JP2000357318A - Glass for substrate of information recording medium and glass substrate for information recording medium - Google Patents
Glass for substrate of information recording medium and glass substrate for information recording mediumInfo
- Publication number
- JP2000357318A JP2000357318A JP2000080690A JP2000080690A JP2000357318A JP 2000357318 A JP2000357318 A JP 2000357318A JP 2000080690 A JP2000080690 A JP 2000080690A JP 2000080690 A JP2000080690 A JP 2000080690A JP 2000357318 A JP2000357318 A JP 2000357318A
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- Japan
- Prior art keywords
- glass
- substrate
- recording medium
- information recording
- modulus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、高いヤング率を有
する情報記録媒体基板用ガラスおよび情報記録媒体用ガ
ラス基板に関する。The present invention relates to a glass for an information recording medium substrate having a high Young's modulus and a glass substrate for an information recording medium.
【０００２】[0002]
【従来の技術】情報記録媒体用基板、特に磁気ディスク
（ハードディスク）用基板としてガラス基板が用いられ
ており、モル％で表示した組成が、ＳｉＯ2：６５．３
％、Ａｌ2Ｏ3：８．６％、ＺｒＯ2：３．５％、Ｌｉ
2Ｏ：１２．５％、Ｎａ2Ｏ：１０．１％、であるガラス
（以下「従来ガラス」という。）からなる基板が例示さ
れる。この従来ガラスは通常化学強化処理されて使用さ
れる。 2. Description of the Related Art A glass substrate is used as a substrate for an information recording medium, particularly a substrate for a magnetic disk (hard disk). The composition expressed in mol% is SiO 2 : 65.3.
%, Al 2 O 3: 8.6 %, ZrO 2: 3.5%, Li
A substrate made of glass (hereinafter, referred to as “conventional glass”) having 2O: 12.5% and Na 2 O: 10.1% is exemplified. This conventional glass is usually used after being chemically strengthened.
【０００３】近年記憶容量を増すために、基板の薄板化
による搭載枚数の増加が求められている。一方、記憶密
度を増すために磁気ディスクと読み取り磁気ヘッドの間
隔は小さくなっており、前記基板の薄板化にともなう基
板のたわみや反りの増大は磁気ディスク破損の原因とな
る。In recent years, in order to increase the storage capacity, an increase in the number of mounted substrates due to thinning of the substrate has been required. On the other hand, the distance between the magnetic disk and the read magnetic head is reduced in order to increase the storage density, and the increase in the deflection and warpage of the substrate accompanying the thinning of the substrate causes damage to the magnetic disk.
【０００４】[0004]
【発明が解決しようとする課題】この問題、すなわち基
板のたわみや反りの問題を解決するためにヤング率の高
いガラスが求められている。なお、前記従来ガラスのヤ
ング率は８２ＧＰａである。また、情報記録媒体用基板
には、その在庫中に表面性状が著しく変化し、前記基板
上に形成される下地膜、磁性膜、保護膜等の膜がはがれ
やすくなることがないこと、すなわち耐候性が求められ
る。前記従来ガラスの耐候性は決して高くはないが、化
学強化処理によって耐候性は許容されるレベルになる。
これは、従来ガラスの耐候性を低下させる主因と考えら
れるアルカリ成分が、化学強化処理によってガラス表面
から抽出除去されるためと考えられる。しかし化学強化
処理には、工程が増加する、化学強化処理後の基板表面
によごれが付着しやすい、等の問題がある。In order to solve this problem, that is, the problem of substrate deflection and warpage, there is a need for a glass having a high Young's modulus. The conventional glass has a Young's modulus of 82 GPa. In addition, the surface properties of the information recording medium substrate are not significantly changed during the stock, and the underlying film, magnetic film, protective film, and other films formed on the substrate are not easily peeled off. Sex is required. Although the weather resistance of the conventional glass is not high at all, the weather resistance is brought to an acceptable level by the chemical strengthening treatment.
This is presumably because alkali components, which are conventionally considered to be the main cause of reducing the weather resistance of glass, are extracted and removed from the glass surface by the chemical strengthening treatment. However, the chemical strengthening treatment has problems such as an increase in the number of steps and a tendency for dust to adhere to the substrate surface after the chemical strengthening treatment.
【０００５】また、記憶密度を増すためには磁気記録層
である磁性層の保磁力を増加させることが有効であり、
そのためには磁性層形成に際して行われる熱処理をより
高い温度で行う必要がある。この観点から、基板に用い
られるガラスのガラス転移点が高いことが求められてい
る。なお、前記従来ガラスのガラス転移点は５００℃で
ある。In order to increase the storage density, it is effective to increase the coercive force of the magnetic layer as the magnetic recording layer.
For this purpose, it is necessary to perform the heat treatment for forming the magnetic layer at a higher temperature. From this viewpoint, it is required that the glass used for the substrate has a high glass transition point. The glass transition point of the conventional glass is 500 ° C.
【０００６】磁気ディスク用ガラス基板は従来、ノート
ブックパソコン等に用いられる２．５型基板（ガラス基
板外径：６５ｍｍ）が主であったが、今後はサーバー等
に用いられるより大きな基板、すなわち３．０型基板
（ガラス基板外径：８４ｍｍ）、３．５型基板（ガラス
基板外径：９５ｍｍ）、等も増加する可能性が高い。し
たがって、このようなガラス基板に使用されるガラスは
大量生産に適したものであることが求められている。Conventionally, a glass substrate for a magnetic disk is mainly a 2.5-type substrate (glass substrate outer diameter: 65 mm) used for a notebook computer or the like. There is a high possibility that a 3.0-type substrate (glass substrate outer diameter: 84 mm), a 3.5-type substrate (glass substrate outer diameter: 95 mm), etc. will also increase. Therefore, the glass used for such a glass substrate is required to be suitable for mass production.
【０００７】ガラスの大量生産はガラス溶融窯により行
われる。ガラス溶融窯の溶融ガラスと直接接触する部分
には通常ＡＺＳ（Ａｌ2Ｏ3−ＺｒＯ2−ＳｉＯ2）系電鋳
煉瓦が使用される。したがって、ＡＺＳ系電鋳煉瓦に対
する溶融ガラスの侵食性が小さいことも求められてい
る。[0007] Mass production of glass is performed by a glass melting furnace. AZS (Al 2 O 3 —ZrO 2 —SiO 2 ) -based electroformed brick is usually used for a portion of the glass melting furnace that directly contacts the molten glass. Accordingly, it is also required that the erosion of the molten glass on the AZS-based electroformed brick is small.
【０００８】さらに、板ガラスの大量生産はフロート法
をはじめとする連続成形法により広く行われている。こ
のような連続成形法として、フロート法以外にフュージ
ョン法、ダウンドロー法が例示される。したがって、フ
ロート成形等の連続成形が可能なガラスであることが求
められている。[0008] Further, mass production of sheet glass is widely performed by a continuous forming method such as a float method. Examples of such a continuous molding method include a fusion method and a downdraw method in addition to the float method. Therefore, it is required that the glass be capable of continuous molding such as float molding.
【０００９】ＷＯ９９／０６３３３には、ヤング率が９
０ＧＰａ以上であり、モル％表示で、ＴｉＯ2：０．１
〜３０、ＣａＯ：１〜４５、ＭｇＯ＋ＣａＯ：５〜４
０、Ｎａ2Ｏ＋Ｌｉ2Ｏ：３〜３０、Ａｌ2Ｏ3：０〜１
５、ＳｉＯ2：３５〜６５、であるガラスをダイレクト
プレス成形することを特徴とする情報記録媒体用ガラス
基板の製造方法が開示されている。なお、ダイレクトプ
レス成形は連続成形法ではない。WO 99/06333 has a Young's modulus of 9
0 GPa or more, TiO 2 : 0.1
-30, CaO: 1-45, MgO + CaO: 5-4
0, Na 2 O + Li 2 O: 3~30, Al 2 O 3: 0~1
5, SiO 2: 35~65, method of manufacturing a glass substrate for an information recording medium, characterized by direct press molding the glass is disclosed a. Note that direct press molding is not a continuous molding method.
【００１０】本発明者は、ＷＯ９９／０６３３３に開示
されているガラスの一部について追試した（後掲表５中
の例４１、例４２）。その結果、ＷＯ９９／０６３３３
に開示されているガラスに対し連続成形法を適用して板
ガラスを製造することは困難ではないか、と考えた。本
発明は、上記課題を解決する情報記録媒体基板用ガラス
および情報記録媒体用ガラス基板の提供を目的とする。The present inventor has conducted additional tests on some of the glasses disclosed in WO 99/06333 (Examples 41 and 42 in Table 5 given later). As a result, WO 99/06333
It was thought that it would be difficult to produce a sheet glass by applying a continuous forming method to the glass disclosed in the above. An object of the present invention is to provide a glass for an information recording medium substrate and a glass substrate for an information recording medium that solve the above problems.
【００１１】[0011]
【課題を解決するための手段】本発明は、モル％表示で
実質的に、 ＳｉＯ2 ６０〜７２、 Ａｌ2Ｏ3 ２〜９、 ＭｇＯ ３〜９、 ＣａＯ ２〜１０、 ＳｒＯ ０〜１５、 ＺｎＯ ０〜４、 ＴｉＯ2 ０〜８、 ＺｒＯ2 ０〜４、 Ｌｉ2Ｏ １〜１２、 Ｎａ2Ｏ ０〜８、 Ｋ2Ｏ ０〜５、 Ｙ2Ｏ3 ０〜５、 Ｌａ2Ｏ3 ０〜５、 Ｌｉ2Ｏ＋Ｎａ2Ｏ＋Ｋ2Ｏ ４〜１５、 からなり、ヤング率が８５ＧＰａ以上である情報記録媒
体基板用ガラス、および、前記情報記録媒体基板用ガラ
スからなる情報記録媒体用ガラス基板を提供する。According to the present invention, there are provided, in terms of mol%, substantially: SiO 2 60 to 72, Al 2 O 3 2 to 9, MgO 3 to 9, CaO 2 to 10, SrO 0 to 15, ZnO 0-4, TiO 2 0-8, ZrO 2 0-4, Li 2 O 1-12, Na 2 O 0-8, K 2 O 0-5, Y 2 O 3 0-5, La 2 O 3 0~5, Li 2 O + Na 2 O + K 2 O 4~15, consists, Young's modulus is not less than 85GPa information recording medium glass substrate, and a glass substrate for an information recording medium consisting of the information recording medium substrate glass provide.
【００１２】[0012]
【発明の実施の形態】本発明の情報記録媒体基板用ガラ
ス（以下単に本発明のガラスという。）のヤング率は８
５ＧＰａ以上である。８５ＧＰａ未満では基板のたわみ
や反りの問題が発生する。好ましくは８８ＧＰａ以上、
より好ましくは９０ＧＰａ以上である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The glass for an information recording medium substrate of the present invention (hereinafter simply referred to as the glass of the present invention) has a Young's modulus of 8.
5 GPa or more. If it is less than 85 GPa, the problem of bending or warping of the substrate occurs. Preferably at least 88 GPa,
More preferably, it is 90 GPa or more.
【００１３】本発明のガラスのガラス転移点は５５０℃
以上であることが好ましい。５５０℃未満では磁性層形
成熱処理温度を充分高くできず、磁性層の保磁力増加が
困難になるおそれがある。より好ましくは５６０℃以
上、さらに好ましくは５７０℃以上、一層好ましくは５
８０℃以上、特に好ましくは６００℃以上、最も好まし
くは６１０℃以上である。The glass transition point of the glass of the present invention is 550 ° C.
It is preferable that it is above. If the temperature is less than 550 ° C., the heat treatment temperature for forming the magnetic layer cannot be sufficiently increased, and it may be difficult to increase the coercive force of the magnetic layer. More preferably 560 ° C. or higher, further preferably 570 ° C. or higher, more preferably 5 ° C. or higher.
It is at least 80 ° C, particularly preferably at least 600 ° C, most preferably at least 610 ° C.
【００１４】本発明のガラスの液相温度をＴL（単位：
℃）、粘度が１０4Ｐ（ポアズ）となる温度をＴ4（単
位：℃）として、ＴL−Ｔ4＜５０であることが好まし
い。ＴL−Ｔ4≧５０ではフロート成形が困難になるおそ
れがある。より好ましくはＴL−Ｔ 4＜４０、特に好まし
くはＴL−Ｔ4＜３０である。The liquidus temperature of the glass of the present invention is defined as TL(unit:
℃), viscosity is 10FourThe temperature that becomes P (Poise) is TFour(single
Temperature: ° C)L-TFourPreferably <50
No. TL-TFourIf ≧ 50, float molding may be difficult
There is. More preferably TL-T Four<40, especially preferred
K is TL-TFour<30.
【００１５】本発明のガラスの組成について以下モル％
を単に％と表示して説明する。なお、本発明のガラスは
実質的に、 ＳｉＯ2 ６０〜７２、 Ａｌ2Ｏ3 ２〜８、 ＭｇＯ ３〜８、 ＣａＯ ３〜１０、 ＳｒＯ ０〜８、 ＺｎＯ ０〜４、 ＴｉＯ2 １〜８、 ＺｒＯ2 ０．２〜４、 Ｌｉ2Ｏ １〜１２、 Ｎａ2Ｏ ０〜３、 Ｋ2Ｏ ０〜２、 Ｙ2Ｏ3 ０〜５、 Ｌａ2Ｏ3 ０〜５、 Ｌｉ2Ｏ＋Ｎａ2Ｏ＋Ｋ2Ｏ ４〜１４、 からなることが好ましい。[0015] The composition of the glass of the present invention is as follows:
Is simply described as%. The glass of the present invention is essentially, SiO 2 60~72, Al 2 O 3 2~8, MgO 3~8, CaO 3~10, SrO 0~8, ZnO 0~4, TiO 2 1~8 ZrO 2 0.2-4, Li 2 O 1-12, Na 2 O 0-3, K 2 O 0-2, Y 2 O 3 0-5, La 2 O 3 0-5, Li 2 O + Na 2 O + K 2 O 4-14, preferably.
【００１６】また、実質的に、 ＳｉＯ2 ６２〜７０、 Ａｌ2Ｏ3 ３〜７、 ＭｇＯ ３．５〜７．５、 ＣａＯ ３．５〜８、 ＳｒＯ ０．５〜７、 ＺｎＯ ０〜３．５、 ＴｉＯ2 １．５〜７、 ＺｒＯ2 ０．４〜３、 Ｌｉ2Ｏ ２〜１０、 Ｎａ2Ｏ ０．１〜２．５、 Ｋ2Ｏ ０．１〜１．５、 Ｙ2Ｏ3 ０．２〜４、 Ｌａ2Ｏ3 ０〜４、 Ｌｉ2Ｏ＋Ｎａ2Ｏ＋Ｋ2Ｏ ４．５〜１３、 からなることがより好ましい。In addition, SiO 2 62-70, Al 2 O 3 3-7, MgO 3.5-7.5, CaO 3.5-8, SrO 0.5-7, ZnO 0-3 .5, TiO 2 1.5~7, ZrO 2 0.4~3, Li 2 O 2~10, Na 2 O 0.1~2.5, K 2 O 0.1~1.5, Y 2 O 3 0.2~4, La 2 O 3 0~4, Li 2 O + Na 2 O + K 2 O 4.5~13, more preferably made of.
【００１７】また、実質的に、 ＳｉＯ2 ６３〜６９、 Ａｌ2Ｏ3 ４〜６、 ＭｇＯ ４〜７、 ＣａＯ ４〜７、 ＳｒＯ １〜５、 ＺｎＯ ０〜３、 ＴｉＯ2 ２〜６、 ＺｒＯ2 ０．６〜２、 Ｌｉ2Ｏ ４〜８、 Ｎａ2Ｏ ０．２〜２、 Ｋ2Ｏ ０．２〜１、 Ｙ2Ｏ3 ０．５〜３、 Ｌａ2Ｏ3 ０〜３、 Ｌｉ2Ｏ＋Ｎａ2Ｏ＋Ｋ2Ｏ ５〜１０、 からなることが特に好ましい。In addition, SiO 2 63-69, Al 2 O 3 4-6, MgO 4-7, CaO 4-7, SrO 1-5, ZnO 0-3, TiO 2 2-6, ZrO 2 0.6~2, Li 2 O 4~8, Na 2 O 0.2~2, K 2 O 0.2~1, Y 2 O 3 0.5~3, La 2 O 3 0~3, li 2 O + Na 2 O + K 2 O 5~10, it is particularly preferably made of.
【００１８】ＳｉＯ2はガラスの骨格を形成する必須成
分である。６０％未満では、ＴLが高くなりすぎる。好
ましくは６０．５％以上、より好ましくは６１％以上、
特に好ましくは６２％以上、最も好ましくは６３％以上
である。７２％超では、ヤング率が低下する。好ましく
は７０％以下、より好ましくは６９％以下である。SiO 2 is an essential component for forming the skeleton of glass. If it is less than 60%, T L becomes too high. Preferably at least 60.5%, more preferably at least 61%,
It is particularly preferably at least 62%, most preferably at least 63%. If it exceeds 72%, the Young's modulus decreases. It is preferably at most 70%, more preferably at most 69%.
【００１９】Ａｌ2Ｏ3はヤング率を高くし、また耐候性
を高くする必須成分である。２％未満では前記効果が小
さい。好ましくは３％以上、より好ましくは４％以上で
ある。９％超ではＴLが高くなりすぎ、またＡＺＳ系電
鋳煉瓦に対する侵食性も大きくなる。好ましくは８％以
下、より好ましくは７．５％以下、特に好ましくは７％
以下、最も好ましくは６％以下である。Al 2 O 3 is an essential component for increasing Young's modulus and increasing weather resistance. If it is less than 2%, the effect is small. It is preferably at least 3%, more preferably at least 4%. If it exceeds 9%, the TL becomes too high, and the erosion of the AZS-based electroformed brick increases. Preferably 8% or less, more preferably 7.5% or less, particularly preferably 7%
Or less, most preferably 6% or less.
【００２０】ＳｉＯ2とＡｌ2Ｏ3の含有量の合計は６６
％以上であることが好ましい。６６％未満では、ＴLが
高くなりすぎるおそれがある、またはＴ4が低くなりす
ぎるおそれがある、またはＴL−Ｔ4が大きくなりすぎる
おそれがある。より好ましくは６６．５％以上、特に好
ましくは６７％以上である。The total content of SiO 2 and Al 2 O 3 is 66
% Is preferable. If it is less than 66%, T L may be too high, T 4 may be too low, or T L -T 4 may be too large. It is more preferably at least 66.5%, particularly preferably at least 67%.
【００２１】ＭｇＯは、ヤング率を高くし、またガラス
の溶解性を向上させる効果があり必須成分である。３％
未満では前記効果が小さい。好ましくは３．５％以上、
より好ましくは４％以上、最も好ましくは５％以上であ
る。９％超ではＴLが高くなりすぎる。好ましくは８％
以下、より好ましくは７．５％以下、特に好ましくは７
％以下である。MgO has an effect of increasing the Young's modulus and improving the solubility of glass, and is an essential component. 3%
If less, the effect is small. Preferably 3.5% or more,
It is more preferably at least 4%, most preferably at least 5%. If it exceeds 9%, T L becomes too high. Preferably 8%
Or less, more preferably 7.5% or less, particularly preferably 7% or less.
% Or less.
【００２２】ＣａＯは、ヤング率を高くし、またガラス
の溶解性を向上させる効果があり必須成分である。２％
未満では前記効果が小さい。好ましくは３％以上、より
好ましくは３．５％以上、特に好ましくは４％以上であ
る。１０％超ではＴLが高くなりすぎる。好ましくは８
％以下、より好ましくは７．５％以下、特に好ましくは
７％以下である。CaO is an essential component because it has the effects of increasing the Young's modulus and improving the solubility of glass. 2%
If less, the effect is small. It is preferably at least 3%, more preferably at least 3.5%, particularly preferably at least 4%. If it exceeds 10%, T L becomes too high. Preferably 8
% Or less, more preferably 7.5% or less, particularly preferably 7% or less.
【００２３】ＳｒＯは必須成分ではないが、ＴLを低下
させ、またガラスの溶解性を向上させる効果があり、１
５％まで含有してもよい。１５％超ではヤング率が低下
するおそれがある。好ましくは１０％以下、より好まし
くは９．５％以下、さらに好ましくは９％以下、一層好
ましくは８％以下、特に好ましくは７％以下、最も好ま
しくは５％以下である。また、ＳｒＯを含有する場合、
その含有量は好ましくは０．５％以上、より好ましくは
１％以上である。SrO is not an essential component, but has the effect of lowering T L and improving the solubility of glass.
You may contain up to 5%. If it exceeds 15%, the Young's modulus may decrease. It is preferably at most 10%, more preferably at most 9.5%, further preferably at most 9%, more preferably at most 8%, particularly preferably at most 7%, most preferably at most 5%. When SrO is contained,
Its content is preferably at least 0.5%, more preferably at least 1%.
【００２４】ＺｎＯは必須成分ではないが、ヤング率を
高くし、またガラスの溶解性を向上させる効果があり、
４％まで含有してもよい。４％超ではＴLが高くなりす
ぎるおそれがある。好ましくは３．５％以下、より好ま
しくは３％以下、特に好ましくは２．５％以下である。ZnO is not an essential component, but has an effect of increasing the Young's modulus and improving the solubility of glass.
You may contain up to 4%. If it exceeds 4%, TL may be too high. It is preferably at most 3.5%, more preferably at most 3%, particularly preferably at most 2.5%.
【００２５】ＴｉＯ2は必須成分ではないが、ヤング率
を高くし、また耐候性を高くする効果があり、８％まで
含有してもよい。８％超ではＴLが高くなりすぎるおそ
れがある、または分相現象が起りやすくなるおそれがあ
る。好ましくは７％以下、より好ましくは６％以下であ
る。また、ＴｉＯ2を含有する場合、その含有量は１％
以上であることが好ましい。より好ましくは１．５％以
上、特に好ましくは２％以上である。なお、ＴLを下げ
たい場合、分相現象を抑制したい場合、等においてはＴ
ｉＯ2を実質的に含有しないことが好ましい。典型的に
は０．０５％以下、より好ましくは０．０２％以下であ
る。Although TiO 2 is not an essential component, it has an effect of increasing Young's modulus and weather resistance, and may be contained up to 8%. If it exceeds 8%, TL may be too high, or phase separation may easily occur. It is preferably at most 7%, more preferably at most 6%. When TiO 2 is contained, its content is 1%
It is preferable that it is above. It is more preferably at least 1.5%, particularly preferably at least 2%. When it is desired to reduce TL , to suppress the phase separation phenomenon, or the like, T
It is preferable that iO 2 is not substantially contained. It is typically at most 0.05%, more preferably at most 0.02%.
【００２６】ＺｒＯ2は必須成分ではないが、ヤング率
を高くする効果があり、４％まで含有してもよい。４％
超ではＴLが高くなりすぎるおそれがある。好ましくは
３％以下、より好ましくは２％以下である。また、Ｚｒ
Ｏ2を含有する場合、その含有量は０．２％以上である
ことが好ましい。より好ましくは０．４％以上、特に好
ましくは０．６％以上である。ZrO 2 is not an essential component, but has an effect of increasing the Young's modulus, and may be contained up to 4%. 4%
Above that, TL may be too high. It is preferably at most 3%, more preferably at most 2%. Also, Zr
When O 2 is contained, its content is preferably 0.2% or more. It is more preferably at least 0.4%, particularly preferably at least 0.6%.
【００２７】Ｌｉ2Ｏはヤング率を高くする必須成分で
ある。１％未満では前記効果が小さい。好ましくは２％
以上、より好ましくは４％以上である。１２％超ではＴ
Lが高くなりすぎる。好ましくは１０％以下、より好ま
しくは８％以下である。Li 2 O is an essential component for increasing the Young's modulus. If it is less than 1%, the effect is small. Preferably 2%
Above, more preferably 4% or more. T over 12%
L is too high. It is preferably at most 10%, more preferably at most 8%.
【００２８】Ｎａ2Ｏは必須成分ではないが、ガラスの
溶解性を向上させる効果があり、８％まで含有してもよ
い。８％超ではヤング率が低下するおそれがある。好ま
しくは６％以下、より好ましくは５．５％以下、さらに
好ましくは５．２％以下、特に好ましくは２．５％以
下、最も好ましくは２％以下である。また、Ｎａ2Ｏを
含有する場合、その含有量は好ましくは０．１％以上、
より好ましくは０．２％以上である。Although Na 2 O is not an essential component, it has an effect of improving the solubility of glass, and may be contained up to 8%. If it exceeds 8%, the Young's modulus may decrease. It is preferably at most 6%, more preferably at most 5.5%, further preferably at most 5.2%, particularly preferably at most 2.5%, most preferably at most 2%. When Na 2 O is contained, the content is preferably 0.1% or more,
It is more preferably at least 0.2%.
【００２９】Ｋ2Ｏは必須成分ではないが、ガラスの溶
解性を向上させる効果があり、５％まで含有してもよ
い。５％超ではヤング率が低下するおそれがある。好ま
しくは４．７％以下、より好ましくは４．４％以下、特
に好ましくは１．５％以下、最も好ましくは１％以下で
ある。また、Ｋ2Ｏを含有する場合、その含有量は好ま
しくは０．１％以上、より好ましくは０．２％以上であ
る。K 2 O is not an essential component, but has an effect of improving the solubility of glass, and may be contained up to 5%. If it exceeds 5%, the Young's modulus may decrease. It is preferably at most 4.7%, more preferably at most 4.4%, particularly preferably at most 1.5%, most preferably at most 1%. When K 2 O is contained, its content is preferably at least 0.1%, more preferably at least 0.2%.
【００３０】Ｙ2Ｏ3は必須成分ではないが、ヤング率を
高くする効果があり、５％まで含有してもよい。５％超
ではＴLが高くなりすぎるおそれがある。好ましくは４
％以下、より好ましくは３％以下である。また、Ｙ2Ｏ3
を含有する場合、その含有量は好ましくは０．２％以
上、より好ましくは０．５％以上である。Although Y 2 O 3 is not an essential component, it has an effect of increasing the Young's modulus, and may be contained up to 5%. If it exceeds 5%, TL may be too high. Preferably 4
%, More preferably 3% or less. In addition, Y 2 O 3
, The content is preferably 0.2% or more, more preferably 0.5% or more.
【００３１】Ｌａ2Ｏ3は必須成分ではないが、ヤング率
を高くする効果があり、５％まで含有してもよい。５％
超ではＴLが高くなりすぎるおそれがある。好ましくは
４％以下、より好ましくは３％以下である。La 2 O 3 is not an essential component, but has an effect of increasing the Young's modulus, and may be contained up to 5%. 5%
Above that, TL may be too high. It is preferably at most 4%, more preferably at most 3%.
【００３２】Ｌｉ2Ｏ、Ｎａ2ＯおよびＫ2Ｏの含有量の
合計は４％以上１５％以下である。４％未満ではガラス
の溶解性が低下し、またＴLが高くなりすぎる。好まし
くは４．５％以上、より好ましくは５％以上である。１
５％超ではヤング率が低下し、耐候性が低下し、またＡ
ＺＳ系電鋳煉瓦に対する侵食性も大きくなる。好ましく
は１４％以下、より好ましくは１３％以下、特に好まし
くは１１％以下、最も好ましくは１０％以下である。The total content of Li 2 O, Na 2 O and K 2 O is 4% or more and 15% or less. If it is less than 4%, the solubility of the glass is lowered, and the TL is too high. It is preferably at least 4.5%, more preferably at least 5%. 1
If it exceeds 5%, the Young's modulus decreases, the weather resistance decreases, and A
Erosiveness to ZS-based electroformed bricks also increases. It is preferably at most 14%, more preferably at most 13%, particularly preferably at most 11%, most preferably at most 10%.
【００３３】本発明のガラスは実質的に上記成分からな
るが、この他に以下に例示する成分を、本発明の目的を
損なわない範囲で含有してもよい。ＳＯ3、Ｃｌ、Ａｓ2
Ｏ3、Ｓｂ2Ｏ3等の清澄剤を合計で１％まで含有しても
よい。ＳｒＯと同様の効果を得るためにＢａＯを２％ま
で含有してもよい。ＴｉＯ2と同様の効果を得るために
ＳｎＯ2を２％まで含有してもよい。Ｙ2Ｏ3と同様の効
果、すなわち、ヤング率を高くし、また耐候性を高くす
る等の効果を得るためにＴａ2Ｏ5、Ｎｂ2Ｏ5、ＣｅＯ2
等の希土類金属酸化物を合計で３％まで含有してもよ
い。ガラスの溶解性や安定性を向上させるために、Ｂ2
Ｏ3、Ｐ2Ｏ5、Ｖ2Ｏ5等を合計で３％まで含有してもよ
い。The glass of the present invention consists essentially of the above-mentioned components, and may further contain the following components as long as the object of the present invention is not impaired. SO 3 , Cl, As 2
Refining agents such as O 3 and Sb 2 O 3 may be contained up to 1% in total. BaO may be contained up to 2% in order to obtain the same effect as SrO. To obtain the same effect as TiO 2 , SnO 2 may be contained up to 2%. In order to obtain an effect similar to that of Y 2 O 3 , that is, an effect of increasing the Young's modulus and increasing the weather resistance, Ta 2 O 5 , Nb 2 O 5 , CeO 2
May be contained up to 3% in total. In order to improve the solubility and stability of glass, B 2
O 3 , P 2 O 5 , V 2 O 5 and the like may be contained up to 3% in total.
【００３４】なお、ＴLをより低下させたい場合は、Ｓ
ｃ2Ｏ3、Ｙ2Ｏ3、Ｌａ2Ｏ3、Ｐｒ2Ｏ 3、Ｎｄ2Ｏ3、Ｐｍ
2Ｏ3、Ｓｍ2Ｏ3、Ｅｕ2Ｏ3、Ｇｄ2Ｏ3、Ｔｂ2Ｏ3、Ｄｙ
2Ｏ3、Ｈｏ2Ｏ3、Ｅｒ2Ｏ3、Ｔｍ2Ｏ3、Ｙｂ2Ｏ3、Ｌｕ
2Ｏ3、のいずれも実質的に含有しないようにすることが
好ましい。Note that TLIf you want to lower the
cTwoOThree, YTwoOThree, LaTwoOThree, PrTwoO Three, NdTwoOThree, Pm
TwoOThree, SmTwoOThree, EuTwoOThree, GdTwoOThree, TbTwoOThree, Dy
TwoOThree, HoTwoOThree, ErTwoOThree, TmTwoOThree, YbTwoOThree, Lu
TwoOThree, May not be substantially contained
preferable.
【００３５】本発明の情報記録媒体用ガラス基板（以下
単に本発明のガラス基板という。）は本発明のガラスか
らなり、所定の寸法・形状に切断されたガラス板であ
る。本発明のガラス基板は、１２０℃、２気圧の水蒸気
雰囲気に２０時間保持したとき、該ガラス基板表面に存
在する、大きさが１０μｍ以上の付着物の数ＮLが１個
／ｃｍ2以下であり、大きさが１μｍ以上１０μｍ未満
の付着物の数ＮSが１０5個／ｃｍ2以下であることが好
ましい。The glass substrate for an information recording medium of the present invention (hereinafter simply referred to as the glass substrate of the present invention) is a glass plate made of the glass of the present invention and cut into a predetermined size and shape. When the glass substrate of the present invention is kept in a water vapor atmosphere at 120 ° C. and 2 atm for 20 hours, the number N L of deposits having a size of 10 μm or more present on the surface of the glass substrate is 1 / cm 2 or less; It is preferable that the number N S of the deposits having a size of 1 μm or more and less than 10 μm is 10 5 / cm 2 or less.
【００３６】ＮLが１個／ｃｍ2超またはＮSが１０5個／
ｃｍ2超では、ガラス基板在庫中にガラス基板表面に付
着物（白ヤケ）が発生し、ガラス基板上に形成される下
地膜、磁性膜、保護膜等の膜がはがれやすくなる。この
付着物は、空気中の水分や炭酸ガスの影響によりガラス
基板に生成付着した反応生成物であると考えられ、拭い
ても除去できないものである。ＮLはより好ましくは
０．５個／ｃｍ2以下、特に好ましくは０．２個／ｃｍ2
以下である。ＮSはより好ましくは０．８×１０5個／ｃ
ｍ2以下、特に好ましくは０．６×１０5個／ｃｍ2以下
である。N L exceeds 1 piece / cm 2 or N S exceeds 10 5 pieces / cm 2
If it exceeds cm 2 , deposits (white burns) are generated on the surface of the glass substrate during stock of the glass substrate, and films such as a base film, a magnetic film, and a protective film formed on the glass substrate are easily peeled off. This deposit is considered to be a reaction product generated and attached to the glass substrate under the influence of moisture in the air or carbon dioxide gas, and cannot be removed by wiping. N L is more preferably 0.5 / cm 2 or less, particularly preferably 0.2 / cm 2.
It is as follows. N S is more preferably 0.8 × 10 5 cells / c
m 2 or less, particularly preferably 0.6 × 10 5 / cm 2 or less.
【００３７】本発明のガラスおよびガラス基板の製造方
法は特に限定されず、各種方法を適用できる。たとえ
ば、通常使用される各成分の原料を目標組成となるよう
に調合し、これをガラス溶融窯で加熱溶融する。バブリ
ング、撹拌、清澄剤の添加等によりガラスを均質化し、
周知のフロート法、プレス法、フュージョン法またダウ
ンドロー法などの方法により所定の厚さの板ガラスに成
形し、徐冷後必要に応じて研削、研磨などの加工を行っ
た後、所定の寸法・形状のガラス基板とされる。成形法
としては、特に、大量生産に適したフロート法が好適で
ある。また、フロート法以外の連続成形法、すなわち、
フュージョン法、ダウンドロー法等にも好適である。本
発明のガラスおよびガラス基板は、特に磁気ディスク基
板に好適である。The method for producing the glass and glass substrate of the present invention is not particularly limited, and various methods can be applied. For example, raw materials of commonly used components are prepared so as to have a target composition, and this is heated and melted in a glass melting furnace. Homogenize the glass by bubbling, stirring, adding a fining agent, etc.
Formed into a sheet glass of a predetermined thickness by methods such as the well-known float method, press method, fusion method or downdraw method, and after slow cooling, if necessary, grinding, polishing, etc. The glass substrate has a shape. As a molding method, a float method suitable for mass production is particularly preferable. In addition, continuous molding methods other than the float method, that is,
It is also suitable for a fusion method, a downdraw method and the like. The glass and glass substrate of the present invention are particularly suitable for a magnetic disk substrate.
【００３８】[0038]
【実施例】各成分の原料を表のＳｉＯ2からＬａ2Ｏ3ま
での欄にモル％表示で示した組成となるように調合し、
白金るつぼを用いて１４５０〜１５５０℃の温度で３〜
５時間溶解した。溶解にあたっては、白金スターラを溶
融ガラス中に挿入し、２時間撹拌してガラスを均質化し
た。次いで溶融ガラスを流し出して板状に成形し、徐冷
した。なお、表のＲ2Ｏ計は、Ｌｉ2Ｏ、Ｎａ2Ｏおよび
Ｋ2Ｏの含有量（単位：モル％）の合計である。EXAMPLES The raw materials of each component were prepared so as to have the composition shown in mol% in the columns from SiO 2 to La 2 O 3 in the table.
Using a platinum crucible at a temperature of 1450-1550 ° C
Dissolved for 5 hours. Upon melting, a platinum stirrer was inserted into the molten glass and stirred for 2 hours to homogenize the glass. Next, the molten glass was poured out, formed into a plate shape, and gradually cooled. The R 2 O meter in the table is the total of the contents (unit: mol%) of Li 2 O, Na 2 O, and K 2 O.
【００３９】こうして得られたガラス板について、ヤン
グ率Ｅ（単位：ＧＰａ）、ガラス転移点Ｔg（単位：
℃）、液相温度ＴL（単位：℃）、粘度が１０4Ｐとなる
温度Ｔ4（単位：℃）、前記ＮL（単位：個／ｃｍ2）お
よび前記ＮS（単位：１０5個／ｃｍ2）を、以下に示す
方法により測定した。結果を表に示す。With respect to the glass plate thus obtained, Young's modulus E (unit: GPa), glass transition point T g (unit:
° C.), the liquidus temperature T L (unit: ° C.), the temperature T 4 (unit viscosity becomes 10 4 P: ° C.), the N L (unit: pieces / cm 2) and the N S (unit: 10 5 Pieces / cm 2 ) were measured by the following method. The results are shown in the table.
【００４０】Ｅ：厚さが１０〜２０ｍｍ、大きさが４ｃ
ｍ×４ｃｍのガラス板について、超音波パルス法により
測定した。 Ｔg：示差熱膨張計を用いて、石英ガラスを参照試料と
して室温から５℃／分の割合で昇温した際のガラスの伸
び率を、ガラスが軟化してもはや伸びが観測されなくな
る温度、すなわち屈伏点まで測定し、得られた熱膨張曲
線における屈曲点に相当する温度をガラス転移点とし
た。E: 10-20 mm in thickness and 4 c in size
The measurement was performed on the glass plate of mx 4 cm by the ultrasonic pulse method. T g : using a differential thermal dilatometer, the elongation percentage of the glass when the temperature was raised from room temperature at a rate of 5 ° C./min using quartz glass as a reference sample, the temperature at which the glass softened and the elongation was no longer observed. That is, measurement was performed up to the yield point, and the temperature corresponding to the bending point in the obtained thermal expansion curve was defined as the glass transition point.
【００４１】ＴL：ガラスを乳鉢で２ｍｍ程度のガラス
粒に粉砕し、このガラス粒を白金ボートに並べて置き、
温度傾斜炉中で２４時間熱処理した。結晶が析出してい
るガラス粒の温度の最高値を液相温度とした。 Ｔ4：回転粘度計により測定した。T L : Glass is ground into glass particles of about 2 mm in a mortar, and the glass particles are arranged in a platinum boat,
Heat treatment was performed in a temperature gradient furnace for 24 hours. The maximum value of the temperature of the glass particles on which the crystals were precipitated was defined as the liquidus temperature. T 4 : Measured with a rotational viscometer.
【００４２】ＮL、ＮS：厚さが１〜２ｍｍ、大きさが４
ｃｍ×４ｃｍのガラス板の両面を鏡面研磨し、炭酸カル
シウムおよび中性洗剤を用いて洗浄した後、超加速寿命
試験器（不飽和型プレッシャークッカーＴＰＣ−４１
０、タバイエスペック（株））に入れて１２０℃、２気
圧の水蒸気雰囲気に２０時間静置した。取り出したガラ
ス板の表面２００μｍ角の範囲を微分干渉顕微鏡で観察
し、大きさが１０μｍ以上の付着物の個数と大きさが１
μｍ以上１０μｍ未満の付着物の個数をカウントした。N L , N S : thickness 1-2 mm, size 4
Both sides of a glass plate of cm × 4 cm are mirror-polished, washed with calcium carbonate and a neutral detergent, and then subjected to an ultra-accelerated life tester (unsaturated pressure cooker TPC-41).
0, and was placed in a steam atmosphere at 120 ° C. and 2 atm for 20 hours. The surface of the removed glass plate was observed in a range of 200 μm square with a differential interference microscope, and the number and size of the deposits having a size of 10 μm or more were 1 μm or more.
The number of deposits having a size of not less than μm and less than 10 μm was counted.
【００４３】例１〜３９のガラスは実施例、例４０〜４
２のガラスは比較例である。例４０は従来ガラスであ
り、例４１および例４２はＷＯ９９／０６３３３に開示
されているガラスである。The glasses of Examples 1 to 39 are Examples, and Examples 40 to 4
Glass No. 2 is a comparative example. Example 40 is a conventional glass, and Examples 41 and 42 are the glasses disclosed in WO 99/06333.
【００４４】[0044]
【表１】 [Table 1]
【００４５】[0045]
【表２】 [Table 2]
【００４６】[0046]
【表３】 [Table 3]
【００４７】[0047]
【表４】 [Table 4]
【００４８】[0048]
【表５】 [Table 5]
【００４９】[0049]
【発明の効果】本発明によれば、以下のような特長を有
する情報記録媒体用ガラス基板を提供できる。 （１）ヤング率が高く、基板のたわみや反りが小さく、
基板を薄板化できる。これにより、記憶装置の磁気ディ
スク搭載枚数を増加できる。 （２）化学強化処理がなくとも耐候性に優れ、在庫中に
付着物（白ヤケ）が発生しにくい。したがってこの付着
物に起因する、下地膜、磁性膜、保護膜等の膜はがれが
起こりにくい。According to the present invention, a glass substrate for an information recording medium having the following features can be provided. (1) High Young's modulus, small deflection and warpage of the substrate,
The substrate can be thinned. Thus, the number of magnetic disks mounted on the storage device can be increased. (2) Even without chemical strengthening treatment, it has excellent weather resistance, and hardly causes deposits (white burns) in stock. Therefore, films such as the base film, the magnetic film, and the protective film due to the deposits are less likely to peel.
【００５０】（３）ガラス転移点が高く、磁性層形成熱
処理温度を高くできる。これにより、磁性層の保磁力を
増加でき記憶密度を増加できる。 （４）ＡＺＳ系電鋳煉瓦に対する侵食性が小さく、ガラ
ス溶融窯を用いた大量生産ができる。 （５）フロート法、フュージョン法、ダウンドロー法等
の連続成形法による成形ができ、高品質のガラス基板を
大量生産できる。(3) The glass transition point is high, and the heat treatment temperature for forming the magnetic layer can be increased. Thereby, the coercive force of the magnetic layer can be increased and the storage density can be increased. (4) The erosion of the AZS-based electroformed brick is small, and mass production using a glass melting furnace can be performed. (5) It can be formed by a continuous forming method such as a float method, a fusion method, or a down draw method, so that a high-quality glass substrate can be mass-produced.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 4G062 AA18 BB01 CC10 DA06 DA07 DB03 DC01 DD01 DE01 DE02 DE03 DF01 EA03 EA04 EB01 EB02 EB03 EC01 EC02 EC03 ED03 EE03 EF01 EF02 EF03 EF04 EG01 FA01 FA10 FB01 FB02 FB03 FC01 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FJ02 FJ03 FK01 FK02 FK03 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN29 NN33 5D006 CB04 CB07 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4G062 AA18 BB01 CC10 DA06 DA07 DB03 DC01 DD01 DE01 DE02 DE03 DF01 EA03 EA04 EB01 EB02 EB03 EC01 EC02 EC03 ED03 EE03 EF01 EF02 EF03 EF04 EG01 FA01 FA03 FB01 FB02 FC03 FF01 FG01 FH01 FJ01 FJ02 FJ03 FK01 FK02 FK03 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK03 KK05
Claims (6)
体基板用ガラス。1. A substantially by mol%, SiO 2 60~72, Al 2 O 3 2~9, MgO 3~9, CaO 2~10, SrO 0~15, ZnO 0~4, TiO 2 0 ~8, ZrO 2 0~4, Li 2 O 1~12, Na 2 O 0~8, K 2 O 0~5, Y 2 O 3 0~5, La 2 O 3 0~5, Li 2 O + Na 2 O + K 2 O 4 to 15, wherein the Young's modulus is 85 GPa or more.
モル％以上である請求項１に記載の情報記録媒体基板用
ガラス。 2. The total content of SiO 2 and Al 2 O 3 is 66.
The glass for an information recording medium substrate according to claim 1, which is at least mol%.
１または２に記載の情報記録媒体基板用ガラス。3. The glass for an information recording medium substrate according to claim 1, wherein the glass transition point is 550 ° C. or higher.
Ｐとなる温度をＴ4（単位：℃）として、ＴL−Ｔ4＜５
０である請求項１、２または３に記載の情報記録媒体基
板用ガラス。4. A liquid phase temperature of TL (unit: ° C.) and a viscosity of 10 4
Let T 4 (unit: ° C.) be the temperature that becomes P, and T L −T 4 <5
4. The glass for an information recording medium substrate according to claim 1, wherein the value is 0. 5.
録媒体基板用ガラスからなる情報記録媒体用ガラス基
板。5. A glass substrate for an information recording medium, comprising the glass for an information recording medium substrate according to claim 1, 2, 3 or 4.
板であって、１２０℃、２気圧の水蒸気雰囲気に２０時
間保持した該ガラス基板表面に存在する、大きさが１０
μｍ以上の付着物の数が１個／ｃｍ2以下であり、大き
さが１μｍ以上１０μｍ未満の付着物の数が１０5個／
ｃｍ2以下である情報記録媒体用ガラス基板。6. A glass substrate for an information recording medium according to claim 5, wherein said glass substrate is kept at 120 ° C. and 2 atm in a water vapor atmosphere for 20 hours.
μm or more deposition the number is one / cm 2 or less, adhesion The number of less than 10μm size is 1μm or 10 5 /
A glass substrate for an information recording medium having a size of not more than cm 2 .
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| JP2000080690A JP4161509B2 (en) | 1999-04-13 | 2000-03-22 | Glass for information recording medium substrate and glass substrate for information recording medium |
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|---|---|---|---|
| JP10565399 | 1999-04-13 | ||
| JP11-105653 | 1999-04-13 | ||
| JP2000080690A JP4161509B2 (en) | 1999-04-13 | 2000-03-22 | Glass for information recording medium substrate and glass substrate for information recording medium |
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| JP4161509B2 JP4161509B2 (en) | 2008-10-08 |
Family
ID=26445902
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|---|---|---|---|
| JP2000080690A Expired - Fee Related JP4161509B2 (en) | 1999-04-13 | 2000-03-22 | Glass for information recording medium substrate and glass substrate for information recording medium |
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| JPH11302033A (en) * | 1998-04-17 | 1999-11-02 | Nippon Sheet Glass Co Ltd | Glass composition and its production |
| JP2000203872A (en) * | 1998-09-11 | 2000-07-25 | Nippon Sheet Glass Co Ltd | Glass composition, substrate for information recording medium by using the same, and information recording medium |
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