 2 made of a material SUS and having a diameter of 1 mm at a coverage of 40%. The photocatalyst of the present invention is formed from the hydrated aggregate 1 and the wire mesh 2. An electric heater 3 (flexible ribbon heater) is wound around a copper block 4, and the hydrated aggregates 1 are heated by heat transfer because the wire mesh 2 is in contact with a heating means (not shown) for setting the temperature with a sliderac. ing. The size of the hydrated aggregate 1 is 180 to 200 mm in length and 50 to 6 in width.
0 mm and a thickness of 5 to 10 mm. Since the hydrated aggregate 1 is covered with the wire mesh 2, even if the gypsum is cracked by impact or vibration, it can be prevented from falling. The hydrated aggregates 1 are preferably heated to 1 to 500 ° C., more preferably 5 to 100 ° C. by transferring the heat of the electric heater 3 to the wire netting 2, so that malodorous substances and plants are irradiated under ultraviolet irradiation. When a photocatalytically reactive substance such as a growth substance or a toxic substance is brought into contact with the photocatalyst 1, it can be decomposed by a photocatalytic reaction more advantageously than when it is not heated.

【0017】図2は、本発明の光触媒体の第2の実施形
態を示す斜視図である。水和凝集物1の長手方向に宛が
われた電熱チューブヒーター5を、短手方向に巻かれた
5本の針金6で固定することにより水和凝集物1が保護
されている。第2の実施形態においても、第1の実施形
態と同様に、水和凝集物1が加熱されることにより、紫
外線照射下において光触媒反応性物質の光触媒反応によ
る分解が促進される。また、第1の実施形態と同様な水
和凝集物1の崩落防止効果がある。
FIG. 2 is a perspective view showing a second embodiment of the photocatalyst according to the present invention. The hydrated aggregate 1 is protected by fixing the electric heating tube heater 5 addressed to the longitudinal direction of the hydrated aggregate 1 with five wires 6 wound in the transverse direction. Also in the second embodiment, similarly to the first embodiment, the decomposition of the photocatalytically reactive substance by the photocatalytic reaction is promoted under the irradiation of ultraviolet rays by heating the hydrated aggregate 1. Further, there is an effect of preventing the hydrated aggregates 1 from falling as in the first embodiment.

【0018】図3は、本発明の光触媒体の第3の実施形
態を示す斜視図である。ここでは第2の実施形態におけ
る細管状電熱ヒーター5が、光触媒体の内部に埋め込ま
れている。細管状伝熱ヒーターや針金6により水和凝集
物を衝撃や振動による崩落を防ぐと共に、ヒーターによ
る加熱で光触媒反応の活性化が図られている。
FIG. 3 is a perspective view showing a third embodiment of the photocatalyst according to the present invention. Here, the thin tubular electric heater 5 in the second embodiment is embedded inside the photocatalyst. The hydrated aggregates are prevented from collapsing due to impact or vibration by a thin tubular heat transfer heater or wire 6, and the photocatalytic reaction is activated by heating by the heater.

【0019】[0019]

【実施例】以下に、実施例を挙げて本発明を詳細に説明
するが、本発明はこれらにより限定されるものではな
い。なお、部数は特に表記しない限り、重量基準であ
る。 (1)光触媒体の調製 二酸化チタン(A−100、多木化学株式会社製、一次
粒子径8nm)1部、焼石膏1部および水2部を混練し
てから粘土製の縦190mm、横50mm、高さ8mm
の型に入れて賦形して水和固化後、150℃に加熱し
て、型と同寸法の水和凝集物を得た。水和凝集物1個あ
たりの二酸化チタン量は15gであった。この水和凝集
物をSUS製の径1mmの金網(長手方向12本と短手
方向24本の針金で形成される)で被覆して図1に示す
ような光触媒体を得た。これを2個調製した。線状材に
よる被覆率は40%であった。 (2)ガス濃度の測定 エチレン濃度の測定は、水素炎イオン化検出器(FI
D)型ガスクロマトグラフィーによった。メチルメルカ
プタンの濃度の分析は、FID型ガスグロマトグラフィ
ーによった。
The present invention will be described below in detail with reference to examples, but the present invention is not limited to these examples. The number of copies is based on weight unless otherwise specified. (1) Preparation of Photocatalyst One part of titanium dioxide (A-100, manufactured by Taki Kagaku Co., Ltd., primary particle diameter 8 nm), one part of calcined gypsum and two parts of water are kneaded, and then 190 mm long and 50 mm wide made of clay. , Height 8mm
After hydration and solidification by shaping in a mold, the mixture was heated to 150 ° C. to obtain a hydrated aggregate having the same dimensions as the mold. The amount of titanium dioxide per hydrated aggregate was 15 g. This hydrated aggregate was covered with a SUS wire mesh having a diameter of 1 mm (formed of 12 wires in the longitudinal direction and 24 wires in the transverse direction) to obtain a photocatalyst as shown in FIG. Two of them were prepared. The coverage by the linear material was 40%. (2) Measurement of gas concentration Ethylene concentration was measured using a flame ionization detector (FI
D) type gas chromatography. The analysis of the concentration of methyl mercaptan was based on FID type gas chromatography.

【0020】実施例1 縦30cm、30cm、高さ30cmのアクリル板製の
ボックス(天面が蓋を兼ねる)の中に、図1の形態の光
触媒体2本を垂直に8cm離して固定し、その中央に長
さ46cm、径2.6cmの捕虫器用蛍光ランプ〔FL
15BL、東芝(株)製、主波長352nm)を設置し
た。次ぎに、ボックス外にあるスライダックで温度調整
した電熱ヒーター3(フレキシブルリボンヒーター)に
より銅ブロック4を加熱し、これに接触している金網2
に伝熱させた。水和凝集物1のランプ側の表面温度は4
0℃であった。ボックス内に初期濃度10ppmとなる
量のエチレンを注入し、系内が一定濃度となるよう30
分間経過してからランプを点灯し、以後15分経過する
毎にボックス内の気体をサンプリングしてエチレン濃度
を測定した。
Example 1 Two photocatalysts of the form shown in FIG. 1 were fixed vertically 8 cm apart in a box made of an acrylic plate having a height of 30 cm, a height of 30 cm and a height of 30 cm. In the center, a fluorescent lamp for insect traps with a length of 46 cm and a diameter of 2.6 cm [FL
15BL, manufactured by Toshiba Corporation, main wavelength: 352 nm). Next, the copper block 4 is heated by the electric heater 3 (flexible ribbon heater) whose temperature has been adjusted by a slide rack outside the box, and the wire mesh 2 in contact with the copper block 4 is heated.
The heat was transferred to The surface temperature of the hydrated aggregate 1 on the lamp side is 4
It was 0 ° C. Ethylene was injected into the box in an amount to give an initial concentration of 10 ppm, and 30% of the system was maintained at a constant concentration.
After a lapse of minutes, the lamp was turned on, and every 15 minutes thereafter, the gas in the box was sampled to measure the ethylene concentration.

【0021】比較例1 伝熱による光触媒体の加温をせず、室温25℃にて試験
した他は実施例1と同様に行って15分経過する毎にエ
チレンの濃度を測定した。実施例2、比較例2 実施例1および比較例1のエチレンをメチルメルカプタ
ンに変えた他は実施例1および比較例1と同様に行っ
た。実施例1〜2および比較例1〜2の結果を表1に示
す。なお、N.D.は検出限界以下の濃度であることを
示す。
Comparative Example 1 The procedure of Example 1 was repeated except that the photocatalyst was not heated by heat transfer but was tested at room temperature of 25 ° C., and the ethylene concentration was measured every 15 minutes. Example 2 and Comparative Example 2 Example 1 and Comparative Example 1 were carried out in the same manner as in Example 1 and Comparative Example 1 except that ethylene was changed to methyl mercaptan. Table 1 shows the results of Examples 1 and 2 and Comparative Examples 1 and 2. In addition, N. D. Indicates that the concentration is below the detection limit.

【0022】[0022]

【表1】 [Table 1]

【0023】実施例3、比較例3 水和凝集物に金網を被覆して得た図1の光触媒体と、線
状材を被覆していない水和凝集物のおのおの3個づつの
試料について、緩衝材用落下衝撃試験機(CST−18
0、吉田精機株式会社製)を用いて、試料の上に2kg
の錘を落として割れ、崩れの発生状況を調べた。2kg
の錘を最初は高さ10cmの位置から落下させ、次第に
落下させる位置を高くして試料にかかる加速度G値を大
きくして試験した。その結果、本発明の光触媒体は、1
95Gを超えても表面の石膏がわずかに崩れ程度であ
り、割れることはなかった。一方、線状材で保護しなか
った水和凝集物は、40Gにて粉々に砕けた。
Example 3 and Comparative Example 3 For each of three samples of the photocatalyst shown in FIG. 1 obtained by coating a hydrated agglomerate with a wire mesh, and three hydrated agglomerates not coated with a linear material, Drop impact tester for cushioning material (CST-18
0, manufactured by Yoshida Seiki Co., Ltd.)
The weight was dropped and cracked, and the occurrence of collapse was examined. 2kg
First, the weight was dropped from a position having a height of 10 cm, and the position at which the weight was gradually dropped was increased to increase the acceleration G value applied to the sample. As a result, the photocatalyst of the present invention has 1
Even if it exceeded 95G, the plaster on the surface was slightly collapsed and did not break. On the other hand, the hydrated aggregate not protected by the linear material was broken into pieces at 40G.

【0024】表1より、導電性線状材で保護した光触媒
体を伝熱により加熱すると光触媒反応による光触媒反応
性物質除去反応が大きく促進されることが示された。ま
た、実施例3および比較例3の対比から、光触媒体を線
状材で保護することにより、衝撃を受けても割れにく
い、かつ、崩落しにくい光触媒体となったことが示され
た。
Table 1 shows that heating the photocatalyst protected by the conductive linear material by heat transfer greatly accelerates the photocatalytically reactive substance removal reaction by the photocatalytic reaction. In addition, from the comparison between Example 3 and Comparative Example 3, it was shown that by protecting the photocatalyst with the linear material, the photocatalyst was less likely to be broken and less likely to collapse even when subjected to an impact.

【0025】[0025]

【発明の効果】本発明により、空気中の悪臭物質、植物
成長促進物質、毒性物質などの光触媒反応性物質を迅速
に分解除去することができる、衝撃や振動に強い光触媒
体が得られる。
According to the present invention, it is possible to obtain a photocatalyst which can rapidly decompose and remove photocatalytic reactive substances such as malodorous substances, plant growth promoting substances and toxic substances in the air and which is resistant to shock and vibration.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明の一実施形態の光触媒体が電熱
ヒーターからの伝熱で加熱されている態様を示す斜視図
である。
FIG. 1 is a perspective view showing an embodiment in which a photocatalyst according to one embodiment of the present invention is heated by heat transfer from an electric heater.

【図2】図2は、本発明の他の実施形態の光触媒体が電
熱で加熱されている態様を示す斜視図である。
FIG. 2 is a perspective view showing a mode in which a photocatalyst according to another embodiment of the present invention is heated by electric heat.

【図3】図3は、本発明の更に他の実施形態の光触媒体
が電熱で加熱されている態様を示す斜視図である。
FIG. 3 is a perspective view showing a state in which a photocatalyst according to still another embodiment of the present invention is heated by electric heat.

【符号の説明】[Explanation of symbols]

1 水和凝集物 2 金網 3 電熱ヒーター 4 銅ブロック 5 電熱チューブヒーター 6 針金 DESCRIPTION OF SYMBOLS 1 Hydrated aggregate 2 Wire mesh 3 Electric heater 4 Copper block 5 Electric tube heater 6 Wire

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) B01J 27/053 B01D 53/36 D ZABJ Fターム(参考) 4C080 AA07 AA10 BB02 BB05 CC02 CC05 CC08 HH05 KK08 LL10 MM02 NN01 QQ03 QQ14 4D048 AA01 AA02 AA03 AA05 AA08 AA17 AA19 AB03 BA02X BA07X BA41X BA46X BB03 BB11 CA02 CC43 EA01 4G069 AA02 AA08 BA04B BA10A BA48A BB10B BC09B CA10 CA12 CA13 CA15 CA17 CD10 DA06 EA11 EE02 EE03 FA02 FB07 FB66 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (Reference) B01J 27/053 B01D 53/36 D ZABJ F-term (Reference) 4C080 AA07 AA10 BB02 BB05 CC02 CC05 CC08 HH05 KK08 LL10 MM02 NN01 QQ03 QQ14 4D048 AA01 AA02 AA03 AA05 AA08 AA17 AA19 AB03 BA02X BA07X BA41X BA46X BB03 BB11 CA02 CC43 EA01 4G069 AA02 AA08 BA04B BA10A BA48A BB10B BC09B CA10 CA12 CA13 FE03 EA03

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 0.5〜5eVの禁止帯幅を有する半導
体を含有する粘土成形物または水硬性化合物の水和凝集
物と導電性線状材とから構成される光触媒体。
1. A photocatalyst comprising a clay molding containing a semiconductor having a bandgap of 0.5 to 5 eV or a hydrated aggregate of a hydraulic compound and a conductive linear material.
【請求項2】 請求項1記載の光触媒体を加熱する工程
と、 前記光触媒体に光触媒反応性物質を含有する気体を接触
させる工程と、 前記光触媒体に紫外線を照射する工程とを有する光触媒
体の使用方法。
2. A photocatalyst, comprising: heating the photocatalyst according to claim 1, contacting the photocatalyst with a gas containing a photocatalytically reactive substance, and irradiating the photocatalyst with ultraviolet light. How to use
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004113961A (en) * 2002-09-27 2004-04-15 Osada Giken Co Ltd Gas component decomposition method
JP2005139440A (en) * 2003-10-17 2005-06-02 Hitoshi Mizuguchi Method for decomposing compound
JP2006055821A (en) * 2004-08-24 2006-03-02 Osada Giken Co Ltd Method and apparatus for treating gas from waste water tank
JP2007105122A (en) * 2005-10-11 2007-04-26 Fujitsu General Ltd Air cleaner
WO2007100039A1 (en) * 2006-03-01 2007-09-07 Nissan Motor Co., Ltd. Photocatalyst activation system and method for activating photocatalyst
JP2010088969A (en) * 2008-10-03 2010-04-22 Ntt Gp Eco Communication Inc Apparatus and method for decomposing hazardous substance
CN110479229A (en) * 2019-08-13 2019-11-22 云南大学 A kind of preparation method and application of different shape plant photochemical catalyst

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004113961A (en) * 2002-09-27 2004-04-15 Osada Giken Co Ltd Gas component decomposition method
JP2005139440A (en) * 2003-10-17 2005-06-02 Hitoshi Mizuguchi Method for decomposing compound
JP4517146B2 (en) * 2003-10-17 2010-08-04 国立大学法人横浜国立大学 Method for decomposing compounds
JP2006055821A (en) * 2004-08-24 2006-03-02 Osada Giken Co Ltd Method and apparatus for treating gas from waste water tank
JP2007105122A (en) * 2005-10-11 2007-04-26 Fujitsu General Ltd Air cleaner
JP4640096B2 (en) * 2005-10-11 2011-03-02 株式会社富士通ゼネラル Air cleaner
WO2007100039A1 (en) * 2006-03-01 2007-09-07 Nissan Motor Co., Ltd. Photocatalyst activation system and method for activating photocatalyst
JP2010088969A (en) * 2008-10-03 2010-04-22 Ntt Gp Eco Communication Inc Apparatus and method for decomposing hazardous substance
CN110479229A (en) * 2019-08-13 2019-11-22 云南大学 A kind of preparation method and application of different shape plant photochemical catalyst

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