JP2001172762A - Vacuum evaporation system - Google Patents
Vacuum evaporation systemInfo
- Publication number
- JP2001172762A JP2001172762A JP35254199A JP35254199A JP2001172762A JP 2001172762 A JP2001172762 A JP 2001172762A JP 35254199 A JP35254199 A JP 35254199A JP 35254199 A JP35254199 A JP 35254199A JP 2001172762 A JP2001172762 A JP 2001172762A
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- JP
- Japan
- Prior art keywords
- evaporation
- film
- vacuum
- deposited
- partition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は真空蒸着装置に関
し、詳しくは、真空槽内を走行するフィルムに異なる元
素からなる混合膜を形成するための真空蒸着装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum deposition apparatus, and more particularly, to a vacuum deposition apparatus for forming a mixed film of different elements on a film running in a vacuum chamber.
【０００２】[0002]
【従来の技術】従来、真空槽中を走行する被蒸着物に複
数の材料を同時に蒸着させて、被蒸着物の表面に混合膜
を形成する装置として、例えば、特開平４−２１８６６
０号公報に記載されている装置がある。この装置は、図
４に示すように、走行する基板１１と直行する方向に対
向・配置され、２種類の蒸着材料１０ａ，１０ｂを収納
した２個の坩堝８，８が走行基板１１の走行方向に隣接
して配置されている。そして、走行基板１１の走行方向
に隣接して配置された２個の坩堝８，８に対して、電子
銃４から電子ビーム１２を照射することにより、２種類
の蒸着材料１０ａ，１０ｂから蒸発した各々の蒸着成分
が基板１１に蒸着して、複合めっき層を形成するように
なっている。2. Description of the Related Art Conventionally, as an apparatus for simultaneously depositing a plurality of materials on an object to be deposited traveling in a vacuum chamber and forming a mixed film on the surface of the object to be deposited, for example, Japanese Patent Application Laid-Open No. Hei 4-21866 is disclosed.
There is an apparatus described in Japanese Patent Application Publication No. 0 (1999). As shown in FIG. 4, this apparatus is opposed to and arranged in a direction perpendicular to the traveling substrate 11, and two crucibles 8, 8 containing two kinds of vapor deposition materials 10a, 10b are moved in the traveling direction of the traveling substrate 11. It is arranged adjacent to. Then, the two crucibles 8, 8 arranged adjacent to each other in the traveling direction of the traveling substrate 11 are irradiated with the electron beam 12 from the electron gun 4 to evaporate from the two kinds of evaporation materials 10 a, 10 b. Each deposition component is deposited on the substrate 11 to form a composite plating layer.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、上記真
空蒸着装置で異なる蒸着材料を基板表面に蒸着する場
合、各坩堝間には、坩堝の側壁を含めて距離があるた
め、各坩堝に収納された蒸着材料から蒸発する各々の蒸
着成分が基板表面で均一に混ざり合い難いという問題が
ある。つまり、一定速度で走行している基板に対して各
々の坩堝から蒸発する蒸発成分の蒸発量は、図５（ａ）
に示すように、直上が最も多いことから、坩堝間の間隔
が広くなればなるほど蒸発分布域が拡がるため、均一に
混合する範囲が狭くなり、事実、図５（ｂ）に示すよう
に、深さ方向の成分分布はかなり変動の大きいものとな
らざるを得ない。However, when different vapor deposition materials are vapor-deposited on the substrate surface by the above-mentioned vacuum vapor deposition apparatus, since there is a distance between the respective crucibles including the side walls of the crucibles, they are stored in the respective crucibles. There is a problem that it is difficult to uniformly mix the respective evaporation components evaporated from the evaporation material on the substrate surface. That is, the evaporation amount of the evaporation component evaporated from each crucible with respect to the substrate traveling at a constant speed is shown in FIG.
As shown in FIG. 5, since the area immediately above is the largest, the wider the distance between the crucibles, the wider the area of evaporation distribution, and the narrower the range of uniform mixing. In fact, as shown in FIG. The component distribution in the vertical direction must be quite variable.
【０００４】因みに、図５（ｂ）は厚さ３０ｍｍの側壁
を有する坩堝２個を、フィルムに対向してフィルムの走
行方向に並置すると共に、走行方向前方側の坩堝に粒子
状のＳｉＯ2 を収納し、後方側の坩堝に粒子状のＡｌ2
Ｏ3 を収納すると共に、これら蒸着材料に電子ビームを
照射して得られたものである。このようにして蒸着した
フィルムに対し、蒸着膜中のＡｌ2 Ｏ3 成分を蛍光Ｘ線
装置により、蒸着膜表面から深さ方向に向けてその断面
を連続的にライン分析した。図５（ｂ）では、蒸着膜自
体の深さ方向で、蒸着膜の被蒸着物側にＡｌ2 Ｏ3 成分
が多く偏在して均一性に乏しい結果となっている。[0004] Incidentally, the two crucibles having a side wall in FIG. 5 (b) thickness of 30 mm, with juxtaposed in opposition to the film in the running direction of the film, the SiO 2 particulate into the crucible of the traveling direction front side It is stored and the particulate Al 2
It is obtained by storing O 3 and irradiating these deposition materials with an electron beam. With respect to the film thus deposited, the cross section of the Al 2 O 3 component in the deposited film was continuously analyzed in a depth direction from the surface of the deposited film by a fluorescent X-ray apparatus. In FIG. 5B, in the depth direction of the deposited film itself, a large amount of Al 2 O 3 components are unevenly distributed on the deposition target side of the deposited film, resulting in poor uniformity.
【０００５】そこで本発明の目的は、上記従来技術の有
する問題点に鑑みて、被蒸着物上に、均一性の高い異な
る成分からなる混合膜を形成可能な真空蒸着装置を提供
することにある。Accordingly, an object of the present invention is to provide a vacuum deposition apparatus capable of forming a mixed film composed of different components with high uniformity on an object to be deposited, in view of the above-mentioned problems of the prior art. .
【０００６】[0006]
【課題を解決するための手段】上記目的は各請求項記載
の発明により達成される。すなわち、本発明に係る真空
蒸着装置の特徴構成は、真空槽内で走行する被蒸着物に
異なる元素からなる混合膜を形成可能な真空蒸着装置に
おいて、異なる種類の蒸着材料を仕分けて保持すべくこ
れらの蒸着材料を仕分け可能な薄い仕切り部を備えた材
料保持手段と、前記蒸着材料を加熱して加熱・蒸発させ
る加熱手段とを備えると共に、前記材料保持手段中の仕
切り部を、その長手方向が前記被蒸着物の走行方向とは
略直交する方向になるように配置することにある。The above object is achieved by the invention described in each claim. That is, the characteristic configuration of the vacuum deposition apparatus according to the present invention is to sort and hold different types of deposition materials in a vacuum deposition apparatus capable of forming a mixed film made of different elements on a deposition target traveling in a vacuum chamber. A material holding means provided with a thin partition portion capable of sorting these vapor deposition materials, and a heating means for heating and evaporating the vapor deposition material by heating the vapor deposition material. Is disposed so as to be in a direction substantially perpendicular to the traveling direction of the object to be deposited.
【０００７】この構成によれば、材料保持手段中に仕分
けて保持される異なる元素からなる蒸着材料が互いに近
接したものとすることができるので、これらの蒸着材料
を加熱・蒸発させた場合に、特に膜厚方向で均一に混ざ
り合わせることができ、従来技術による場合に比べて、
被蒸着物上に顕著に均一な混合膜を形成できる。その結
果、被蒸着物上に、均一性の高い異なる成分からなる混
合膜を形成可能な真空蒸着装置を提供することができ
た。According to this structure, the vapor deposition materials composed of different elements that are sorted and held in the material holding means can be close to each other. Therefore, when these vapor deposition materials are heated and evaporated, In particular, they can be uniformly mixed in the film thickness direction,
A remarkably uniform mixed film can be formed on the object to be deposited. As a result, a vacuum deposition apparatus capable of forming a mixed film composed of different components with high uniformity on an object to be deposited was provided.
【０００８】前記被蒸着物と前記材料保持手段との間に
あって、走行する前記被蒸着物の走行方向前後の位置
に、前記材料保持手段から加熱され蒸発する前記蒸着材
料の蒸発を部分的に遮蔽する遮蔽装置を設けることが好
ましい。[0008] Partially shields the evaporation of the evaporation material heated and evaporated from the material holding means at a position between the material to be deposited and the material holding means and at a position before and after the running direction of the material to be run. It is preferable to provide a shielding device that performs the shielding.
【０００９】この構成によれば、加熱され蒸発する蒸着
材料の飛翔領域の内、混合度合いの高い飛翔領域からの
蒸着材料を被蒸着物に蒸着するようにできるので、膜厚
方向に一層均一な混合膜を形成できて都合がよい。According to this structure, the evaporation material from the flying region having a high degree of mixing among the flying regions of the evaporation material to be heated and evaporated can be deposited on the object to be deposited. It is convenient to form a mixed film.
【００１０】前記材料保持手段が、前記蒸着材料を押し
上げる押し上げ機構を備えることが好ましい。It is preferable that the material holding means includes a push-up mechanism for pushing up the vapor deposition material.
【００１１】この構成によれば、蒸着材料が加熱手段の
作用により加熱・蒸発して消耗したとしても、蒸着材料
を所定位置に保持できるので、常に加熱手段との距離を
一定に保てる等、蒸着条件を所定条件にすることがで
き、長時間の加熱蒸着に対しても、安定した蒸着が可能
になる。According to this configuration, even if the evaporation material is heated and evaporated by the action of the heating means and consumed, the evaporation material can be held at a predetermined position, so that the distance from the heating means can always be kept constant. The conditions can be set to predetermined conditions, and stable vapor deposition can be performed even for long-time heating vapor deposition.
【００１２】前記仕切り部が、２〜１０ｍｍの厚みを有
すると共に、１０〜１５０ｍｍ間隔で配置されることが
好ましい。It is preferable that the partition portions have a thickness of 2 to 10 mm and are arranged at intervals of 10 to 150 mm.
【００１３】仕切り部の厚みは薄い程好ましいが、２ｍ
ｍ未満にまで薄くすると、加熱手段からの加熱による消
耗のため使用時間が短くなり、かえってコスト高になる
ので好ましくなく、厚みが１０ｍｍを越えると、均一混
合され難くなって好ましくない。又、仕切り部は１個で
ある必要はなく、複数個配置してもよく、その場合、仕
切り部の間隔が１０〜１５０ｍｍ間隔で配置されると、
混合蒸着膜の組成比を蒸着膜深さに均一にできて都合が
よい。仕切り板の間隔を１０ｍｍ未満とすると、蒸着材
料に比べて仕切り板の容積が相対的に大きくなって蒸着
材料の補充頻度が多くなるなど、蒸着効率が低くなって
好ましくなく、仕切り板の間隔が１５０ｍｍを越える
と、被蒸着物の蒸着膜深さ方向に均一に蒸着し難くなっ
て好ましくない。The thickness of the partition is preferably as small as possible.
When the thickness is less than m, the use time is shortened due to consumption by heating from the heating means, and the cost is rather increased. Thus, when the thickness exceeds 10 mm, uniform mixing becomes difficult, which is not preferable. Further, the number of the partition portions does not need to be one, and a plurality of the partition portions may be arranged. In this case, when the intervals between the partition portions are arranged at intervals of 10 to 150 mm,
It is convenient that the composition ratio of the mixed vapor deposition film can be made uniform to the vapor deposition film depth. When the interval between the partition plates is less than 10 mm, the volume of the partition plates is relatively large compared to the vapor deposition material, and the frequency of replenishment of the vapor deposition material is increased. If the thickness exceeds 150 mm, it is difficult to uniformly deposit the material to be deposited in the depth direction of the deposited film, which is not preferable.
【００１４】前記仕切り部が、炭素を含む材料からなる
ことが好ましい。It is preferable that the partition is made of a material containing carbon.
【００１５】この構成によれば、加熱手段による加熱に
対しても耐久性にすぐれるので都合がよい。炭素を含む
材料としては、一般炭素材の他、炭素繊維強化した炭素
材などがある。According to this configuration, durability is excellent even with heating by the heating means, which is convenient. Examples of the material containing carbon include a carbon material reinforced with carbon fiber, in addition to a general carbon material.
【００１６】[0016]
【発明の実施の形態】本発明の実施の形態を、図面を参
照して詳細に説明する。図１は、本実施形態における真
空蒸着装置の概略全体構造を示す。この真空蒸着装置
は、真空槽６内の巻き出しロール１にセットされた被蒸
着物であるフィルム１１が冷却ロール３上を走行し、テ
ンションロール５を通り、巻き取りロール２で巻き取ら
れる。真空槽６内の真空度は、油拡散ポンプ（図示略）
等からなる排気装置９により所定の真空度に維持され
る。真空槽６の底部に材料保持手段の一例である坩堝８
が配置されている。電子銃４は、坩堝８に収納された蒸
着材料１０に対して電子線１２を照射する。電子線１２
により加熱され蒸発した材料は、冷却ロール３上を走行
するフィルム１１の表面に蒸着される。又、図番７はフ
ィルム１１上に均一で良好な蒸着膜を形成するために、
蒸発量を部分的に遮蔽する遮蔽装置である遮蔽板であ
る。遮蔽板７は、フィルム走行方向の前後位置に２枚設
けられており、これらの間隔は調整できるようになって
いることが好ましく、装置外部から遠隔操作により、両
遮蔽板７，７間の間隔を自在に変更可能になっていても
よい。Embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 shows a schematic overall structure of a vacuum evaporation apparatus according to the present embodiment. In this vacuum evaporation apparatus, a film 11 as an object to be deposited set on an unwinding roll 1 in a vacuum chamber 6 runs on a cooling roll 3, passes through a tension roll 5, and is wound by a winding roll 2. The degree of vacuum in the vacuum chamber 6 is determined by an oil diffusion pump (not shown).
A predetermined degree of vacuum is maintained by the exhaust device 9 composed of the above. A crucible 8 as an example of a material holding means is provided at the bottom of the vacuum chamber 6.
Is arranged. The electron gun 4 irradiates the electron beam 12 to the deposition material 10 stored in the crucible 8. Electron beam 12
The material heated and evaporated by the vapor deposition is deposited on the surface of the film 11 running on the cooling roll 3. FIG. 7 shows that a uniform and good deposited film is formed on the film 11.
This is a shielding plate which is a shielding device for partially shielding the evaporation amount. Two shielding plates 7 are provided at the front and rear positions in the film running direction, and it is preferable that the distance between them can be adjusted. The distance between the two shielding plates 7 is controlled by remote control from outside the apparatus. May be freely changed.
【００１７】次に、上記坩堝８について詳しく説明す
る。この坩堝８は、図２に拡大して示すように、走行す
るフィルム１１に対向して、２種類の蒸着材料１０ａ，
１０ｓを個別に収納可能になるように、中央に薄い仕切
り板１３を設けて、フィルム１１の幅方向に対向可能に
延設されて構成されている。図２（ｂ）には省略されて
いるが、坩堝８の底部には、蒸着材料１０ａ，１０ｓを
押し上げる押し上げ機構１５が夫々設けられている。こ
の押し上げ機構１５は、底板１５ａとピストンロッド１
５ｂとシリンダー１５ｃ等とからなっていて、蒸着材料
が電子ビームの照射に伴い消耗すると、漸次底板１５ａ
を押し上げ蒸着材料が坩堝８の上表面に向けて持ち上が
るようになっている。そのため、電子ビームの照射に伴
って蒸着材料１０が漸次消耗したとしても、底部の隅な
どに残存している蒸着材料をも有効に蒸発させることが
できるのみならず、電子銃４と蒸着材料１０との距離
を、常時略一定に保持できて、蒸着条件を所定範囲に維
持できることになって都合がよい。Next, the crucible 8 will be described in detail. The crucible 8 faces the running film 11 as shown in FIG.
A thin partition plate 13 is provided at the center so that 10 s can be individually stored, and is extended so as to be able to face in the width direction of the film 11. Although not shown in FIG. 2B, push-up mechanisms 15 for pushing up the deposition materials 10a and 10s are provided at the bottom of the crucible 8, respectively. The push-up mechanism 15 includes a bottom plate 15a and a piston rod 1
5b and a cylinder 15c, etc., and when the deposition material is consumed by the irradiation of the electron beam, the bottom plate 15a is gradually reduced.
And the vapor deposition material is lifted toward the upper surface of the crucible 8. Therefore, even if the vapor deposition material 10 is gradually consumed by the irradiation of the electron beam, not only the vapor deposition material remaining in the bottom corner and the like can be effectively evaporated, but also the electron gun 4 and the vapor deposition material 10 can be effectively evaporated. Can be maintained substantially constant at all times, and the vapor deposition conditions can be maintained in a predetermined range, which is convenient.
【００１８】尚、底板１５ａを押し上げるには、種々の
機構が考えられるが、ピストンロッド１５ｂあるいはシ
リンダー１５ｃ近傍に重さセンサーを備えさせて、蒸着
材料１０が消耗したことによる重量低下を感知し、ピス
トンロッド１５ｂを自動的に押し上げるようにしてもよ
いし、蒸着開始後自動的に蒸着材料の消耗量に見合った
一定速度でピストンロッド１５ｂを押し上げるようにし
てもよい。Various mechanisms are conceivable for pushing up the bottom plate 15a. A weight sensor is provided near the piston rod 15b or the cylinder 15c to detect a decrease in weight due to the consumption of the vapor deposition material 10. The piston rod 15b may be automatically pushed up, or the piston rod 15b may be automatically pushed up at a constant speed commensurate with the consumption of the evaporation material after the start of evaporation.
【００１９】更に、坩堝８は、外枠を銅製に構成されて
いると共に、内部を冷却水が循環可能になっていて、図
１に示すように、坩堝８を冷却するために冷却水などの
冷媒を流通させる冷却管１４が坩堝８に接続されてい
る。仕切り板１３は、炭素繊維強化炭素材で構成されて
いて、耐久性などの観点から、２〜１０ｍｍ程度である
ことが好ましく、５ｍｍ前後であることが一層好まし
い。仕切り部の厚みは薄い程好ましいが、２ｍｍ未満に
まで薄くすると、加熱手段からの加熱による消耗のため
使用時間が短くなり、かえってコスト高になるので好ま
しくない。Further, the crucible 8 has an outer frame made of copper, and has a cooling water circulating inside. The crucible 8 is provided with cooling water or the like for cooling the crucible 8 as shown in FIG. A cooling pipe 14 through which a refrigerant flows is connected to the crucible 8. The partition plate 13 is made of a carbon fiber reinforced carbon material, and preferably has a thickness of about 2 to 10 mm, more preferably about 5 mm, from the viewpoint of durability and the like. The thickness of the partition portion is preferably as small as possible, but it is not preferable to reduce the thickness to less than 2 mm because the use time is shortened due to consumption by heating from the heating means, and the cost is rather increased.
【００２０】図１，２では仕切り板１３を１枚配置した
例を示したが、特にその枚数に制限はなく、複数枚を坩
堝８内に配置して異なる蒸着材料を仕切るようにしても
よい。仕切り板の間隔は、１０〜１５０ｍｍ程度である
ことが好ましい。仕切り板の間隔を１０ｍｍ未満とする
と、蒸着材料に比べて仕切り板の容積が相対的に大きく
なって蒸着材料の補充頻度が多くなるなど、蒸着効率が
低くなって好ましくない。又、仕切り板の間隔が１５０
ｍｍを越えると、異なる蒸着材料を蒸着膜深さ方向に均
一に蒸着し難くなって好ましくない。FIGS. 1 and 2 show an example in which one partition plate 13 is arranged, but the number is not particularly limited, and a plurality of sheets may be arranged in the crucible 8 to separate different evaporation materials. . The spacing between the partition plates is preferably about 10 to 150 mm. If the distance between the partition plates is less than 10 mm, the volume of the partition plates becomes relatively large as compared with the vapor deposition material, and the frequency of replenishment of the vapor deposition material increases. Also, the interval between the partition plates is 150
If it exceeds mm, it is difficult to uniformly deposit different deposition materials in the depth direction of the deposition film, which is not preferable.
【００２１】[0021]
【実施例】以下に、実際に行った例を示す。被蒸着物で
ある高分子フィルムとして、ポリエチレンテレフタレー
ト（ＰＥＴ）フィルム（東洋紡績（株）製、Ｅ５１０
０：商品名）を用いた。その他使用可能な高分子フィル
ムとしては、ポリプロピレン、ポリエチレン、ナイロン
６、ナイロン６６、ナイロン１２、ナイロン４、ポリ塩
化ビニル、ポリ塩化ビニリデン、ポリビニールアルコー
ル、全芳香族ポリアミド、ポリアミドイミド、ポリイミ
ド、ポリエーテルイミド、ポリスルフォン、ポリフェニ
レンスルフィド、ポリフェニレンオキサイド等からなる
高分子フィルムが挙げられるが、実施する上で高分子フ
ィルムとして特に材料に限定されるものではない。又、
これらの（有機重合体）有機高分子は他の有機重合体を
少量共重合したり、ブレンドしたものでもよい。The following is an example of the actual operation. Polyethylene terephthalate (PET) film (manufactured by Toyobo Co., Ltd., E510
0: trade name). Other usable polymer films include polypropylene, polyethylene, nylon 6, nylon 66, nylon 12, nylon 4, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, wholly aromatic polyamide, polyamide imide, polyimide and polyether. Examples include a polymer film composed of imide, polysulfone, polyphenylene sulfide, polyphenylene oxide, and the like. However, in practice, the polymer film is not particularly limited to a material. or,
These (organic polymer) organic polymers may be copolymers or blends of other organic polymers in small amounts.
【００２２】蒸着材料（蒸着源）として、３〜５ｍｍ程
度の大きさの粒子状をした酸化アルミニウム（Ａｌ2 ０
3 、純度９９．５％）と酸化珪素（Ｓｉ０2 、純度９
９．９％）を用いた。これらの材料を保持する１個の坩
堝は銅製であり、底部に外形２０ｍｍΦの冷却用水冷管
２０を設けた構造とした。冷却水の流量は略４ｍ3 ／分
である。この坩堝８内には、上記２種類の蒸着材料１０
ａ，１０ｓをフィルム１１の走行方向に配置させるため
に、坩堝８の中央に、５ｍｍ厚みの炭素繊維強化炭素材
製仕切り板１３を走行するフィルム１１の幅方向に延設
・配置させた。仕切り板１３で確保された各ブロックに
は、前記２種類の蒸着材料１０ａ，１０ｓを収容した。
本実施例で用いた坩堝８の概略構造は、図２に示す通り
である。このときの仕切り板１３の上部と冷却ロール３
との間隔は約４００ｍｍであり、又、電子銃４として
は、２５０ｋＷのものをフィルム幅方向に延設して配置
されている坩堝８に向けて配置した。[0022] As the deposition material (evaporation source), aluminum oxide (Al 2 0 in which the 3~5mm about the size of the particulate
3, purity 99.5%) and silicon oxide (Si0 2, pure 9
9.9%). One crucible holding these materials was made of copper, and had a structure in which a cooling water cooling tube 20 having an outer diameter of 20 mmΦ was provided at the bottom. The flow rate of the cooling water is approximately 4 m 3 / min. In the crucible 8, the above two kinds of vapor deposition materials 10
In order to arrange a and 10s in the running direction of the film 11, a 5 mm-thick carbon fiber reinforced carbon material partition plate 13 was extended and arranged in the center of the crucible 8 in the width direction of the running film 11. Each of the blocks secured by the partition plate 13 accommodated the two types of vapor deposition materials 10a and 10s.
The schematic structure of the crucible 8 used in the present embodiment is as shown in FIG. At this time, the upper part of the partition plate 13 and the cooling roll 3
Is about 400 mm, and an electron gun 4 having a power of 250 kW is arranged toward the crucible 8 extending in the film width direction.
【００２３】蒸着中の真空槽６内の圧力は、４×１０-2
Ｐａ以下を常時維持できるような排気系とした。具体的
には、５０，０００Ｌ／秒の油拡散ポンプを真空槽底部
に直接接続する構造にした。尚、蒸着した混合膜層の厚
みの測定方法は特に限定されないが、テンションロール
５の略真上で、且つフィルム１１の幅方向の中央に配置
された蛍光Ｘ線装置からなるオンライン厚み測定装置
（図示略）にて連続的に測定すると、連続したデータが
得られ利便性が高まって好ましい。The pressure in the vacuum chamber 6 during the deposition is 4 × 10 -2.
An exhaust system capable of constantly maintaining Pa or less was used. Specifically, the oil diffusion pump of 50,000 L / sec was directly connected to the bottom of the vacuum chamber. The method for measuring the thickness of the deposited mixed film layer is not particularly limited, but an on-line thickness measuring device including a fluorescent X-ray device disposed almost directly above the tension roll 5 and at the center in the width direction of the film 11 ( (Not shown) is preferable because continuous data is obtained and convenience is enhanced.
【００２４】このようにして蒸着したフィルムに対し、
図５に示したと同様に、蒸着膜中のＡｌ2 Ｏ3 成分を蛍
光Ｘ線装置により、蒸着膜表面から深さ方向に向けてそ
の断面を連続的にライン分析した。その結果を図３
（ａ），（ｂ）に示す。図３（ａ）から、各蒸着材料の
蒸発量のピーク位置が互いに接近しており、夫々の分布
曲線の裾部分を遮断するように遮蔽板７の位置を決定す
ることによって、各蒸着材料が深さ方向により均一に蒸
着されるようにすることができる。事実、図３（ｂ）で
は、蒸着膜自体の深さ方向で、最表面側にＡｌ2 Ｏ3 成
分が幾分多く偏在するものの、図５（ｂ）の結果と比べ
て顕著に改善されており、膜厚方向に概ね均一な混合膜
が得られていることがわかる。For the film thus deposited,
As in the case shown in FIG. 5, the cross section of the Al 2 O 3 component in the vapor-deposited film was continuously analyzed by a fluorescent X-ray apparatus from the vapor-deposited film surface in the depth direction. The result is shown in FIG.
(A) and (b) show. From FIG. 3A, the peak positions of the evaporation amounts of the respective vapor deposition materials are close to each other, and by determining the position of the shielding plate 7 so as to block the bottom of each distribution curve, the respective vapor deposition materials are determined. The deposition can be performed more uniformly in the depth direction. In fact, in FIG. 3B, in the depth direction of the vapor-deposited film itself, Al 2 O 3 components are unevenly distributed somewhat on the outermost surface side, but are significantly improved as compared with the results of FIG. 5B. This indicates that a substantially uniform mixed film was obtained in the film thickness direction.
【００２５】〔別実施の形態〕 （１） 上記実施形態では、電子銃４を１個配置した例
を示したが、その複数個を坩堝の長手方向（走行するフ
ィルムの幅方向）に並設するようにしてもよく、又、坩
堝８も１個に限られず、走行するフィルムの幅方向に対
向して複数個並設するようにしてもよい。[Other Embodiments] (1) In the above embodiment, an example in which one electron gun 4 is arranged is shown, but a plurality of electron guns 4 are arranged side by side in the longitudinal direction of the crucible (the width direction of the running film). The number of crucibles 8 is not limited to one, and a plurality of crucibles 8 may be arranged side by side in the width direction of the running film.
【００２６】（２） 真空槽６の底部に配置された材料
保持手段の一例である坩堝８は、加熱手段の一例である
電子銃４の軸方向に向かってフィルム１１の蒸着面と平
行を保ちながら低速で移動するようにしてもよい。つま
り、図１に示す電子銃４に対して接近または離間するこ
とにより、坩堝８内に収納されている蒸着材料１０を照
射する電子線の照射条件（電子銃と蒸着材料との距離な
ど）ができるだけ一定になるので都合がよい。(2) The crucible 8 as an example of the material holding means disposed at the bottom of the vacuum chamber 6 keeps parallel to the deposition surface of the film 11 in the axial direction of the electron gun 4 as an example of the heating means. Alternatively, it may move at a low speed. In other words, by approaching or separating from the electron gun 4 shown in FIG. 1, the irradiation condition of the electron beam for irradiating the vapor deposition material 10 stored in the crucible 8 (distance between the electron gun and the vapor deposition material) is changed. It is convenient because it is as constant as possible.
【００２７】（３） 上記実施形態では、真空槽として
いわゆる１チャンバー式を用いた例を示したが、フィル
ム等の被蒸着材料を走行する室と蒸着材料を加熱する室
とを異なる減圧状態にして真空蒸着を行う、いわゆる２
チャンバー式の装置にも、本発明を適用できる。(3) In the above embodiment, an example was described in which a so-called one-chamber type was used as the vacuum chamber. However, the chamber in which the material to be evaporated such as a film is run and the chamber in which the evaporation material is heated are set to different decompression states. So-called vacuum deposition
The present invention can be applied to a chamber type device.
【００２８】（４） 上記実施形態では、被蒸着材料の
巻き出しロール及び巻き取りロールを真空槽内に配置し
た例を示したが、巻き出しロール及び巻き取りロールを
蒸着する真空槽外に配置し、蒸着を高真空槽内で行う連
続方式の装置にも適用できる。(4) In the above embodiment, the example in which the unwinding roll and the take-up roll of the material to be vapor-deposited are arranged in the vacuum chamber is shown. However, the present invention can also be applied to a continuous apparatus in which vapor deposition is performed in a high vacuum chamber.
【００２９】（５） 上記実施形態では、被蒸着物とし
て高分子フィルムを例に挙げたが、被蒸着物としては
紙、布などでもよい。又、蒸着材料として、上記した酸
化アルミニウムと酸化珪素以外に、種々の元素、化合物
を使用することができ、更に２種以上の蒸着材料を用い
て２種以上の元素または成分からなる混合膜を形成する
ようにしてもよい。(5) In the above embodiment, the polymer film is taken as an example of the material to be deposited. However, the material to be deposited may be paper, cloth, or the like. In addition, as the vapor deposition material, various elements and compounds can be used in addition to the above-described aluminum oxide and silicon oxide. Further, a mixed film composed of two or more elements or components using two or more vapor deposition materials can be used. It may be formed.
【図１】本発明の一実施形態に係る真空蒸着装置の概略
全体構成図FIG. 1 is a schematic overall configuration diagram of a vacuum evaporation apparatus according to an embodiment of the present invention.
【図２】図１の真空蒸着装置の材料保持手段近傍を説明
する拡大図FIG. 2 is an enlarged view illustrating the vicinity of a material holding unit of the vacuum evaporation apparatus of FIG.
【図３】蒸着膜の分析結果を示すグラフFIG. 3 is a graph showing an analysis result of a deposited film.
【図４】従来の真空蒸着装置における坩堝と被蒸着物と
の配置関係を説明する図FIG. 4 is a view for explaining an arrangement relationship between a crucible and an object to be deposited in a conventional vacuum deposition apparatus.
【図５】従来技術により蒸着した蒸着膜の分析結果を示
すグラフFIG. 5 is a graph showing an analysis result of a deposited film deposited by a conventional technique.
６ 真空槽 ７ 遮蔽装置 ８ 材料保持手段 １０ 蒸着材料 １１ 被蒸着物 １３ 仕切り部 １５ 押し上げ機構 Reference Signs List 6 Vacuum tank 7 Shielding device 8 Material holding means 10 Deposition material 11 Deposition target 13 Partition part 15 Push-up mechanism
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大濱 一郎 滋賀県大津市堅田二丁目１番１号 東洋紡 績株式会社総合研究所内 (72)発明者 伊関 清司 滋賀県大津市堅田二丁目１番１号 東洋紡 績株式会社総合研究所内 Ｆターム(参考） 4K029 AA11 AA25 CA01 DA10 DB13 DB14 DB15 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Ichiro Ohama 2-1-1 Katata, Otsu City, Shiga Prefecture Inside Toyobo Co., Ltd. Research Institute (72) Inventor Kiyoji Iseki 2-1-1 Katata, Otsu City, Shiga Prefecture 4K029 AA11 AA25 CA01 DA10 DB13 DB14 DB15
Claims (5)
素からなる混合膜を形成可能な真空蒸着装置において、
異なる種類の蒸着材料を仕分けて保持すべくこれらの蒸
着材料を仕分け可能な薄い仕切り部を備えた材料保持手
段と、前記蒸着材料を加熱して加熱・蒸発させる加熱手
段とを備えると共に、前記材料保持手段中の仕切り部
を、その長手方向が前記被蒸着物の走行方向とは略直交
する方向になるように配置することを特徴とする真空蒸
着装置。1. A vacuum evaporation apparatus capable of forming a mixed film made of different elements on an object to be deposited traveling in a vacuum chamber,
Material holding means having a thin partition portion capable of sorting these evaporation materials to sort and hold different types of evaporation materials, and heating means for heating and evaporating the evaporation materials by heating the evaporation materials, and the material A vacuum deposition apparatus, wherein a partition in the holding means is disposed such that a longitudinal direction thereof is substantially perpendicular to a running direction of the deposition target.
にあって、走行する前記被蒸着物の走行方向前後の位置
に、前記材料保持手段から加熱され蒸発する前記蒸着材
料の蒸発を部分的に遮蔽する遮蔽装置を設ける請求項１
の真空蒸着装置。2. The method according to claim 1, wherein the evaporation of the evaporation material, which is heated and evaporated from the material holding means, is provided between the material to be deposited and the material holding means at a position before and after the running direction of the material to be run. 2. A shielding device for shielding a vehicle.
Vacuum evaporation equipment.
し上げる押し上げ機構を備える請求項１又は２の真空蒸
着装置。3. The vacuum deposition apparatus according to claim 1, wherein the material holding means includes a push-up mechanism for pushing up the deposition material.
有すると共に、１０〜１５０ｍｍ間隔で配置される請求
項１〜３のいずれか１項の真空蒸着装置。4. The vacuum deposition apparatus according to claim 1, wherein the partition has a thickness of 2 to 10 mm and is arranged at an interval of 10 to 150 mm.
る請求項１〜４のいずれか１項の真空蒸着装置。5. The vacuum deposition apparatus according to claim 1, wherein the partition is made of a material containing carbon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35254199A JP2001172762A (en) | 1999-12-13 | 1999-12-13 | Vacuum evaporation system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35254199A JP2001172762A (en) | 1999-12-13 | 1999-12-13 | Vacuum evaporation system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001172762A true JP2001172762A (en) | 2001-06-26 |
Family
ID=18424775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35254199A Pending JP2001172762A (en) | 1999-12-13 | 1999-12-13 | Vacuum evaporation system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001172762A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003004720A1 (en) * | 2001-07-03 | 2003-01-16 | Galileo Vacuum Systems S.R.L. | Apparatus for vacuum vaporization |
| JP2009149968A (en) * | 2007-12-21 | 2009-07-09 | Samsung Electro Mech Co Ltd | Vacuum deposition system controllable of source amount |
| JP2010261100A (en) * | 2009-04-30 | 2010-11-18 | Samsung Mobile Display Co Ltd | Vapor deposition apparatus |
| JP2012155894A (en) * | 2011-01-24 | 2012-08-16 | Konica Minolta Holdings Inc | Vapor-deposition device |
-
1999
- 1999-12-13 JP JP35254199A patent/JP2001172762A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003004720A1 (en) * | 2001-07-03 | 2003-01-16 | Galileo Vacuum Systems S.R.L. | Apparatus for vacuum vaporization |
| JP2009149968A (en) * | 2007-12-21 | 2009-07-09 | Samsung Electro Mech Co Ltd | Vacuum deposition system controllable of source amount |
| JP2010261100A (en) * | 2009-04-30 | 2010-11-18 | Samsung Mobile Display Co Ltd | Vapor deposition apparatus |
| US8961692B2 (en) | 2009-04-30 | 2015-02-24 | Samsung Display Co., Ltd. | Evaporating apparatus |
| JP2012155894A (en) * | 2011-01-24 | 2012-08-16 | Konica Minolta Holdings Inc | Vapor-deposition device |
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