JP2000347394A5 - Method for manufacturing photosensitive paste and display members - Google Patents

Method for manufacturing photosensitive paste and display members Download PDF

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Publication number
JP2000347394A5
JP2000347394A5 JP1999159229A JP15922999A JP2000347394A5 JP 2000347394 A5 JP2000347394 A5 JP 2000347394A5 JP 1999159229 A JP1999159229 A JP 1999159229A JP 15922999 A JP15922999 A JP 15922999A JP 2000347394 A5 JP2000347394 A5 JP 2000347394A5
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JP
Japan
Prior art keywords
photosensitive paste
display members
manufacturing photosensitive
photosensitive
manufacturing
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JP1999159229A
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Japanese (ja)
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JP2000347394A (en
JP4352509B2 (en
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Priority to JP15922999A priority Critical patent/JP4352509B2/en
Priority claimed from JP15922999A external-priority patent/JP4352509B2/en
Publication of JP2000347394A publication Critical patent/JP2000347394A/en
Publication of JP2000347394A5 publication Critical patent/JP2000347394A5/en
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Publication of JP4352509B2 publication Critical patent/JP4352509B2/en
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【特許請求の範囲】
【請求項1】 ガラス転移点が400〜550℃である低融点ガラスおよび感光性有機成分を含む感光性ペーストであって、厚さ50μmの塗布膜の全光線透過率が60%以上、焼成後にXYZ表色系におけるY値が15以下であることを特徴とする感光性ペースト。
【請求項2】 ガラス転移点が400〜550℃である低融点ガラス、感光性有機成分ならびにRu、Mn、Ni、Cr、Fe、CoおよびCuからなる群から選ばれる少なくとも一種の金属のアルコキシド誘導体類、β−ジケトン類の錯体、β−ケト酸エステル類の錯体または有機カルボン酸誘導体類を含むことを特徴とする感光性ペースト。
【請求項3】 基板上に請求項1または2に記載の感光性ペーストを塗布、乾燥して得た感光性ペースト膜を露光、現像、焼成することによって隔壁を形成する工程を含むディスプレイ用部材の製造方法。
[Claims]
1. A photosensitive paste containing a low melting point glass having a glass transition point of 400 to 550 ° C. and a photosensitive organic component, wherein the coating film having a thickness of 50 μm has a total light transmittance of 60% or more after firing. A photosensitive paste characterized in that the Y value in the XYZ color system is 15 or less.
2. An alkoxide derivative of at least one metal selected from the group consisting of low melting point glass having a glass transition point of 400 to 550 ° C., a photosensitive organic component, and Ru, Mn, Ni, Cr, Fe, Co, and Cu. A photosensitive paste comprising a complex of β-diketones, a complex of β-keto acid esters, or an organic carboxylic acid derivative.
3. A display member including a step of forming a partition wall by applying, developing, and firing a photosensitive paste film obtained by applying the photosensitive paste according to claim 1 or 2 on a substrate and drying the film. Manufacturing method.

【0012】
【課題を解決するための手段】
すなわち本発明は、ガラス転移点が400〜550℃である低融点ガラスおよび感光性有機成分を含む感光性ペーストであって、厚さ50μmの塗布膜の全光線透過率が60%以上、焼成後にXYZ表色系におけるY値が15以下であることを特徴とする感光性ペーストである。また、ガラス転移点が400〜550℃である低融点ガラス、感光性有機成分ならびにRu、Mn、Ni、Cr、Fe、CoおよびCuからなる群から選ばれる少なくとも一種の金属のアルコキシド誘導体類、β−ジケトン類の錯体、β−ケト酸エステル類の錯体または有機カルボン酸誘導体類を含むことを特徴とする感光性ペーストである。
0012
[Means for solving problems]
That is, the present invention is a photosensitive paste containing low melting point glass having a glass transition point of 400 to 550 ° C. and a photosensitive organic component, and the total light transmittance of a coating film having a thickness of 50 μm is 60% or more after firing. It is a photosensitive paste characterized by having a Y value of 15 or less in the XYZ color system. Further, a low melting point glass having a glass transition point of 400 to 550 ° C., a photosensitive organic component, and at least one metal alkoxide derivative selected from the group consisting of Ru, Mn, Ni, Cr, Fe, Co and Cu, β A photosensitive paste comprising a complex of -diketones, a complex of β-keto acid esters, or organic carboxylic acid derivatives.

さらに、本発明は、基板上に上記の感光性ペーストを塗布、乾燥して得た感光性ペースト膜を露光、現像、焼成することによって隔壁を形成する工程を含むディスプレイ用部材の製造方法である。 Further, the present invention is a method for manufacturing a display member, which comprises a step of forming a partition wall by applying the above-mentioned photosensitive paste on a substrate, drying the photosensitive paste film, and exposing, developing, and firing the photosensitive paste film. ..

JP15922999A 1999-06-07 1999-06-07 Photosensitive paste and display member manufacturing method Expired - Fee Related JP4352509B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15922999A JP4352509B2 (en) 1999-06-07 1999-06-07 Photosensitive paste and display member manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15922999A JP4352509B2 (en) 1999-06-07 1999-06-07 Photosensitive paste and display member manufacturing method

Publications (3)

Publication Number Publication Date
JP2000347394A JP2000347394A (en) 2000-12-15
JP2000347394A5 true JP2000347394A5 (en) 2006-07-13
JP4352509B2 JP4352509B2 (en) 2009-10-28

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ID=15689171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15922999A Expired - Fee Related JP4352509B2 (en) 1999-06-07 1999-06-07 Photosensitive paste and display member manufacturing method

Country Status (1)

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JP (1) JP4352509B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3460657B2 (en) * 2000-01-31 2003-10-27 株式会社村田製作所 Photosensitive glass paste for multilayer wiring circuit board and method for manufacturing multilayer wiring circuit board
JP4694157B2 (en) * 2004-06-28 2011-06-08 富士フイルム株式会社 Substrate with light-shielding image, method for producing light-shielding image, transfer material, color filter, and display device
JP4197177B2 (en) * 2005-03-18 2008-12-17 東京応化工業株式会社 Photo-curable resin composition for forming black matrix, photosensitive film using the same, method for forming black matrix, black matrix and plasma display panel having the black matrix
KR100645707B1 (en) 2006-01-27 2006-11-15 삼성에스디아이 주식회사 Organic light-emitting display device and method for fabricating the same
KR102624898B1 (en) 2018-07-05 2024-01-16 도레이 카부시키가이샤 Resin composition, light-blocking film, method for producing light-blocking film, and substrate having partitioning wall attached thereto
KR20220161259A (en) 2020-03-30 2022-12-06 도레이 카부시키가이샤 Resin composition, light shielding film, and substrate on which barrier ribs are formed
JPWO2023048016A1 (en) 2021-09-24 2023-03-30

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