JP2000114711A - Reflow device and heating method for solder connection - Google Patents

Reflow device and heating method for solder connection

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Publication number
JP2000114711A
JP2000114711A JP10284912A JP28491298A JP2000114711A JP 2000114711 A JP2000114711 A JP 2000114711A JP 10284912 A JP10284912 A JP 10284912A JP 28491298 A JP28491298 A JP 28491298A JP 2000114711 A JP2000114711 A JP 2000114711A
Authority
JP
Japan
Prior art keywords
zone
heating
temperature
substrate
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10284912A
Other languages
Japanese (ja)
Inventor
Shunei Otsuka
俊英 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10284912A priority Critical patent/JP2000114711A/en
Publication of JP2000114711A publication Critical patent/JP2000114711A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To make a device compact and improve energy efficiency and usage efficiency of nitrogen gas. SOLUTION: A reflow device has a preheating zone in which the temperature of a board 4 is raised to a predetermined temperature, a main heating zone in which the temperature of the board 4 is raised to a solder melting temperature or higher, a cooling zone in which the board is cooled after solder connection, conveyers 6, 7 and 8 which convey the board in the respective zones, heaters which are individually provided in the respective zones and shutters 10 and 12 which close partition walls separating one zone from the others. The board 4 is made to stay for predetermined periods for heating in the preheating zone, the main heating zone and the cooling zone respectively. With this constitution, the volume of a heating chamber 3 can be reduced and heating energy efficiency and usage efficiency of nitrogen gas can be improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半田接合の対象物
を加熱するリフロー装置および半田接合における加熱方
法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflow apparatus for heating an object to be soldered and a heating method for soldering.

【0002】[0002]

【従来の技術】基板などの半田接合対象物に電子部品を
半田接合する際に用いられる装置として、リフロー装置
が知られている。リフロー装置は、対象物をリフロー装
置内の加熱室を通過させることにより、半田接合部の温
度を順次上昇させ、半田融点温度以上に加熱することに
より半田を溶融させて半田接合するものである。加熱室
内には一般に対象物を所定温度まで昇温させる予熱ゾー
ン、半田を溶融させるための加熱を行う本加熱ゾーンお
よび半田接合後に冷却するための冷却ゾーンの3つのゾ
ーンが設けられ、これら各ゾーン間を連通して設けられ
たコンベア上に対象物を載置して搬送しながら各ゾーン
における加熱が行われていた。
2. Description of the Related Art A reflow apparatus is known as an apparatus used for soldering an electronic component to an object to be soldered such as a substrate. In a reflow apparatus, an object is passed through a heating chamber in the reflow apparatus to sequentially increase the temperature of a solder joint, and is heated to a temperature equal to or higher than the melting point of the solder to melt the solder and join the solder. The heating chamber is generally provided with three zones: a preheating zone for heating the object to a predetermined temperature, a main heating zone for heating to melt the solder, and a cooling zone for cooling after soldering. Heating in each zone has been performed while placing and transporting the target object on a conveyor provided in communication between the zones.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
リフロー装置では加熱中に対象物が移動するため、リフ
ロー装置は一般に長い加熱室を必要としていた。この結
果リフロー装置は必然的に大容積の加熱室を有するもの
となり、この加熱室の熱源には大きな加熱容量が必要と
されていた。また加熱室内を低酸素雰囲気として半田接
合性を向上させるため、加熱室内に窒素ガスを供給する
ことが行われる場合があるが、この場合には加熱室の容
積が大きいため大量の窒素ガスが消費されていた。
However, in the conventional reflow apparatus, since an object moves during heating, the reflow apparatus generally requires a long heating chamber. As a result, the reflow device necessarily has a large-capacity heating chamber, and a large heating capacity is required for the heat source of this heating chamber. In some cases, a nitrogen gas is supplied into the heating chamber to improve the solderability by setting the heating chamber to a low oxygen atmosphere. In this case, a large amount of nitrogen gas is consumed due to a large volume of the heating chamber. It had been.

【0004】さらに、従来のリフロー装置においては、
搬送コンベアは連続して駆動されているため加熱室内へ
の出入口や各ゾーン間の仕切を閉止することができず、
このため加熱された窒素ガスがリフロー装置外に常に流
出した状態となっており、このことが加熱のエネルギ効
率や窒素ガスの使用効率を更に低下させる要因となって
いた。このように従来のリフロー装置は、装置全長が長
く全体のコンパクト化が困難で、加熱用のエネルギーや
窒素ガスのロスが大きいという問題点があった。
Further, in a conventional reflow apparatus,
Since the conveyor is driven continuously, it is not possible to close the entrance to the heating chamber and the partition between each zone,
For this reason, the heated nitrogen gas always flows out of the reflow device, and this has been a factor that further reduces the heating energy efficiency and the nitrogen gas use efficiency. As described above, the conventional reflow apparatus has a problem that the total length of the apparatus is long and it is difficult to make the whole compact, and there is a large loss of heating energy and nitrogen gas.

【0005】そこで本発明は、コンパクトでエネルギー
効率や窒素ガスの使用効率を向上させることができるリ
フロー装置および半田接合における加熱方法を提供する
ことを目的とする。
Accordingly, an object of the present invention is to provide a reflow apparatus which is compact and can improve energy efficiency and use efficiency of nitrogen gas, and a heating method in solder joining.

【0006】[0006]

【課題を解決するための手段】請求項1記載のリフロー
装置は、半田接合の対象物を所定温度まで昇温させる予
熱ゾーンと、前記対象物を半田融点温度以上に加熱する
本加熱ゾーンと、半田接合後の前記対象物を冷却する冷
却ゾーンと、前記予熱ゾーン、本加熱ゾーンおよび冷却
ゾーンにおいて前記対象物を搬送する搬送手段と、前記
各ゾーンにそれぞれ個別に備えられた加熱手段と、前記
各ゾーンのうちのいずれかのゾーンと他の区画とを隔て
る隔壁を閉止する閉止手段を備えた。
According to a first aspect of the present invention, there is provided a reflow apparatus comprising: a preheating zone for heating an object to be soldered to a predetermined temperature; a main heating zone for heating the object to a temperature equal to or higher than a melting point of solder; A cooling zone for cooling the object after soldering, a conveying means for conveying the object in the preheating zone, a main heating zone and a cooling zone, and heating means individually provided in each of the zones, Closing means for closing a partition separating any of the zones from the other compartments was provided.

【0007】請求項2記載の半田接合における加熱方法
は、半田接合の対象物を所定温度まで昇温させる予熱ゾ
ーンと、前記対象物を半田融点温度以上に加熱する本加
熱ゾーンと、半田接合後の前記対象物を冷却する冷却ゾ
ーンを順次通過させて前記対象物の半田接合のための加
熱を行う半田接合における加熱方法であって、前記対象
物を、前記予熱ゾーン、本加熱ゾーンおよび冷却ゾーン
においてそれぞれのゾーンについて定められた所定時間
停留させて加熱するようにした。
[0007] A heating method for solder bonding according to claim 2, wherein a preheating zone for heating the object to be soldered to a predetermined temperature, a main heating zone for heating the object to a temperature equal to or higher than the melting point of solder, and A heating method in solder joining in which heating is performed for solder joining of the object by sequentially passing through a cooling zone for cooling the object, wherein the object is subjected to the preheating zone, the main heating zone, and the cooling zone. In the above, heating was performed by stopping for a predetermined time determined for each zone.

【0008】各請求項記載の発明によれば、半田接合の
対象物を予熱ゾーン、本加熱ゾーンおよび冷却ゾーンの
各ゾーン間を間欠搬送して各ゾーンで所定時間停留させ
て加熱することにより、リフロー装置の加熱室の容積を
小さくして加熱のエネルギ効率や窒素ガスの使用効率を
向上させることができる。
According to the invention described in each claim, the object to be soldered is intermittently transported between the preheating zone, the main heating zone, and the cooling zone, and is stopped in each zone for a predetermined time and heated. By reducing the volume of the heating chamber of the reflow device, the heating energy efficiency and the nitrogen gas use efficiency can be improved.

【0009】[0009]

【発明の実施の形態】(実施の形態1)図1は本発明の
実施の形態1のリフロー装置の正面図、図2は同リフロ
ー装置の構成を示すブロック図、図3は同加熱方法の温
度プロファイルを示すグラフである。
(Embodiment 1) FIG. 1 is a front view of a reflow apparatus according to Embodiment 1 of the present invention, FIG. 2 is a block diagram showing a configuration of the reflow apparatus, and FIG. It is a graph which shows a temperature profile.

【0010】まず図1を参照してリフロー装置の構造を
説明する。図1において、リフロー装置1は、外形を構
成するカバー部材2の内部に水平方向に配設された加熱
室3を備えており、加熱室3は内部隔壁B1,B2,B
3,B4によって5つのゾーンZ1,Z2,Z3,Z
4,Z5に分割されている。ゾーンZ1,Z2,Z3は
半田接合の対象物である基板4を所定温度まで昇温させ
る予熱ゾーン、Z4は基板4を半田融点温度以上に加熱
して半田接合を行う本加熱ゾーン、Z5は半田接合後の
基板4を徐々に降温させて冷却する冷却ゾーンとなって
いる。
First, the structure of the reflow device will be described with reference to FIG. In FIG. 1, a reflow device 1 includes a heating chamber 3 disposed in a horizontal direction inside a cover member 2 constituting an outer shape, and the heating chamber 3 includes internal partition walls B1, B2, B
5 zones Z1, Z2, Z3, Z by 3 and B4
4, Z5. Zones Z1, Z2, and Z3 are preheating zones for heating the substrate 4 to be soldered to a predetermined temperature, Z4 is a main heating zone for heating the substrate 4 to a temperature equal to or higher than the solder melting point, and Z5 is a soldering zone. This is a cooling zone in which the temperature of the bonded substrate 4 is gradually lowered and cooled.

【0011】加熱室3の上流側(図1において左側)の
側壁には、基板4を搬入するための搬入口3aが、また
下流側の側壁には基板4を搬出するための搬出口3bが
設けられていいる。搬入口3aの手前側には搬入コンベ
ア5が配設されている。ゾーンZ1,Z2,Z3内を連
通して、搬送コンベア6が、ゾーンZ4およびゾーンZ
5にはそれぞれ搬送コンベア7,8が配設されている。
搬入コンベア5上に載置された基板4は、搬送コンベア
6,7,8上を順次搬送され、搬出口3bの外側に配設
された搬出コンベア9によって搬出される。モータM
1,M2,M3,M4およびM5は、搬入コンベア5、
搬送コンベア6,7,8、搬出コンベア9をそれぞれ駆
動する。
An inlet 3a for carrying in the substrate 4 is provided on a side wall on the upstream side (left side in FIG. 1) of the heating chamber 3, and a carry-out port 3b for carrying out the substrate 4 is provided on a side wall on the downstream side. It is provided. A carry-in conveyor 5 is provided in front of the carry-in entrance 3a. The conveying conveyor 6 communicates with the zones Z1, Z2, and Z3 to form the zone Z4 and the zone Z.
5 are provided with conveyors 7 and 8, respectively.
The substrate 4 placed on the carry-in conveyor 5 is sequentially carried on the carry conveyors 6, 7, and 8, and is carried out by the carry-out conveyor 9 provided outside the carry-out port 3b. Motor M
1, M2, M3, M4 and M5 are loading conveyors 5,
The transport conveyors 6, 7, 8 and the unloading conveyor 9 are respectively driven.

【0012】各ゾーンZ1,Z2,Z3,Z4およびZ
5は、上下にそれぞれ加熱用のヒータH1,H2,H
3,H4およびH5を個別に備えている。ヒータH1,
H2,H3,H4,H5は各ゾーン内の搬送コンベア上
に載置された基板4を加熱する。加熱された基板4の表
面温度は、非接触式の温度センサS1,S2,S3,S
4およびS5によって検出される。またゾーンZ1,Z
2,Z3,Z4には、窒素ガス供給部14によって窒素
ガスが供給される。各ゾーン内に窒素ガスを供給するこ
とにより、基板4を低酸素雰囲気下で加熱し、半田接合
時の接合性を向上させることができる。
Each zone Z1, Z2, Z3, Z4 and Z
5 are heaters H1, H2, H for heating up and down, respectively.
3, H4 and H5 are individually provided. Heater H1,
H2, H3, H4, and H5 heat the substrate 4 placed on the transport conveyor in each zone. The heated surface temperature of the substrate 4 is measured by a non-contact type temperature sensor S1, S2, S3, S3.
4 and S5. Zones Z1 and Z
2, Z3, and Z4 are supplied with nitrogen gas by a nitrogen gas supply unit 14. By supplying a nitrogen gas into each zone, the substrate 4 can be heated in a low oxygen atmosphere, and the bondability during solder bonding can be improved.

【0013】また、搬入口3a、搬出口3bには、それ
ぞれシリンダ11,13によって上下駆動されるシャッ
タ10,12が設けられている。シャッタ10,12
は、基板4の搬入・搬出時のみに開状態となり、それ以
外のときには搬入口3a、搬出口3bを閉止する。すな
わち、シャッタ10は予熱ゾーンZ1と他の区画である
リフロー装置の外部との隔壁を閉止し、シャッタ11は
冷却ゾーンZ5と同じく他の区画であるリフロー装置の
外部との隔壁を閉止する閉止手段となっている。
Further, shutters 10 and 12 which are driven up and down by cylinders 11 and 13 are provided at the entrance 3a and the exit 3b, respectively. Shutters 10, 12
Is opened only when the substrate 4 is loaded / unloaded, and at other times, the loading port 3a and the loading port 3b are closed. That is, the shutter 10 closes the partition between the preheating zone Z1 and the other section, the outside of the reflow device, and the shutter 11 closes the partition between the preheating zone Z1 and the outside of the reflow device, which is another section like the cooling zone Z5. It has become.

【0014】これにより、加熱室3内の加熱気体の外部
への流出を最小限に抑制することができ、加熱に要する
エネルギーや窒素ガスの消費量を低減することができ
る。なお本実施の形態1では搬入口3a、搬出口3bに
のみシャッタを設ける例を示しているが、他のゾーン間
を仕切る隔壁にシャッタを設けて各ゾーン間を閉止する
ようにしても良い。
Thus, the outflow of the heated gas in the heating chamber 3 to the outside can be minimized, and the energy required for heating and the consumption of nitrogen gas can be reduced. In the first embodiment, an example is shown in which a shutter is provided only in the carry-in port 3a and the carry-out port 3b. However, a shutter may be provided in a partition partitioning another zone to close each zone.

【0015】次に図2を参照して、リフロー装置の制御
系の構成を説明する。図2において、温度検出部21
は、各ゾーンに設けられた温度センサS1,S2,S
3,S4,S5の検出信号を受け取り、温度データに変
換する。温度調整部22は各ゾーンごとに、指令温度に
従ってヒータH1,H2,H3,H4,H5を駆動す
る。モータ駆動部23は、搬入コンベア5、搬送コンベ
ア6,7,8および搬出コンベア9のモータM1,M
2,M3,M4,M5を駆動する。シリンダ駆動部24
はシャッタ10,12を上下動するシリンダ11,13
を駆動する。制御部20は記憶されたプログラムに従っ
て上記各部を制御する。
Next, the configuration of the control system of the reflow device will be described with reference to FIG. Referring to FIG.
Are temperature sensors S1, S2, S provided in each zone.
3, and receives the detection signals of S4 and S5 and converts them into temperature data. The temperature adjustment unit 22 drives the heaters H1, H2, H3, H4, H5 according to the command temperature for each zone. The motor drive unit 23 includes motors M1, M of the carry-in conveyor 5, the transfer conveyors 6, 7, 8 and the carry-out conveyor 9.
2, M3, M4 and M5 are driven. Cylinder drive unit 24
Are cylinders 11 and 13 for moving the shutters 10 and 12 up and down.
Drive. The control unit 20 controls each of the above units according to the stored program.

【0016】このリフロー装置は上記のように構成され
ており、以下リフロー装置による加熱方法について説明
する。まず図1において、図外の電子部品実装装置によ
って電子部品が実装された基板4が搬入コンベア5上に
載置される。このときシャッタ10は開状態にあり、モ
ータM1を駆動することにより、基板4はゾーンZ1内
の搬送コンベア6上に移動する。そして基板4の移動が
完了したならば直ちにシャッタ10が閉じられる。この
後、基板4はモータM2を間欠駆動することによりゾー
ンZ1,Z2,Z3に所定時間停留する。
This reflow apparatus is configured as described above, and a heating method using the reflow apparatus will be described below. First, in FIG. 1, a substrate 4 on which electronic components are mounted by an electronic component mounting apparatus (not shown) is placed on a carry-in conveyor 5. At this time, the shutter 10 is in the open state, and by driving the motor M1, the substrate 4 moves onto the transport conveyor 6 in the zone Z1. Then, as soon as the movement of the substrate 4 is completed, the shutter 10 is closed. Thereafter, the substrate 4 is parked in the zones Z1, Z2, Z3 for a predetermined time by intermittently driving the motor M2.

【0017】このとき、各ゾーンZ1,Z2,Z3にお
いて温度センサS1,S2,S3によって、停留状態に
ある基板4表面の所定測定点の温度を非接触により検出
する。検出信号は温度検出部21を介して制御部20に
伝達され、制御部20は各ゾーンでの温度と図3に示す
温度プロファイルとの偏差に基づいて温度調整部22に
指令温度を伝達する。温度調整部22は、指令温度に従
って各ゾーンのヒータH1,H2,H3を駆動する。こ
れにより、予熱ゾーンのゾーンZ1にて所定温度T1ま
で昇温した基板4は、ゾーンZ2,Z3に停留する時間
中所定温度T1に保持される。
At this time, in each of the zones Z1, Z2, Z3, the temperature at the predetermined measuring point on the surface of the substrate 4 in the stationary state is detected by the temperature sensors S1, S2, S3 in a non-contact manner. The detection signal is transmitted to the control unit 20 via the temperature detection unit 21, and the control unit 20 transmits the command temperature to the temperature adjustment unit 22 based on the deviation between the temperature in each zone and the temperature profile shown in FIG. The temperature adjustment unit 22 drives the heaters H1, H2, H3 in each zone according to the command temperature. Thereby, the substrate 4 heated to the predetermined temperature T1 in the zone Z1 of the preheating zone is maintained at the predetermined temperature T1 during the period of staying in the zones Z2 and Z3.

【0018】この後、基板4はゾーンZ4に移動し、所
定時間停留する。ここで基板4が停留した状態で本加熱
が行われ、図3に示すように半田融点温度T2以上に加
熱され、基板4の半田が溶融することにより電子部品の
半田接合が行われる。この後、基板4はゾーンZ5に移
動し、ここでも同様に所定時間停留することにより基板
4の冷却が行われる。これらのゾーンZ4,Z5での本
加熱、冷却工程においても、基板4の温度は温度センサ
S4,S5によって検出され、この検出結果と図3に示
すプロファイルとの偏差に基づいてヒータH4,H5が
制御される。
Thereafter, the substrate 4 moves to the zone Z4 and stays there for a predetermined time. Here, the main heating is performed in a state where the substrate 4 is stopped, and the substrate 4 is heated to the solder melting point temperature T2 or higher as shown in FIG. Thereafter, the substrate 4 moves to the zone Z5, where the substrate 4 is similarly stopped for a predetermined time to cool the substrate 4. Also in the main heating and cooling steps in these zones Z4 and Z5, the temperature of the substrate 4 is detected by the temperature sensors S4 and S5, and the heaters H4 and H5 are activated based on the deviation between the detection result and the profile shown in FIG. Controlled.

【0019】そして所定の停留時間経過後に、搬出口3
bのシャッタ12が開けられ、基板4は搬出コンベア9
により外部に搬出される。このように、基板4を間欠搬
送することにより、所定の加熱時間中において基板4は
移動しないため加熱室3は基板4を収容できる長さを備
えていれば良く、従って加熱室3の長さを大幅に短縮す
ることができ、コンパクトなリフロー装置が実現され
る。またこれにより、加熱室3内部の容積を減少させて
加熱に要するエネルギーや加熱室3内に供給される窒素
ガスの消費量を大幅に節減することができる。さらに、
加熱室3を周囲から閉止することにより、上述の省エネ
ルギー効果、窒素ガス消費量節減効果を更に向上させる
ことができる。
After the elapse of a predetermined stop time, the exit 3
b, the shutter 12 is opened, and the substrate 4 is unloaded from the unloading conveyor 9.
Is carried out to the outside. As described above, by intermittently transporting the substrate 4, the substrate 4 does not move during a predetermined heating time, so that the heating chamber 3 only needs to have a length capable of accommodating the substrate 4. Can be greatly reduced, and a compact reflow device can be realized. In addition, by this, the volume inside the heating chamber 3 can be reduced, and the energy required for heating and the consumption of nitrogen gas supplied into the heating chamber 3 can be significantly reduced. further,
By closing the heating chamber 3 from the surroundings, it is possible to further improve the above-described energy saving effect and nitrogen gas consumption reduction effect.

【0020】また各ゾーンで基板4を停留させるように
しているので、温度センサによる温度検出を精度よく行
うことができるとともに、温度制御において基板が移動
することの変動要素を除外することができるため、温度
制御の精度を向上させて望ましい温度プロファイルによ
り忠実に従った温度制御行うことができる。これによ
り、良好な温度プロセスで半田接合が行われるため、接
合品質を向上させることができる。
Further, since the substrate 4 is stopped in each zone, the temperature can be accurately detected by the temperature sensor, and a variable element of the movement of the substrate in the temperature control can be eliminated. In addition, it is possible to improve the accuracy of the temperature control and perform the temperature control more faithfully according to the desired temperature profile. Thereby, the soldering is performed in a favorable temperature process, so that the bonding quality can be improved.

【0021】さらに、各ゾーン毎の搬送コンベアが分離
されているため、予熱工程、本加熱工程、冷却工程で、
異った停留時間を設定することができ、例えば本加熱後
の基板は予熱工程と関係なく速やかに冷却ゾーンに移動
させるなど、よりフレキシブルな加熱形態が可能とな
る。
Further, since the transport conveyor for each zone is separated, the preheating step, the main heating step, and the cooling step
A different dwell time can be set, and a more flexible heating mode is possible, for example, by quickly moving the substrate after the main heating to the cooling zone regardless of the preheating step.

【0022】(実施の形態2)図4は本発明の実施の形
態2のリフロー装置の正面図である。図4は、実施の形
態1におけるリフロー装置の加熱室3の各ゾーンZ1〜
Z5に、個別のコンベア6A,6B,6Cを設けて、各
ゾーン毎に独立した搬送動作を行えるようにするととも
に、各ゾーンZ1〜Z5を隔てる各隔壁B1〜B4にそ
れぞれシリンダ16によって上下動するシャッタ30,
31,32,33を設けたものである。このような構成
とすることにより、各ゾーンの独立性を高め、更に高精
度の温度制御を実現できるとともに、省エネルギー効果
を更に向上させることができる。
(Embodiment 2) FIG. 4 is a front view of a reflow apparatus according to Embodiment 2 of the present invention. FIG. 4 shows each zone Z <b> 1 to Z <b> 1 of the heating chamber 3 of the reflow device in the first embodiment.
Individual conveyors 6A, 6B and 6C are provided in Z5 so that independent transport operations can be performed for each zone, and the cylinders 16 move up and down on partition walls B1 to B4 separating the zones Z1 to Z5, respectively. Shutter 30,
31, 32, and 33 are provided. With such a configuration, the independence of each zone can be enhanced, more accurate temperature control can be realized, and the energy saving effect can be further improved.

【0023】[0023]

【発明の効果】本発明によれば、半田接合の対象物を予
熱ゾーン、本加熱ゾーンおよび冷却ゾーンの各ゾーン間
を間欠搬送して各ゾーンにおいて所定時間停留させて加
熱するようにしてリフロー装置の加熱室の容積を小さく
したので、また各ゾーンを他の区画から閉止する閉止手
段を設けるようにしたので、加熱のエネルギ効率や窒素
ガスの使用効率を向上させてランニングコストを削減で
きる。
According to the present invention, an object to be soldered is intermittently transported between a preheating zone, a main heating zone and a cooling zone, and is stopped for a predetermined time in each zone to heat it. Since the volume of the heating chamber is reduced, and a closing means for closing each zone from other sections is provided, the energy efficiency of heating and the use efficiency of nitrogen gas are improved, and the running cost can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態1のリフロー装置の正面図FIG. 1 is a front view of a reflow device according to a first embodiment of the present invention.

【図2】本発明の実施の形態1のリフロー装置の構成を
示すブロック図
FIG. 2 is a block diagram illustrating a configuration of a reflow device according to the first embodiment of the present invention.

【図3】本発明の実施の形態1の加熱方法の温度プロフ
ァイルを示すグラフ
FIG. 3 is a graph showing a temperature profile of the heating method according to the first embodiment of the present invention.

【図4】本発明の実施の形態2のリフロー装置の正面図FIG. 4 is a front view of a reflow device according to a second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 リフロー装置 3 加熱室 3a 搬入口 3b 搬出口 4 基板 5 搬入コンベア 6、7、8 搬送コンベア 9 搬出コンベア 10、12 シャッタ H1、H2、H3、H4、H5 ヒータ S1、S2、S3、S4、S5 温度センサ DESCRIPTION OF SYMBOLS 1 Reflow apparatus 3 Heating chamber 3a Carry-in port 3b Carry-out port 4 Substrate 5 Carry-in conveyor 6, 7, 8 Carry conveyor 9 Carry-out conveyor 10, 12 Shutter H1, H2, H3, H4, H5 Heater S1, S2, S3, S4, S5 Temperature sensor

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】半田接合の対象物を所定温度まで昇温させ
る予熱ゾーンと、前記対象物を半田融点温度以上に加熱
する本加熱ゾーンと、半田接合後の前記対象物を冷却す
る冷却ゾーンと、前記予熱ゾーン、本加熱ゾーンおよび
冷却ゾーンにおいて前記対象物を搬送する搬送手段と、
前記各ゾーンにそれぞれ個別に備えられた加熱手段と、
前記各ゾーンのうちのいずれかのゾーンと他の区画とを
隔てる隔壁を閉止する閉止手段を備えたことを特徴とす
るリフロー装置。
1. A preheating zone for heating an object to be soldered to a predetermined temperature, a main heating zone for heating the object to a temperature equal to or higher than a melting point of solder, and a cooling zone for cooling the object after soldering. Transport means for transporting the object in the preheating zone, the main heating zone and the cooling zone,
Heating means individually provided in each of the zones,
A reflow device comprising a closing means for closing a partition separating any one of the zones from another zone.
【請求項2】半田接合の対象物を所定温度まで昇温させ
る予熱ゾーンと、前記対象物を半田融点温度以上に加熱
する本加熱ゾーンと、半田接合後の前記対象物を冷却す
る冷却ゾーンを順次通過させて前記対象物の半田接合の
ための加熱を行う半田接合における加熱方法であって、
前記対象物を、前記予熱ゾーン、本加熱ゾーンおよび冷
却ゾーンにおいてそれぞれのゾーンについて定められた
所定時間停留させて加熱することを特徴とする半田接合
における加熱方法。
2. A preheating zone for heating an object to be soldered to a predetermined temperature, a main heating zone for heating the object to a temperature equal to or higher than a melting point of solder, and a cooling zone for cooling the object after soldering. A heating method in solder joining in which heating for solder joining of the object is sequentially performed by passing through,
A heating method in soldering, wherein the object is heated while being stopped for a predetermined time set in each of the preheating zone, the main heating zone, and the cooling zone.
JP10284912A 1998-10-07 1998-10-07 Reflow device and heating method for solder connection Pending JP2000114711A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10284912A JP2000114711A (en) 1998-10-07 1998-10-07 Reflow device and heating method for solder connection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10284912A JP2000114711A (en) 1998-10-07 1998-10-07 Reflow device and heating method for solder connection

Publications (1)

Publication Number Publication Date
JP2000114711A true JP2000114711A (en) 2000-04-21

Family

ID=17684670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10284912A Pending JP2000114711A (en) 1998-10-07 1998-10-07 Reflow device and heating method for solder connection

Country Status (1)

Country Link
JP (1) JP2000114711A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100439618B1 (en) * 2001-05-03 2004-07-12 에이에스엠 어쌤블리 오토메이션 리미티드 Solder reflow oven
KR100877597B1 (en) 2007-07-21 2009-01-07 (주)스마트코퍼레이션 Attaching apparatus using high frequency induction heating
JP2009295810A (en) * 2008-06-05 2009-12-17 Honda Motor Co Ltd Liquid reflow equipment
JP2010153674A (en) * 2008-12-26 2010-07-08 Fujitsu Ltd Reflow device
KR100984322B1 (en) 2008-08-20 2010-09-30 삼성전기주식회사 reflow device
CN103769713A (en) * 2012-10-19 2014-05-07 台达电子电源(东莞)有限公司 Preheating module and preheating zone using same and preheating section
CN111266686A (en) * 2018-12-04 2020-06-12 西安中科恒境环保科技有限公司 Intelligent control method and system for nitrogen reflow oven

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100439618B1 (en) * 2001-05-03 2004-07-12 에이에스엠 어쌤블리 오토메이션 리미티드 Solder reflow oven
KR100877597B1 (en) 2007-07-21 2009-01-07 (주)스마트코퍼레이션 Attaching apparatus using high frequency induction heating
JP2009295810A (en) * 2008-06-05 2009-12-17 Honda Motor Co Ltd Liquid reflow equipment
KR100984322B1 (en) 2008-08-20 2010-09-30 삼성전기주식회사 reflow device
JP2010153674A (en) * 2008-12-26 2010-07-08 Fujitsu Ltd Reflow device
CN103769713A (en) * 2012-10-19 2014-05-07 台达电子电源(东莞)有限公司 Preheating module and preheating zone using same and preheating section
CN111266686A (en) * 2018-12-04 2020-06-12 西安中科恒境环保科技有限公司 Intelligent control method and system for nitrogen reflow oven

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