JP2001318218A - Ovd medium and method for manufacturing the same - Google Patents

Ovd medium and method for manufacturing the same

Info

Publication number
JP2001318218A
JP2001318218A JP2000135812A JP2000135812A JP2001318218A JP 2001318218 A JP2001318218 A JP 2001318218A JP 2000135812 A JP2000135812 A JP 2000135812A JP 2000135812 A JP2000135812 A JP 2000135812A JP 2001318218 A JP2001318218 A JP 2001318218A
Authority
JP
Japan
Prior art keywords
ovd
medium
destroyed
manufacturing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000135812A
Other languages
Japanese (ja)
Other versions
JP4078790B2 (en
Inventor
Akira Kubo
章 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP2000135812A priority Critical patent/JP4078790B2/en
Publication of JP2001318218A publication Critical patent/JP2001318218A/en
Application granted granted Critical
Publication of JP4078790B2 publication Critical patent/JP4078790B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Duplication Or Marking (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an inexpensive OVD(optical variable device) medium 16 by destroying a part of an OVD and adhering another OVD having another image to the first OVD, and to provide a method for manufacturing the medium. SOLUTION: A part of an OVD is destroyed by heating and pressurizing with using a plate 12, which has a rugged pattern consisting of a recess and a projection with a rough surface and represents another image, such as figures and characters by the recess and the projection with the rough surface. When an OVD transfer foil 53 is transferred to a support body 14, the plate 12 having a rugged pattern is used.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、OVD媒体に関す
るものであり、特に、OVDに絵柄・文字など別な画像
を形成したOVDが貼付されたOVD媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an OVD medium, and more particularly to an OVD medium having an OVD on which another image such as a picture or character is formed.

【0002】[0002]

【従来の技術】従来よりOVDは、意匠性やセキュリテ
ィー性を向上させるために種々な媒体に貼付されてき
た。これは、OVDはエンボス成形、或いは多層薄膜蒸
着などにより大量に廉価に複製できるからであり、また
一方では、カラーコピーなどでは複製できないためであ
る。しかし、一旦、撮影されたホログラムや多層薄膜を
部分的に変えて絵柄・文字など別な画像を与えることは
難しいものであり、ホログラムや多層薄膜の一部分に絵
柄・文字など別な画像を与える際には、例えば、レーザ
を用いて部分的に加熱しOVDを破壊することになる
が、この方法は設備に多大な投資を必要とする欠点を有
している。
2. Description of the Related Art Conventionally, OVD has been affixed to various media in order to improve design and security. This is because OVD can be duplicated in large quantities at low cost by embossing or multi-layer thin film deposition, while it cannot be duplicated by color copying or the like. However, it is difficult to give a different image such as a picture or character by partially changing the photographed hologram or multilayer thin film. In this method, for example, the OVD is destroyed by partial heating using a laser, but this method has a drawback that requires a large investment in equipment.

【0003】[0003]

【発明が解決しようとする課題】本発明は、上記の欠点
を解決するためになされたものであり、ホログラムや多
層薄膜などOVDの少なくとも一部分を破壊して、OV
Dに絵柄・文字など別な画像を形成したOVDが貼付さ
れたOVD媒体であって、多大な投資を必要とせずに製
造できる、廉価なOVD媒体を提供することを課題とす
る。また、上記多大な投資を必要とせずに製造できる、
廉価なOVD媒体の製造方法を提供することを課題とす
る。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned drawbacks, and at least a part of an OVD such as a hologram or a multilayer thin film is destroyed to obtain an OVD.
It is an object of the present invention to provide an inexpensive OVD medium, which is an OVD medium in which an OVD in which another image such as a pattern or a character is formed on D is attached and which can be manufactured without requiring a large investment. In addition, it can be manufactured without requiring a large investment as described above,
It is an object to provide a method for manufacturing an inexpensive OVD medium.

【0004】[0004]

【課題を解決するための手段】本発明は、OVDの少な
くとも一部分を破壊して、OVDに絵柄・文字など別な
画像を形成したOVDが貼付されたOVD媒体におい
て、該少なくとも一部分を、その表面が凹部と表面凹凸
状の凸部とで構成され、該凹部と表面凹凸状の凸部とで
絵柄・文字など別な画像を表す凹凸版を用いた加熱・加
圧によって破壊したことを特徴とするOVD媒体であ
る。
SUMMARY OF THE INVENTION According to the present invention, there is provided an OVD medium in which at least a portion of an OVD is destroyed and an OVD on which another image such as a picture or a character is formed is attached to the OVD. Is composed of a concave portion and a convex portion having an uneven surface, and the concave portion and the convex portion having a concave and convex surface are destroyed by heating and pressing using a concavo-convex plate representing another image such as a picture or a character. OVD media.

【0005】また、本発明は、上記発明によるOVD媒
体の製造方法であって、OVDが形成されたOVD転写
箔のOVDを支持体に転写する際に、凹凸版を用いて転
写することを特徴とするOVD媒体の製造方法である。
[0005] The present invention also relates to a method for producing an OVD medium according to the present invention, wherein the OVD of the OVD transfer foil on which the OVD is formed is transferred to a support by using an uneven plate. This is a method for manufacturing an OVD medium.

【0006】[0006]

【発明の実施の形態】以下に本発明の実施の形態を詳細
に説明する。図1は、本発明によるOVD媒体の一実施
例の平面図である。また、図2は、図1における一実施
例をX−X’断面で示す断面図である。図1、及び図2
に示すように、OVD媒体(16)は、支持体(14)
上にOVD(13)が設けられたものである。OVD
(13)は、OVDが破壊されていない非凹凸部(13
a)とOVDが破壊された凹凸部(13b)とで構成さ
れている。そして、OVDが破壊されていない非凹凸部
(13a)とOVDが破壊された凹凸部(13b)との
境界によって示される文字「A」を表す別な画像がOV
D(13)に与えられたものとなっている。
Embodiments of the present invention will be described below in detail. FIG. 1 is a plan view of an embodiment of an OVD medium according to the present invention. FIG. 2 is a cross-sectional view showing one embodiment of FIG. 1 along the line XX ′. 1 and 2
As shown, the OVD medium (16) comprises a support (14).
The OVD (13) is provided above. OVD
(13) is a non-uneven portion (13) in which the OVD is not destroyed.
a) and an uneven portion (13b) in which the OVD is destroyed. Another image representing the letter "A" indicated by the boundary between the non-concavo-convex portion (13a) where the OVD is not destroyed and the concavo-convex portion (13b) where the OVD has been destroyed is an OV.
D (13).

【0007】図3は、このような、文字「A」を表す別
な画像がOVD(13)に与えられたOVD媒体(1
6)を製造する際に用いるホットスタンプの概念を示し
た断面図である。図3に示すように、ホットスタンプの
プレス版取り付け部(11)に凹凸版(12)を取り付
けておき、予め、支持体(14)上にOVD(13)が
貼付されたOVD媒体(16)を台座(15)上に配
し、凹凸版(12)を押し付けることにより、凹凸版
(12)の凸部がOVDの干渉構造もしくは回折構造を
破壊し、OVD(13)に、OVDが破壊されていない
非凹凸部(13a)とOVDが破壊された凹凸部(13
b)を形成する。すなわち、OVDが破壊されていない
非凹凸部(13a)とOVDが破壊された凹凸部(13
b)との境界によって示される文字「A」を表す別な画
像がOVD(13)に与えられる。
FIG. 3 shows an OVD medium (1) in which another image representing the character "A" is given to the OVD (13).
It is sectional drawing which showed the concept of the hot stamp used when manufacturing 6). As shown in FIG. 3, an uneven plate (12) is attached to a press plate attaching portion (11) of a hot stamp, and an OVD medium (16) on which an OVD (13) is pasted on a support (14) in advance. Is arranged on the pedestal (15), and by pressing the relief plate (12), the projections of the relief plate (12) destroy the interference structure or diffraction structure of the OVD, and the OVD (13) destroys the OVD. The non-concavo-convex portion (13a) that has not been destroyed and the concavo-convex portion (13
b) is formed. That is, the non-uneven portion (13a) where the OVD is not destroyed and the uneven portion (13a) where the OVD is destroyed.
Another image representing the letter "A" indicated by the border with b) is provided to OVD (13).

【0008】図4は、この際に用いる凹凸版(12)の
表面状態を示す説明図であるが、凹凸版(12)の表面
状態は、凹部(12a)と凸部(12b)とで文字
「A」を表すように構成されており、凸部(12b)の
表面は、OVDを加熱・加圧することによって破壊する
ための表面凹凸状となっている。従って、上記のよう
に、本発明によるOVD媒体は、凹凸版を用いたプレス
によってOVDに絵柄・文字など別な画像を形成するの
で、多大な投資を必要とせず、廉価なOVD媒体とな
る。
FIG. 4 is an explanatory view showing the surface condition of the relief printing plate (12) used in this case. The surface condition of the relief printing plate (12) is composed of a concave portion (12a) and a convex portion (12b). It is configured to represent "A", and the surface of the convex portion (12b) has a surface irregular shape for breaking the OVD by heating and pressing. Therefore, as described above, the OVD medium according to the present invention forms a different image such as a picture or a character on the OVD by pressing using a concavo-convex plate, so that it does not require a large investment and is an inexpensive OVD medium.

【0009】図5は、本発明によるOVD媒体の製造方
法を示す説明図である。本発明によるOVD媒体の製造
方法は、図5に示すように、ホットスタンプのプレス版
取り付け部(11)に凹凸版(12)を取り付けてお
き、台座(15)上の支持体(14)の上に、OVDが
形成されたOVD転写箔(53)を配し、凹凸版(1
2)を押し付けることにより、OVD転写箔(53)の
OVD(13)を支持体(14)に転写し、製造するも
のである。
FIG. 5 is an explanatory view showing a method of manufacturing an OVD medium according to the present invention. In the method of manufacturing an OVD medium according to the present invention, as shown in FIG. 5, an uneven plate (12) is attached to a press plate attaching portion (11) of a hot stamp, and a support (14) on a pedestal (15) is formed. An OVD transfer foil (53) on which OVD is formed is disposed thereon, and
By pressing 2), the OVD (13) of the OVD transfer foil (53) is transferred to the support (14) and manufactured.

【0010】この転写により、OVD転写箔(53)に
形成されたOVD(13)が支持体(14)に転写され
ると同時に、上記凹凸版(12)の凸部がOVDの干渉
構造もしくは回折構造を破壊し、OVD(13)に、O
VDが破壊されていない非凹凸部(13a)とOVDが
破壊された凹凸部(13b)を形成する。すなわち、本
発明によるOVD媒体の製造方法は、OVDが破壊され
ていない非凹凸部(13a)とOVDが破壊された凹凸
部(13b)との境界によって示される文字「A」を表
す別な画像がOVD(13)に効率よく与えられるOV
D媒体の製造方法となる。
[0010] By this transfer, the OVD (13) formed on the OVD transfer foil (53) is transferred to the support (14), and at the same time, the projections of the concavo-convex plate (12) are subjected to the OVD interference structure or diffraction. The structure is destroyed and OVD (13)
A non-concavo-convex portion (13a) where VD is not destroyed and a concavo-convex portion (13b) where OVD is destroyed are formed. That is, in the method of manufacturing an OVD medium according to the present invention, another image representing the letter “A” indicated by the boundary between the non-concavo-convex portion (13a) in which the OVD is not broken and the concavo-convex portion (13b) in which the OVD is broken is provided. Is efficiently given to OVD (13)
This is a method for manufacturing a D medium.

【0011】本発明でいうOVD(Optical V
ariable Device)とは、ホログラムや回
折格子などの光回折効果を持つものや多層薄膜のような
光干渉効果を持つものを指す。ホログラムや回折格子の
ようなOVDとしては、光の干渉縞を微細な凹凸パター
ンとして平面に記録するレリーフ型や体積方向に干渉縞
を記録する体積型がある。
In the present invention, OVD (Optical V)
The term “arrivable device” refers to a device having a light diffraction effect such as a hologram or a diffraction grating, or a device having a light interference effect such as a multilayer thin film. As OVDs such as holograms and diffraction gratings, there are a relief type for recording interference fringes of light on a plane as a fine uneven pattern and a volume type for recording interference fringes in a volume direction.

【0012】また、見る角度により色の変化(カラーシ
フト)を生じる多層薄膜のようなOVDとしては、光学
特性の異なるセラミックスや金属の薄膜を積層したもの
がある。この他に、光の干渉を利用した固有の像や色の
変化を生じるものであればこれらに限られるものではな
い。これらのOVDの中では、量産性やコストを考慮し
た場合には、レリーフ型ホログラム(回折格子)や多層
薄膜が好ましいものである。
Further, as an OVD such as a multilayer thin film which causes a color change (color shift) depending on a viewing angle, there is a laminate of ceramic or metal thin films having different optical characteristics. In addition to the above, the present invention is not limited to these as long as they cause a unique image or color change using light interference. Among these OVDs, a relief hologram (diffraction grating) or a multilayer thin film is preferable in consideration of mass productivity and cost.

【0013】レリーフ型ホログラム(回折格子)は光学
的な撮影方法により、微細な凹凸パターンからなるレリ
ーフ型のマスターホログラムを作製し、次に、このマス
ターホログラムから電気メッキ法により凹凸パターンを
複製したニッケル製のプレス版を作製し量産する。すな
わち、このプレス版を加熱し、ホログラム形成層に押し
当て、凹凸パターンを複製する。
A relief type hologram (diffraction grating) is prepared by preparing a relief type master hologram having a fine concavo-convex pattern by an optical imaging method, and then replicating the concavo-convex pattern from the master hologram by electroplating. Press plates are manufactured and mass-produced. That is, this press plate is heated and pressed against the hologram-forming layer to copy the concavo-convex pattern.

【0014】それゆえ、ホログラム形成層は熱による成
形性が良好で、プレスムラが生じ難く、明るい再生像が
得られる材料であることが必要であり、例えば、ポリカ
ーボネート樹脂、ポリスチレン樹脂、ポリ塩化ビニル樹
脂などの熱可塑性樹脂、不飽和ポリエステル樹脂、メラ
ミン樹脂、エポキシ樹脂などの熱硬化性樹脂、あるい
は、ラジカル重合性不飽和基を有する紫外線や電子線硬
化性樹脂を単独あるいは複合して用いることができる。
また、上記以外のものでも、ホログラム形成層として凹
凸パターンを形成可能な安定な材料であれば使用可能で
ある。
Therefore, the hologram forming layer needs to be a material that has good moldability due to heat, hardly causes press unevenness, and can obtain a bright reproduced image. For example, a polycarbonate resin, a polystyrene resin, and a polyvinyl chloride resin are required. Thermoplastic resins such as thermoplastic resins, unsaturated polyester resins, melamine resins, epoxy resins, or ultraviolet or electron beam curable resins having radically polymerizable unsaturated groups can be used alone or in combination. .
In addition, any material other than the above can be used as long as it is a stable material capable of forming a concavo-convex pattern as the hologram forming layer.

【0015】また、OVDにレリーフ型ホログラム(回
折格子)を用いた場合、その回折効率を高めるためレリ
ーフ面を構成する高分子材料(ホログラム形成層)と屈
折率の異なる反射層を設けることが好ましい。この反射
層を設けることにより、回折効率が向上し、より鮮明な
画像や色の変化をもたらすものになる。用いる材料とし
ては、屈折率の異なるTiO2 、SiO2 、SiO、F
2 3 、ZnSなどの高屈折率材料や、より反射効果
の高いAl、Sn、Cr、Ni、Cu、Au等の金属材
料が挙げられる。これらの材料は単独あるいは積層して
使用できるものであり、これらの材料は真空蒸着法、ス
パッタリング等の公知の薄膜形成技術にて形成され、そ
の膜厚は用途によって異なるが、5〜1000nm程度
で形成される。
When a relief hologram (diffraction grating) is used for the OVD, it is preferable to provide a reflective layer having a different refractive index from the polymer material (hologram forming layer) constituting the relief surface in order to increase the diffraction efficiency. . By providing this reflective layer, the diffraction efficiency is improved, and a clearer image and color change can be obtained. The materials used include TiO 2 , SiO 2 , SiO, and F having different refractive indexes.
Examples include a high refractive index material such as e 2 O 3 and ZnS, and a metal material such as Al, Sn, Cr, Ni, Cu, and Au having a higher reflection effect. These materials can be used alone or in a laminated form. These materials are formed by a known thin film forming technique such as a vacuum evaporation method and sputtering, and the thickness thereof varies depending on the application. It is formed.

【0016】また、その屈折率が、ホログラム形成層で
使用される高分子材料(屈折率n=1.3〜1.5)よ
りも高い材料であれば、上記の無機材料以外の有機系、
有機無機複合体、有機系材料に無機系フィラーを分散し
たものなどが使用可能である。これらの材料はグラビア
コート、ダイコート、スクリーン印刷等の公知のコーテ
ィング法や印刷法にて0.1〜10μm程度のホログラ
ム形成層に形成される。また、上記以外の材料であって
も反射性を有した材料であれば、適宜使用することが可
能である。
If the refractive index is higher than the polymer material (refractive index n = 1.3 to 1.5) used in the hologram forming layer, organic materials other than the above-mentioned inorganic materials can be used.
An organic-inorganic composite, a material in which an inorganic filler is dispersed in an organic material, or the like can be used. These materials are formed on a hologram-forming layer having a thickness of about 0.1 to 10 μm by a known coating method or printing method such as gravure coating, die coating, or screen printing. In addition, any material other than the above can be used as long as it has a reflective property.

【0017】一方、多層薄膜で形成されるOVDは、異
なる光学適性を有する多層薄膜層からなり、金属薄膜、
セラミックス薄膜またはそれらを併設してなる複合薄膜
として積層形成される。たとえば、屈折率の異なる薄膜
を積層する場合、高屈折率の薄膜と低屈折率の薄膜を組
み合わせても良く、また特定の組み合わせを交互に積層
するようにしてもよい。それらの組み合わせにより、所
望の多層薄膜を得ることができる。
On the other hand, an OVD formed of a multilayer thin film includes multilayer thin films having different optical aptitudes,
It is formed by laminating as a ceramic thin film or a composite thin film formed by attaching them. For example, when thin films having different refractive indexes are stacked, a thin film having a high refractive index and a thin film having a low refractive index may be combined, or a specific combination may be alternately stacked. A desired multilayer thin film can be obtained by a combination thereof.

【0018】この多層薄膜には、セラミックスや金属な
どの材料が用いられ、おおよそ屈折率が2.0以上の高
屈折率材料と屈折率が1.5程度の低屈折率材料を所定
の膜圧で積層したものである。以下に用いられる材料の
一例を挙げる。まず、セラミックスとしては、例えば、
Sb2 3 (3.0)、Fe2 3 (2.7)、TiO
2 (2.6)、CdS(2.6)、CeO2 (2.
3)、ZnS(2.3)、PbCl2 (2.3)、Cd
O(2.2)、Sb2 3 (2.0)、WO3 (2.
0)、SiO(2.0)、Si2 3 (2.5)、In
2 3(2.0)、PbO(2.6)、Ta2
3 (2.4)、ZnO(2.1)、ZrO2 (2.
0)、MgO(1.6)、SiO2 (1.5)、MgF
2 (1.4)、CeF3 (1.6)、CaF2 (1.
3)、AlF3 (1.6)、Al2 3 (1.6)、G
aO(1.7)等が挙げられる。尚、カッコ内の数値は
屈折率を示す。
This multilayer thin film includes ceramics and metals.
Which material is used and the refractive index is approximately 2.0 or higher
Predetermined refractive index material and low refractive index material with a refractive index of about 1.5
At a film pressure of Of the materials used below
Take an example. First, as ceramics, for example,
SbTwoOThree(3.0), FeTwoOThree(2.7), TiO
Two(2.6), CdS (2.6), CeOTwo(2.
3), ZnS (2.3), PbClTwo(2.3), Cd
O (2.2), SbTwoOThree(2.0), WOThree(2.
0), SiO (2.0), SiTwoOThree(2.5), In
TwoOThree(2.0), PbO (2.6), TaTwoO
Three(2.4), ZnO (2.1), ZrOTwo(2.
0), MgO (1.6), SiOTwo(1.5), MgF
Two(1.4), CeFThree(1.6), CaFTwo(1.
3), AlFThree(1.6), AlTwoO Three(1.6), G
aO (1.7) and the like. The numbers in parentheses are
Indicates the refractive index.

【0019】金属単体もしくは合金の薄膜としては、例
えば、Al、Sn、Fe、Mg、Zn、Au、Ag、C
r、Ni、Cu、Si等が挙げられる。また、低屈折率
の有機ポリマーとしては、たとえば、ポリエチレン
(1.51)ポリプロピレン(1.49)、ポリテトラ
フロロエチレン(1.35)、ポリメチルメタクレート
(1.49)、ポリスチレン(1.60)等が挙げられ
る。これらの高屈折率材料、もしくは透過率30%〜6
0%の金属薄膜より少なくとも一種、低屈折率材料より
少なくとも一種選択し、所定の厚さで交互に積層させる
ことにより、特定の波長の可視光に対する吸収あるいは
反射を示す多層薄膜となる。
Examples of thin films of simple metals or alloys include Al, Sn, Fe, Mg, Zn, Au, Ag, and C.
r, Ni, Cu, Si and the like. Examples of the organic polymer having a low refractive index include polyethylene (1.51) polypropylene (1.49), polytetrafluoroethylene (1.35), polymethyl methacrylate (1.49), and polystyrene (1.49). 60) and the like. These high-refractive-index materials or transmittances of 30% to 6
By selecting at least one kind from a 0% metal thin film and at least one kind from a low refractive index material and alternately stacking them at a predetermined thickness, a multilayer thin film exhibiting absorption or reflection of visible light of a specific wavelength is obtained.

【0020】上記の各材料の中から、屈折率、反射率、
透過率等の光学特性や耐光性、耐薬品性、層間密着性な
どに基づき材料を適宜選択し、薄膜として積層し多層薄
膜を形成する。形成方法は、公知の手法を用いることが
でき、膜厚、成膜速度、積層数、あるいは光学膜厚(=
n・d、n:屈折率、d:膜厚)などの制御が可能な通
常の真空蒸着法、スパッタリング法などの物理的気相析
出法やCVD法などの化学的気相析出法を用いることが
できる。また、低屈折率の有機ポリマーの成膜方法とし
ては、公知のグラビア印刷法、オフセット印刷法、スク
リーン印刷法などの印刷方法やバーコート法、グラビア
法、ロールコート法などの塗布方法を用いることができ
る。尚、本発明ではセラミックスおよび金属と同等、あ
るいは類似する屈折率と反射率を有するものであれば用
いることが可能である。
From among the above materials, the refractive index, the reflectance,
Materials are appropriately selected based on optical characteristics such as transmittance, light resistance, chemical resistance, interlayer adhesion, and the like, and laminated as thin films to form a multilayer thin film. As a forming method, a known method can be used, and the film thickness, the film forming speed, the number of layers, or the optical film thickness (=
n. d, n: refractive index, d: film thickness) can be controlled by using a normal vapor deposition method, a physical vapor deposition method such as a sputtering method, or a chemical vapor deposition method such as a CVD method. Can be. As a method for forming a low-refractive-index organic polymer, a known printing method such as a gravure printing method, an offset printing method, a screen printing method, or a coating method such as a bar coating method, a gravure method, or a roll coating method may be used. Can be. In the present invention, any material having the same or similar refractive index and reflectance as ceramics and metals can be used.

【0021】この多層薄膜層の層厚は、具体的には5〜
2000nmの範囲であり、また、薄膜の層構成は上記
高屈折率の材料もしくは金属材料からなる薄膜、例え
ば、ZnS、TiO2 、ZrO2 、In2 3 、Sn
O、ITO、CeO2 、ZnO、Ta2 3 、Al、F
e、Mg、Zn、Au、Ag、Cr、Ni、Cu、Si
などと、上記低屈折率の材料からなる薄膜、例えば、M
gF2 、SiO2 、CaF 2 、MgO、Al2 3 など
との組み合わせであり、それらを交互に積相し、その積
層数が2層以上、好ましくは2層〜9層である。分光特
性は層数に応じて変化する。尚、用いる材料、組み合わ
せにより多層膜の光学特性が異なるため、これに限定さ
れるものではない。
The thickness of the multilayer thin film layer is, specifically, 5 to 5.
2000 nm, and the layer structure of the thin film is as described above.
Thin film made of high refractive index material or metal material, such as
For example, ZnS, TiOTwo, ZrOTwo, InTwoOThree, Sn
O, ITO, CeOTwo, ZnO, TaTwoOThree, Al, F
e, Mg, Zn, Au, Ag, Cr, Ni, Cu, Si
And a thin film made of the material having a low refractive index, for example, M
gFTwo, SiOTwo, CaF Two, MgO, AlTwoOThreeSuch
And alternately accumulate them, and the product
The number of layers is 2 or more, preferably 2 to 9 layers. Spectral characteristics
The property changes according to the number of layers. The materials and combinations used
The optical characteristics of the multilayer film
It is not something to be done.

【0022】凹凸版の凸部の表面凹凸状は、0.01か
ら1mmの間隔で凹凸を、例えば、線状に設けたもので
ある。この凹凸版をOVDに加熱・加圧することにより
OVDの効果を破壊もしくは変化させ、絵柄・文字など
別な画像を形成することができる。凸部の表面凹凸状が
深い場合には破壊され、浅い場合には変形される。ま
た、凸部の表面凹凸状により反射方向を変えることによ
り画像を形成することができる。凹凸版は、エッチン
グ、彫刻、旋盤など公知の金属加工技術を用いて作製す
ることができる。
The surface unevenness of the projections of the uneven printing plate is such that unevenness is provided, for example, linearly at intervals of 0.01 to 1 mm. By heating and pressurizing the concavo-convex plate to OVD, the effect of OVD is destroyed or changed, and another image such as a pattern or character can be formed. If the surface irregularities of the projections are deep, they are destroyed, and if they are shallow, they are deformed. Further, an image can be formed by changing the reflection direction according to the surface unevenness of the projection. The concavo-convex plate can be manufactured by using a known metal working technique such as etching, engraving, and lathe.

【0023】支持体上にOVDを設けOVD媒体を作製
するには、ステッカーの貼付、転写箔の転写など、どの
ような方法であっても良い。また、加熱・加圧をかける
装置としては、ホットスタンプ以外に、プレス機、平押
し、若しくはシリンダ型の箔押し機などを用いることが
できる。
To prepare an OVD medium by providing OVD on a support, any method such as sticking a sticker or transferring a transfer foil may be used. As a device for applying heat and pressure, a press machine, a flat press machine, a cylinder type foil press machine, or the like can be used in addition to the hot stamp.

【0024】[0024]

【発明の効果】本発明は、OVDの少なくとも一部分
を、その表面が凹部と表面凹凸状の凸部とで構成され、
該凹部と表面凹凸状の凸部とで絵柄・文字など別な画像
を表す凹凸版を用いた加熱・加圧によって破壊したOV
D媒体であるので、多大な投資を必要とせずに製造でき
る、廉価なOVD媒体となる。
According to the present invention, at least a part of the OVD is constituted by a concave portion and a convex portion having an irregular surface.
OV destroyed by heating / pressing using a concave / convex plate that represents a different image such as a pattern / character with the concave portion and the convex portion having an irregular surface.
Because it is a D medium, it is an inexpensive OVD medium that can be manufactured without requiring significant investment.

【0025】また、本発明は、上記OVD媒体の製造に
おいて、OVDが形成されたOVD転写箔のOVDを支
持体に転写する際に、凹凸版を用いて転写するので、多
大な投資を必要とせずに製造できる、廉価なOVD媒体
の製造方法となる。
Further, in the production of the OVD medium according to the present invention, when the OVD of the OVD transfer foil on which the OVD is formed is transferred to a support by using an uneven plate, a large investment is required. It is a method of manufacturing an inexpensive OVD medium that can be manufactured without using any OVD medium.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるOVD媒体の一実施例の平面図で
ある。
FIG. 1 is a plan view of an embodiment of an OVD medium according to the present invention.

【図2】図1における一実施例をX−X’断面で示す断
面図である。
FIG. 2 is a cross-sectional view showing one embodiment in FIG.

【図3】OVD媒体を製造する際に用いるホットスタン
プの概念を示した断面図である。
FIG. 3 is a cross-sectional view showing a concept of a hot stamp used when manufacturing an OVD medium.

【図4】凹凸版の表面状態を示す説明図である。FIG. 4 is an explanatory diagram showing a surface state of the uneven plate.

【図5】本発明によるOVD媒体の製造方法を示す説明
図である。
FIG. 5 is an explanatory view showing a method of manufacturing an OVD medium according to the present invention.

【符号の説明】[Explanation of symbols]

11…プレス版取り付け部 12…凹凸版 12a…凹凸版の凹部 12b…凹凸版の凸部 13…OVD 13a…OVDが破壊されていない非凹凸部 13b…OVDが破壊された凹凸部 14…支持体 15…台座 16…OVD媒体 53…OVD転写箔 DESCRIPTION OF SYMBOLS 11 ... Press plate mounting part 12 ... Uneven plate 12a ... Uneven plate concave part 12b ... Uneven plate convex part 13 ... OVD 13a ... Non-uneven part where OVD is not destroyed 13b ... Uneven part where OVD was destroyed 14 ... Support 15 ... pedestal 16 ... OVD medium 53 ... OVD transfer foil

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】OVDの少なくとも一部分を破壊して、O
VDに絵柄・文字など別な画像を形成したOVDが貼付
されたOVD媒体において、該少なくとも一部分を、そ
の表面が凹部と表面凹凸状の凸部とで構成され、該凹部
と表面凹凸状の凸部とで絵柄・文字など別な画像を表す
凹凸版を用いた加熱・加圧によって破壊したことを特徴
とするOVD媒体。
1. The method of claim 1, wherein at least a portion of the OVD is destroyed and
In an OVD medium on which an OVD on which a different image such as a picture or a character is formed is attached to the VD, at least a part of the OVD medium has a concave portion and a convex portion having an irregular surface, and the concave portion and the convex portion having an irregular surface. An OVD medium characterized by being destroyed by heating and pressurization using a relief plate representing a different image such as a picture or a character at a part.
【請求項2】請求項1記載のOVD媒体の製造方法であ
って、OVDが形成されたOVD転写箔のOVDを支持
体に転写する際に、凹凸版を用いて転写することを特徴
とするOVD媒体の製造方法。
2. The method for manufacturing an OVD medium according to claim 1, wherein when the OVD of the OVD transfer foil on which the OVD is formed is transferred to a support, the OVD is transferred using an uneven plate. A method for manufacturing an OVD medium.
JP2000135812A 2000-05-09 2000-05-09 OVD medium manufacturing method Expired - Fee Related JP4078790B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000135812A JP4078790B2 (en) 2000-05-09 2000-05-09 OVD medium manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000135812A JP4078790B2 (en) 2000-05-09 2000-05-09 OVD medium manufacturing method

Publications (2)

Publication Number Publication Date
JP2001318218A true JP2001318218A (en) 2001-11-16
JP4078790B2 JP4078790B2 (en) 2008-04-23

Family

ID=18643843

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Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002307878A (en) * 2001-04-11 2002-10-23 Toppan Printing Co Ltd Forgery-preventing image forming body and manufacturing method therefor
JP2008511027A (en) * 2004-08-27 2008-04-10 カーイクスオー アクチエンゲゼルシャフト Anti-counterfeiting security object

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002307878A (en) * 2001-04-11 2002-10-23 Toppan Printing Co Ltd Forgery-preventing image forming body and manufacturing method therefor
JP2008511027A (en) * 2004-08-27 2008-04-10 カーイクスオー アクチエンゲゼルシャフト Anti-counterfeiting security object
JP4728335B2 (en) * 2004-08-27 2011-07-20 カーイクスオー アクチエンゲゼルシャフト Anti-counterfeiting security object

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