JP2001249361A5 - - Google Patents

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Publication number
JP2001249361A5
JP2001249361A5 JP2000111219A JP2000111219A JP2001249361A5 JP 2001249361 A5 JP2001249361 A5 JP 2001249361A5 JP 2000111219 A JP2000111219 A JP 2000111219A JP 2000111219 A JP2000111219 A JP 2000111219A JP 2001249361 A5 JP2001249361 A5 JP 2001249361A5
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Japan
Prior art keywords
thin film
electro
optical device
film transistor
storage capacitor
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JP2000111219A
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Japanese (ja)
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JP3904371B2 (en
JP2001249361A (en
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Priority claimed from JP2000111219A external-priority patent/JP3904371B2/en
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Publication of JP2001249361A5 publication Critical patent/JP2001249361A5/ja
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Description

【発明の名称】電気光学装置及び電子機器[Title of the invention] Electro-optics device and electronic device

【0008】
本発明の電気光学装置は上記課題を解決するために、複数の走査線と、前記複数の走査線に交差する複数のデータ線と、前記走査線と前記データ線の交差に対応して配置された薄膜トランジスタ及び画素電極とを有する電気光学装置であって、前記薄膜トランジスタの半導体層のドレイン領域が前記データ線及び前記走査線の延在方向に沿って形成された第1蓄積容量電極と、前記薄膜トランジスタのゲート電極と同一層で形成され、前記データ線及び前記走査線の延在方向に沿って形成された第1蓄積容量電極と重なる第2蓄積容量電極と、前記第2蓄積容量電極より上層であって、前記薄膜トランジスタの半導体層のドレイン電極と前記画素電極との間を電気的に接続するための導電層とを備えることを特徴とする。
0008
In order to solve the above problems, the electro-optical device of the present invention is arranged corresponding to a plurality of scanning lines, a plurality of data lines intersecting the plurality of scanning lines, and the intersection of the scanning lines and the data lines. An electro-optical device having a thin film and a pixel electrode, the first storage capacity electrode in which the drain region of the semiconductor layer of the thin film is formed along the extending direction of the data line and the scanning line, and the thin film. A second storage capacity electrode formed in the same layer as the gate electrode of the above and overlapping the first storage capacity electrode formed along the extending direction of the data line and the scanning line, and a layer above the second storage capacity electrode. It is characterized by including a conductive layer for electrically connecting between the drain electrode of the semiconductor layer of the thin film and the pixel electrode.

【0009】
また、本発明は、前記導電層は、隣接するデータ線間に形成されると良い。
0009
Further, in the present invention, the conductive layer may be formed between adjacent data lines.

【0010】
また、本発明は、前記薄膜トランジスタの半導体層の下層であって、前記薄膜トランジスタのチャネルに重なる遮光性の下側導電膜を有すると良い。
0010
Further, the present invention may have a light-shielding lower conductive film which is a lower layer of the semiconductor layer of the thin film transistor and which overlaps with the channel of the thin film transistor.

【0011】
また、本発明は、前記第2蓄積容量電極は、前記データ線が延在する領域で前記下側導電膜に電気的に接続されると良い。
[0011]
Further, in the present invention, it is preferable that the second storage capacity electrode is electrically connected to the lower conductive film in the region where the data line extends.

【0072】
本発明のこのような作用及び他の利得は次に説明する実施の形態から明らかにする。
[0072]
Such actions and other gains of the present invention will be apparent from the embodiments described below.

Claims (5)

複数の走査線と、前記複数の走査線に交差する複数のデータ線と、前記走査線と前記データ線の交差に対応して配置された薄膜トランジスタ及び画素電極とを有する電気光学装置であって、
前記薄膜トランジスタの半導体層のドレイン領域が前記データ線及び前記走査線の延在方向に沿って形成された第1蓄積容量電極と、
前記薄膜トランジスタのゲート電極と同一層で形成され、前記データ線及び前記走査線の延在方向に沿って形成された第1蓄積容量電極と重なる第2蓄積容量電極と、
前記第2蓄積容量電極より上層であって、前記薄膜トランジスタの半導体層のドレイン電極と前記画素電極との間を電気的に接続するための導電層とを備えることを特徴とする電気光学装置。
An electro-optical device comprising: a plurality of scanning lines; a plurality of data lines intersecting the plurality of scanning lines; and a thin film transistor and a pixel electrode arranged corresponding to the intersections of the scanning lines and the data lines.
A first storage capacitor electrode in which a drain region of a semiconductor layer of the thin film transistor is formed along the extending direction of the data line and the scanning line;
A second storage capacitor electrode which is formed in the same layer as the gate electrode of the thin film transistor and overlaps the first storage capacitor electrode formed along the extending direction of the data line and the scanning line;
An electro-optical device, comprising: a conductive layer above the second storage capacitor electrode for electrically connecting the drain electrode of the semiconductor layer of the thin film transistor and the pixel electrode.
前記導電層は、隣接するデータ線間に形成されることを特徴とする請求項1に記載の電気光学装置。The electro-optical device according to claim 1, wherein the conductive layer is formed between adjacent data lines. 前記薄膜トランジスタの半導体層の下層であって、前記薄膜トランジスタのチャネルに重なる遮光性の下側導電膜を有することを特徴とする請求項1又は2に記載の電気光学装置。3. The electro-optical device according to claim 1, further comprising a light-shielding lower conductive film which is a lower layer of the semiconductor layer of the thin film transistor and overlaps a channel of the thin film transistor. 前記第2蓄積容量電極は、前記データ線が延在する領域で前記下側導電膜に電気的に接続されることを特徴とする請求項3に記載の電気光学装置。4. The electro-optical device according to claim 3, wherein the second storage capacitor electrode is electrically connected to the lower conductive film in a region where the data line extends. 請求項1から請求項4のいずれか一項に記載の電気光学装置を有することを特徴とする電子機器。An electronic apparatus comprising the electro-optical device according to any one of claims 1 to 4.
JP2000111219A 1998-11-26 2000-04-12 Electro-optical device and electronic apparatus Expired - Lifetime JP3904371B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000111219A JP3904371B2 (en) 1998-11-26 2000-04-12 Electro-optical device and electronic apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33634398 1998-11-26
JP2000111219A JP3904371B2 (en) 1998-11-26 2000-04-12 Electro-optical device and electronic apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56032599A Division JP3458382B2 (en) 1998-11-26 1999-11-26 ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2004320159A Division JP3733970B6 (en) 1998-11-26 2004-11-04 Electro-optical device and electronic apparatus
JP2006302517A Division JP4758868B2 (en) 1998-11-26 2006-11-08 Electro-optical device and electronic apparatus

Publications (3)

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JP2001249361A JP2001249361A (en) 2001-09-14
JP2001249361A5 true JP2001249361A5 (en) 2004-12-24
JP3904371B2 JP3904371B2 (en) 2007-04-11

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JP2000111219A Expired - Lifetime JP3904371B2 (en) 1998-11-26 2000-04-12 Electro-optical device and electronic apparatus

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4342831B2 (en) * 2002-04-23 2009-10-14 株式会社半導体エネルギー研究所 Display device
JP4225347B2 (en) * 2006-12-15 2009-02-18 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP5862204B2 (en) * 2011-10-31 2016-02-16 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP6186127B2 (en) * 2013-01-25 2017-08-23 株式会社ジャパンディスプレイ Display device
TWI559064B (en) 2012-10-19 2016-11-21 Japan Display Inc Display device

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