JP2000288488A - Washing device for slit nozzle - Google Patents
Washing device for slit nozzleInfo
- Publication number
- JP2000288488A JP2000288488A JP10011799A JP10011799A JP2000288488A JP 2000288488 A JP2000288488 A JP 2000288488A JP 10011799 A JP10011799 A JP 10011799A JP 10011799 A JP10011799 A JP 10011799A JP 2000288488 A JP2000288488 A JP 2000288488A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- cleaning
- angle
- cleaning liquid
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は半導体ウェーハやガ
ラス基板等の板状被処理物表面に塗布液を一定幅で塗布
するためのスリットノズルを洗浄する装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for cleaning a slit nozzle for applying a coating solution at a constant width on a surface of a plate-like workpiece such as a semiconductor wafer or a glass substrate.
【０００２】[0002]
【従来の技術】半導体ウェーハやガラス基板等の板状被
処理物表面にレジスト液等を塗布するノズルとして、従
来はスピンナー上に載置した被処理物の中心部に円形ノ
ズルから塗布液をスポット状に滴下し、スピンナーによ
って被処理物を回転させることで発生する遠心力で塗布
液を外方に向けて拡散せしめるようにしている。しかし
ながら、この方法では、被処理物表面に残る塗布液が僅
かであり、殆どが飛散してしまうので無駄がある。そこ
で、スピンナー塗布の代わりにノズルに形成する塗布液
の吐出口をスリット状にし、被処理物に対しノズルを相
対的に移動することで被処理物表面に所定幅で塗布液を
塗布することが考えられている。2. Description of the Related Art Conventionally, as a nozzle for applying a resist solution or the like to the surface of a plate-shaped workpiece such as a semiconductor wafer or a glass substrate, a coating liquid is conventionally spotted from a circular nozzle onto a central portion of the workpiece placed on a spinner. The coating liquid is spread outward by centrifugal force generated by rotating the object to be processed by a spinner. However, in this method, the coating liquid remaining on the surface of the object to be processed is small, and most of the coating liquid is scattered. Therefore, instead of spinner coating, the discharge port of the coating liquid to be formed on the nozzle is formed in a slit shape, and the nozzle is relatively moved with respect to the processing object to apply the coating liquid on the surface of the processing object with a predetermined width. It is considered.
【０００３】スリットノズルを用いれば、塗布液の無駄
をなくし且つ効率的に塗布を行えるのであるが、幅広と
なる分、ノズル先端の周辺部に塗布液の回り込み量も多
く、これが乾燥すると大量の異物発生の原因となる。[0003] The use of a slit nozzle makes it possible to eliminate the waste of the coating liquid and to perform the coating efficiently. It may cause foreign matter.
【０００４】そこで、本出願人は特開平１０−３０８３
３８号公報にスリットノズル専用の洗浄装置を提案して
いる。上記公報に提案した洗浄装置は、図３の平面図に
示すように、洗浄部１００と洗浄液の溜り部１０１を併
設し、洗浄部１００にスリットノズルを載置した状態で
実質的な密閉空間を形成するようにし、また洗浄部１０
０の長手方向の一端側にガス供給管１０２と洗浄液供給
管１０３を臨ませ、他端側にはガス排気管１０４を臨ま
せ、ガス供給管１０２から供給されたガスをガス排気管
１０４から排出することで、洗浄部１００内にガスの流
れを形成し、このガスの流れに乗せて洗浄液供給管１０
３からの洗浄液を、ノズル表面に行き渡らせるようにし
たものである。Accordingly, the present applicant has disclosed in Japanese Patent Application Laid-Open No. Hei 10-3083.
No. 38 proposes a cleaning device dedicated to a slit nozzle. As shown in the plan view of FIG. 3, the cleaning device proposed in the above-mentioned publication has a cleaning unit 100 and a reservoir 101 for cleaning liquid provided side by side, and a substantially closed space in which a slit nozzle is mounted on the cleaning unit 100. And the cleaning section 10
The gas supply pipe 102 and the cleaning liquid supply pipe 103 face the one end in the longitudinal direction of 0, and the gas exhaust pipe 104 faces the other end, and the gas supplied from the gas supply pipe 102 is exhausted from the gas exhaust pipe 104. As a result, a gas flow is formed in the cleaning unit 100, and the cleaning liquid supply pipe 10 is placed on the gas flow.
The cleaning liquid from No. 3 is distributed over the nozzle surface.
【０００５】また、図４に示すのも従来のスリットノズ
ル専用の洗浄装置であり、この洗浄装置は、洗浄部１０
０内にノズル先端に対向するように洗浄液の吐出口１０
５を長手方向に沿って多数形成している。そして、吐出
口１０５の向き、つまり吐出口１０５から噴出する洗浄
液の角度は、ノズル長手方向に対して直交している。FIG. 4 also shows a conventional cleaning device dedicated to a slit nozzle.
The cleaning liquid discharge port 10 is set so as to face the nozzle tip within 0.
5 are formed along the longitudinal direction. The direction of the ejection port 105, that is, the angle of the cleaning liquid ejected from the ejection port 105 is orthogonal to the longitudinal direction of the nozzle.
【０００６】[0006]
【発明が解決しようとする課題】特開平１０−３０８３
３８号公報に提案した装置によれば、効率よく洗浄を行
えるのであるが、ガス供給管から供給するガスの量と洗
浄液供給管から供給する洗浄液とのバランスをとるのが
難しい。Problems to be Solved by the Invention
According to the device proposed in Japanese Patent Publication No. 38, it is possible to perform cleaning efficiently, but it is difficult to balance the amount of gas supplied from the gas supply pipe with the cleaning liquid supplied from the cleaning liquid supply pipe.
【０００７】また、洗浄液の吐出口の角度をノズル長手
方向に対して直交せしめた装置にあっては、１つの吐出
口によってカバーする洗浄面積が少なく充分な洗浄を行
えず、これを解消するためには吐出口の開口面積を大き
くするか、吐出口の数を増やさなければならない。吐出
口の開口面積を大きくすると吐出圧力が弱くなり、吐出
口の数を増やすのは、製作上コストがかかる。更に、吐
出口の角度をノズル長手方向に対して直交せしめると、
洗浄液の跳ね返り量も多くなり、洗浄効率が悪くなる。Further, in an apparatus in which the angle of the discharge port of the cleaning liquid is made orthogonal to the longitudinal direction of the nozzle, the cleaning area covered by one discharge port is small and sufficient cleaning cannot be performed. In such a case, it is necessary to increase the opening area of the discharge port or increase the number of discharge ports. Increasing the opening area of the discharge port lowers the discharge pressure, and increasing the number of discharge ports increases production cost. Further, when the angle of the discharge port is made orthogonal to the longitudinal direction of the nozzle,
The rebound amount of the cleaning liquid increases, and the cleaning efficiency deteriorates.
【０００８】[0008]
【課題を解決するための手段】上記課題を解決すべく本
発明に係るスリットノズルの洗浄装置は、ノズルを載置
した状態で実質的な密閉空間を形成する洗浄部を備え、
この洗浄部内にはノズル先端に対向するように洗浄液の
吐出口が長手方向に沿って多数形成され、更に各ノズル
の洗浄液の噴出方向はノズルに対する直交方向に対して
角度を有する構成とした。In order to solve the above problems, a slit nozzle cleaning apparatus according to the present invention includes a cleaning unit that forms a substantially closed space with the nozzle mounted thereon,
A large number of cleaning liquid discharge ports are formed in the cleaning section along the longitudinal direction so as to face the nozzle tip, and the direction in which the cleaning liquid is ejected from each nozzle has an angle with respect to the direction perpendicular to the nozzles.
【０００９】このような構成とすることで、吐出口から
の洗浄液がノズルの先端表面に沿って流れる。したがっ
て、１つの吐出口による洗浄面積が大きくなり、吐出口
の数を少なくしても充分に効率よく洗浄できる。With this configuration, the cleaning liquid from the discharge port flows along the tip surface of the nozzle. Therefore, a cleaning area by one discharge port becomes large, and even if the number of discharge ports is reduced, cleaning can be performed sufficiently and efficiently.
【００１０】前記各ノズルの洗浄液の具体的な噴出方向
角度は、ノズルに対する直交方向を９０°としたとき６
５°〜７５°とすることが好ましい。この角度を大きく
し過ぎると洗浄液のノズルに対する衝突力が小さくな
り、洗浄能力が低下し、逆に角度を小さくし過ぎるとノ
ズルに当ったときの洗浄液の跳ね返り量が多くなる。更
に、ノズルと洗浄液の吐出口との間隔は、洗浄液の吐出
圧にもよるが、１〜５ｍｍの間隔とすれば、効率よく洗
浄できる。この間隔がこれよりも短い場合には洗浄液の
跳ね返り量が多くなり、また、これよりも長い場合には
洗浄液のノズルに対する衝突力が小さくなり、洗浄能力
が低下するという問題が生じる。The specific angle of the jetting direction of the cleaning liquid from each nozzle is 6 ° when the orthogonal direction to the nozzle is 90 °.
It is preferable that the angle is 5 ° to 75 °. If the angle is too large, the collision force of the cleaning liquid against the nozzle will be small, and the cleaning performance will be reduced. Conversely, if the angle is too small, the amount of the cleaning liquid rebounding when hitting the nozzle will be large. Further, the distance between the nozzle and the discharge port of the cleaning liquid depends on the discharge pressure of the cleaning liquid. If the interval is shorter than this, the amount of rebound of the cleaning liquid increases, and if it is longer than this, the collision force of the cleaning liquid against the nozzle decreases, resulting in a problem that the cleaning ability decreases.
【００１１】また、前記洗浄部には下方に向けて排気口
を開口せしめることが好ましい。斯かる構成とすること
で、洗浄後の洗浄液をスムーズに排出することができ
る。Preferably, an exhaust port is opened downward in the cleaning section. With such a configuration, the cleaning liquid after cleaning can be smoothly discharged.
【００１２】[0012]
【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。ここで、図１は本発明に係る
スリットノズルの洗浄装置の縦断面図、図２は図１のＡ
−Ａ方向断面図である。Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIG. 1 is a longitudinal sectional view of a slit nozzle cleaning apparatus according to the present invention, and FIG.
It is a sectional view in the -A direction.
【００１３】洗浄装置は洗浄ステーション１と待機部２
０とディップ洗浄部３０とプリディスペンス部４０を併
設してなり、洗浄ステーション１は下ブロック２の上に
上ブロック３を固設し、この上ブロック３の上にノズル
受台４を取り付けている。The cleaning device comprises a cleaning station 1 and a standby unit 2
The cleaning station 1 has an upper block 3 fixed on a lower block 2, and a nozzle receiver 4 is mounted on the upper block 3. .
【００１４】下ブロック２と上ブロック３との間には洗
浄液供給源５が設けられ、また前記ノズル受台４には洗
浄部６が形成され、この洗浄部６には上方からノズルＮ
が載置され、ノズルＮが載置された状態で略密閉空間が
形成される。尚、略密閉空間を形成するのは洗浄液が外
部に飛び散らないようにするためであるので、多少隙間
が空いていても構わない。A cleaning liquid supply source 5 is provided between the lower block 2 and the upper block 3, and a cleaning section 6 is formed on the nozzle receiving base 4, and the cleaning section 6 has a nozzle N from above.
Is mounted, and a substantially closed space is formed in a state where the nozzle N is mounted. Note that the substantially closed space is formed to prevent the cleaning liquid from scattering to the outside, so that a gap may be slightly formed.
【００１５】また、前記洗浄部６には長手方向に沿った
両側にノズルＮに向かって開口する洗浄液の吐出口７…
が開口している。この吐出口７は後端が前記洗浄液供給
源５につながるとともに、先端の吐出角度（噴出方向角
度）は、ノズルに対する直交方向に対して角度を有して
いる。この実施例にあっては、６５°〜７５°にしてい
る。このときのノズルＮの側面と洗浄液の吐出口７の開
口部との間隔が１〜５ｍｍとなるようにすると、洗浄液
の吐出圧にもよるが、洗浄効率がよい。The cleaning section 6 has cleaning liquid discharge ports 7 that open toward the nozzle N on both sides along the longitudinal direction.
Is open. The discharge port 7 has a rear end connected to the cleaning liquid supply source 5 and a front end discharge angle (ejection direction angle) with respect to a direction orthogonal to the nozzle. In this embodiment, the angle is 65 ° to 75 °. At this time, when the distance between the side surface of the nozzle N and the opening of the cleaning liquid discharge port 7 is set to 1 to 5 mm, the cleaning efficiency is good depending on the discharge pressure of the cleaning liquid.
【００１６】また、前記洗浄部６の底部には洗浄後の洗
浄液を排出するための排気口８を形成している。An exhaust port 8 for discharging the cleaning liquid after cleaning is formed at the bottom of the cleaning section 6.
【００１７】以上において、塗布後のノズルＮを洗浄す
るには、あまりにもノズルＮに付着物が多い場合には、
溶媒が入ったディップ洗浄部３０にノズルＮを浸漬して
付着物を溶解した後、ノズルＮを洗浄ステーション１に
移す。そして、ノズルＮを洗浄部６上に載置した状態
で、吐出口７から洗浄液をノズル先端に向けて噴出し、
排気口８から排気する。すると、洗浄液はノズル先端面
に対して斜めに吹き付けられるので、洗浄液がノズルの
先端面に沿って流れ、ノズルＮに付着している塗布液や
塗布液から生じた析出物等を溶解し洗い流す。In the above, in order to clean the nozzle N after coating, if there is too much deposit on the nozzle N,
After immersing the nozzle N in the dip cleaning unit 30 containing the solvent to dissolve the deposits, the nozzle N is moved to the cleaning station 1. Then, in a state where the nozzle N is placed on the cleaning unit 6, the cleaning liquid is ejected from the discharge port 7 toward the nozzle tip,
Air is exhausted from the exhaust port 8. Then, the cleaning liquid is sprayed obliquely to the nozzle tip surface, so that the cleaning liquid flows along the nozzle tip surface, dissolving and washing away the coating liquid adhering to the nozzle N and the precipitates generated from the coating liquid.
【００１８】更に、上記の洗浄後のノズルＮを使用する
場合には、プリディスペンス部４０にノズルＮをセット
し、一旦、塗布液をノズルＮから空の状態で塗布してか
ら、基板等の表面に塗布を行なう。このようにすること
で、ボタ落ちを防止することができる。Further, when the nozzle N after the above-mentioned cleaning is used, the nozzle N is set in the pre-dispensing section 40, and once the coating liquid is applied in an empty state from the nozzle N, the substrate N Apply to the surface. By doing so, dropping can be prevented.
【００１９】また、塗布を休止する場合には、ノズルＮ
に付着した塗布液が乾燥固着するのを防止するために待
機部２０にノズルＮを待機しておく。この待機部２０
は、ノズルＮ先端部の乾燥を防止するため、塗布液の雰
囲気になっていることが必要である。この塗布液の雰囲
気としておく手段としては、 ノズルＮ先端部を塗布液中にディップする方法。 ノズルＮ先端部を塗布液雰囲気にしておく方法、およ
び 塗布液に代えて、塗布液に使用する溶媒を用いた上記
又はの方法、等が考えられる。When the application is suspended, the nozzle N
The nozzle N is made to stand by in the stand-by unit 20 in order to prevent the coating liquid adhering to the surface from drying and fixing. This standby unit 20
In order to prevent the tip of the nozzle N from drying, it is necessary that the atmosphere of the coating liquid be set. As a means for setting the atmosphere of the coating liquid, a method of dipping the tip of the nozzle N into the coating liquid. A method in which the tip of the nozzle N is kept in a coating liquid atmosphere, and the above method or the above using a solvent used for the coating liquid instead of the coating liquid are conceivable.
【００２０】[0020]
【発明の効果】以上に説明したように本発明によれば、
ノズルを載置した状態で実質的な密閉空間を形成する洗
浄部内に、ノズル先端に対向するように洗浄液の吐出口
を長手方向に沿って多数形成するとともに各ノズルの洗
浄液の噴出方向をノズルに対する直交方向に対して角度
を有する構成としたので、吐出口からの洗浄液がノズル
の先端表面に沿って流れ、１つの吐出口当りの洗浄面積
が大きくなり、吐出口の数を少なくしても充分に効率よ
く洗浄できる。According to the present invention as described above,
A large number of cleaning liquid discharge ports are formed along the longitudinal direction so as to face the nozzle tip in the cleaning section forming a substantially closed space with the nozzle mounted, and the cleaning liquid jetting direction of each nozzle is set to the nozzle. Since the cleaning liquid is configured to have an angle with respect to the orthogonal direction, the cleaning liquid from the discharge port flows along the tip surface of the nozzle, the cleaning area per discharge port increases, and even if the number of discharge ports is reduced, it is sufficient. It can be washed efficiently.
【００２１】特に、前記ノズルに対する直交方向を基準
とした吐出口の角度を６５°〜７５°とすれば、従来装
置に比較して、吐出口の数を約６０％にまで減少でき、
加工コストを大幅に削減することが可能になる。In particular, if the angle of the discharge port with respect to the direction perpendicular to the nozzle is 65 ° to 75 °, the number of discharge ports can be reduced to about 60% as compared with the conventional apparatus.
Processing costs can be significantly reduced.
【図１】本発明に係るスリットノズルの洗浄装置の縦断
面図FIG. 1 is a longitudinal sectional view of a slit nozzle cleaning apparatus according to the present invention.
【図２】図１のＡ−Ａ方向断面図FIG. 2 is a sectional view taken along the line AA of FIG. 1;
【図３】従来のスリットノズルの洗浄装置の平面図FIG. 3 is a plan view of a conventional slit nozzle cleaning device.
【図４】従来のスリットノズルの洗浄装置の縦断面図FIG. 4 is a longitudinal sectional view of a conventional slit nozzle cleaning device.
１…洗浄ステーション、２…下ブロック、３…上ブロッ
ク、４…ノズル受台、５…洗浄液供給源、６…洗浄部、
７…吐出口、２０…待機部、３０…ディップ洗浄部、４
０…プリディスペンス部、Ｎ…ノズル。DESCRIPTION OF SYMBOLS 1 ... Cleaning station, 2 ... Lower block, 3 ... Upper block, 4 ... Nozzle stand, 5 ... Cleaning liquid supply source, 6 ... Cleaning part,
7 ... Discharge port, 20 ... Standby section, 30 ... Dip cleaning section, 4
0: Pre-dispensing part, N: Nozzle.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 福島 偉仁 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 (72)発明者 山口 和伸 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 Ｆターム(参考） 2H096 AA00 AA25 AA27 CA12 CA20 3B201 AA46 AB01 BB23 BB92 CA01 CB01 CD11 CD33 5F046 JA02 JA27 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor: Fukushima Weijin 150 Nakamaruko, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside the Tokyo Chemical Industry Co., Ltd. (72) Inventor Kazunori Yamaguchi 150 Nakamaruko, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Industrial Co., Ltd. F term (reference) 2H096 AA00 AA25 AA27 CA12 CA20 3B201 AA46 AB01 BB23 BB92 CA01 CB01 CD11 CD33 5F046 JA02 JA27
Claims (3)
トノズルを洗浄する装置であって、この装置はスリット
ノズルを載置した状態で実質的な密閉空間を形成する洗
浄部を備え、この洗浄部内にはノズル先端に対向するよ
うに洗浄液の吐出口が長手方向に沿って多数形成され、
更に各ノズルの洗浄液の噴出方向はノズルに対する直交
方向に対して角度を有することを特徴とするスリットノ
ズルの洗浄装置。1. An apparatus for cleaning a slit nozzle having a coating liquid discharge opening having a predetermined width, wherein the apparatus includes a cleaning unit that forms a substantially closed space with the slit nozzle mounted. A number of discharge ports for the cleaning liquid are formed in the cleaning section along the longitudinal direction so as to face the nozzle tip,
Furthermore, the direction of jetting the cleaning liquid of each nozzle has an angle with respect to the direction perpendicular to the nozzle.
装置において、前記各ノズルの洗浄液の噴出方向角度は
ノズルに対する直交方向を９０°としたときに６５°〜
７５°であることを特徴とするスリットノズルの洗浄装
置。2. The slit nozzle cleaning apparatus according to claim 1, wherein the angle of jetting direction of the cleaning liquid of each nozzle is 65 ° to 90 ° when the orthogonal direction to the nozzle is 90 °.
An apparatus for cleaning a slit nozzle, which is at 75 °.
装置において、前記洗浄部には下方に向けて排気口が開
口していることを特徴とするスリットノズルの洗浄装
置。3. The cleaning apparatus for a slit nozzle according to claim 1, wherein an exhaust port is opened downward in the cleaning section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10011799A JP3511106B2 (en) | 1999-04-07 | 1999-04-07 | Cleaning device for slit nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10011799A JP3511106B2 (en) | 1999-04-07 | 1999-04-07 | Cleaning device for slit nozzle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000288488A true JP2000288488A (en) | 2000-10-17 |
| JP3511106B2 JP3511106B2 (en) | 2004-03-29 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10011799A Expired - Fee Related JP3511106B2 (en) | 1999-04-07 | 1999-04-07 | Cleaning device for slit nozzle |
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| Country | Link |
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| JP (1) | JP3511106B2 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005270841A (en) * | 2004-03-25 | 2005-10-06 | Tokyo Ohka Kogyo Co Ltd | Apparatus for cleaning slit nozzle |
| JP2005270848A (en) * | 2004-03-25 | 2005-10-06 | Tokyo Ohka Kogyo Co Ltd | Device and method for adjusting tip end of slit nozzle |
| JP2006281101A (en) * | 2005-03-31 | 2006-10-19 | Toppan Printing Co Ltd | Coater with cleaning device |
| US7416758B2 (en) | 2004-12-31 | 2008-08-26 | Lg Display Co., Ltd. | Slit coater |
| US7449069B2 (en) | 2004-12-28 | 2008-11-11 | Lg Display Co., Ltd. | Slit coater having apparatus for supplying a coating solution |
| US7647884B2 (en) | 2004-12-31 | 2010-01-19 | Lg. Display Co., Ltd. | Slit coater with a standby unit for a nozzle and a coating method using the same |
| US7914843B2 (en) | 2004-12-31 | 2011-03-29 | Lg Display Co., Ltd. | Slit coater having pre-applying unit and coating method using the same |
| JP2015006652A (en) * | 2013-05-31 | 2015-01-15 | 東京エレクトロン株式会社 | Substrate processing device and nozzle cleaning method |
| KR102621585B1 (en) * | 2023-03-13 | 2024-01-05 | (주)화인테크놀로지 | Industrial multi-nozzle cleaning device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101256794B1 (en) * | 2011-07-04 | 2013-04-22 | 주식회사 케이씨텍 | Non-contact type cleaning device of slit nozzle and cleaning method using same |
-
1999
- 1999-04-07 JP JP10011799A patent/JP3511106B2/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101121122B1 (en) * | 2004-03-25 | 2012-03-19 | 다즈모 가부시키가이샤 | Cleaning apparatus for slit nozzle |
| JP2005270848A (en) * | 2004-03-25 | 2005-10-06 | Tokyo Ohka Kogyo Co Ltd | Device and method for adjusting tip end of slit nozzle |
| JP4489480B2 (en) * | 2004-03-25 | 2010-06-23 | 東京応化工業株式会社 | Slit nozzle cleaning device |
| JP4526288B2 (en) * | 2004-03-25 | 2010-08-18 | 東京応化工業株式会社 | Adjusting device and adjusting method for slit nozzle tip |
| JP2005270841A (en) * | 2004-03-25 | 2005-10-06 | Tokyo Ohka Kogyo Co Ltd | Apparatus for cleaning slit nozzle |
| KR101184720B1 (en) | 2004-03-25 | 2012-09-20 | 다즈모 가부시키가이샤 | Cleaning apparatus for slit nozzle |
| US7449069B2 (en) | 2004-12-28 | 2008-11-11 | Lg Display Co., Ltd. | Slit coater having apparatus for supplying a coating solution |
| US7416758B2 (en) | 2004-12-31 | 2008-08-26 | Lg Display Co., Ltd. | Slit coater |
| US7647884B2 (en) | 2004-12-31 | 2010-01-19 | Lg. Display Co., Ltd. | Slit coater with a standby unit for a nozzle and a coating method using the same |
| US7914843B2 (en) | 2004-12-31 | 2011-03-29 | Lg Display Co., Ltd. | Slit coater having pre-applying unit and coating method using the same |
| JP2006281101A (en) * | 2005-03-31 | 2006-10-19 | Toppan Printing Co Ltd | Coater with cleaning device |
| JP2015006652A (en) * | 2013-05-31 | 2015-01-15 | 東京エレクトロン株式会社 | Substrate processing device and nozzle cleaning method |
| KR102621585B1 (en) * | 2023-03-13 | 2024-01-05 | (주)화인테크놀로지 | Industrial multi-nozzle cleaning device |
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| Publication number | Publication date |
|---|---|
| JP3511106B2 (en) | 2004-03-29 |
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