CN215085955U - Processing device and processing system for halogen gas - Google Patents

Abstract

The utility model relates to a processing apparatus and processing system for halogen gas, processing apparatus includes: a recovery unit for providing a sweep gas; the confluence unit is communicated with the recovery unit and is used for mixing residual gas; the first vacuum unit is communicated with the confluence unit and is used for providing negative pressure for the confluence unit; and the harmful removing unit is communicated with the first vacuum unit and is used for carrying out harmful removing treatment on the residual gas. The device has the advantages that harmful substances in the halogen gas are treated by the harmful removal unit, so that various harmful gases in the halogen gas can be removed; can make different harmful routes of taking off according to the harmful gas of difference, easy operation is convenient.

Description

Processing device and processing system for halogen gas

Technical Field

The utility model relates to a gas treatment technical field especially relates to a processing apparatus and processing system for halogen gas.

Background

After the container for storing the halogen gas is used, harmful gas is generated inside the container, and the harmful gas needs to be treated before the halogen gas is discharged to allow the container to enter the next cycle.

In the related art, the processing manner includes:

a. water scrubbing (to treat corrosive gases);

b. oxidation (to treat combustion toxic gases);

c. adsorption (dry type) (treatment of the corresponding exhaust gas with an adsorbent);

d. plasma combustion (each type of exhaust gas can be treated).

For the water washing mode, the equipment is low in price and simple to operate, but only water-soluble gas can be treated, so that the application range is narrow;

for the oxidation type, the equipment is simple to operate, but only can treat combustible toxic gas, so that the application range is narrow;

the adsorption type (dry type) is not suitable for a gas which is easily clogged, although the treatment efficiency is high;

the plasma combustion type is widely used, but has high operation cost, a complicated structure and difficulty in post-maintenance.

Since the halogen gas contains a large amount of harmful gases, it cannot be treated by a single treatment method, resulting in a large number of equipments, high operation cost and a complicated structure.

At present, no effective solution is provided for the problems of difficult treatment of harmful gases, high cost, complex equipment and the like in the related technology.

SUMMERY OF THE UTILITY MODEL

The utility model aims at the not enough among the prior art, provide a processing apparatus and processing system for halogen gas to solve the harmful gas that exists among the correlation technique and be difficult to handle, with high costs, equipment complicacy scheduling problem.

In order to achieve the purpose, the utility model adopts the technical proposal that:

in a first aspect, there is provided a processing apparatus for halogen gas, comprising:

a recovery unit for providing a sweep gas;

the confluence unit is communicated with the recovery unit and is used for mixing residual gas;

a first vacuum unit in communication with the confluence unit for providing a negative pressure to the confluence unit;

and the harmful removing unit is communicated with the first vacuum unit and is used for carrying out harmful removing treatment on the residual gas.

In some of these embodiments, the recovery unit comprises:

a recovery pipeline in communication with the confluence unit;

a first flow rate detecting element provided to the recovery line;

at least one recovery valve disposed in the recovery pipeline upstream of the first flow sensing element;

at least one suction line in communication with the corresponding recovery valve;

at least one first weight detection element is arranged below the corresponding air suction pipeline.

In some of these embodiments, the bus unit includes:

a bus member communicating with the recovery unit;

a pressure detecting member provided to the bus member;

a first confluence valve disposed upstream of the confluence member and communicating with the recovery unit.

In some of these embodiments, the pest control unit comprises:

a first damage removal container in communication with the first vacuum unit;

a second damage removal container, wherein the second damage removal container is communicated with the first damage removal container and the first vacuum unit;

a third harmful substance removing container communicated with the first harmful substance removing container, the second harmful substance removing container and the first vacuum unit

In some of these embodiments, the first vacuum unit comprises:

a first vacuum member in communication with the confluence unit for providing a negative pressure;

a vacuum valve disposed upstream of the first vacuum member and in communication with the confluence unit.

In a second aspect, there is provided a processing system for halogen gases, comprising:

a nitrogen feedstock unit for providing a nitrogen feedstock;

a bromine feedstock unit for providing a bromine feedstock;

a krypton feedstock unit for providing a krypton feedstock;

the confluence unit is respectively communicated with the nitrogen raw material unit, the bromine raw material unit and the krypton raw material unit and is used for mixing to form halogen gas;

a distribution unit communicating with the confluence unit for distributing halogen gas;

the recovery unit is communicated with the confluence unit and is used for providing residual gas;

a first vacuum unit in communication with the confluence unit for providing a negative pressure to the confluence unit;

and the harmful removing unit is communicated with the first vacuum unit and is used for carrying out harmful removing treatment on the residual gas.

In some of these embodiments, the allocation unit comprises:

a distribution line in communication with the confluence unit;

a second flow rate detecting element provided to the distribution line;

at least one distribution valve disposed in the distribution line downstream of the flow sensing element;

at least one filling line, which is connected to the corresponding distributor valve;

and the second weight detection element is arranged below the corresponding filling pipeline.

In some of these embodiments, further comprising:

and the second vacuum unit is respectively communicated with the krypton raw material unit and the confluence unit and is used for providing negative pressure.

In some of these embodiments, the second vacuum unit comprises:

a second vacuum element in communication with the krypton source unit and the confluence unit, respectively;

a second vacuum valve disposed upstream of the second vacuum element and in communication with the krypton feedstock unit;

a third vacuum valve disposed downstream of the second vacuum member and in communication with the confluence unit.

In some of these embodiments, the bus unit includes:

a bus member communicating with the recovery unit;

a pressure detecting member provided to the bus member;

a first confluence valve disposed upstream of the confluence member and communicating with the recovery unit;

a second confluence valve disposed upstream of the confluence element and in communication with the nitrogen feedstock unit, the bromine feedstock unit, and the krypton feedstock unit, respectively;

a third confluence valve disposed downstream of the confluence element and in communication with the distribution unit.

The utility model adopts the above technical scheme, compare with prior art, have following technological effect:

the utility model discloses a processing apparatus and processing system for halogen gas, utilize and take off the harmful unit, handle the harmful substance in the halogen gas, can get rid of the multiple harmful gas in the halogen gas; can make different harmful routes of taking off according to the harmful gas of difference, easy operation is convenient.

Drawings

Fig. 1 is a schematic view of a processing device according to an embodiment of the invention;

fig. 2 is a schematic view of a recovery unit according to an embodiment of the invention;

fig. 3 is a schematic view (one) of a confluence unit according to an embodiment of the present invention;

fig. 4 is a schematic view of a first vacuum unit according to an embodiment of the present invention;

fig. 5 is a schematic view of a pest control unit according to an embodiment of the present invention;

fig. 6 is a schematic diagram of a processing system according to an embodiment of the present invention;

figure 7 is a schematic diagram of a nitrogen feed unit according to an embodiment of the present invention;

figure 8 is a schematic diagram of a bromine feedstock unit according to an embodiment of the present invention;

FIG. 9 is a schematic diagram of a krypton feed unit in accordance with an embodiment of the present invention;

fig. 10 is a schematic view (two) of a confluence unit according to an embodiment of the present invention;

fig. 11 is a schematic view of a dispensing unit according to an embodiment of the invention;

fig. 12 is a schematic view of a second vacuum unit according to an embodiment of the present invention.

Wherein the reference numerals are: 100. a recovery unit; 101. a recovery pipeline; 102. a first flow rate detecting element; 103. a recovery valve; 104. an air intake pipeline; 105. a first weight detecting element;

200. a confluence unit; 201. a bus member; 202. a first confluence pipeline; 203. a first confluence valve; 204. a pressure detecting element; 205. a second confluence line; 206. a third conflux line; 207. a second confluence valve; 208. a third confluence valve;

300. a first vacuum unit; 301. a first vacuum element; 302. a first vacuum line; 303. a first vacuum valve;

400. a pest removal unit; 401. a first pest elimination container; 402. a second pest elimination container; 403. a third pest-removing container; 404. a first pest-free pipeline; 405. a second pest-free pipeline; 406. a third pest-free pipeline; 407. a fourth pest-free pipeline; 408. a fifth harmful pipeline; 409. a sixth harmful pipeline; 410. a seventh pest-free pipeline; 411. an eighth pest-free pipeline; 412. a discharge line; 413. a first pest elimination valve; 414. a second pest elimination valve; 415. a third pest elimination valve; 416. a fourth pest elimination valve; 417. a fifth pest elimination valve; 418. a sixth pest elimination valve; 419. a seventh pest elimination valve; 420. an eighth pest elimination valve;

500. a nitrogen feedstock unit; 501. a nitrogen feed vessel; 502. a nitrogen feed line; 503. a first control valve;

600. a bromine feedstock unit; 601. a bromine source container; 602. a bromine raw material pipeline; 603. a second control valve;

700. a krypton feedstock unit; 701. a krypton source container; 702. a krypton feed line; 703. a third control valve;

800. a distribution unit; 801. a distribution line; 802. a second flow rate detecting element; 803. a dispensing valve; 804. filling a pipeline; 805. a second weight detecting element;

900. a second vacuum unit; 901. a second vacuum element; 902. a second vacuum line; 903. a third vacuum line; 904. a second vacuum valve; 905. a third vacuum valve;

A. a residual gas steel cylinder; B. gas cylinders.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the protection scope of the present invention.

It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.

The present invention will be further described with reference to the accompanying drawings and specific embodiments, but the present invention is not limited thereto.

Example 1

The present embodiment relates to a processing apparatus for halogen gas.

As shown in fig. 1, a treatment apparatus for halogen gas includes a recovery unit 100, a confluence unit 200, a first vacuum unit 300, and a detoxifying unit 400, wherein the recovery unit 100 is in communication with the confluence unit 200 for supplying a sweep gas containing halogen gas to the confluence unit 200, the first vacuum unit 300 is in communication with the confluence unit 200 for supplying a negative pressure to the confluence unit 200 so that the sweep gas enters the confluence unit 200 from the recovery unit 100, and the detoxifying unit 400 is in communication with the first vacuum unit 300 for performing detoxifying treatment on the sweep gas and discharging the detoxified sweep gas.

As shown in fig. 2, the recycling unit 100 includes a recycling pipeline 101, a first flow rate detecting element 102, at least one recycling valve 103, at least one gas suction pipeline 104, and at least one first weight detecting element 105, wherein the recycling pipeline 101 is communicated with a first collecting pipeline 202, the first flow rate detecting element 102 is disposed downstream of the recycling pipeline 101 for detecting a gas flow rate of the recycling pipeline 101, the recycling valve 103 is disposed upstream of the first flow rate detecting element 102 in the recycling pipeline 101, the gas suction pipeline 104 is communicated with the corresponding recycling valve 103, and the first weight detecting element 105 is disposed below the corresponding gas suction pipeline 104.

In some of these embodiments, the first flow sensing element 102 is a flow meter.

In some of these embodiments, the recovery valve 103 is a shut-off valve.

In some of these embodiments, the first weight detecting element 105 is a scale.

As shown in fig. 3, the confluence unit 200 includes a confluence element 201, a first confluence pipe 202, a first confluence valve 203, and a pressure detection element 204, wherein the confluence element 201 is communicated with the recovery pipe 101 through the first confluence pipe 202, the first confluence valve 203 is disposed on the first confluence pipe 202 for controlling the opening and closing of the first confluence pipe 202, and the pressure detection element 204 is disposed on the confluence element 201.

In some of these embodiments, the bus member 201 is a bus bar.

In some of these embodiments, the first confluence valve 203 is a shutoff valve.

In some of these embodiments, the pressure sensing element 204 is a pressure gauge.

As shown in fig. 4, the first vacuum unit 300 includes a first vacuum component 301, a first vacuum pipeline 302 and a first vacuum valve 303, wherein the first vacuum component 301 is communicated with the first vacuum pipeline 302, the first vacuum pipeline 302 is communicated with the confluence component 201, and the first vacuum valve 303 is disposed on the first vacuum pipeline 302 for controlling the opening and closing of the first vacuum pipeline 302.

In some of these embodiments, the first vacuum component 301 is a vacuum pump.

In some of these embodiments, the first vacuum valve 303 is a shut-off valve.

As shown in fig. 5, the damage eliminating unit 400 includes a first damage eliminating container 401, a second damage eliminating container 402, a third damage eliminating container 403, a first damage eliminating pipeline 404, a second damage eliminating pipeline 405, a third damage eliminating pipeline 406, a discharge pipeline 412, a first damage eliminating valve 413, a second damage eliminating valve 414, a third damage eliminating valve 415, a fourth damage eliminating valve 416, a fifth damage eliminating valve 417, a sixth damage eliminating valve 418, a seventh damage eliminating valve 419 and an eighth damage eliminating valve 420, wherein the first damage eliminating container 401 is communicated with the first vacuum element 301 through the first damage eliminating pipeline 404, the first damage eliminating container 401 is communicated with the discharge pipeline 412 through the second damage eliminating pipeline 405, the first damage eliminating container 401 is communicated with the third damage eliminating container 403 through the third damage eliminating pipeline 401, the second damage eliminating container 402 is communicated with the first vacuum element 301 through the fourth damage eliminating pipeline 407, the second damage eliminating container 402 is communicated with the first damage eliminating container 401 through the fifth damage eliminating pipeline 408, the second damage eliminating container 402 is communicated with the discharge pipeline 412 through a sixth damage eliminating pipeline 409, the third damage eliminating container 403 is communicated with the first vacuum element 301 and the third damage eliminating pipeline 406 through a seventh damage eliminating pipeline 410, the third damage eliminating container 403 is communicated with the second damage eliminating container 402 through an eighth damage eliminating pipeline 411, a first damage eliminating valve 413 is arranged on the first damage eliminating pipeline 404 for controlling the opening and closing of the first damage eliminating pipeline 404, a second damage eliminating valve 414 is arranged on the second damage eliminating pipeline 405 for controlling the opening and closing of the second damage eliminating pipeline 405, a third damage eliminating valve 415 is arranged on the third damage eliminating pipeline 406 for controlling the opening and closing of the third damage eliminating pipeline 406, a fourth damage eliminating valve 416 is arranged on the fourth damage eliminating pipeline 407 for controlling the opening and closing of the fourth damage eliminating pipeline 407, a fifth damage eliminating valve 417 is arranged on the fifth damage eliminating pipeline 408 for controlling the opening and closing of the fifth damage eliminating pipeline 408, and a sixth damage eliminating valve 409 is arranged on the sixth damage eliminating pipeline 418 for controlling the opening and closing of the sixth damage eliminating pipeline 409, a seventh damage eliminating valve 419 is disposed on the seventh damage eliminating pipeline 410 for controlling the opening and closing of the seventh damage eliminating pipeline 410, and an eighth damage eliminating valve 420 is disposed on the eighth damage eliminating pipeline 411 for controlling the opening and closing of the eighth damage eliminating pipeline 411.

The first abatement vessel 401 is filled with an activated carbon adsorbent, the second abatement vessel 402 is filled with a potassium permanganate adsorbent, and the third abatement vessel 403 is filled with a ferric oxide adsorbent.

In some of these embodiments, the first, second, third, fourth, fifth, sixth, seventh, and eighth damage valves 413, 414, 415, 416, 417, 418, 419, 420 are shut-off valves.

In some embodiments, the detoxifying unit 400 further comprises a discharge valve disposed in the discharge line 412 for controlling the opening and closing of the discharge line 412.

In some of these embodiments, the discharge valve is a shut-off valve.

For the detoxification unit 400, at least one of a first detoxification vessel 401, a second detoxification vessel 402, and a third detoxification vessel 403 is operated. Specifically, only the first detoxification vessel 401 is operated; or, only the second decontamination container 402 is operational; or, only the third detoxification vessel 403 is operated; or, the first harm removing container 401 and the second harm removing container 402 work in sequence; or, the first harm removing container 401 and the third harm removing container 403 work in sequence; or, the second damage removing container 402 and the third damage removing container 403 work in sequence; or the first damage removing container 401, the second damage removing container 402 and the third damage removing container 403 work in sequence.

The method of use of this example is as follows:

opening the first vacuum member 301 and the first vacuum valve 303 to allow the first vacuum member 301 to supply the negative pressure to the bus bar member 201;

opening the first confluence valve 203;

opening a recovery valve 103, and conveying the residual gas of the residual gas steel cylinder A to a confluence element 201 through an air suction pipeline 104 under the action of negative pressure;

under the action of negative pressure, residual gas enters at least one of the first harm removal container 401, the second harm removal container 402 and the third harm removal container 403 for harm removal treatment and is discharged through a discharge pipeline 412;

the first weight detecting element 105 detects the weight of the steel cylinder a, and when the weight of the steel cylinder a reaches a weight threshold value, the recovery valve 103 is closed, and the connection between the suction line 104 and the steel cylinder a is removed.

Example 2

The present embodiments relate to a processing system for halogen gases.

As shown in fig. 6, a processing system for halogen gas comprises a recovery unit 100, a confluence unit 200, a first vacuum unit 300, a detoxifying unit 400, a nitrogen raw material unit 500, a bromine raw material unit 600, a krypton raw material unit 700 and a distribution unit 800, wherein the recovery unit 100 is communicated with the confluence unit 200 for providing a residual gas containing halogen gas to the confluence unit 200, the first vacuum unit 300 is communicated with the confluence unit 200 for providing negative pressure to the confluence unit 200 so that the residual gas enters the confluence unit 200 from the recovery unit 100, the detoxifying unit 400 is communicated with the first vacuum unit 300 for performing detoxifying treatment on the residual gas and discharging the detoxified residual gas, the nitrogen raw material unit 500 is communicated with the confluence unit 200 for providing nitrogen raw material, the bromine raw material unit 600 is communicated with the confluence unit 200 for providing bromine raw material, the krypton raw material unit 700 is communicated with the confluence unit 200 for providing krypton raw material, the distribution unit 800 communicates with the confluence unit 200 for distributing the halogen gas processed by the confluence unit 200. The recovery unit 100, the first vacuum unit 300 and the abatement unit 400 are gas abatement devices, the nitrogen material unit 500, the bromine material unit 600, the krypton material unit 700 and the distribution unit 800 are gas distribution devices, and the gas abatement devices and the gas distribution devices do not work simultaneously.

The structure and connection relationship of the recycling unit 100, the first vacuum unit 300, and the damage removing unit 400 are substantially the same as those of embodiment 1, and are not repeated herein.

As shown in fig. 7, the nitrogen source unit 500 includes a nitrogen source container 501, a nitrogen source line 502, and a first control valve 503, wherein the nitrogen source line 502 is communicated with the nitrogen source container 501, and the first control valve 503 is provided in the nitrogen source line 502 for controlling the opening and closing of the nitrogen source line 502.

Wherein the nitrogen raw material is N₂。

In some of these embodiments, the nitrogen feed container 501 is a storage tank.

In some of these embodiments, the first control valve 503 is a shut-off valve.

As shown in fig. 8, the bromine raw material unit 600 includes a bromine raw material container 601, a bromine raw material pipeline 602, and a second control valve 603, wherein the bromine raw material pipeline 602 is communicated with the bromine raw material container 601, and the second control valve 603 is disposed in the bromine raw material pipeline 602 for controlling the opening and closing of the bromine raw material pipeline 602.

Wherein the bromine raw material is CH₂Br₂。

In some of these embodiments, the bromine feedstock container 601 is a storage tank.

In some of these embodiments, the second control valve 603 is a shut-off valve.

As shown in fig. 9, the krypton source unit 700 includes a krypton source container 701, a krypton source line 702, and a third control valve 703, wherein the krypton source line 702 is communicated with the krypton source container 701, and the third control valve 703 is provided in the krypton source line 702 to control opening and closing of the krypton source line 702.

Wherein the krypton raw material is Kr.

In some of these embodiments, the krypton feedstock vessel 701 is a storage tank.

In some of these embodiments, the third control valve 703 is a shut-off valve.

As shown in fig. 10, the confluence unit 200 includes a confluence element 201, a first confluence pipe 202, a first confluence valve 203, a pressure detecting element 204, a second confluence pipe 205, a third confluence pipe 206, a second confluence valve 207, and a third confluence valve 208, the confluence element 201 is communicated with the recovery pipeline 101 through a first confluence pipeline 202, a first confluence valve 203 is disposed on the first confluence pipeline 202 for controlling the opening and closing of the first confluence pipeline 202, a pressure detection element 204 is disposed on the confluence element 201, the confluence element 201 is communicated with the nitrogen raw material unit 500, the bromine raw material unit 600 and the krypton raw material unit 700 through a second confluence pipeline 205, a third confluence pipeline 206 is communicated with the distribution unit 800, a second confluence valve 207 is disposed on the second confluence pipeline 205 for controlling the opening and closing of the second confluence pipeline 205, and a third confluence valve 208 is disposed on the third confluence pipeline 206 for controlling the opening and closing of the third confluence pipeline 206.

In some of these embodiments, the bus member 201 is a bus bar.

In some of these embodiments, the first combining valve 203, the second combining valve 207, and the third combining valve 208 are shut-off valves.

As shown in fig. 11, the dispensing unit 800 includes a dispensing line 801, a second flow rate detecting element 802, at least one dispensing valve 803, at least one filling line 804, and at least one second weight detecting element 805, wherein the dispensing line 801 is communicated with the third collecting line 206, the second flow rate detecting element 802 is disposed upstream of the dispensing line 801 for detecting a gas flow rate of the dispensing line 801, the at least one dispensing valve 803 is disposed downstream of the second flow rate detecting element 802 in the dispensing line 801, the filling line 804 is communicated with the corresponding dispensing valve 803, and the second weight detecting element 805 is disposed below the corresponding filling line 804.

In some of these embodiments, the second flow sensing element 802 is a flow meter that is used to obtain the flow of gas through the distribution line 801.

In some of these embodiments, the distribution valve 803 is a shut-off valve.

In some of these embodiments, the second weight detecting element 805 is a scale.

As shown in fig. 6, the processing system for halogen gas further includes a second vacuum unit 900, and the second vacuum unit 900 is respectively communicated with the krypton raw material unit 700 and the confluence unit 200.

As shown in fig. 12, the second vacuum unit 900 includes a second vacuum element 901, a second vacuum line 902, a third vacuum line 903, a second vacuum valve 904, and a third vacuum valve 905, wherein the second vacuum element 901 is communicated with the krypton raw material line 702 through the second vacuum line 902, the second vacuum element 901 is communicated with the second confluence line 205 through the third vacuum line 903, the second vacuum valve 904 is disposed on the second vacuum line 902 for controlling the opening and closing of the second vacuum line 902, and the third vacuum valve 905 is disposed on the third vacuum line 903 for controlling the opening and closing of the third vacuum line 903.

In some of these embodiments, the second vacuum element 901 is a film press.

In some of these embodiments, the second and third vacuum valves 904, 905 are shut-off valves.

The application method of the embodiment includes an inflation method and a pest elimination method, wherein the pest elimination method is basically the same as that of embodiment 1, and is not repeated herein.

The inflation method of this embodiment is as follows:

opening the first control valve 503 to allow the nitrogen source container 501 to supply the nitrogen source to the confluence element 201 through the nitrogen source line 502;

opening the second control valve 603 to allow the bromine raw material container 601 to deliver bromine raw material to the confluence element 201 through the bromine raw material line 602;

opening the third control valve 703 to allow the krypton source container 701 to supply krypton to the confluence element 201 through the krypton source line 702; alternatively, the third control valve 703 is closed, the second vacuum valve 904 is opened, and the third vacuum valve 905 is opened, so that the second vacuum unit 901 supplies a negative pressure to the krypton raw material container 701, and the krypton raw material is sent from the krypton raw material container 701 to the confluence means 201 through the second vacuum line 902 and the third vacuum line 903;

opening a second confluence valve 207 to allow the nitrogen, bromine and krypton raw materials to enter the confluence element 201 through a second confluence line 205;

opening the third confluence valve 208 to allow the halogen gas formed by the mixing process of the confluence elements 201 to enter the distribution pipeline 801 through the third confluence pipeline 206;

opening a distribution valve 803 to allow the halogen gas to enter the gas cylinder B through the charging line 804;

the weight of the gas cylinder B is detected by means of the second weight detection element 805, and in case the weight of the gas cylinder B reaches a weight threshold value, the dispensing valve 803 is closed and the connection of the filler line 804 to the gas cylinder B is removed.

The above description is only an example of the preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and those skilled in the art should be able to realize the equivalent alternatives and obvious variations of the present invention.

Claims (10)

1. A processing apparatus for halogen gas, comprising:

a recovery unit for providing a sweep gas;

the confluence unit is communicated with the recovery unit and is used for mixing residual gas;

a first vacuum unit in communication with the confluence unit for providing a negative pressure to the confluence unit;

and the harmful removing unit is communicated with the first vacuum unit and is used for carrying out harmful removing treatment on the residual gas.

2. The processing apparatus according to claim 1, wherein the recovery unit comprises:

a recovery pipeline in communication with the confluence unit;

a first flow rate detecting element provided to the recovery line;

at least one recovery valve disposed in the recovery pipeline upstream of the first flow sensing element;

at least one suction line in communication with the corresponding recovery valve;

at least one first weight detection element is arranged below the corresponding air suction pipeline.

3. The processing apparatus according to claim 1, wherein the confluence unit comprises:

a bus member communicating with the recovery unit;

a pressure detecting member provided to the bus member;

a first confluence valve disposed upstream of the confluence member and communicating with the recovery unit.

4. The processing apparatus according to claim 1, wherein the detoxifying unit comprises:

a first damage removal container in communication with the first vacuum unit;

a second damage removal container, wherein the second damage removal container is communicated with the first damage removal container and the first vacuum unit;

and the third damage removal container is communicated with the first damage removal container, the second damage removal container and the first vacuum unit.

5. The processing apparatus according to claim 1, wherein the first vacuum unit comprises:

a first vacuum member in communication with the confluence unit for providing a negative pressure;

a first vacuum valve disposed upstream of the first vacuum member and communicating with the confluence unit.

6. A processing system for halogen gases, comprising:

a nitrogen feedstock unit for providing a nitrogen feedstock;

a bromine feedstock unit for providing a bromine feedstock;

a krypton feedstock unit for providing a krypton feedstock;

the confluence unit is respectively communicated with the nitrogen raw material unit, the bromine raw material unit and the krypton raw material unit and is used for mixing to form halogen gas;

a distribution unit communicating with the confluence unit for distributing halogen gas;

the recovery unit is communicated with the confluence unit and is used for providing residual gas;

a first vacuum unit in communication with the confluence unit for providing a negative pressure to the confluence unit;

and the harmful removing unit is communicated with the first vacuum unit and is used for carrying out harmful removing treatment on the residual gas.

7. The processing system of claim 6, wherein the allocation unit comprises:

a distribution line in communication with the confluence unit;

a second flow rate detecting element provided to the distribution line;

at least one distribution valve disposed in the distribution line downstream of the flow sensing element;

at least one filling line, which is connected to the corresponding distributor valve;

and the second weight detection element is arranged below the corresponding filling pipeline.

8. The processing system of claim 6, further comprising:

and the second vacuum unit is respectively communicated with the krypton raw material unit and the confluence unit and is used for providing negative pressure.

9. The processing system of claim 8, wherein the second vacuum unit comprises:

a second vacuum element in communication with the krypton source unit and the confluence unit, respectively;

a second vacuum valve disposed upstream of the second vacuum element and in communication with the krypton feedstock unit;

a third vacuum valve disposed downstream of the second vacuum member and in communication with the confluence unit.

10. The processing system of claim 6, wherein the confluence unit comprises:

a bus member communicating with the recovery unit;

a pressure detecting member provided to the bus member;

a first confluence valve disposed upstream of the confluence member and communicating with the recovery unit;

a second confluence valve disposed upstream of the confluence element and in communication with the nitrogen feedstock unit, the bromine feedstock unit, and the krypton feedstock unit, respectively;

a third confluence valve disposed downstream of the confluence element and in communication with the distribution unit.

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