JP2000319433A - Apparatus for surface treatment using fluorine gas - Google Patents

Apparatus for surface treatment using fluorine gas

Info

Publication number
JP2000319433A
JP2000319433A JP11126852A JP12685299A JP2000319433A JP 2000319433 A JP2000319433 A JP 2000319433A JP 11126852 A JP11126852 A JP 11126852A JP 12685299 A JP12685299 A JP 12685299A JP 2000319433 A JP2000319433 A JP 2000319433A
Authority
JP
Japan
Prior art keywords
gas
surface treatment
tank
fluorine
treatment apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11126852A
Other languages
Japanese (ja)
Inventor
Kenji Watanabe
賢治 渡辺
Kazuo Niwa
一夫 丹羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP11126852A priority Critical patent/JP2000319433A/en
Publication of JP2000319433A publication Critical patent/JP2000319433A/en
Pending legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a simple apparatus for the surface treatment of a plastic product and the like with fluorine gas. SOLUTION: This apparatus is mainly composed of a gas-preparing tank 6 equipped with at least a fluorine gas-supplying pipe and a nitrogen gas- supplying pipe connected with respective gas resources, a treating tank 11 connected to the gas-preparing tank by a gas conduit and equipped with an opening capable of being tightly closed, and an exhaust gas-treating apparatus equipped with an active alumina bed for adsorbing at least fluorine gas.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、フッ素ガスを用い
て種々の物質の表面改質を行なう装置に関するものであ
る。詳しくは本発明は、希薄なフッ素ガスを用いて、プ
ラスチック等の表面を手軽に改質するのに好適な表面処
理装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for performing surface modification of various substances using fluorine gas. More specifically, the present invention relates to a surface treatment apparatus suitable for easily modifying the surface of plastic or the like using a dilute fluorine gas.

【0002】[0002]

【従来の技術】フッ素ガスは極めて活性が強く、有機物
をフッ素ガスで処理するとその表面を改質できることが
知られている。例えば無極性のポリオレフインをフッ素
ガスで処理すると、塗料や接着剤の付着性を高めたり、
親水性を高めたりすることができる。フッ素ガスは極め
て活性が強いので、その取扱いには細心の注意を要す
る。従ってフッ素ガスを用いて表面処理を行なう装置も
特別のものが開発されている。例えば、特開平10−1
82861号公報には、所定濃度のフッ素ガスを含む混
合ガスを調製するガス調製槽と、ここで調製した混合ガ
スにより表面処理を行なう処理槽とを備えた表面処理装
置が記載されている。この装置では、表面処理が終了す
ると処理槽のガスをガス調製槽に逆流させることによ
り、排ガスとして処理されるフッ素ガス量を減少させて
いる。
2. Description of the Related Art It is known that fluorine gas is extremely active, and that the surface of an organic substance can be modified by treating it with fluorine gas. For example, treating non-polar polyolefin with fluorine gas increases the adhesion of paints and adhesives,
Hydrophilicity can be enhanced. Fluorine gas is extremely active and requires careful handling. Therefore, a special apparatus for performing a surface treatment using fluorine gas has been developed. For example, JP-A-10-1
Japanese Patent No. 82861 describes a surface treatment apparatus provided with a gas preparation tank for preparing a mixed gas containing a predetermined concentration of fluorine gas and a processing tank for performing a surface treatment with the mixed gas prepared here. In this apparatus, when the surface treatment is completed, the gas in the treatment tank is caused to flow back to the gas preparation tank, thereby reducing the amount of fluorine gas treated as exhaust gas.

【0003】[0003]

【発明が解決しようとする課題】上記の装置は大規模な
表面処理装置には好適であるが、機構が複雑なので小規
模な表面処理装置には適していない。また、希薄なフッ
素ガスを用いて表面処理を行なう場合にも、処理槽のガ
スをガス調製槽に逆流させて排ガスとして処理されるフ
ッ素ガス量を減少させることは、装置を複雑にするに見
合うだけの利点は見出せない。従って本発明は、小規模
な表面処理や希薄なフッ素ガスを用いて行なう表面処理
に好適な表面処理装置を提供しようとするものである。
The above-described apparatus is suitable for a large-scale surface treatment apparatus, but is not suitable for a small-scale surface treatment apparatus because of its complicated mechanism. Further, even when performing surface treatment using a diluted fluorine gas, reducing the amount of fluorine gas to be treated as exhaust gas by flowing the gas in the treatment tank back to the gas preparation tank is commensurate with complicating the apparatus. The only advantage cannot be found. Accordingly, an object of the present invention is to provide a surface treatment apparatus suitable for a small-scale surface treatment or a surface treatment performed using a diluted fluorine gas.

【0004】[0004]

【課題を解決するための手段】本発明に係る表面処理装
置は、それぞれのガス源と連絡している少なくともフッ
素ガス供給管及び窒素ガス供給管を備えたガス調製槽、
ガス調製槽とガス導管で連絡されており、かつ密閉し得
る開口部を備えた処理槽、並びに少なくともフッ素ガス
を吸着するための活性アルミナ床を備えた排ガス処理装
置から主として成っている。
According to the present invention, there is provided a surface treatment apparatus comprising: a gas preparation tank having at least a fluorine gas supply pipe and a nitrogen gas supply pipe communicating with respective gas sources;
It mainly consists of a treatment tank which is connected to the gas preparation tank by a gas conduit and has an opening capable of being sealed, and an exhaust gas treatment device having at least an activated alumina bed for adsorbing fluorine gas.

【0005】[0005]

【発明の実施の形態】本発明に係る表面処理装置は、ガ
ス調製槽、処理槽及び排ガス処理装置から主として構成
されている。ガス調製槽は、フッ素ガス源からフッ素ガ
スを受入れるためのフッ素ガス導管及び不活性ガス源か
ら希釈用の不活性ガスを受入れるための不活性ガス導管
を有している。不活性ガスとしては通常は窒素ガスを用
いるので、本明細書では窒素ガスで不活性ガスを代表す
る。更にガス調製槽には、通常はフッ素ガスと混合して
表面処理に用いる他の反応性ガスをそのガス源から受入
れるためのガス導管も備えられている。このようなガス
としては、酸素、塩素、二酸化硫黄、臭素及び或る種の
有機単量体などが用いられるが、最も一般的なのは酸素
である。ガス源としては通常はボンベに充填したガスが
用いられる。これによりボンベ出口のガス圧力と流量を
設定するだけで、ガス調製槽にそれぞれのガスを所望の
組成比となるように供給することができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A surface treatment apparatus according to the present invention mainly comprises a gas preparation tank, a treatment tank and an exhaust gas treatment apparatus. The gas preparation tank has a fluorine gas conduit for receiving fluorine gas from a fluorine gas source and an inert gas conduit for receiving an inert gas for dilution from an inert gas source. Since nitrogen gas is generally used as the inert gas, the nitrogen gas represents the inert gas in this specification. Further, the gas preparation tank is also provided with a gas conduit for receiving another reactive gas used for surface treatment, usually mixed with fluorine gas, from the gas source. Such gases include oxygen, chlorine, sulfur dioxide, bromine, and certain organic monomers, the most common being oxygen. As a gas source, a gas filled in a cylinder is usually used. Thus, by simply setting the gas pressure and the flow rate at the cylinder outlet, each gas can be supplied to the gas preparation tank so as to have a desired composition ratio.

【0006】処理槽は被処理物を収容し、かつガス調製
槽からガスを受入れて被処理物の表面処理を行なう容器
であり、被処理物を出し入れするための密閉しうる開口
部と、ガス調製槽からガスを受入れるためのガス導管を
有している。処理槽には異常反応が起きた場合にこれを
検知するための温度計と圧力計とを取付けておくのが好
ましい。
The processing tank is a container for storing the object to be processed and receiving the gas from the gas preparation tank to perform a surface treatment of the object to be processed. It has a gas conduit for receiving gas from the preparation tank. It is preferable to attach a thermometer and a pressure gauge to the treatment tank for detecting an abnormal reaction when it occurs.

【0007】排ガス処理装置は系内のガスを無害化して
系外に排出するためのものであり、フッ素ガスを吸着除
去するための活性アルミナ床と、他の除去すべきガスに
応じた適宜の無害化手段を有していて、ガスがこれらを
順次通過して外部に排出されるようになっている。この
ような無害化手段として最も一般的なのは、フッ素処理
により生成したフッ化水素を吸着除去するためのフッ化
ナトリウム床である。排ガス処理装置としては、このよ
うに吸着剤を用いた乾式装置を用いるのが、装置が簡単
でありかつ保持も容易なので好ましい。
The exhaust gas treatment apparatus is for detoxifying the gas in the system and discharging the gas to the outside of the system. An activated alumina bed for adsorbing and removing fluorine gas and an appropriate gas corresponding to other gas to be removed are provided. It has detoxifying means so that the gas passes through them sequentially and is discharged to the outside. The most common detoxifying means is a sodium fluoride bed for adsorbing and removing hydrogen fluoride generated by the fluorine treatment. As the exhaust gas treatment device, it is preferable to use a dry device using an adsorbent as described above because the device is simple and the holding is easy.

【0008】本発明の好ましい一態様では、排ガス処理
装置は真空ポンプに接続されていて、系内のガスを吸引
により排ガス処理装置を経て系外に排出するようになっ
ている。また他の好ましい一態様では、装置の主要部で
あるガス調製槽、処理槽及び排ガス処理装置は、排気装
置を備えた気密な遮蔽体内に設置されており、万一ガス
が漏洩しても環境を汚染しないようになっている。
[0008] In one preferred embodiment of the present invention, the exhaust gas treatment device is connected to a vacuum pump, and discharges gas in the system through the exhaust gas treatment device to the outside of the system by suction. In another preferred embodiment, the gas preparation tank, the treatment tank, and the exhaust gas treatment device, which are the main parts of the device, are installed in an airtight shield provided with an exhaust device, so that even if gas leaks, the environment is not affected. Not to be contaminated.

【0009】図1に示す本発明に係る表面処理装置を用
いてプラスチックの表面処理を行なう1例を説明する
と、処理槽1にポリエチレン、ナイロンその他の表面処
理に供するプラスチック製品を収容して蓋を密閉する。
次いで真空ポンプ2を作動させて系内を真空にする。フ
ッ素ガスボンベ3、酸素ガスボンベ4及び窒素ガスボン
ベ5のバルブを開いて、各ガスを所定の比率となるよう
にガス調製槽6に流入させる。ガス調製槽に所定の組成
の混合ガスが形成されたならば、混合ガス導管7のバル
ブを開いて混合ガスを処理槽1に流入させる。所定の処
理時間が経過したならば真空ポンプ2を再び作動させ、
かつ排ガス導管8のバルブを開いて処理槽内のガスを活
性アルミナ充填塔9及びフッ化ナトリウム充填塔10を
経て系外に排出する。次いで真空ポンプを停止させ、窒
素ガスボンベのバルブを開いて窒素ガスを処理槽に流入
させ、処理槽以降を窒素ガスで置換する。系内が窒素ガ
スで十分に置換されたならば処理槽1の蓋を開けて処理
を終えたプラスチック製品を取出す。なお、各バルブの
開閉や真空ポンプの作動−停止は、所定のプログラムに
従って自動的に行なわれるように、構成しておくのが好
ましい。
An example of performing a surface treatment of plastic using the surface treatment apparatus according to the present invention shown in FIG. 1 will be described. A treatment tank 1 contains polyethylene, nylon or other plastic products to be subjected to surface treatment, and covers the lid. Seal tightly.
Next, the vacuum pump 2 is operated to evacuate the system. The valves of the fluorine gas cylinder 3, the oxygen gas cylinder 4, and the nitrogen gas cylinder 5 are opened, and each gas flows into the gas preparation tank 6 at a predetermined ratio. When a mixed gas having a predetermined composition is formed in the gas preparation tank, the valve of the mixed gas conduit 7 is opened to allow the mixed gas to flow into the processing tank 1. When a predetermined processing time has elapsed, the vacuum pump 2 is operated again,
The valve in the exhaust gas conduit 8 is opened, and the gas in the processing tank is discharged out of the system through the activated alumina packed tower 9 and the sodium fluoride packed tower 10. Next, the vacuum pump is stopped, the valve of the nitrogen gas cylinder is opened, and nitrogen gas flows into the processing tank, and the gas after the processing tank is replaced with nitrogen gas. When the inside of the system has been sufficiently replaced with nitrogen gas, the lid of the processing tank 1 is opened and the processed plastic product is taken out. It is preferable that the opening and closing of each valve and the operation / stop of the vacuum pump are automatically performed according to a predetermined program.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図は本発明に係る表面処理装置の1例である。FIG. 1 is an example of a surface treatment apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

1 処理槽 2 真空ポンプ 3 フッ素ガスボンベ 4 酸素ガスボンベ 5 窒素ガスボンベ 6 ガス調製槽 7 混合ガス導管 8 排ガス導管 9 活性アルミナ充填塔 10 フッ化ナトリウム充填塔 DESCRIPTION OF SYMBOLS 1 Processing tank 2 Vacuum pump 3 Fluorine gas cylinder 4 Oxygen gas cylinder 5 Nitrogen gas cylinder 6 Gas preparation tank 7 Mixed gas conduit 8 Exhaust gas conduit 9 Activated alumina filling tower 10 Sodium fluoride filling tower

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4D002 AA22 AA23 BA04 CA07 DA17 DA46 GA02 GB03 GB04 4F073 AA01 BA07 BA29 DA01 DA04 DA09 DA11 GA11  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4D002 AA22 AA23 BA04 CA07 DA17 DA46 GA02 GB03 GB04 4F073 AA01 BA07 BA29 DA01 DA04 DA09 DA11 GA11

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 それぞれのガス源と連絡している少なく
ともフッ素ガス供給管及び窒素ガス供給管を備えたガス
調製槽、ガス調製槽とガス導管で連絡されており、かつ
密閉し得る開口部を備えた処理槽、並びに少なくともフ
ッ素ガスを吸着するための活性アルミナ床を備えた排ガ
ス処理装置から主として成ることを特徴とするフッ素ガ
スを用いる表面処理装置。
1. A gas preparation tank having at least a fluorine gas supply pipe and a nitrogen gas supply pipe communicating with respective gas sources, an opening which is connected to the gas preparation tank by a gas conduit and which can be sealed. A surface treatment apparatus using fluorine gas, which mainly comprises a treatment tank provided and an exhaust gas treatment apparatus having at least an activated alumina bed for adsorbing fluorine gas.
【請求項2】 ガス調製槽が、酸素ガス源と連絡してい
る酸素ガス導管を備えていることを特徴とする請求項1
記載の表面処理装置。
2. The gas preparation tank according to claim 1, wherein the gas preparation tank includes an oxygen gas conduit communicating with the oxygen gas source.
The surface treatment apparatus as described in the above.
【請求項3】 それぞれのガス源がガスボンベであるこ
とを特徴とする請求項1又は2記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein each gas source is a gas cylinder.
【請求項4】 排ガス処理装置が活性アルミナ床とフッ
化水素を吸着するためのフッ化ナトリウム床とを備えて
いる乾式排ガス処理装置であることを特徴とする請求項
1ないし3のいずれかに記載の表面処理装置。
4. The exhaust gas treatment device according to claim 1, wherein the exhaust gas treatment device is a dry exhaust gas treatment device having an activated alumina bed and a sodium fluoride bed for adsorbing hydrogen fluoride. The surface treatment apparatus as described in the above.
【請求項5】 排ガス処理装置が系内を排気するための
真空ポンプと連絡していることを特徴とする請求項1な
いし4のいずれかに記載の表面処理装置。
5. The surface treatment apparatus according to claim 1, wherein the exhaust gas treatment apparatus is in communication with a vacuum pump for exhausting the system.
【請求項6】 少なくともガス調製槽、処理槽及び排ガ
ス処理装置が、排気装置を備えた気密な遮蔽体内に設置
されていることを特徴とする請求項1ないし5のいずれ
かに記載の表面処理装置。
6. The surface treatment according to claim 1, wherein at least the gas preparation tank, the treatment tank, and the exhaust gas treatment device are installed in an airtight shield provided with an exhaust device. apparatus.
JP11126852A 1999-05-07 1999-05-07 Apparatus for surface treatment using fluorine gas Pending JP2000319433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11126852A JP2000319433A (en) 1999-05-07 1999-05-07 Apparatus for surface treatment using fluorine gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11126852A JP2000319433A (en) 1999-05-07 1999-05-07 Apparatus for surface treatment using fluorine gas

Publications (1)

Publication Number Publication Date
JP2000319433A true JP2000319433A (en) 2000-11-21

Family

ID=14945457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11126852A Pending JP2000319433A (en) 1999-05-07 1999-05-07 Apparatus for surface treatment using fluorine gas

Country Status (1)

Country Link
JP (1) JP2000319433A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005095268A1 (en) 2004-03-31 2005-10-13 Kanto Denka Kogyo Co., Ltd. Method for producing f2-containing gas, apparatus for producing f2-containing gas, method for modifying article surface, and apparatus for modifying article surface
JP2009039605A (en) * 2007-08-07 2009-02-26 Central Glass Co Ltd Removing method of clo3f
WO2009110611A1 (en) * 2008-03-06 2009-09-11 東洋炭素株式会社 Surface treatment apparatus
JP2009213946A (en) * 2008-03-06 2009-09-24 Toyo Tanso Kk Surface treatment apparatus
JP2009213947A (en) * 2008-03-06 2009-09-24 Toyo Tanso Kk Surface treatment apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005095268A1 (en) 2004-03-31 2005-10-13 Kanto Denka Kogyo Co., Ltd. Method for producing f2-containing gas, apparatus for producing f2-containing gas, method for modifying article surface, and apparatus for modifying article surface
US7919141B2 (en) 2004-03-31 2011-04-05 Kanto Denka Kogyo Co., Ltd. Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articles
JP2009039605A (en) * 2007-08-07 2009-02-26 Central Glass Co Ltd Removing method of clo3f
WO2009110611A1 (en) * 2008-03-06 2009-09-11 東洋炭素株式会社 Surface treatment apparatus
JP2009213946A (en) * 2008-03-06 2009-09-24 Toyo Tanso Kk Surface treatment apparatus
JP2009213947A (en) * 2008-03-06 2009-09-24 Toyo Tanso Kk Surface treatment apparatus

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