JP2000262959A - Method for forming uniform coating film layer - Google Patents
Method for forming uniform coating film layerInfo
- Publication number
- JP2000262959A JP2000262959A JP11114039A JP11403999A JP2000262959A JP 2000262959 A JP2000262959 A JP 2000262959A JP 11114039 A JP11114039 A JP 11114039A JP 11403999 A JP11403999 A JP 11403999A JP 2000262959 A JP2000262959 A JP 2000262959A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- solvent
- work
- film
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、溶液を用いた皮膜層作
成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a coating layer using a solution.
【０００２】[0002]
【従来の技術】溶液を用いた皮膜層作成方法としては、
溶液が満たされた槽にワークを沈め、次いで徐々にワー
クを溶液上部に引き出すことによりワーク表面に溶液を
塗布し、界面上部にて溶剤を蒸発させ、溶質皮膜を形成
させる方法や、ワークに溶液を噴霧塗布し、付着した溶
液中の溶剤を蒸発させながら皮膜を形成させる方法が一
般的である。2. Description of the Related Art As a method of forming a coating layer using a solution, there are the following methods.
Submerge the work in a bath filled with the solution, then slowly pull the work to the upper part of the solution, apply the solution to the work surface, evaporate the solvent at the upper part of the interface, and form a solute film on the work. Is generally applied by spray coating to form a film while evaporating the solvent in the attached solution.
【０００３】このような方法の場合、ワークに溶液皮膜
が塗布された状態にて界面から引き上げられ、同時に溶
剤の蒸発が始まり、溶質皮膜が形成される。この場合、
溶剤液面が波打ち、即ち、上下動が生じた場合、ワーク
の塗布溶液厚みが不均一な状態で乾燥が始まったり、溶
剤が蒸発して皮膜が形成された上に再び溶剤が付着し、
形成皮膜厚みを厚くしたり等で形成皮膜厚みが不均一と
なる。In the case of such a method, a work is coated with a solution film and then pulled up from the interface, and at the same time, evaporation of the solvent starts to form a solute film. in this case,
When the solvent liquid surface undulates, that is, when vertical movement occurs, drying starts with the coating solution thickness of the work being non-uniform, or the solvent evaporates to form a film, and the solvent adheres again,
The thickness of the formed film becomes non-uniform, for example, by increasing the thickness of the formed film.
【０００４】液面の変動以外にも、ワーク表面形成皮膜
厚みに影響を及ぼす、ワークの引き上げ速度、溶剤蒸発
速度を等を一定に制御し、均一な厚みの皮膜層を得るよ
うに操業する。以上のような条件を満たすためには、特
別な設備と手段を要する。液面に波が生じないように、
振動源を遮断し、強固な地盤上に設備を設置したり、特
別な引き上げ装置を準備したり、或いは作業能率を犠牲
にしてワーク引き上げ速度を遅くしたり等、高価な投資
と操業費用を要する。[0004] In addition to fluctuations in the liquid level, the thickness of the film formed on the surface of the work is controlled so that the work pulling speed and the solvent evaporation speed are controlled at a constant level, so as to obtain a film layer having a uniform thickness. Special facilities and means are required to satisfy the above conditions. In order to avoid waves on the liquid surface,
Expensive investment and operating costs are required, such as blocking vibration sources, installing equipment on solid ground, preparing special lifting equipment, or slowing down the work lifting speed at the expense of work efficiency .
【０００５】[0005]
【発明が解決しようとする課題】本発明は前述の欠点を
解決する為になされたものであり、溶剤に溶質を溶解し
た溶液をワークに塗布し、溶剤を蒸発させることによ
り、ワーク表面に溶質の皮膜層を形成させる皮膜層作成
方法において、ワークに溶液を塗布する際の空間の溶剤
濃度を、溶剤の実質的に飽和濃度にてワークに溶液を塗
布し、次いでそのまま静置して塗布された溶液皮膜の余
分の厚み分を流下させ、次いで空間雰囲気の溶剤濃度を
飽和濃度以下として塗布した溶液皮膜の溶剤を蒸発さ
せ、溶質の皮膜層を形成させることを特徴とする均一な
皮膜層作成方法を提供するにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks, and a solution in which a solute is dissolved in a solvent is applied to a work, and the solute is evaporated on the work surface by evaporating the solvent. In the method of forming a film layer for forming a film layer, the solvent concentration in the space when the solution is applied to the work, the solution is applied to the work at a substantially saturated concentration of the solvent, and then the solution is allowed to stand still and applied. A uniform film layer characterized by flowing down the excess thickness of the solution film, and then evaporating the solvent of the applied solution film so that the solvent concentration in the space atmosphere is less than the saturation concentration to form a solute film layer. There is a way to provide.
【０００６】以下本発明を図面に基づいて具体的に説明
する。これはあくまでも実施態様例であり、他の具体的
方法も採用可能である。図１において処理槽１は密閉容
器であり、ワークの出し入れのための蓋２を備えてい
る。弁１０、１１、１２、１３、は閉の状態にて蓋２を
開け、板状のワーク８を垂直に設置する。Hereinafter, the present invention will be described in detail with reference to the drawings. This is only an example of the embodiment, and other specific methods can be adopted. In FIG. 1, a treatment tank 1 is a closed container and has a lid 2 for taking in and out a work. With the valves 10, 11, 12, and 13 closed, the lid 2 is opened, and the plate-shaped work 8 is installed vertically.
【０００７】次いで弁１２、１０、を開け、溶液ポンプ
５を起動し溶液槽の液６を処理槽のワークが液にて漬か
るまで供給し、次いで弁１０、１４を閉め溶液ポンプ５
を停止する。液の移送の方法は、他の通常用いられる方
法、例えば溶液槽と処理槽との間に圧力差が生じるよう
にする等の方法でも本発明の実施の上で差し支えない。
溶液槽、処理槽、共に、空間ガスの溶剤濃度は、それぞ
れの槽の溶液の溶剤と飽和状態となる。なほ、溶液槽の
溶質濃度、温度は、必要とする皮膜厚みに応じて調節す
る。Next, the valves 12 and 10 are opened, and the solution pump 5 is started to supply the solution 6 in the solution tank until the work in the processing tank is immersed in the solution. Then, the valves 10 and 14 are closed and the solution pump 5 is closed.
To stop. As a method of transferring the liquid, any other commonly used method, such as a method of generating a pressure difference between the solution tank and the processing tank, may be used in practicing the present invention.
In both the solution tank and the processing tank, the solvent concentration of the space gas becomes saturated with the solvent of the solution in each tank. In addition, the solute concentration and temperature in the solution tank are adjusted according to the required film thickness.
【０００８】次いで、弁１１を開け、溶液を溶液槽に抜
き出し、ワークに溶液塗布膜を形成させる。溶液槽の溶
剤飽和ガスは、弁１２を経て抜き出した溶液と置換し処
理槽にはいる。この時、ワークに塗布した溶液膜厚みに
影響がないようにガス導入方法に配慮する必要がある。
液抜き出しが終了し、ワーク塗布液膜厚みが安定するま
でそのまま放置する。この間、塗布膜の溶剤は蒸発を起
こさない雰囲気で維持される。溶液塗布膜を形成させる
方法は、その他の方法、例えば溶液をスプレーノズルに
てワークに散布する方法でもよく、溶剤の蒸発が起こら
ないため散布後、塗布膜厚みが安定するまで放置するこ
とによって、均一な厚みの塗布膜を形成させることがで
きる。Next, the valve 11 is opened, the solution is drawn into the solution tank, and a solution coating film is formed on the work. The solvent-saturated gas in the solution tank is replaced with the solution extracted through the valve 12 and enters the processing tank. At this time, it is necessary to consider the gas introduction method so as not to affect the thickness of the solution film applied to the work.
The liquid removal is completed, and the work application liquid is left as it is until the film thickness is stabilized. During this time, the solvent of the coating film is maintained in an atmosphere that does not evaporate. The method of forming the solution coating film may be another method, for example, a method of spraying the solution on the work with a spray nozzle, and since the solvent does not evaporate, after spraying, by allowing the coating film thickness to stabilize, A coating film having a uniform thickness can be formed.
【０００９】均一な溶液膜が形成された後、次いで、弁
１１、１２、を閉め、弁１３を開け、真空ポンプにて処
理槽内の圧力を下げ、溶液塗布膜の溶剤を蒸発させる。
溶剤蒸発速度は必要に応じて弁１３を調節し、減圧度や
圧力降下速度によって調節することが好ましい。処理槽
の空間雰囲気を溶剤の不飽和濃度とする方法は、減圧に
する方法以外に、図に記載は無いが、例えば処理槽上部
から不飽和ガスを導入し、飽和ガスを下部から抜き出し
置換する方法でも本発明の実施の上で差し支えない。塗
布された溶液塗膜が充分に乾燥されるまで処理する。After a uniform solution film is formed, the valves 11 and 12 are closed, the valve 13 is opened, the pressure in the processing tank is reduced by a vacuum pump, and the solvent of the solution coating film is evaporated.
Preferably, the solvent evaporation rate is adjusted by adjusting the valve 13 as necessary, and by adjusting the degree of pressure reduction or the rate of pressure drop. The method of setting the space atmosphere of the processing tank to the unsaturated concentration of the solvent is not described in the drawing, except for the method of reducing the pressure. For example, an unsaturated gas is introduced from the upper part of the processing tank, and the saturated gas is extracted from the lower part and replaced. The method may be used in practicing the present invention. Treat the applied solution coating until it is sufficiently dried.
【００１０】溶液塗膜が充分に乾燥したならば、弁１３
を閉め、真空ポンプを停止し、弁１４を開け、空気を導
入し蓋を開け、皮膜が形成されたワーク取り出す。If the solution coating has dried sufficiently, the valve 13
Is closed, the vacuum pump is stopped, the valve 14 is opened, air is introduced and the lid is opened, and the work on which the film is formed is taken out.
【００１１】[0011]
【発明の効果】本発明による均一な皮膜層作成方法を用
いると、溶液を塗布する段階で、溶液塗布膜厚みが不均
一であっても、乾燥前に溶剤飽和雰囲気にて塗布膜を均
一にする工程を設けたことから、塗布段階の厳密な条件
を必要とせず、従って従来のように特別な設備と手段を
必要とせず、作業能率も高くなる。According to the method for forming a uniform film layer according to the present invention, even when the thickness of the solution coating film is not uniform at the stage of applying the solution, the coating film can be uniformly formed in a solvent-saturated atmosphere before drying. As a result, the strict conditions of the application step are not required, and therefore, special equipment and means are not required as in the prior art, and the work efficiency is increased.
【図１】本発明の一実施態様を説明する説明図。FIG. 1 is an explanatory diagram illustrating one embodiment of the present invention.
１は処理槽 ２は処理槽蓋 ３は溶液槽 ４は真空ポンプ ５は溶液ポンプ ６は溶剤槽溶液 ７は処理槽溶液 ８ワーク １０〜１４は開閉弁 1 is a processing tank 2 is a processing tank lid 3 is a solution tank 4 is a vacuum pump 5 is a solution pump 6 is a solvent tank solution 7 is a processing tank solution 8 Work 10 is a switching valve 10 to 14
Claims (1)
後、ワークという）に塗布し、溶剤を蒸発させることに
より、ワーク表面に溶質の皮膜層を形成させる皮膜層作
成方法において、ワークに溶液を塗布する際の空間の溶
剤濃度を、溶剤の実質的に飽和濃度にてワークに溶液を
塗布し、次いでそのまま静置して塗布された溶液皮膜の
余分の厚み分を流下させ、次いで空間雰囲気の溶剤濃度
を飽和濃度以下として塗布した溶液皮膜の溶剤を蒸発さ
せ、溶質の皮膜層を形成させることを特徴とする均一な
皮膜層作成方法A method for forming a solute film on a surface of a work by applying a solution in which a solute is dissolved in a solvent to an object to be processed (hereinafter referred to as a work) and evaporating the solvent. The solvent concentration in the space when applying the solution to the work, the solution is applied to the work at a substantially saturated concentration of the solvent, and then left as it is to allow the excess thickness of the applied solution film to flow down, A method for forming a uniform coating layer, characterized by evaporating a solvent of a solution coating applied at a solvent concentration in a space atmosphere equal to or lower than a saturation concentration to form a solute coating layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11114039A JP2000262959A (en) | 1999-03-17 | 1999-03-17 | Method for forming uniform coating film layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11114039A JP2000262959A (en) | 1999-03-17 | 1999-03-17 | Method for forming uniform coating film layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000262959A true JP2000262959A (en) | 2000-09-26 |
Family
ID=14627509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11114039A Pending JP2000262959A (en) | 1999-03-17 | 1999-03-17 | Method for forming uniform coating film layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000262959A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6994892B2 (en) | 2002-02-28 | 2006-02-07 | Fuji Photo Film Co., Ltd. | Method of manufacturing optical recording medium |
| CN105457844A (en) * | 2015-12-24 | 2016-04-06 | 中国科学院宁波材料技术与工程研究所 | Liquid level sedimentation method-based coating device |
| CN112495691A (en) * | 2020-10-27 | 2021-03-16 | 南京科赫科技有限公司 | Material deep coating device for gas purification |
-
1999
- 1999-03-17 JP JP11114039A patent/JP2000262959A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6994892B2 (en) | 2002-02-28 | 2006-02-07 | Fuji Photo Film Co., Ltd. | Method of manufacturing optical recording medium |
| CN105457844A (en) * | 2015-12-24 | 2016-04-06 | 中国科学院宁波材料技术与工程研究所 | Liquid level sedimentation method-based coating device |
| CN105457844B (en) * | 2015-12-24 | 2019-01-11 | 中国科学院宁波材料技术与工程研究所 | A kind of device of liquid level sedimentation plated film |
| CN112495691A (en) * | 2020-10-27 | 2021-03-16 | 南京科赫科技有限公司 | Material deep coating device for gas purification |
| CN112495691B (en) * | 2020-10-27 | 2022-04-12 | 南京科赫科技有限公司 | Filter bag depth coating device for flue gas purification |
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